JPS6113201B2 - - Google Patents
Info
- Publication number
- JPS6113201B2 JPS6113201B2 JP15355179A JP15355179A JPS6113201B2 JP S6113201 B2 JPS6113201 B2 JP S6113201B2 JP 15355179 A JP15355179 A JP 15355179A JP 15355179 A JP15355179 A JP 15355179A JP S6113201 B2 JPS6113201 B2 JP S6113201B2
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- sheet
- light guide
- monomer
- low refractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000178 monomer Substances 0.000 claims description 52
- 229920000642 polymer Polymers 0.000 claims description 18
- 229920003023 plastic Polymers 0.000 claims description 15
- 239000004033 plastic Substances 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 12
- 239000010408 film Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 230000000379 polymerizing effect Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 10
- 238000005253 cladding Methods 0.000 description 6
- 239000002985 plastic film Substances 0.000 description 6
- 229920002100 high-refractive-index polymer Polymers 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000012808 vapor phase Substances 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 238000011978 dissolution method Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 229920005601 base polymer Polymers 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- JMMZCWZIJXAGKW-UHFFFAOYSA-N 2-methylpent-2-ene Chemical compound CCC=C(C)C JMMZCWZIJXAGKW-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Optical Integrated Circuits (AREA)
Description
本発明はプラスチツク導光路シートの製造方法
に関するものである。さらに詳細には紫外線重合
性モノマをプラスチツク透明フイルム中で重合せ
しめることによりマスクパターン通りの導光路シ
ートを製造する新規な方法を提供することにあ
る。
光通信用分岐路又は縮象用フアイバーシートな
どにプラスチツク透明シートからなる導光路シー
トが採用されている。この導光路シートは図に示
すように屈折率の高い部分(導光路部分)1と屈
折率の低い部分(クラツド部分)2とからなり、
導光路部分1を光が全反射あるいは屈折しながら
伝播していくように構成されている。斯る導光路
シートにおいて導光路部分1とクラツド部分2と
の屈折率の差が小さいと、大きな角度で曲折した
光路の場合入射した光が自由に進むことができ
ず、このため高度の機能を備えた導光路を集積さ
せるためには前記屈折率の差を大きくして光を自
由に進めるようにしなければならない。
従来のこの種プラスチツク導光路シートは、低
屈折率モノマを高屈折率プラスチツク透明シート
中に分散させしかるのちマスクパターンを該シー
トに密着せしめて紫外線を照射し、導光路以外に
存在するモノマを重合させ、次で導光路部分に残
存するモノマを真空中において蒸発除去せしめる
製造方法が採られていた。この製造方法において
低屈折率モノマを高屈折率プラスチツク透明シー
ト中に分散せしめるには、シートをキヤスト法で
製造するときに溶媒と相溶性のよいモノマを溶媒
中に溶解しておき、モノマと溶媒との沸点の差を
利用して溶媒のみを蒸発除去してキヤストシート
完成時にモノマだけをシート中に残留させる方法
(以下モノマ同時溶解法という)をとり、然る後
モノマ分散シートにモノマの蒸発を防ぎながら短
時間のうちにマスクパターンを焼付けていた。し
かしながらこのモノマ同時溶解法においてはキヤ
ストシートが出来上つた時点を把握することが非
常に難かしく、シート乾燥時間が長すぎるとモノ
マまでも蒸発除去してしまうことになり導光路部
分とクラツド部分との屈折率差の小さな導光路シ
ートしか得られず、逆に乾燥時間が短かすぎると
シート表面の硬度が充分でなくマスクパターン焼
付時にシートが変形してしまう等のトラブルが発
生し満足な導光路シートを得ることが困難であつ
た。
また、モノマをプラスチツク透明シート中に分
散せしめる方法として、モノマの気相拡散法も提
案されている。この方法は紫外線増感剤を分散さ
せた高屈折率プラスチツク透明シートをキヤスト
法、溶解押出法などの製膜方法により製造し、こ
のシートを、モノマの飽和蒸気を満たした容器中
に放置してシートにモノマを拡散させ、しかるの
ち前述のモノマ同時溶解法と同じプロセスでマス
クパターンを焼付ける方法が採られている。この
気相拡散法によればシート表面又は表面層に近い
部分にモノマが集り易く、仕上つた導光路シート
に割れが入り易い欠点があつた。
本願発明者等は上記プロセスの諸欠点を一挙に
解決するため鋭意研究を重ねた結果、末重合モノ
マの一部を前もつて重合させることによりシート
表面にポリマ膜を生成させ、該ポリマ膜でモノマ
を包むことによりマスクパターン焼付操作及び導
光路以外に存在するモノマを重合せしめたのちの
導光路に残存する末反応モノマの除去に対し、何
等支障をきたすことなく導光路部分とクラツド部
分との屈折率差の大きい導光路シートを得る方法
を完成した。
即ち、本発明の要旨はプラスチツク透明シート
中に導光路を形成する際、低屈折率モノマを含有
する高屈折率シートの表面に、まず低屈折率モノ
マを選択的に重合せしめて低屈折率ポリマの薄膜
層を形成させ、末反応モノマをシート内部に閉じ
込めたのち所望のマスクパターンを焼付け、しか
るのち導光路となる部分に残存する末反応モノマ
を蒸発除去することを特徴とするものである。
なお、低屈折率ポリマ薄膜層はマスクパターン
焼付け後の末反応モノマ蒸発除去には殆んど支障
がない。
本発明で用いる導光路シート製造用プラスチツ
クとしては、その屈折率を基準に任意に選択でき
るが、ポリマをモノマ、或はポリマ/モノマ/溶
媒、との相溶性、これら各成分溶液の膜形成能、
とりわけ透明膜の形成能を考慮しながら、高屈折
率ポリマと低屈折率ポリマの組合せを見出す必要
がある。従つてここで用いることのできるシート
用プラスチツクポリマとしては、例えば、ポリガ
ーボネート、ポリスチレン、ポリメタクリル酸メ
チル、ジアレルフタレート、ジ.グリコール.
ジ.アリルカーボネツト(CR―39)、ポリ―4.メ
チルペンテン.1、ポリビニルブチラール、酢酸
酪酸セルロース、ポリアクリル酸メチル、など何
れも光透過率が80%以上の透明プラスチツクが好
ましく、またモノマとしては、比較的沸点が低
く、屈折率も小さくさらにポリマの溶液と相溶性
が優れていて紫外線重合したポリマの透明度も優
れている例えば、アクリル酸メチル、メタクリル
酸メチル、アクリル酸エチル、アクリル酸イソブ
チル、アクリル酸2―ハイドロキシエチル、アク
リル酸2―ハイドロキシプロピル、アクリル酸2
―シアノエチル、アクリル酸シクロヘキシル、メ
タクリル酸エチルなどその沸点が120℃以下で屈
折率が1.50以下のものが好適である。
本発明は上記ポリマ及びモノマから任意に選択
した一種またはそれ以上の高屈折率ポリマと低屈
折率モノマとをモノマ同時溶解法又は気相拡散法
等により低屈折率モノマを分散せしめた高屈折率
プラスチツクシートを作成し、該シート表面の低
屈折率モノマをまず重合せしめて低屈折率ポリマ
薄膜層を形成し、次で低屈折率ポリマ薄膜層を設
けたプラスチツク透明シートにマスクパターン焼
付処理を施してクラツド部分となる低屈折率モノ
マを重合せしめて後真空容器中で導光路部分に残
存する末反応モノマを除去することによつて導光
路シートを製造する。
本発明において、低屈折率モノマを分散せしめ
た高屈折率プラスチツクシートの表面に低屈折率
ポリマの薄膜層を形成せしめるには強度の弱い紫
外線を均一に照射する方法が採られる。強度の弱
い紫外線はランプ入力100W/cm以下の紫外線ラン
プが好適であり、照射時間はモノマの種類、増感
剤の種類、濃度によつて感光波長域が違つてくる
ので一概に規定することはできないが通常は数分
以内に完了することが望ましい。またベースシー
トとなる高屈折率プラスチツクシートの膜厚は20
μ〜250μが好適であり望ましくは50μ〜120μが
適当で、過度に薄いベースシートを使つた場合は
モノマが揮発し易く表面に形成せしめる低屈折率
ポリマ薄膜層の被覆効果が充分得られず、厚手の
シートを用いるとマスクをかけて照射するとき斑
が出来易く好ましくない。
低屈折率モノマをベースシートに含有せしめる
割合は、膜形成時の透明性、製膜過程におけるモ
ノマの減少、膜厚の影響、製膜終了時のベースシ
ートの機械的性質主として硬さ、しなやかさ等を
考慮し、同時に期待される屈折率差の大きさも考
え合せモノマ濃度を決定すべきであり、通常はモ
ノマ濃度をベースポリマの60%以下、望ましくは
10〜50%の範囲とすることが好ましい。この領域
のモノマ濃度を用いると導光路部分とクラツド部
分の屈折率差が、高屈折率ポリマと低屈折率ポリ
マ夫々の屈折率の差の10%以上、通常は15%以上
に及ぶようになる。マスク焼付用紫外線は、表面
層形成用紫外線と同一のものでも良いが、なるべ
くは別のものを用意ることが好ましく通常、高圧
水銀灯、超高圧水銀灯または紫外線レーザを使用
する。
以上述べたように本発明によれば、低屈折率モ
ノマを分散せしめたプラスチツクシートの表面に
低屈折率モノマを選択重合せしめた低屈折率ポリ
マ薄膜層を形成してマスクパターンを紫外線照射
により焼付けるプロセスで、製膜時やマスクパタ
ーン焼付時におけるモノマの蒸発を抑制し、低屈
折率モノマを効果的に重合せしめることができ、
その結果屈折率の大きな導光路シートが得られ、
導光路部とクラツド部との屈折率差が大きくとれ
るので大きな角度の曲折ができる導光路を構成す
ることができ、分岐回路、方向変換回路、交叉回
路など通常のガラスフアイバーでは到底達成でき
なかつた応用回路まで容易に作ることができる。
また気相拡散法により製造された導光路シートの
欠点であつた割れも表面低屈折率ポリマ薄膜層に
より補強され、割れが入ることもなく経年安定し
た良好な導光路シートを得ることができる。
次に本発明の具体例を説明する。
高屈折率ポリマとして、ビスフエノール型ポリ
カーボネート(バイエル社製)を使つて導光路シ
ートを作つた。キヤスト法によりシートを得るた
めポリマ溶液を表1のような組成により調製し
た。
The present invention relates to a method of manufacturing a plastic light guide sheet. More specifically, it is an object of the present invention to provide a novel method for producing a light guide sheet according to a mask pattern by polymerizing an ultraviolet ray polymerizable monomer in a plastic transparent film. Light guide sheets made of transparent plastic sheets are used for branch paths for optical communication or fiber sheets for abstraction. As shown in the figure, this light guide sheet consists of a part with a high refractive index (light guide part) 1 and a part with a low refractive index (clad part) 2,
It is configured such that light propagates through the light guide portion 1 while undergoing total reflection or refraction. In such a light guide sheet, if the difference in refractive index between the light guide section 1 and the cladding section 2 is small, the incident light will not be able to travel freely in the case of an optical path bent at a large angle. In order to integrate the provided light guide paths, it is necessary to increase the difference in the refractive index to allow light to travel freely. Conventionally, this kind of plastic light guide sheet is made by dispersing a low refractive index monomer in a high refractive index plastic transparent sheet, then placing a mask pattern in close contact with the sheet and irradiating it with ultraviolet rays to polymerize the monomers present outside the light guide. A manufacturing method has been adopted in which the monomer remaining in the light guide portion is then evaporated and removed in a vacuum. In this production method, in order to disperse a low refractive index monomer in a high refractive index plastic transparent sheet, a monomer that is compatible with the solvent is dissolved in the solvent when the sheet is produced by the casting method, and the monomer and the solvent are dissolved in the solvent. This method utilizes the difference in boiling point between the The mask pattern was printed in a short time while preventing However, in this monomer simultaneous dissolution method, it is very difficult to know when the cast sheet is completed, and if the sheet drying time is too long, even the monomer will evaporate and be removed, and the light guide portion and cladding portion will be separated. On the other hand, if the drying time is too short, problems such as deformation of the sheet during mask pattern printing may occur due to insufficient hardness of the sheet surface, resulting in a satisfactory guide sheet. It was difficult to obtain an optical path sheet. A vapor phase diffusion method of monomers has also been proposed as a method of dispersing monomers in transparent plastic sheets. In this method, a transparent sheet of high refractive index plastic in which an ultraviolet sensitizer is dispersed is manufactured by a film forming method such as a casting method or melt extrusion method, and this sheet is left in a container filled with saturated vapor of monomer. A method is used in which a monomer is diffused into a sheet and then a mask pattern is printed using the same process as the monomer simultaneous dissolution method described above. This vapor phase diffusion method has the drawback that the monomer tends to collect on the sheet surface or in a portion close to the surface layer, and the finished light guide sheet is prone to cracking. The inventors of the present application have conducted extensive research in order to solve all of the drawbacks of the above processes at once, and as a result, they have created a polymer film on the sheet surface by pre-polymerizing a part of the end-polymerized monomer. By wrapping the monomer, it is possible to connect the light guide portion and the cladding portion without causing any hindrance to the mask pattern printing operation and the removal of unreacted monomers remaining in the light guide after superimposing monomers existing outside the light guide. We have completed a method to obtain a light guide sheet with a large refractive index difference. That is, the gist of the present invention is that when forming a light guide path in a plastic transparent sheet, first, a low refractive index monomer is selectively polymerized on the surface of a high refractive index sheet containing a low refractive index monomer, and then a low refractive index polymer is formed. The method is characterized in that a thin film layer is formed to confine the terminally reactive monomer inside the sheet, a desired mask pattern is printed, and then the terminally reactive monomer remaining in the portion that will become the light guide path is removed by evaporation. Note that the low refractive index polymer thin film layer has almost no problem in evaporating and removing the reactive monomer after the mask pattern is baked. The plastic for manufacturing the light guide sheet used in the present invention can be arbitrarily selected based on its refractive index, but the compatibility of the polymer with the monomer or polymer/monomer/solvent, and the film-forming ability of the solution of each of these components are important. ,
In particular, it is necessary to find a combination of a high refractive index polymer and a low refractive index polymer, taking into consideration the ability to form a transparent film. Therefore, the plastic polymers for the sheet that can be used here include, for example, polygarbonate, polystyrene, polymethyl methacrylate, diallyl phthalate, di. Glycol.
J. Allyl carbonet (CR-39), poly-4.methylpentene. 1. Transparent plastics such as polyvinyl butyral, cellulose acetate butyrate, polymethyl acrylate, etc., each having a light transmittance of 80% or more are preferable, and as monomers, they have a relatively low boiling point and a small refractive index. Excellent compatibility and transparency of UV-polymerized polymers.For example, methyl acrylate, methyl methacrylate, ethyl acrylate, isobutyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, acrylic acid. 2
- Cyanoethyl, cyclohexyl acrylate, ethyl methacrylate, etc., which have a boiling point of 120°C or less and a refractive index of 1.50 or less are preferred. The present invention provides high refractive index polymers in which one or more high refractive index polymers and low refractive index monomers arbitrarily selected from the above polymers and monomers are dispersed by a monomer simultaneous dissolution method or a vapor phase diffusion method. A plastic sheet is prepared, a low refractive index monomer on the surface of the sheet is first polymerized to form a low refractive index polymer thin film layer, and then a mask pattern baking process is performed on the plastic transparent sheet provided with the low refractive index polymer thin film layer. A light guide sheet is manufactured by polymerizing a low refractive index monomer that will become a cladding portion, and then removing unreacted monomers remaining in the light guide portion in a vacuum container. In the present invention, in order to form a thin film layer of a low refractive index polymer on the surface of a high refractive index plastic sheet in which a low refractive index monomer is dispersed, a method of uniformly irradiating low-intensity ultraviolet rays is adopted. An ultraviolet lamp with a lamp input of 100 W/cm or less is suitable for low-intensity ultraviolet rays, and the irradiation time cannot be unconditionally specified because the sensitive wavelength range varies depending on the type of monomer, the type of sensitizer, and the concentration. Although this is not possible, it is usually desirable to complete within a few minutes. In addition, the film thickness of the high refractive index plastic sheet that becomes the base sheet is 20
μ~250μ is suitable, and desirably 50μ~120μ is suitable. If an excessively thin base sheet is used, the monomer will easily volatilize and the coating effect of the low refractive index polymer thin film layer formed on the surface will not be obtained sufficiently. Using a thick sheet is undesirable because it tends to cause spots when irradiating with a mask on. The proportion of low refractive index monomers contained in the base sheet depends on transparency during film formation, reduction of monomer during film formation, influence of film thickness, and mechanical properties of the base sheet at the end of film formation, mainly hardness and flexibility. The monomer concentration should be determined by taking into consideration the expected refractive index difference, and usually the monomer concentration should be 60% or less of the base polymer, preferably 60% or less of the base polymer.
It is preferably in the range of 10 to 50%. When using a monomer concentration in this range, the refractive index difference between the light guide portion and the cladding portion will be 10% or more, usually 15% or more, of the refractive index difference between the high refractive index polymer and the low refractive index polymer, respectively. . The ultraviolet light for mask baking may be the same as the ultraviolet light for forming the surface layer, but it is preferable to prepare a different one if possible, and usually a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, or an ultraviolet laser is used. As described above, according to the present invention, a low refractive index polymer thin film layer in which a low refractive index monomer is selectively polymerized is formed on the surface of a plastic sheet in which a low refractive index monomer is dispersed, and a mask pattern is baked by ultraviolet irradiation. The attaching process suppresses monomer evaporation during film formation and mask pattern baking, and effectively polymerizes low refractive index monomers.
As a result, a light guide sheet with a large refractive index is obtained,
Since there is a large difference in refractive index between the light guide section and the cladding section, it is possible to construct a light guide path that can bend at a large angle, which is impossible to achieve with ordinary glass fibers such as branch circuits, direction conversion circuits, and crossover circuits. Application circuits can be easily created.
In addition, cracks, which were a drawback of light guide sheets produced by the vapor phase diffusion method, are reinforced by the low refractive index polymer thin film layer on the surface, making it possible to obtain a good light guide sheet that is stable over time without any cracks. Next, specific examples of the present invention will be explained. A light guide sheet was made using bisphenol polycarbonate (manufactured by Bayer) as a high refractive index polymer. In order to obtain a sheet by the casting method, a polymer solution having the composition shown in Table 1 was prepared.
【表】
この溶液を研摩したステンレス容器(20×15
cm)に流し込み、さらに容器全体を密閉容器に入
れて、乾燥窒素を200c.c./分で流し込んで、塩化
メチレンを蒸発させた。約3時間後に厚さ50μの
透明シートが得られた。このシート中には、ポリ
カーボネートをベースとして、モノマ、増感剤、
重合禁止剤が均一に分散している。この状態にあ
るシートの両面から高圧水銀灯(ランプ入力:80
W/cm)を60秒照射したシート断面の顕微鏡観察
結果から、シート表面にポリメタクリル酸メチル
の薄膜層が形成された。この処理が終つたシート
の内部には末反応モノマが高濃度で充填されてい
る。このシートを、パイレツクスガラス表面にク
ロム皮膜をエツチング法により焼付けた導光路パ
ターンに密着させ超高圧水銀灯(ランプ入力:
120W/cm)により180秒焼付処理した。
次に10-5mmHgに保つた真空容器中で導光路部
分に残る末反応モノマを除去した。
比較のために、プロセスの途中で低屈折率ポリ
マ薄膜層形成処理しないサンプルを同一照射条件
により作成して両者を比較した結果表2のように
両者の光学的性質に大巾な差が認められ本発明の
効果が実証された。
表2の結果から明らかなように本発明によれ
ば、屈折率差が大きなものが得られ導光路のNA
値も大きく、またシートの弾性率も大きく損失も
小さなものが得られる。[Table] Polished stainless steel container (20 x 15
cm), the entire container was placed in a sealed container, and dry nitrogen was flushed at 200 c.c./min to evaporate the methylene chloride. After about 3 hours, a transparent sheet with a thickness of 50 μm was obtained. This sheet contains monomers, sensitizers,
Polymerization inhibitor is uniformly dispersed. A high-pressure mercury lamp (lamp input: 80
Microscopic observation of the cross section of the sheet after 60 seconds of irradiation with (W/cm) revealed that a thin film layer of polymethyl methacrylate was formed on the sheet surface. After this treatment, the interior of the sheet is filled with highly concentrated reactive monomers. This sheet is closely attached to a light guide pattern made by etching a chromium film on the surface of Pyrex glass, and is attached to an ultra-high pressure mercury lamp (lamp input:
120W/cm) for 180 seconds. Next, the unreacted monomer remaining in the light guide was removed in a vacuum container maintained at 10 -5 mmHg. For comparison, we created a sample under the same irradiation conditions that did not undergo the process to form a low refractive index polymer thin film layer during the process, and compared the two.As shown in Table 2, a large difference in the optical properties of the two was observed. The effects of the present invention were demonstrated. As is clear from the results in Table 2, according to the present invention, a device with a large refractive index difference can be obtained, and the NA of the light guide path is
It is possible to obtain a sheet with a large value, a large elastic modulus, and a small loss.
【表】
*屈折率差、干渉顕微鏡で測定。
[Table] *Refractive index difference, measured using an interference microscope.
図は導光路シートの構成説明図である。 1:導光路部分、2:クラツド部分。 The figure is an explanatory diagram of the structure of the light guide sheet. 1: Light guide portion, 2: Clad portion.
Claims (1)
スチツク透明フイルムの表面に前記低屈折率モノ
マを重合せしめた低屈折率ポリマ薄膜層を形成せ
しめたのち、所望のマスクパターンで遮光しなが
ら薄膜層内に分散した低屈折率モノマを紫外線で
選択的に重合し、しかるのち導光路部分に存在す
る未反応モノマを除去することを特徴とするプラ
スチツク導光路シートの製造方法。1. After forming a low refractive index polymer thin film layer in which the low refractive index monomer is polymerized on the surface of a high refractive index plastic transparent film in which a low refractive index monomer is dispersed, a desired mask pattern is used to block light and the inside of the thin film layer is formed. 1. A method for producing a plastic light guide sheet, which comprises selectively polymerizing low refractive index monomers dispersed in the light guide with ultraviolet light, and then removing unreacted monomers present in the light guide portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15355179A JPS5677806A (en) | 1979-11-29 | 1979-11-29 | Manufacture of plastic light conduction path sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15355179A JPS5677806A (en) | 1979-11-29 | 1979-11-29 | Manufacture of plastic light conduction path sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5677806A JPS5677806A (en) | 1981-06-26 |
| JPS6113201B2 true JPS6113201B2 (en) | 1986-04-12 |
Family
ID=15564972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15355179A Granted JPS5677806A (en) | 1979-11-29 | 1979-11-29 | Manufacture of plastic light conduction path sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5677806A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62195002U (en) * | 1986-06-03 | 1987-12-11 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2007533A1 (en) * | 1989-01-13 | 1990-07-13 | Bruce Lee Booth | Optical waveguide devices, elements for making the devices and methods for making the device and elements |
| JPH0534364U (en) * | 1991-10-11 | 1993-05-07 | 中部工機株式会社 | Chiyo valve |
-
1979
- 1979-11-29 JP JP15355179A patent/JPS5677806A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62195002U (en) * | 1986-06-03 | 1987-12-11 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5677806A (en) | 1981-06-26 |
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