JPS6058976B2 - UV cleaning equipment - Google Patents

Description

[Detailed description of the invention] The present invention relates to an ultraviolet cleaning device.

Ozone generated by an ultraviolet lamp is used to decompose and clean contaminants, but when this ultraviolet lamp, for example a low-pressure mercury lamp, is turned on, ultraviolet rays mainly in the mercury resonance line with a wavelength of 254 nm are emitted to the outside. Therefore, ultraviolet rays of 185 nm and even small amounts of other wavelengths are emitted. Then, ozone is generated by ultraviolet rays with a wavelength of 185 nm, and then this ozone is
It is known that oxygen as a generating group is generated by decomposition by nm, and that this oxygen as a generating group decomposes organic contaminants and is scattered in a gaseous state. This ultraviolet cleaning device is applied to various objects to be cleaned, one of which is a crystal oscillator.

Crystal oscillators use their resonant frequencies to determine the standard of time, and are used in a variety of products.
If the surface of a crystal resonator becomes contaminated, the resonant frequency will be distorted. Therefore, the surface must be clean, but recently there has been a growing demand for accuracy in resonant frequencies, and the surface is required to be highly clean. Furthermore, when a metal film is deposited on this surface, contaminants on the surface significantly impede the adhesion of the deposited film. By the way, in conventional ultraviolet cleaning equipment, an ultraviolet lamp is installed on the upper surface of an irradiation chamber, and the ultraviolet rays are irradiated onto the upper surface of the object to be cleaned. Although ozone itself makes some contribution to the decomposition of organic pollutants,
Most of the radiation is caused by ultraviolet rays, so if only the top surface is irradiated with ultraviolet rays, some of the ultraviolet rays will be absorbed during the transmission, even if the ultraviolet rays are transmitted through a crystal resonator. Decomposition is incomplete. When cleaning both sides of something that does not transmit ultraviolet rays, such as a metal wafer, it has been possible to clean one side and then turn the wafer over to clean the other side. Therefore, the operation was complicated and the cleaning time was long. Further, during the reversing operation, one side that had been cleaned becomes contaminated again due to contaminants on the other side. Therefore, an object of the present invention is to provide an ultraviolet cleaning device that is easy to operate and can reliably clean both sides of a flat object in a short period of time. This is an ultraviolet cleaning device that decomposes and cleans organic contaminants adhering to the surface of the object to be cleaned using the generated oxygen produced by the decomposition of ozone. It is characterized in that ultraviolet lamps with mirrors behind them are disposed on both sides or on both left and right sides, and a gas containing oxygen is supplied into the irradiation chamber.

The present invention will be specifically described below based on embodiments shown in the drawings.

FIG. 1 shows a cross-sectional view of the apparatus, and a lamp body 2 is built into the apparatus box 1, forming a double structure to prevent generated ozone from leaking to the outside.

The inside of the lamp body 2 is an irradiation chamber 3, and above and below this irradiation chamber 3 there are U-shaped 35 UV lamps 4, respectively.
Two 0W high-output, low-pressure mercury lamps are installed. A mirror 5 is arranged behind each of the upper and lower ultraviolet lamps 4, and the light from the ultraviolet lamps 4 is irradiated toward the center of the irradiation chamber 3 from both the upper and lower sides. Note that cooling water channels 6 are fixed to the upper and lower surfaces of the lamp body 2 for cooling. The objects to be cleaned 7 are crystal oscillators with a diameter of approximately 7TnIn, and are arranged in large numbers on a planar support 8 and supported in the center of the irradiation chamber 3, but since light is also irradiated from below, the support A hole corresponding to the size of the crystal oscillator is bored in the tool 8, and the crystal oscillator is supported in point contact by claws around the hole, and the lower surface is also directly irradiated with light. On the side of the lamp body 2-, there are provided an intake hole 9 for supplying oxygen-containing gas to the irradiation chamber 3, and an exhaust hole 10 for exhausting the internal gas together with decomposed contaminants. The gas sucked through 10 is treated in an ozone decomposition chamber and then released into the atmosphere. When the ultraviolet lamp 4 is turned on, the upper and lower surfaces of the crystal resonator are irradiated with ultraviolet rays, but since oxygen-containing gas is supplied into the irradiation chamber 3, the oxygen generating group is generated near the upper and lower surfaces. As a result, contaminants are decomposed and both the upper and lower surfaces are uniformly cleaned 3.

Therefore, compared to conventional single-sided irradiation, cleaning is performed more cleanly, the accuracy of the resonant frequency is improved, and the adhesion of the metal film deposited in a subsequent process is also increased. The object to be cleaned 7 in this embodiment is a crystal resonator that transmits ultraviolet rays, but even if it is a metal wafer that does not transmit ultraviolet rays, both the upper and lower surfaces are cleaned at the same time. There is no need to turn it over mid-way, so it is easy to operate and can be cleaned in a short time without re-contamination. In this embodiment, the ultraviolet lamps 4 are disposed on both the upper and lower sides of the irradiation chamber 3, but the same effect can be obtained even if the ultraviolet lamps 4 are disposed on both the left and right sides.

If the object 7 to be cleaned is transparent to ultraviolet rays, FIG.
As shown in FIG. 5, they may be supported by multiple supports 8 at intervals in a horizontal or inclined state, or they may be arranged and supported in a vertical state.

In these cases, ultraviolet rays are irradiated from both the top and bottom, so
Compared to the conventional method of irradiating only from above, cleaning can be performed more reliably in a shorter time. As explained above, the ultraviolet cleaning device of the present invention includes ultraviolet lamps with mirrors arranged behind them on both the upper and lower surfaces or both the left and right sides of the irradiation chamber in which the object to be cleaned is supported, and oxygen in the irradiation chamber. According to the present invention, it is possible to provide an ultraviolet cleaning device that is easy to operate and can reliably clean both sides of a flat object in a short time.

[Brief explanation of the drawing]

FIG. 1 is a sectional view of an embodiment of the present invention, FIG. 2 is a front view showing a support mode for the object to be cleaned, FIG. 3 is a plan view, and FIG. 4 is a front view showing another support mode. The figure is also a plan view. 1... Equipment box, 2... Light body, 3... Irradiation room, 4...
...Ultraviolet lamp, 5...Mirror, 6...Cooling channel, 7...Object to be cleaned (crystal resonator), 8...Support,
9... Suction hole, 10... Exhaust hole.

Claims (1)

[Claims] 1 An ultraviolet cleaning device that generates ozone using light from an ultraviolet lamp, and decomposes and cleans organic contaminants that adhere to the surface of the object to be cleaned using oxygen, which is a generating group generated by the decomposition of the ozone. Ultraviolet lamps with mirrors placed behind them are arranged on both the top and bottom or left and right sides of the irradiation chamber in which the cleaning body is supported, and a gas containing oxygen is supplied into the irradiation chamber. cleaning equipment.