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JPS6134505B2 - - Google Patents
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JPS6134505B2 - - Google Patents

Info

Publication number
JPS6134505B2
JPS6134505B2 JP56109378A JP10937881A JPS6134505B2 JP S6134505 B2 JPS6134505 B2 JP S6134505B2 JP 56109378 A JP56109378 A JP 56109378A JP 10937881 A JP10937881 A JP 10937881A JP S6134505 B2 JPS6134505 B2 JP S6134505B2
Authority
JP
Japan
Prior art keywords
cathode
gas
auxiliary
temperature
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56109378A
Other languages
Japanese (ja)
Other versions
JPS5811779A (en
Inventor
Shizuka Yamaguchi
Naotatsu Asahi
Kazuyoshi Terakado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10937881A priority Critical patent/JPS5811779A/en
Publication of JPS5811779A publication Critical patent/JPS5811779A/en
Publication of JPS6134505B2 publication Critical patent/JPS6134505B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は導電性部材のグロー放電処理法に係
り、特にホローカソード放電を利用して温度を高
くして処理を行う方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a glow discharge treatment method for conductive members, and more particularly to a method of treating conductive members by increasing the temperature using hollow cathode discharge.

金属材料の表面処理の1種であるグロー放電表
面処理法が工業的に活用されてきている。その代
表例がイオン窒化処理法である。イオン窒化処理
法は少なくとも10-1Torr以下に減圧されている
減圧容器(以下炉体と記す)に処理に必要なガス
体を導入しながら、被処理品が陰極となるように
電極を設け(炉体を陰極とすることもある)、こ
れに外部の直流電源から電圧を印加してグロー放
電を発生させて表面硬化処理を行うものである。
第1図はイオン窒化処理の概要を示したものであ
る。
A glow discharge surface treatment method, which is a type of surface treatment for metal materials, has been used industrially. A typical example is the ion nitriding method. The ion nitriding method involves introducing a gas body necessary for the treatment into a reduced pressure vessel (hereinafter referred to as the furnace body) whose pressure is reduced to at least 10 -1 Torr or less, and installing an electrode so that the product to be treated becomes a cathode ( (The furnace body may be used as a cathode), and a voltage is applied to this from an external DC power source to generate glow discharge and perform surface hardening treatment.
FIG. 1 shows an outline of the ion nitriding process.

一般には被処理品2が陰極となり、炉体1が陽
極となつている。炉体1は処理中の加熱により各
種の機器や部品(気密用パツキング等)が過熱さ
れるのを防ぐために水冷構造となつている。イオ
ン窒化処理では真空排気装置9内で炉体内を少な
くとも10-1Torr以下に減圧しながら、水素ガス
と窒素ガス或いはアンモニアガスなどの処理ガス
6を導入して1〜10Torrの範囲の所定の圧力に
保持し、直流電源3から300〜1500Vの電圧を印
加してグロー放電を発生させて窒化処理を行なつ
ている。なお第1図において、4は陽極端子、5
は陰極端子、6はガスボンベ、7はガス導入口、
8は真空装置9が接続されたガス排気口、10は
真空計端子、11は光高温計、12は制御盤であ
る。
Generally, the workpiece 2 serves as a cathode, and the furnace body 1 serves as an anode. The furnace body 1 has a water-cooled structure to prevent various equipment and parts (such as airtight packing) from being overheated due to heating during processing. In the ion nitriding process, while reducing the pressure inside the furnace to at least 10 -1 Torr or less in a vacuum evacuation device 9, a processing gas 6 such as hydrogen gas and nitrogen gas or ammonia gas is introduced to maintain a predetermined pressure in the range of 1 to 10 Torr. The nitriding process is performed by applying a voltage of 300 to 1500 V from the DC power supply 3 to generate glow discharge. In Fig. 1, 4 is an anode terminal, and 5 is an anode terminal.
is the cathode terminal, 6 is the gas cylinder, 7 is the gas inlet,
8 is a gas exhaust port to which a vacuum device 9 is connected, 10 is a vacuum gauge terminal, 11 is an optical pyrometer, and 12 is a control panel.

被処理品の加熱はグロー放電エネルギーによつ
ているので外部からの熱源を必要としない。従つ
てグローを発生している表面が加熱源となるの
で、被処理品の温度は体積に対する表面の割合に
よつて変化する。すなわち同一形状で比較的単純
な形状の被処理品では全体がほぼ均一な温度にな
り均一な処理ができるが、複雑な形状、特に体積
に対する表面積が異なる部品間では同一被処理品
でも場所により温度が異なり、それに伴ない拡散
原子の濃度、深さが大きく変動し、均一な処理が
できなくなるという欠点がある。
Since the object to be processed is heated by glow discharge energy, no external heat source is required. Therefore, since the surface generating the glow becomes the heating source, the temperature of the object to be treated changes depending on the ratio of the surface to the volume. In other words, if the workpiece is of the same shape and has a relatively simple shape, the temperature will be almost uniform throughout and uniform processing will be possible, but if the workpiece has a complex shape, especially parts with different surface areas relative to volume, the temperature will vary depending on the location even if the workpiece is the same. This has the disadvantage that the concentration and depth of diffused atoms vary greatly, making uniform processing impossible.

特にこの温度差は高温度での処理で大きくなる
傾向がある。したがつて、イオン窒化処理よりも
処理温度が高温域すなわち700〜1200℃となる浸
炭あるいは浸硼処理等においては、このような処
理に際して高温域までの昇温あるいは保持をグロ
ー放電エネルギーのみで行うと熱効率が悪く多く
のエネルギーを要するとともに温度差が大きくな
り、必要な場所に均一に硬化処理することが困難
になる。その解決策として例えば従来の真空熱処
理炉内でイオン処理を行う方法、或いは外部から
高周波加熱を行いつつイオン処理を行う方法等が
ある。しかし、前者の場合、被処理品の加熱を例
えば炭素繊維のようなヒータによつて行うため、
加熱電源は高出力を要するとともに、イオンによ
る加熱が少くなるので従来のイオンのみによる処
理に比較して被処理品へのイオン衝撃エネルギー
が小さくなり、表面へのイオン量も少くなる。そ
のため、装置の構造と制御が複雑となるとともに
全体の消費エネルギーも多く、イオンによるクリ
ーニング作用、表面の硬化等の処理に関与する原
子の濃度も少くなる欠点がある。後者の場合、高
周波による誘導電流によつて加熱するため多くの
部品を炉内に装入した場合、高周波コイルからの
距離によつて、個々の部品間で加熱される温度が
異なるとともに、前者同様、電源、制御が複雑と
なる。又処理に要するエネルギーも多く、イオン
のクリーニング作用、表面のイオン濃度の制御の
上でも欠点がある。
In particular, this temperature difference tends to increase when processing at high temperatures. Therefore, in cases such as carburizing or borening, where the treatment temperature is in a higher temperature range than ion nitriding, that is, 700 to 1200°C, it is necessary to raise or maintain the temperature to the high temperature range using only glow discharge energy. This results in poor thermal efficiency, requiring a lot of energy, and a large temperature difference, making it difficult to uniformly cure the required areas. As a solution, there are, for example, a method of performing ion treatment in a conventional vacuum heat treatment furnace, or a method of performing ion treatment while applying high frequency heating from the outside. However, in the former case, the workpiece is heated using a heater such as carbon fiber.
The heating power source requires a high output, and since heating by ions is reduced, the ion impact energy on the processed object is lower than in conventional treatment using only ions, and the amount of ions on the surface is also reduced. Therefore, the structure and control of the device become complicated, the overall energy consumption is large, and the concentration of atoms involved in processing such as cleaning action by ions and surface hardening is also reduced. In the latter case, when many parts are charged into a furnace to be heated by induced current due to high frequency, the temperature heated between individual parts will differ depending on the distance from the high frequency coil, and the same temperature as in the former case will occur. , power supply, and control become complicated. In addition, a large amount of energy is required for the treatment, and there are also drawbacks in terms of ion cleaning effect and control of surface ion concentration.

一方、被処理品の用途に応じては、その表面全
体に同一機能の表面処理を施こすのではなく、同
一被処理品内で、複数の機能を有する処理を要す
ることがある。このような処理は上述のイオン表
面処理においては同一炉内で、一工程で連続して
行うことはできず、複雑工程で行なわれていた。
On the other hand, depending on the intended use of the article to be treated, it may be necessary to perform treatments having multiple functions within the same article, rather than subjecting the entire surface to a surface treatment with the same function. In the above-mentioned ion surface treatment, such a treatment cannot be performed continuously in one process in the same furnace, and is performed in a complicated process.

イオン表面処理法において、部分的に異つた表
面処理層(例えば窒化処理での窒化層深さ及び硬
さ)を得る方法としては、特開昭47−6956号公報
に示される如く、被処理品(陰極)と減圧容器壁
(陽極)との間に付加金属電極(被処理品に対し
て陽極)を抵抗を介して陽極電源へ配置させて、
この部分の電位を変化させ、部分的にイオン衝撃
エネルギーを変化させる方法も知られている。こ
の方法においては、例えば、イオン窒化処理の場
合には、異なつた窒化を要する部分に付加金属電
極を設け、この部分の電位を外部回路によつて変
えてイオン衝撃エネルギーを変化させて表面部に
吸着し拡散する窒素量を調節し、部分的に異なつ
た深さの窒化層を形成させるようにしている。し
かし、この外部回路によつてイオン衝撃エネルギ
ーを部分的に変化させる方法では、衝撃エネルギ
ーの制御が難かしく、装置が複雑となるととも
に、実際問題として窒素の拡散がイオン衝撃エネ
ルギーとともに温度の影響も受ける為、窒化層深
さを部扮分的に大巾に変動させることはできない
欠点があつた。
In the ion surface treatment method, as a method of obtaining partially different surface treatment layers (for example, the depth and hardness of the nitrided layer in nitriding treatment), as shown in Japanese Patent Application Laid-Open No. 47-6956, An additional metal electrode (anode for the workpiece) is placed between the (cathode) and the wall of the vacuum container (anode) via a resistor to the anode power source.
A method is also known in which the potential of this portion is changed to partially change the ion impact energy. In this method, for example, in the case of ion nitriding, additional metal electrodes are provided at parts that require different nitriding, and the potential of these parts is changed by an external circuit to change the ion bombardment energy to the surface parts. The amount of nitrogen adsorbed and diffused is adjusted to form nitrided layers with partially different depths. However, with this method of partially changing the ion bombardment energy using an external circuit, it is difficult to control the bombardment energy, the device becomes complicated, and in practice, nitrogen diffusion is affected by temperature as well as the ion bombardment energy. Therefore, there was a drawback that the depth of the nitrided layer could not be varied over a wide range.

本発明の目的は、前述従来技術の欠点を解消す
べくなされたもので、イオン表面処理装置を用い
て被処理品を特に複数個の被処理品を均一に加熱
して処理を行うに際して、被処理品近傍でイオン
処理用の電源を用いて効率的にある設定した温度
に加熱して全体あるいは部分的に処理することが
でき、しかも加熱に要するエネルギーを大幅に節
約できる材料のグロー放電処理方法を提供するこ
とである。
SUMMARY OF THE INVENTION An object of the present invention was to solve the above-mentioned drawbacks of the prior art. A method for glow discharge treatment of materials that uses an ion treatment power source near the product to efficiently heat it to a certain set temperature and process it in whole or in part, and that can significantly save the energy required for heating. The goal is to provide the following.

本発明は、減圧雰囲気中で雰囲気中に含まれる
所定のガス物質をグロー放電によつて励起して、
陰極に接続された導電性部材よりなる被処理品の
表面に衝突させて、導電性部材内に一定の物理的
あるいは化学的変化を生じせしめるイオン表面処
理法において、単数あるいは複数の各々の被処理
品を、その被処理品を陰極とする電極とは別の少
なくとも二つの面からなつて一定間隙を保つた補
助陰極で包囲された内部に配置することによつ
て、ホロー陰極効果を生じさせることを特徴とす
る導電性部材のグロー放電処理方法に関するもの
である。
The present invention excites a predetermined gaseous substance contained in the atmosphere in a reduced pressure atmosphere by glow discharge,
In an ion surface treatment method in which a certain physical or chemical change is caused in the conductive member by colliding with the surface of the workpiece consisting of a conductive member connected to a cathode, each of the single or multiple workpieces is A hollow cathode effect is produced by arranging a product surrounded by an auxiliary cathode that is made up of at least two surfaces other than the electrode whose cathode is the product to be treated and which maintains a constant gap. The present invention relates to a glow discharge treatment method for a conductive member characterized by the following.

そして、導電性部材の被処理部を少なくとも2
種類のグロー放電処理条件下にさらすことによ
り、導電性部材に複数種の処理を施すことができ
る。
Then, at least two parts of the conductive member are treated.
By exposing the conductive member to different types of glow discharge treatment conditions, it is possible to perform a plurality of types of treatments on the conductive member.

また導電性部材の2以上被処理部を異なつたグ
ロー放電処理条件下にさらすことによつて、1つ
の導電性部材に対し複数種の機能をもつた部分を
与えることができる。
Further, by exposing two or more treated parts of the conductive member to different glow discharge treatment conditions, it is possible to provide a single conductive member with parts having multiple types of functions.

以下本発明の原理を説明する。まず、被処理品
表面から原子を拡散させて、表面硬化或いは表面
の潤滑作用、耐食性、耐疲労性等の機能を持たせ
る場合、被処理材に悪影響を及ぼすことなく機能
を持たせるにはその拡散或いは吸着させる原子の
量、深さ等に適切な値があり、表面濃度が一定
(一般には材料の固溶限或いは吸着物の生長速度
等に関係)に保たれれば、処理温度が重要な役割
を演ずる。ここで鉄鋼材料の表面硬化を例にとる
と、窒素で表面硬化を行う場合は、一般に400〜
700℃の範囲である。炭素を用いる浸炭処理での
表面硬化では700〜1100℃であり、硼素では800〜
1200℃になる。一方、硫黄を用いた浸硫処理によ
る表面潤滑では150〜600℃である。以上のように
拡散させる原子、被処理材により適切な処理温度
と処理時間がある。イオン表面処理において、被
処理品の表面温度を効率よく高くするか或いは部
分的に調切な温度に加熱する方法は外部熱源によ
る方法等も可能であるが、本発明では、被処理品
金属材料とほぼ同電位の複数個から成る補助電極
を、被処理表面から所定の距離をおいて陰極側に
配置し、イオン処理中に導入するガスの圧力を制
御することにより補助陰極と被処理品の間或いは
補助陰極内でホローカソード放電を発生させて処
理を行なう。ここで、被処理品の熱の収受は、グ
ロー放電エネルギーの熱交換、被処理品間や電極
などからの幅射熱であり、熱放出による熱損失は
幅射熱、処理ガスの対流、電極からの熱電導(電
極の冷却水からの流出)などがある。この要因の
中で被処理品の必要な部分を所定の温度に加熱す
るのに利用できるものは、補助の陰極と被処理品
間の幅射熱などである。これは陰極間隔を一定間
隔とし、導入ガス圧力を所定の値に設定して、二
つの負グロー間にホローカソード放電を起させる
ことにつて与えられる。この場合、被処理品と補
助陰極間のガスの電離密度も増加され、目的とす
る拡散する活性を原子との表面反応も活発とな
る。
The principle of the present invention will be explained below. First, when diffusing atoms from the surface of a workpiece to impart functions such as surface hardening, surface lubrication, corrosion resistance, and fatigue resistance, it is necessary to do so without adversely affecting the workpiece. If the amount and depth of atoms to be diffused or adsorbed have appropriate values, and the surface concentration is kept constant (generally related to the solid solubility limit of the material or the growth rate of the adsorbate), the treatment temperature is important. play a role. Taking surface hardening of steel materials as an example, when surface hardening with nitrogen, it is generally 400~
It is in the range of 700℃. Surface hardening by carburizing using carbon is 700-1100℃, and boron is 800-1100℃.
The temperature reaches 1200℃. On the other hand, surface lubrication by sulfurization using sulfur is 150 to 600°C. As described above, there are appropriate processing temperatures and processing times depending on the atoms to be diffused and the material to be processed. In ionic surface treatment, methods such as using an external heat source can be used to efficiently raise the surface temperature of the object to be treated or to heat it to a partially controlled temperature. A plurality of auxiliary electrodes with approximately the same potential are placed on the cathode side at a predetermined distance from the surface to be treated, and by controlling the pressure of the gas introduced during ion treatment, the gap between the auxiliary cathode and the object to be treated is Alternatively, the process is performed by generating hollow cathode discharge within the auxiliary cathode. Here, the absorption of heat from the workpiece is due to the heat exchange of glow discharge energy, radiant heat from between the workpieces and the electrodes, and the heat loss due to heat release is radial heat, convection of the processing gas, and radial heat from the electrodes. Thermal conduction from the electrodes (outflow from the cooling water of the electrodes), etc. Among these factors, those that can be used to heat the required portion of the workpiece to a predetermined temperature include radiation heat between the auxiliary cathode and the workpiece. This is achieved by setting the cathode spacing at a constant interval, setting the introduced gas pressure to a predetermined value, and causing a hollow cathode discharge between two negative glows. In this case, the ionization density of the gas between the object to be treated and the auxiliary cathode is also increased, and the surface reaction with the target diffusion active atoms is also activated.

この現象を効果的に行なうためには、被処理品
表面から補助電極までの距離及びガスの組成に応
じたガス圧力の設定が重要な因子になる。先ず被
処理品表面から補助電極までの距離であるが、こ
れはガス圧力によつても異なるが、被処理品及び
配設された補助電極とに生じる負グローが何らか
の相互作用を及ぼしてホローカソード放電を発生
しなければ目的とする効果は発生しない。これ
は、ガス組成及びガス圧によつて負グローの幅が
異なりこれがホローカソード放電に強く影響する
からである。更に、これらと密接な関係にある補
助電極の負グロー放電面積をも考慮しなければな
らない。したがつて、一般的なイオン表面処理に
おいては、この距離が0.5mm以下になると被処理
品への処理ガスの反応が阻害される傾向にあり、
一方50mm以上離れるとグロー間の相互作用の影響
が弱くなり補助電極からの被処理品への幅射熱に
よる加熱効果が低下するとともに補助電極側への
熱損失ともなり、エネルギーの損失になる。そこ
で、第2図は平行平板陰極の補助電極による被処
理品の加熱効果を示したものである。第3図は2
つの円筒状陰極を同心円となるように配置して両
者間に被処理品を設置した例である。一例として
第2図のようにある間隙を持つて設置された二つ
の平行面の補助電極13から成る平行平板陰極の
間隙内に被処理品2の一部を設置し、これらを陰
極に接続する。窒素ガス、水素ガス、アルゴンガ
ス、メタンガス等の混合ガスを用い、2.5Torrの
ガス圧力でグロー放電を発生させ平行面の補助電
極のない被処理品上部の温度を600℃とした場合
の平行面の補助電極内の被処理品の温度を測定し
た。第4図は平行面の補助電極と被処理品との間
隙の距離と温度の関係を示したものである。距離
と温度の関係は導入ガスの比率、ガス圧力、被処
理材の形状、補助電極材質及びその形状などによ
り大きく変動する。第4図の場合を見ると、距離
が0.5mm以下は平行面の補助電極内の温度600℃で
他のグロー面とほぼ等しい温度になつている。そ
れ以上距慮が大きくなると平行面の補助電極部の
温度が急激に上昇し、距離が3〜7mmでピーク値
になる。この距離の場合、平行面の補助電極内の
温度は1000℃以上となり他の部分よりも約400℃
以上高い温度になつている。更に距離が長くなる
と、それらの温度差は漸次少なくなり約50mmでは
あまり差を生じなくなつている。以上のように平
行面の補助電極と被処理品の距離は0.5〜50mmの
範囲が望ましい。なお、この方法において被処理
品の表面は、700℃以上に加熱された領域には浸
炭が施され、その他の領域には浸炭窒化が施され
る。
In order to effectively carry out this phenomenon, important factors are the distance from the surface of the object to be treated to the auxiliary electrode and the setting of the gas pressure according to the composition of the gas. First, there is the distance from the surface of the workpiece to the auxiliary electrode, which varies depending on the gas pressure. Unless discharge occurs, the desired effect will not occur. This is because the width of the negative glow varies depending on the gas composition and gas pressure, which strongly affects hollow cathode discharge. Furthermore, the negative glow discharge area of the auxiliary electrode, which is closely related to these, must also be considered. Therefore, in general ionic surface treatment, if this distance is less than 0.5 mm, the reaction of the processing gas to the object to be processed tends to be inhibited.
On the other hand, if the distance is 50 mm or more, the effect of the interaction between the glows becomes weaker, and the heating effect of radiated heat from the auxiliary electrode to the processed object decreases, and there is also heat loss to the auxiliary electrode side, resulting in a loss of energy. Therefore, FIG. 2 shows the heating effect of the object to be processed by the auxiliary electrode of the parallel plate cathode. Figure 3 is 2
This is an example in which two cylindrical cathodes are arranged concentrically and a workpiece is placed between them. As an example, as shown in Fig. 2, a part of the object to be processed 2 is placed in the gap between the parallel plate cathodes, which are made up of two parallel plane auxiliary electrodes 13 placed with a certain gap, and these are connected to the cathode. . Parallel surface when using a mixed gas such as nitrogen gas, hydrogen gas, argon gas, methane gas, etc., and generating glow discharge at a gas pressure of 2.5 Torr, and setting the temperature above the workpiece without an auxiliary electrode on the parallel surface to 600℃. The temperature of the workpiece inside the auxiliary electrode was measured. FIG. 4 shows the relationship between the distance of the gap between the auxiliary electrode on the parallel plane and the object to be processed and the temperature. The relationship between distance and temperature varies greatly depending on the ratio of introduced gas, gas pressure, the shape of the material to be treated, the material of the auxiliary electrode and its shape, etc. Looking at the case in Figure 4, when the distance is 0.5 mm or less, the temperature within the auxiliary electrode on the parallel surface is 600°C, which is almost the same temperature as the other glow surfaces. When the distance becomes larger than that, the temperature of the auxiliary electrode portion on the parallel plane rises rapidly, reaching a peak value at a distance of 3 to 7 mm. At this distance, the temperature inside the auxiliary electrode on the parallel plane is more than 1000℃, which is about 400℃ higher than other parts.
The temperature is getting higher than that. As the distance further increases, the temperature difference between them gradually decreases, and at about 50 mm there is no significant difference. As mentioned above, the distance between the parallel plane auxiliary electrode and the object to be processed is preferably in the range of 0.5 to 50 mm. In addition, in this method, the surface of the article to be treated is carburized in the area heated to 700° C. or higher, and carbonitrided in the other area.

次にガス圧力であるが、ガスの混合比率、目的
とする特性により適正な値がある。例えばここで
第5図は第2図と同方法において平行面の補助陰
極と被処理品との間隙の距離を1.5mmとし、ガス
圧力を変動させた場合の温度を求めた例である。
図によればガス圧力を0.5Torr未満に保持すると
平行面の補助電極内の温度も他のグロー面とほぼ
等しい温度になる。一方、ガス圧力を0.5Torr以
上にすると平行面の補助電極内のグロー放電電流
密度が高くなり、他の部分よりも高くなつて温度
差を生じる。この例ではガス圧力を約2.5Torrに
保持すると平行面の補助陰極内では他の部分より
も約400℃以上高温に保持することができる。な
お、この最高加熱温度あるいは温度差はガスの組
成、補助陰極の構造等により大巾に変化させるこ
とができる。以上のように本法では被処理品の全
体あるいは部分的に加熱保持するために処理圧力
が重要な因子となつている。一般には0.1〜
10Torrの範囲で変動させるのが望ましい。
Next is the gas pressure, which has an appropriate value depending on the gas mixture ratio and the desired characteristics. For example, FIG. 5 shows an example in which the temperature was determined using the same method as in FIG. 2, with the distance between the parallel plane auxiliary cathode and the workpiece being 1.5 mm, and the gas pressure being varied.
According to the figure, when the gas pressure is maintained below 0.5 Torr, the temperature in the auxiliary electrode on the parallel surface becomes approximately the same as that on the other glow surfaces. On the other hand, when the gas pressure is increased to 0.5 Torr or more, the glow discharge current density in the auxiliary electrode on the parallel plane becomes higher than in other parts, resulting in a temperature difference. In this example, if the gas pressure is maintained at approximately 2.5 Torr, the temperature within the parallel-sided auxiliary cathode can be maintained at approximately 400° C. or more higher than the other portions. Note that this maximum heating temperature or temperature difference can be varied widely depending on the composition of the gas, the structure of the auxiliary cathode, etc. As described above, in this method, the processing pressure is an important factor in order to heat and maintain the whole or part of the product to be processed. Generally 0.1~
It is desirable to fluctuate within a range of 10 Torr.

本発明における他の付ずい的因子として、補助
電極の大きさ及び材質がある。先ず補助電極の大
きさは、被処理品全体を加熱する場合は被処理品
が平行面の補助電極の内部にほぼ設置できる大き
さが好ましい。一方、被処理品を部分的に加熱あ
るいは異なつた処理を施したい場合には、その部
分がほぼ平行面の補助電極の内部に収まる大きさ
であるのが好ましい。次に補助電極の材質は、処
理中に被処理品の表面に悪影響を及ぼさない材料
であれば良い。
Other incidental factors in the present invention include the size and material of the auxiliary electrode. First, the size of the auxiliary electrode is preferably such that when the entire object to be processed is heated, the object to be processed can be placed almost inside the auxiliary electrode on a parallel surface. On the other hand, when it is desired to partially heat or perform a different treatment on the object to be processed, it is preferable that the area is large enough to fit inside the auxiliary electrode having substantially parallel surfaces. Next, the material of the auxiliary electrode may be any material as long as it does not adversely affect the surface of the object to be processed during processing.

更に本発明を効果的に行うためには補助陰極の
形状及び構造も重要な因子となる。第6図は、第
2図で示した平板陰極13を改良した後の補助陰
極構造で、その一方を示したものである。この場
合13aが被処理品に面した側であり、13bは
その反対側である。この処理方法では陰極間隙t1
が重要な因子となる。更に被処理品側の平板陰極
13aが13bよりも高い温度になるような構造
すなわち13bの厚さを13aの厚さよりも大に
するなどの工夫をすることが効果的である。ホロ
ーカソード効果は13aと13b及び13aと被
処理品との間で発生させる。また補助陰極の構造
を第7図のように円心円から成る円筒型としても
よい。この場合補助電極13a或いは13dは1
3b或いは13eに比較して薄くし更に小形片と
して13cに取付けると、ホローカソード放電に
よる加熱に伴う熱膨張での変形によるホローカソ
ード放電の間隙の変化を少なくすることができ
る。次に補助電極の間隙t2,t3の間隙であるが、
一般的なイオン表面硬化処理においては、この距
離が0.5mm以下になると被処理品への処理ガスの
反応が阻害される傾向にあり、一方50mm以上離れ
るとグロー間でのホローカソード効果の影響が弱
くなり補助電極間或いは被処理品との間の幅射熱
による加熱効果が低下するし、一般のイオン表面
処理に近くなる。
Furthermore, the shape and structure of the auxiliary cathode are also important factors in order to carry out the present invention effectively. FIG. 6 shows an auxiliary cathode structure obtained by improving the flat plate cathode 13 shown in FIG. 2, one of which is shown. In this case, 13a is the side facing the workpiece, and 13b is the opposite side. In this treatment method, the cathode gap t 1
is an important factor. Furthermore, it is effective to devise a structure in which the flat plate cathode 13a on the side of the object to be treated is heated to a higher temperature than the cathode 13b, that is, to make the thickness of the cathode 13b larger than the thickness of the cathode 13a. The hollow cathode effect is generated between 13a and 13b and between 13a and the workpiece. Further, the structure of the auxiliary cathode may be a cylindrical structure having a circular center as shown in FIG. In this case, the auxiliary electrode 13a or 13d is 1
By making it thinner than 3b or 13e and attaching it to 13c as a small piece, it is possible to reduce changes in the gap between hollow cathode discharges due to deformation due to thermal expansion due to heating by hollow cathode discharges. Next is the gap t 2 and t 3 between the auxiliary electrodes,
In general ionic surface hardening treatment, if this distance is less than 0.5 mm, the reaction of the processing gas to the treated object tends to be inhibited, while if it is more than 50 mm away, the influence of the hollow cathode effect between glows is reduced. This weakens the heating effect due to radiant heat between the auxiliary electrodes or the object to be treated, and it becomes similar to general ion surface treatment.

ここで窒素ガス、水素ガス、アルゴンガス、メ
タンガスの混合ガスを用い3Torrの圧力でグロー
放電を発生させ、補助電極のない場合、第6図及
び第7図の補助電極を用い第6図ではt1を30mmと
し、13aと被処理品の間隙を任意に変えた場合
及び第7図でt2を10mm,t3を任意に変えて、これ
と被処理品との間隙を10mmとした場合に直径15mm
×長さ50mmの試験片の温度を同一炉内に同時に処
理を行つて測定した。第8図は間隙と温度の関係
を示すグラフである。補助電極のない従来のグロ
ー放電のみの温度はAのように570℃であるが、
補助電極として第6図に示すものを用いた場合
は、Bのようになりホローカソード放電の発生す
る2〜7mmの間では900℃以上の温度にまで加熱
される。また補助電極として第7図のものを用い
た場合は第8図の曲線Cのような温度になり、補
助電極のない場合に比較してホローカソード放電
部では300℃以上高い温度になつている。この温
度差はガス組成、ガス圧力、補助電極材々質、形
状、厚さ等によつて大きく変動する。以上のよう
に補助電極を用いてホローカソード放電を用いて
個々の部品のそれぞれ或いは個々の部品のある特
定の位置を加熱するにはホローカソード放電を発
生させる距離は0.5〜50mmの範囲が望ましいこと
が分る。次に補助電極の構造であるが第6図及び
第7図の構造で補助電極として陽極に対向する面
の陰極13bを被処理側の陰極13aより厚くし
て同様の実験を行うと各々の厚さの差にもよるが
13aの陰極が厚くなる程、同一の消費電力では
温度差が少くなり、陰極13aが陰極13bより
も高い温度となる構造が望ましい結果を得た。
Here, a glow discharge is generated at a pressure of 3 Torr using a mixed gas of nitrogen gas, hydrogen gas, argon gas, and methane gas. If there is no auxiliary electrode, the auxiliary electrode shown in Figures 6 and 7 is used. When 1 is set to 30 mm and the gap between 13a and the workpiece is arbitrarily changed, and when t2 and t3 are arbitrarily changed to 10mm and the gap between this and the workpiece is set to 10mm in Fig. 7. Diameter 15mm
The temperature of test pieces with a length of 50 mm was measured by simultaneously processing them in the same furnace. FIG. 8 is a graph showing the relationship between the gap and temperature. The temperature of conventional glow discharge alone without an auxiliary electrode is 570℃ as in A, but
When the auxiliary electrode shown in FIG. 6 is used, it becomes as shown in B and is heated to a temperature of 900 DEG C. or more between 2 and 7 mm where hollow cathode discharge occurs. Furthermore, when the auxiliary electrode shown in Figure 7 is used, the temperature becomes as shown by curve C in Figure 8, which is more than 300°C higher in the hollow cathode discharge area than in the case without the auxiliary electrode. . This temperature difference varies greatly depending on the gas composition, gas pressure, material, shape, thickness, etc. of the auxiliary electrode. As mentioned above, in order to heat each individual component or a specific position of each component using hollow cathode discharge using an auxiliary electrode, the distance at which the hollow cathode discharge is generated is preferably in the range of 0.5 to 50 mm. I understand. Next, regarding the structure of the auxiliary electrode, if a similar experiment is performed with the structure shown in FIGS. 6 and 7, and the cathode 13b on the surface facing the anode is made thicker than the cathode 13a on the side to be treated, each thickness will be Although it depends on the difference in thickness, the thicker the cathode 13a is, the smaller the temperature difference is for the same power consumption, and a structure in which the temperature of the cathode 13a is higher than that of the cathode 13b was obtained.

本発明の実施例を詳細に説明する。 Examples of the present invention will be described in detail.

〔実施例 1〕 第9図及び第10図に示すイオン表面処理装置
の内部に被処理品2を同心円環状に配列し、その
内周及び外周に同心円環状の平行面の補助電極1
3を設定し、イオン浸炭処理を行つた。
[Example 1] Workpieces 2 to be treated are arranged in a concentric ring shape inside the ion surface treatment apparatus shown in FIGS. 9 and 10, and auxiliary electrodes 1 with concentric ring-shaped parallel surfaces are arranged on the inner and outer peripheries.
3 was set, and ion carburizing treatment was performed.

被処理品は、JIS規格SCM415のクロムモリブ
デン鋼のピニオン(直径25mm,長さ50mm,モジユ
ール2)を48個使用した。円環状の補助電極は、
外周に設置した14は直径φ200mm(内径)、内周
に設置した15は直径φ80mm(外径)で高さはそ
れぞれ110mm,肉厚6mmのSS41製である。
48 chrome-molybdenum steel pinions (diameter 25 mm, length 50 mm, module 2) of JIS standard SCM415 were used as the objects to be treated. The annular auxiliary electrode is
14 installed on the outer circumference is made of SS41 with a diameter of φ200 mm (inner diameter), and 15 installed on the inner circumference has a diameter of φ80 mm (outer diameter), a height of 110 mm, and a wall thickness of 6 mm.

処理は、減圧容器1内を10-2Torr以下に減圧
し、その状態で水素ガスを導入してピニオンと大
小の円環状の補助電極間においてホロー陰極効果
を生じさせて980℃で5min間のスパツタクリーニ
ングを行い、次に窒素ガス、メタンガス、アルゴ
ンガスを添加して同温度に10min間保持して浸炭
処理を行つた。この処理時の温度分布を赤外線光
高温計により測定した。本発明の処理時の温度分
布±7℃であつた。処理後、被処理品を炉内で冷
却し、その断面硬さ分布を測定した。第11図は
硬さ分布を示したものである。第11図において
曲線a及びa′は本発明による処理後の硬さ分布で
あり、曲線aは歯先部、曲線a′は歯底部である。
曲線b及びb′は従来法による処理後の硬さ分布で
あり、曲線bは歯先部、曲線b′は歯底部である。
図で明らかなように従来法では歯先部が温度が高
くなつて有効硬化深さは1.5mmであるが、歯底部
では表面硬さも低く有効硬化深さは0.4mmであ
る。このように従来法ではピニオン等に均一な浸
炭層が得られなかつた。一方本発明によれば歯先
部では有効硬化深さ1.3mm,歯底部では0.85mmで
あり表面硬さはいずれもHv800程度になつてお
り、均一な浸炭層を得ることができた。以上の結
果より本発明法によれば、複雑形状品であるピニ
オンの歯先部、歯底部の温度を高温域にて多数個
均一に保持することができる。一方処理に要した
放電電力量は従来法の1/3であり、したがつて省
資源、省エネルギーの上からも極めて有効であ
る。
The process involves reducing the pressure inside the vacuum vessel 1 to 10 -2 Torr or less, introducing hydrogen gas in that state to create a hollow cathode effect between the pinion and the large and small annular auxiliary electrodes, and heating it at 980°C for 5 minutes. Spatter cleaning was performed, and then nitrogen gas, methane gas, and argon gas were added and carburization was performed by maintaining the same temperature for 10 minutes. The temperature distribution during this treatment was measured using an infrared pyrometer. The temperature distribution during the treatment of the present invention was ±7°C. After the treatment, the treated product was cooled in a furnace, and its cross-sectional hardness distribution was measured. FIG. 11 shows the hardness distribution. In FIG. 11, curves a and a' are the hardness distribution after the treatment according to the present invention, where curve a is the tooth tip and curve a' is the tooth bottom.
Curves b and b' are the hardness distributions after treatment by the conventional method, where curve b is at the tooth tip and curve b' is at the tooth bottom.
As is clear from the figure, in the conventional method, the temperature at the tooth tip is high and the effective hardening depth is 1.5 mm, but the surface hardness at the tooth bottom is low and the effective hardening depth is 0.4 mm. As described above, in the conventional method, it was not possible to obtain a uniform carburized layer on pinions and the like. On the other hand, according to the present invention, the effective hardening depth was 1.3 mm at the tooth tip and 0.85 mm at the tooth bottom, and the surface hardness was approximately Hv800 in both cases, making it possible to obtain a uniform carburized layer. From the above results, according to the method of the present invention, the temperature of the tooth tips and tooth bottoms of a large number of complex-shaped pinions can be maintained uniformly in a high temperature range. On the other hand, the amount of discharge power required for the treatment is 1/3 of the conventional method, so it is extremely effective in terms of resource and energy conservation.

〔実施例 2〕 実施例1と同一の被処理品を用い、円環状の補
助電極を種々変化させて、第9図に示す装置中で
窒素ガス、水素ガス、アルゴンガス、メタンガス
の混合ガスの圧力を変動させた場合の被処理品の
温度を測定した。円環状の補助電極の形状は第6
図、及び第6図の形状において13aに直径0.5
〜9mmの穴及び0.5〜9mm巾のスリツトを設けた
ものである。外周及び内周に設置した円環状の補
助電極13aと被処理品間の間隙はいずれも15mm
一定とし、また円環状の補助電極の13aと13
bの間隙tiは5mmとして。第12図はガス圧力
と温度分布の関係を示したものである。イオンに
おける表面処理を安定して行うためには多少のガ
ス圧力の変動によつても被処理品の温度が大きく
変動しないことである。単一の円環状補助電極で
は第12図の曲線Dのように被処理品との間でホ
ローカソード放電を発生させる範囲内のみで比較
的狭い圧力範囲内で高い温度になる。これを第6
図のようにすると第12図の曲線Eのようになり
ホローカソード効果が電極内である第6図の13
a及び13bの間に発生し、その効果が見られ
る。また13aに直径1〜3mmの穴を順序正しく
設けた場合は第12図の曲線Fのように最高加熱
時の圧力範囲が広くなる。この場合、圧力の変動
により13aの補助電極の穴の中にその圧力に応
じてホローカソード放電が発生し、これにより被
処理品とのホローカソード放電の圧力範囲が広く
なることによる。なお、最高加熱温度、一定温度
を維持できる圧力範囲は補助電極の形状、構造、
ガス組成によつて大巾に変動できる。
[Example 2] Using the same workpiece as in Example 1 and changing the annular auxiliary electrode in various ways, a mixed gas of nitrogen gas, hydrogen gas, argon gas, and methane gas was mixed in the apparatus shown in Fig. 9. The temperature of the processed product was measured when the pressure was varied. The shape of the annular auxiliary electrode is the sixth
Diameter 0.5 at 13a in the shape shown in Figures and Figure 6
It has a ~9mm hole and a 0.5~9mm wide slit. The gap between the annular auxiliary electrode 13a installed on the outer and inner peripheries and the workpiece is 15 mm.
constant, and the annular auxiliary electrodes 13a and 13
The gap t i of b is 5 mm. FIG. 12 shows the relationship between gas pressure and temperature distribution. In order to stably perform surface treatment using ions, it is important that the temperature of the object to be treated does not vary greatly even with slight fluctuations in gas pressure. With a single annular auxiliary electrode, the temperature is high within a relatively narrow pressure range only within a range where hollow cathode discharge is generated between the electrode and the workpiece, as shown by curve D in FIG. This is the 6th
If you do it as shown in the figure, it will look like curve E in Figure 12, and the hollow cathode effect will be in the electrode 13 in Figure 6.
It occurs between a and 13b, and its effect can be seen. Further, when holes 13a with diameters of 1 to 3 mm are provided in the correct order, the pressure range at maximum heating becomes wider as shown by curve F in FIG. In this case, a hollow cathode discharge is generated in the hole of the auxiliary electrode 13a according to the pressure due to the fluctuation of pressure, and the pressure range of the hollow cathode discharge with the workpiece is thereby widened. The maximum heating temperature and the pressure range that can maintain a constant temperature depend on the shape and structure of the auxiliary electrode,
It can vary widely depending on the gas composition.

次に第6図の構造の電極として直径0.5〜3
mm,4,5,6,7,8,9mmの穴を順次設けた
内部補助電極を用いて穴の大きさについて検討し
た。その結果、最大の穴径が4mm以上になると最
高加熱温度が急激に低下し8mm以上になると効果
が著しく低下することがわかつた。最も効果があ
る範囲は直径0.5〜4mmで、0.5〜7mmの範囲でも
ある程度の効果がある。次に穴の代りに長さ20mm
のスリツトを設けた。この場合もスリツトの巾が
4mm以内であれば同様に始めにスリツト内でホロ
ーカソード効果にもとづく放電が発生した。次に
電極の外側にセラミツクス層を設けて同様の実験
を行つた。その結果、第6図の形の電極で被処理
品側の反対面にセラミツクを設けた場合は電気出
力を約10%低減出来ることが知られた。
Next, as an electrode with the structure shown in Figure 6, a diameter of 0.5 to 3
The size of the holes was investigated using an internal auxiliary electrode in which holes of 4, 5, 6, 7, 8, and 9 mm were sequentially provided. As a result, it was found that when the maximum hole diameter was 4 mm or more, the maximum heating temperature decreased rapidly, and when the maximum hole diameter was 8 mm or more, the effectiveness decreased significantly. The most effective range is 0.5 to 4 mm in diameter, and a range of 0.5 to 7 mm is also somewhat effective. Next, instead of a hole, length 20mm
A slit was provided. In this case as well, if the width of the slit was within 4 mm, a similar discharge occurred within the slit based on the hollow cathode effect. Next, a similar experiment was conducted with a ceramic layer provided on the outside of the electrode. As a result, it was found that if ceramic was provided on the opposite side of the object to be treated using an electrode having the shape shown in FIG. 6, the electrical output could be reduced by approximately 10%.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はイオン窒化処理装置の概略図、第2図
は平行平板電極の補助電極説明図、第3図は第2
図の電極を環状に形成した場合の説明図、第4図
は第2図の方法による被処理品と平行平板陰極と
の距離及び温度との関係説明図、第5図は同じく
圧力と温度との関係説明図、第6図は第2図の平
行平板陰極改良後の斜視図、第7図は第6図の電
極を環状に配置した平面図、第8図は間隙と温度
との関係グラフ、第9図は本発明のイオン表面処
理法を実施する装置の縦断面図、第10図は第9
図の円環状補助電極の説明図、第11図は距離と
硬さの関係説明図、第12図はガス圧と温度との
関係説明図である。 1……炉体、2……被処理品(陰極)、4……
陽極端子、5……陰極端子、7……ガス導入口、
8……ガス排気口、9……真空装置、13……平
行陰極、13a……補助陰極(被処理品側)、1
3b……補助陰極(被処理品の反対側)、13c
……補助陰極(中間部)、131……円環状補助
電極(外周)、132……円環状補助電極(内
周)。
Figure 1 is a schematic diagram of the ion nitriding treatment equipment, Figure 2 is an explanatory diagram of the auxiliary electrode of parallel plate electrodes, and Figure 3 is the
Figure 4 is an explanatory diagram of the relationship between the distance and temperature between the object to be treated and the parallel plate cathode by the method of Figure 2, and Figure 5 is also an illustration of the relationship between pressure and temperature. Figure 6 is a perspective view of the improved parallel plate cathode in Figure 2, Figure 7 is a plan view of the electrodes in Figure 6 arranged in a ring, and Figure 8 is a graph of the relationship between the gap and temperature. , FIG. 9 is a vertical cross-sectional view of an apparatus for carrying out the ion surface treatment method of the present invention, and FIG.
FIG. 11 is an explanatory diagram of the relationship between distance and hardness, and FIG. 12 is an explanatory diagram of the relationship between gas pressure and temperature. 1...furnace body, 2...product to be treated (cathode), 4...
Anode terminal, 5...Cathode terminal, 7...Gas inlet,
8...Gas exhaust port, 9...Vacuum device, 13...Parallel cathode, 13a...Auxiliary cathode (workpiece side), 1
3b...Auxiliary cathode (opposite side of processed item), 13c
... Auxiliary cathode (middle part), 131 ... Circular auxiliary electrode (outer periphery), 132 ... Annular auxiliary electrode (inner periphery).

Claims (1)

【特許請求の範囲】 1 減圧雰囲気中で所定のガス物質をグロー放電
によつて励起してイオン化し、陰極に接続された
導電性部材よりなる被処理品の表面に衝突させて
表面処理を施す方法において、前記被処理品の周
囲に少なくとも2つの補助陰極を対向させて設置
し且つ該補助陰極と前記被処理品との間隔を0.5
〜50mmとし、前記減圧雰囲気内のガス圧力を0.1
〜10Torrとし、前記被処理品と前記補助陰極の
両方にグロー放電を発生させて表面処理を施すこ
とを特徴とするイオン表面処理法。 2 特許請求の範囲第1項において、前記被処理
品の一部分の周囲に少なくとも2つの前記補助陰
極を対向させて設置することを特徴とするイオン
表面処理法。 3 特許請求の範囲第2項において、前記ガス物
質として窒素ガスと水素ガスとアルゴンガスとメ
タンガスの混合ガスを用いることにより、前記被
処理品を少なくとも2種類のグロー放電処理条件
下にさらすことを特徴とするイオン表面処理法。 4 減圧雰囲気中で所定のガス物質をグロー放電
によつて励起してイオン化し、陰極に接続された
導電性部材よりなる被処理品の表面に衝突させて
表面処理を施す方法において、前記被処理品の周
囲に多層構造の補助陰極を少なくとも2つ対向さ
せて設置し且つ多層構造の層間に間隙を設けると
共に各層を陰極に接続し、多層構造の該補助陰極
の最内壁面と前記被処理品との間隔を0.5〜50mm
とし、前記減圧雰囲気内のガス圧力を0.1〜
10Torrとし、前記被処理品と前記補助陰極の両
方にグロー放電を発生させて表面処理を施すこと
を特徴とするイオン表面処理法。 5 特許請求の範囲第4項において、多層構造の
前記補助陰極の層間間隙を0.5〜50mmとすること
を特徴とするイオン表面処理法。
[Claims] 1. A predetermined gas substance is excited and ionized by glow discharge in a reduced pressure atmosphere, and the ionized material is caused to collide with the surface of a workpiece made of a conductive member connected to a cathode to perform surface treatment. In the method, at least two auxiliary cathodes are installed around the object to be processed so as to face each other, and the distance between the auxiliary cathode and the object to be processed is 0.5.
~50mm, and the gas pressure in the reduced pressure atmosphere is 0.1
10 Torr, and generates glow discharge on both the object to be treated and the auxiliary cathode to perform surface treatment. 2. The ion surface treatment method according to claim 1, characterized in that at least two of the auxiliary cathodes are placed facing each other around a part of the object to be treated. 3. In claim 2, the article to be treated is exposed to at least two types of glow discharge treatment conditions by using a mixed gas of nitrogen gas, hydrogen gas, argon gas, and methane gas as the gas substance. Characteristic ionic surface treatment method. 4. A method in which a predetermined gaseous substance is excited and ionized by glow discharge in a reduced pressure atmosphere, and the ionized material is caused to collide with the surface of a workpiece made of a conductive member connected to a cathode to perform surface treatment. At least two auxiliary cathodes with a multilayer structure are installed around the product so as to face each other, and a gap is provided between the layers of the multilayer structure, and each layer is connected to the cathode, and the innermost wall surface of the auxiliary cathode with the multilayer structure and the product to be treated are The distance between the
and the gas pressure in the reduced pressure atmosphere is 0.1~
10Torr, and surface treatment is performed by generating glow discharge on both the article to be treated and the auxiliary cathode. 5. The ion surface treatment method according to claim 4, characterized in that the auxiliary cathode having a multilayer structure has an interlayer gap of 0.5 to 50 mm.
JP10937881A 1981-07-15 1981-07-15 Ion surface treatment method Granted JPS5811779A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10937881A JPS5811779A (en) 1981-07-15 1981-07-15 Ion surface treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10937881A JPS5811779A (en) 1981-07-15 1981-07-15 Ion surface treatment method

Publications (2)

Publication Number Publication Date
JPS5811779A JPS5811779A (en) 1983-01-22
JPS6134505B2 true JPS6134505B2 (en) 1986-08-08

Family

ID=14508722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10937881A Granted JPS5811779A (en) 1981-07-15 1981-07-15 Ion surface treatment method

Country Status (1)

Country Link
JP (1) JPS5811779A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0753908B2 (en) * 1986-03-20 1995-06-07 株式会社東芝 High-speed sliding member manufacturing method
JPH0623426B2 (en) * 1987-01-09 1994-03-30 株式会社神戸製鋼所 Surface hardening method for high Mn non-magnetic steel
KR20150110968A (en) * 2014-03-22 2015-10-05 (주)제이 앤 엘 테크 Method and system for nitriding bore of pipe with hollow cathode discharge
CN112795863B (en) * 2020-12-30 2021-11-09 清华大学 Titanium alloy surface ion carbonitriding processing apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5394231A (en) * 1977-01-28 1978-08-18 Suzuki Motor Co Ionic nitriding treatment method

Also Published As

Publication number Publication date
JPS5811779A (en) 1983-01-22

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