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JPS6140984B2 - - Google Patents
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JPS6140984B2 - - Google Patents

Info

Publication number
JPS6140984B2
JPS6140984B2 JP1978978A JP1978978A JPS6140984B2 JP S6140984 B2 JPS6140984 B2 JP S6140984B2 JP 1978978 A JP1978978 A JP 1978978A JP 1978978 A JP1978978 A JP 1978978A JP S6140984 B2 JPS6140984 B2 JP S6140984B2
Authority
JP
Japan
Prior art keywords
hole
dry plate
glass
photomask
glass dry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1978978A
Other languages
Japanese (ja)
Other versions
JPS54114304A (en
Inventor
Masao Kaneko
Keiji Fujikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1978978A priority Critical patent/JPS54114304A/en
Publication of JPS54114304A publication Critical patent/JPS54114304A/en
Publication of JPS6140984B2 publication Critical patent/JPS6140984B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

【発明の詳細な説明】 本発明はプリント回路板等の製造に用いられる
ガラスフオトマスクに関するものであり、フオト
マスクとその被転写物に相対的に同じ位置にガイ
ド穴を設け、そのガイド穴にピンを通して、フオ
トマスクと被転写物の位置合わせを行なつた後、
フオトマスクに描かれた印刷回路等を転写する方
法で使用するガラスフオトマスクの製造方法であ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a glass photomask used for manufacturing printed circuit boards, etc., in which guide holes are provided at the same position relatively to the photomask and the object to which it is transferred, and pins are inserted into the guide holes. After aligning the photomask and the transferred object through the
This is a method of manufacturing a glass photomask used in a method of transferring printed circuits etc. drawn on a photomask.

従来ガラスフオトマスク材料であるガラス乾板
へのガイド穴明けは、ガラスに直接穴明けするか
ガラス乾板のガイド穴部に金属を埋込みそれにジ
グボーラ等の工作機械で穴明けしていた。しか
し、ガラスに直接穴明けする方法ではガラスの加
工性が悪いため、明けられたガイド穴の精度が悪
くなり、また、ガラス乾板に金属を埋込みそれに
穴明けする方法ではガイド穴を精度よく加工する
工作機械が必要で特に最近のようにプリント基板
及びその製造のワークサイズが大きくなるとその
ガイド工作機械も大型のものが必要となりその工
作機械は大変高価なものになるとともに、ガラス
乾板を描かれたプリント回路に合わせて工作機械
に取付けガイド穴を加工するのに長時間かかるた
めその結果、ガラスフオトマスクが非常に高価な
ものになつてしまう欠点があつた。
Conventionally, guide holes were formed in a glass dry plate, which is a material for a glass photomask, by either directly drilling holes in the glass, or by filling the guide holes of the glass dry plate with metal and drilling the holes with a machine tool such as a jig borer. However, with the method of directly drilling holes in the glass, the accuracy of the drilled guide holes is poor due to the poor machinability of the glass, and with the method of embedding metal in a glass dry plate and drilling the holes, the guide holes cannot be formed with high precision. Machine tools are required, especially as the size of printed circuit boards and their manufacturing work has increased recently, and the guide machine tools have also become large, making them very expensive. The drawback is that it takes a long time to attach the photomask to a machine tool and machine the guide holes in accordance with the printed circuit, making the glass photomask very expensive.

本発明の目的とするところは、ガラスフオトマ
スクの精度のよいガイド穴を簡単に安価に加工で
きるガラスフオトマスク製造方法を提供すること
である。本発明の特徴とするところは、プリント
回路が描かれたガラス乾板にバカ穴を明け、そこ
にガイド穴に相当する穴が明いたブシユをブシユ
埋込定盤を用いて精度よく樹脂等で固定すること
によりガラス乾板にガイド穴を形成することにあ
る。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a glass photomask that can easily and inexpensively form guide holes with high precision in a glass photomask. A feature of the present invention is that a hole is made in a glass dry plate on which a printed circuit is drawn, and a bushing with a hole corresponding to a guide hole is fixed in the hole with resin etc. with precision using a bushing embedding surface plate. By doing so, guide holes are formed in the glass dry plate.

以下図面を用いて本発明の一実施例を説明す
る。まず、第1図に示すようにプリント回路4及
び位置合わせマーク2の描かれたガラス乾板1の
ガイド穴に相当する部分にバカ穴3を明ける。バ
カ穴3の径は後工程で埋込まれるブシユ5の外形
より10mm程度大きく明けたほうがよい。
An embodiment of the present invention will be described below with reference to the drawings. First, as shown in FIG. 1, a blank hole 3 is made in a portion of the glass dry plate 1 on which the printed circuit 4 and alignment mark 2 are drawn, corresponding to the guide hole. The diameter of the hole 3 should be approximately 10 mm larger than the outer diameter of the bush 5 that will be embedded in the subsequent process.

次に、第2図に示すようにこのガラス乾板1を
ブシユ埋込定盤8に載せ、ガラス乾板1の位置合
わせマーク2とブシユ埋込定盤8の位置合わせマ
ーク2′を重ね合わせることによりガラス乾板1
とブシユ埋込定盤8の位置合わせを行なつた後、
ガイド穴に相当する穴が明けられたブシユ5をピ
ン7に挿入しそのピン7のブシユ埋込定盤8のガ
イド穴9′に挿入しそのブシユ5をエポキシ樹脂
性充填接着剤6(例えば、日本デブコン社製の商
品名デブコンAQ)で、ガラス乾板1のバカ穴3
に固定する。
Next, as shown in FIG. 2, this glass dry plate 1 is placed on the bush-embedded surface plate 8, and the positioning mark 2 of the glass dry plate 1 and the positioning mark 2' of the bush-embedded surface plate 8 are overlapped. Glass dry plate 1
After aligning the bush-embedded surface plate 8 with
Insert the bushing 5 with a hole corresponding to the guide hole into the pin 7, insert it into the guide hole 9' of the bushing embedded surface plate 8 of the pin 7, and fill the bushing 5 with an epoxy resin filling adhesive 6 (for example, With Nippon Devcon Co., Ltd. (product name: Devcon AQ), make a hole in the glass drying plate 1.
Fixed to.

なお、ブシユ5の外周はローレツト仕上げ等で
凹凸を設けておく。しかる後ブシユ5に挿入され
たピンを抜き取ることにより第3図の如くガイド
穴9を有するガラスフオトマスクが得られる。
Note that the outer periphery of the bushing 5 is provided with unevenness by knurling or the like. Thereafter, by removing the pin inserted into the bush 5, a glass photomask having a guide hole 9 as shown in FIG. 3 is obtained.

以上の説明の如く本発明によれば位置精度の良
いガイド穴を簡単にしかも安価に形成することが
できる。
As described above, according to the present invention, guide holes with good positional accuracy can be formed simply and at low cost.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はプリント回路と位置合わせマークが描
かれたガラス乾板にバカ穴を明けた後のガラス乾
板の平面図、第2図は、ガラス乾板にブツシユを
樹脂で固定しているときのガラス乾板とブシユ埋
込定盤の断面図、第3図は完成したガイド穴を有
するガラスフオトマスクの平面図である。 符号の説明、1……ガラス乾板、2,2′……
位置合せマーク、3……バカ穴、4……プリント
回路の描かれた領域、5……ブシユ、6……埋込
樹脂、7……ピン、8……ブツシユ埋込定盤、
9,9′……ガイド穴。
Figure 1 is a plan view of the glass dry plate with printed circuits and alignment marks drawn on it after holes have been made, and Figure 2 is the glass dry plate with the buttons fixed to the glass plate with resin. FIG. 3 is a cross-sectional view of a bush-embedded surface plate, and FIG. 3 is a plan view of a completed glass photomask having guide holes. Explanation of symbols, 1... Glass dry plate, 2, 2'...
Alignment mark, 3... stupid hole, 4... area where printed circuit is drawn, 5... bushing, 6... embedded resin, 7... pin, 8... bush embedded surface plate,
9,9'...Guide hole.

Claims (1)

【特許請求の範囲】[Claims] 1 プリント回路が描かれたフオトマスクと該フ
オトマスクのプリント回路を転写する被転写物の
相対的に同じ位置にガイド穴を有し、該ガイド穴
にピンを挿入してフオトマスクおよび被転写物を
重ね合せフオトマスクのプリント回路を被転写物
に転写する写真焼付方法で使用されるフオトマス
クの製造方法であつて、ガラス乾板に位置合せ用
のマークを付けた該ガラス乾板のガイド穴部にガ
イド穴より大きな径を有するバカ穴を明け、該ガ
ラス乾板の位置合せ用マークと相対的に同じ位置
に位置合せ用マークおよびガイド穴が設けられた
定盤に前記ガラス乾板を載せ、前記位置合せ用マ
ークを用いてガラス乾板と定盤を位置合せをし、
ガイド穴と同じ径の穴が明けられたブシユにピン
を挿入し、該ピンおよびブシユをガラス乾板のバ
カ穴および定盤のガイド穴に挿入しブシユとバカ
穴の隙間に接着剤を流入してブシユをガラス乾板
に固定し、前記ピンを抜き取りガラス乾板にガイ
ド穴を形成してなることを特徴とするガラスマス
ク製造方法。
1. A photomask on which a printed circuit is drawn and a transfer target to which the printed circuit of the photomask is transferred have guide holes at the same relative positions, and a pin is inserted into the guide hole to overlap the photomask and the transfer target. A method for manufacturing a photomask used in a photo printing method for transferring a printed circuit of a photomask onto an object to be transferred, the method comprising forming a guide hole portion of a glass dry plate with a mark for alignment on the glass dry plate with a diameter larger than the guide hole. A hole having a hole is made, and the glass dry plate is placed on a surface plate provided with an alignment mark and a guide hole at the same position relative to the alignment mark on the glass dry plate, and using the alignment mark, Align the glass dry plate and surface plate,
Insert a pin into a bushing with a hole of the same diameter as the guide hole, insert the pin and bushing into the blank hole of the glass dry plate and the guide hole of the surface plate, and pour adhesive into the gap between the bushing and blank hole. A method for producing a glass mask, comprising: fixing a bush to a glass dry plate; removing the pin; and forming a guide hole in the glass dry plate.
JP1978978A 1978-02-24 1978-02-24 Method of making glass mask Granted JPS54114304A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1978978A JPS54114304A (en) 1978-02-24 1978-02-24 Method of making glass mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1978978A JPS54114304A (en) 1978-02-24 1978-02-24 Method of making glass mask

Publications (2)

Publication Number Publication Date
JPS54114304A JPS54114304A (en) 1979-09-06
JPS6140984B2 true JPS6140984B2 (en) 1986-09-12

Family

ID=12009097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1978978A Granted JPS54114304A (en) 1978-02-24 1978-02-24 Method of making glass mask

Country Status (1)

Country Link
JP (1) JPS54114304A (en)

Also Published As

Publication number Publication date
JPS54114304A (en) 1979-09-06

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