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JPH0233296B2 - - Google Patents
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JPH0233296B2 - - Google Patents

Info

Publication number
JPH0233296B2
JPH0233296B2 JP58080615A JP8061583A JPH0233296B2 JP H0233296 B2 JPH0233296 B2 JP H0233296B2 JP 58080615 A JP58080615 A JP 58080615A JP 8061583 A JP8061583 A JP 8061583A JP H0233296 B2 JPH0233296 B2 JP H0233296B2
Authority
JP
Japan
Prior art keywords
monomer
lens
substrate
transparent gel
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58080615A
Other languages
Japanese (ja)
Other versions
JPS59204519A (en
Inventor
Juichi Aoki
Motoaki Yoshida
Masaaki Funaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP58080615A priority Critical patent/JPS59204519A/en
Publication of JPS59204519A publication Critical patent/JPS59204519A/en
Publication of JPH0233296B2 publication Critical patent/JPH0233296B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00009Production of simple or compound lenses
    • B29D11/00432Auxiliary operations, e.g. machines for filling the moulds
    • B29D11/00442Curing the lens material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00009Production of simple or compound lenses
    • B29D11/00355Production of simple or compound lenses with a refractive index gradient

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Focusing (AREA)
  • Optical Integrated Circuits (AREA)

Description

【発明の詳现な説明】 本発明は合成暹脂から成る透明基板䞭に屈折率
分垃型レンズ郚分を圢成したレンズ䜓を補造する
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a lens body in which a gradient index lens portion is formed in a transparent substrate made of synthetic resin.

平行平面をも぀透明基板内に、光軞方向に二乗
近䌌で倉化する屈折率分垃および光軞を含む少
なくずも䞀぀の断面内で光軞から遠ざかるに぀れ
お二乗近䌌で次第に倉化する屈折率分垃をも぀屈
折率分垃型レンズ郚分を間隔をおいおラむン状に
あるいはマトリクス状に倚数圢成した平面レンズ
が知られおいる。このような平面レンズにおい
お、レンズ郚分は光軞を含む党おの断面内で䞊蚘
のような屈折率分垃をも぀レンズすなわち円圢レ
ンズである堎合もあれば、぀の断面内で光軞か
ら離れるにしたがい次第に倉化する屈折率分垃を
もち、これず盎亀する断面内では光軞からの距離
によらず屈折率が䞀定であるようなレンズいわゆ
るカマボコ型レンズである堎合もある。
In a transparent substrate with parallel planes, there is a refractive index distribution that changes with square approximation in the optical axis direction. A planar lens in which a large number of refractive index gradient lens parts are formed in a line or matrix shape at intervals, and the refractive index distribution gradually changes in a square approximation as it moves away from the optical axis within at least one cross section that includes the optical axis. Are known. In such a flat lens, the lens part may be a lens with the above-mentioned refractive index distribution in all cross sections including the optical axis, that is, a circular lens, or it may be a circular lens with a refractive index distribution as described above in all cross sections including the optical axis. In some cases, the lens has a refractive index distribution that gradually changes, and the refractive index is constant regardless of the distance from the optical axis in a cross section perpendicular to this, so-called a semicylindrical lens.

䞊述のような平面レンズは耇写機やフアクシミ
リの光孊系など皮々の甚途における画像䌝送玠子
ずしお、あるいは光源ず光フアむバヌずの光結合
系、光フアむバヌの䞭間に枛衰噚たたな分岐回路
を挿入するための平行光倉換玠子など光通信甚の
呚蟺デバむス等に有甚である。
The above-mentioned plane lenses are used as image transmission elements in various applications such as optical systems of copying machines and facsimile machines, or in optical coupling systems between light sources and optical fibers, or for inserting attenuators or branch circuits between optical fibers. It is useful for peripheral devices for optical communications, such as parallel light conversion elements.

䞊述のような平面レンズを合成暹脂を甚いお補
䜜する堎合、第図に瀺すように屈折率Naの網
状重合䜓共重合䜓を含むPaを生成する単量
䜓単量䜓混合物を含むMaを䞀郚重合しお透
明ゲル状の基板を぀くり、この基板の衚
面に圢成すべきレンズ郚分のパタヌンに合わせた
開口を蚭けたマスクを斜し、この開口
を通しお基板䞭に䞊蚘屈折率Naずは異なる屈
折率Nbの重合䜓共重合䜓を含むPbを生成す
る単量䜓単量䜓混合物を含むMbを拡散及び
重合させおレンズ郚分を圢成する方法が知ら
れおいる。この堎合NaNbであれば基板䞭に圢
成されるレンズ郚分は凹レンズ䜜甚をもち、
NaNbであれば凞レンズ䜜甚をも぀こずにな
る。
When manufacturing a plane lens as described above using a synthetic resin, as shown in Figure 1, a monomer (monomer mixture) that produces a network polymer (including copolymer) Pa with a refractive index of Na is used. A transparent gel-like substrate 10 is made by partially polymerizing Ma (including Ma), and a mask 12 with openings 11 corresponding to the pattern of the lens portion to be formed is applied to the surface of this substrate 10.
A monomer (including a monomer mixture) Mb that produces a polymer (including a copolymer) Pb having a refractive index Nb different from the above-mentioned refractive index Na is diffused and polymerized into the substrate through the lens portion 13. There are known methods of forming . In this case, if Na>Nb, the lens portion 13 formed in the substrate has a concave lens effect,
If Na<Nb, it will have a convex lens effect.

たた、他の方法ずしお第図に瀺すように䞊蚘
ず同様の透明ゲル状基板を぀くり、この基板
面のレンズ郚分に限定しおマスクを斜し、呚
蟺から基板ず重合しおNaは異なる屈折率Nb
の重合䜓を぀くるような単量䜓を拡散する方法も
ある。
As another method, as shown in FIG. 2, a transparent gel-like substrate 14 similar to that described above is made, a mask 15 is applied only to the lens portion of the substrate surface, and Na is polymerized with the substrate 14 from the periphery. Different refractive index Nb
There is also a method of diffusing monomers to form polymers.

この堎合には、基板䞭に圢成されるレンズ郚分
はNaNbであれば凞レンズ䜜甚を瀺し、
NaNbであれば凹レンズ䜜甚を瀺す。
In this case, the lens portion 16 formed in the substrate exhibits a convex lens effect if Na<Nb,
If Na>Nb, it exhibits a concave lens effect.

ずころが、䞊述した様な第図及び第図に瀺
す埓来方法では、単量䜓Mbの拡散を劚げる為に
蚭けられるマスクずゲル基板
ずの密着性が䜙皋良奜でない限り、単量䜓Mb
はマスクずゲル基板ずの間に䟵入し、単量䜓Mb
がゲル基板の衚面党䜓に拡散しおしたうので屈折
率分垃をも぀たレンズ䜓を圢成するこずができな
いずいう問題はしばしば生じおいた。
However, in the conventional method shown in FIGS. 1 and 2 as described above, masks 12, 15 and gel substrates 10, 1 provided to prevent the diffusion of monomer Mb
Unless the adhesion with 4 is very good, monomeric Mb
enters between the mask and the gel substrate, and monomeric Mb
The problem has often arisen that it is impossible to form a lens body with a refractive index distribution because the lens particles diffuse over the entire surface of the gel substrate.

本発明の䞊蚘埓来の問題点を解決し、屈折率分
垃型平面レンズの補造に際しマスクずゲル基板ず
の密着性の問題を回避し埗る新芏な合成暹脂平面
レンズの補造方法を提䟛するこずを目的ずしおい
る。
An object of the present invention is to provide a novel method for manufacturing a synthetic resin flat lens that can solve the above-mentioned conventional problems and avoid the problem of adhesion between a mask and a gel substrate when manufacturing a gradient index flat lens. It is said that

すなわち、本発明に係る合成暹脂平面レンズの
補造方法は、屈折率がNaの網状重合䜓Paを生成
する皮たたは皮以䞊の単量䜓Maを䞍完党に
重合させお透明なゲル状の基板を圢成し、この透
明ゲル基板䞭に、Naずは異なる屈折率Nbを有す
る重合䜓Pbを生成する皮たたは皮以䞊の単
量䜓Mbを拡散・浞透させ前蚘透明ゲル基板の衚
面領域に郚分的硬化凊理を斜しお、圢成すべきレ
ンズ郚分のパタヌンに合わせた硬化郚および未硬
化郚を前蚘衚面領域に圢成し、前蚘透明ゲル基板
の前蚘硬化凊理が斜された偎の衚面を介しお、䞻
ずしお前蚘未硬化郚およびこの未硬化郚に察応し
た前蚘透明ゲル基板の内郚の前蚘単量䜓Mbを陀
去し、これによ぀お、前蚘硬化郚の近傍における
前蚘透明ゲル基板内に前蚘単量䜓Mbが連続的に
倉化する濃床募配でも぀お残留しおいる状態を圢
成し、この状態においお前蚘単量䜓Maおよび
Mbの重合を完結させるこずからな぀おいる。な
お、本発明でいう重合は共重合も含んでいるもの
ずする。
That is, the method for producing a synthetic resin flat lens according to the present invention involves incompletely polymerizing one or more monomers Ma that produces a network polymer Pa having a refractive index of Na to produce a transparent gel-like polymer. A substrate is formed, and one or more monomers Mb that produce a polymer Pb having a refractive index Nb different from that of Na are diffused and permeated into the surface area of the transparent gel substrate. A partial hardening process is applied to the surface area to form a hardened part and an unhardened part in accordance with the pattern of the lens part to be formed, and a hardened part and an unhardened part are formed in the surface area through the surface of the transparent gel substrate on which the hardening process has been performed. Then, the uncured portion and the monomer Mb inside the transparent gel substrate corresponding to the uncured portion are mainly removed. A state is formed in which the monomer Mb remains even in a continuously changing concentration gradient, and in this state, the monomers Ma and
It consists of completing the polymerization of Mb. Note that the term "polymerization" as used in the present invention includes copolymerization.

䞊述したように本発明においおは、透明ゲル基
板の衚面に圢成された硬化郚分を単量䜓Mbを陀
去する際におけるいわばマスクずしお甚いるこず
によ぀お、単量䜓Mbが䞊述したような状態で基
板内に残留するこずになる。この硬化郚分は透明
ゲル基板ず䞀䜓のものであるから、第図及び第
図に瀺すような埓来䟋におけるマスクず透明ゲ
ル基板ずの密着性は問題にならない。したが぀お
所望の屈折率をも぀たレンズ郚分が基板内に圢成
できる。
As described above, in the present invention, by using the hardened portion formed on the surface of the transparent gel substrate as a so-called mask when removing monomer Mb, monomer Mb is kept in the above-mentioned state. It will remain inside the board. Since this hardened portion is integrated with the transparent gel substrate, the adhesion between the mask and the transparent gel substrate in the conventional example shown in FIGS. 1 and 2 is not a problem. Therefore, a lens portion with a desired refractive index can be formed within the substrate.

本発明に係る本発明においお単量䜓Maずしお
は、重合したずきに透明な網状重合䜓ずなるもの
であればいずれも䜿甚可胜であり、分子内に開
裂しお架橋を圢成しうる二重結合を個以䞊有す
る皮たたは皮以䞊の化合物が甚いられおよ
い。この奜適䟋ずしおは、ゞアリルフタレヌト、
ゞアリルむ゜フタレヌト、ゞアリルテレフタレヌ
ト、ゞ゚チレングリコヌルビスアリルカヌボネヌ
トの劂きゞアリル゚ステルトリメリド酞トリア
リル、リン酞トリアリル、亜リン酞トリアリルの
劂きトリアリル゚ステルメタクリル酞アリル、
アクリル酞アリルの劂き䞍飜和酞アリル゚ステ
ルフタル酞ゞビニル、む゜フタル酞ゞビニル、
テレフタル酞ゞビルの劂きビニル゚ステルを挙げ
るこずができる。なお本発明でいう網状重合䜓
Paは、䞊述した劂き単量䜓の皮を重合しお埗
られるホモポリマヌ及びこれらの単量䜓の二皮以
䞊から埗られる共重合䜓、䞊びにこれら単量䜓
Maずスチレン、メタクリル酞゚ステル、安息銙
酞ビニルなどの劂き単量䜓ずの共重合䜓を含んで
いる。たた、この網状重合䜓PaはNaの屈折率を
有しおいるものずする。
In the present invention, any monomer Ma can be used as long as it forms a transparent network polymer when polymerized, and any monomer Ma that can be cleaved into one molecule to form a crosslink can be used. One or more compounds having two or more bonds may be used. Suitable examples include diallyl phthalate,
diallyl esters such as diallyl isophthalate, diallyl terephthalate, diethylene glycol bisallyl carbonate; triallyl esters such as triallyl trimellidate, triallyl phosphate, triallyl phosphite; allyl methacrylate;
Unsaturated acid allyl esters such as allyl acrylate; divinyl phthalate, divinyl isophthalate,
Mention may be made of vinyl esters such as dibyl terephthalate. Note that the network polymer as used in the present invention
Pa is a homopolymer obtained by polymerizing one of the above-mentioned monomers, a copolymer obtained from two or more of these monomers, and a copolymer obtained from two or more of these monomers.
It contains a copolymer of Ma and monomers such as styrene, methacrylate, vinyl benzoate, etc. Further, it is assumed that this network polymer Pa has a refractive index of Na.

本発明ではたず、䞊述した単量䜓Maを重合さ
せお透明なゲル状の基板を䜜補する。単量䜓の重
合は、重合䜓が流動性を倱぀た透明なゲルずな぀
たずころで、すなわち重合未完の状態で䞀旊䞭止
される。この重合を所定の圢状を有する型や枠䞭
で行えばゲル基板の成圢が同時に行える。次いで
埗られたゲル基板に、Naずは異なる屈折率Nbを
有する重合䜓を生成する単量䜓Mbを拡散・浞透
させる。
In the present invention, first, the monomer Ma described above is polymerized to produce a transparent gel-like substrate. Polymerization of the monomer is temporarily stopped when the polymer loses its fluidity and becomes a transparent gel, that is, when the polymerization is incomplete. If this polymerization is carried out in a mold or frame having a predetermined shape, the gel substrate can be formed at the same time. Next, a monomer Mb that produces a polymer having a refractive index Nb different from that of Na is diffused and permeated into the obtained gel substrate.

この過皋で䜿甚する単量䜓Mbずしおは、重合
したずきに、線圢重合䜓ずなるものであ぀おも網
状重合䜓ずなるものであ぀おもよいが、前述した
単量䜓Maず共重合しお透明な共重合䜓を生成し
うるものが奜たしい。このような単量䜓Mbずし
お、スチレン、メタクリル酞゚ステル、アクリル
酞゚ステル、酢酞ビニル、塩化ビニル、アクリロ
ニトリル、ブタゞ゚ンたたはこれらのうちの皮
以䞊からなる混合物が奜適に䜿甚できる。
The monomer Mb used in this process may be one that becomes a linear polymer or a network polymer when polymerized, but it may be one that becomes a linear polymer or a network polymer when polymerized. Preferably, those that can be used to produce a transparent copolymer. As such monomer Mb, styrene, methacrylic ester, acrylic ester, vinyl acetate, vinyl chloride, acrylonitrile, butadiene, or a mixture of two or more of these can be suitably used.

次に、単量䜓Mbを拡散させた前蚘透明ゲル基
板の衚面に斌いお、堎所的に䞍均䞀な重合条件を
䞎えお衚面領域のみを遞択的に硬化させる。堎所
的に䞍均䞀な重合条件ずしおは、局郚加熱、光照
射、電子線照射などが甚いられ埗るが、これらの
内で、可芖光線およびたたは玫倖線の照射が方
法ず簡䟿さず云う点では最適であろう。なお、必
芁であれば、単量䜓Maおよびたたは単量䜓
Mbに、熱重合開始剀、光重合開始剀、光増感剀
などを添加しおおくこずもできる。このように堎
所的に䞍均䞀な重合条件を䞎えお衚面領域を硬化
するこずによ぀お、硬化郚ず未硬化郚ずによ぀お
圢成すべきレンズ郚分に察応するパタヌンを圢成
するようにする。
Next, on the surface of the transparent gel substrate on which the monomer Mb has been diffused, locally non-uniform polymerization conditions are applied to selectively harden only the surface region. Local heating, light irradiation, electron beam irradiation, etc. can be used as locally non-uniform polymerization conditions, but among these, visible light and/or ultraviolet ray irradiation is the most suitable in terms of method and simplicity. Probably. In addition, if necessary, monomer Ma and/or monomer
A thermal polymerization initiator, a photopolymerization initiator, a photosensitizer, etc. can also be added to Mb. By curing the surface region by applying locally non-uniform polymerization conditions in this manner, a pattern corresponding to the lens portion to be formed is formed by the cured portions and uncured portions.

すなわち硬化郚ず未硬郚ずによるパタヌンは、
圢成すべき屈折率分垃型レンズの圢状、倧きさ、
NaずNbずの倧小関係などに䟝぀お決定される。
たた、耇数個のレンズを蚭ける堎合には、それら
の䜍眮関係も前蚘硬化パタヌンに圱響を䞎える。
䟋えば円圢レンズを圢成する堎合には、䞭倮の光
軞郚を䞭心ずした円圢郚に察応する郚分を残しお
それ以倖の郚分を硬化させるか、レンズ郚に察応
する郚分を円盀状に硬化させる。NaNbであれ
ば前者は凞レンズ、埌者は凹レンズになる。Na
Nbであれば前者は凹レンズに、埌者は凞レン
ズになる。カマボコ型レンズを圢成する堎合は、
線状にレンズ郚を残しおそれ以倖の郚分を硬化さ
せるか、レンズ郚に察応する郚分を線状に硬化さ
せる。
In other words, the pattern of hardened parts and unhardened parts is
The shape and size of the gradient index lens to be formed,
It is determined depending on the magnitude relationship between Na and Nb.
Furthermore, when a plurality of lenses are provided, their positional relationship also affects the curing pattern.
For example, when forming a circular lens, either a portion corresponding to the circular portion centered on the central optical axis portion is left and the other portions are hardened, or a portion corresponding to the lens portion is hardened into a disk shape. If Na>Nb, the former becomes a convex lens and the latter becomes a concave lens. Na
<Nb, the former becomes a concave lens, and the latter becomes a convex lens. When forming a semicylindrical lens,
Either the lens portion is left in a linear shape and the other portions are hardened, or the portion corresponding to the lens portion is hardened in a linear shape.

次いで未硬化郚及び基板内郚に拡散しおいる未
重合の単量䜓Mbを前蚘透明ゲル基板のパタヌン
を圢成した衚面を介しお陀去する。陀去する方法
ずしおは、単量䜓Mbの溶解胜をも぀溶剀に浞挬
する方法、枛圧しお気化させる方法、前者の埌に
埌者を行なう方法など、皮々採甚しうる。この様
な方法で前蚘透明ゲル基板から単量䜓Mbを取り
陀く操䜜を行぀た堎合、この工皋の前段階に斌い
お硬化させた郚分を通぀お内郚の単量䜓Mbが抜
けお行くこずは困難であり、䞻ずしお非硬化郚及
びその内郚の単量䜓Mbが未硬化郚を通぀お抜け
出お行く。この珟象に䟝぀お単量䜓Mbの濃床分
垃が硬化郚の近傍の透明ゲル基板内に生じるこず
になる。この様にしお単量䜓Mbの濃床分垃を透
明ゲル基板内に圢成した埌に、単量䜓Ma及び残
留しおいる単量䜓Mbの重合を完結させ、単量䜓
Mbの分垃を固定化するこずにより、䞊蚘した様
な屈折率分垃型レンズ郚分をプラスチツク基板内
に圢成するこずができる。
Next, the unpolymerized monomer Mb diffused in the uncured portion and inside the substrate is removed through the patterned surface of the transparent gel substrate. Various methods can be used for removal, such as immersion in a solvent capable of dissolving monomer Mb, vaporization under reduced pressure, and performing the latter after the former. When monomer Mb is removed from the transparent gel substrate using this method, it is difficult for the monomer Mb inside to escape through the part that was hardened in the previous stage of this process. The unhardened part and the monomer Mb inside it mainly escape through the unhardened part. Due to this phenomenon, a concentration distribution of the monomer Mb is generated in the transparent gel substrate near the cured portion. After forming the concentration distribution of monomer Mb in the transparent gel substrate in this way, the polymerization of monomer Ma and remaining monomer Mb is completed, and the monomer
By fixing the distribution of Mb, it is possible to form a gradient index lens portion as described above in a plastic substrate.

次に本発明を図面に瀺した実斜䟋に基づいお詳
现に説明する。
Next, the present invention will be described in detail based on embodiments shown in the drawings.

たず第図むに瀺す様に型枠䞭で屈
折率Naの網状重合䜓Paを圢成する単量䜓Maを
重合させお透明ゲル基板を぀くる。次に、こ
の透明ゲル基板の衚面に屈折率Nbの重合䜓
Pbを生成する単量䜓Mbを液盞たたは気盞で接觊
させ、第図むに瀺す様に、透明ゲル基板の
衚面党䜓から単量䜓Mbを拡散させる。単量䜓
Mbを拡散させる際の枩床が高いほど単量䜓Mb
の拡散速床は倧きいが単量䜓Mbが単独で重合し
たり、単量䜓Maず共重合したりするほど高くな
らないようにする。次に、第図ロに瀺す様に、
単量䜓Mbを拡散させた透明ゲル基板の衚面
に光を遮蔜する為の円圢の遮光マスクを乗せ
お光を照射する。マスクの盎埄R1は、第
図ハに瀺した様な硬化郚にあいた円圢の穎未硬
化郚の盎埄R2に等しくなるが、これは第
図ニに瀺したレンズ郚の盎埄R3よりもか
なり小さくしおおいた方が奜たしい。照射する光
は、通垞の光硬化性暹脂に甚いられる玫倖線が奜
たしい。光照射に䟝぀お第図ハに瀺す様に、硬
化郚が圢成される。硬化郚の厚みは、単
量䜓Mbが容易に透過しない皋床に厚くなければ
ならないが、その条件を満たす限りにおいお薄い
方が奜たしい。硬化郚分にある盎埄R2の穎
から次の工皋で単量䜓Mbを陀去するが、圢
成しようずしおいるレンズの埄R3よりもR2が充
分小さくなれば、単量䜓Mbの等濃床曲線は穎
の郚分で透明ゲル基板の衚面ず平行にな
り、断面が同心円の球面状にならない。単量䜓
Mbを陀去する方法ずしおは、単量䜓Mbが単量
䜓Maよりもはるかに揮発し易いものである堎合
には枛圧するだけで良く、揮発性が䌌かよ぀おい
る堎合には、溶解性の異なる溶剀に浞挬する方法
が採られおよい。どうしおも単量䜓Maず単量䜓
Mbがほが等量で抜けおしたう堎合には、単量䜓
Mbの濃床分垃は既に基板内に圢成されおいるの
で、重合を完結させる際に透明ゲル基板を単
量䜓Maず接觊させおおけば抜けたこずによる単
量䜓Maの䞍足が補われ、重合時の収瞮を緩和す
るこずができる。単量䜓Mbを穎を介しお陀
去する事に䟝぀お圢成された単量䜓Mbの濃床分
垃を固定する為に重合を完結させ、次いで衚面を
研磚すれば、第図ニに瀺す様な、断面を有する
球状のレンズ郚分の圢成された合成暹脂平面
レンズが完成する。レンズ郚分の盎埄の
盎埄R3は、硬化郚の穎の盎埄R2遮光マ
スクの盎埄R1、透明ゲル基板の架橋密床、
単量䜓Mb陀去条件などに圱響される。レンズ郚
分は、NaNbの堎合凞レンズ、NaNbの
堎合凹レンズずなる。
First, as shown in FIG. 3A, a transparent gel substrate 17 is prepared by polymerizing a monomer Ma forming a network polymer Pa having a refractive index Na in molds 18 and 19. Next, a polymer with a refractive index of Nb is coated on the surface of this transparent gel substrate 17.
The monomer Mb that generates Pb is brought into contact with it in a liquid phase or a gas phase, and the monomer Mb is diffused from the entire surface of the transparent gel substrate 17, as shown in FIG. 3A. monomer
The higher the temperature when diffusing Mb, the more monomeric Mb
Although the diffusion rate is high, it should not be so high that monomer Mb polymerizes alone or copolymerizes with monomer Ma. Next, as shown in Figure 3B,
A circular light shielding mask 20 for shielding light is placed on the surface of a transparent gel substrate 17 on which monomer Mb is diffused, and light is irradiated. The diameter R1 of the mask 20 is the third
It is equal to the diameter R2 of the circular hole (uncured part) 21 in the hardened part as shown in Figure C, which is much smaller than the diameter R3 of the lens part 22 shown in Figure 3 D. It's better to be there. The light to be irradiated is preferably ultraviolet rays used for ordinary photocurable resins. By light irradiation, a hardened portion 23 is formed as shown in FIG. 3C. The thickness of the hardened portion 23 must be thick enough that the monomer Mb does not easily pass through it, but as long as this condition is satisfied, it is preferably thinner. In the next step, monomer Mb is removed from the hole 21 with diameter R2 in the hardened portion 23, but if R2 becomes sufficiently smaller than the diameter R3 of the lens to be formed, the isoconcentration curve of monomer Mb will be hole 2
The portion 1 is parallel to the surface of the transparent gel substrate 17, and the cross section does not have a concentric spherical shape. monomer
To remove Mb, if monomeric Mb is much more volatile than monomeric Ma, it is sufficient to reduce the pressure; if the volatilities are similar, the solubility may be reduced. Methods of immersion in different solvents may be used. Monomer Ma and monomer
If Mb is removed in approximately equal amounts, the monomer
Since the concentration distribution of Mb has already been formed in the substrate, if the transparent gel substrate 17 is kept in contact with the monomer Ma when completing the polymerization, the shortage of the monomer Ma caused by the removal of the monomer Ma can be compensated for. Shrinkage during polymerization can be alleviated. By removing the monomer Mb through the hole 21, the polymerization is completed to fix the concentration distribution of the monomer Mb formed, and then the surface is polished, as shown in FIG. 3D. A synthetic resin flat lens 24 having a spherical lens portion 22 having a cross section is completed. The diameter R3 of the lens portion 22 is determined by the diameter R2 of the hole in the cured portion 23 (=diameter R1 of the light shielding mask), the crosslinking density of the transparent gel substrate 17,
It is affected by monomeric Mb removal conditions, etc. The lens portion 22 becomes a convex lens when Na>Nb, and becomes a concave lens when Na<Nb.

第図に本発明の他の実斜䟋を瀺す。 FIG. 4 shows another embodiment of the invention.

本䟋でも、前述した方法ず同様にたず型枠
内で屈折率Naの網状重合䜓Paを生成す
る単量䜓Maを䞀郚重合させお透明ゲル基板
を぀くり、屈折率Nbの重合䜓Pbを生成する単量
䜓Mbを接觊させ、第図むに瀺す様に、その衚
面党䜓から拡散させる。このずきの枩床はMbが
重合するより䜎い枩床にする。次に、第図ロに
瀺す様に、単量䜓Mbを拡散させた透明ゲル基板
に、圢成すべきレンズ郚分に察応した円型の
穎のあいた遮光マスクを乗せ、玫倖線を照射
する。遮光マスクの穎の盎埄R4は、第図
ハに瀺した硬化郚の盎埄R5に等しくなり、
これは倧䜓第図ニに瀺したレンズ郚の盎埄
R6に等しくなる。玫倖線照射に䟝぀お第図ハ
に瀺す様に、円盀状の硬化郚が圢成される。
この厚みは、単量䜓Mbが透過しない限りに斌い
お、出来るだけ薄いこずが望たしい。次に、透明
ゲル基板から、単量䜓Mbを陀去する。透明
ゲル基板の衚面の未硬化郚から単量䜓
Mbが抜けるず、濃床募配が生じ、硬化郚の
䞋や、透明ゲル基板の深郚より単量䜓Mbが
そこぞ移動しおきお、曎に新たな濃床募配が生じ
る。この様にしお断面同心円状の単量䜓Mbの濃
床分垃を圢成させたあずで、それを固定する為に
重合を完結させ、次いで衚面を研磚すれば、第
図ニに瀺す様な断面を有する球圢レンズ郚分
の圢成された合成暹脂平面レンズが完成す
る。レンズ郚分の盎埄R6は、ほが硬化郚分
の盎埄R5遮光マスクの穎の盎埄R4に
䟝぀お決たる。レンズ郚分は、NaNbのず
き凹レンズに、NaNbのずき凞レンズになる。
In this example, as well as the method described above, first the formwork 2 is
A transparent gel substrate 25 is formed by partially polymerizing a monomer Ma that forms a network polymer Pa having a refractive index Na within 6 and 27.
A monomer Mb that forms a polymer Pb having a refractive index Nb is brought into contact with the polymer Pb and diffused from the entire surface as shown in FIG. 4A. The temperature at this time is set to be lower than that at which Mb polymerizes. Next, as shown in FIG. 4B, a light-shielding mask 28 with a circular hole corresponding to the lens portion to be formed is placed on the transparent gel substrate 25 in which the monomer Mb is diffused, and ultraviolet rays are irradiated. . The diameter R4 of the hole in the light-shielding mask 28 is equal to the diameter R5 of the hardened portion 29 shown in FIG.
This is approximately the diameter of the lens portion 31 shown in FIG.
will be equal to R6. By irradiating the ultraviolet rays, a disk-shaped hardened portion 29 is formed as shown in FIG. 4C.
It is desirable that this thickness be as thin as possible as long as monomer Mb does not pass through. Next, monomer Mb is removed from the transparent gel substrate 25. The monomer is removed from the uncured portion 30 on the surface of the transparent gel substrate 25.
When Mb escapes, a concentration gradient is generated, and monomer Mb moves there from below the hardened portion 29 and from the deep part of the transparent gel substrate 25, and a new concentration gradient is generated. After forming the concentration distribution of the monomer Mb with a concentric circular cross section in this way, the polymerization is completed to fix it, and then the surface is polished.
Spherical lens portion 31 having a cross section as shown in Figure D
The synthetic resin flat lens 32 having the above formed thereon is completed. The diameter R6 of the lens portion 31 is approximately determined by the diameter R5 of the hardened portion 29 (=the diameter R4 of the hole in the light shielding mask). The lens portion 31 becomes a concave lens when Na>Nb, and becomes a convex lens when Na<Nb.

以䞊の様にしお基板衚面を倚数の未硬化の円圢
郚分を残しお硬化させたり、たたは倚数の島状の
円圢硬化郚分を衚面に基板衚面に圢成したりする
こずにより、屈折率分垃型球レンズが配列しお構
成される合成暹脂平面レンズが埗られる。たた遮
光マスクをラむン状パタヌンのものにすれば、光
線がラむン状に集束するカマボコ型レンズあるい
はレンチキナラレンズ盞圓の屈折率分垃型平面レ
ンズを補造するこずもできる。
By curing the substrate surface leaving a large number of uncured circular parts as described above, or by forming a large number of island-like circular hardened parts on the substrate surface, a gradient index spherical lens can be obtained. A synthetic resin flat lens is obtained, which is composed of an array of . Furthermore, if the light-shielding mask has a linear pattern, it is also possible to manufacture a gradient index flat lens equivalent to a semicylindrical lens or a lenticular lens in which light rays are focused in a line.

具䜓䟋  この具䜓䟋は第図に瀺す方法に埓぀たもの
であ぀お、たず、ゞ゚チレングリコヌルビスアリ
ルカヌボネヌトCR−39に過酞化ベンゟむル
及びベンゟプノンを重量ず぀溶解させ、型
に泚入しお80℃で90分間保持し、20mm×20mm×
mmの透明ゲル基板を䜜補した。これを
−トリフロロ゚チルメタクリレヌト3FMA䞭
に浞挬しお衚面からゲル物䜓䞭に拡散させた。次
に、䞭倮に盎埄mmの真鍮円板を乗せ、超高圧氎
銀ランプからの玫倖線を照射しお真鍮円板に察応
する郚分の呚囲を硬化させた。次にこれをデシケ
ヌタ䞭に入れ、真空ポンプを぀ないで枛圧し、盎
埄mmの未硬化郚より3FMAを気化させお取り陀
いた。これを80℃で15時間保持しお重合を完結さ
せ、衚面を研磚した。このCR−393FMA共重
合䜓ブロツクの䞭倮郚は焊点距離30mmの凞レンズ
にな぀おいた。
Specific Example 1 This specific example 1 follows the method shown in Figure 3. First, 3% by weight of benzoyl peroxide and benzophenone were dissolved in diethylene glycol bisallyl carbonate (CR-39) and poured into a mold. 20mm x 20mm x 5
A transparent gel substrate of mm size was prepared. 2, 2, 2 this
- immersed in trifluoroethyl methacrylate (3FMA) to diffuse into the gel body from the surface. Next, a brass disk with a diameter of 2 mm was placed in the center, and the area around the area corresponding to the brass disk was hardened by irradiating ultraviolet light from an ultra-high pressure mercury lamp. Next, this was placed in a desiccator, and a vacuum pump was connected to reduce the pressure, and 3FMA was vaporized and removed from the uncured portion with a diameter of 2 mm. This was held at 80°C for 15 hours to complete polymerization, and the surface was polished. The center of this CR-39/3FMA copolymer block was a convex lens with a focal length of 30 mm.

具䜓䟋  この具䜓䟋は第図に瀺す方法に埓぀たもの
であ぀お、たず、ゞアリルむ゜フタレヌト
DAIPに過酞化ベンゟむル及びベンゟプノ
ンを重量ず぀溶解させ、型に泚入しお80℃で
180分間加熱し、20mm×20mm×mmの透明ゲル基
板を䜜補した。これをメチルメタクリレヌト
MMA䞭に浞挬しお衚面からゲル基板䞭に拡
散させた。次に、䞭倮に盎埄mmの真鍮円板を乗
せ、超高圧氎銀ランプからの玫倖線を照射しお真
鍮円板に察応する郚分の呚囲を硬化させた。次に
これをデシケヌタ䞭に入れ、真空ポンプを぀ない
で枛圧し、盎埄mmの未硬化郚よりMMAを抜い
た。これを80℃で15時間保持しお重合を完結さ
せ、衚面を研磚した。このDAIPMMA共重合
䜓ブロツクの䞭倮郚は焊点距離30mmの凞レンズに
な぀おいた。
Specific Example 2 This specific example 2 follows the method shown in FIG. 3. First, benzoyl peroxide and benzophenone are dissolved in diallylisophthalate (DAIP) in an amount of 3% by weight, and poured into a mold. at °C
Heating was performed for 180 minutes to produce a transparent gel substrate measuring 20 mm x 20 mm x 5 mm. This was immersed in methyl methacrylate (MMA) and diffused from the surface into the gel substrate. Next, a brass disk with a diameter of 2 mm was placed in the center, and the area around the area corresponding to the brass disk was hardened by irradiating ultraviolet light from an ultra-high pressure mercury lamp. Next, this was placed in a desiccator, a vacuum pump was connected to reduce the pressure, and the MMA was extracted from the uncured part with a diameter of 2 mm. This was held at 80°C for 15 hours to complete polymerization, and the surface was polished. The center of this DAIP/MMA copolymer block was a convex lens with a focal length of 30 mm.

具䜓䟋  この具䜓䟋は第図に瀺す方法に埓぀たもの
であ぀お、たず、ゞ゚チレングリコヌルビスアリ
ルカヌボネヌトCR−39に過酞化ベンゟむル
及びベンゟプノンを重量ず぀溶解させ、型
に泚入しお80℃で90分間加熱し、50mm×50mm×
mmの透明ゲル基板を䜜補した。これを、過酞化ベ
ンゟむル及びベンゟプノンをそれれ重量ず
぀溶解させ安息銙酞ビニルVBに浞挬し、衚
面からゲル基板䞭に拡散させた。次に、盎埄mm
の円圢の透光郚が×のマトリクス状に25個぀
いた黒色遮光マスクをこのゲル基板䞊に乗せ、超
高圧氎銀ランプからの玫倖線を照射し、ゲル基板
衚面に盎埄mmの円板状硬化郚を島状に25個圢成
した。これをアセトン䞭に浞挬しお未硬化郚より
単量䜓に溶出させ、枛圧しおアセトンを陀去し
た。次に、この衚面にCR−39を接觊させお80℃
で15時間保持し、重合を完結させ、衚面のCR−
39単独重合䜓を研磚しおずり陀き、平滑にした。
このCR−39VB共重合䜓ブロツクの衚面には、
焊点距離玄30mmのレンズが×のマトリクス状
に圢成されおいた。
Specific Example 3 This specific example 3 follows the method shown in Figure 4. First, benzoyl peroxide and benzophenone were dissolved in diethylene glycol bisallyl carbonate (CR-39) in an amount of 3% by weight each, and then poured into a mold. Heat it at 80℃ for 90 minutes, and make 50mm x 50mm x 5
A transparent gel substrate of mm size was prepared. This was immersed in vinyl benzoate (VB) in which benzoyl peroxide and benzophenone were each dissolved in an amount of 3% by weight, and diffused from the surface into the gel substrate. Next, the diameter is 3mm
A black light-shielding mask with 25 circular light-transmitting parts arranged in a 5 x 5 matrix was placed on top of the gel substrate, and ultraviolet light from an ultra-high pressure mercury lamp was irradiated onto the surface of the gel substrate in the form of a disk with a diameter of 3 mm. 25 hardened parts were formed in the form of islands. This was immersed in acetone to dissolve the monomer from the uncured portion, and the acetone was removed under reduced pressure. Next, bring CR-39 into contact with this surface and heat it at 80°C.
for 15 hours to complete the polymerization and remove the CR-
The 39 homopolymer was polished off and smoothed.
On the surface of this CR-39/VB copolymer block,
Lenses with a focal length of approximately 30 mm were formed in a 5 x 5 matrix.

具䜓䟋  この具䜓䟋は第図に瀺す方法においお遮光
マスクにラむン状パタヌンのものを甚いたもので
あ぀お、たず、ゞ゚チレングリコヌルビスアリル
カヌボネヌトCR−39に過酞化ベンゟむル及
びベンゟプノンを重量ず぀溶解させ、型に
泚入しお80℃で90分間加熱し、50mm×50mm×mm
の透明ゲル基板を䜜補した。これを、
−トリヒドロパヌフロロプロピルメタクリレヌト
4FMAに浞挬しお衚面から拡散させた。この
䞊に、幅200Όの黒線がmm間隔で40本䞊んだ
ガラス板を乗せ、超高圧氎銀ランプからの玫倖線
を照射した埌、ガラス板を取り陀いお枛圧し、
4FMAを未硬化衚面から揮散させた。これを80℃
で15時間保持し、重合を完結させ、衚面を研磚し
た。平行光線を透過させるず、このCR−39
4FMA共重合䜓ブロツクより30mmの距離に眮いた
板䞊に40本の茝線が認められた。
Specific Example 4 In this specific example 4, a line pattern was used as the light-shielding mask in the method shown in FIG. Dissolve in weight percent, pour into a mold and heat at 80℃ for 90 minutes to form a 50mm x 50mm x 5mm
A transparent gel substrate was prepared. This is 1, 1, 3
- immersed in trihydroperfluoropropyl methacrylate (4FMA) and diffused from the surface. A glass plate with 40 black lines of 200 ÎŒm width arranged at 1 mm intervals was placed on top of this, and after irradiating it with ultraviolet rays from an ultra-high pressure mercury lamp, the glass plate was removed and the pressure was reduced.
4FMA was volatilized from the uncured surface. This is 80℃
The mixture was held for 15 hours to complete polymerization, and the surface was polished. When parallel light passes through this CR-39/
Forty bright lines were observed on the plate placed at a distance of 30 mm from the 4FMA copolymer block.

【図面の簡単な説明】[Brief explanation of drawings]

第図及び第図はそれぞれ合成暹脂平面レン
ズの補造方法の埓来䟋を瀺す断面図であり、第
図及び第図はそれぞれ本発明による合成暹脂平
面レンズ補造方法の実斜䟋を瀺す断面図である。 なお、図面に甚いた笊号においお、
  透明ゲル基板、  遮光マスク、
  未硬化郚、  硬化
郚、  レンズ郚分、  
合成暹脂平面レンズである。
FIG. 1 and FIG. 2 are cross-sectional views showing a conventional example of a method for manufacturing a synthetic resin flat lens, respectively.
FIG. 4 is a cross-sectional view showing an embodiment of the method for manufacturing a synthetic resin flat lens according to the present invention. In addition, in the codes used in the drawings, 17, 25
...transparent gel substrate, 20,28...light-shielding mask,
21, 30... Uncured part, 23, 29... Cured part, 22, 31... Lens part, 24, 32...
It is a synthetic resin flat lens.

Claims (1)

【特蚱請求の範囲】  合成暹脂からなる透明な基板䞭に、光軞方向
に次第に倉化する屈折率分垃ず光軞を含む少なく
ずも䞀぀の断面内で䞊蚘光軞から遠ざかるに぀れ
お次第に倉化する屈折率分垃ずを倫々備えた単䞀
のたたは耇数の屈折率分垃型レンズ郚分を圢成す
るようにした合成暹脂平面レンズの補造方法にお
いお、 (a) 屈折率がNaの網状重合䜓Paを生成する皮
たたは皮以䞊の単量䜓Maを䞍完党に重合さ
せお透明なゲル状の基板を圢成する工皋、 (b) この透明ゲル基板䞭に、Naずは異なる屈折
率Nbを有する重合䜓Pbを生成する皮たたは
皮以䞊の単量䜓Mbを拡散・浞透させる工
皋、 (c) 前蚘基板の衚面領域に郚分的硬化凊理を斜し
お、圢成すべきレンズ郚分のパタヌンに合わせ
た硬化郚および未硬化郚を前蚘衚面領域に圢成
する工皋、 (d) 前蚘透明ゲル基板の前蚘硬化凊理が斜された
偎の衚面を介しお、䞻ずしお前蚘未硬化郚およ
びその内郚の前蚘単量䜓Mbを陀去し、これに
よ぀お、前蚘硬化郚の近傍における前蚘透明ゲ
ル基板内に前蚘単量䜓Mbが連続的に倉化する
濃床募配でも぀お残留しおいる状態を圢成する
工皋、 (e) 前蚘単量䜓Mbの前蚘残留状態においお、前
蚘単量䜓MaおよびMbの重合を完結させる工
皋、 を有するこずを特城ずする合成暹脂平面レンズの
補造方法。
[Claims] 1. A refractive index distribution that gradually changes in the optical axis direction in a transparent substrate made of synthetic resin, and a refractive index distribution that gradually changes as the distance from the optical axis increases within at least one cross section that includes the optical axis. In a method for manufacturing a synthetic resin flat lens in which a single or a plurality of gradient index lens parts are formed, the method includes: (a) one type of synthetic resin that produces a reticular polymer Pa having a refractive index of Na; A step of incompletely polymerizing two or more types of monomers Ma to form a transparent gel-like substrate; (b) producing a polymer Pb having a refractive index Nb different from that of Na in this transparent gel substrate; (c) applying a partial hardening treatment to the surface area of the substrate to form a hardened portion and an uncured portion in accordance with the pattern of the lens portion to be formed; forming a hardened part in the surface region; (d) mainly removing the unhardened part and the monomer Mb inside thereof through the hardening-treated surface of the transparent gel substrate; , thereby forming a state in which the monomer Mb remains in the transparent gel substrate in the vicinity of the cured portion with a concentration gradient that continuously changes; (e) the monomer A method for manufacturing a synthetic resin flat lens, comprising the step of completing polymerization of the monomers Ma and Mb in the residual state of Mb.
JP58080615A 1983-05-09 1983-05-09 Preparation of synthetic resin plane lens Granted JPS59204519A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58080615A JPS59204519A (en) 1983-05-09 1983-05-09 Preparation of synthetic resin plane lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58080615A JPS59204519A (en) 1983-05-09 1983-05-09 Preparation of synthetic resin plane lens

Publications (2)

Publication Number Publication Date
JPS59204519A JPS59204519A (en) 1984-11-19
JPH0233296B2 true JPH0233296B2 (en) 1990-07-26

Family

ID=13723242

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58080615A Granted JPS59204519A (en) 1983-05-09 1983-05-09 Preparation of synthetic resin plane lens

Country Status (1)

Country Link
JP (1) JPS59204519A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405556A (en) * 1993-04-13 1995-04-11 National Science Council Process of fabricating light-focusing plastic optical elements
JP3012500B2 (en) * 1995-11-20 2000-02-21 日本板硝子株匏䌚瀟 Method for manufacturing flat lens array
US6027672A (en) * 1997-12-31 2000-02-22 Lightpath Technologies, Inc. Method of producing large polymer optical blanks with predictable axil refractive index profile
WO2022210869A1 (en) * 2021-03-31 2022-10-06 デンカ株匏䌚瀟 Method for producing semi-cured product composite, method for producing cured product composite, and semi-cured product composite
EP4101626A1 (en) * 2021-06-11 2022-12-14 Essilor International Method for obtaining a lens element
DE102023106782B3 (en) * 2023-03-17 2024-07-25 Rodenstock Gmbh Myopia management lenses with microlenses made from GRIN structures

Also Published As

Publication number Publication date
JPS59204519A (en) 1984-11-19

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