JPS6055965B2 - Manufacturing method of temperature sensor - Google Patents
Manufacturing method of temperature sensorInfo
- Publication number
- JPS6055965B2 JPS6055965B2 JP11056280A JP11056280A JPS6055965B2 JP S6055965 B2 JPS6055965 B2 JP S6055965B2 JP 11056280 A JP11056280 A JP 11056280A JP 11056280 A JP11056280 A JP 11056280A JP S6055965 B2 JPS6055965 B2 JP S6055965B2
- Authority
- JP
- Japan
- Prior art keywords
- temperature sensor
- film
- temperature
- manufacturing
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000000034 method Methods 0.000 claims description 15
- 229920001721 polyimide Polymers 0.000 claims description 15
- 239000004642 Polyimide Substances 0.000 claims description 11
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 11
- 239000011230 binding agent Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 239000004952 Polyamide Substances 0.000 claims description 4
- 229920002647 polyamide Polymers 0.000 claims description 4
- 239000004593 Epoxy Substances 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 3
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 claims description 2
- 229920000877 Melamine resin Polymers 0.000 claims description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000004962 Polyamide-imide Substances 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 2
- 229920002312 polyamide-imide Polymers 0.000 claims description 2
- 229920001021 polysulfide Polymers 0.000 claims description 2
- 239000005077 polysulfide Substances 0.000 claims description 2
- 150000008117 polysulfides Polymers 0.000 claims description 2
- 239000004814 polyurethane Substances 0.000 claims description 2
- 229920002635 polyurethane Polymers 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 230000004580 weight loss Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 229910052809 inorganic oxide Inorganic materials 0.000 description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- -1 poly(phenylene) Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920005596 polymer binder Polymers 0.000 description 2
- 239000002491 polymer binding agent Substances 0.000 description 2
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000002411 thermogravimetry Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Thermistors And Varistors (AREA)
Description
【発明の詳細な説明】
本発明は導電性有機物を利用した温度センサーの製造方
法に関し、特に芳香族ポリイミド樹脂を熱処理する事に
よつて、熱安定性にすぐれた線状、帯状または面状の温
度センサーを提供するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a temperature sensor using a conductive organic material, and in particular, by heat-treating an aromatic polyimide resin, a linear, band-like or planar shape with excellent thermal stability can be produced. It provides a temperature sensor.
従来、ある一点の温度検出をする場合の温度センサーと
しては、一般にサーミスタとよばれる無機の酸化物を用
いた温度センサーが広く使用されている。Conventionally, a temperature sensor using an inorganic oxide, generally called a thermistor, has been widely used as a temperature sensor for detecting the temperature at a certain point.
この無機酸化物による温度センサーは信頼性にすぐれて
いるので他の温度センサーの入り込む与地は少ない。し
力化ながら今日では単なる点温度の検出ではなく、面状
、線状あるいはさらに複雑な形状をした物体の温度を正
確に検出したいと言う要求が多くなつて来つつある。そ
の様な物体の温度検出には線状、面状の温度センサーが
必要である。しかし、前述の無機酸化物は線状、面状な
どの形状に加工しにくいため、この様な目的には不適当
である。一般的に温度センサーには次の様な特性が要求
される。This inorganic oxide temperature sensor has excellent reliability, so there is little room for other temperature sensors to be used. Today, there is an increasing demand for not only detecting point temperature but also accurately detecting the temperature of objects with planar, linear, or more complex shapes. Linear and planar temperature sensors are required to detect the temperature of such objects. However, the above-mentioned inorganic oxides are difficult to process into linear or planar shapes, and are therefore unsuitable for such purposes. Generally, temperature sensors are required to have the following characteristics.
(1)抵抗値の温度依存性、すなわちB定数が大きいこ
と。(2)検出されるべき抵抗値が適当であること。(1) The temperature dependence of the resistance value, that is, the B constant is large. (2) The resistance value to be detected is appropriate.
”(3)耐熱性にすぐれていること。有機材料の中にこ
の様な条件を満たすものがあれば、一般に有橙物は成形
性に富んでいるので温度センサーとして有望であるにち
がいない。(3) It must have excellent heat resistance. If there is an organic material that satisfies these conditions, it must be promising as a temperature sensor because orange materials generally have good moldability.
本発明は上記の条件を満足する有機温度センサーの製造
方法に関するものである。近年の高分子化学の著しい発
達は、従来有機材料の最も大きな欠点とされて来た熱安
定性の分野についてもすばらしい発展をもたらすに至つ
ている。それらの材料は耐熱性高分子とよばれ、代表的
なものとして、フ呈ノキシ樹脂、ポリ(フェニレン)オ
キシド、ポリバラキシリレン、芳香族ポリスルホン、ポ
リアミド、芳香族ポリアミドイミド、ポリエステルイミ
ド、芳香族ポリイミド、ポリベンツイミダゾール等が知
られている。これらの材料は耐熱性にすぐれているばか
りでなく大きなり定数を有しているので、もし適当な抵
抗値を付与する事が出来れば温度センサーとしてすぐれ
た材料となり得るであろう。しかしながら上記の高分子
の比抵抗値はいずれも1016〜1Cf!OΩG程度の
絶縁体であつてこのままでは温度センサーとはなり得な
い。196fF.にIBM社のS.D.Bruckはデ
ュポン社のカプトンHフィルム(ポリイミドフィルム)
が真空中800′C以上の高温で熱分解する事により5
×10−2Ωαの電導体に変化する事を発見した。The present invention relates to a method for manufacturing an organic temperature sensor that satisfies the above conditions. The remarkable development of polymer chemistry in recent years has led to wonderful developments in the field of thermal stability, which has traditionally been considered the biggest drawback of organic materials. These materials are called heat-resistant polymers, and typical examples include fluorinated oxygen resin, poly(phenylene) oxide, polyvaraxylylene, aromatic polysulfone, polyamide, aromatic polyamideimide, polyesterimide, and aromatic polyimide. , polybenzimidazole, etc. are known. These materials not only have excellent heat resistance but also a large coefficient of resistance, so if an appropriate resistance value can be imparted to them, they could be excellent materials for temperature sensors. However, the specific resistance values of the above polymers are all 1016 to 1 Cf! Since it is an insulator of about OΩG, it cannot be used as a temperature sensor as it is. 196fF. IBM's S. D. Bruck is DuPont's Kapton H film (polyimide film)
is thermally decomposed in a vacuum at a high temperature of 800'C or higher.
It was discovered that it changes into a conductor of ×10-2Ωα.
この様な熱分解法か耐熱性高分子に電導性を付与させる
ために有効な方法であろうと考えられるが、必ずしもす
べての耐熱性高分子に適用される訳ではなく、融点が分
解点よりも高い事、分解後再結合を生じることなどいく
つかの条件が必要である。この様な熱分解法はしたがつ
て、得られた電導体に適当な用途が開けなかつた事と相
まつてその後の研究は進んでいない。しかしながら温度
センサーと言う目的のためには電導性は必ずしも大きく
ある必要はなく、1010〜1σΩCm程度の範囲てあ
れば良いのであるから、その様な電導性を付与させる事
が出来れば新たに大きな用途が開けてくる事はまちがい
ない。この様な観点から、本発明においてはポリイミド
樹脂の熱分解反応により新規な温度センサーを得ようと
するものである。まず熱分解ポリイミド(PPIと略す
)の抵抗値を1010〜1σΩCm以下の範囲におさめ
る必要がある。This type of thermal decomposition method is thought to be an effective method for imparting electrical conductivity to heat-resistant polymers, but it is not necessarily applicable to all heat-resistant polymers, and it is not always applicable to all heat-resistant polymers. Several conditions are necessary, such as being high and allowing recombination to occur after decomposition. This type of thermal decomposition method has not been able to find any suitable use for the resulting conductor, and further research has not progressed. However, for the purpose of a temperature sensor, the electrical conductivity does not necessarily need to be large, and it is sufficient to have a range of about 1010 to 1σΩCm, so if such electrical conductivity can be imparted, it will be possible to create new and large applications. There is no doubt that it will open up. From this point of view, the present invention attempts to obtain a novel temperature sensor using a thermal decomposition reaction of polyimide resin. First, it is necessary to keep the resistance value of pyrolytic polyimide (abbreviated as PPI) within the range of 1010 to 1σΩCm.
そこでカプトンHフィルムを使用して所定の.温度で4
Hr真空中で熱処理を行ないその抵抗値を測定した。そ
の結果を第1図に示す。抵抗値は熱処理温度と共に急激
に減少し4時間の熱処理条件では550℃で1010Ω
礪となり700℃以上で1σΩ礪以下となる事が明らか
となつた。次に上記抵抗体のB定数を知り、温度センサ
ーとして使用可能かどうかを判断した。Therefore, using Kapton H film, a predetermined. 4 in temperature
Heat treatment was performed in a Hr vacuum, and the resistance value was measured. The results are shown in FIG. The resistance value decreases rapidly with the heat treatment temperature, and under the heat treatment condition of 4 hours, it was 1010Ω at 550℃.
It has become clear that the resistance becomes 1σΩ or less at temperatures above 700°C. Next, we learned the B constant of the resistor and determined whether it could be used as a temperature sensor.
第2図には上記条件で熱処理したときの処理温度と得ら
れた抵抗体のB定数(20℃〜200′Cの間て計算)
との関係を示す。温度センサーとしてのB定数は大きい
ほど良い事は言うまでもないが、近年の検出回路の進歩
にともなつて、100哩度のB定数値があれは温度セン
サーとして十分使用出来ると考えられている。第2図に
よれば550℃で熱処理した場合のB定数は38001
700℃において1000であり、これらの範囲の抵抗
体が十分温度センサーとして使用し得る事を示している
。第3図には600℃4Hr処理後の抵抗体の温度一抵
抗特性を示す。温l度一抵抗特性は少くとも300℃ま
でIOgρ(ρは比抵抗)一温度特性が直線となる典型
的な半導体特性を示し、温度センサーとしてはすぐれた
性質を有している事が分る。この様なすぐれた熱安定性
は従来の有機物温度センサーには考えられなかつたもの
である。第4図には600度Cで熱処理した場合の処理
時間と比抵抗値ρの関係を示す。Figure 2 shows the processing temperature when heat-treated under the above conditions and the B constant of the obtained resistor (calculated between 20°C and 200'C).
Indicates the relationship between It goes without saying that a larger B constant is better as a temperature sensor, but with recent advances in detection circuits, a B constant value of 100 degrees is considered to be sufficient for use as a temperature sensor. According to Figure 2, the B constant when heat treated at 550°C is 38001.
1000 at 700°C, indicating that resistors in these ranges can be used satisfactorily as temperature sensors. FIG. 3 shows the temperature-resistance characteristics of the resistor after being treated at 600° C. for 4 hours. The temperature-temperature-resistance characteristic shows typical semiconductor characteristics in which the IOgρ (ρ is specific resistance)-temperature characteristic is a straight line up to at least 300°C, indicating that it has excellent properties as a temperature sensor. . Such excellent thermal stability was unimaginable for conventional organic temperature sensors. FIG. 4 shows the relationship between the treatment time and the specific resistance value ρ in the case of heat treatment at 600 degrees Celsius.
600℃においては8時間の熱処理においても抵抗値が
一定とならずさらに熱分解が進行中である事が分る。At 600° C., the resistance value was not constant even after 8 hours of heat treatment, indicating that thermal decomposition was in progress.
第5図には″熱分解反応の進行速度を予想するために行
つたTGA測定による処理時間と重量減少%の関係を示
す。650℃での熱分解では重量減少は約3時間で一定
値47%に達する。Figure 5 shows the relationship between treatment time and weight loss % based on TGA measurements conducted to predict the progress rate of the thermal decomposition reaction.In thermal decomposition at 650°C, the weight loss is a constant value of 47% in about 3 hours. reach %.
したがつてこれ以上の温度では3時間以下の処理時間で
反応を完結させ得る事が分る。比抵抗値およびB定数を
制御するためには、処理温度て特性を制御する方法と、
処理時間て特性を制御する方法が考えられるが、再現性
の面から言つて明らかに処理温度て制御する方法の方が
すぐれている。Therefore, it can be seen that the reaction can be completed in a treatment time of 3 hours or less at a temperature higher than this. In order to control the specific resistance value and the B constant, there is a method of controlling the characteristics by processing temperature,
One possible method is to control the characteristics using processing time, but in terms of reproducibility, the method of controlling processing temperature is clearly superior.
たとえば650℃で1107Ωoの抵抗値を得るために
は処理時間を5〜2紛程度にしなければならないが、そ
こは重量減少曲線が急激に減少している個所であり事実
上、正確な制御は不可能てある。逆に550゜C以下の
温度においても10時間以上の非常に長時間の熱処理を
行なえば1010Ωα以下の抵抗値を得る事は不可能で
はない。しかしながら、その様な長時間は実際の製造現
場においては操作の簡便性、生産性などを考慮すると現
実的ではない。以上のことを勘案すると、温度センサー
として好ましい条件である比抵抗値1010Ωd〜1σ
ΩDlB定数1000以上を満足させるP円フィルムを
得るには、熱処理温度550〜700℃で1時間乃至数
時間以上熱処理すればよい事がわかる。なお熱処理雰囲
気としては真空中以外に不活性ガス中でも熱処理時間を
や)長くすれば同様の結果が得られる。以上述べた様に
処理方法を適当に選択することによつて比抵抗値のバラ
ツキを±300%以内にB定数のバラツキを±10%以
内におさめる事が出来る事が分つた。For example, in order to obtain a resistance value of 1107 Ωo at 650°C, the processing time must be reduced to about 5 to 2 times, but this is the point where the weight loss curve decreases rapidly, so accurate control is virtually impossible. It's possible. On the other hand, it is not impossible to obtain a resistance value of 1010 Ωα or less even at a temperature of 550° C. or less if heat treatment is performed for a very long time of 10 hours or more. However, such a long time is not realistic in actual manufacturing sites, considering ease of operation, productivity, etc. Considering the above, the specific resistance value is 1010Ωd~1σ, which is the preferable condition for a temperature sensor.
It can be seen that in order to obtain a P-circle film that satisfies the ΩDlB constant of 1000 or more, it is sufficient to perform heat treatment at a heat treatment temperature of 550 to 700° C. for 1 hour to several hours or more. Note that similar results can be obtained by increasing the heat treatment time in an inert gas atmosphere other than vacuum. As described above, it has been found that by appropriately selecting the processing method, it is possible to reduce the variation in resistivity value to within ±300% and the variation in B constant to within ±10%.
実際の抵抗値の制御は電極幅によつて行う事が出来るの
でこの場合あまり問題としなくても良く、B定数のバラ
ツキ±10%以内は温度センサーとしては十分な特性で
ある。この様にPPIフィルムは温度センサーとしてす
ぐれた特性を有しているが、さらにいくつかの特徴を上
げることが出来る。Since the actual resistance value can be controlled by the electrode width, there is no need to worry much in this case, and a variation in the B constant of within ±10% is sufficient for a temperature sensor. As described above, the PPI film has excellent properties as a temperature sensor, but several additional features can be improved.
その第1は成形性が容易である事であつて、フィルム状
ポリイミドを任意の形状に切り出して熱処理することに
より、任意の形の平面状のセンサーを作る事が出来ると
言う点である。その第2はPPl自体は比較的もろく、
フレキシブル温度センサーとしての用途には適さないが
、容易に粉砕によつて微粉末化出来るので、それらの粉
体を高分子バインダーに分散して印刷タイプの温度セン
サーを作る事が出来る点である。この様なタイプの温度
センサーにおいて最も大きな問題は電導体の凝集である
。PPI粉体の第3の特徴はPPIグラファイトと異な
り水素原子を多く含んだ有機性の材料であるためにほと
んどの高分子バインダーや溶剤とよく相容し凝集による
2次粒子の形成をほとんど示さないと言う点にある。た
とえばバインダーとしてはポリウレタン、エポキシ、フ
ェノキシ、シリコーン、ポリイミド、ポリアミド◆イミ
ド、クロロカーボン、ポリキシレン、ポリエステル、ポ
リビニル、アクリル、フェノール、メラミン、グアナミ
ン、ポリアミド、ポリサルファイドなどが接着性、皮膜
性など機械的性質を考慮して選択される。以下にこのよ
うな特徴を有するPPI温度センサーの実施例を示す。
〈実施例1〉 ,8実
施例1,2はPPIフィルム上に直接電極を印刷し、そ
のまま温度センサーとして使用するものである。The first is that it is easy to form, and by cutting out a film-like polyimide into an arbitrary shape and heat-treating it, a planar sensor of any shape can be made. Second, PPL itself is relatively fragile;
Although it is not suitable for use as a flexible temperature sensor, it can be easily pulverized into fine powder, so it is possible to make a printing type temperature sensor by dispersing the powder in a polymer binder. The biggest problem with these types of temperature sensors is agglomeration of conductors. The third characteristic of PPI powder is that, unlike PPI graphite, it is an organic material containing many hydrogen atoms, so it is compatible with most polymeric binders and solvents, and shows almost no formation of secondary particles due to agglomeration. That's the point. For example, binders include polyurethane, epoxy, phenoxy, silicone, polyimide, polyamide, imide, chlorocarbon, polyxylene, polyester, polyvinyl, acrylic, phenol, melamine, guanamine, polyamide, polysulfide, etc., which have mechanical properties such as adhesiveness and film properties. are selected taking into consideration. Examples of PPI temperature sensors having such characteristics are shown below.
<Example 1>, 8 In Examples 1 and 2, electrodes were printed directly on the PPI film and used as a temperature sensor as is.
第6図には一般に比抵抗値が1Cf′ΩCm以下である
場合に行なわれる平行電極クイプのセンサー構成図を示
す。1はセラミック等の絶縁性の基板であつて、その面
上にセンサー皮膜2が接着されている。FIG. 6 shows a configuration diagram of a parallel electrode quip sensor which is generally used when the resistivity value is less than 1 Cf'ΩCm. 1 is an insulating substrate made of ceramic or the like, on the surface of which a sensor film 2 is adhered.
この様な絶縁性の基板が使用されるのはセンサー皮膜の
機械的強度を補うためである。電極3は、カーボンペー
スト、グラファイトペースト、銀ペーストなどから選ば
れセンサー皮膜上に印刷されている。この様にして構成
されたセンサーは温度に対してすぐれた応答性を示す事
が確かめられた。く実施例2〉
第7図A,bに一般に比抵抗値101Ωα以上の場合に
行なわれるサンドイッチタイプのセンサーの構成図を示
す。The reason why such an insulating substrate is used is to supplement the mechanical strength of the sensor film. The electrode 3 is selected from carbon paste, graphite paste, silver paste, etc., and is printed on the sensor film. It has been confirmed that the sensor constructed in this manner exhibits excellent responsiveness to temperature. Embodiment 2> FIGS. 7A and 7B are block diagrams of a sandwich type sensor that is generally used when the resistivity value is 101 Ωα or more.
2はセンサー皮膜、3はセンサー皮膜上に塗布された電
極、4はリード線取出しのための金属箔を示す。2 is a sensor film, 3 is an electrode coated on the sensor film, and 4 is a metal foil for taking out a lead wire.
この様な構成によつて実・際に測定されるセンサーの抵
抗値を100MΩ以下の値とする事が出来る。〈実施例
3〉
ここではPPIを高分子バインダーに分散して得られる
組合せ物の例を示す。With such a configuration, the resistance value of the sensor that is actually measured can be set to a value of 100 MΩ or less. <Example 3> Here, an example of a combination obtained by dispersing PPI in a polymer binder is shown.
ポリイミドの5重量%アセトアミド・ピロリドン溶液を
ガラス基板上にキャストして0.1〜0.5μの厚さの
皮膜にし、300℃で約30分硬化させ、次にこのガラ
ス基板を水に浸してポリイミド皮膜を分散した。この膜
を真空中にて約4時間500をC〜900℃の種々の温
度でノ熱分解し、更にアトライターで2時間粉砕し、4
00メッシュ以下の粉末を得た。バインダーとしてエポ
キシ樹脂を用い、PPIとバインダー比が80:20の
場合のデータを示す。PPI−エポキシからなるペース
トを3本ロールにて完全に混練し、J3OOメッシュの
スクリーンを用いてセラミック基板上に塗布、印刷など
により皮膜状に形成した。表は皮膜の電気的性質である
。とができる。A 5% by weight acetamide/pyrrolidone solution of polyimide was cast onto a glass substrate to form a film with a thickness of 0.1 to 0.5μ, cured at 300°C for about 30 minutes, and then the glass substrate was immersed in water. A polyimide film was dispersed. This film was pyrolyzed in vacuum at various temperatures from 500°C to 900°C for about 4 hours, and then crushed in an attritor for 2 hours.
A powder of 00 mesh or less was obtained. Data is shown when an epoxy resin is used as the binder and the PPI to binder ratio is 80:20. A paste consisting of PPI-epoxy was thoroughly kneaded using three rolls, and was formed into a film by coating and printing on a ceramic substrate using a J3OO mesh screen. The table shows the electrical properties of the film. I can do that.
バインダー/フィラー比が一定であることは、組成物の
機械的性質がほとんど変化せすに電気的特性のみを制御
し得るということを意味し、本発明の重要な利点となる
。抵抗値の長期安定性は85℃、500C@間で10%
以内であつたので、非常に優秀であると言える。A constant binder/filler ratio means that only the electrical properties can be controlled while the mechanical properties of the composition change little, which is an important advantage of the present invention. Long-term stability of resistance value is 10% between 85℃ and 500C@
It can be said that it is extremely excellent.
また、最高使用温度は約250℃であつた。上記PPl
はポリエステル樹脂をバインダーにして皮膜化すること
もでき、ポリエステルベースを用いたフレキシブル回路
用としても最適であつた。Further, the maximum operating temperature was about 250°C. The above PPl
It was also possible to form a film using polyester resin as a binder, making it ideal for use in flexible circuits using a polyester base.
また、バインダーとしてシリコーンを用いた場合350
℃までの耐熱性が得られ、ヒータとして最適の導電性組
成物が得られた。以上のように、本発明はポリイミドを
真空中あるいは不活性ガス中で5500C〜700℃の
温度範囲で1時間以上熱処理したPPIのフィルムまた
はこのPPIを粉末化してバインダーと混合したものを
皮膜状にして点状、線状、面状等所望の形状に形成し、
このフィルムまたは皮膜に電極を形成した有機温度セン
サーの製造方法であり、点状はもちろん、線状、面状な
ど複雑な形状の温度センサーを得ることができる。In addition, when silicone is used as a binder, 350
A conductive composition with heat resistance up to ℃ was obtained, which is suitable for use as a heater. As described above, the present invention is a PPI film made by heat-treating polyimide in a temperature range of 5500C to 700C for 1 hour or more in a vacuum or inert gas, or a film made by powdering this PPI and mixing it with a binder. to form a desired shape such as dots, lines, or planes,
This is a method for manufacturing an organic temperature sensor in which electrodes are formed on this film or membrane, and it is possible to obtain temperature sensors in complex shapes such as dots, lines, and planes.
第1図はカプトンHフィルムを真空中4時間所定の温度
て熱分解を行つた場合の比抵抗値と処理温度の関係を示
す図、第2図はカプトンHフィルムを真空中4時間所定
の温度で熱分解を行つた場合のB定数と処理温度との関
係を示す図、第3図はカプトンHフィルムを600℃4
時間真空中で熱分解した場合の温度一抵抗特性を示す図
、第4図はカプトンHフィルムを600℃真空中で熱分
解した場合の比抵抗値と処理時間の関係を示す図、第5
図はカプトンHフィルムを真空中で熱処理した場合の重
量減少曲線、第6図は平行電極より成るセンサーの構成
を示す平面図、第7図A,bはサンドイッチ電極より成
るセンサーの平面図及び断面図てある。
1・・・・・・絶縁性基板、2・・・・・・PPI皮膜
、3・・・・・・電極、4・・・・・・電極とり出し用
金属箔。Figure 1 shows the relationship between resistivity and processing temperature when Kapton H film is thermally decomposed in vacuum at a predetermined temperature for 4 hours. Figure 3 shows the relationship between the B constant and processing temperature when thermal decomposition is carried out at 600°C.
Figure 4 is a diagram showing the temperature-resistance characteristics when thermally decomposed in vacuum for time. Figure 4 is a diagram showing the relationship between specific resistance value and processing time when Kapton H film is thermally decomposed at 600°C in vacuum.
The figure shows a weight loss curve when Kapton H film is heat-treated in vacuum. Figure 6 is a plan view showing the configuration of a sensor consisting of parallel electrodes. Figure 7 A and b are a plan view and cross section of a sensor consisting of sandwich electrodes. There is a diagram. DESCRIPTION OF SYMBOLS 1... Insulating substrate, 2... PPI film, 3... Electrode, 4... Metal foil for taking out the electrode.
Claims (1)
700℃の温度範囲で熱分解して得られる材料を本質的
に有する皮膜に電極を形成することを特徴とする温度サ
ンサーの製造方法。 2 熱分解時間が1時間乃至数時間以上である特許請求
の範囲第1項記載の温度センサーの製造方法。 3 ポリイミドとしてフィルム状ポリイミドを使用し、
熱分解後のフィルム上に電極形成した特許請求の範囲第
1項記載の温度サンサーの製造方法。 4 熱分解後のポリイミドを粉末化してバインダー中に
混合し、これを基板上に塗布、印刷等により皮膜上に形
成した特許請求の範囲第1項記載の温度センサーの製造
方法。 5 バインダーとしてポリウレタン、エポキシ、フェノ
キシ、シリコーン、ポリイミド、ポリアミド−イミド、
フロロカーボン、ポリキシレン、ポリエステル、ポリビ
ニル、アクリル、フェノール、メラミン、グアナミン、
ポリアミド、ポリサルファイドのいずれかを使用した特
許請求の範囲第4項記載の温度センサーの製造方法。[Claims] 1 Polyimide in vacuum or inert gas,
A method for manufacturing a temperature sensor, characterized in that electrodes are formed on a film that essentially contains a material obtained by thermal decomposition in a temperature range of 700°C. 2. The method for manufacturing a temperature sensor according to claim 1, wherein the thermal decomposition time is from one hour to several hours or more. 3 Using film-like polyimide as the polyimide,
A method for manufacturing a temperature sensor according to claim 1, wherein an electrode is formed on the film after thermal decomposition. 4. The method for manufacturing a temperature sensor according to claim 1, wherein the polyimide after thermal decomposition is powdered and mixed into a binder, and the powder is coated on a substrate and formed on a film by printing or the like. 5 As a binder, polyurethane, epoxy, phenoxy, silicone, polyimide, polyamide-imide,
Fluorocarbon, polyxylene, polyester, polyvinyl, acrylic, phenol, melamine, guanamine,
The method for manufacturing a temperature sensor according to claim 4, using either polyamide or polysulfide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11056280A JPS6055965B2 (en) | 1980-08-11 | 1980-08-11 | Manufacturing method of temperature sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11056280A JPS6055965B2 (en) | 1980-08-11 | 1980-08-11 | Manufacturing method of temperature sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5735302A JPS5735302A (en) | 1982-02-25 |
| JPS6055965B2 true JPS6055965B2 (en) | 1985-12-07 |
Family
ID=14538971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11056280A Expired JPS6055965B2 (en) | 1980-08-11 | 1980-08-11 | Manufacturing method of temperature sensor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6055965B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02269925A (en) * | 1989-04-11 | 1990-11-05 | Nhk Spring Co Ltd | Temperature sensor |
| JP6579194B2 (en) * | 2015-07-31 | 2019-09-25 | 株式会社村田製作所 | Temperature sensor |
-
1980
- 1980-08-11 JP JP11056280A patent/JPS6055965B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5735302A (en) | 1982-02-25 |
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