JPS604241B2 - Metal moldings for surface coating materials - Google Patents
Metal moldings for surface coating materialsInfo
- Publication number
- JPS604241B2 JPS604241B2 JP52029250A JP2925077A JPS604241B2 JP S604241 B2 JPS604241 B2 JP S604241B2 JP 52029250 A JP52029250 A JP 52029250A JP 2925077 A JP2925077 A JP 2925077A JP S604241 B2 JPS604241 B2 JP S604241B2
- Authority
- JP
- Japan
- Prior art keywords
- chromium
- metal
- surface coating
- solution
- molded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 本発明は表面被覆材に用いる金属の成型体に関する。[Detailed description of the invention] The present invention relates to a metal molded body used as a surface covering material.
更に詳しくは乾式メッキで表面被覆材に用いる高純度金
属成型体及びその製造法に関する。More specifically, the present invention relates to a high-purity metal molded body used as a surface coating material by dry plating and a method for producing the same.
近年、環境汚染の面から特に六価クロムなどを用いる湿
式メッキ法に代替するメッキ法として、電子ビームを用
いる真空蒸着法又はイオンプレーティング法、更にスパ
ッタリング法などの物理的な手段による表面被覆法、い
わゆる乾式メッキ法が注目されている。この様な乾式メ
ッキ法は、被メッキ物表面に付着させる金属を粉末状の
ま〉、又は棒状、板状に成型したもの(以下これらをタ
ーゲットと称す)に熱的又は電気的なエネルギーを加え
て、金属をイオン化し、又は原子状で飛散させて被メッ
キ物表面に付着させる方法で、近時工業機械、装飾物、
電子工業部品、更にプラスチックなどの表面被覆に利用
されつつある。In recent years, surface coating methods using physical means such as vacuum evaporation or ion plating methods using electron beams, and sputtering methods have been introduced as plating methods to replace wet plating methods that use hexavalent chromium in particular due to environmental pollution. The so-called dry plating method is attracting attention. In this dry plating method, thermal or electrical energy is applied to the metal to be adhered to the surface of the object to be plated, either in powder form, or in the form of a rod or plate (hereinafter referred to as target). This is a method of ionizing metal or scattering it in atomic form and attaching it to the surface of the object to be plated.
It is increasingly being used for electronic industry parts and for surface coatings such as plastics.
本発明者らは、乾式メッキ、特にスパッタリング法で用
いられるターゲットの成型について従来から研究を続け
ているが、成型する金属の粉末をある条件下に加圧する
ことによりターゲットとして用いる上で極めて良好な金
属成型体を得ることを見出.した。The present inventors have been conducting research on the molding of targets used in dry plating, especially sputtering methods, and found that by pressurizing the metal powder to be molded under certain conditions, it is extremely suitable for use as a target. Discovered that it was possible to obtain a metal molded body. did.
乾式メッキにおいてメッキ膜の形成に用いられる金属は
、Au,Ag,Ptを始め、Zn,Cd,W,Ti,C
u,Ni,Mn,Crなどであるが、これらの内Crは
、これを被覆した表面の耐摩耗性又は化学的抵抗力が極
めて優れているので、工業機械部品及び電子工業部品の
メッキに多用されている。The metals used to form plating films in dry plating include Au, Ag, and Pt, as well as Zn, Cd, W, Ti, and C.
Cr, Ni, Mn, Cr, etc. Among these, Cr is widely used for plating industrial machinery parts and electronic parts because the surface coated with it has extremely excellent wear resistance or chemical resistance. has been done.
特に電子工業部品のメッキに用いられるものは、高純度
の金属が必要とされる。高純度金属例えば高純度金属ク
ロムを得るには、クロム塩溶液の電気的分解、いわゆる
電解で得る方法、クロム塩溶液をある種の有機溶媒を用
いて抽出精製し、精製クロム塩溶液を、又はこの溶液か
ら得たクロム塩を酸化し、次いで環元して金属クロムを
得る方法、更にクロム酸又は無水クロム酸を焔焼し、次
いで環元して得る方法などがある。Particularly those used for plating electronic industrial parts require high purity metals. In order to obtain high-purity metals such as high-purity chromium metal, a chromium salt solution can be obtained by electrolysis, so-called electrolysis, a chromium salt solution is extracted and purified using a certain type of organic solvent, and a purified chromium salt solution is obtained, or There are methods such as oxidizing the chromium salt obtained from this solution and then ringing to obtain metallic chromium, and further burning chromic acid or chromic acid anhydride and then ringing.
.本発明では、上記したいず
れの金属も、又いずれの方法で得たものも用いることが
出来る。.. In the present invention, any of the metals mentioned above and those obtained by any of the methods can be used.
本発明では、前記した有機溶媒を用いて抽出精製して得
た金属クロムが特に好ましい。溶媒抽出に用いる溶媒は
、抽出の対象となる金属の種類によって、適宜さめる。In the present invention, metallic chromium obtained by extraction and purification using the above-mentioned organic solvent is particularly preferred. The solvent used for solvent extraction is appropriately cooled depending on the type of metal to be extracted.
例えば、鉄、モリブデン等は、トリオクチルフオスフエ
ート、トリブチルフオスフエート、ジー2−エチルヘキ
シルリン酸等のリン化合物、コバルト等は、トリノルマ
ルオクチルアミン、トリィソオクチルアミントルカプリ
ルアミン等のアミン類を用いる。For example, iron, molybdenum, etc. are phosphorus compounds such as trioctyl phosphate, tributyl phosphate, di-2-ethylhexyl phosphate, etc., and cobalt, etc. are amines such as tri-normaloctylamine, trisooctylamine tolcaprylamine, etc. Use.
この様な溶媒を用いてクロムと共存する金属類を除去す
ることにより極めて高純度のクロムを含む溶液が得られ
る。従って、この溶液を用いて酸化、環元処理により金
属化したクロム粉末は純度が高く良好なターゲットとな
る。By removing metals coexisting with chromium using such a solvent, a solution containing extremely high purity chromium can be obtained. Therefore, chromium powder metallized by oxidation and ring treatment using this solution has high purity and becomes a good target.
特に金属クロムターゲットを得る場合、金属クロムは硬
く且つ脆いので、インゴツトを切削して所望の成形体を
得ることは極めて困難である。又、電解で金属クロムを
得る際電極板から剥離した金属クロムは一応成型体状を
保っているが、必要な厚さ及び大きさのものを常時得る
ことが出来ない。本発明は金属粉末を加圧して成型する
ことが特徴である。金属粉末の加圧成型は、{1ー熱加
圧、いわゆるホットプレス、■筒状物に金属粉末を充填
し、上下、あるいは左右からピストンで圧縮する機械的
な加圧、更に【3}ゴムの袋状物に金属粉末を封入して
、耐圧容器に満した水中に入れ、容器に水を圧入して加
圧するいわゆるラバープレスなどの方法で行うことが出
来る。Particularly when obtaining a metallic chromium target, since metallic chromium is hard and brittle, it is extremely difficult to cut an ingot to obtain a desired molded body. Furthermore, when metallic chromium is obtained by electrolysis, the metallic chromium peeled off from the electrode plate retains the shape of a molded body, but it is not always possible to obtain the required thickness and size. The present invention is characterized in that metal powder is pressurized and molded. Pressure molding of metal powder is performed by {1-heat pressing, so-called hot press, ■mechanical pressurization in which a cylindrical object is filled with metal powder and compressed with a piston from the top and bottom or from the left and right, and [3} rubber. This can be done by a method such as a so-called rubber press, in which metal powder is sealed in a bag-like material, placed in water filled with a pressure-resistant container, and water is pressurized into the container.
しかし{1)の方法で得たものは必然的に高価なものと
なり、又‘2}の方法は厚さが大きい成型体を得る際、
成型体にラミネーションが生じたり、得られた成型体を
加熱した際ひび割れが生じたりするので好ましい方法で
はない。However, the product obtained by the method {1) is inevitably expensive, and the method '2} is expensive when obtaining a molded product with a large thickness.
This is not a preferred method because lamination may occur in the molded product or cracks may occur when the resulting molded product is heated.
本発明では【3}の加圧方法が好ましい。In the present invention, the pressurizing method [3] is preferred.
‘3丁の方法では、金属粉末を封入するゴムなどの袋状
物の型状を適宜選ぶことにより所望の型状の成型体が得
られ又、成形体全体に均氏がかかるので極めて密な又、
熱的にも安定した成型体が得られる。In the 3-piece method, a molded body of the desired shape can be obtained by appropriately selecting the shape of the bag-like material such as rubber that encloses the metal powder, and since the entire molded body is coated with heat, it is extremely dense. or,
A thermally stable molded body can be obtained.
又、成型の際高純度金属を用いると高純度金属の持つ延
性の為に極めて成型性が好い。Furthermore, when a high purity metal is used during molding, the moldability is extremely good due to the ductility of the high purity metal.
前記した{3’の加圧方法、すなわちラバープレス法の
加圧圧力は、加圧成型する金属の種類によっても異なる
が、500〜5500k9/めである。The pressurizing pressure of the above-mentioned pressurizing method {3', that is, the rubber press method, varies depending on the type of metal to be press-molded, but is 500 to 5,500 k9/m.
又、加圧時間は、特に制限されないが、5〜120分行
えば充分である。又、特にスパッタリングに用いるター
ゲットは、これに酸素が混在すると、これを用いてメッ
キを行う際、被メッキ物の被覆表面の酸化が起り、好ま
しい表面が得られない。Further, the pressurization time is not particularly limited, but 5 to 120 minutes is sufficient. Further, especially when a target used for sputtering contains oxygen, when plating is performed using the target, oxidation of the coated surface of the object to be plated occurs, making it impossible to obtain a desirable surface.
従って、ターゲットを成型する際、必要に応じて脱ガス
した金属粉末を用いることが好ましい。Therefore, when molding the target, it is preferable to use degassed metal powder as necessary.
金属の脱ガスは、環元雰囲気中で金属を加熱するなどの
通常の方法で行なう。勿論成型後、金属成型体を前記し
たような操作で脱ガスすることも出釆る。The metal is degassed by a conventional method such as heating the metal in a cyclic atmosphere. Of course, after molding, the metal molded body may be degassed by the operations described above.
加圧成型して得た成型体は、暁結、研磨などの後処理を
して製品とする。The molded body obtained by pressure molding is subjected to post-processing such as forming and polishing to produce a product.
本発明は、高純度で、且つ堅固な乾式メッキ用のターゲ
ットを得ることが出来る、又得られたターゲットは特に
スパッタリング用として極めて好ましいものである。According to the present invention, it is possible to obtain a highly pure and strong target for dry plating, and the obtained target is particularly suitable for use in sputtering.
次に実施例で本発明を詳述する。Next, the present invention will be explained in detail with reference to Examples.
実施例 1
61.6%のCrを含むフェロクロムを塩素化して得た
塩化クロム、塩化鉄溶液に塩素ガスを通じて鉄イオンを
三価の鉄イオンとし次いで回転円板式向流抽出装置(4
段)を用いてトルオクチルフオースクェートーケロシン
溶液と向流接触させて塩化鉄を除去し、精製塩化クロム
溶液を得た。Example 1 Chromium chloride obtained by chlorinating ferrochrome containing 61.6% Cr, chlorine gas was passed through an iron chloride solution to convert iron ions into trivalent iron ions, and then a rotating disk type countercurrent extraction device (4
The iron chloride was removed by countercurrent contact with the toluoctyl phosphate kerosene solution using a chromium chloride solution.
次いで該塩化クロム溶液を更にミキサーセトラー向流抽
出装置(2段)を用いトリノルマルオクチルアミンーキ
シレン溶液と接触させて精製し、該溶液を水素を燃焼さ
せた炉内に滴下し贋霧時擬して酸化クロムを得、更にこ
れを炭素を用いて約1400qoで真空還元して更に水
素気流中約1500℃で還元し純度99.97%(CO
.01%,Feo.01%その他0.01%)の金属ク
ロム粉末(20メッシュ以下)を得た。この金属.クロ
ム粉末を概ね厚さ10の/肌、直径200仇/肌の型状
のゴム袋に充填し、水を封入した約0.5あの耐圧容器
に入れ、水を容器に圧入して4000k9/地とし5分
間置いた。加圧後ゴム袋から取出した成型体は見掛密度
6.2夕/塊であった。Next, the chromium chloride solution was further purified by contacting it with a tri-n-octylamine-xylene solution using a mixer-settler countercurrent extraction device (two stages), and the solution was dropped into a furnace in which hydrogen was burned to simulate a forgery. This was further reduced in vacuum using carbon at about 1400 qo and further reduced at about 1500°C in a hydrogen stream to obtain a purity of 99.97% (CO
.. 01%, Feo. A metal chromium powder (20 mesh or less) containing 0.01% and 0.01% of others was obtained. This metal. Fill a chromium powder into a rubber bag with a thickness of approximately 10 mm and a diameter of 200 mm, place it in a pressure-resistant container of approximately 0.5 mm filled with water, and press the water into the container to make a 4000 k9/cm. and left for 5 minutes. The molded product taken out from the rubber bag after pressurization had an apparent density of 6.2 min/lump.
この成型体を水素気流中1600qoで2時間暁緒を行
なったが、“われ”は生ぜず、堅固なものであつた。This molded product was incubated for 2 hours at 1,600 qo in a hydrogen stream, but no cracks were formed and it remained solid.
実施例1で得た成型体は、旋盤で表面を切削研摩し、真
鈴表面のスパッタリングによる表面被覆用のターゲット
として用いたところ、美麗な被覆表面を得た。The surface of the molded body obtained in Example 1 was cut and polished using a lathe, and when used as a target for surface coating by sputtering on the surface of Marin, a beautiful coated surface was obtained.
Claims (1)
れたクロム塩溶液又は該溶液から得たクロム塩を酸化し
、得たクロム酸化物を環元して得た高純度金属クロムを
加圧成型した、スパツタリング蒸着、イオン蒸着又は電
子蒸着による表面被覆用クロム成型体。 2 脱ガス処理した金属クロムを成型した特許請求の範
囲第1項記載の成型体。 3 ラバープレス法で成型した特許請求の範囲第1又は
2項記載の成型体。[Claims] 1. A chromium salt solution obtained by extracting and purifying a solution containing a chromium salt with an organic solvent, or by oxidizing the chromium salt obtained from the solution and ring-forming the obtained chromium oxide. A chromium molded body for surface coating by pressure molding of high-purity metallic chromium using sputtering vapor deposition, ion vapor deposition, or electronic vapor deposition. 2. The molded article according to claim 1, which is made of degassed metal chromium. 3. The molded article according to claim 1 or 2, which is molded by a rubber press method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52029250A JPS604241B2 (en) | 1977-03-18 | 1977-03-18 | Metal moldings for surface coating materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52029250A JPS604241B2 (en) | 1977-03-18 | 1977-03-18 | Metal moldings for surface coating materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53114739A JPS53114739A (en) | 1978-10-06 |
| JPS604241B2 true JPS604241B2 (en) | 1985-02-02 |
Family
ID=12271010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52029250A Expired JPS604241B2 (en) | 1977-03-18 | 1977-03-18 | Metal moldings for surface coating materials |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS604241B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61221361A (en) * | 1985-03-26 | 1986-10-01 | Mitsubishi Metal Corp | Chromium target for sputtering |
| JPS62260056A (en) * | 1986-05-07 | 1987-11-12 | Hitachi Metals Ltd | Chromium target member |
| JP2667309B2 (en) * | 1991-06-28 | 1997-10-27 | 株式会社リケン | Abrasion resistant film formation method by HCD ion plating |
| JP2604940B2 (en) * | 1992-05-19 | 1997-04-30 | 株式会社リケン | Evaporating material for ion plating |
-
1977
- 1977-03-18 JP JP52029250A patent/JPS604241B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53114739A (en) | 1978-10-06 |
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