JPS6059997B2 - plating device - Google Patents
plating deviceInfo
- Publication number
- JPS6059997B2 JPS6059997B2 JP10079378A JP10079378A JPS6059997B2 JP S6059997 B2 JPS6059997 B2 JP S6059997B2 JP 10079378 A JP10079378 A JP 10079378A JP 10079378 A JP10079378 A JP 10079378A JP S6059997 B2 JPS6059997 B2 JP S6059997B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plated
- mask body
- opening
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 title claims description 108
- 239000000463 material Substances 0.000 claims description 41
- 239000000243 solution Substances 0.000 claims description 35
- 238000002347 injection Methods 0.000 claims description 9
- 239000007924 injection Substances 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 8
- 238000005507 spraying Methods 0.000 claims description 6
- 239000007921 spray Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 5
- 238000011084 recovery Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Lead Frames For Integrated Circuits (AREA)
Description
【発明の詳細な説明】
本発明はメッキ装置、特にマスク開口部めがけてメッ
キ液を噴射するタイプのメッキ装置、の改良に関するも
のてある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a plating apparatus, particularly a plating apparatus of a type that sprays a plating solution toward a mask opening.
被メッキ材をメッキ洛中に浸漬するメッキ装置に代え
最近では被メッキ材のメッキが必要な部分にのみメッキ
処理するため、メッキ液を噴射してメッキ必要部分にの
みこのメッキ液を施こすタイプのメッキ装置が種々開発
され且つ実施化されている。In place of plating equipment that immerses the material to be plated in a plating solution, recently a type of plating device that sprays plating solution and applies the plating solution only to the areas that require plating has been recently introduced. Various plating apparatuses have been developed and put into practice.
金、銀その他の貴金属メッキに於いてはコスト低減化の
ため特に斯かるメッキ装置の利用が’意図されている。
そして、この様なメッキ装置に於ては被メッキ材の必要
部分にのみメッキ処理するためマスク手段を使用してい
る。このマスク手段には色々なものが提案されているが
マスク部分と非マスク部分(即ち非メッキ部分とメッキ
対象一部分)の境界を明確にするために確実視されてい
るのは非メッキ部分にテープを張付ける方法である。The use of such plating equipment is particularly intended for cost reduction in the plating of gold, silver, and other precious metals.
In such a plating apparatus, a mask means is used to plate only the necessary portions of the material to be plated. Various methods have been proposed for this masking method, but in order to make the boundary between the masked part and the non-masked part (i.e. the non-plated part and the part to be plated) clear, the most reliable method is to tape the non-plated part. This is a method of attaching.
テープの張付け、メッキ処理後の引離しを厭わなければ
メッキ対象部分と非対象部分とをスツキリ出すことは十
分可能である。然しながら、この場合、テープの粘着、
剥離に手間と時間が掛かり、極端なときはテープに因つ
てメッキ対象部分が損傷を受けることもある。If you don't mind applying the tape and separating it after plating, it is quite possible to clearly expose the parts to be plated and the parts not to be plated. However, in this case, the adhesiveness of the tape
Peeling takes time and effort, and in extreme cases, the tape may damage the area to be plated.
そこて最近注目を集めているのが、シート又はプレート
状のマスク材に開口を形成し、このマスク材を被メッキ
材に密着させて開口にメッキ液を噴射する装置てある。
この装置に於けるマスク手段は開口の形成に工夫を要す
るものの前述のテープよりも非常に使用し易く特に多量
のメッキ処理に適している。ところが、このマスク手段
はメッキ対象部分と非対象部分の境界を1完全にョ明確
化するのは難しい。それはマスクの開口部分にメッキ液
が残存したり被メッキ材自体にメッキ液が残つたりする
からであつて、そしてメッキ処理後にマスク材と被メッ
キ材を離すと、開口部分やメッキ対象部分の残存メッキ
液が被メッキ材の表面のメッキ対象部分以外に恰も滲み
出すようになり、無電解析出するからである。又、場合
によつては電解析出することもある。勿論、この残存メ
ッキ液の量と非メッキ対象部分での無電解又は電解析出
の生じる度合とは僅かとなるように種々改良されて来て
いるが、理想的にいえばメッキ液が仮令微量であつても
残存しメッキ処理後に漏出するのは好ましくない。本発
明はこの様な状況の下て開発されたものであつて、マス
クの開口にそして更に被メッキ材のメッキ対象部分にメ
ッキ液が残存せぬよう種々の.工夫を加えたメッキ装置
を提案せんとするものてある。Therefore, an apparatus that has recently attracted attention is a device that forms openings in a sheet or plate-shaped mask material, brings the mask material into close contact with a material to be plated, and injects a plating solution into the openings.
Although the mask means in this apparatus requires some ingenuity in forming the openings, it is much easier to use than the above-mentioned tape and is particularly suitable for plating a large amount. However, with this masking means, it is difficult to completely clarify the boundary between the part to be plated and the part not to be plated. This is because the plating solution may remain in the openings of the mask or on the material to be plated, and if the mask material and the material to be plated are separated after plating, the openings or the part to be plated may This is because the remaining plating solution oozes out onto areas other than the parts to be plated on the surface of the material to be plated, and is deposited electrolessly. In some cases, electrolytic deposition may also be performed. Of course, various improvements have been made to minimize the amount of residual plating solution and the degree to which electroless or electrolytic deposition occurs on non-plated areas, but ideally the amount of plating solution should be minimal. Even if it is, it is undesirable for it to remain and leak out after the plating process. The present invention was developed under these circumstances, and various measures have been taken to prevent the plating solution from remaining in the opening of the mask and furthermore on the part to be plated of the material to be plated. There is also an attempt to propose a plating device with some innovations.
即ち本発明は具体的にはメッキ液を水平方向に噴射する
ノズルを内部に備えたメッキボックスと、メッキ液噴射
開口を有しメッキボックスの側面へ交換自在に取付けら
れる蓋体と、被メッキ.材の所望メッキ部分を区画露出
させる開口部を有し蓋体の外側に固定され、予め位置決
めされた被キツキ材へ密着・離反せしめられるマスク体
と、そしてこのマスク体に被メッキ材を対峙させる被メ
ッキ材の位置決め手段とから成り、上記メッキボックス
内にはマスク体の開口部にエアーを噴射するエアーノズ
ルが設けてあることを特徴とするメッキ装置を提供せん
とするものである。That is, the present invention specifically provides a plating box having a nozzle therein for spraying a plating solution in a horizontal direction, a lid body having a plating solution spraying opening and being replaceably attached to the side of the plating box, and a cover to be plated. A mask body is fixed to the outside of the lid body and has an opening for sectioning and exposing the desired plated portion of the material, and is brought into close contact with and separated from a pre-positioned material to be plated, and the material to be plated is made to face this mask body. It is an object of the present invention to provide a plating apparatus comprising a means for positioning a material to be plated, and an air nozzle for injecting air into an opening of a mask body is provided in the plating box.
以下この詳細を図面に基づき説明する。The details will be explained below based on the drawings.
第1図に於いて、1はメッキボックスで、メッキ液を水
平方向に噴射するアノード兼用ノズル2を内部に備える
。3が不溶性のアノードである。In FIG. 1, numeral 1 denotes a plating box, which is equipped with an anode nozzle 2 for spraying a plating solution horizontally. 3 is an insoluble anode.
4は蓋体でメッキ液の噴射開口5を有しメッキボックス
1の側面に交換自在に取付けられる。Reference numeral 4 denotes a lid body which has a plating solution injection opening 5 and is replaceably attached to the side surface of the plating box 1.
従つて、メッキ処理の際、メッキ液の噴射開口5が被メ
ッキ材6で閉じられればメッキボックス1内は密閉状態
を呈する。7はマスク体て被メッキ材6の所望メLツキ
部分Aを区画露出させる開口部8を有し、蓋体4のメッ
キボックス取付反対側へ固定される。Therefore, during the plating process, if the plating solution injection opening 5 is closed by the material to be plated 6, the inside of the plating box 1 will be in a sealed state. A mask body 7 has an opening 8 for sectioning and exposing a desired plated portion A of the material to be plated 6, and is fixed to the opposite side of the lid body 4 where the plating box is attached.
このマスク体7は表面にカソード用の導電帯18を配設
しており全体がほぼプレート形状で同じくプレート形状
の被メッキ材6と密着・離反する。従つて、被メッキ材
6の表面形状に合わせた形状のマスク体が使用される。
このマスク体7は蓋体4に固定されておりマスク体7を
選択使用するとき蓋体4ごと全体を交換てきる。蓋体と
マスク体はいわゆるR.′スク手段ョを構成するもので
両者を予め一体化して形成してもよい。ところて、マス
ク体7の開口部8はメッキ液の噴射開口5に連通されて
おりこの噴射開口5は先細形状の傾斜面9より形成され
る。10は被メッキ材の位置決め手段で、マスク体7に
被メッキ材6を対峙させる。This mask body 7 has a conductive band 18 for a cathode on its surface, and is generally plate-shaped as a whole, and comes into close contact with and separates from the material 6 to be plated, which also has a plate shape. Therefore, a mask body having a shape matching the surface shape of the material to be plated 6 is used.
This mask body 7 is fixed to the lid body 4, and when the mask body 7 is selectively used, the entire lid body 4 can be replaced. The lid body and mask body are so-called R. 'The two components may constitute the screen means and may be formed by integrating them in advance. Incidentally, the opening 8 of the mask body 7 is communicated with the plating solution injection opening 5, and the injection opening 5 is formed of a tapered inclined surface 9. Reference numeral 10 denotes a positioning means for the material to be plated, which causes the material to be plated 6 to face the mask body 7.
第1図の例では垂直状に配置したベースプレート11に
ピン12が突出形成されて位置決め手段を構成するが勿
論被メッキ材6の形状に合わせ他のものを採用できる。
この位置決め手段10と、蓋体14を介しマスク体7を
取付けたメッキボックス1とは、少なくとも片方が他方
に対して近接、密着そして離反自在なものとする。第1
図の例ではメッキボックス1が図示せぬエアーシリンダ
ーにて矢印X方向に移動、後退自在にされている。そし
て、13はフレキシブルホースでアノード兼用ノズル2
へメッキ液を圧送供給する。14はメッキ液の回収バイ
ブで図示せぬメッキタンクに連通されている。In the example shown in FIG. 1, a pin 12 is formed protruding from a base plate 11 disposed vertically to constitute a positioning means, but of course other pins can be adopted depending on the shape of the material 6 to be plated.
At least one of the positioning means 10 and the plating box 1 to which the mask body 7 is attached via the lid 14 is capable of approaching, adhering to, and separating from the other. 1st
In the illustrated example, the plating box 1 is movable and retracted in the direction of arrow X by an air cylinder (not shown). 13 is a flexible hose that also serves as an anode nozzle 2.
Plating solution is supplied under pressure. Reference numeral 14 is a plating solution recovery vibe, which is connected to a plating tank (not shown).
この様なメッキ装置の構成を前提として、エアーノズル
15がメッキボックス1内部に組込まれている。The air nozzle 15 is built into the plating box 1 based on the configuration of the plating apparatus as described above.
これが本発明の最大の特色で、エアーノズル15はマス
ク体7の開口部8の全体にエアーを噴射するものて、噴
射角度を可変とし、マスク体7と蓋体14の交換に相応
させてどの様な位置の開口部8にもエアーを吹付けるこ
とが可能にできる。このため第1図の例ではノズル先端
16が継手17を介し首振り可能にしてある。エアーノ
ズル15はメッキ液噴射用のアノード兼用ノズル2に近
接配置されるが、メッキ液の回収、即ち噴射され戻つて
来るメッキ液流に邪魔とならぬような位置に配置される
ことが好ましくこのためエアーノズル15をアノード兼
用ノズル2と一体化するようにしてもよい。第2図によ
り他の具体例を述べる。This is the most distinctive feature of the present invention. Air can be blown to the opening 8 at various positions. For this reason, in the example shown in FIG. 1, the nozzle tip 16 is made swingable via a joint 17. The air nozzle 15 is placed close to the anode nozzle 2 for spraying the plating solution, but it is preferably placed in a position where it does not interfere with the recovery of the plating solution, that is, the flow of the plating solution that is sprayed and returned. Therefore, the air nozzle 15 may be integrated with the anode nozzle 2. Another specific example will be described with reference to FIG.
基本的構成は第1図のものと同様であるが、メッキボッ
クスは対向する一対のものとして示され又、エアーノズ
ルがアノード兼用ノズルに一体化して形成され、更に片
方の蓋体自体に被メッキ材の位置決め手段が具現化され
ている点が異なる。理解に便なるため第1図と同一乃至
類似するところは第2図中で10幡台の同一符号で示し
、以下、特に相違する点につき詳述し第1図の繰返えし
説明となるようなところは簡単に述べる。メッキボック
ス101a,101bは対向配置された1対をなす2つ
のもので、少くとも一方のメッキボックスが他方に対し
近接、離反自在にされる。The basic configuration is the same as that in Figure 1, but the plating boxes are shown as a pair facing each other, and the air nozzle is formed integrally with the anode nozzle, and one of the lids itself is plated. The difference is that means for positioning the material is embodied. For ease of understanding, parts that are the same or similar to those in Fig. 1 are indicated by the same reference numerals at 10 in Fig. 2. Hereinafter, particularly different points will be explained in detail, and the explanation of Fig. 1 will be repeated. I will briefly mention such things. The plating boxes 101a and 101b are a pair of oppositely arranged plating boxes, and at least one of the plating boxes can move toward or away from the other.
図示の例では右方のメッキボックス101b1が図示せ
ぬ圧力シリンダーにて左方へ移動・復元自在にしてある
。これらメッキボックス101a,101b内には一体
化されたアノード兼用ノズル102a,102bとエア
ーノズル115a,115bが設けられる。即ち、アノ
ード兼用ノズル102a,102bの下方部分には不溶
性のアノード103a,103bが設けられ、他方上方
部分にはエアーノズル115a,115bを構成するス
リット状の開口が斜め下方に向けて形成してあり、この
開口にはエアーバイブ19a,19bに連通するエアー
供給箱20a,20bが付設される。そして、エアーノ
ズル115a,115bのエアー噴射方向はマスク体1
07a,107bの開口部108a,108bに向けて
予め調整してある。このマスク体107a,107bは
蓋体104a,104bの対向面側に固定されており、
各々の表面にカソード用の導電帯118a,118bが
配設される。蓋体104aは被メッキ材106の位置決
め手段110としても使用され、上方にピン112が突
出される。このマスク体107a付きの蓋体104aの
正面図は第4図に、又蓋体104aのピン112に吊下
げられる被メッキ材106の正面図が第5図に示される
。図示の被メッキ材(プリント基板)106は下方にメ
ッキ対象部分100Aを有し、マスク体107aの開口
部108aがこのメッキ対象部分を区画露出させる。尚
プリント基板106には適宜の場所に孔21があるので
これをピン112に合わせるようにしたが、被メッキ材
が異なればピンの位置、位置決め手段それ自体、更には
マスク体並びに蓋体も適宜変更使用されるものである。
次に作用を説明する被メッキ材に対する片面メッキ処理
(第1図の具体例)と両面メッキ処理(第2図の具体例
)の差以外は具体的に同じ作用となるので、両面メッキ
処理の場合につき説明する。第3図で示すように、両面
をマスク体107a,107bで挾持された状態の被メ
ッキ材106はそのメッキ対象部分のみがマスク体の開
口部108a,108bより区画露出されており、ここ
にアノード兼用のノズル102a,102bよりメッキ
液が矢印の如く水平方向に噴出され導電帯118a,1
18bを介し陰極化されたメッキ対象部分100Aで電
解メッキが行なわれる。メッキ対象部分100Aに施こ
されたメッキ液は蓋体の噴射開口の傾斜面をつたい開口
部108a,108bより退出し回収される。そして、
メッキ処理後エアーノズル115a,115bよりエア
ーを噴射し開口部の全体に衝突させる。するとメッキ対
象部分100Aに残つているメッキ液や開口部に僅かば
かり残存していたメッキ液は完全に吹き飛ばされてメッ
キ対象部分や開口部より強制的に排除され同じく回収さ
れる。勿論上述のメッキ処理及ひ残存メッキ液の排除回
収処理は密閉化されたメッキボックス101a,101
b内で行なわれることになる。次いでマスク体107a
,107bを被メッキ材106より離反させ被メッキ材
106を取出し、これら一連の操作を繰返えすのである
。尚、被メッキ材106の表面形状やメッキ対象部分の
位置、幅その他が相違すればそれに合致させてマスク体
を蓋体ごと交換し、交換されたマスク体の開口部に相応
させエアーノズルのエアー噴射方向を調整することがで
きる。以上説明したように本発明に拠れば、被メッキ材
のメッキ対象部分めがけてアノード兼用ノズルよりメッ
キ液を水平方向に噴射し、マスク体の開口部内で電解メ
ッキすると共に、メッキ液は蓋体に形成したメッキ液噴
射開口の傾斜面を利用して殆んどの液がマスク体の開口
部より回収され、しかもこの開口部に僅かばかり残存す
るかも知れないメッキ液及び/又はメッキ対象部分に残
るメッキ液はエアーを開口部全体に噴射して衝突させる
ことで強制的に吹き飛ばされ排除回収されるので、メッ
キ処理後マスク体と離反された被メッキ材の表面にマス
ク開口部よりメッキ液が滲み出し又メッキ対象部分の残
余メッキ液が滲み出したりして無電解又は電解析出する
ことがない。更にメッキ処理、メッキ液の回収並びに残
存メッキ液の強制排除と回収の一連の処理は密閉化され
たメッキボックス内で行なわれるので安全で操作し易い
という多くの効果が期待できる。In the illustrated example, the right plating box 101b1 is movable to the left and restored by a pressure cylinder (not shown). In these plating boxes 101a and 101b, integrated anode nozzles 102a and 102b and air nozzles 115a and 115b are provided. That is, insoluble anodes 103a, 103b are provided in the lower portions of the anode nozzles 102a, 102b, and slit-shaped openings constituting air nozzles 115a, 115b are formed diagonally downward in the upper portions. , air supply boxes 20a, 20b are attached to this opening, which communicate with air vibes 19a, 19b. The air jet direction of the air nozzles 115a and 115b is set to the mask body 1.
It is adjusted in advance toward the openings 108a and 108b of 07a and 107b. The mask bodies 107a, 107b are fixed to the opposing surfaces of the lid bodies 104a, 104b,
Conductive bands 118a and 118b for cathodes are provided on each surface. The lid body 104a is also used as a positioning means 110 for the material to be plated 106, and a pin 112 is projected upward. A front view of the lid body 104a with the mask body 107a is shown in FIG. 4, and a front view of the material to be plated 106 suspended from the pin 112 of the lid body 104a is shown in FIG. The illustrated material to be plated (printed circuit board) 106 has a plating target portion 100A below, and the opening 108a of the mask body 107a sections and exposes this plating target portion. Note that the printed circuit board 106 has holes 21 at appropriate locations, so these holes were aligned with the pins 112. However, if the material to be plated is different, the position of the pins, the positioning means itself, and even the mask body and lid body may be changed as appropriate. Modification is what is used.
Next, except for the difference between single-sided plating (specific example in Figure 1) and double-sided plating (specific example in Figure 2) on the material to be plated, the effects are the same, so double-sided plating I will explain each case. As shown in FIG. 3, only the parts to be plated of the material 106 to be plated, which are held between mask bodies 107a and 107b on both sides, are sectioned and exposed through the openings 108a and 108b of the mask bodies, and the anode is placed here. Plating liquid is ejected horizontally as shown by the arrow from the dual-purpose nozzles 102a and 102b, and the conductive bands 118a and 1
Electrolytic plating is performed on the plating target portion 100A which is cathodized through the plating portion 18b. The plating solution applied to the plating target portion 100A exits through the openings 108a and 108b along the slope of the injection opening of the lid and is collected. and,
After the plating process, air is injected from the air nozzles 115a and 115b to collide with the entire opening. Then, the plating solution remaining on the plating target part 100A and the plating solution slightly remaining in the opening are completely blown away and forcibly removed from the plating target part and the opening, and are also recovered. Of course, the above-mentioned plating process and removal and recovery process of the remaining plating solution are performed in the sealed plating boxes 101a and 101.
This will be done within b. Next, the mask body 107a
, 107b are separated from the material to be plated 106, the material to be plated 106 is taken out, and this series of operations is repeated. If the surface shape of the material to be plated 106 or the position, width, etc. of the part to be plated are different, match the mask body with the lid body, and adjust the air nozzle to match the opening of the replaced mask body. The injection direction can be adjusted. As explained above, according to the present invention, the plating solution is sprayed horizontally from the anode nozzle toward the part to be plated on the material to be plated, electrolytic plating is performed within the opening of the mask body, and the plating solution is sprayed onto the lid body. Most of the liquid is recovered from the opening of the mask body by using the slope of the formed plating liquid injection opening, and in addition, a small amount of the plating liquid may remain in this opening and/or the plating remaining on the part to be plated. The liquid is forcibly blown away and collected by spraying air across the entire opening and colliding with it, so the plating liquid oozes out from the mask opening onto the surface of the material to be plated, which is separated from the mask body after plating. Further, the residual plating solution on the part to be plated will not ooze out and cause electroless or electrolytic deposition. Furthermore, since the series of processes including plating, recovery of the plating solution, and forcible removal and recovery of the remaining plating solution are performed in a sealed plating box, many advantages such as safety and ease of operation can be expected.
第1図は本発明の基本的具体例を示す装置の要部断面図
、第2図は他の具体例を示すメッキ装置を要部断面図に
して示す斜視図、第3図は第2図のメッキ装置の使用状
態を示す要部拡大の断面図、第4図は蓋体及びマスク体
の正面図、そして第5図は被メッキ材としてのプリント
基板の概略正面図である。
図中、1,101a,101b・・・・・・メッキボッ
クス、2,102a,102b・・・・アノード兼用ノ
ズル、3,103a,103b・・・・・・アノード、
4,104a,104b・・・・・・蓋体、5,105
a,105b・・・・・・メッキ液の噴射開口、6,1
06・・・・・・被メッキ材、7,107a,107b
・・・・マスク体、8,108a,108b・・・・・
・開口部、9,109a,109b・・・・・・傾斜面
、10,110・・・・・・被メッキ材の位置決め手段
、12,112・・・ゼン、15,115a,115b
・・・・・・エアーノズル、18,118a,118b
・・・・・・カソード用導電帯、A,lOOA・・・・
・・メッキ対象部分。FIG. 1 is a sectional view of a main part of an apparatus showing a basic example of the present invention, FIG. 2 is a perspective view showing a sectional view of a main part of a plating apparatus showing another example, and FIG. FIG. 4 is a front view of a lid and a mask, and FIG. 5 is a schematic front view of a printed circuit board as a material to be plated. In the figure, 1,101a, 101b...Plating box, 2,102a, 102b...Anode nozzle, 3,103a, 103b...Anode,
4,104a,104b...Lid body, 5,105
a, 105b... Plating liquid injection opening, 6, 1
06... Material to be plated, 7, 107a, 107b
...Mask body, 8, 108a, 108b...
・Opening portion, 9, 109a, 109b... Inclined surface, 10, 110... Positioning means for plated material, 12, 112... Zen, 15, 115a, 115b
...Air nozzle, 18, 118a, 118b
...Cathode conductive band, A, lOOA...
・Part to be plated.
Claims (1)
たメッキボックスと、メッキ液噴射開口を有しメッキボ
ックスの側面への交換自在に取付けられる蓋体と、被メ
ッキ材の所望メッキ部分を区面露出させる開口部を有し
蓋体の外側に固定され、予め位置決めされた被メッキ材
へ密着・離反せしめられるマスク体と、そしてこのマス
ク体に被メッキ材を対峙させるメッキ材の位置決め手段
とから成り、上記メッキボックス内にはマスク体の開口
部にエアーを噴射するエアーノズルが設けてあることを
特徴とするメッキ装置。 2 メッキ液ノズル及びエアーノズルを内部に設けた上
部メッキボックスは一対をなす2つのものであつて、少
くとも一方が他方に対し近接・離反自在に対向配置され
、この両メッキボックスは各々対向面側に上記蓋体及び
マスク体を備え、そして被メッキ材の上記位置決め手段
は片方の蓋体に設けてある、特許請求の範囲第1項記載
のメッキ装置。 3 上記エアーノズルはメッキ液ノズルと一体化された
ものである、特許請求の範囲第1項又は第2項記載のメ
ッキ装置。 4 上記エアーノズルはメッキ液ノズルと別途メッキボ
ックス内に設けられたエアーの噴射角度が可変とされる
ものである、特許請求の範囲第1項又は第2項記載のメ
ッキ装置。 5 上記マスク体は陰極導電帯を表面に配設したもので
ある、特許請求の範囲第1項又は第2項記載のメッキ装
置。 6 上記蓋体のメッキ液噴射開口は先細形状の傾斜面に
て形成されるものである、特許請求の範囲第1項又は第
2項記載のメッキ装置。[Scope of Claims] 1. A plating box equipped with a nozzle for spraying a plating solution horizontally, a lid having a plating solution spray opening and replaceably attached to the side of the plating box, and a material to be plated. A mask body is fixed to the outside of the lid body and has an opening that exposes the desired plating portion, and is brought into close contact with and separated from a pre-positioned material to be plated, and the material to be plated is opposed to this mask body. 1. A plating apparatus comprising: means for positioning a plating material; and an air nozzle for injecting air into an opening of a mask body is provided in the plating box. 2. The upper plating box with the plating solution nozzle and the air nozzle inside is a pair, and at least one is placed facing the other so that it can approach and move away from the other. 2. The plating apparatus according to claim 1, wherein the lid body and the mask body are provided on one side, and the means for positioning the material to be plated is provided on one of the lid bodies. 3. The plating apparatus according to claim 1 or 2, wherein the air nozzle is integrated with a plating solution nozzle. 4. The plating apparatus according to claim 1 or 2, wherein the air nozzle is provided in a plating box separately from the plating solution nozzle and has a variable air jet angle. 5. The plating apparatus according to claim 1 or 2, wherein the mask body has a cathode conductive band disposed on its surface. 6. The plating apparatus according to claim 1 or 2, wherein the plating liquid injection opening of the lid body is formed by a tapered inclined surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10079378A JPS6059997B2 (en) | 1978-08-18 | 1978-08-18 | plating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10079378A JPS6059997B2 (en) | 1978-08-18 | 1978-08-18 | plating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5528339A JPS5528339A (en) | 1980-02-28 |
| JPS6059997B2 true JPS6059997B2 (en) | 1985-12-27 |
Family
ID=14283300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10079378A Expired JPS6059997B2 (en) | 1978-08-18 | 1978-08-18 | plating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6059997B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0762270B2 (en) * | 1985-06-17 | 1995-07-05 | 株式会社日立製作所 | Partial plating method |
| KR100974266B1 (en) * | 2008-08-12 | 2010-08-06 | (주) 세기정밀 | Leadframe Double Sided Silver Plating Equipment |
| JP6135538B2 (en) * | 2014-02-13 | 2017-05-31 | 株式会社デンソー | Plating apparatus and plating method |
-
1978
- 1978-08-18 JP JP10079378A patent/JPS6059997B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5528339A (en) | 1980-02-28 |
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