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JPS6211796B2 - - Google Patents
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JPS6211796B2 - - Google Patents

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Publication number
JPS6211796B2
JPS6211796B2 JP55054516A JP5451680A JPS6211796B2 JP S6211796 B2 JPS6211796 B2 JP S6211796B2 JP 55054516 A JP55054516 A JP 55054516A JP 5451680 A JP5451680 A JP 5451680A JP S6211796 B2 JPS6211796 B2 JP S6211796B2
Authority
JP
Japan
Prior art keywords
semiconductor
junction
laser device
semiconductor laser
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55054516A
Other languages
Japanese (ja)
Other versions
JPS56150888A (en
Inventor
Masafumi Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5451680A priority Critical patent/JPS56150888A/en
Publication of JPS56150888A publication Critical patent/JPS56150888A/en
Publication of JPS6211796B2 publication Critical patent/JPS6211796B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Description

【発明の詳細な説明】 本発明は半導体レーザ装置に関するものであり
発振出力変化をより簡単に、感度よく検知する機
能を有する半導体レーザ装置を提供することを目
的とするものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor laser device, and an object of the present invention is to provide a semiconductor laser device having a function of detecting changes in oscillation output more easily and with high sensitivity.

半導体レーザは、光通信、ビデオデイスクなど
広く光応用装置に使用されているが、半導体レー
ザの動作状態を安定にするため、常に発振出力を
モニターしたり、ビデオデイスクのようにデイス
ク板からのもどり光と半導体レーザの相互作用に
よる発振出力より信号を検出する必要がある。
Semiconductor lasers are widely used in optical application equipment such as optical communication and video disks, but in order to stabilize the operating state of semiconductor lasers, the oscillation output must be constantly monitored and the return from the disk board, such as with video disks, must be controlled. It is necessary to detect a signal from the oscillation output generated by the interaction between light and a semiconductor laser.

従来このようなモニターには、第1図のように
半導体レーザ1のステム2にフアイバー3を埋込
み、このフアイバー3を通して半導体レーザチツ
プ4の光出力6をSiの光検出器5に導入して、Si
の光検出器5の信号を検出していた。
Conventionally, in such a monitor, a fiber 3 is embedded in the stem 2 of a semiconductor laser 1 as shown in FIG.
The signal from the photodetector 5 was detected.

しかしながらこのような構成では、ステムの構
造が複雑になり、しかもフアイバーを通すため半
導体レーザの光出力の利用効率が悪く、しかも位
置合せが必要で、しかも、半導体レーザから出射
した光の広がり光分を少なくするための配慮が必
要となる。
However, in such a configuration, the structure of the stem is complicated, the optical output of the semiconductor laser is inefficiently utilized because the fiber passes through it, alignment is required, and the spread of the light emitted from the semiconductor laser is difficult. Consideration must be taken to reduce the

本発明は半導体レーザと光検出器を一体とする
ことにより上述のような欠点を除去せんとするも
のである。
The present invention aims to eliminate the above-mentioned drawbacks by integrating a semiconductor laser and a photodetector.

本発明では半導体レーザ装置において、誘導放
射がおこる領域に誘導放出の外部取出し方向と直
角な方向から可能なかぎり近接して誘導放射の出
力を検出できるような出力検出用P―NまたはP
―I―N接合を形成し、誘導放射をさせながらそ
の出力をこの出力検出用p―nまたはp―i―n
接合より電気信号としてモニターすること可能に
したことを特徴とするものである。
In the present invention, in a semiconductor laser device, an output detection P-N or a
-I-N junction is formed, and its output is used as p-n or p-i-n for output detection while causing stimulated radiation.
It is characterized by making it possible to monitor electrical signals from the junction.

半導体レーザは効率的に誘導放出をおこすた
め、屈折率分布を適当に選んだ光ガイドを構成し
たり、注入キヤリアが局部的にとじこめられるよ
うな構成をとつたりしている。つまり注入キヤリ
ア密度、自然放出のエネルギー密度を上げて誘導
放出を起しやすくしている。しかしこのような局
所的に放射エネルギー密度を上げてもかならず広
がりを生ずるため、誘導放出を起してもこの誘導
放出も広がりを生じている。このため、誘導放出
をおこしている領域を1/eに減衰しているとこ
ろを目安とすれば、レーザのビームの径が決めら
れるが、1/e以下の減衰部分はもつと広がつて
いる。この広がつている部分にレーザビームを有
効に吸収するp―n接合またはp―i―n接合を
形成すれば、この接合にはレーザビームの出力の
変化によつて電気信号の変化が生ずる。これを有
効に取出すことによつて、半導体レーザの光出力
をモニターできることになる。
In order to efficiently cause stimulated emission in a semiconductor laser, a light guide with an appropriately selected refractive index distribution is constructed, or a structure is adopted in which the injection carrier is locally confined. In other words, the injection carrier density and spontaneous emission energy density are increased to facilitate stimulated emission. However, even if the radiant energy density is increased locally, it will inevitably spread, so even if stimulated emission occurs, this stimulated emission will also spread. For this reason, the diameter of the laser beam can be determined by using the region where stimulated emission is attenuated to 1/e as a guide, but the attenuated portion below 1/e gradually expands. . If a pn junction or a pin junction that effectively absorbs the laser beam is formed in this widening portion, a change in the electrical signal will occur in this junction due to a change in the output of the laser beam. By effectively extracting this, the optical output of the semiconductor laser can be monitored.

ここで、レーザ発振の波長は、活性層の半導体
のエネルギーギヤツプおよび不純物などによりき
まるが、このレーザ光の光検出にはレーザ光のエ
ネルギーが出力検出用p―nまたはp―i―n接
合を構成する半導体のエネルギーギヤツプと等し
いかそれ以上であることが望ましい。そのため、
本発明では、この活性層を構成する半導体のエネ
ルギーギヤツプが、この半導体基板結晶を構成す
る半導体のエネルギーギヤツプに等しいか大きい
ことが必要となる。以下本発明の一実施例を詳細
に説明する。
Here, the wavelength of laser oscillation is determined by the energy gap and impurities of the semiconductor in the active layer, but for photodetection of this laser light, the energy of the laser light is It is desirable that the energy gap be equal to or greater than the energy gap of the semiconductor constituting the junction. Therefore,
In the present invention, it is necessary that the energy gap of the semiconductor constituting the active layer is equal to or larger than the energy gap of the semiconductor constituting the semiconductor substrate crystal. An embodiment of the present invention will be described in detail below.

<実施例 1> 第2図は本発明の一実施例の構成を示すもの
で、n型半導体結晶基板21(エネルギーギヤツ
プEg1,屈折率n1)上にp型半導体結晶基板22
(エネルギーギヤツプEg2,屈折率n2)を図のよう
にBの部分がストライプ状にかつ凹溝を形成する
ように欠除された状態で接合されたp―n接合を
有する半導体結晶基板11があり、その結晶基板
11の一部に前記凹溝を覆つて第1のグラツド層
となるn型半導体層23(エネルギーギヤツプE
g3,屈折率n3),活性層となるn型またはp型半
導体層24(エネルギーギヤツプEg4,屈折率
n4)、第2のクラツド層となるp型半導体層25
(エネルギーギヤツプEg5,屈折率n5)および絶縁
体薄膜26を第2図のように形成し、n型半導体
基板結晶21、p型半導体基板結晶22および第
2クラツド層25にそれぞれオーム性電極、すな
わち第3電極28、第2電極29、第1電極27
を形成した構成とする。ただし Eg1,Eg2≦Eg4<Eg3,Eg5,n4>n3,n5にな
るように各層を選ぶ。
<Embodiment 1> FIG. 2 shows the configuration of an embodiment of the present invention, in which a p-type semiconductor crystal substrate 22 is placed on an n-type semiconductor crystal substrate 21 (energy gap E g1 , refractive index n 1 ).
(Energy gap E g2 , refractive index n 2 ) As shown in the figure, a semiconductor crystal having a p-n junction is bonded with the part B cut out in a stripe shape and a groove. There is a substrate 11, and a part of the crystal substrate 11 has an n-type semiconductor layer 23 (energy gap E) that covers the groove and becomes a first gradient layer.
g3 , refractive index n 3 ), n-type or p-type semiconductor layer 24 serving as the active layer (energy gap E g4 , refractive index
n 4 ), p-type semiconductor layer 25 which becomes the second cladding layer
(energy gap E g5 , refractive index n 5 ) and an insulating thin film 26 are formed as shown in FIG. sexual electrodes, i.e. third electrode 28, second electrode 29, first electrode 27
The configuration is as follows. However, each layer is selected so that E g1 , E g2 ≦ E g4 < E g3 , E g5 , n 4 > n 3 , n 5 .

ここで第1電極27と第3電極28間に適当な
順電圧を印加すると誘導放射(以後レーザ発振と
いう)がおこり、図で10で示すようなレーザス
ポツトが観測される。
When an appropriate forward voltage is applied between the first electrode 27 and the third electrode 28, stimulated radiation (hereinafter referred to as laser oscillation) occurs, and a laser spot as shown by 10 in the figure is observed.

レーザ発振したレーザ光は半導体結晶の中で、
活性層のみに閉じ込められているのではなくレー
ザー光の一部は凹溝にしみ出している。この光を
半導体結晶基板11のp―n接合部で検出しよう
とするものである。この場合半導体結晶基板の接
合部12に逆バイアスがかかるように、第2電極
29と第3電極28間に電圧をかけることによ
り、レーザ光を検出することができる。もちろ
ん、0バイアスでも検出が可能である。ここでp
型半導体結晶基板22の役割は第1電極27によ
る電流集中をさらに凹溝Bにより出口を絞つて、
電流の広がりを少なくすることと、レーザ光を検
出するという二つの役割をはたしていることであ
る。この場合上記各半導体層21,22,23,
25の伝導型を全く逆にしたものも可能である。
The oscillated laser light is inside the semiconductor crystal,
Rather than being confined only in the active layer, a portion of the laser light seeps into the groove. This light is intended to be detected at the pn junction of the semiconductor crystal substrate 11. In this case, laser light can be detected by applying a voltage between the second electrode 29 and the third electrode 28 so that a reverse bias is applied to the junction 12 of the semiconductor crystal substrate. Of course, detection is possible even with 0 bias. Here p
The role of the type semiconductor crystal substrate 22 is to concentrate the current by the first electrode 27 and further narrow the outlet by the groove B.
It plays two roles: reducing the spread of current and detecting laser light. In this case, each of the semiconductor layers 21, 22, 23,
It is also possible to have the conductivity type of 25 completely reversed.

第3図は本発明の他の実施例を示し第2図の実
施例のp型半導体基板層22のかわりに不純物の
濃度の少いi型層31とp型層32をつみかさね
た半導体結晶基板30を用いたものである。この
場合光検出すべき接合が第2図の実施例ではp―
n接合であつたが本実施例ではp―i―n接合と
なり、応答速度向上、逆耐圧の増加、およびレー
ザの電流集中をより効率よくすることができる。
FIG. 3 shows another embodiment of the present invention, and shows a semiconductor crystal substrate in which an i-type layer 31 and a p-type layer 32 with a low impurity concentration are stacked in place of the p-type semiconductor substrate layer 22 in the embodiment of FIG. 30 was used. In this case, the junction to be photodetected is p-
The N junction was used, but in this embodiment it is a pin junction, which improves response speed, increases reverse breakdown voltage, and makes laser current concentration more efficient.

第4図は本発明の第3の実施例を示すもので、
第2図の実施例の構造を複数ケー列に配列した半
導体レーザアレイを構成したものである。
FIG. 4 shows a third embodiment of the present invention.
A semiconductor laser array is constructed by arranging a plurality of structures of the embodiment shown in FIG. 2 in rows of cells.

第2図の実施例のn型半導体基板21を共通基
板として二組の第2図の実施例に相当する装置
A,Bを構成する。同図の記号のA,Bはそれぞ
れAとBの装置に属することを示すのみで、各記
号の意味は第2図の実施例における符号と同様で
ある。ここで電極27Aと電極28間に電圧を印
加すればAの半導体レーザが発振し、その光出力
は電極29Aと28の間で電気信号として取出す
ことができる。他方電極27Bと28間に電圧を
印加すれば、Bの半導体レーザの光出力が電極2
9B28間から検出できることになる。
Two sets of devices A and B corresponding to the embodiment of FIG. 2 are constructed using the n-type semiconductor substrate 21 of the embodiment of FIG. 2 as a common substrate. The symbols A and B in the figure only indicate that they belong to the devices A and B, respectively, and the meanings of each symbol are the same as those in the embodiment of FIG. 2. If a voltage is applied between the electrodes 27A and 28, the semiconductor laser A oscillates, and its optical output can be extracted between the electrodes 29A and 28 as an electrical signal. If a voltage is applied between the other electrodes 27B and 28, the optical output of the semiconductor laser B will be
This means that it can be detected from between 9B28.

第5図はさらに別の実施例を示し、第2図の実
施例において光検出用電極の取出し方法を改良し
たものである。すなわち半導体レーザは通常活性
層に近い電極を取付のステムに取つけるため、第
2図の構成が都合の悪い場合もある。従つて光検
出用の電極をn型結晶基板21のオーミツク電極
と同じ面側に取出すことも必要であり、第5図a
では光検出に必要なp―n接合のp型半導体基板
結晶22に達するようなp型層51をn型半導体
基板21内に形成しこれにオーム性電極52を形
成すると、第2図の電極29に相当する電極とな
る。さらに同図bではn型半導体結基板結晶21
の一部を除去し、p型半導体基板結晶22を露出
させこれに54のオーム性電極を形成するとこれ
が第2図の電極29に相当する電極となる。原理
的には第2図の実施例と同じであり、光検出信号
を得る電極がそれぞれ電極28と52間、28と
54間になるだけである。このような構成にする
と電極27側をフエースダウンボンドしても電極
28,52または54はそれぞれワイヤボンデイ
ングによりワイヤで取出すことができる。
FIG. 5 shows yet another embodiment, in which the method of taking out the photodetecting electrode is improved from the embodiment of FIG. That is, in semiconductor lasers, the electrode close to the active layer is usually attached to the mounting stem, so the configuration shown in FIG. 2 may be inconvenient in some cases. Therefore, it is necessary to take out the photodetecting electrode on the same side of the n-type crystal substrate 21 as the ohmic electrode, as shown in FIG. 5a.
Now, if a p-type layer 51 is formed in the n-type semiconductor substrate 21 that reaches the p-type semiconductor substrate crystal 22 of the p-n junction necessary for photodetection, and an ohmic electrode 52 is formed thereon, the electrode shown in FIG. 2 is formed. The electrode corresponds to No. 29. Furthermore, in the figure b, an n-type semiconductor substrate crystal 21
When a part of the p-type semiconductor substrate crystal 22 is removed and an ohmic electrode 54 is formed thereon, this becomes an electrode corresponding to the electrode 29 in FIG. 2. The principle is the same as the embodiment shown in FIG. 2, except that the electrodes for obtaining the photodetection signal are located between the electrodes 28 and 52 and between the electrodes 28 and 54, respectively. With this configuration, even if the electrode 27 side is face-down bonded, each of the electrodes 28, 52, or 54 can be taken out with a wire by wire bonding.

以上のように本発明は、第1クラツド層,活性
層,第2クラツド層を少なくとも有する半導体レ
ーザ装置において、誘導放射が起る領域に近接し
て、誘導放射出力検出用のp―n接合、あるいは
p―i―n接合を形成したもので、誘導放射させ
ながらその出力を検知することができ、発振出力
変化を簡単に感度よく検知できる利点を有する。
As described above, the present invention provides a semiconductor laser device having at least a first cladding layer, an active layer, and a second cladding layer. Alternatively, a pin junction is formed, and the output can be detected while stimulating radiation, and it has the advantage that changes in oscillation output can be easily detected with high sensitivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来の半導体レーザの構成図、第2
図,第3図,第4図および第5図a,bは本発明
の一実施例における半導体レーザ装置の断面図で
ある。 10……誘導放射領域、21…n型半導体結晶
基板、22……p型半導体結晶基板、23……第
1クラツド層、24……活性層、25……第2ク
ラツド層、26……絶縁体薄膜、27……第1電
極、28……第3電極、29……第2電極。
Figure 1 is a configuration diagram of a conventional semiconductor laser;
3, 4, and 5a and 5b are cross-sectional views of a semiconductor laser device according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 10... Stimulated radiation region, 21... N-type semiconductor crystal substrate, 22... P-type semiconductor crystal substrate, 23... First cladding layer, 24... Active layer, 25... Second cladding layer, 26... Insulation Body thin film, 27...first electrode, 28...third electrode, 29...second electrode.

Claims (1)

【特許請求の範囲】 1 半導体基板結晶上に、第1クラツド層,活性
層,第2クラツド層を少なくとも有し誘導放射を
行う半導体レーザ装置において、前記半導体基板
結晶と第1クラツド層との間に半導体領域を有
し、この半導体領域は、誘導放射がおこる領域の
少なくとも直下は欠除しており、かつ半導体領域
の一部が誘導放射がおこる領域に延びるごとく設
けられており、この半導体領域と半導体基板結晶
とにより、誘導放射光を電気信号として検出する
ことを特徴とする半導体レーザ装置。 2 半導体領域と半導体基板結晶とでp―n接合
を形成したことを特徴とする特許請求の範囲第1
項記載の半導体レーザ装置。 3 半導体領域と半導体基板結晶とでp―i―n
接合を形成したことを特徴とする特許請求の範囲
第1項記載の半導体レーザ装置。 4 活性層を構成する半導体のエネルギーギヤツ
プが、上記p―n接合,p―i―n接合を構成す
る半導体のエネルギーギヤツプに等しいかそれよ
り大きいことを特徴とする特許請求の範囲第2項
または第3項記載の半導体レーザ装置。
[Scope of Claims] 1. In a semiconductor laser device that includes at least a first cladding layer, an active layer, and a second cladding layer on a semiconductor substrate crystal and performs stimulated emission, the semiconductor laser device includes at least a first cladding layer, an active layer, and a second cladding layer on a semiconductor substrate crystal. The semiconductor region has a semiconductor region which is omitted at least immediately below the region where stimulated radiation occurs, and is provided so that a part of the semiconductor region extends into the region where stimulated radiation occurs. 1. A semiconductor laser device that detects stimulated radiation light as an electrical signal by using a semiconductor substrate crystal and a semiconductor substrate crystal. 2 Claim 1 characterized in that a pn junction is formed between the semiconductor region and the semiconductor substrate crystal
The semiconductor laser device described in . 3 P-i-n between the semiconductor region and the semiconductor substrate crystal
The semiconductor laser device according to claim 1, characterized in that a junction is formed. 4 Claims characterized in that the energy gap of the semiconductor constituting the active layer is equal to or larger than the energy gap of the semiconductor constituting the p-n junction or pin junction. The semiconductor laser device according to item 2 or 3.
JP5451680A 1980-04-23 1980-04-23 Semiconductor laser device Granted JPS56150888A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5451680A JPS56150888A (en) 1980-04-23 1980-04-23 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5451680A JPS56150888A (en) 1980-04-23 1980-04-23 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPS56150888A JPS56150888A (en) 1981-11-21
JPS6211796B2 true JPS6211796B2 (en) 1987-03-14

Family

ID=12972806

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5451680A Granted JPS56150888A (en) 1980-04-23 1980-04-23 Semiconductor laser device

Country Status (1)

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JP (1) JPS56150888A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5789289A (en) * 1980-11-25 1982-06-03 Sharp Corp Semiconductor device
JPS594192A (en) * 1982-06-30 1984-01-10 Sharp Corp Semiconductor laser device
JPS60198885A (en) * 1984-03-23 1985-10-08 Toshiba Corp Integrated semiconductor laser
JPH0644659B2 (en) * 1985-07-17 1994-06-08 松下電器産業株式会社 Optical integrated circuit device
US5252513A (en) * 1990-03-28 1993-10-12 Xerox Corporation Method for forming a laser and light detector on a semiconductor substrate
DE102016002245B4 (en) 2016-02-26 2022-06-30 Gentherm Gmbh Device for controlling the temperature of at least one object and method for checking the functionality of a sensor device consisting of at least two sensors

Also Published As

Publication number Publication date
JPS56150888A (en) 1981-11-21

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