JPS6046098B2 - Method for producing cyclohexylbenzene - Google Patents
Method for producing cyclohexylbenzeneInfo
- Publication number
- JPS6046098B2 JPS6046098B2 JP58073571A JP7357183A JPS6046098B2 JP S6046098 B2 JPS6046098 B2 JP S6046098B2 JP 58073571 A JP58073571 A JP 58073571A JP 7357183 A JP7357183 A JP 7357183A JP S6046098 B2 JPS6046098 B2 JP S6046098B2
- Authority
- JP
- Japan
- Prior art keywords
- catalyst
- cyclohexylbenzene
- acid
- alumina
- benzene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- HHNHBFLGXIUXCM-GFCCVEGCSA-N cyclohexylbenzene Chemical compound [CH]1CCCC[C@@H]1C1=CC=CC=C1 HHNHBFLGXIUXCM-GFCCVEGCSA-N 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 54
- 239000003054 catalyst Substances 0.000 claims description 32
- 238000006243 chemical reaction Methods 0.000 claims description 26
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 239000011964 heteropoly acid Substances 0.000 claims description 10
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 claims description 10
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 239000002274 desiccant Substances 0.000 claims description 8
- 239000012024 dehydrating agents Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 6
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 claims description 6
- 239000000741 silica gel Substances 0.000 claims description 6
- 229910002027 silica gel Inorganic materials 0.000 claims description 6
- 239000005909 Kieselgur Substances 0.000 claims description 5
- 229910021536 Zeolite Inorganic materials 0.000 claims description 5
- 229910052763 palladium Inorganic materials 0.000 claims description 5
- 239000010457 zeolite Substances 0.000 claims description 5
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 239000010948 rhodium Substances 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 description 25
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000005984 hydrogenation reaction Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000002808 molecular sieve Substances 0.000 description 6
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 101150000971 SUS3 gene Proteins 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium chloride Substances Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- -1 organic acid salts Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【発明の詳細な説明】
本発明はベンゼンを水素化縮合することによりシクロヘ
キシルベンゼンを製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing cyclohexylbenzene by hydrogenation condensation of benzene.
従来、シクロヘキシルベンゼンの製造方法としては、第
8族金属を固体酸系担体(シリカアルミナまたはH型ゼ
オライト)に担持した触媒を用いる方法(J、Cata
1ysisU、385(1969)、石油誌川(1)、
25(1976)や特開昭53−108952)、また
、担持パラジウムと熔融塩(NaCl−AlCl3)を
触媒に用いる方法(Chem、Pharm、Bull、
29(1)、15(1981)が知られている。Conventionally, as a method for producing cyclohexylbenzene, a method using a catalyst in which a Group 8 metal is supported on a solid acid support (silica alumina or H-type zeolite) (J, Catalyst) has been used.
1ysisU, 385 (1969), Yukishikawa (1),
25 (1976) and JP-A-53-108952), and methods using supported palladium and molten salt (NaCl-AlCl3) as catalysts (Chem, Pharm, Bull,
29(1), 15 (1981) is known.
さらに、水素化触媒、^ 、、T■ムJ−、ムiLL゛
、ド1↓れ、J−hJ、相オア 口1を、フHす法(U
、S、P、3153678)もある。しかし、これら触
媒活性は低く、ベンゼン転化率を高めるためには長時間
の反応を必要とするとか、あるいは、生成したシクロヘ
キシルベンゼンがさらにアルキル化されてシンクロヘキ
シルペンテン等(Cls)を多量に生成するなど、工業
的なシクロヘキシルベンゼンの製造方法としては満足す
べき方法とは言えない。本発明者らは、先に、ベンゼン
の水素化縮合によるシクロヘキシルベンゼンの製造方法
の欠色を克服するため、種々検討を重ねた結果、けいタ
ングステン酸、りんタングステン酸およびりんモリブデ
ン酸の内から選ばれた少くとも一種のヘテロポリ酸とニ
ッケル、パラジウムおよびルテニウムの内から選ばれた
少くとも一種の金属またはその化合物を触媒に用いると
共に、脱水乾燥剤を加えることにより、きわめて容易に
、しかも、C、8の化合物の生成を抑えて、高選択率で
シクロヘキシルベンゼンを製造し得ることを見出し、特
許出願ノ(特開昭59−5130)し、さらに、改良を
重ねて、上記触媒二成分(前記ヘテロポリ酸と前記金属
もしくはその化合物)をシリカゲルに担持した触媒を用
いる方法を発明し、特許出願(特開昭59一13742
6)した。Furthermore, the hydrogenation catalyst, ^,, T■muJ-,muiLL゛, do1↓re, J-hJ, phase or mouth 1, the method of fusing (U
, S, P, 3153678). However, the activity of these catalysts is low, and a long reaction time is required to increase the benzene conversion rate, or the cyclohexylbenzene produced is further alkylated to produce a large amount of synchlorohexylpentene (Cls). This cannot be said to be a satisfactory method for industrially producing cyclohexylbenzene. In order to overcome the defects in the production method of cyclohexylbenzene by hydrogenation condensation of benzene, the present inventors have previously conducted various studies, and as a result, selected silicotungstic acid, phosphotungstic acid, and phosphomolybdic acid. By using at least one type of heteropolyacid and at least one metal selected from nickel, palladium, and ruthenium as a catalyst and adding a dehydrating and drying agent, C, It was discovered that cyclohexylbenzene could be produced with high selectivity while suppressing the formation of compound No. He invented a method using a catalyst in which an acid and the above-mentioned metals or their compounds were supported on silica gel, and filed a patent application (Japanese Patent Application Laid-Open No. 59-13742).
6) I did.
その後、触媒の調製法について検;討を重ねた結果、通
常水素化触媒に用いられるアルミナ、ケイソウ土、活性
炭担体に、上記金属成分を担持した後に、ヘテロポリ酸
を担持する等、調製法を工夫すれば、シリカゲル以外の
担体でも、通常水素化触媒に用いられる担体は使用出来
、従つて、触媒の調製が著しく簡単で、且つ、取扱いが
容易なシクロヘキシルベンゼンの製造方法を見出した。
本発明はこの知見に基づいてなされるに至つたものであ
る。けいタングステン酸、りんタングステン酸およびり
んモリブデン酸の内から選ばれた少くとも一種のヘテロ
ポリ酸と、ニッケル、ルテニウム、ロジウム、パラジウ
ムおよび白金の内から選ばれた少くとも一種の金属(第
8族金属)またはその化合物を、アルミナ、ケイソウ土
、活性炭などの担体に担持した触媒の存在下に、ベンゼ
ンを水素化縮合するにあたり、反応系にゼオライト、シ
リカゲルおよびアルミナの内から選ばれた少くとも一種
の脱水乾燥剤を存在させることを特徴とするシクロヘキ
シルベンゼンの製造方法を提供するものである。Subsequently, as a result of repeated discussions on catalyst preparation methods, we devised a preparation method, such as supporting the above-mentioned metal components on alumina, diatomaceous earth, or activated carbon carriers, which are usually used in hydrogenation catalysts, and then supporting the heteropolyacid. As a result, we have found a method for producing cyclohexylbenzene that allows use of carriers other than silica gel that are normally used for hydrogenation catalysts, and therefore allows for extremely simple preparation of the catalyst and ease of handling.
The present invention has been made based on this knowledge. At least one heteropolyacid selected from silicotungstic acid, phosphotungstic acid, and phosphomolybdic acid; and at least one metal selected from nickel, ruthenium, rhodium, palladium, and platinum (Group 8 metal). ) or its compound supported on a carrier such as alumina, diatomaceous earth, or activated carbon.When hydrogenating and condensing benzene, at least one selected from zeolite, silica gel, and alumina is added to the reaction system. The present invention provides a method for producing cyclohexylbenzene characterized by the presence of a dehydrating and drying agent.
本発明方法の触媒は、種々の方方法に従つて調製出来る
が、代表的な例としては、市販の水素化触媒、または前
記第8族金属を水または酢酸等の溶媒に溶解もしくは懸
濁させた液に、前記担体物質を浸漬することにより金属
成分を担体上に付着せしめ、乾燥し、高温で水素化する
た、あるいは、熱分解などの手段により水素化活性を持
たせた触媒を、前記ヘテロポリ酸の溶液に浸漬すること
により、該ヘテロポリ酸成分を触媒上に付着せしめ、乾
燥し、不活性ガス中で焼成する方法があ.る。The catalyst of the present invention can be prepared according to various methods, but typical examples include commercially available hydrogenation catalysts, or dissolving or suspending the Group 8 metal in a solvent such as water or acetic acid. The metal component is deposited on the carrier by immersing the carrier material in the solution, dried, and hydrogenated at high temperature. There is a method in which the heteropolyacid component is deposited on the catalyst by immersion in a solution of the heteropolyacid, dried, and then calcined in an inert gas. Ru.
焼成温度としては、200〜600゜Cが用いられ、好
ましくは250〜500℃である。触媒成分の内、ヘテ
ロポリ酸としては、けいタングステン酸、りんタングス
テン酸がよい。The firing temperature used is 200 to 600°C, preferably 250 to 500°C. Among the catalyst components, silicotungstic acid and phosphotungstic acid are preferable as the heteropolyacid.
本触媒系において、前記ヘテロポリ酸の存在がシクロ、
ヘキシルベンゼンの生成に必須であることは、比較例2
から明らかである。該ヘテロポリ酸の濃度としては、担
体によつて著しく異なるが、担体重量の1〜200%の
範囲が用いられ、好ましくは5〜150%である。前記
第8族金属成分は、ギ酸、酢酸等の有機酸塩、炭酸塩、
硝酸塩、塩化物、水酸化物等の形で加えることが出来、
その他の化合物でも、触媒調製液に溶解するか、懸濁す
るものは使用出来る。In this catalyst system, the presence of the heteropolyacid is cyclo,
Comparative Example 2 is essential for the production of hexylbenzene.
It is clear from this. The concentration of the heteropolyacid varies significantly depending on the carrier, but is used in the range of 1 to 200% of the carrier weight, preferably 5 to 150%. The Group 8 metal component includes organic acid salts such as formic acid and acetic acid, carbonates,
Can be added in the form of nitrates, chlorides, hydroxides, etc.
Other compounds can also be used as long as they are dissolved or suspended in the catalyst preparation solution.
さらに、これら金属の活性を制御するため、他の金属と
共に担持してもよい。この第8族金属化合物の濃度は、
担持金属の種類によつて著しく異なるが、担体重量の0
.05〜50%の範囲が用いられ、好ましくは0.1〜
30%である。ベンゼンの水素化活性が大きい貴金属を
用いる場合は、その担持濃度を下げ、前記ヘテロポリ酸
濃度を高めることが、シクロヘキシルベンゼンの選択率
を向上させるために好ましい。ノ 本発明の方法を実施
する場合、まず反応系に前記の脱水・乾燥剤を添加する
。Furthermore, in order to control the activity of these metals, they may be supported together with other metals. The concentration of this Group 8 metal compound is
Although it varies significantly depending on the type of supported metal, the weight of the support is 0.
.. A range of 0.05 to 50% is used, preferably 0.1 to 50%.
It is 30%. When using a noble metal having a high benzene hydrogenation activity, it is preferable to lower the supported concentration and increase the heteropolyacid concentration in order to improve the selectivity of cyclohexylbenzene. When carrying out the method of the present invention, first the above-mentioned dehydrating/desiccating agent is added to the reaction system.
この場合、脱水・乾燥剤に接触させたベンゼンを用いて
もよい。例えば、Pd−アルミナだけを前記担体に担持
させた触媒とゼオライトで反応を行つても、シクロへ、
キシルベンゼンは生成しない(比較例2)が、けいタン
グステン酸とPd−アルミナを前記担体に担持した触媒
と、ゼオライト等の脱水・乾燥剤を共存させると、シク
ロヘキシルベンゼンの収率、選択率を著しく向上させ得
る(実施例1と比較例1の比較)。脱水・乾燥剤として
は、工業的に乾燥剤として用いられるものはいずれも用
いられるが、モレキユラー●シーブ10×、13×、シ
リカゲル、アルミナゲルがよい。使用量は0.05〜5
g/20gベンゼンの範囲が適当であり、0.1〜2g
/20gベンゼンが好ましい。本発明の方法は無溶媒で
も溶媒中でも行われ得る。In this case, benzene brought into contact with a dehydrating/desiccating agent may be used. For example, even if a reaction is carried out with a catalyst in which only Pd-alumina is supported on the carrier and zeolite,
Although xylbenzene is not produced (Comparative Example 2), when a catalyst in which silicotungstic acid and Pd-alumina are supported on the carrier is coexisting with a dehydrating/desiccating agent such as zeolite, the yield and selectivity of cyclohexylbenzene are significantly increased. (Comparison of Example 1 and Comparative Example 1). As the dehydrating/desiccating agent, any desiccant used industrially can be used, but Molecular Sieve 10x, 13x, silica gel, and alumina gel are preferred. The amount used is 0.05-5
g/20g benzene range is suitable, 0.1-2g
/20g benzene is preferred. The method of the invention can be carried out without or in a solvent.
シクロヘキサン等の反応に不活性な溶媒はいずれも用い
られる。原料のベンゼンは出来る限り水分含量の少いも
のが望ましい。本発明の方法において、反応温度は通常
50〜300℃、好ましくは100〜250℃であり、
反応水素圧は1〜300k9/Cltl好ましくは10
〜150k9/Criである。Any solvent inert to the reaction, such as cyclohexane, can be used. It is desirable that the raw material benzene has as little water content as possible. In the method of the present invention, the reaction temperature is usually 50 to 300°C, preferably 100 to 250°C,
The reaction hydrogen pressure is 1 to 300k9/Cltl, preferably 10
~150k9/Cri.
反応温度が低いとシクロヘキサンの選択率が高くなり、
また反応温度が高すぎると、反応生成物の分解が起つて
不利である。次に、本発明を実施例に基づき、さらに詳
細に説明する。The lower the reaction temperature, the higher the selectivity of cyclohexane;
Moreover, if the reaction temperature is too high, decomposition of the reaction products will occur, which is disadvantageous. Next, the present invention will be explained in more detail based on examples.
実施例1
けいタングステン酸0.275g(110℃で恒量にな
るまで乾燥した試薬を用いた)を水に溶解し、これに市
販の0.5%Pd−アルミナ(日本エンゲルハルド社製
、球状)1gを加え、3紛間攪拌し、ロータリー●バキ
ューム●エバポレーターで水分を蒸発させ、110℃で
乾燥した後、ガラス管に移し、窒素気流中、325℃で
3紛間乾燥させて触媒を調製した。Example 1 0.275 g of silicotungstic acid (using a reagent dried to a constant weight at 110°C) was dissolved in water, and commercially available 0.5% Pd-alumina (manufactured by Nippon Engelhard Co., Ltd., spherical) was dissolved in water. 1 g was added, the powder was stirred for three times, the water was evaporated using a rotary vacuum evaporator, the water was dried at 110°C, the powder was transferred to a glass tube, and the three powders were dried at 325°C in a nitrogen stream to prepare a catalyst. .
この触媒0.5gを、ガス導入口、圧力計、温度計挿入
管を備えた内容積80m1(7)SUS3托製オートク
レーブにベンゼン20g1モレキユラー●シーブ13×
(1/16ペレット)1gとテフロンコート攪拌子と共
に入れ、内部を窒素で置換した後、水素ガスを室温で5
0kg/dまで圧入した。0.5 g of this catalyst was placed in a 80 m1 (7) SUS3 autoclave with an internal volume equipped with a gas inlet, a pressure gauge, and a thermometer insertion tube, with 20 g of benzene, 1 molecular sieve, and 13 x
(1/16 pellets) and a Teflon-coated stirring bar, and after replacing the inside with nitrogen, hydrogen gas was added at room temperature for 5 minutes.
It was press-fitted to 0 kg/d.
マグネチツク・スターラーで攪拌しながら、反応温度2
00℃まで加熱した。反応温度到達時をもつて反応開始
とした。反応時間87分後、シクロヘキシルベンゼン4
.90g1シクロヘキサン0.71gを得た。Cl8化
合物の生成はこん跡であつた。比較例1
実施例1の方法でモレキユラー・シーブ13×だけを除
いて7吟間反応させ、シクロヘキシルベンゼン3.21
g1シクロヘキサン1.42gを得た。While stirring with a magnetic stirrer, reduce the reaction temperature to 2.
It was heated to 00°C. The reaction was started when the reaction temperature was reached. After 87 minutes of reaction time, cyclohexylbenzene 4
.. 90g/0.71g of cyclohexane was obtained. There was no trace of Cl8 compound formation. Comparative Example 1 Using the method of Example 1 except for molecular sieve 13x, a reaction was carried out for 7 minutes, and cyclohexylbenzene 3.21
1.42 g of g1 cyclohexane was obtained.
比較例2実施例1でけいタングステン酸を担持させず、
市販の0.5%Pd−アルミナ0.5gをそのまま用い
、実施例1の反応条件で6紛間反応させ、シクロヘキサ
ン3.11gを得た。Comparative Example 2 In Example 1, silicotungstic acid was not supported,
Using 0.5 g of commercially available 0.5% Pd-alumina as it was, 6 powders were reacted under the reaction conditions of Example 1 to obtain 3.11 g of cyclohexane.
シクロヘキシルベンゼンの生成は認められなかつた。実
施例2
実施例1の方法で、けいタングステン酸0.35gを水
に溶解し、市販の0.5%Pt−アルミナ(日本エンゲ
ルハルド社製、ペレット状)1gを加え、実施例1の方
法に従い、窒素気流中、350′Cで1時間乾燥して調
製した触媒0.5gと、ベンゼン20g1モレキユラー
・シーブ13×0.5gを用い、実施例1の方法により
、反応温度210℃で42分間反応させ、シクロヘキシ
ルベンゼン3.30g1シクロヘキサン1.49gを得
た。No formation of cyclohexylbenzene was observed. Example 2 Using the method of Example 1, 0.35 g of silicotungstic acid was dissolved in water, and 1 g of commercially available 0.5% Pt-alumina (manufactured by Nippon Engelhard Co., Ltd., in pellet form) was added. According to the method of Example 1, using 0.5 g of a catalyst prepared by drying at 350'C for 1 hour in a nitrogen stream, 20 g of benzene, 13 x 0.5 g of molecular sieve, and a reaction temperature of 210 C for 42 minutes. The reaction yielded 3.30 g of cyclohexylbenzene and 1.49 g of cyclohexane.
実施例3
実施例1の方法により、りんタングステン酸0.275
gを水に溶解し、これに市販の0.5%Pd−アルミナ
球1gを加え、攪拌、乾燥してさらに、窒素気流中、3
75℃で3紛間乾燥した触媒0.5gと、ベンゼン20
g1モレキユラー●シーブ13×1.5gを用い、実施
例1の方法により反応温度205℃で、67分間反応さ
せ、シクロヘキシルベンゼン4.91g1シクロヘキサ
ン0.75gを得た。Example 3 By the method of Example 1, phosphotungstic acid 0.275
g in water, add 1 g of commercially available 0.5% Pd-alumina spheres, stir, dry and further dissolve in a nitrogen stream for 3
0.5 g of catalyst dried at 75°C and 20 g of benzene
Using 13 x 1.5 g of g1 molecular sieves, the reaction was carried out at a reaction temperature of 205° C. for 67 minutes according to the method of Example 1 to obtain 4.91 g of cyclohexylbenzene and 0.75 g of cyclohexane.
実施例4実施例1の方法により、けいタングステン酸1
.20gと市販の2%Pd一活性炭粒(日本エンゲルハ
ルド社製)1gとから調製した触媒0.125gと、モ
レキユラー●シーブ13×0.75g1ベンゼン20g
を用い、実施例1の方法により、反応温度220℃で9
0分間反応させ、シクロヘキシルベンゼン3.12g1
シクロヘキサン1.59gを得た。Example 4 By the method of Example 1, tungstic acid 1
.. 0.125 g of a catalyst prepared from 20 g of commercially available 2% Pd and 1 g of activated carbon particles (manufactured by Nippon Engelhard Co., Ltd.), and 20 g of Molecular Sieve 13 x 0.75 g and 1 benzene.
9 using the method of Example 1 at a reaction temperature of 220°C.
0 minute reaction, cyclohexylbenzene 3.12g1
1.59 g of cyclohexane was obtained.
実施例5
実施例1の方法により、けいタングステン酸0.25g
と、市販の0.5%Ru−アルミナ触媒(日本エンゲル
ハルド社製)1gとから調製した触媒0.5gと200
℃で乾燥したシリカゲル1.5g1ベンゼン20gを用
い、実施例1の方法により、反応温度225℃で、35
分間反応させ、シクロヘキシルベンゼン3.09g1シ
クロヘキサン1.75gを得た。Example 5 0.25 g of silicotungstic acid was prepared by the method of Example 1.
and 1 g of a commercially available 0.5% Ru-alumina catalyst (manufactured by Nippon Engelhard Co., Ltd.).
Using the method of Example 1 using 1.5 g of silica gel and 20 g of benzene dried at 35° C. at a reaction temperature of 225° C.
The reaction was carried out for 3.09 g of cyclohexylbenzene and 1.75 g of cyclohexane.
実施例6実施例1の方法により、りんタングステン酸0
.275gと市販の0.5%Rh−アルミナ触媒とから
調製した触媒0.5gと、450℃で乾燥したアルミナ
球(水沢化学製、ネオビードC−4)0.5g1ベンゼ
ン20gを用い、実施例1の方法により、反応温度21
5℃で27分間反応させ、シクロヘキシルベンゼン2.
67g1シクロヘキサン1.97gを得た。Example 6 By the method of Example 1, phosphotungstic acid 0
.. Example 1 Using 0.5 g of a catalyst prepared from 275 g and a commercially available 0.5% Rh-alumina catalyst, and 0.5 g of alumina spheres (Neobead C-4, manufactured by Mizusawa Chemical Co., Ltd.) dried at 450°C and 20 g of benzene. By the method of
After reacting at 5°C for 27 minutes, cyclohexylbenzene 2.
67g/1.97g of cyclohexane was obtained.
実施例1Ni(NO3)2・6H204.9533gを
水に溶解し、これにケイソウ土10gを加えて1時間攪
拌し、ロータリー●バキューム●エバポレーターで水分
を蒸発させ、ガラス管に移して300m1/Minの水
素気流中、450℃で1時間環元した触媒の内1gをけ
いタングステン酸0.5gの水溶液に入れ、実施例1の
方・法で攪拌、乾燥し、窒素気流中300℃て3紛間乾
燥して調製した触媒0.5gと450℃て乾燥したゼオ
ラムF9(東洋曹達製)0.5g1ベンゼン20gを入
れ、実施例1の方法により、反応温度195℃で、35
分間反応させ、シクロヘキシルベンゼン・3.71g1
シクロヘキサン1.23gを得た。Example 1 Dissolve 4.9533 g of Ni(NO3)2.6H in water, add 10 g of diatomaceous earth, stir for 1 hour, evaporate water using a rotary vacuum evaporator, transfer to a glass tube, and heat at 300 m1/min. 1 g of the catalyst ring-regenerated at 450°C for 1 hour in a hydrogen stream was added to an aqueous solution of 0.5 g of silicotungstic acid, stirred and dried according to the method of Example 1, and pulverized at 300°C in a nitrogen stream. 0.5 g of the dried catalyst and 0.5 g of Zeolum F9 (manufactured by Toyo Soda) dried at 450°C and 20 g of benzene were added, and the reaction temperature was 195°C according to the method of Example 1.
Cyclohexylbenzene・3.71g1
1.23 g of cyclohexane was obtained.
実施例8実施例7の方法で、Ni(NO3)2・6F[
204.9533gとIrc′4●H2OO.O458
gの水溶液にケイソウ土10gを加え、攪拌、乾燥、水
素化して調製した触ノ媒から1gを、りんモリブデン酸
0.6gの水溶液に加えて調製した触媒0.5gと、ゼ
オラムF9O.75glベンゼン20gを用い、実施例
1の方法により、反応温度200℃で3吟間反応させ、
シクロヘキシルベンゼン0.39g1シクロヘキサン2
.55gを得た。Example 8 Using the method of Example 7, Ni(NO3)2.6F[
204.9533g and Irc'4●H2OO. O458
0.5 g of a catalyst prepared by adding 1 g of a catalyst prepared by adding 10 g of diatomaceous earth to an aqueous solution of 1 g, stirring, drying, and hydrogenating it to an aqueous solution of 0.6 g of phosphomolybdic acid; Using 75 g and 20 g of benzene, the reaction was carried out according to the method of Example 1 at a reaction temperature of 200° C. for 3 minutes,
Cyclohexylbenzene 0.39g 1 cyclohexane 2
.. 55g was obtained.
Claims (1)
んモリブデン酸の内から選ばれた少くとも一種のヘテロ
ポリ酸と、ニッケル、ルテニウム、ロジウム、パラジウ
ムおよび白金の内から選ばれた少くとも一種の金属また
はその化合物を、アルミナ、ケイソウ土、活性炭などの
担体に担持した触媒の存在下にベンゼンを水素化縮合す
るにあたり、反応系にゼオライト、シリカゲルおよびア
ルミナの内から選ばれた少くとも一種の脱水乾燥剤を存
在させることを特徴とするシクロヘキシルベンゼンの製
造方法。1 At least one heteropolyacid selected from silicotungstic acid, phosphotungstic acid, and phosphomolybdic acid, and at least one metal selected from nickel, ruthenium, rhodium, palladium, and platinum or a compound thereof. When hydrogenating and condensing benzene in the presence of a catalyst supported on a carrier such as alumina, diatomaceous earth, or activated carbon, at least one dehydrating and drying agent selected from zeolite, silica gel, and alumina is present in the reaction system. A method for producing cyclohexylbenzene, characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58073571A JPS6046098B2 (en) | 1983-04-26 | 1983-04-26 | Method for producing cyclohexylbenzene |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58073571A JPS6046098B2 (en) | 1983-04-26 | 1983-04-26 | Method for producing cyclohexylbenzene |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59199641A JPS59199641A (en) | 1984-11-12 |
| JPS6046098B2 true JPS6046098B2 (en) | 1985-10-14 |
Family
ID=13522094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58073571A Expired JPS6046098B2 (en) | 1983-04-26 | 1983-04-26 | Method for producing cyclohexylbenzene |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6046098B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61186332A (en) * | 1985-02-12 | 1986-08-20 | Agency Of Ind Science & Technol | Production of cyclohexylbenzene |
| US8084648B2 (en) * | 2008-02-12 | 2011-12-27 | Exxonmobil Chemical Patents Inc. | Process for producing cyclohexylbenzene |
| CN114433231B (en) * | 2022-02-10 | 2023-04-21 | 北京化工大学 | Preparation method and application of polyacid-supported metal nickel hydroalkylation bifunctional catalyst |
-
1983
- 1983-04-26 JP JP58073571A patent/JPS6046098B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59199641A (en) | 1984-11-12 |
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