JPS6149346B2 - - Google Patents
Info
- Publication number
- JPS6149346B2 JPS6149346B2 JP25629585A JP25629585A JPS6149346B2 JP S6149346 B2 JPS6149346 B2 JP S6149346B2 JP 25629585 A JP25629585 A JP 25629585A JP 25629585 A JP25629585 A JP 25629585A JP S6149346 B2 JPS6149346 B2 JP S6149346B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon carbide
- resin
- sintered body
- resin composition
- based sintered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 36
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 35
- 239000000843 powder Substances 0.000 claims description 22
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 13
- 239000003822 epoxy resin Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- 229920000647 polyepoxide Polymers 0.000 claims description 11
- 229920002050 silicone resin Polymers 0.000 claims description 10
- 229910052582 BN Inorganic materials 0.000 claims description 6
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 6
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 claims description 5
- 229920000620 organic polymer Polymers 0.000 claims description 3
- 239000002861 polymer material Substances 0.000 claims description 3
- 239000011342 resin composition Substances 0.000 description 25
- 239000008188 pellet Substances 0.000 description 20
- 229920005989 resin Polymers 0.000 description 19
- 239000011347 resin Substances 0.000 description 19
- 239000004065 semiconductor Substances 0.000 description 14
- 239000012212 insulator Substances 0.000 description 11
- 230000017525 heat dissipation Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 238000010292 electrical insulation Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000009429 electrical wiring Methods 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
【発明の詳細な説明】
(発明の利用分野)
本発明は高熱伝導性組成物に係り、特に熱膨張
係数が小さく、半導体装置の被覆に好適な高熱伝
導性組成物に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Application of the Invention) The present invention relates to a highly thermally conductive composition, and particularly to a highly thermally conductive composition that has a small coefficient of thermal expansion and is suitable for coating semiconductor devices.
(発明の背景)
高出力トランジスタなどの半導体素子の、発熱
に起因する特性の不安定性や寿命の加速的劣化を
避けるためには、トランジスタペレツトが許容制
限温度を越えて昇温するのを防止する方策がとら
れなければらならない。(Background of the Invention) In order to avoid instability of characteristics and accelerated deterioration of life of semiconductor elements such as high-output transistors due to heat generation, it is necessary to prevent transistor pellets from rising above the allowable limit temperature. Measures must be taken to do so.
また、混成集積回路装置に所定の電気的機能を
持たせるには、同回路装置に搭載される回路素
子、中でも半導体素子としてのトランジスタペレ
ツトは、他の回路素子と電気的に絶縁されなけれ
ばならない場合が多い。 In addition, in order for a hybrid integrated circuit device to have a predetermined electrical function, the circuit elements mounted on the circuit device, especially transistor pellets as semiconductor elements, must be electrically insulated from other circuit elements. In many cases, this is not the case.
さらに、高度な機能が要求される混成集積回路
装置では、搭載された回路素子が外部からの影
響、とくに電磁波妨害を受けないようにするため
の方策がとられねばならない。 Furthermore, in hybrid integrated circuit devices that require advanced functionality, measures must be taken to prevent the mounted circuit elements from being affected by external influences, particularly electromagnetic interference.
以上のような要請を満す混成集積回路装置の一
例として、第1図のように、放熱体を兼ねた金属
支持体1にソルダ5,5′により一体化された絶
縁物2,2′上に、半導体素子3,3′をはじめと
して抵抗体やコンデンサなどの回路素子をソルダ
4,4′により搭載し、各回路素子に所定の電気
配線を施すと同時に所定の電気端子を設けて(電
気配線、端子は図示せず)、絶縁樹脂6を被覆し
た構造の装置がある。 As an example of a hybrid integrated circuit device that satisfies the above requirements, as shown in FIG. Circuit elements such as semiconductor elements 3 and 3' as well as resistors and capacitors are mounted using solders 4 and 4', and predetermined electrical wiring is provided to each circuit element, and at the same time, predetermined electrical terminals are provided (electrical There is a device having a structure in which wiring and terminals (not shown) are coated with an insulating resin 6.
このような半導体装置では、回路素子で発生し
た熱が主として絶縁物2,2′や金属支持体1を
経由して外部へ放出されるように種々の工夫がな
されている。 In such a semiconductor device, various measures have been taken so that the heat generated in the circuit elements is mainly released to the outside via the insulators 2, 2' and the metal support 1.
一方においては、混成集積回路装置が大容量化
されたり、回路素子を高集積化したりする(例え
ば、回路素子を混成集積回路装置の余剰空間に搭
載する)傾向が強まるにつれ、放熱の多面化、換
言すれば、回路素子から絶縁物を経て金属支持体
へ向う熱流路だけでなく、モールド用絶縁樹脂を
介して混成集積回路装置の上面あるいは側面から
も放熱する必要性が強まつてきている。 On the other hand, as the capacity of hybrid integrated circuit devices becomes larger and the tendency for circuit elements to become more highly integrated (for example, circuit elements are mounted in the excess space of hybrid integrated circuit devices) increases, heat dissipation becomes more multifaceted. In other words, there is an increasing need to dissipate heat not only from the heat flow path from the circuit element to the metal support via the insulator, but also from the top or side surface of the hybrid integrated circuit device via the insulating resin for molding.
従来より被覆用として用いられている絶縁樹脂
は、シリコーン系樹脂あるいはエポキシ系樹脂が
多い。 Insulating resins conventionally used for coating are often silicone resins or epoxy resins.
これらの樹脂の熱伝導率は1.5〜7.5×10-4ca
/cm・℃・s(シリコーン系樹脂)、7〜18×
10-4ca/cm・℃・s(エポキシ系樹脂)程度で
あり、金属に比較しては勿論のこと、アルミナや
ベリリヤをはじめとするセラミツク絶縁物と比較
しても熱伝導性が劣る。 The thermal conductivity of these resins is 1.5 to 7.5×10 -4 ca
/cm・℃・s (silicone resin), 7~18×
10 -4 ca/cm・℃・s (epoxy resin), and its thermal conductivity is inferior not only to metals but also to ceramic insulators such as alumina and beryllia.
このため、大容量の回路素子とりまく全ての方
向へ熱を伝達し、放熱効果を高めるためには、被
覆用絶縁樹脂としてシリコーン系樹脂またはエポ
キシ系樹脂をそのまま使用する現在の方法では不
十分である。 For this reason, the current method of using silicone resin or epoxy resin as is as an insulating resin for coating is insufficient to transfer heat in all directions surrounding large-capacity circuit elements and improve the heat dissipation effect. .
もちろん、樹脂の熱伝導性を高めれば、放熱効
果が高まるわけであり、従来においても、該樹脂
中にアルミナの焼結体粉末や、窒化ホウ素焼結体
粉末などを分散混入した充填物を用いたものがあ
る。しかし、これらの材料を用いても、その熱伝
導率はせいぜい40×10-4ca/cm℃sec程度であ
り、半導体装置の特性を著しく向上するまでには
至つていない。 Of course, increasing the thermal conductivity of the resin will increase the heat dissipation effect, and conventionally, fillers in which sintered alumina powder, boron nitride sintered powder, etc. are dispersed in the resin have been used. There was something there. However, even when these materials are used, their thermal conductivity is at most about 40×10 -4 ca/cm°C sec, and the characteristics of semiconductor devices have not yet been significantly improved.
(発明の目的)
本発明は、上述の状況に鑑みてなされたもの
で、従来の被覆用絶縁樹脂の欠点を補なうことの
できる高熱伝導性組成物を提供することを目的と
するものである。(Object of the Invention) The present invention was made in view of the above-mentioned situation, and an object of the present invention is to provide a highly thermally conductive composition that can compensate for the drawbacks of conventional coating insulating resins. be.
(発明の概要)
前述の目的を達成してなる本発明の高熱伝導性
組成物は炭化ケイ素を主成分とし、その他に酸化
ベリリウムおよび窒化ホウ素の少なくとも1種を
含む炭化ケイ素系焼結体の粉末を分散してなる有
機高分子材からなり、前記有機高分子材がシリコ
ーン系樹脂又はエポキシ系樹脂であることを特徴
とする。(Summary of the Invention) The highly thermally conductive composition of the present invention, which achieves the above-mentioned objects, is a powder of a silicon carbide-based sintered body containing silicon carbide as a main component and also containing at least one of beryllium oxide and boron nitride. It is characterized in that the organic polymer material is a silicone resin or an epoxy resin.
即ち、本発明は、炭化ケイ素粉末に含まれる酸
化ベリリウム、窒化ホウ素の含有量が、炭化ケイ
素100重量部に対して2重量部以上である場合、
炭化ケイ素系焼結体は比抵抗1010Ωcm以上と良好
な電気絶縁性を示すとともに、熱伝導率は0.7ca
/cm・s・℃と優れた熱伝導性を有することに
着目してなされたものである。 That is, in the present invention, when the content of beryllium oxide and boron nitride contained in silicon carbide powder is 2 parts by weight or more with respect to 100 parts by weight of silicon carbide,
The silicon carbide-based sintered body exhibits good electrical insulation with a specific resistance of 10 10 Ωcm or more, and a thermal conductivity of 0.7ca.
This was developed with the focus on its excellent thermal conductivity of /cm・s・℃.
このように、優れた電気絶縁性と熱伝導性を兼
備した炭化ケイ素系焼結体の粉末を、シリコーン
系樹脂またはエポキシ系樹脂中に分散させた組成
物は、シリコーン系樹脂またはエポキシ系樹脂そ
のものに比べて電気絶縁性を全く損なうことなく
格段に向上した熱伝導性を示す。 In this way, a composition in which silicon carbide-based sintered powder, which has both excellent electrical insulation and thermal conductivity, is dispersed in silicone-based resin or epoxy-based resin, can be produced by dispersing silicone-based resin or epoxy-based resin itself. It exhibits significantly improved thermal conductivity without any loss in electrical insulation.
(発明の実施例)
以下に、図面を参照して本発明を詳細に説明す
る。(Embodiments of the Invention) The present invention will be described in detail below with reference to the drawings.
第2図は、シリコーン系樹脂に炭化ケイ素系焼
結体粉末を分散させた組成物における炭化ケイ素
系焼結体の体積分率(横軸)と熱伝導率(縦軸)
との関係である。熱伝導率は炭化ケイ素系焼結体
の体積分率の増加にともなつて大幅に増大する傾
向を示している。 Figure 2 shows the volume fraction (horizontal axis) and thermal conductivity (vertical axis) of silicon carbide sintered body in a composition in which silicon carbide sintered body powder is dispersed in silicone resin.
This is the relationship between Thermal conductivity tends to increase significantly as the volume fraction of the silicon carbide sintered body increases.
第3図は、エポキシ系樹脂に炭化ケイ素系焼結
体粉末を分散させた組成物の、炭化ケイ素系焼結
体の体積分率と熱伝導率の関係である。 FIG. 3 shows the relationship between the volume fraction of silicon carbide-based sintered body and thermal conductivity of a composition in which silicon carbide-based sintered body powder is dispersed in epoxy-based resin.
この場合も、熱伝導率は炭化ケイ素系焼結体の
体積分率の増加にともなつて大幅に増大している
ことが分かる。この際、樹脂組成物の比抵抗は
1010Ωcm以上の値が保持されることは勿論であ
る。 In this case as well, it can be seen that the thermal conductivity increases significantly as the volume fraction of the silicon carbide-based sintered body increases. At this time, the specific resistance of the resin composition is
Of course, a value of 10 10 Ωcm or more is maintained.
なお、前述した樹脂組成物が優れた放熱性を有
するのは、本来熱伝導率の小さいシリコーン系樹
脂またはエポキシ系樹脂の欠点を、これら樹脂に
分散された炭化ケイ素系焼結体粉末によつて補な
うことが可能なためである。 The reason why the above-mentioned resin composition has excellent heat dissipation properties is that the disadvantages of silicone resins or epoxy resins, which inherently have low thermal conductivity, are overcome by the silicon carbide sintered powder dispersed in these resins. This is because it is possible to compensate.
また、本発明の樹脂組成物に煙霧質シリカを添
加した場合は、樹脂組成物の展延性が増すため、
シート状等にして使用するような場合に好適な絶
縁物になり得る。 Furthermore, when fumed silica is added to the resin composition of the present invention, the spreadability of the resin composition increases;
It can be a suitable insulator when used in the form of a sheet or the like.
したがつて、本発明の前記高熱伝導性組成物を
半導体装置の充填剤または保護層材として用いれ
ば、放熱性と絶縁性を兼備した樹脂組成物を介し
て、半導体素子ペレツトで発生した熱を放射状に
伝達でき、冷却効果を高めることが可能になる。 Therefore, if the highly thermally conductive composition of the present invention is used as a filler or protective layer material for a semiconductor device, the heat generated in the semiconductor element pellet can be dissipated through the resin composition that has both heat dissipation and insulation properties. It can be transmitted radially, making it possible to enhance the cooling effect.
以下、本発明を実施例を用いてさらに詳細に説
明する。 Hereinafter, the present invention will be explained in more detail using Examples.
実施例 1
第4図は、半導体素子の収納容器と放熱体とを
兼ねるアルミニウムフインにダイオードペレツト
4個を搭載した5A級整流回路モジユールに、本
発明を適用した実施例の断面図である。Embodiment 1 FIG. 4 is a sectional view of an embodiment in which the present invention is applied to a 5A class rectifier circuit module in which four diode pellets are mounted on an aluminum fin that serves both as a storage container for semiconductor elements and as a heat sink.
この整流回路モジユールは、アルミニウムフイ
ン11に設けた凹部に、ダイオードペレツト4個
14a,14b……がそれぞれ整流回路を構成す
るように電気接続されたサブアツセンブリを搭載
し、そして凹部に絶縁樹脂16,17を充填した
ものである。 This rectifier circuit module has a subassembly mounted in a recess provided in an aluminum fin 11, in which four diode pellets 14a, 14b, etc. are electrically connected to form a rectifier circuit, and an insulating resin is mounted in the recess. 16 and 17.
組立時には、まず最初にアルミニウムフイン1
1に設けた凹部底面12上に絶縁物13が載置さ
れ、この絶縁物上にダイオードペレツト14a,
14b(他のダイオードペレツト2個は図示せ
ず)を電極および電気端子を兼ねる金属リード1
5a,15b,15cと一体化したサブアツセン
ブリが載置される。 When assembling, first install aluminum fin 1.
An insulator 13 is placed on the bottom surface 12 of the recess provided in 1, and diode pellets 14a and 14a are placed on this insulator.
14b (the other two diode pellets are not shown) is a metal lead 1 that also serves as an electrode and an electrical terminal.
A subassembly integrated with 5a, 15b, and 15c is placed.
そして、これら絶縁物13およびサブアツセン
ブリの周囲に、シリコーン系樹脂に、BeO/SiC
重量部比0.02を含む炭化ケイ素系焼結体粉末を分
散させた第1の樹脂組成物16を充填、硬化させ
る。さらに第1の樹脂組成物16の上に、エポキ
シ系樹脂に、BeO/SiC重量部比0.02を含む炭化
ケイ素系焼結体粉末を分散させた第2の樹脂組成
物17を充填、硬化させる。 Then, around these insulators 13 and sub-assemblies, silicone resin is coated with BeO/SiC.
A first resin composition 16 in which silicon carbide-based sintered body powder containing a weight part ratio of 0.02 is dispersed is filled and cured. Further, on the first resin composition 16, a second resin composition 17 in which silicon carbide-based sintered body powder containing a BeO/SiC weight part ratio of 0.02 is dispersed in an epoxy resin is filled and cured.
なお、前述した第1の樹脂組成物中の炭化ケイ
素系焼結体粉末の体積分率は71%、そして第2の
樹脂組成物中の炭化ケイ素系焼結体粉末の体積分
率は70%である。 The volume fraction of the silicon carbide-based sintered body powder in the first resin composition described above is 71%, and the volume fraction of the silicon carbide-based sintered body powder in the second resin composition is 70%. It is.
以上の構成で得られた整流回路モジユールのダ
イオードペレツト・空気間の熱抵抗は、8〜11
℃/W(平均値:10℃/W、試料数:200個)で
ある。 The thermal resistance between the diode pellet and air of the rectifier circuit module obtained with the above configuration is 8 to 11.
°C/W (average value: 10 °C/W, number of samples: 200).
一方、炭化ケイ素系焼結体粉末を分散させない
シリコーン樹脂およびエポキシ樹脂を用いた従来
型同等品の熱抵抗は13〜15℃/W(平均値:14
℃/W、試料数:200個)であり、本実施例のも
のは従来例に比べて、著しい放熱性の向上が認め
られた。この結果、整流回路モジユールの許容電
流容量を従来の5Aから6Aに上げることが可能に
なつた。 On the other hand, the thermal resistance of conventional equivalent products using silicone resin and epoxy resin without dispersing silicon carbide sintered body powder is 13 to 15℃/W (average value: 14
C/W, number of samples: 200), and it was observed that the heat dissipation of this example was significantly improved compared to the conventional example. As a result, it has become possible to increase the allowable current capacity of the rectifier circuit module from the conventional 5A to 6A.
実施例 2
第5図は、銅板間に絶縁物を介在させた絶縁基
板上にトランジスタペレツト4個、ダイオードペ
レツト2個、チツプ抵抗2個、チツプコンデンサ
2個を搭載した電流制御用5KW級モジユールに
本発明を適用した実施例の断面図である。Embodiment 2 Figure 5 shows a 5KW class for current control, which has four transistor pellets, two diode pellets, two chip resistors, and two chip capacitors mounted on an insulating substrate with an insulator interposed between copper plates. FIG. 2 is a sectional view of an embodiment in which the present invention is applied to a module.
この電流制御用モジユールの組立時には、まず
銅支持体21上に絶縁物22を介して銅載置板2
3a,23bが一体化される。前記銅載置板23
a,23b上に、前述した回路素子としてのトラ
ンジスタペレツト、ダイオードペレツト、チツプ
抵抗、チツプコンデンサ等の回路素子28a,2
8bを搭載する。 When assembling this current control module, first place the copper mounting plate 2 on the copper support 21 via the insulator 22.
3a and 23b are integrated. The copper mounting plate 23
Circuit elements 28a, 28a, 23b, such as transistor pellets, diode pellets, chip resistors, chip capacitors, etc., are placed on a, 23b.
Equipped with 8b.
そして、それぞれの回路素子に所定の電気配線
を施すとともに電気端子(図示せず)を取り付け
る。 Then, predetermined electrical wiring is provided to each circuit element and electrical terminals (not shown) are attached.
つぎに、銅支持板21上にケース24を取り付
けるとともに、前述した絶縁物22、銅載置板2
1、回路素子28a,28bとしてのトランジス
タペレツト、ダイオードペレツト、チツプ抵抗、
チツプコンデンサを完全に包囲するようにシリコ
ーン系樹脂にBN/SiC重量部比0.03の炭化ケイ素
系焼結体粉末を分散させた第1の樹脂組成物25
を充填、硬化させる。 Next, the case 24 is attached on the copper support plate 21, and the above-mentioned insulator 22 and the copper mounting plate 2 are attached.
1. Transistor pellets, diode pellets, chip resistors as circuit elements 28a and 28b,
A first resin composition 25 in which silicon carbide-based sintered body powder with a BN/SiC weight part ratio of 0.03 is dispersed in a silicone-based resin so as to completely surround a chip capacitor.
Fill and harden.
さらに、第1の樹脂組成物25の上に、エポキ
シ樹脂にBN/SiC重量部比0.03の炭化ケイ素系焼
結体粉末を分散させた第2の樹脂組成物26を充
填、硬化させる。 Further, on the first resin composition 25, a second resin composition 26 in which silicon carbide-based sintered body powder with a BN/SiC weight part ratio of 0.03 is dispersed in an epoxy resin is filled and cured.
なお、前述した第1の樹脂組成物中の炭化ケイ
素系焼結体粉末の体積分率は80%、そして第2の
樹脂組成物中の炭化ケイ素系焼結体粉末の体積分
率は80%である。 The volume fraction of the silicon carbide-based sintered body powder in the first resin composition described above is 80%, and the volume fraction of the silicon carbide-based sintered body powder in the second resin composition is 80%. It is.
以上の構成で得られた電流制御用モジユールに
入力電力5KWに相当する通電をして、出力電流
の制御を試みたところ、同モジユールに搭載され
た回路素子としてのトランジスタペレツトおよび
ダイオードペレツトの温度は90〜110℃であり、
炭化ケイ素系焼結体粉末を分散させないシリコー
ン樹脂および/またはエポキシ樹脂を用いた従来
型の同等品に比べて15〜20℃低い素子温度を保つ
ことができた。 When we attempted to control the output current by applying current equivalent to an input power of 5KW to the current control module obtained with the above configuration, we found that the transistor pellet and diode pellet as the circuit elements mounted on the module The temperature is 90-110℃,
It was possible to maintain an element temperature 15 to 20 degrees Celsius lower than conventional equivalent products using silicone resin and/or epoxy resin in which silicon carbide-based sintered body powder is not dispersed.
実施例 3
第6図は、電気配線を施したアルミナ製パツケ
ージにシリコン集積回路素子ペレツトをCCB
(Controlled Colaps Bonding)法によつて搭載
した集積回路装置に、本発明を適用した実施例の
断面図である。Example 3 Figure 6 shows a silicon integrated circuit element pellet placed on a CCB in an alumina package with electrical wiring.
1 is a cross-sectional view of an embodiment in which the present invention is applied to an integrated circuit device mounted by the (Controlled Colaps Bonding) method.
この集積回路装置の組立時には、アルミナパツ
ケージ31の凹部に設けた厚膜配線32a,32
b上にはんだボール33a,33bを介してシリ
コン集積回路素子ペレツト34が搭載される。 When assembling this integrated circuit device, thick film wiring 32a, 32 provided in the recessed part of the alumina package 31 is used.
A silicon integrated circuit element pellet 34 is mounted on the semiconductor chip 3b via solder balls 33a and 33b.
そして、アルミナパツケージ31と金属キヤツ
プ35とで包囲された空間に、シリコーン系樹脂
にBeO/SiC重量部比0.03の炭化ケイ素系焼結体
粉末を分散させた第1の樹脂組成物36を充填、
硬化させる。 Then, the space surrounded by the alumina package 31 and the metal cap 35 is filled with a first resin composition 36 in which silicon carbide-based sintered body powder with a BeO/SiC weight part ratio of 0.03 is dispersed in a silicone-based resin.
Let it harden.
さらに第1の樹脂組成物36の上に、エポキシ
樹脂にBN/BiC重量部比0.03の炭化ケイ素系焼結
体粉末を分散させた第2の樹脂組成物37を充
填、硬化させる。35は金属キヤツプである。 Further, on the first resin composition 36, a second resin composition 37 in which silicon carbide-based sintered body powder with a BN/BiC weight part ratio of 0.03 is dispersed in an epoxy resin is filled and cured. 35 is a metal cap.
なお、前述した第1の樹脂組成物36中の炭化
ケイ素系焼結体粉末の体積分率は80%、そして第
2の樹脂組成物37中の炭化ケイ素系焼結体粉末
の体積分率は80%である。 The volume fraction of the silicon carbide-based sintered body powder in the first resin composition 36 described above is 80%, and the volume fraction of the silicon carbide-based sintered body powder in the second resin composition 37 is 80%. It is 80%.
以上の構成で得られた集積回路装置に40Wの電
力を印加して作動させたところ、搭載された集積
回路素子ペレツトの温度は100℃を越えなかつ
た。 When the integrated circuit device obtained with the above configuration was operated by applying a power of 40 W, the temperature of the integrated circuit element pellet mounted thereon did not exceed 100°C.
以上、本発明を実施例により説明したが、本発
明はこれのみに限定されるものではなく、シリコ
ーン系樹脂またはエポキシ系樹脂に分散される炭
化ケイ素系焼結体が、酸化ベリリウムと窒化ホウ
素の両者を含む場合でも本発明の効果ないし利点
を享受できる。 Although the present invention has been described above with reference to Examples, the present invention is not limited thereto, and the silicon carbide-based sintered body dispersed in silicone-based resin or epoxy-based resin is composed of beryllium oxide and boron nitride. Even if both are included, the effects and advantages of the present invention can be enjoyed.
(発明の効果)
以上に説明したように、本発明の樹脂組成物は
電気絶縁性を保持すると同時に優れた熱伝導性を
示すので、本発明の樹脂組成物を半導体装置の充
填剤または保護層材として用いることにより半導
体装置の放熱性を高めることができ、同装置の電
力容量や信頼性を高めることができる。(Effects of the Invention) As explained above, the resin composition of the present invention maintains electrical insulation and exhibits excellent thermal conductivity, so it can be used as a filler or protective layer of semiconductor devices. By using it as a material, the heat dissipation of the semiconductor device can be improved, and the power capacity and reliability of the device can be increased.
また、本発明の樹脂組成物は熱膨張係数が小さ
いので、半導体材料との熱膨張係数差が少なく、
特に大型の半導体基体を被覆するのに適してい
る。 In addition, since the resin composition of the present invention has a small coefficient of thermal expansion, there is little difference in coefficient of thermal expansion from that of the semiconductor material.
It is particularly suitable for coating large semiconductor bodies.
第1図は混成集積回路装置の一例を示す断面
図、第2,第3図はそれぞれ本発明の実施例であ
る樹脂組成物の熱伝導性を示す図、第4図および
第5第6図はそれぞれ本発明の適用例を示す断面
図である。
11……アルミニウムフイン、12……凹部底
面、13……絶縁物、14a,14b……ダイオ
ードペレツト、15a〜15c……金属リード、
16……第1の樹脂組成物、17……第2の樹脂
組成物。
FIG. 1 is a cross-sectional view showing an example of a hybrid integrated circuit device, and FIGS. 2 and 3 are views showing the thermal conductivity of a resin composition that is an example of the present invention, and FIGS. 4, 5, and 6 respectively. 2A and 2B are cross-sectional views showing application examples of the present invention, respectively. 11... Aluminum fin, 12... Bottom of recess, 13... Insulator, 14a, 14b... Diode pellet, 15a to 15c... Metal lead,
16...First resin composition, 17...Second resin composition.
Claims (1)
リウムおよび窒化ホウ素の少なくとも1種を含む
炭化ケイ素系焼結体の粉末を分散してなる有機高
分子材からなることを特徴とする高熱伝導性組成
物。 2 前記有機高分子材がシリコーン系樹脂又はエ
ポキシ系樹脂であることを特徴とする前記特許請
求の範囲第1項記載の高熱伝導性組成物。 3 炭化ケイ素系焼結体中における酸化ベリリウ
ムおよび窒化ホウ素の含有率が1%以上であるこ
とを特徴とする前記特許請求の範囲第1項または
第2項記載の高熱伝導性組成物。[Claims] 1. An organic polymer material comprising silicon carbide as a main component and dispersing powder of a silicon carbide-based sintered body containing at least one of beryllium oxide and boron nitride. A highly thermally conductive composition. 2. The highly thermally conductive composition according to claim 1, wherein the organic polymer material is a silicone resin or an epoxy resin. 3. The highly thermally conductive composition according to claim 1 or 2, wherein the content of beryllium oxide and boron nitride in the silicon carbide-based sintered body is 1% or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25629585A JPS61159457A (en) | 1985-11-15 | 1985-11-15 | Highly thermally conductive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25629585A JPS61159457A (en) | 1985-11-15 | 1985-11-15 | Highly thermally conductive composition |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4626380A Division JPS56144565A (en) | 1980-04-10 | 1980-04-10 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61159457A JPS61159457A (en) | 1986-07-19 |
| JPS6149346B2 true JPS6149346B2 (en) | 1986-10-29 |
Family
ID=17290671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25629585A Granted JPS61159457A (en) | 1985-11-15 | 1985-11-15 | Highly thermally conductive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61159457A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5232970A (en) * | 1990-08-31 | 1993-08-03 | The Dow Chemical Company | Ceramic-filled thermally-conductive-composites containing fusible semi-crystalline polyamide and/or polybenzocyclobutenes for use in microelectronic applications |
| CN109852005B (en) * | 2019-01-14 | 2021-09-07 | 国网西藏电力有限公司 | A kind of high thermal conductivity composite insulating material and preparation method based on electric field induction mechanism |
-
1985
- 1985-11-15 JP JP25629585A patent/JPS61159457A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61159457A (en) | 1986-07-19 |
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