JPH0156147B2 - - Google Patents
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- Publication number
- JPH0156147B2 JPH0156147B2 JP59222178A JP22217884A JPH0156147B2 JP H0156147 B2 JPH0156147 B2 JP H0156147B2 JP 59222178 A JP59222178 A JP 59222178A JP 22217884 A JP22217884 A JP 22217884A JP H0156147 B2 JPH0156147 B2 JP H0156147B2
- Authority
- JP
- Japan
- Prior art keywords
- core tube
- liquid
- cleaning
- tube
- reactor core
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Cleaning In General (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
【発明の詳細な説明】
〔従来の技術〕
本発明は炉心管の洗浄方法に関する。たとえ
ば、半導体装置の製造に用いる石英管について
は、特開昭52−143760号に示されている。DETAILED DESCRIPTION OF THE INVENTION [Prior Art] The present invention relates to a method for cleaning a furnace core tube. For example, a quartz tube used in the manufacture of semiconductor devices is disclosed in Japanese Patent Application Laid-Open No. 143760/1983.
半導体装置、集積回路等の製造においては、薄
い半導体板(ウエハ)を加熱状態に維持される石
英管からなる炉心管内に流し、ウエハ表面部に被
膜を形成したり、不純物を拡散させる作業があ
る。この作業にあつては、炉心管(単に管とも称
する。)内には反応ガスの反応によつて各種の生
成物が発生し、この生成物はウエハ以外の不所望
な管壁にも付着する。このため、この付着層は塊
となつて管壁から落下してウエハ表面に付着し、
ウエハ表面での被膜の異常生長の原因等になつた
りする。また、付着層内に含まれている不純物が
管内に再蒸発し、これが再びウエハ表層部に拡散
し、(いわゆるオートドーピング)拡散濃度が不
均一となつたりする。 In the production of semiconductor devices, integrated circuits, etc., thin semiconductor plates (wafers) are passed through a heated quartz tube to form a film on the wafer surface or diffuse impurities. . During this work, various products are generated in the reactor core tube (also simply referred to as the tube) due to the reaction of the reaction gases, and these products also adhere to undesirable tube walls other than the wafer. . Therefore, this adhesion layer forms a lump, falls from the tube wall, and adheres to the wafer surface.
This may cause abnormal growth of the film on the wafer surface. In addition, impurities contained in the deposited layer re-evaporate into the tube and diffuse again into the wafer surface layer (so-called autodoping), resulting in non-uniform diffusion concentration.
そこで、一定処理回数毎に、この炉心管を拡散
炉(熱処理装置)から取り外し、管内壁に付着す
る被膜を取り除く洗浄作業が行なわれ、この洗浄
作業は、第1図および第2図に示すような構造の
洗浄装置を用いることが提案される。すなわち、
この洗浄装置には並列に第1洗浄槽1〜第3洗浄
槽3が配設され、第1洗浄槽1には炉心管4の内
壁に付着した被膜を溶解するエツチング液、たと
えば、シリコンやシリコン化合物の場合にはふつ
酸を主とするエツチング液が入れられ、第2洗浄
槽2には純水が順次供給される状態で入れられ
る。また、第3洗浄槽3の下方には回転制御され
る複数のローラ5が配設され、第2洗浄槽2で洗
浄された炉心管4はこれらローラ5上に載せられ
回転するようになつている。また、第3洗浄槽3
の側内壁上部には純水をローラ5上の炉心管4に
吹き付ける噴射管6が配設されている。 Therefore, the furnace core tube is removed from the diffusion furnace (heat treatment equipment) every fixed number of times, and cleaning work is performed to remove the coating that adheres to the inner wall of the tube.This cleaning work is performed as shown in Figures 1 and 2. It is proposed to use a cleaning device with a similar structure. That is,
This cleaning device is provided with a first cleaning tank 1 to a third cleaning tank 3 in parallel, and the first cleaning tank 1 is filled with an etching solution such as silicone or In the case of compounds, an etching solution mainly containing hydrochloric acid is placed in the second cleaning tank 2, and pure water is sequentially supplied to the second cleaning tank 2. Further, a plurality of rollers 5 whose rotation is controlled are disposed below the third cleaning tank 3, and the reactor core tube 4 cleaned in the second cleaning tank 2 is placed on these rollers 5 and rotated. There is. In addition, the third cleaning tank 3
An injection pipe 6 for spraying pure water onto the reactor core tube 4 on the rollers 5 is disposed at the upper part of the inner wall of the reactor.
このような洗浄装置にあつては、炉心管4の両
端近傍を下方が円弧状に屈曲したアーム7でそれ
ぞれ支え、第1洗浄槽1のエツチング液8中に浸
して炉心管4の内壁に付着している被膜を除去
し、その後、アーム7を上昇、水平移動、下降さ
せて炉心管4を第2洗浄槽2の純水からなる洗浄
液9中に入れてエツチング液等を洗い流す。さら
に、アーム7を移動させて炉心管4を第3洗浄槽
3内のローラ5上に載置する。そして、第2図に
示すように、炉心管4の一端の細管部(枝管)1
0に回転可能な回転ジヨイント11を介して純水
供給管12を接続し、純水供給管12から炉心管
4内に純水を流し込み、管内の洗浄を行なう。ま
た、上方の噴射管6から純水を炉心管4に吹き付
け、炉心管4の外壁を洗う。この際、ローラ5は
共に同一方向に回転することから、炉心管4は一
定回転方向に廻り続け、炉心管4の内外壁全体に
洗浄液が流れ洗浄が行なわれる。 In the case of such a cleaning device, the vicinity of both ends of the core tube 4 are supported by arms 7 bent in an arc shape at the bottom, and the etching solution is immersed in the etching liquid 8 in the first cleaning tank 1 to adhere to the inner wall of the core tube 4. After that, the arm 7 is raised, moved horizontally, and lowered, and the core tube 4 is placed in the cleaning liquid 9 made of pure water in the second cleaning tank 2 to wash away the etching liquid and the like. Furthermore, the arm 7 is moved to place the furnace tube 4 on the roller 5 in the third cleaning tank 3. As shown in FIG. 2, a thin tube section (branch tube) 1 at one end of the furnace tube
A pure water supply pipe 12 is connected through a rotary joint 11 which is rotatable to the main body, and pure water is flowed from the pure water supply pipe 12 into the reactor core tube 4 to clean the inside of the pipe. Further, pure water is sprayed onto the core tube 4 from the upper injection pipe 6 to wash the outer wall of the core tube 4. At this time, since the rollers 5 both rotate in the same direction, the furnace core tube 4 continues to rotate in a constant rotation direction, and the cleaning liquid flows over the entire inner and outer walls of the furnace core tube 4 to perform cleaning.
しかし、このような洗浄装置およびその洗浄方
法ではつぎのような欠点がある。
However, such a cleaning device and its cleaning method have the following drawbacks.
(1) 第3洗浄槽での洗浄にあつては、洗浄の都度
炉心管に回転ジヨイントを接続しなければなら
ず、作業性が悪い。(1) When cleaning in the third cleaning tank, it is necessary to connect a rotating joint to the reactor core tube each time cleaning is performed, resulting in poor work efficiency.
(2) 炉心管には回転ジヨイントを介して純水供給
管を接続しているため、本来ならば純水供給管
が炉心管の回転によつて捩れたりするわけはな
いが実際には回転ジヨイント近傍を固定構造と
していないため、純水供給管が捩れ、純水の供
給が変動し、管内洗浄が充分行なえない欠点も
生じる。(2) Since the pure water supply pipe is connected to the reactor core tube through a rotating joint, there is no way that the pure water supply pipe would be twisted by the rotation of the reactor core tube, but in reality, the pure water supply pipe is connected to the rotating joint. Since there is no fixed structure in the vicinity, the pure water supply pipe is twisted, the supply of pure water fluctuates, and the inside of the pipe cannot be sufficiently cleaned.
(3) 純水供給管は第3洗浄槽の底部を這う状態と
なるため、ゴム質の純水供給管がふつ酸に侵さ
れ、新に不純物が発生し、炉心管を汚染するお
それもある。(3) Since the pure water supply pipe runs along the bottom of the third cleaning tank, there is a risk that the rubbery pure water supply pipe will be corroded by the acid, creating new impurities and contaminating the reactor core tube. .
(4) 炉心管の枝管部分は炉心管の一端部が急激に
絞む構造となつていて、洗浄液は枝管から大径
部である炉心管内に流れ込む。この結果、絞む
領域では流れの渦が発生して、この部分では洗
浄液の新陳代謝が極めて悪くなり、炉心管の絞
り曲面内壁の洗浄が充分できない。(4) The branch pipes of the reactor core tube have a structure in which one end of the reactor core tube narrows rapidly, and the cleaning liquid flows from the branch pipe into the large diameter part of the reactor core tube. As a result, a vortex of flow is generated in the constriction region, and the metabolism of the cleaning liquid is extremely slow in this region, making it impossible to sufficiently clean the inner wall of the constriction curved surface of the reactor core tube.
(5) 枝管のない炉心管では大径な回転ジヨイント
が市場にないので、このような洗浄装置では洗
浄ができない。すなわち汎用性が低い。(5) Since there are no large-diameter rotating joints on the market for core tubes without branch pipes, such cleaning equipment cannot clean them. In other words, it has low versatility.
(6) 第1洗浄槽および第2洗浄槽の液中への炉心
管の出入時、炉心管を水平状態で出し入れする
構造となつているため、炉心管を液中に沈める
際枝管側が塞がれていることもあつて管内の空
気のリークが不充分となる。管内に残留する小
さい気泡のためにエツチング、洗浄がされない
部分も生じエツチング、洗浄が効果的に行なえ
ない。また、管内の空気がリークしにくいの
で、管が浮き、セツト位置がずれてしまい、そ
の後のアームによる支持等が不充分となつた
り、ローラ上に規定通りに管を載置させること
ができなくなつたりする。(6) When the reactor core tube is inserted into and removed from the liquid in the first and second cleaning tanks, the structure is such that the reactor core tube is inserted and removed horizontally, so when the reactor core tube is submerged in the liquid, the branch pipe side is blocked. The leakage of the air inside the pipe is also insufficient. Due to the small air bubbles remaining in the tube, some areas are not etched or cleaned, making it impossible to effectively etch and clean. In addition, since the air inside the tube is difficult to leak, the tube may float and the set position may shift, resulting in insufficient support by the arm or the inability to place the tube on the rollers as specified. I feel relaxed.
したがつて、本発明の目的は、上記(6)の欠点を
除去することにあり洗浄が充分行なえ、かつ作業
能率の高い炉心管の洗浄方法を提供することにあ
る。
Therefore, an object of the present invention is to eliminate the above-mentioned drawback (6), and to provide a method for cleaning a reactor core tube that allows sufficient cleaning and high work efficiency.
上記(6)の問題点を解決するための手段は、液体
の入つた液体槽に炉心管を浸漬して前記炉心管を
洗浄する炉心管の洗浄方法において、前記炉心管
の一の端部近傍および他の一の端部近傍をそれぞ
れ第一および第二の支持体で支持し、前記第一お
よびび第二の支持体により前記炉心管を前記液体
槽の液面近傍まで移動し、前記第一の支持体を降
下させることにより前記炉心管の一の端部を前記
液体槽の液中へ部分的に浸漬し、その状態を保つ
て前記第二の支持体を降下させることにより前記
炉心管の他の一の端部を前記液体槽の液中へ全面
的に浸漬し、その状態を保つて前記第一の支持体
を降下させ、それにより前記液体槽の液中へ部分
的に浸漬した前記炉心管の一の端部を前記液体槽
の液中へ全面的に浸漬することを特徴とする炉心
管の洗浄方法である。
Means for solving the above problem (6) is that in a method for cleaning a core tube in which the core tube is cleaned by immersing the core tube in a liquid tank containing a liquid, a portion near one end of the core tube is provided. and the vicinity of the other one end are supported by first and second supports, respectively, and the core tube is moved to the vicinity of the liquid level of the liquid tank by the first and second supports, and the By lowering the first support, one end of the reactor core tube is partially immersed in the liquid of the liquid tank, and while maintaining this state, lowering the second support, the reactor core tube is lowered. The other end was fully immersed into the liquid in the liquid bath, and while maintaining that state, the first support was lowered, thereby being partially immersed in the liquid in the liquid bath. The method for cleaning a furnace core tube is characterized in that one end of the furnace core tube is completely immersed in the liquid in the liquid tank.
参考例 1
第3図および第4図は本発明の参考例であると
ころの炉心管洗浄装置を示す。この参考例では第
1図および第2図で示した前記炉心管洗浄装置に
おいて、第3洗浄槽3の構造を一部改良し、かつ
炉心管4を支持するアーム7を含む移送機構を改
良したものである。すなわち、第3洗浄槽3の底
板13上には4個のローラ5が取り付けられ、そ
れぞれ対となる2個のローラ5でそれぞれ炉心管
4の両端近傍を支えるようになつている。また、
一側に位置する2つのローラ5の中心には、一本
の連結軸14が固定状態で貫通している。この連
結軸14は第3洗浄槽3の一端側のカバー15の
下に配設されるモータ16の回転軸17にカツプ
リング18を介して連結され、モータ16の駆動
によつて回転するようになつている。したがつ
て、ローラ5上に炉心管4を載置してモータ16
を駆動させると、炉心管4はローラ5によつて回
転する。Reference Example 1 FIGS. 3 and 4 show a core tube cleaning device that is a reference example of the present invention. In this reference example, in the core tube cleaning apparatus shown in FIGS. 1 and 2, the structure of the third cleaning tank 3 is partially improved, and the transfer mechanism including the arm 7 that supports the core tube 4 is improved. It is something. That is, four rollers 5 are mounted on the bottom plate 13 of the third cleaning tank 3, and each pair of two rollers 5 supports the vicinity of both ends of the furnace tube 4, respectively. Also,
One connecting shaft 14 passes through the center of the two rollers 5 located on one side in a fixed state. This connecting shaft 14 is connected via a coupling ring 18 to a rotating shaft 17 of a motor 16 disposed under a cover 15 on one end side of the third cleaning tank 3, and is rotated by the drive of the motor 16. ing. Therefore, the furnace tube 4 is placed on the roller 5 and the motor 16 is
When driven, the furnace core tube 4 is rotated by the rollers 5.
また、第3洗浄槽3のカバー15側には純水か
らなる洗浄液を噴射する純水噴射機構19が配設
されている。この純水噴射機構19は純水を噴き
出すジエツトノズル20と、このジエツトノズル
20に純水を導く供給管21とからなつている。
また、前記ジエツトノズル20は上下にジエツト
ノズルを揺動させる首振部22をも有している。 Furthermore, a pure water injection mechanism 19 is provided on the cover 15 side of the third cleaning tank 3 to spray a cleaning liquid made of pure water. This pure water injection mechanism 19 consists of a jet nozzle 20 that spouts out pure water, and a supply pipe 21 that guides the pure water to the jet nozzle 20.
The jet nozzle 20 also has a swinging portion 22 that swings the jet nozzle up and down.
また、第3洗浄槽3の両側内壁上部には、ロー
ラ5上に載置される炉心管4に純水を吹き付ける
複数の噴射孔(図示せず)を有する噴射管6が配
設されている。 Furthermore, an injection pipe 6 having a plurality of injection holes (not shown) for spraying pure water onto the reactor core tube 4 placed on the roller 5 is arranged at the upper part of the inner wall on both sides of the third cleaning tank 3. .
一方、炉心管4を移送する移送機構は第5図に
示す構造となつている。すなわち、第1洗浄槽1
〜第3洗浄槽3の上方にはこれらを共に横切るよ
うに2本のレール23が配設され、このレール2
3上には可動箱24が車輪25を介して載つてい
る。この車輪25は図示しないモータ系によつて
回動制御される。また、可動箱24の底面からは
下端が円弧状に屈曲し、その屈曲部に炉心管4を
載置するアーム7が二本延びている。これらアー
ム7の上端はそれぞれ可動箱24内の昇降板26
に固定され支持されている。これら昇降板26は
可動箱24内で鉛直方向に延びる2本のガイド2
7に滑動自在に嵌合している。また、昇降板26
には前記ガイド27に平行となるねじ棒28が螺
合し、このねじ棒28の上端はカツプリング29
を介して可動箱24の天井板30の上面に支持板
31を介して固定された昇降用モータ32の回転
軸33に連結されている。したがつて、アーム、
昇降板、ねじ棒、モータ等からなる支持機構にあ
つて、前記昇降用モータ32を正転させると昇降
板26は下降するため、アーム7も下降し、昇降
用モータ32を逆転させると昇降板26は上昇す
る。また、2本のアーム7は個別に昇降制御が可
能となつている。 On the other hand, the transfer mechanism for transferring the furnace core tube 4 has a structure shown in FIG. That is, the first cleaning tank 1
- Two rails 23 are arranged above the third cleaning tank 3 so as to cross them together, and these rails 23
3, a movable box 24 is mounted on wheels 25. The rotation of this wheel 25 is controlled by a motor system (not shown). Further, from the bottom surface of the movable box 24, the lower end thereof is bent in an arc shape, and two arms 7 on which the reactor core tube 4 is placed extend from the bent portion. The upper ends of these arms 7 are each connected to a lifting plate 26 inside the movable box 24.
is fixed and supported. These elevating plates 26 are connected to two guides 2 extending vertically within the movable box 24.
7 is slidably fitted. In addition, the elevating plate 26
A threaded rod 28 parallel to the guide 27 is screwed into the screw rod 28, and the upper end of this threaded rod 28 is connected to a coupling ring 29.
It is connected to a rotating shaft 33 of a lifting motor 32 fixed to the upper surface of a ceiling plate 30 of the movable box 24 via a support plate 31. Therefore, the arm
In a support mechanism consisting of an elevating plate, a threaded rod, a motor, etc., when the elevating motor 32 is rotated in the normal direction, the elevating plate 26 is lowered, so that the arm 7 is also lowered, and when the elevating motor 32 is reversed, the elevating plate 26 is lowered. 26 rises. Furthermore, the two arms 7 can be individually controlled to rise and fall.
つぎに、このような炉心管洗浄装置を用いた本
発明に係る炉心管の洗浄方法について、第6図a
〜eを参照しながら説明する。まず、移送機構の
アーム7に炉心管4を引つ掛けた後、移送機構を
第1洗浄槽1の真上で停止させ、第6図a,bで
示すように2組の支持機構の昇降用モータ32を
共に正回転させて炉心管4を水平状態を保つて降
下させる。そして、炉心管4の下面がエツチング
液8に接触する頃、一方の支持機構のアーム7の
下降を停止させ、他方の支持機構のアーム7の下
降をのみ続行する。停止側アーム7は炉心管4の
枝管10側を支持している。したがつて、同図c
で示すように、炉心管4はその大径部からエツチ
ング液8中に入る。この大径部側はストレートな
円管となることから管も浮くようなことなく管内
にはスムースにエツチング液が入り込む。
Next, a method for cleaning a core tube according to the present invention using such a core tube cleaning device will be explained in FIG. 6a.
This will be explained with reference to . First, after hooking the reactor core tube 4 to the arm 7 of the transfer mechanism, the transfer mechanism is stopped directly above the first cleaning tank 1, and the two sets of support mechanisms are raised and lowered as shown in Fig. 6a and b. Both motors 32 are rotated in the forward direction to lower the furnace core tube 4 while keeping it in a horizontal state. Then, when the lower surface of the furnace tube 4 comes into contact with the etching liquid 8, the lowering of the arm 7 of one support mechanism is stopped, and only the lowering of the arm 7 of the other support mechanism is continued. The stop-side arm 7 supports the branch pipe 10 side of the reactor core tube 4. Therefore, Figure c
As shown, the core tube 4 enters the etching liquid 8 from its large diameter portion. Since this large-diameter side is a straight circular tube, the etching liquid smoothly enters the tube without floating the tube.
つぎに、同図dで示すように、他方のアーム7
を停止させ、一方のアーム7を下降させて炉心管
4をその枝管側からエツチング液中に入れる。こ
の際、エツチング液は大径側からも枝管内に流れ
込むので、炉心管4が浮き上がつたりしない。ま
た、枝管10が炉心管4の大径部よりも下方に位
置する傾斜状態となつた所で一方のアーム7の降
下を停止させ、代りに停止状態にあつた他方のア
ーム7を徐々に降下させ、炉心管4をエツチング
液8中に水平状態で停止させ、炉心管内の付着層
のエツチングを行なう。このように、炉心管4を
交互に斜の状態にしてエツチング液中に浸漬させ
るため、炉心管内に気泡が残留することはない。 Next, as shown in the figure d, the other arm 7
is stopped, one arm 7 is lowered, and the reactor core tube 4 is placed into the etching solution from its branch tube side. At this time, since the etching liquid also flows into the branch pipe from the large diameter side, the furnace core tube 4 does not float up and become sluggish. Further, when the branch pipe 10 reaches an inclined position below the large diameter portion of the core tube 4, the descent of one arm 7 is stopped, and the other arm 7, which has been in a stopped state, is gradually lowered. The reactor core tube 4 is lowered and stopped horizontally in the etching liquid 8, and the deposited layer inside the reactor core tube is etched. In this way, since the furnace core tube 4 is alternately tilted and immersed in the etching solution, no air bubbles remain in the furnace core tube.
参考例 2
つぎに、本発明の参考例である炉心管の引き上
げ動作について説明する。ここで、エツチングに
よつて管壁の不所望付着層が溶解された頃、第7
図a〜dで示す手順で炉心管4をエツチング液中
から引き上げる。すなわち、同図aで示すよう
に、エツチング液8中で水平状態となつている炉
心管にあつて、同図bで示すように一方のアーム
7を上昇させ、枝管10が上位置となるように炉
心管4を傾斜させる。つぎに、この状態で両方の
アーム7を上昇させる。すると、炉心管のエツチ
ング液が流れる管内壁底面は全て同一方向の傾き
を有する面、すなわち、同図cで示すように左上
がりの底面となり、エツチング液は阻外されるこ
となく管内から流れ落ちる。この炉心管4が傾斜
状態でエツチング液上に引き上げられた後、同図
dで示すように枝管10側の一方のアーム7の上
昇は停止し、他方のアーム7が上昇して炉心管4
を水平状態とする。Reference Example 2 Next, a furnace tube lifting operation that is a reference example of the present invention will be described. Here, when the undesired adhesion layer on the tube wall was dissolved by etching, the seventh
The furnace core tube 4 is lifted out of the etching solution according to the procedure shown in Figures a to d. That is, when the core tube is in a horizontal state in the etching liquid 8 as shown in FIG. Incline the furnace core tube 4 as shown in FIG. Next, both arms 7 are raised in this state. Then, the bottom surfaces of the inner walls of the core tubes through which the etching liquid flows are all sloped in the same direction, that is, the bottom surfaces are slanted upward to the left as shown in Figure c, and the etching liquid flows down from the tubes without being blocked. After the core tube 4 is lifted onto the etching solution in an inclined state, one arm 7 on the side of the branch tube 10 stops rising, and the other arm 7 rises, causing the core tube 4 to rise as shown in d in the same figure.
is in a horizontal state.
つぎに、移送機構は移動して第2洗浄槽2上で
停止し、前記手順と同様な手順で炉心管4を洗浄
液(純水)中に一定時間浸漬させて炉心管の内外
壁を洗浄する。 Next, the transfer mechanism moves and stops above the second cleaning tank 2, and the core tube 4 is immersed in the cleaning liquid (pure water) for a certain period of time in the same manner as described above to clean the inner and outer walls of the core tube. .
つぎに、移送機構は炉心管4を第3図および第
4図に示すように、第3洗浄槽3内に搬送する。
炉心管4は大径部をジエツトノズル20側に対峙
させた状態でローラ5上に載る。この際、アーム
7の屈曲部は炉心管4の下面からわずか下方に外
れる。すると、モータ16が駆動してローラ5が
回転することから、炉心管4は回転し、これと同
時に噴射管6から純水が吹き出され、炉心管4の
外周壁が洗浄される。また、同時にジエツトノズ
ル20からも噴いよく純水が噴射され、この水流
は回転する炉心管4の内壁に当たる。また、ジエ
ツトノズル20の首振部22が首を振ることから
水流は炉心管の母線に沿つて移動するため、炉心
管4の内壁全域が炉心管の回転もあつて洗浄され
る。また、水流は奥の絞り曲面部や枝管内壁にも
勢い良く当たるため、洗浄が効果的に行なえる。
なお、汚れた洗浄液は排水口34から排水され
る。このように一定時間洗浄されると、ジエツト
ノズル20および噴射管6からの純水の噴射は停
止され、モータ16の回転も停止する。そして、
アーム7が上昇して洗浄化された炉心管4は所定
位置に運ばれ、一連の洗浄作業が完了する。 Next, the transfer mechanism transfers the reactor core tube 4 into the third cleaning tank 3, as shown in FIGS. 3 and 4.
The furnace core tube 4 is placed on the rollers 5 with its large diameter portion facing the jet nozzle 20 side. At this time, the bent portion of the arm 7 is slightly removed downward from the lower surface of the furnace core tube 4. Then, since the motor 16 is driven and the roller 5 rotates, the furnace core tube 4 rotates, and at the same time, pure water is blown out from the injection tube 6 to clean the outer peripheral wall of the furnace core tube 4. At the same time, pure water is also jetted from the jet nozzle 20, and this water stream hits the inner wall of the rotating reactor core tube 4. Further, since the swinging portion 22 of the jet nozzle 20 swings, the water flow moves along the generatrix of the core tube, so that the entire inner wall of the core tube 4 is cleaned due to the rotation of the core tube. In addition, the water flow hits the inner wall of the constrictor and the inner wall of the branch pipe with great force, allowing for effective cleaning.
Note that the dirty cleaning liquid is drained from the drain port 34. After cleaning for a certain period of time in this way, the injection of pure water from the jet nozzle 20 and the injection pipe 6 is stopped, and the rotation of the motor 16 is also stopped. and,
The arm 7 rises and the cleaned furnace core tube 4 is carried to a predetermined position, completing a series of cleaning operations.
このような実施例によれば、炉心管のエツチン
グ液および洗浄液内への浸漬にあつて、管内に空
気を残留させることなく浸漬できる。
According to this embodiment, the furnace core tube can be immersed in the etching solution and the cleaning solution without leaving any air remaining in the tube.
また、液中への炉心管の浸漬するときに炉心管
を適宜傾けて浸漬できる構造となつていることか
ら、浸漬時管内に気泡が残留したり、あるいは液
面に炉心管が浮いてアームに対して移動したりす
ることはない。したがつて、エツチング、洗浄の
均一性が保たれる。 In addition, since the structure allows the core tube to be tilted appropriately when immersing it in the liquid, air bubbles may remain inside the tube during immersion, or the core tube may float on the liquid surface and cause the arm to immerse. It will not move against you. Therefore, the uniformity of etching and cleaning can be maintained.
以上のように、本発明の洗浄方法によれば、洗
浄が充分でかつ作業能率を高くできる。 As described above, according to the cleaning method of the present invention, sufficient cleaning can be performed and work efficiency can be increased.
第1図および第2図は炉心管洗浄装置の一部説
明図であつて、第1図は洗浄動作を示す動作図、
第2図は第3洗浄槽における炉心管内外の洗浄状
態を示す一部断面図である。第3図〜第5図およ
び第7図は本発明に対する参考例を示す図であ
り、第6図は本発明の実施例を示す図である。
1……第1洗浄槽、2……第2洗浄槽、3……
第3洗浄槽、4……炉心管、5……ローラ、6…
…噴射管、7……アーム、8……エツチング液、
9……洗浄液、10……細部管(枝管)、11…
…回転ジヨイント、12……純水供給管、13…
…底板、14……連結軸、15……カバー、16
……モータ、17……回転軸、18……カツプリ
ング、19……純水噴射機構、20……ジエツト
ノズル、21……供給管、22……首振部、23
……レール、24……可動箱、25……車輪、2
6……昇降板、27……ガイド、28……ねじ
棒、29……カツプリング、30……天井板、3
1……支持板、32……昇降用モータ、33……
回転軸、34……排水口。
1 and 2 are partial explanatory diagrams of the core tube cleaning device, and FIG. 1 is an operational diagram showing the cleaning operation;
FIG. 2 is a partial sectional view showing the state of cleaning inside and outside the reactor core tube in the third cleaning tank. 3 to 5 and 7 are diagrams showing reference examples of the present invention, and FIG. 6 is a diagram showing an embodiment of the present invention. 1...First cleaning tank, 2...Second cleaning tank, 3...
Third cleaning tank, 4... Core tube, 5... Roller, 6...
...Injection pipe, 7...Arm, 8...Etching liquid,
9...Cleaning liquid, 10...Detail pipe (branch pipe), 11...
...Rotating joint, 12...Pure water supply pipe, 13...
...Bottom plate, 14...Connection shaft, 15...Cover, 16
... Motor, 17 ... Rotating shaft, 18 ... Coupling, 19 ... Pure water injection mechanism, 20 ... Jet nozzle, 21 ... Supply pipe, 22 ... Oscillating part, 23
...Rail, 24...Movable box, 25...Wheel, 2
6... Elevating plate, 27... Guide, 28... Threaded rod, 29... Coupling, 30... Ceiling plate, 3
1... Support plate, 32... Lifting motor, 33...
Rotating shaft, 34...Drain port.
Claims (1)
炉心管を洗浄する炉心管の洗浄方法において、前
記炉心管の一の端部近傍および他の一の端部近傍
をそれぞれ第一および第二の支持体で支持し、前
記第一および第二の支持体により前記炉心管を前
記液体槽の液面近傍まで移動し、前記第一の支持
体を降下させることにより前記炉心管の一の端部
を前記液体槽の液中へ部分的に浸漬し、その状態
を保つて前記第二の支持体を降下させることによ
り前記炉心管の他の一の端部を前記液体槽の液中
へ全面的に浸漬し、その状態を保つて前記第一の
支持体を降下させ、それにより前記液体槽の液中
へ部分的に浸漬した前記炉心管の一の端部を前記
液体槽の液中へ全面的に浸漬することを特徴とす
る炉心管の洗浄方法。 2 前記液体はエツチング液であることを特徴と
する特許請求の範囲第1項記載の炉心管の洗浄方
法。[Scope of Claims] 1. A method for cleaning a furnace core tube in which the furnace core tube is cleaned by immersing the furnace core tube in a liquid tank containing a liquid, wherein the furnace core tube is cleaned near one end and the other end. are supported by first and second supports, respectively, and the reactor core tube is moved to near the liquid level of the liquid tank by the first and second supports, and the first support is lowered. One end of the reactor core tube is partially immersed in the liquid of the liquid bath, and the other end of the reactor core tube is lowered by lowering the second support while maintaining that state. lowering the first support while fully immersed in the liquid of the liquid bath, thereby causing one end of the reactor core tube to be partially immersed in the liquid of the liquid bath; A method for cleaning a reactor core tube, comprising completely immersing it in the liquid in the liquid tank. 2. The method of cleaning a reactor core tube according to claim 1, wherein the liquid is an etching liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59222178A JPS6171880A (en) | 1984-10-24 | 1984-10-24 | How to clean the furnace core tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59222178A JPS6171880A (en) | 1984-10-24 | 1984-10-24 | How to clean the furnace core tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6171880A JPS6171880A (en) | 1986-04-12 |
| JPH0156147B2 true JPH0156147B2 (en) | 1989-11-29 |
Family
ID=16778386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59222178A Granted JPS6171880A (en) | 1984-10-24 | 1984-10-24 | How to clean the furnace core tube |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6171880A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5090756B2 (en) * | 2007-03-01 | 2012-12-05 | 株式会社フジクラ | Quartz tube cleaning equipment |
| JP5287173B2 (en) * | 2008-11-26 | 2013-09-11 | 三菱自動車工業株式会社 | Degreasing and cleaning device for vehicle body and cleaning method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4825614A (en) * | 1971-08-09 | 1973-04-03 |
-
1984
- 1984-10-24 JP JP59222178A patent/JPS6171880A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6171880A (en) | 1986-04-12 |
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