JPS6145202B2 - - Google Patents
Info
- Publication number
- JPS6145202B2 JPS6145202B2 JP1721878A JP1721878A JPS6145202B2 JP S6145202 B2 JPS6145202 B2 JP S6145202B2 JP 1721878 A JP1721878 A JP 1721878A JP 1721878 A JP1721878 A JP 1721878A JP S6145202 B2 JPS6145202 B2 JP S6145202B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- film
- thickness
- configuration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 239000010408 film Substances 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 7
- 239000012528 membrane Substances 0.000 claims description 3
- 239000012788 optical film Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000001629 suppression Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 2
- -1 Ta 2 O 5 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Optical Filters (AREA)
Description
本発明は適切な半値巾を有し、かつ簡単な膜構
成で製作の容易なダイクロイツク膜に関するもの
である。
3色分解光学系の青反射ダイクロイツク膜には
通常高屈折率層Hと低屈折率層Lの膜厚比が3:
1(以下H:L=3:1のように略記する)の交
互多層膜が多用されている。
第1図は、基本的な膜厚構成がH:L=3:1
である青反射ダイクロイツク膜の一実施例の透過
率特性を示す図で、第1表の膜構成に示す如く基
板側より第1層目、第2層目及び最終層がリツプ
ル抑制の為に基本的な膜厚から変化している。こ
のH:L=3:1を基本構成とする。
The present invention relates to a dichroic film that has an appropriate half-width, has a simple film structure, and is easy to manufacture. The blue reflective dichroic film of a three-color separation optical system usually has a film thickness ratio of high refractive index layer H and low refractive index layer L of 3:
1 (hereinafter abbreviated as H:L=3:1) is often used. In Figure 1, the basic film thickness configuration is H:L=3:1.
This is a diagram showing the transmittance characteristics of an example of a blue-reflecting dichroic film.As shown in the film structure in Table 1, the first layer, second layer, and final layer are arranged from the substrate side to suppress ripples. The film thickness has changed from the basic thickness. The basic configuration is H:L=3:1.
【表】【table】
【表】【table】
【表】
ダイクロイツク膜は半値巾を充分取ることが出
来ない難点がある。ダイクロイツク膜の半値巾を
広げる目的で、H:L=3:1構成と、H:L=
1:1構成を混在させて半値巾を広げる方法が特
願昭52−71896(特開昭54−7359号公報)に示さ
れている。第2図はこの方法で半値巾を拡大した
青反射ダイクロイツク膜の一実施例の透過特性曲
線を示すものであり、その構成を第2表に示す。
この方法では、半値巾を拡大することは可能であ
るが、リツプル除去の為に、中間層にもリツプル
抑制用の膜厚を有する層を設ける必要があり、製
造上高等な技術を必要とする。
本発明は上記難点の除去を目的とするもので半
値巾が拡大され簡単な膜構成で且つ製造が容易な
ダイクロイツク膜を提供するものである。
本発明に係るダイクロイツク膜に於ては、高屈
折率層と低屈折率層の交互層より成るもので基準
波長をλ0とすると、高屈折率層の基本的膜厚を
λ0/4、低屈折率層の基本的膜厚を3/4λ0とする
ことにより、上記目的を達成するものである。
以下本発明について詳述する。
第3図は、高屈折率層の分散を考慮して、H:
L=3:1構成とH:L=1:3構成の透過率特
性を示す図で、点線はH:L=3:1構成(第3
表)のものであり、実線はH:L=1:3構成
(第4表)のものである。入射角が零の垂直入射
の場合、分散が無ければこれらの特性曲線は一致
するが、分散を考慮すると、第3図より明らかな
様に、本発明に係るH:L=1:3の基本構成の
方が広い半値巾を有するものである。[Table] Dichroic films have the disadvantage that they cannot have a sufficient half-width. For the purpose of widening the half-width of the dichroic film, H:L=3:1 configuration and H:L=
A method of widening the half-width by mixing 1:1 configurations is shown in Japanese Patent Application No. 71896/1984 (Japanese Patent Application Laid-Open No. 7359/1989). FIG. 2 shows a transmission characteristic curve of an example of a blue reflective dichroic film whose half-width is expanded by this method, and its structure is shown in Table 2.
With this method, it is possible to expand the half-width, but in order to remove ripples, it is necessary to provide a layer with a film thickness for suppressing ripples in the intermediate layer, which requires advanced manufacturing technology. . The present invention aims to eliminate the above-mentioned drawbacks and provides a dichroic film which has an enlarged half-width, has a simple film structure, and is easy to manufacture. The dichroic film according to the present invention is composed of alternating layers of high refractive index layers and low refractive index layers, and when the reference wavelength is λ 0 , the basic film thickness of the high refractive index layer is λ 0 /4. The above object is achieved by setting the basic thickness of the low refractive index layer to 3/ 4λ0 . The present invention will be explained in detail below. Figure 3 shows H:
This is a diagram showing the transmittance characteristics of the L=3:1 configuration and the H:L=1:3 configuration, where the dotted line indicates the H:L=3:1 configuration (the third
Table), and the solid line is for the H:L=1:3 configuration (Table 4). In the case of normal incidence with an incident angle of zero, these characteristic curves would match if there was no dispersion, but if dispersion is taken into account, as is clear from Fig. 3, the basics of H:L = 1:3 according to the present invention This configuration has a wider half-width.
【表】【table】
【表】【table】
【表】
これは高屈折率物質が一般に分散をもつ為に短
波長側でその屈折率が変化し、それに伴つて光学
的膜厚が波長により変化している為である。従つ
て半値巾を拡大する効果は、短波長側に反射帯域
を有する青反射ダイクロイツク膜に於て特に顕著
な効果を示すものである。
以上の如く、本発明は基準波長をλ0とすると
基板側から第1層目が高屈折率層で始まり、高屈
折率層の膜厚をλ0/4、低屈折率層の膜厚を3λ0/
4とする基本構成により、H:L=3:1構成よ
りも半値巾を拡大し、かつ、H:L=3:1,
1:1の混合膜構成より製作の容易なダイクロイ
ツク膜を構成するものである。
通常用いられている高屈折率蒸着物質は全て分
散を有しており、本発明に用いることができる。
例えば、高屈折率物質としてはZrO2,TiO2,
Ta2O5,CeO2,ZnS,ThO2およびこれらの混合
物、低屈折率物質としては、MgF2,SiO2,
ThF4,Na3AlF6およびこれらの混合物等を用い
ることができる。
第4図は本発明の一実施例で、高屈折率物質と
してCeO2、低屈折率物質としてMgF2を使用した
10層のダイクロイツク膜の透過率特性を示す図
で、その時の膜構成を第5表に示す。
第4図に示すH:L=1:3構成では、基板側
の2層及び外側媒質側の2層、計4層を基本膜厚
からずらすことにより、容易にリツプルを抑制す
ることができる。第4図は、この方法でリツプル
抑制を行なつたものである。
第4図を第1図のH:L=3:1構成の特性図
と比較すれば、半値巾は明らかに拡大されてお
り、また第2図のH:L=3:1,1:1混合膜
と比較すれば、半値巾はほとんど同程度に拡大さ
れて、しかも、膜構成は単純化されて規則的であ
り、製作は従来のものとほとんど同程度に容易で
ある。[Table] This is because high refractive index materials generally have dispersion, so their refractive index changes on the short wavelength side, and the optical film thickness changes accordingly. Therefore, the effect of enlarging the half-width is particularly remarkable in a blue reflective dichroic film having a reflection band on the short wavelength side. As described above, in the present invention, when the reference wavelength is λ 0 , the first layer from the substrate side starts with a high refractive index layer, the film thickness of the high refractive index layer is λ 0 /4, and the film thickness of the low refractive index layer is 3λ 0 /
4, the half width is expanded compared to the H:L=3:1 configuration, and H:L=3:1,
This constitutes a dichroic film that is easier to manufacture than a 1:1 mixed film structure. All commonly used high refractive index vapor deposition materials have dispersion and can be used in the present invention.
For example, high refractive index materials include ZrO 2 , TiO 2 ,
Ta 2 O 5 , CeO 2 , ZnS, ThO 2 and mixtures thereof; low refractive index materials include MgF 2 , SiO 2 ,
ThF 4 , Na 3 AlF 6 and mixtures thereof can be used. Figure 4 shows an example of the present invention, in which CeO 2 was used as the high refractive index material and MgF 2 was used as the low refractive index material.
This is a diagram showing the transmittance characteristics of a 10-layer dichroic film, and the film configuration at that time is shown in Table 5. In the H:L=1:3 configuration shown in FIG. 4, ripples can be easily suppressed by shifting a total of four layers, two layers on the substrate side and two layers on the outer medium side, from the basic film thickness. FIG. 4 shows ripple suppression performed using this method. Comparing Figure 4 with the characteristic diagram for the H:L=3:1 configuration in Figure 1, the half-width is clearly expanded, and the H:L=3:1, 1:1 configuration in Figure 2 is clearly expanded. Compared to mixed membranes, the half-width is expanded to almost the same extent, yet the membrane configuration is simplified and regular, and fabrication is almost as easy as the conventional one.
【表】【table】
【表】
リツプル抑制膜は第5表に示した値には限らず
多少変化しても実用上さしつかえない領域が存在
する。例えば基板側から第1,2層目を考えれ
ば、第1層目が薄くなつた場合は第2層目を厚く
し、逆に第1層目が厚くなつた場合は第2層目を
薄くすることで、膜厚の変化の影響を少なくする
ことができる。
すなわち、基板側から1層目、2層目の膜厚の
和が3.15/4λ0から3.85/4λ0の間に存在
し、第1層
目の光学的膜厚が0.25/4λ0から0.5/4λ0
の間に存
在するようになせば実用上問題のないリツプル抑
制が行なえる。
外側媒質側のリツプル抑制膜も同様で全層数を
n層とすると、n−1層目とn層目の膜厚の和が
4.4/4λ0から5.5/4λ0の間に存在し、第(
n−1)
層目の膜厚が0.7/4λ0からλ0の間に存在するよ
うになせばよい。第5図に、これ等膜厚の上限値
及び下限値に対応する実施例の透過率特性曲線
を、その時の膜構成を第6表に示す。
なお、本説明に掲げた特性例は全て、高屈折率
物質にCeO2、低屈折率物質にMgF2を用いたもの
で、屈折率はCeO2は分散式n(λ)=2.2+
11.1/λ−367で表わされ、MgF2はn=1.38であ
る。
以上詳述したように、本発明に係るダイクロイ
ツク膜は高屈折率層と低屈折率層の交互多層膜か
ら成り基板から第1層目が高屈折率層で始まり、
高屈折率層の基本となるべき層の光学的膜厚はλ
0/4、低屈折率層の基本となるべき層の光学的膜
厚は3λ0/4とし、基板側の2層及び外部媒質側の
2層を基本膜厚からずらすことにより容易にリツ
プル抑制が行なえ、半値巾を拡大して、しかも構
成が単純で従来通り製作が容易であるという優れ
た効果をもつものである。[Table] The ripple suppressing film is not limited to the values shown in Table 5, but there is a range where it is practically acceptable even if the values are slightly changed. For example, considering the first and second layers from the substrate side, if the first layer becomes thinner, make the second layer thicker, and conversely, if the first layer becomes thicker, make the second layer thinner. By doing so, the influence of changes in film thickness can be reduced. That is, the sum of the film thicknesses of the first and second layers from the substrate side is between 3.15/4λ 0 and 3.85/4λ 0 , and the optical thickness of the first layer is 0.25. /4λ 0 to 0.5/4λ 0
If it exists between the two, ripple suppression can be achieved without causing any practical problems. Similarly, for the ripple suppression film on the outer medium side, if the total number of layers is n, the sum of the film thicknesses of the n-1st layer and the nth layer is between 4.4/4λ 0 and 5.5/4λ 0 . exists, and the first (
n-1) The thickness of the layer may be between 0.7/4λ 0 and λ 0 . FIG. 5 shows transmittance characteristic curves of Examples corresponding to the upper and lower limits of the film thickness, and Table 6 shows the film configuration at that time. All of the characteristic examples listed in this explanation use CeO 2 as a high refractive index material and MgF 2 as a low refractive index material, and the refractive index is CeO 2 according to the dispersion formula n (λ) = 2.2 +
11.1/λ-367, and n=1.38 for MgF2 . As detailed above, the dichroic film according to the present invention is composed of an alternating multilayer film of high refractive index layers and low refractive index layers, and the first layer from the substrate starts with the high refractive index layer,
The optical thickness of the layer that should be the basis of the high refractive index layer is λ
0 /4, the optical thickness of the layer that should be the basis of the low refractive index layer is 3λ 0 /4, and ripples can be easily suppressed by shifting the two layers on the substrate side and the two layers on the external medium side from the basic thickness. It has the excellent effect of increasing the half-width, having a simple structure, and being easy to manufacture as before.
第1図は従来のH:L=3:1構成の一実施例
の透過率特性図、第2図はH:L=3:1,1:
1の混合膜の一実施例の透過率特性図、第3図は
本発明に係るH:L=1:3構成の効果を説明す
る為の図、第4図及び第5図は本発明に係るダイ
クロイツク膜の実施例の透過率特性を示す図。
T……透過率、λ……波長。
Fig. 1 is a transmittance characteristic diagram of an example of a conventional H:L=3:1 configuration, and Fig. 2 is a transmittance characteristic diagram of an example of a conventional H:L=3:1 configuration.
FIG. 3 is a diagram for explaining the effect of the H:L=1:3 configuration according to the present invention, and FIGS. 4 and 5 are diagrams for explaining the effect of the H:L=1:3 configuration according to the present invention. FIG. 3 is a diagram showing the transmittance characteristics of an example of such a dichroic film. T...Transmittance, λ...Wavelength.
Claims (1)
成るダイクロイツク膜に於て、主として青色に対
する反射帯域を有しており、基準波長をλ0とす
ると、前記高屈折率層の基本膜厚λ0/4、前記低
屈折率の基本膜厚3/4λ0であり、基板側より数
えて第1層目、第2層目及び第(n−1)層目、
第n層目を上記基本膜厚より変化させ、該第1層
目と該第2層目の光学的膜厚の和は3.15/4λ0か
ら3.85/4λ0の間に存し且つ該第(n−1)層目
と該n層目の光学的膜厚の和が4.4/4λ0から5.
5/4λ0の間に存することを特徴とするダイクロ
イツク膜。 2 前記第1層目の光学的膜厚は0.25/4λ0から
0.5/4λ0の間に存し、前記第(n−1)層目の
光学的膜厚は、0.7/4λ0からλ0の間に存する
ことを特徴とする特許請求の範囲第1項記載のダ
イクロイツク膜。[Claims] 1. A dichroic film consisting of n alternating layers of high refractive index layers and low refractive index layers has a reflection band mainly for blue, and when the reference wavelength is λ 0 , The basic film thickness of the high refractive index layer is λ 0 /4, the basic film thickness of the low refractive index layer is 3/4λ 0 , and the first layer, the second layer, and the (n-1)th layer counting from the substrate side. layer,
The n-th layer is changed from the above basic thickness, and the sum of the optical thicknesses of the first layer and the second layer is between 3.15/4λ 0 and 3.85/4λ 0 , and the The sum of the optical film thicknesses of the n-1) layer and the n-th layer is 4.4/4λ 0 to 5.
A dichroic film characterized by existing between 5/ 4λ0 . 2 The optical thickness of the first layer is from 0.25/4λ 0
0.5/4λ 0 , and the optical thickness of the (n-1)th layer is between 0.7/4λ 0 and λ 0 , as set forth in claim 1. dichroic membrane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1721878A JPS54109855A (en) | 1978-02-16 | 1978-02-16 | Dichroic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1721878A JPS54109855A (en) | 1978-02-16 | 1978-02-16 | Dichroic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54109855A JPS54109855A (en) | 1979-08-28 |
| JPS6145202B2 true JPS6145202B2 (en) | 1986-10-07 |
Family
ID=11937793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1721878A Granted JPS54109855A (en) | 1978-02-16 | 1978-02-16 | Dichroic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54109855A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04267202A (en) * | 1991-02-21 | 1992-09-22 | Horiba Ltd | Multi-layer film interference filter |
| IL98713A (en) * | 1991-07-02 | 1997-11-20 | Electro Optics Ind Ltd | Optical notch or minus filter |
| JP4824317B2 (en) * | 2005-01-19 | 2011-11-30 | 日本板硝子株式会社 | Filtered lens and wavelength multiplexing optical coupler using the same |
-
1978
- 1978-02-16 JP JP1721878A patent/JPS54109855A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54109855A (en) | 1979-08-28 |
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