JPS6235811B2 - - Google Patents
Info
- Publication number
- JPS6235811B2 JPS6235811B2 JP58165149A JP16514983A JPS6235811B2 JP S6235811 B2 JPS6235811 B2 JP S6235811B2 JP 58165149 A JP58165149 A JP 58165149A JP 16514983 A JP16514983 A JP 16514983A JP S6235811 B2 JPS6235811 B2 JP S6235811B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaned
- ultraviolet
- support
- supported
- ultraviolet rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 11
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 239000000356 contaminant Substances 0.000 claims description 6
- 238000000354 decomposition reaction Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000012780 transparent material Substances 0.000 claims description 3
- 239000013078 crystal Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 239000002957 persistent organic pollutant Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Cleaning In General (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【発明の詳細な説明】
本発明は紫外線による洗浄方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cleaning method using ultraviolet rays.
紫外線ランプより発生するオゾンを利用して汚
染物を分解洗浄することが行われているが、この
紫外線ランプ、例えば低圧水銀ランプを点灯する
と、主として波長が254nmの水銀共鳴線の紫外線
が外部に放出され、従として185nmの紫外線が、
更には他の波長のものがわずかに放出される。そ
して、波長185nmの紫外線によつてオゾンが生成
し、次にこのオゾンが波長254nmにより分解され
て発生基の酸素が生成し、この発生基の酸素が有
機汚染物を分解してガス状態で飛散させることが
知られている。 Ozone generated by an ultraviolet lamp is used to decompose and clean contaminants, but when this ultraviolet lamp, for example a low-pressure mercury lamp, is turned on, ultraviolet rays mainly in the mercury resonance line with a wavelength of 254 nm are emitted to the outside. and 185nm ultraviolet rays,
Furthermore, a small amount of other wavelengths is emitted. Then, ozone is generated by ultraviolet rays with a wavelength of 185 nm, and then this ozone is decomposed by a wavelength of 254 nm to generate oxygen, which is a generating group. This oxygen, which is a generating group, decomposes organic pollutants and is dispersed in a gaseous state. It is known to cause
この紫外線洗浄方法は各種の被洗浄体に適用さ
れるが、その一つに水晶振動子がある。水晶振動
子はその共鳴周波数を利用して時間の基準を定め
るものであり、いろいろな商品に利用されている
が、水晶振動子の表面が汚染されると共鳴周波数
に狂いが生じる。従つてその表面は清浄でなけれ
ばならないが、紫外線で洗浄することにより高い
清浄度が得られ、また、後工程で蒸着される金属
膜の密着性を向上させることができる。 This ultraviolet cleaning method is applied to various objects to be cleaned, one of which is a crystal resonator. Crystal oscillators use their resonant frequencies to determine time standards, and are used in a variety of products, but if the surface of the quartz oscillator becomes contaminated, the resonant frequency will go awry. Therefore, the surface must be clean, and by cleaning with ultraviolet rays, a high degree of cleanliness can be obtained and the adhesion of the metal film deposited in a subsequent step can be improved.
ところで従来は、被洗浄体は金網やステンレ
ス、アルミナなど紫外線を透過しない材質からな
る支持具で支持されていた。この様な支持具で支
持されていても、紫外線ランプの照射室の上面に
設置されて、被洗浄体の上面のみを洗浄する場合
はとくに支障はない。しかし、被洗浄体の両面を
洗浄する必要があるときは、紫外線ランプが照射
室の上面にのみ設置されていると、一面を洗浄し
た後に反転して他面を洗浄しなければならず、操
作が煩雑で、洗浄時間が長くなり、また反転操作
の最中に洗浄の終つた一面が他面の汚染物などの
ために再び汚染されるなどの問題点がある。従つ
て、紫外線ランプを照射室の上下両面や左右両側
面に設置して被洗浄体の両面を同時に照射するこ
とが考えられるが、この場合に支持具が前述の通
りの紫外線を透過しない材質からなると、支持具
をどの様な形状にしても、被洗浄体のある部分は
支持具によつて遮ぎられて紫外線が完全には照射
されず、その部分の洗浄が不完全となる不具合が
あつた。 Conventionally, the object to be cleaned has been supported by a support made of a material that does not transmit ultraviolet rays, such as wire mesh, stainless steel, or alumina. Even if it is supported by such a support, there is no particular problem when it is installed on the upper surface of the irradiation chamber of an ultraviolet lamp and only the upper surface of the object to be cleaned is cleaned. However, when it is necessary to clean both sides of the object to be cleaned, if the ultraviolet lamp is installed only on the top of the irradiation chamber, it is necessary to clean one side and then turn it over to clean the other side. There are problems in that cleaning is complicated, takes a long time to clean, and during the reversing operation, one side that has been cleaned becomes contaminated again due to contaminants on the other side. Therefore, it is conceivable to install ultraviolet lamps on both the upper and lower sides of the irradiation chamber or on both the left and right sides of the irradiation chamber and irradiate both sides of the object to be cleaned at the same time. Therefore, no matter what shape the support is made, a certain part of the object to be cleaned will be blocked by the support and the ultraviolet rays will not be completely irradiated, resulting in a problem that the cleaning of that part will be incomplete. Ta.
そこで本発明は、被洗浄体の両面を確実に洗浄
できる紫外線洗浄方法を提供することを目的と
し、その構成は、紫外線ランプの光でオゾンを発
生させ、このオゾンの分解により生成される発生
基の酸素により被洗浄体の表面に付着する有機汚
染物などを分解して洗浄する紫外線洗浄方法であ
つて紫外線透過性物質よりなる支持具に支持され
た被洗浄体に紫外線を照射する工程を含むことを
特徴とする。 Therefore, an object of the present invention is to provide an ultraviolet cleaning method that can reliably clean both sides of an object to be cleaned.The structure of the present invention is to generate ozone with the light of an ultraviolet lamp, and generate radicals generated by the decomposition of this ozone. An ultraviolet cleaning method in which organic contaminants adhering to the surface of an object to be cleaned are decomposed and cleaned using oxygen, and includes a step of irradiating the object to be cleaned supported by a support made of an ultraviolet-transparent substance with ultraviolet rays. It is characterized by
以下に図面に基いて本発明の一実施例を具体的
に説明する。 An embodiment of the present invention will be specifically described below based on the drawings.
第１図は本発明の実施例に使用される装置の断
面図を示すが、装置箱１には照射箱２が内蔵され
て二重構造をなし、発生したオゾンが外部に漏洩
しないようになつている。照射箱２の内部が照射
室３であるが、この照射室３の上方と下方にはそ
れぞれ紫外線ランプ４としてＵ字状の350W高出
力低圧水銀灯が２本づつ配設されている。上下の
紫外線ランプ４の背後にはそれぞれミラー５が配
置され、紫外線ランプ４の光は上下両方から照射
室３の中央に向けて照射される。照射箱２の上面
と磁下面には冷却水路６が固着されて冷却されて
いる。被洗浄体７は直径７mm程度の水晶振動子で
あり、支持具８上に多数配列されて照射室３の中
央部に支持されるが、支持具８は石英ガラス製で
あり、第２図に示す様に水晶振動子の大きさに相
応する孔８ａがあけられ、孔周縁の爪８ｂによつ
て水晶振動子が支持される。支持具８の材質は石
英ガラスに限られるものではなく、サフアイヤ、
テフロン、LiF、MgFなどの如く紫外線を透過さ
せる性質を有するものであればよく、形状も図例
に限られるものではなく、単に板状をなすもので
もよい。そして照射箱２の側方には酸素を含むガ
スを照射室３に供給する吸入孔９と、内部のガス
を分解された汚染物とともに排出する排気孔１０
が設けられているが、排出されたガスはオゾン分
解室で処理された後に大気中にに放出される。 FIG. 1 shows a cross-sectional view of the device used in the embodiment of the present invention. The device box 1 has an irradiation box 2 built-in and has a double structure to prevent the generated ozone from leaking outside. ing. The interior of the irradiation box 2 is an irradiation chamber 3, and two U-shaped 350W high-output low-pressure mercury lamps are disposed above and below this irradiation chamber 3 as ultraviolet lamps 4, respectively. A mirror 5 is arranged behind each of the upper and lower ultraviolet lamps 4, and the light from the ultraviolet lamps 4 is irradiated toward the center of the irradiation chamber 3 from both the upper and lower sides. Cooling channels 6 are fixed to the upper surface and lower surface of the irradiation box 2 for cooling. The objects to be cleaned 7 are crystal oscillators with a diameter of approximately 7 mm, and are arranged in large numbers on a support 8 and supported in the center of the irradiation chamber 3.The support 8 is made of quartz glass and is shown in FIG. As shown, a hole 8a corresponding to the size of the crystal resonator is drilled, and the crystal resonator is supported by claws 8b at the periphery of the hole. The material of the support 8 is not limited to quartz glass, but also sapphire,
Any material may be used as long as it has the property of transmitting ultraviolet rays, such as Teflon, LiF, MgF, etc., and the shape is not limited to the illustrated example, and may be simply a plate-like material. On the side of the irradiation box 2, there is an inlet hole 9 for supplying oxygen-containing gas to the irradiation chamber 3, and an exhaust hole 10 for discharging the internal gas together with decomposed contaminants.
However, the emitted gas is treated in an ozone decomposition chamber and then released into the atmosphere.
しかして、紫外線ランプ４を点灯すると水晶振
動子の上下両面に紫外線が照射されるが、照射室
３内に酸素を含むガスが供給されているので、発
生基の酸素が上下両面の近傍で生成され、これに
よつて汚染物は分解されるが、支持具８が紫外線
透過性物質である石英ガラスよりなるため、紫外
線ランプ４よりの光はこれに遮ぎられることな
く、水晶振動子の表面に満遍なく照射される。そ
して、水晶振動子が支持具８によつて支持されて
いる部位は、真空状態で支持具８に密着している
訳ではなく、この支持されている部位と支持具８
との間にも酸素を含むガスが存在するので、これ
が発生基の酸素になつて、水晶振動子が支持具８
によつて支持されている部位も洗浄する。従つ
て、水晶振動子は一様に洗浄されるので清浄度は
向上し、共鳴周波数はより正確となるとともに、
後工程で蒸着される金属膜の密着力も大きくな
る。 When the ultraviolet lamp 4 is turned on, the upper and lower surfaces of the crystal resonator are irradiated with ultraviolet rays, but since oxygen-containing gas is supplied into the irradiation chamber 3, the oxygen generating group is generated near the upper and lower surfaces. This decomposes the contaminants, but since the support 8 is made of quartz glass, which is an ultraviolet-transparent material, the light from the ultraviolet lamp 4 is not blocked by it and can be seen on the surface of the crystal resonator. is evenly irradiated. The part where the crystal oscillator is supported by the support 8 is not in close contact with the support 8 in a vacuum state, but this supported part and the support 8
Since there is also a gas containing oxygen between the
Also clean areas supported by Therefore, the crystal is cleaned uniformly, resulting in improved cleanliness and a more accurate resonant frequency.
The adhesion of the metal film deposited in the subsequent process also increases.
そして、被洗浄体７自体が紫外線透過性の場合
は、第３図〜第６図に示すように、水平ないし傾
斜状態で間隔をあけ、紫外線透過性物質からなる
支持具８で支持してもよく、更には垂直状態に並
べて支持してもよい。これらの場合も紫外線が支
持具８に遮ぎられることなく被洗浄体７に照射さ
れ、一様に洗浄することができる。 If the object to be cleaned 7 itself is transparent to ultraviolet rays, it may be supported horizontally or inclined at intervals with supports 8 made of an ultraviolet-transparent material, as shown in FIGS. 3 to 6. Furthermore, they may be supported side by side vertically. In these cases as well, the object to be cleaned 7 is irradiated with ultraviolet rays without being blocked by the support 8, and can be cleaned uniformly.
以上説明した様に、本発明の紫外線洗浄方法は
紫外線透過性物質よりなる支持具に支持された被
洗浄体に紫外線を照射する工程を含むため、支持
具に遮ぎられることなく紫外線が一様に照射され
るので、本発明に従えば、被洗浄体の両面を確実
に洗浄できる紫外線洗浄方法を提供することがで
きる。 As explained above, the ultraviolet cleaning method of the present invention includes the step of irradiating the object to be cleaned supported by a support made of an ultraviolet-transparent substance with ultraviolet rays, so that the ultraviolet rays are uniformly applied without being blocked by the support. Therefore, according to the present invention, it is possible to provide an ultraviolet cleaning method that can reliably clean both surfaces of an object to be cleaned.
第１図は本発明の実施例に使用される装置の断
面図、第２図は支持具の要部斜視図、第３図は被
洗浄体の支持態様を示す正面図、第４図は同じく
平面図、第５図は他の支持態様を示す正面図、第
６図は同じく平面図である。
１……装置箱、２……照射箱、３……照射室、
４……紫外線ランプ、５……ミラー、６……冷却
水路、７……被洗浄体（水晶振動子）、８……支
持具、９……吸入孔、１０……排気孔。
Fig. 1 is a sectional view of the device used in the embodiment of the present invention, Fig. 2 is a perspective view of the main parts of the support, Fig. 3 is a front view showing how the object to be cleaned is supported, and Fig. 4 is the same. A plan view, FIG. 5 is a front view showing another support mode, and FIG. 6 is a plan view. 1... Equipment box, 2... Irradiation box, 3... Irradiation room,
4...Ultraviolet lamp, 5...Mirror, 6...Cooling channel, 7...Object to be cleaned (crystal resonator), 8...Support, 9...Suction hole, 10...Exhaust hole.
Claims (1)
オゾンの分解により生成される発生基の酸素によ
り被洗浄体の表面に付着する有機汚染物などを分
解して洗浄する紫外線洗浄方法であつて、紫外線
透過性物質よりなる支持具に支持された被洗浄体
に紫外線を照射する工程を含む紫外線洗浄方法。1 An ultraviolet cleaning method in which ozone is generated by the light of an ultraviolet lamp, and organic contaminants adhering to the surface of the object to be cleaned are decomposed and cleaned by the generated oxygen generated by the decomposition of this ozone. An ultraviolet cleaning method that includes the step of irradiating an object to be cleaned supported by a support made of a transparent material with ultraviolet rays.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58165149A JPS6058238A (en) | 1983-09-09 | 1983-09-09 | Cleaning method utilizing ultraviolet ray |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58165149A JPS6058238A (en) | 1983-09-09 | 1983-09-09 | Cleaning method utilizing ultraviolet ray |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6058238A JPS6058238A (en) | 1985-04-04 |
| JPS6235811B2 true JPS6235811B2 (en) | 1987-08-04 |
Family
ID=15806808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58165149A Granted JPS6058238A (en) | 1983-09-09 | 1983-09-09 | Cleaning method utilizing ultraviolet ray |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6058238A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109482577A (en) * | 2018-12-19 | 2019-03-19 | 烟台和锦电子有限公司 | A kind of quartz-crystal resonator shell oil removing cleaning device and its application method |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63202921A (en) * | 1987-02-18 | 1988-08-22 | Nec Kyushu Ltd | Cleaner for semiconductor wafer |
| JPS63121A (en) * | 1987-06-17 | 1988-01-05 | Wakomu:Kk | Vapor washing/drying apparatus |
| TW260806B (en) * | 1993-11-26 | 1995-10-21 | Ushio Electric Inc | |
| JPH09123206A (en) * | 1995-10-30 | 1997-05-13 | Towa Kk | Resin molding equipment for electronic parts |
| US6098637A (en) * | 1998-03-03 | 2000-08-08 | Applied Materials, Inc. | In situ cleaning of the surface inside a vacuum processing chamber |
| DE10211611A1 (en) * | 2002-03-12 | 2003-09-25 | Zeiss Carl Smt Ag | Process and device for decontamination of optical surfaces |
| CN104259128A (en) * | 2014-08-01 | 2015-01-07 | 苏州普京真空技术有限公司 | Crystal oscillator wafer cleaning method |
| CN112718692A (en) * | 2020-12-09 | 2021-04-30 | 四川富乐德科技发展有限公司 | Method for cleaning LiF crystal of OLED crucible part |
-
1983
- 1983-09-09 JP JP58165149A patent/JPS6058238A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109482577A (en) * | 2018-12-19 | 2019-03-19 | 烟台和锦电子有限公司 | A kind of quartz-crystal resonator shell oil removing cleaning device and its application method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6058238A (en) | 1985-04-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |