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JPS6115901B2 - - Google Patents
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JPS6115901B2 - - Google Patents

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Publication number
JPS6115901B2
JPS6115901B2 JP55046263A JP4626380A JPS6115901B2 JP S6115901 B2 JPS6115901 B2 JP S6115901B2 JP 55046263 A JP55046263 A JP 55046263A JP 4626380 A JP4626380 A JP 4626380A JP S6115901 B2 JPS6115901 B2 JP S6115901B2
Authority
JP
Japan
Prior art keywords
silicon carbide
resin
resin composition
sintered body
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55046263A
Other languages
Japanese (ja)
Other versions
JPS56144565A (en
Inventor
Yasutoshi Kurihara
Komei Yatsuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4626380A priority Critical patent/JPS56144565A/en
Publication of JPS56144565A publication Critical patent/JPS56144565A/en
Publication of JPS6115901B2 publication Critical patent/JPS6115901B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/40Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/43Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/40Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • H10W74/473Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins containing a filler
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】 本発明は半導体装置に係り、特に半導体ペレツ
トで発生した熱を効果的に放散する構造の半導体
装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device, and more particularly to a semiconductor device having a structure that effectively dissipates heat generated in a semiconductor pellet.

半導体装置の一例である高出力トランジスタを
複数個搭載した混成集積回路装置では、数アンペ
ア以上のコレクタ電流が流れる。その際、半導体
素子としてのトランジスタペレツトは通常発熱す
る。
In a hybrid integrated circuit device equipped with a plurality of high-output transistors, which is an example of a semiconductor device, a collector current of several amperes or more flows. At this time, the transistor pellet as a semiconductor element usually generates heat.

この発熱に起因する特性の不安定性や寿命の加
速的劣化を避けるためには、トランジスタペレツ
トが許容制限温度を越えて昇温するのを防止する
方法がとられなければならない。
In order to avoid instability of characteristics and accelerated deterioration of lifetime due to heat generation, a method must be taken to prevent the temperature of the transistor pellet from rising beyond the permissible limit temperature.

また、混成集積回路装置に所定の電気的機能を
持たせるには、同回路装置に搭載される回路素
子、中でも半導体素子としてのトランジスタペレ
ツトは、他の回路素子と電気的に絶縁されなけれ
ばならない場合が多い。
In addition, in order for a hybrid integrated circuit device to have a predetermined electrical function, the circuit elements mounted on the circuit device, especially transistor pellets as semiconductor elements, must be electrically insulated from other circuit elements. In many cases, this is not the case.

さらに、高度な機能が要求される混成集積回路
装置では搭載された回路素子が外部からの影響、
とくに電磁波妨害を受けないようにするための方
策がとられねばならない。
Furthermore, in hybrid integrated circuit devices that require advanced functionality, the mounted circuit elements are subject to external influences.
In particular, measures must be taken to avoid electromagnetic interference.

以上のような要請を満す混成集積回路装置の一
例として、第1図のように、放熱体を兼ねた金属
支持体1にソルダ5,5′により一体化された絶
縁物2,2′上に、半導体素子3,3′をはじめと
して抵抗体やコンデンサなどの回路素子をソルダ
4,4′により搭載し、各回路素子に所定の電気
配線を施すと同時に所定の電気端子を設けて(電
気配線、端子は図示せず)、絶縁樹脂6を被覆し
た構造の装置がある。
As an example of a hybrid integrated circuit device that satisfies the above requirements, as shown in FIG. Circuit elements such as semiconductor elements 3 and 3' as well as resistors and capacitors are mounted using solders 4 and 4', and predetermined electrical wiring is provided to each circuit element, and at the same time, predetermined electrical terminals are provided (electrical There is a device having a structure in which wiring and terminals (not shown) are coated with an insulating resin 6.

このような半導体装置では、回路素子で発生し
た熱が主として絶縁物2,2′や金属支持体1を
経由して外部へ放出されるように種々の工夫がな
されている。
In such a semiconductor device, various measures have been taken so that the heat generated in the circuit elements is mainly released to the outside via the insulators 2, 2' and the metal support 1.

一方においては、混成集積回路装置が大容量化
されたり、回路素子を高集積化したりする(例え
ば回路素子を混成集積回路装置の余剰空間に搭載
する)傾向が強まるにつれ、放熱の多面化−即ち
回路素子から絶縁物を経て金属支持体へ向う熱流
路だけでなく、モールド用絶縁樹脂を介して混成
集積回路装置の上面あるいは側面からも放熱する
必要性が強まつてきている。
On the other hand, as the capacity of hybrid integrated circuit devices increases and the tendency to increase the integration of circuit elements (e.g., mounting circuit elements in the excess space of hybrid integrated circuit devices) increases, heat dissipation becomes multifaceted. There is an increasing need to dissipate heat not only from the heat flow path from the circuit element to the metal support via the insulator, but also from the top or side surface of the hybrid integrated circuit device via the insulating resin for molding.

従来被覆用として用いられている絶縁樹脂はシ
リコーン系樹脂あるいはエポキシ系樹脂が多い
が、これら樹脂の熱伝導率は1.5〜7.5×10-4cal/
cm・℃・s(シリコーン系樹脂)、7〜18×10-4cal/
cm・℃・s(エポキシ系樹脂)と、金属に比較して
は勿論のことアルミナやベリリヤをはじめとする
セラミツク絶縁物と比較しても熱伝導性が劣る。
Insulating resins conventionally used for coating are often silicone resins or epoxy resins, but the thermal conductivity of these resins is 1.5 to 7.5 × 10 -4 cal/
cm・℃・s (silicone resin), 7 to 18×10 -4 cal/
cm・℃・s (epoxy resin), its thermal conductivity is inferior not only to metals but also to ceramic insulators such as alumina and beryllia.

このため、大容量の回路素子をとりまく全ての
方向へ熱を伝達し、放熱効果を高めるためには、
被覆用絶縁樹脂としてシリコーン系樹脂またはエ
ポキシ系樹脂をそのまま使用する現在の方法では
不十分である。
Therefore, in order to transfer heat in all directions surrounding large-capacity circuit elements and increase the heat dissipation effect, it is necessary to
The current method of using silicone resin or epoxy resin as is as the insulating resin for coating is insufficient.

もちろん、樹脂の熱伝導性を高めれば、放熱効
果が高まるわけであり、従来においても、該樹脂
中にアルミナの焼結体粉末や、窒化ホウ素焼結体
粉末などを分散混入した充填物を用いたものもあ
る。しかし、これらの材料を用いても、その熱伝
導率はせいぜい40×10-4cal/cm℃sec程度であ
り、半導体装置の特性を著しく向上するまでには
至つていない。
Of course, increasing the thermal conductivity of the resin increases the heat dissipation effect, and in the past, fillers such as alumina sintered powder or boron nitride sintered powder have been dispersed in the resin. Some were. However, even when these materials are used, their thermal conductivity is at most about 40×10 -4 cal/cm°C sec, and the characteristics of semiconductor devices have not yet been significantly improved.

本発明は、上述の状況に鑑みてなされたもの
で、従来の被覆用絶縁樹脂の欠点を補ない、放熱
性のよい半導体装置を提供するものである。
The present invention has been made in view of the above-mentioned situation, and it is an object of the present invention to provide a semiconductor device that compensates for the drawbacks of the conventional insulating resin for coating and has good heat dissipation.

前述の目的を達成してなる本発明の半導体装置
は、シリコーン系樹脂またはエポキシ系樹脂と、
該シリコーン系樹脂またはエポキシ系樹脂中に分
散され、炭化ケイ素を主成分とし、酸化ペリリウ
ム、窒化ホウ素の少くとも1種を含む焼結体の粉
末とで構成された高熱伝導性組成物を、充填物又
は保護物として含むことを特徴とする。
The semiconductor device of the present invention that achieves the above-mentioned object comprises a silicone resin or an epoxy resin;
Filling with a highly thermally conductive composition that is dispersed in the silicone resin or epoxy resin and is composed of silicon carbide as a main component and sintered powder containing at least one of perylium oxide and boron nitride. It is characterized by being included as an object or a protected object.

即ち、本発明は、炭化ケイ素粉末に含まれる酸
化ベリリウム、窒化ホウ素の含有量が、炭化ケイ
素100重量部に対して2重量部以上である場合、
炭化ケイ素系焼結体は比抵抗1010Ωcm以上と良好
な電気絶縁性を示すとともに、熱伝導率は0.7ca
l/cm・s・℃と優れた熱伝導性を有することに着目
してなされたものである。
That is, in the present invention, when the content of beryllium oxide and boron nitride contained in silicon carbide powder is 2 parts by weight or more with respect to 100 parts by weight of silicon carbide,
The silicon carbide-based sintered body exhibits good electrical insulation with a specific resistance of 10 10 Ωcm or more, and a thermal conductivity of 0.7ca.
This was developed with an eye to its excellent thermal conductivity of l/cm・s・℃.

このように、優れた電気絶縁性と熱伝導性を兼
備した炭化ケイ素粉末を、シリコーン系樹脂また
はエポキシ系樹脂中に分散させた組成物は、シリ
コーン系樹脂またはエポキシ系樹脂そのものに比
べて電気絶縁性を全く損なうことなく格段に向上
した熱伝導性を示す。
In this way, a composition in which silicon carbide powder, which has both excellent electrical insulation and thermal conductivity, is dispersed in silicone resin or epoxy resin has better electrical insulation than silicone resin or epoxy resin itself. It exhibits significantly improved thermal conductivity without any loss in performance.

第2図は、シリコーン系樹脂に炭化ケイ素系焼
結体粉末を分散させた組成物における炭化ケイ素
の体積分率(横軸)と熱伝導率(縦軸)との関係
である。熱伝導率は炭化ケイ素系焼結体の体積分
率の増加にともなつて大幅に増大する傾向を示し
ている。
FIG. 2 shows the relationship between the volume fraction of silicon carbide (horizontal axis) and thermal conductivity (vertical axis) in a composition in which silicon carbide-based sintered body powder is dispersed in silicone-based resin. Thermal conductivity tends to increase significantly as the volume fraction of the silicon carbide sintered body increases.

このことから、半導体装置の放熱性向上をはか
るのに、前述した樹脂組成物が極めて有用である
ことがわかる。
This shows that the resin composition described above is extremely useful for improving the heat dissipation properties of semiconductor devices.

また、第3図は、エポキシ系樹脂に炭化ケイ素
系焼結体粉末を分散させた組成物の、炭化ケイ素
系焼結体の体積分率と熱伝導率の関係である。こ
の場合も、熱伝導率は炭化ケイ素系焼結体の体積
分率の増加にともなつて大幅に増大していること
が分かる。この際、樹脂組成物の比抵抗1010Ωcm
以上の値が保持されることは勿論である。
Further, FIG. 3 shows the relationship between the volume fraction of silicon carbide-based sintered body and thermal conductivity of a composition in which silicon carbide-based sintered body powder is dispersed in epoxy-based resin. In this case as well, it can be seen that the thermal conductivity increases significantly as the volume fraction of the silicon carbide-based sintered body increases. At this time, the specific resistance of the resin composition is 10 10 Ωcm
Of course, the above values are held.

なお、前述した樹脂組成物が優れた放熱性を有
するのは、本来熱伝導率の小さいシリコーン系樹
脂またはエポキシ系樹脂の欠点をこれら樹脂に分
散された炭化ケイ素系焼結体粉末によつて補なう
ことが可能なためである。
The reason why the aforementioned resin composition has excellent heat dissipation properties is that the disadvantages of silicone resins or epoxy resins, which inherently have low thermal conductivity, are compensated for by the silicon carbide sintered powder dispersed in these resins. This is because it is possible.

また、本発明樹脂組成物に煙霧質シリカを添加
した場合は、樹脂組成物の展延性が増すため、シ
ート状等にして使用するような場合に好適な絶縁
物になり得る。したがつて前記高熱伝導性組成物
を本発明半導体装置の充填剤または保護層材とし
て用いれば放熱性と絶縁性を兼備した樹脂組成物
を介して半導体素子ペレツトで発生した熱を放射
状に伝達できるため、冷却効果を高めることが可
能になる。
Further, when fumed silica is added to the resin composition of the present invention, the spreadability of the resin composition increases, so that it can become a suitable insulator when used in the form of a sheet or the like. Therefore, if the highly thermally conductive composition is used as a filler or protective layer material for the semiconductor device of the present invention, the heat generated in the semiconductor element pellet can be transmitted radially through the resin composition that has both heat dissipation and insulation properties. Therefore, it becomes possible to enhance the cooling effect.

以下、本発明の半導体装置を実施例を用いてさ
らに詳細に説明する。
Hereinafter, the semiconductor device of the present invention will be explained in more detail using examples.

実施例 1 本実施例は、半導体素子の収納容器と放熱体と
を兼ねるアルミニウムフインにダイオードペレツ
ト4個を搭載した5A級整流回路モジユールであ
る。
Example 1 This example is a 5A class rectifier circuit module in which four diode pellets are mounted on an aluminum fin that serves both as a storage container for semiconductor elements and as a heat sink.

この整流回路モジユールは、第4図a,bに示
すように、アルミニウムフイン11に設けた凹部
に、ダイオードペレツト4個14a,14b……
…がそれぞれ整流回路を構成するように電気接続
されたサブアツセンブリを搭載し、そして凹部に
絶縁樹脂16,17を充填したものである。
As shown in FIGS. 4a and 4b, this rectifier circuit module has four diode pellets 14a, 14b...
... are mounted with electrically connected subassemblies so as to constitute a rectifier circuit, and the recesses are filled with insulating resins 16 and 17.

この際、ダイオードペレツト搭載部を、同図b
に示す任意の一断面図を用いて説明すると、まず
最初にアルミニウムフイン11に設けた凹部底面
12上に絶縁物13が載置され、この絶縁物上に
ダイオードペレツト14a,14b(他のダイオ
ードペレツト2個は図示せず)を電極および電気
端子を兼ねる金属リード15a,15b,15c
と一体化したサブアツセンブリが載置される。
At this time, the diode pellet mounting part is
To explain this using an arbitrary cross-sectional view shown in FIG. (two pellets are not shown) and metal leads 15a, 15b, 15c that also serve as electrodes and electrical terminals.
A sub-assembly integrated with is placed.

そして、これら絶縁物13およびサブアツセン
ブリの周囲に、シリコーン系樹脂に、BeO/SiC
重量部比0.02を含む炭化ケイ素系焼結体粉末を分
散させた第1の樹脂組成物16を充填、硬化させ
る。さらに第1の樹脂組成物16の上に、エポキ
シ系樹脂に、BeO/SiC重量部比0.02を含む炭化
ケイ素系焼結体粉末を分散させた第2の樹脂組成
物17を充填、硬化させる。
Then, around these insulators 13 and sub-assemblies, silicone resin is coated with BeO/SiC.
A first resin composition 16 in which silicon carbide-based sintered body powder containing a weight part ratio of 0.02 is dispersed is filled and cured. Further, on the first resin composition 16, a second resin composition 17 in which silicon carbide-based sintered body powder containing a BeO/SiC weight part ratio of 0.02 is dispersed in an epoxy resin is filled and cured.

なお、前述した第1の樹脂組成物中の炭化ケイ
素系焼結体粉末の体積分率は71%、そして第2の
樹脂組成物中の炭化ケイ素系焼結体粉末の体積分
率は70%である。
The volume fraction of the silicon carbide-based sintered body powder in the first resin composition described above is 71%, and the volume fraction of the silicon carbide-based sintered body powder in the second resin composition is 70%. It is.

以上の構成で得られた本実施例整流回路モジユ
ールのダイオードペレツト・空気間の熱抵抗は、
8〜11℃/W(平均値:10℃/W、試料数:200
個)である。一方、炭化ケイ素系焼結体粉末を分
散させないシリコーン樹脂およびエポキシ樹脂を
用いた従来型同等品の熱抵抗は13〜15℃/W(平
均値:14℃/W、試料数:200個)であり、本実施
例のものは従来例に比べて、著しい放熱性向上が
認められた。この結果、整流回路モジユールの許
容電流容量を従来の5Aから6Aに上げることが可
能になつた。
The thermal resistance between the diode pellet and air of the rectifier circuit module of this embodiment obtained with the above configuration is as follows:
8 to 11℃/W (average value: 10℃/W, number of samples: 200
). On the other hand, the thermal resistance of conventional equivalent products using silicone resin and epoxy resin without dispersing silicon carbide sintered body powder is 13 to 15℃/W (average value: 14℃/W, number of samples: 200). It was found that the heat dissipation properties of this example were significantly improved compared to the conventional example. As a result, it has become possible to increase the allowable current capacity of the rectifier circuit module from the conventional 5A to 6A.

実施例 2 本実施例は、銅板間に絶縁物を介在させた絶縁
基板上にトランジスタペレツト4個、ダイオード
ペレツト2個、チツプ抵抗2個、チツプコンデン
サ2個を搭載した電流制御用5KW級モジユール
である。
Example 2 This example is a 5KW class for current control, which is equipped with 4 transistor pellets, 2 diode pellets, 2 chip resistors, and 2 chip capacitors on an insulating substrate with an insulator interposed between copper plates. It is modular.

この電流制御用モジユールの構造、製法を第5
図に示す任意の一断面図を用いて説明すると、ま
ず銅支持体21上に絶縁物22を介して銅載置板
23a,23bが一体化される。前記銅載置板2
3a,23b上に、前述した回路素子としてのト
ランジスタペレツト、ダイオードペレツト、チツ
プ抵抗、チツプコンデンサ等の回路素子28a,
28bを搭載する。そして、それぞれの回路素子
に所定の電気配線を施すとともに電気端子(図示
せず)を取り付ける。
The structure and manufacturing method of this current control module are explained in the fifth section.
To explain using an arbitrary cross-sectional view shown in the figure, first, copper mounting plates 23a and 23b are integrated on a copper support 21 with an insulator 22 interposed therebetween. Said copper mounting plate 2
On the circuit elements 3a and 23b, circuit elements 28a, such as transistor pellets, diode pellets, chip resistors, chip capacitors, etc., are arranged as the circuit elements described above.
Equipped with 28b. Then, predetermined electrical wiring is provided to each circuit element and electrical terminals (not shown) are attached.

さらに、銅支持板21上にケース24を取り付
けるとともに、前述した絶縁物22、銅載置板2
1、回路素子28a,28bとしてのトランジス
タペレツト、ダイオードペレツト、チツプ抵抗、
チツプコンデンサを完全に包囲するようにシリコ
ーン系樹脂にBN/SiC重量部比0.03の炭化ケイ素
系焼結体粉末を分散させた第1の樹脂組成物25
を充填、硬化させる。さらに第1の樹脂組成物2
5の上に、エポキシ樹脂にBN/SiC重量部比0.03
の炭化ケイ素系焼結体粉末を分散させた第2の樹
脂組成物26を充填、硬化させる。
Further, the case 24 is attached on the copper support plate 21, and the above-mentioned insulator 22 and the copper mounting plate 2 are mounted on the copper support plate 21.
1. Transistor pellets, diode pellets, chip resistors as circuit elements 28a and 28b,
A first resin composition 25 in which silicon carbide-based sintered body powder with a BN/SiC weight part ratio of 0.03 is dispersed in a silicone-based resin so as to completely surround a chip capacitor.
Fill and harden. Furthermore, the first resin composition 2
On top of 5, add BN/SiC weight part ratio 0.03 to epoxy resin.
A second resin composition 26 in which silicon carbide-based sintered body powder is dispersed is filled and cured.

なお、前述した第1の樹脂組成物中の炭化ケイ
素系焼結体粉末の体積分率は80%、そして第2の
樹脂組成物中の炭化ケイ素系焼結体粉末の体積分
率は80%である。
The volume fraction of the silicon carbide-based sintered body powder in the first resin composition described above is 80%, and the volume fraction of the silicon carbide-based sintered body powder in the second resin composition is 80%. It is.

以上の構成で得られた本実施例電流制御用モジ
ユールに入力電力5KWに相当する通電をして、
出力電流の制御を試みたところ、同モジユールに
搭載された回路素子としてのトランジスタペレツ
トおよびダイオードペレツトの温度は90〜110℃
であり、炭化ケイ素系焼結体粉末を分散させない
シリコーン樹脂および/またはエポキシ樹脂を用
いた従来型の同等品に比べて15〜20℃低い素子温
度を保つことができた。
The current control module of this example obtained with the above configuration was energized with an input power of 5KW, and
When we tried to control the output current, the temperature of the transistor pellet and diode pellet, which are the circuit elements mounted on the module, was 90 to 110 degrees Celsius.
Therefore, the device temperature could be maintained 15 to 20°C lower than a conventional equivalent product using silicone resin and/or epoxy resin in which silicon carbide-based sintered body powder is not dispersed.

実施例 3 本実施例は、電気配線を施したアルミナ製パツ
ケージにシリコン集積回路素子ペレツトをCCB
(Controlled Colaps Bonding)法によつて搭載
した集積回路装置である。
Example 3 In this example, silicon integrated circuit element pellets are placed on a CCB in an alumina package with electrical wiring.
This is an integrated circuit device mounted using the (Controlled Colaps Bonding) method.

この集積回路装置では、第6図に示すように、
アルミナパツケージ31の凹部に設けた厚膜配線
32a,32b上にはんだボール33a,33b
を介してシリコン集積回路素子ペレツト34が搭
載される。そして、アルミナパツケージ31と金
属キヤツプ35とで包囲された空間に、シリコー
ン系樹脂にBeO/SiC重量部比0.03の炭化ケイ素
系焼結体粉末を分散させた第1の樹脂組成物36
を充填、硬化させる。さらに第1の樹脂組成物3
6の上に、エポキシ樹脂にBN/SiC重量部比0.03
の炭化ケイ素系焼結体粉末を分散させた第2の樹
脂組成物37を充填、硬化させる。35は金属キ
ヤツプである。
In this integrated circuit device, as shown in FIG.
Solder balls 33a, 33b are placed on the thick film wirings 32a, 32b provided in the recessed part of the alumina package 31.
A silicon integrated circuit element pellet 34 is mounted thereon. Then, in the space surrounded by the alumina package 31 and the metal cap 35, a first resin composition 36 in which silicon carbide-based sintered body powder with a BeO/SiC weight part ratio of 0.03 is dispersed in a silicone-based resin is applied.
Fill and harden. Furthermore, the first resin composition 3
On top of 6, add BN/SiC weight part ratio 0.03 to epoxy resin.
A second resin composition 37 in which silicon carbide-based sintered body powder is dispersed is filled and cured. 35 is a metal cap.

なお、前述した第1の樹脂組成物36中の炭化
ケイ素系焼結体粉末の体積分率は80%、そして第
2の樹脂組成物37中の炭化ケイ素系焼結体粉末
の体積分率は80%である。
The volume fraction of the silicon carbide-based sintered body powder in the first resin composition 36 described above is 80%, and the volume fraction of the silicon carbide-based sintered body powder in the second resin composition 37 is 80%. It is 80%.

以上の構成で得られた本実施例集積回路装置に
40Wの電力を印加して作動させたところ、搭載さ
れた集積回路素子ペレツトの温度は100℃を越え
なかつた。
The integrated circuit device of this example obtained with the above configuration
When the device was operated by applying 40W of power, the temperature of the integrated circuit element pellet mounted on it did not exceed 100℃.

以上、本発明を実施例により説明したが、本発
明はこれのみに限定されるものではなく、以下の
ような場合でも本発明の効果ないし利点を享受で
きる。
Although the present invention has been described above with reference to examples, the present invention is not limited to these examples, and the effects and advantages of the present invention can be enjoyed even in the following cases.

(1) シリコーン系樹脂またはエポキシ系樹脂に分
散させる炭化ケイ素系焼結体が、酸化ベリリウ
ムと窒化ホウ素の両者を含むものである場合。
(1) When the silicon carbide sintered body dispersed in silicone resin or epoxy resin contains both beryllium oxide and boron nitride.

(2) 樹脂組成物で半導体素子ペレツトを直接に被
覆する必要はなく、例えば第7図に示すよう
に、デスクリート型半導体装置を回路基板や放
熱フイン等へ取り付けるに際してシート状に成
形した樹脂組成物を介して固定するような場合
でも有効である。なお第7図において、41は
半導体装置、42は前述の樹脂組成物を薄膜状
に形成したものである。
(2) It is not necessary to directly coat semiconductor element pellets with a resin composition; for example, as shown in FIG. It is also effective when fixing via an object. In FIG. 7, 41 is a semiconductor device, and 42 is a thin film formed from the above-mentioned resin composition.

以上までに説明した樹脂組成物は電気絶縁性を
保持すると同時に優れた熱伝導性を示すので、こ
の樹脂組成物を充填剤または保護層材として用い
ることにより半導体装置の放熱性を高めることが
でき、同装置の電力容量や信頼性を高めることが
できる。
The resin composition described above exhibits excellent thermal conductivity while maintaining electrical insulation properties, so by using this resin composition as a filler or protective layer material, the heat dissipation properties of semiconductor devices can be improved. , the power capacity and reliability of the device can be increased.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は混成集積回路装置の構造図、第2,3
図はそれぞれ本発明に好適な樹脂組成物の熱伝導
性を示す図、第4a,b図および第5,6図はそ
れぞれ本発明の実施例を示す斜視図および断面
図、そして第7図は本発明の変形例を示す側面図
である。 11……アルミニウムフイン、12……凹部底
面、13……絶縁物、14a,14b……ダイオ
ードペレツト、15a,15c……金属リード、
16……第1の樹脂組成物、17……第2の樹脂
組成物。
Figure 1 is a structural diagram of a hybrid integrated circuit device, Figures 2 and 3
The figures each show the thermal conductivity of a resin composition suitable for the present invention, Figures 4a and 4b and Figures 5 and 6 are perspective views and sectional views respectively showing examples of the present invention, and Figure 7 is a diagram showing the thermal conductivity of a resin composition suitable for the present invention. It is a side view which shows the modification of this invention. 11... Aluminum fin, 12... Bottom of recess, 13... Insulator, 14a, 14b... Diode pellet, 15a, 15c... Metal lead,
16...First resin composition, 17...Second resin composition.

Claims (1)

【特許請求の範囲】 1 その外周の少なくとも一部が絶縁材で被覆さ
れた半導体ペレツトを含む半導体装置であつて、
前記絶縁材が炭化ケイ素を主成分とし、その他に
酸化ベリリウムおよび窒化ホウ素の少なくとも1
種を含む炭化ケイ素系焼結体の粉末を分散してな
る有機高分子材からなる高熱伝導性組成物である
ことを特徴とする半導体装置。 2 前記有機高分子材がシリコーン系樹脂又はエ
ポキシ系樹脂であることを特徴とする前記特許請
求の範囲第1項記載の半導体装置。
[Claims] 1. A semiconductor device including a semiconductor pellet whose outer periphery is at least partially covered with an insulating material,
The insulating material mainly contains silicon carbide and also contains at least one of beryllium oxide and boron nitride.
A semiconductor device characterized in that it is a highly thermally conductive composition made of an organic polymer material in which a powder of a silicon carbide-based sintered body containing seeds is dispersed. 2. The semiconductor device according to claim 1, wherein the organic polymer material is a silicone resin or an epoxy resin.
JP4626380A 1980-04-10 1980-04-10 Semiconductor device Granted JPS56144565A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4626380A JPS56144565A (en) 1980-04-10 1980-04-10 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4626380A JPS56144565A (en) 1980-04-10 1980-04-10 Semiconductor device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP25629585A Division JPS61159457A (en) 1985-11-15 1985-11-15 Highly thermally conductive composition

Publications (2)

Publication Number Publication Date
JPS56144565A JPS56144565A (en) 1981-11-10
JPS6115901B2 true JPS6115901B2 (en) 1986-04-26

Family

ID=12742314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4626380A Granted JPS56144565A (en) 1980-04-10 1980-04-10 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS56144565A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5158735A (en) * 1987-03-19 1992-10-27 The Dexter Corporation Encapsulating electronic components
US5011870A (en) * 1989-02-08 1991-04-30 Dow Corning Corporation Thermally conductive organosiloxane compositions

Also Published As

Publication number Publication date
JPS56144565A (en) 1981-11-10

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