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JPS6130749B2 - - Google Patents
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JPS6130749B2 - - Google Patents

Info

Publication number
JPS6130749B2
JPS6130749B2 JP55156354A JP15635480A JPS6130749B2 JP S6130749 B2 JPS6130749 B2 JP S6130749B2 JP 55156354 A JP55156354 A JP 55156354A JP 15635480 A JP15635480 A JP 15635480A JP S6130749 B2 JPS6130749 B2 JP S6130749B2
Authority
JP
Japan
Prior art keywords
resin
lead
lead frame
plated
sealed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55156354A
Other languages
Japanese (ja)
Other versions
JPS5779653A (en
Inventor
Mitsuru Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP55156354A priority Critical patent/JPS5779653A/en
Publication of JPS5779653A publication Critical patent/JPS5779653A/en
Publication of JPS6130749B2 publication Critical patent/JPS6130749B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40Leadframes
    • H10W70/456Materials
    • H10W70/457Materials of metallic layers on leadframes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/5449Dispositions of bond wires not being orthogonal to a side surface of the chip, e.g. fan-out arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】 本発明は樹脂封止型半導体装置に用いられるリ
ードフレームに関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a lead frame used in a resin-sealed semiconductor device.

従来のリードフレームを用いた樹脂封止型半導
体装置の製法は次の通りである。リードフレーム
が準備され、その半導体ダイ搭置部にダイが固着
され、そのダイの外部引出電極部と内部リードの
ステツチ部とが金属細線にて接続され、この半導
体ダイをトランスフアモールド成型等により樹脂
にて封止し、その後外部リードは錫メツキがなさ
れ、更にデユアルインライン型等に成形して組立
てられる。
A method for manufacturing a resin-sealed semiconductor device using a conventional lead frame is as follows. A lead frame is prepared, a die is fixed to the semiconductor die mounting part, the external lead electrode part of the die and the stitch part of the internal lead are connected with a thin metal wire, and the semiconductor die is molded by transfer molding or the like. After sealing with resin, the external leads are tin-plated, and then molded into a dual-in-line type or the like and assembled.

この従来の製法に従うと、トランスフアモール
ド成型以後錫メツキ工程までの製造工程が長い。
この間の工程を詳しく述べると、モールド成型、
樹脂キユア、メツキの前処理として外部リードに
はみでている樹脂の除去作業、錫メツキである。
これらの工程中特にはみ出し樹脂の除去作業は困
難を極める。つまり化学薬品による除去の場合、
その薬品による公害の問題を引き起し、封止樹脂
表面にも悪影響を及ぼし、又薬品が弱いと除去で
きなくなつたりして品質を悪くする。更に機械的
な除去の場合、即ちブラシで取つたり、やすり、
ナイフで削り取るには量産性に欠け、量産しよう
とすれば大きな設備投資となり、しかも外部リー
ドの表面を傷つけ、錫メツキの品質を悪くする等
の問題があつた。そこであらかじめ外部リード部
に錫メツキを施したリードフレームを使用するこ
とが考えられた。しかし半導体ダイをダイ搭量部
に固着させるには、リードフレームをヒータブロ
ツク上に置き、半導体ダイと金又は金の合金とに
よつて金シリコンの合金を形成させる工程が必要
であり、通常ヒータブロツクの温度は450℃前後
であることから錫メツキされたリードフレーム上
の錫は溶けてしまい、又次工程の熱圧着ワイヤボ
ンデイングでもやはり300℃程度のヒータブロツ
ク上にリードフレームは置かれるため錫メツキは
溶けてしまう。従つて従来は、あらかじめ錫メツ
キされたリードフレームは使用することができな
かつた。
According to this conventional manufacturing method, the manufacturing process from transfer molding to the tin plating process is long.
To describe the process in detail, the molding,
As a pretreatment for resin curing and plating, the resin protruding from the external leads is removed and tin plating is performed.
During these steps, the removal of the protruding resin is particularly difficult. In other words, in the case of chemical removal,
The chemicals cause pollution problems, have an adverse effect on the surface of the sealing resin, and if the chemicals are weak, they may not be able to be removed, resulting in poor quality. Furthermore, in the case of mechanical removal, i.e. brushing, filing,
Scraping it off with a knife is not suitable for mass production, and mass production would require a large capital investment, and there were problems such as damaging the surface of the external lead and impairing the quality of the tin plating. Therefore, it has been considered to use a lead frame whose external lead portions are tin-plated in advance. However, in order to securely attach the semiconductor die to the die mounting part, a process is required in which the lead frame is placed on a heater block and a gold-silicon alloy is formed between the semiconductor die and gold or a gold alloy. Since the temperature of the block is around 450°C, the tin on the tin-plated lead frame will melt, and in the next process of thermocompression wire bonding, the lead frame will also be placed on a heater block at around 300°C, so the tin will melt. Metsuki melts. Previously, therefore, pre-tinned lead frames could not be used.

本発明の目的は上記した製造工程の問題点を取
り除き、高品質の半導体装置を製造するに適した
リードフレームを提供することにある。
An object of the present invention is to eliminate the above-described problems in the manufacturing process and provide a lead frame suitable for manufacturing high-quality semiconductor devices.

本発明は樹脂封止型半導体装置に用いられるリ
ードフレームにおいて、その樹脂封止される内部
リードのステツチ部及びダイ搭置部に金又は銀メ
ツキが施されていてかつ樹脂封止されていない外
部リード部分に錫メツキが施されていてかつその
ステツチ部及びダイ搭置部から樹脂封止端に至る
途中の内部リード及びダイ支持部の幅が他の部分
に比べ著しく狭くなつている部分がありかつこの
幅の狭い部分のリード裏側を電気的に不良導体で
かつ熱伝導の良くない材料で一体に補強してある
ことを特徴とするリードフレームである。
The present invention relates to a lead frame used in a resin-sealed semiconductor device, in which the stitching part and the die mounting part of the inner lead to be resin-sealed are plated with gold or silver, and the outer part is not resin-sealed. There is a part where the lead part is tin-plated and the width of the internal lead and die support part on the way from the stitch part and die mounting part to the resin-sealed end is significantly narrower than other parts. The lead frame is characterized in that the back side of the lead at this narrow portion is integrally reinforced with a material that is an electrically poor conductor and has poor thermal conductivity.

次に本発明のリードフレームの一実施例を図面
を用いて説明する。
Next, one embodiment of the lead frame of the present invention will be described with reference to the drawings.

第2図はその実施例を示す斜視図、第3図はそ
のリードフレームを用いて組立てられた樹脂封止
型半導体装置の内部構造を示す斜視図である。リ
ードフレーム1の内部リードの金又は銀メツキが
施されたステツチ部5から樹脂封止端に至る途中
の一部分及び金又は銀メツキが施されたダイ搭置
部2とリードフレームの枠体部12とをつないで
いる支持部の一部分に切り込みを入れ、その部分
の内部リード幅を著しく狭くした部分9を設け、
この部分から先のステツチ部及びダイ搭置部を補
強するためこれら内部リード及び支持部の幅を狭
くした部分9を裏面から一体にカプトンテープの
ような熱的に強い樹脂テープ10で補強してあ
る。(カプトンは商品名)なお図面ではステツチ
部を補強した場合が示されている。カプトン樹脂
テープは、短時間ならば350℃位の耐熱性があ
り、ダイボンデイングやワイヤボンデイングに要
する程度の時間ならば十分耐え得る。又このテー
プはリードフレームに熱圧着で貼り付けてあるた
め加熱しても剥がれることがない。この補強材と
しては、カプトン樹脂に限らず耐熱性を備えかつ
電気的に不良導体で熱伝導性の良くない材料であ
れば使用可能である。通常リードフレームはダイ
ボンデイングや次工程のワイヤボンデイングの
際、前者はダイ搭置部のみを局部的に加熱し、後
者はダイ搭置部及びステツチ部のみを局部的に加
熱する。この場合熱伝導や輻射熱の影響で上記局
部加熱の場合でも、本発明のように幅の狭い部分
9が設けられていないと、外部リードに予め錫メ
ツキのなされているリードフレームでは錫メツキ
8を融かす恐れがある。しかし本発明のリードフ
レームでは内部リードの中間部に他の部分より著
しく幅を狭くした部分9があるため熱伝導を妨
げ、又補強のため用いられた樹脂テープ10は輻
射熱を遮断する効果がある。又外部リードの錫メ
ツキは樹脂封止端よりやや内部リード側まで入り
込んでメツキされているので、本発明のリードフ
レームを用いると樹脂封止時に上下金型ではさん
だ際、錫メツキが施されているためその表面は軟
らかく、従つて上下金型間の隙間はほとんどなく
なりはみ出し樹脂11はほとんど無視できるもの
となる。
FIG. 2 is a perspective view showing the embodiment, and FIG. 3 is a perspective view showing the internal structure of a resin-sealed semiconductor device assembled using the lead frame. A part of the inner lead of the lead frame 1 from the gold- or silver-plated stitching part 5 to the resin-sealed end, the gold- or silver-plated die mounting part 2, and the frame body part 12 of the lead frame. A notch is made in a part of the support part connecting the parts, and a part 9 is provided in which the internal lead width of that part is significantly narrowed.
In order to reinforce the stitching part and die mounting part beyond this part, the narrowed part 9 of these internal leads and the support part is integrally reinforced from the back side with a thermally strong resin tape 10 such as Kapton tape. be. (Kapton is a product name) The drawing shows a case where the stitched portion is reinforced. Kapton resin tape has a heat resistance of about 350°C for a short period of time, and can withstand temperatures as long as required for die bonding and wire bonding. Also, since this tape is attached to the lead frame by thermocompression bonding, it will not peel off even when heated. The reinforcing material is not limited to Kapton resin, but any material that has heat resistance, is an electrically poor conductor, and has poor thermal conductivity can be used. Normally, when a lead frame is subjected to die bonding or wire bonding in the next process, the former heats only the die mounting part locally, and the latter heats only the die mounting part and the stitching part locally. In this case, even in the case of the above-mentioned local heating due to the influence of heat conduction or radiant heat, if the narrow portion 9 is not provided as in the present invention, the tin plating 8 will not be formed in a lead frame where the external leads are pre-plated with tin. There is a risk of melting. However, in the lead frame of the present invention, there is a portion 9 in the middle of the internal lead that is significantly narrower than other portions, which impedes heat conduction, and the resin tape 10 used for reinforcement has the effect of blocking radiant heat. . In addition, the tin plating on the external leads is plated slightly deeper into the inner lead side than the resin-sealed end, so when the lead frame of the present invention is used, the tin plating is applied when the lead frame is sandwiched between the upper and lower molds during resin sealing. As a result, the surface thereof is soft, and therefore the gap between the upper and lower molds is almost eliminated, and the protruding resin 11 can be almost ignored.

本発明のリードフレームは、あらかじめ外部リ
ードに錫メツキがなされているので、樹脂封止後
にメツキを行う製法にくらべて錫メツキの品質も
よく、又このリードフレームを用いた半導体装置
の製造工程は、ダイボンデイング、ワイヤボンデ
イング、樹脂封止、リード成型となり、従来の樹
脂封止後の錫メツキ工程がなくなり、製造工程が
短縮される効果がある。
In the lead frame of the present invention, the external leads are tin-plated in advance, so the quality of the tin plating is better than in a manufacturing method in which plating is performed after resin sealing, and the manufacturing process of a semiconductor device using this lead frame is , die bonding, wire bonding, resin sealing, and lead molding, eliminating the conventional tin plating process after resin sealing, which has the effect of shortening the manufacturing process.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来用いられているリードフレームの
斜視図、第2図は本発明のリードフレームの一実
施例を示す斜視図、第3図は本発明のリードフレ
ームを用いて組立てられた樹脂封止型半導体装置
の内部構造を示す斜視図である。 1……リードフレーム、2……ダイ搭置部、3
……ダイ、4……外部引出電極部、5……ステツ
チ部、6……金属細線、7……封止樹脂、8……
錫メツキ、9……幅を狭くした部分、10……樹
脂テープ、11……はみ出し樹脂、12……リー
ドフレーム枠体部。
Fig. 1 is a perspective view of a conventionally used lead frame, Fig. 2 is a perspective view showing an embodiment of the lead frame of the present invention, and Fig. 3 is a resin seal assembled using the lead frame of the present invention. FIG. 2 is a perspective view showing the internal structure of a stop-type semiconductor device. 1...Lead frame, 2...Die mounting section, 3
...Die, 4...External extraction electrode part, 5...Stitch part, 6...Metal thin wire, 7...Sealing resin, 8...
Tin plating, 9...Narrowed width part, 10...Resin tape, 11...Protruding resin, 12...Lead frame frame body part.

Claims (1)

【特許請求の範囲】[Claims] 1 樹脂封止型半導体装置に用いられるリードフ
レームにおいて、その内部リードのステツチ部及
びダイ搭置部に金又は銀メツキが施され、かつ樹
脂封止されない外部リード部分に錫メツキが施さ
れ、内部リード及びダイ搭置部支持リードの樹脂
封止される部分の一部が細幅に形成され、この細
幅部分が電気的に不良導体でかつ熱伝導の良くな
い材料で一体に補強されていることを特徴とする
樹脂封止型半導体装置用リードフレーム。
1. In a lead frame used for a resin-sealed semiconductor device, the stitching part of the inner lead and the die mounting part are plated with gold or silver, and the outer lead part which is not sealed with resin is plated with tin, and the inner lead is plated with gold or silver. A portion of the resin-sealed portion of the lead and die mounting portion support lead is formed into a narrow width, and this narrow portion is integrally reinforced with a material that is an electrically poor conductor and has poor thermal conductivity. A lead frame for resin-sealed semiconductor devices characterized by the following.
JP55156354A 1980-11-06 1980-11-06 Lead frame for resin-sealed semiconductor device Granted JPS5779653A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55156354A JPS5779653A (en) 1980-11-06 1980-11-06 Lead frame for resin-sealed semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55156354A JPS5779653A (en) 1980-11-06 1980-11-06 Lead frame for resin-sealed semiconductor device

Publications (2)

Publication Number Publication Date
JPS5779653A JPS5779653A (en) 1982-05-18
JPS6130749B2 true JPS6130749B2 (en) 1986-07-15

Family

ID=15625916

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55156354A Granted JPS5779653A (en) 1980-11-06 1980-11-06 Lead frame for resin-sealed semiconductor device

Country Status (1)

Country Link
JP (1) JPS5779653A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6396947A (en) * 1986-10-13 1988-04-27 Mitsubishi Electric Corp Lead frame semiconductor device
US4876587A (en) * 1987-05-05 1989-10-24 National Semiconductor Corporation One-piece interconnection package and process
FR2629272B1 (en) * 1988-03-22 1990-11-09 Bull Sa HIGH DENSITY INTEGRATED CIRCUIT SUPPORT AND APPARATUS FOR SELECTIVE TINNING OF SUPPORT CONDUCTORS

Also Published As

Publication number Publication date
JPS5779653A (en) 1982-05-18

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