JPS6153428B2 - - Google Patents
Info
- Publication number
- JPS6153428B2 JPS6153428B2 JP57178763A JP17876382A JPS6153428B2 JP S6153428 B2 JPS6153428 B2 JP S6153428B2 JP 57178763 A JP57178763 A JP 57178763A JP 17876382 A JP17876382 A JP 17876382A JP S6153428 B2 JPS6153428 B2 JP S6153428B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- rod
- rods
- electrode holding
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004020 conductor Substances 0.000 claims description 24
- 230000002265 prevention Effects 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 9
- 239000012808 vapor phase Substances 0.000 claims description 6
- 239000012212 insulator Substances 0.000 description 7
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000001947 vapour-phase growth Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
本発明は外熱形のプラズマ化学気相生成装置に
使用する電極保持装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electrode holding device used in an externally heated plasma chemical vapor phase generation device.
従来太陽電池用のアモルフアスシリコン膜を生
成する場合、生成効率が良いために外熱形のプラ
ズマ化学気相生成装置が使用されている。しかし
この装置は反応管および内容物が化学気相生成に
最適な温度に保持されているので、プラズマの発
生領域の周辺でも気相成長膜が生成され易く、こ
のために電極周辺部と電極以外の部分との間で異
常放電が起り、部分的にしか気相成長膜が生成し
ない現象がおこることがある。 Conventionally, when producing amorphous silicon films for solar cells, external thermal plasma chemical vapor phase production equipment has been used because of its high production efficiency. However, in this device, the reaction tube and its contents are kept at the optimal temperature for chemical vapor phase generation, so vapor phase growth films are likely to be generated even around the plasma generation area, and this results in Abnormal discharge may occur between the two parts, and a phenomenon may occur in which a vapor-phase growth film is only partially formed.
一般に太陽電池用のアモルフアスシリコン膜は
P層、I層、N層の3種類の膜が必要であるが、
前記のような部分成長が起ると完全な3層構造の
膜が出来ないという問題がおこる。 Generally, amorphous silicon films for solar cells require three types of films: P layer, I layer, and N layer.
If such partial growth occurs as described above, a problem arises in that a film with a complete three-layer structure cannot be formed.
このため、上記の問題解決のためにとられた対
策の一つとして、電極の保持装置を第1図および
第2図(これは第1図のA−A′断面図である)
もしくは第3図および第4図AおよびB(これら
は第3図のB−B′,C−C′の断面図である)に
示すようなものがある。 For this reason, as one of the measures taken to solve the above problem, the electrode holding device as shown in Figs. 1 and 2 (this is a sectional view taken along line A-A' in Fig. 1)
Alternatively, there are the ones shown in FIGS. 3 and 4 A and B (these are cross-sectional views taken along lines B-B' and C-C' in FIG. 3).
第1図および第2図に示したものは両端に石英
などの耐熱絶縁物の連結板1をおき、その間を連
結板1に固着した2本の石英製などの連結棒2を
設け、この連結棒2に一定間隔で刻まれた溝に電
極3を挿入して保持し(第2図の状態)、図示し
てないリード線で電極3を1枚おきに接続して1
対の電極群を構成する。この場合の連結棒2には
各電極の間に連結棒2の外周に間隔を設けて被う
石英などの短絡防止管4を設けたものである。し
かしこの短絡防止管4により連結棒2の表面へは
膜生成が行なわれず短絡は防げるものの、短絡防
止管4の外周に生成した膜を仲介としても放電が
行なわれるために対向する電極間で一様なプラズ
マが発生しないという問題が起つた。 The one shown in Figs. 1 and 2 has a connecting plate 1 made of a heat-resistant insulator such as quartz at both ends, and two connecting rods 2 made of quartz or the like fixed to the connecting plate 1 are provided between them. Insert and hold the electrodes 3 into grooves cut at regular intervals on the rod 2 (as shown in Figure 2), and connect every other electrode 3 with a lead wire (not shown).
This constitutes a pair of electrode groups. In this case, the connecting rod 2 is provided with a short-circuit prevention tube 4 made of quartz or the like that covers the outer periphery of the connecting rod 2 at intervals between each electrode. However, although this short-circuit prevention tube 4 does not form a film on the surface of the connecting rod 2 and prevents short circuits, discharge occurs even through the film formed on the outer periphery of the short-circuit prevention tube 4, so that there is no uniformity between the opposing electrodes. A problem arose in that a similar plasma was not generated.
第3図および第4図は従来の他の装置で、第1
図の場合と同様に両端に石英などの耐熱絶縁物の
連結板1をおき、その連結板1の外周近傍でほぼ
3等分した位置に3本の導体棒5および6を両端
の連結板1の間に設ける。導体棒5および6は上
側に1本と下側に2本設けてあり、下側の2本は
リード線で接続して同電位としてある。これらの
導体棒のうち下側の2本の導体棒5には前記第1
図および第2図のように電極8を挿入する溝が一
定間隔で刻まれており、この溝に上側の導体棒6
に接触しないような切欠を有する電極8を挿入し
て保持する。上側の1本の導体棒6には下側の2
本の導体棒5に接触しない切欠を設けかつ上側に
導体棒6を貫通する孔を設けた電極7を設けて前
記一定間隔の電極8の中間に吊下げるようにして
配置したものである。このような電極構造では前
記のような短絡は起りにくいが、一つの電極群と
他の電極群の導体棒との間、すなわち7と5およ
び8と6との間での放電によつて一様なプラズマ
発生が困難であるうえ、上側から吊るした電極7
への基板の着脱がむずかしいという問題がある。 Figures 3 and 4 show other conventional devices;
As in the case shown in the figure, connecting plates 1 made of heat-resistant insulators such as quartz are placed at both ends, and three conductor rods 5 and 6 are attached to the connecting plates 1 at both ends at positions roughly divided into thirds near the outer periphery of the connecting plate 1. Provided between. The conductor rods 5 and 6 are provided one on the upper side and two on the lower side, and the two on the lower side are connected with lead wires to have the same potential. Among these conductor rods, the lower two conductor rods 5 are connected to the first conductor rods 5.
As shown in Fig. 2, grooves into which the electrodes 8 are inserted are cut at regular intervals, and the upper conductor rod 6
An electrode 8 having a notch that does not come into contact with the electrode 8 is inserted and held. One conductor bar 6 on the upper side has two conductor rods on the lower side.
An electrode 7 is provided with a notch that does not touch the conductor rod 5 and a hole passing through the conductor rod 6 on the upper side, and is suspended between the electrodes 8 at regular intervals. With such an electrode structure, short circuits as described above are unlikely to occur, but short circuits may occur due to discharge between one electrode group and the conductor rods of the other electrode group, that is, between 7 and 5 and 8 and 6. It is difficult to generate such plasma, and the electrode 7 suspended from the top
There is a problem in that it is difficult to attach and detach the board to the device.
本発明はこのような問題点を解決するためにな
されたもので、各電極への基板の着脱が容易であ
り、電極の対向面以外での放電が起りにくく、か
つ電極保持部分での短絡の起りにくい電極保持装
置を提供するものである。以下図面により詳細に
説明する。 The present invention has been made to solve these problems, and it is easy to attach and detach the substrate to each electrode, prevents discharge from occurring on surfaces other than the opposing surfaces of the electrodes, and prevents short circuits at the electrode holding part. This provides an electrode holding device that is unlikely to cause this. This will be explained in detail below with reference to the drawings.
第5図は本発明の電極保持装置に電極を挿入し
た状態の上面図である。第6図は電極面に垂直方
向から見た側面図である。図において9は連結板
で、本実施例では半円弧状の板であるが、半円形
の板でも良い。10および11は連結棒、12お
よび13は電極保持棒、14は短絡防止管であ
る。15は導体棒、16は接続棒、17はフレー
ク防止管、18は電極である。 FIG. 5 is a top view of a state in which an electrode is inserted into the electrode holding device of the present invention. FIG. 6 is a side view seen from a direction perpendicular to the electrode surface. In the figure, reference numeral 9 denotes a connecting plate, which is a semicircular plate in this embodiment, but may also be a semicircular plate. 10 and 11 are connecting rods, 12 and 13 are electrode holding rods, and 14 is a short circuit prevention tube. 15 is a conductor rod, 16 is a connecting rod, 17 is a flake prevention tube, and 18 is an electrode.
本実施例では、互に平行な平面上にある円弧状
の耐熱絶縁物の連結板9上のほぼ等間隔の位置か
ら平行に配置され、かつ両端をそれぞれの連結板
9に固着した4本の耐熱絶縁物の連結棒10およ
び11と、円弧状の連結板9の円弧の両端部に保
持され、連結棒10に平行に設けた2本の導体棒
15とよりなる。前記4本の連結棒10および1
1は1本おきに組とした2組の連結棒を群として
構成させ、それぞれの群の連結棒10または11
には両端の連結板9に平行な面上に耐熱絶縁物の
電極保持棒12または13を円弧の中心に向う方
向に固着してある。この電極保持棒12または1
3は連結棒10または11と反対側の先端に電極
18を挿入する切欠が設けてある。さらに1対の
電極保持棒12または13を含む面すなわち保持
された電極18が等間隔に配置される位置に連結
棒10または11に交互に固着されている。この
電極保持棒12または13の長さは保持される電
極18の隣接した電極との間隔より長いことが必
要である。また前記連結棒10または11の両端
部の連結板9に固着する近傍には連結棒10また
は11の外周を間隔を設けて被う耐熱絶縁物の短
絡防止管14がそれぞれ設けられている。この短
絡防止管14の内面には連結棒10または11の
外周との間の間隔を保持する突起が複数個所設け
られている。前記2本の導体棒15には前記電極
保持棒12または13を含む面上に一つおきに交
互に接続棒16が前記円弧の中心に向う方向に、
かつ挿入された電極18に接触するように配設し
てある。 In the present embodiment, four wires are arranged in parallel from substantially equally spaced positions on connecting plates 9 made of arc-shaped heat-resistant insulators on parallel planes, and each of which has both ends fixed to each connecting plate 9. It consists of connecting rods 10 and 11 made of heat-resistant insulators, and two conductor rods 15 held at both ends of the arc of an arc-shaped connecting plate 9 and provided parallel to the connecting rod 10. The four connecting rods 10 and 1
1 consists of two sets of connecting rods arranged every other pair as a group, and connecting rods 10 or 11 of each group.
Electrode holding rods 12 or 13 made of heat-resistant insulators are fixed on surfaces parallel to the connecting plates 9 at both ends in a direction toward the center of the arc. This electrode holding rod 12 or 1
3 has a notch for inserting an electrode 18 at the end opposite to the connecting rod 10 or 11. Further, surfaces including a pair of electrode holding rods 12 or 13, that is, held electrodes 18, are alternately fixed to connecting rods 10 or 11 at equally spaced positions. The length of this electrode holding rod 12 or 13 needs to be longer than the distance between the electrodes 18 held and adjacent electrodes. Furthermore, short-circuit prevention tubes 14 made of heat-resistant insulators are provided at both ends of the connecting rod 10 or 11 in the vicinity of where they are fixed to the connecting plate 9, and which cover the outer periphery of the connecting rod 10 or 11 at intervals. A plurality of protrusions are provided on the inner surface of the short-circuit prevention tube 14 to maintain a distance from the outer periphery of the connecting rod 10 or 11. The two conductor rods 15 have connection rods 16 alternately arranged on the surface including the electrode holding rods 12 or 13 in a direction toward the center of the arc.
And it is arranged so that it may contact the inserted electrode 18.
なお他の実施例として上記実施例のほかに導体
棒15に接続棒16を配設してある中間の部分に
耐熱絶縁物のフレーク防止管17を装着したもの
である。 As another embodiment, in addition to the above embodiment, a flake prevention tube 17 made of a heat-resistant insulator is attached to the intermediate portion of the conductor rod 15 where the connecting rod 16 is disposed.
つぎに本発明の電極保持装置の作用について説
明する。各電極18にはそれぞれ対向する面に図
示しない方法で被処理基板を装着し、この電極1
8を一対の電極保持棒12または13の先端の切
欠部に挿入し、接続棒16で導体棒15に接続す
る。このようにして各電極18を装着した電極保
持装置をすでに所定温度に保持してある外熱形の
プラズマ化学気相生成装置の反応炉に挿入する。
電極保持装置全体が所定温度に保持された状態で
反応ガスを反応炉内に導入し、一定圧力の減圧状
態のもとで高周波電力を導体棒15、接続棒16
を通して各群の電極18に印加する。 Next, the operation of the electrode holding device of the present invention will be explained. A substrate to be processed is mounted on the opposing surface of each electrode 18 by a method not shown, and this electrode 1
8 is inserted into the notch at the tip of a pair of electrode holding rods 12 or 13, and connected to the conductor rod 15 with a connecting rod 16. The electrode holding device with each electrode 18 mounted thereon in this manner is inserted into a reactor of an externally heated plasma chemical vapor generation apparatus which is already maintained at a predetermined temperature.
A reaction gas is introduced into the reactor while the entire electrode holding device is maintained at a predetermined temperature, and high frequency power is applied to the conductor rod 15 and the connecting rod 16 under a reduced pressure state of a constant pressure.
The voltage is applied to each group of electrodes 18 through.
このようにすると各電極18の間でプラズマが
発生し、化学気相生成が行なわれる。本実施例の
場合、各電極18はそれぞれの電極間隔より長い
電極保持棒12または13で保持されているの
で、たとえ電極保持棒12または13や連結棒1
0または11に気相生成膜が成長していたとして
も電極相互間の間隔が一番短いために前記のよう
な電極と電極以外の部分との間での異常放電は起
りにくい。 In this way, plasma is generated between each electrode 18, and chemical vapor phase generation is performed. In the case of this embodiment, each electrode 18 is held by an electrode holding rod 12 or 13 that is longer than the interval between the electrodes, so even if the electrode holding rod 12 or 13 or the connecting rod 1
Even if a vapor-phase-generated film is grown on the electrodes 0 or 11, the distance between the electrodes is the shortest, so abnormal discharge as described above between the electrodes and a portion other than the electrodes is unlikely to occur.
本実施例では電極群の両端の電極18と連結板
9との距離は電極間隔にくらべて充分長くとつて
あり、さらに各連結棒10および11に設けられ
た短絡防止管14によつてたとえこれら連結板
9、連結棒10および11、短絡防止管14に気
相成長膜が出来たとしても短絡防止管14と連結
棒10および11との間には気相成長膜は生成し
ないので、互に対向する電極18の間で短絡する
ことはない。 In this embodiment, the distance between the electrodes 18 at both ends of the electrode group and the connecting plate 9 is set to be sufficiently long compared to the electrode spacing, and the short-circuit prevention tubes 14 provided on each connecting rod 10 and 11 prevent Even if a vapor-grown film is formed on the connecting plate 9, the connecting rods 10 and 11, and the short-circuit prevention tube 14, no vapor-grown film will be formed between the short-circuit prevention tube 14 and the connecting rods 10 and 11. There is no short circuit between the opposing electrodes 18.
また他の実施例では接続棒16相互間の導体棒
15にかぶせたフレーク防止管17によつてフレ
ークが発生しにくいとともに、発生したフレーク
はフレーク防止管17の交換により容易に取り除
くことが出来る。 In another embodiment, the flake prevention tube 17 placed over the conductor rods 15 between the connecting rods 16 prevents flakes from forming, and the generated flakes can be easily removed by replacing the flake prevention tube 17.
以上のように本発明の電極保持装置は安定した
プラズマを発生させて気相生成膜の品質を確保す
るとともに、電極の着脱も極めて容易な構造であ
る。さらに短絡防止管14やフレーク防止管17
のために電極保持装置全体を洗浄する回数を減ら
すことが出来るなど、実用効果は極めて大きい。 As described above, the electrode holding device of the present invention generates stable plasma to ensure the quality of the vapor-phase-generated film, and has a structure that allows extremely easy attachment and detachment of the electrode. Furthermore, the short circuit prevention pipe 14 and the flake prevention pipe 17
The practical effects are extremely large, such as being able to reduce the number of times the entire electrode holding device is cleaned.
第1図は従来の電極保持装置の平面図、第2図
は第1図のA−A′面の断面図、第3図は従来の
他の電極保持装置の平面図、第4図Aは第3図の
B−B′面の断面図、第4図Bは第3図のC−
C′面の断面図、第5図は本発明の電極保持装置
の平面図、第6図は本発明の電極保持装置の電極
面に垂直方向から見た側面図である。
図において、9は連結板、10および11は連
結棒、12および13は電極保持棒、14は短絡
防止管、15は導体棒、16は接続棒、17はフ
レーク防止管である。
Fig. 1 is a plan view of a conventional electrode holding device, Fig. 2 is a sectional view taken along line A-A' in Fig. 1, Fig. 3 is a plan view of another conventional electrode holding device, and Fig. 4 is a A sectional view taken along line B-B' in Figure 3, and Figure 4B is a cross-sectional view taken along line C-B' in Figure 3.
5 is a plan view of the electrode holding device of the present invention, and FIG. 6 is a side view of the electrode holding device of the present invention viewed from a direction perpendicular to the electrode surface. In the figure, 9 is a connecting plate, 10 and 11 are connecting rods, 12 and 13 are electrode holding rods, 14 is a short-circuit prevention tube, 15 is a conductor rod, 16 is a connecting rod, and 17 is a flake prevention tube.
Claims (1)
装置において、2枚の連結板と、この連結板の間
に両端をそれぞれの連結板に固着した2組の連結
棒と、前記連結板の間に両端をそれぞれの連結板
で保持した2本の導体棒とよりなり、前記連結棒
には各組ごとに一定間隔をへだてて電極を保持し
かつ電極間隔より長い電極保持棒と両端の連結板
と電極保持棒との間に連結棒の外周を間隔をへだ
てて被う短絡防止管を設け、前記導体棒には一枚
おきの電極に接続する接続棒を設けたことを特徴
とする外熱形プラズマ化学気相生成装置の電極保
持装置。 2 外熱形プラズマ化学気相生成装置の電極保持
装置において、2枚の連結板と、この連結板の間
に両端をそれぞれの連結板に固着した2組の連結
棒と、前記連結板の間に両端をそれぞれの連結板
で保持した2本の導体棒とよりなり、前記連結棒
には各組ごとに一定間隔をへだてて電極を保持し
かつ電極間隔より長い電極保持棒と両端の連結板
と電極保持棒との間に連結棒の外周を間隔をへだ
てて被う短絡防止管を設け、前記導体棒には一枚
おきの電極に接続する接続棒とこれらの接続棒の
間の導体棒の外周を被うフレーク防止管とを設け
たことを特徴とする外熱形プラズマ化学気相生成
装置の電極保持装置。[Scope of Claims] 1. An electrode holding device for an externally heated plasma chemical vapor phase generation device, comprising: two connecting plates, two sets of connecting rods having both ends fixed to the respective connecting plates between the connecting plates; It consists of two conductor rods held at both ends by respective connecting plates between connecting plates, and each pair of connecting rods holds electrodes at a certain interval, and has electrode holding rods longer than the electrode spacing, and an electrode holding rod at both ends. A short-circuit prevention tube is provided between the connecting plate and the electrode holding rod, and covers the outer periphery of the connecting rod at a distance, and the conductor rod is provided with a connecting rod that connects to every other electrode. Electrode holding device for external thermal plasma chemical vapor generation equipment. 2. In an electrode holding device for an externally heated plasma chemical vapor generation device, there are two connecting plates, two sets of connecting rods with both ends fixed to the respective connecting plates between the connecting plates, and two sets of connecting rods with both ends fixed between the connecting plates. It consists of two conductor rods held by a connecting plate, and the connecting rod has an electrode holding rod that holds electrodes at a certain interval for each set and is longer than the electrode spacing, a connecting plate at both ends, and an electrode holding rod. A short-circuit prevention tube is provided between the connecting rods at intervals and covers the outer periphery of the connecting rod, and the conductor rod is provided with a connecting rod connected to every other electrode and a short-circuit prevention tube covering the outer periphery of the conductor rod between these connecting rods. An electrode holding device for an externally heated plasma chemical vapor phase generation device, characterized in that it is provided with a flake prevention tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57178763A JPS5969141A (en) | 1982-10-12 | 1982-10-12 | Electrode holder of externally heating type plasma chemical vapor growth device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57178763A JPS5969141A (en) | 1982-10-12 | 1982-10-12 | Electrode holder of externally heating type plasma chemical vapor growth device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5969141A JPS5969141A (en) | 1984-04-19 |
| JPS6153428B2 true JPS6153428B2 (en) | 1986-11-18 |
Family
ID=16054177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57178763A Granted JPS5969141A (en) | 1982-10-12 | 1982-10-12 | Electrode holder of externally heating type plasma chemical vapor growth device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5969141A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6227928U (en) * | 1985-08-01 | 1987-02-20 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6299476A (en) * | 1985-10-28 | 1987-05-08 | Agency Of Ind Science & Technol | Electrical discharge electrode for plasma cvd device |
-
1982
- 1982-10-12 JP JP57178763A patent/JPS5969141A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6227928U (en) * | 1985-08-01 | 1987-02-20 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5969141A (en) | 1984-04-19 |
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