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JPS6211986B2 - - Google Patents
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JPS6211986B2 - - Google Patents

Info

Publication number
JPS6211986B2
JPS6211986B2 JP56020201A JP2020181A JPS6211986B2 JP S6211986 B2 JPS6211986 B2 JP S6211986B2 JP 56020201 A JP56020201 A JP 56020201A JP 2020181 A JP2020181 A JP 2020181A JP S6211986 B2 JPS6211986 B2 JP S6211986B2
Authority
JP
Japan
Prior art keywords
workpiece
signal
weight
hole
reference value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56020201A
Other languages
Japanese (ja)
Other versions
JPS57138575A (en
Inventor
Kazuhiro Ogawa
Tsuneo Kawai
Koichi Noto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56020201A priority Critical patent/JPS57138575A/en
Publication of JPS57138575A publication Critical patent/JPS57138575A/en
Publication of JPS6211986B2 publication Critical patent/JPS6211986B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【発明の詳細な説明】 本発明は、ラツプ加工を行なうための研磨装置
に係り、特に、透明な被加工物の寸法を高精度に
効率よく加工するようにした研磨装置に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a polishing apparatus for lapping, and more particularly to a polishing apparatus that can efficiently process the dimensions of a transparent workpiece with high precision.

ラツプ加工は、通常加工面の荒さや形状精度を
向上させる場合に用いられている。一方、ラツプ
加工においては、加工条件の変動によつて単位時
間当りの加工量が大きく変動する。したがつて、
被加工物の寸法(加工面に対して垂直な方向の寸
法)精度を高精度に加工する場合には、加工開始
から所要寸法になるまで、研磨と被加工物の寸法
測定を何回もくり返し行なつている。このため、
生産性が大巾に低下する欠点がある。
Lapping is usually used to improve the roughness and shape accuracy of a machined surface. On the other hand, in lap machining, the amount of machining per unit time varies greatly depending on changes in machining conditions. Therefore,
When processing the workpiece with high precision (dimensions in the direction perpendicular to the processing surface), polishing and measuring the dimensions of the workpiece must be repeated many times from the start of processing until the required dimensions are achieved. is being carried out. For this reason,
The disadvantage is that productivity is drastically reduced.

本発明の目的は、上記した従来技術の欠点をな
くし、透明な被加工物を加工する際、被加工物を
通して加工終了位置を検出し、生産性を向上させ
るようにした研磨装置を提供するにある。
SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned drawbacks of the prior art, and to provide a polishing device that detects the end position of the workpiece through the workpiece when processing a transparent workpiece, thereby improving productivity. be.

上記目的を達成するため、本発明においては、
ラツプ定盤の回転中心から偏心した軸心を中心と
して回転するワークホルダに保持された被加工物
に、ワークホルダを摺動自在に貫通し、かつ、被
加工物の加工面に対し垂直な貫通穴が形成され、
この貫通穴内に、貫通穴の下端面から所定の寸法
だけ下方に焦点が位置するように対物レンズを設
けた錘を載せて加工を行なうと共に、前記対物レ
ンズを通して被加工物の加工面を照射し、加工面
からの反射光を受光して電気信号に変換し、この
信号を、予じめ設定された基準値と比較すること
により、被加工物の厚さを検出し、前記信号と基
準値とが一致したとき、研磨装置を止めるように
したことを特徴とする。
In order to achieve the above object, in the present invention,
Penetrates a workpiece held in a workpiece that rotates around an axis eccentric from the center of rotation of the lap surface plate, allowing the workpiece to slide freely through the workpiece and perpendicularly to the machined surface of the workpiece. A hole is formed,
Machining is carried out by placing a weight provided with an objective lens in this through hole so that the focal point is located a predetermined distance below the lower end surface of the through hole, and irradiating the machined surface of the workpiece through the objective lens. , detects the thickness of the workpiece by receiving the reflected light from the processing surface and converting it into an electrical signal, and comparing this signal with a preset reference value, and compares the signal and the reference value. The polishing apparatus is characterized in that the polishing device is stopped when the two match.

以下本発明の一実施例を図面にしたがつて説明
する。
An embodiment of the present invention will be described below with reference to the drawings.

第1図ないし第3図は本発明の一実施例を示す
もので、同図において、1はベースにして、軸受
2を介して軸3を回転自在に支持し、プーリ4と
軸3の間は図示しない歯車装置で動力を伝達する
ようになつている。5はモータにして、減速機6
に結合され、減速機6のプーリ7およびベルト8
を介してプーリ4に動力を伝達し、軸3を回転さ
せるようになつている。9はラツプ定盤にして、
軸3の上端に固定され、かつ、上面にポリシング
クロス10を固定している。11は支持部材にし
て、コの字形の開口部の一端が前記軸受2に固定
され、他の一端がポリシングクロス10の上方に
突出している。12は支持軸にして、前記支持部
材11の一端からポリシングクロス10と対向す
るように突出し、その先端にベアリング13を介
してワークホルダ14を回転可能に結合してい
る。このワークホルダ14には貫通穴15が形成
され、この貫通穴15の中に、被加工物16およ
び錘17を摺動可能に収容するようになつてい
る。前記錘17は、第2図に示すように、本体1
8の中央に段付きの貫通穴19が穿設されてい
る。この貫通穴19内に突出する軸受20には、
一端にハンドル21を固定した送りねじ22が回
転自在に支持されている。23はレンズ24を保
持する筒にして、その外側面から突出するナツト
25が前記送りねじ22と螺合し、送りねじ22
の回転によつてレンズ24を昇降させるようにな
つている。26はハーフミラーにして、ラツプ定
盤9が回転したとき、前記レンズ24の中心が通
る軌跡の一点の上方に配置され、レーザ発振器2
7からのレーザ光の一部を反射して、レンズ24
を通し、加工面を照射すると共に、加工面からの
反射光の一部を透過させ、フオトセンサ28に受
光させるようになつている。29は制御手段にし
て、フオトセンサ28からの電気信号に基いて、
前記モータ5の電源を遮断し、モータ5を止めて
加工を終了させる。制御手段29は、第3図に示
すように、フオトセンサ28に接続され、フオト
センサ28から印加される信号を信号処理な可能
な大きさに増巾する増巾回路31と、この増巾回
路31に接続され、増巾回路31から印加された
信号のノイズを除去するバンドパスフイルタ32
と、このバンドパスフイルタ32に接続され、バ
ンドパスフイルタ32から印加される信号をデイ
ジタル信号に変換するA/D変換回路33と、こ
のA/D変換回路33に接続され、2個の接点
A,Bを有する切替スイツチ34と、切替スイツ
チ34の接点Aに接続され、A/D変換回路34
から印加されるデイジタル信号の最大値を基準値
として保持するようにした保持回路35と、この
保持回路35に接続され、保持回路35で保持し
た値を消去するラツチクリアスイツチ36と、前
記切替スイツチ34の接点Bと保持回路35に接
続され、保持回路35から印加される基準値と
A/D変換回路33から印加されたデイジタル信
号を比較し、その値が一致したとき一個の信号を
発振する比較回路37と、この比較回路37に接
続され、手動で接続し、かつ、比較回路37から
印加された信号で切られるようにしたスイツチ回
路38とによつて構成されている。なお、39は
モニタ回路にして、切替スイツチ34と保持回路
35の間に接続され、A/D変換回路33から印
加される電圧を表示するようになつている。
1 to 3 show an embodiment of the present invention. In the figures, reference numeral 1 denotes a base, which rotatably supports a shaft 3 via a bearing 2, and is connected between a pulley 4 and the shaft 3. The power is transmitted by a gear device (not shown). 5 is a motor, and reducer 6
The pulley 7 and belt 8 of the reducer 6
Power is transmitted to the pulley 4 via the pulley 4 to rotate the shaft 3. 9 is a wrap surface plate,
It is fixed to the upper end of the shaft 3, and a polishing cloth 10 is fixed to the upper surface. Reference numeral 11 designates a support member, one end of which has a U-shaped opening is fixed to the bearing 2, and the other end projects above the polishing cloth 10. A support shaft 12 projects from one end of the support member 11 to face the polishing cloth 10, and a work holder 14 is rotatably coupled to the tip of the support shaft via a bearing 13. A through hole 15 is formed in the work holder 14, and a workpiece 16 and a weight 17 are slidably accommodated in the through hole 15. The weight 17 is attached to the main body 1 as shown in FIG.
A stepped through hole 19 is bored in the center of the hole 8 . The bearing 20 protruding into the through hole 19 includes
A feed screw 22 with a handle 21 fixed to one end is rotatably supported. Numeral 23 is a cylinder that holds the lens 24, and a nut 25 protruding from the outer surface of the cylinder is screwed into the feed screw 22.
The lens 24 is raised and lowered by the rotation of the lens 24. Reference numeral 26 is a half mirror, which is placed above a point on the locus that the center of the lens 24 passes when the lap surface plate 9 rotates, and the laser oscillator 2
A part of the laser beam from 7 is reflected to the lens 24.
The machined surface is irradiated through the machined surface, and a part of the reflected light from the machined surface is transmitted and received by the photo sensor 28. 29 is a control means, based on the electric signal from the photo sensor 28,
The power to the motor 5 is cut off, the motor 5 is stopped, and the machining is completed. As shown in FIG. 3, the control means 29 includes an amplifying circuit 31 connected to the photo sensor 28 and amplifying the signal applied from the photo sensor 28 to a size that allows signal processing; A bandpass filter 32 is connected and removes noise from the signal applied from the amplification circuit 31.
, an A/D conversion circuit 33 connected to this bandpass filter 32 and converting the signal applied from the bandpass filter 32 into a digital signal, and an A/D conversion circuit 33 connected to this A/D conversion circuit 33 and connected to two contacts A. , B, and the A/D conversion circuit 34 is connected to the contact A of the changeover switch 34.
a holding circuit 35 configured to hold the maximum value of the digital signal applied from the holding circuit 35 as a reference value; a latch clear switch 36 connected to the holding circuit 35 for erasing the value held by the holding circuit 35; 34 is connected to the holding circuit 35, the reference value applied from the holding circuit 35 and the digital signal applied from the A/D conversion circuit 33 are compared, and when the values match, one signal is oscillated. It is composed of a comparison circuit 37 and a switch circuit 38 connected to the comparison circuit 37, manually connected, and turned off by a signal applied from the comparison circuit 37. A monitor circuit 39 is connected between the changeover switch 34 and the holding circuit 35 to display the voltage applied from the A/D conversion circuit 33.

上記の構成において、保持回路35に基準値を
設定するには、まず、ラツチクリアスイツチ36
を押して、保持回路35に設定されている古い基
準値を消去すると共に、切替スイツチ34を接点
A側に切替える。一方、ラツプ定盤9を回転させ
ながらポリシングクロス10上にラツプ剤を供給
し、ポリシングクロス10上にラツプ剤を分散さ
せたのち、ラツプ定盤9を止め、ワークホルダ1
4の貫通穴15に所定の寸法に加工されたマスタ
ゲージと錘17を挿入する。そして、レーザ発振
器27からレーザ光を発振し、ハーフミラ26お
よびレンズ24を通してマスタゲージとポリシン
グクロス10の接触面を照射し、その反射光を、
レンズ24およびハーフミラ26を介してフオト
センサ28で受光する。この状態で、ハンドル2
1を回し、レンズ24によつて集光されるレーザ
光の焦点をマスタゲージとポリツシングクロス1
0の接触面に合わせる。これは、モニタ回路39
の表示を見ながら、A/D変換回路33の出力が
最大のになるようにレンズ24の位置決めを行な
うことにより達成される。このようにして、基準
値の設定が終ると、切替スイツチ34を接点B側
に切替える。一方、錘17およびマスタゲージを
取出し、貫通穴15に被加工物16をセツトした
のち、錘17を載せる。この状態で、ポリシング
クロス10の上にラツプ剤を供給しつつ、モータ
5を作動させ、ラツプ定盤9を回転させる。する
と、被加工物16の研磨が行なわれる。このと
き、ワークホルダ14がポリシングクロス10に
対し偏心位置にあるため、ワークホルダ14も、
支持軸12を中心として回転する。したがつて、
ワークホルダ14が1回転する毎に、1回づつ、
被加工物16がハーフミラ26の下を通る。そし
て、被加工物16がハーフミラ26の下に位置し
たとき、レーザ光によつて照射され、その反射光
がフオトセンサ28で受光され、電気信号に変換
される。フオトセンサ28の出力は増巾回路3
1、バンドパスフイルタ32、A/D変換回路3
3および切替スイツチ34を通り比較回路37に
印加され、保持回路35に設定された基準値と比
較される。このとき、A/D変換回路33の出力
と基準値が一致すると、比較回路37から信号が
発振され、スイツチ回路38が作動して、モータ
5を止める。このようにして、被加工物10は所
定の寸法に加工される。
In the above configuration, in order to set the reference value in the holding circuit 35, the latch clear switch 36 is first set.
Press to erase the old reference value set in the holding circuit 35 and switch the changeover switch 34 to the contact A side. Meanwhile, the lapping agent is supplied onto the polishing cloth 10 while rotating the lapping surface plate 9, and after the lapping agent is dispersed on the polishing cloth 10, the lapping surface plate 9 is stopped and the work holder 1 is
A master gauge machined to predetermined dimensions and a weight 17 are inserted into the through hole 15 of No. 4. Then, a laser beam is oscillated from the laser oscillator 27, and the contact surface between the master gauge and the polishing cloth 10 is irradiated through the half mirror 26 and the lens 24, and the reflected light is
The light is received by a photo sensor 28 via a lens 24 and a half mirror 26. In this state, handle 2
1 to adjust the focus of the laser beam focused by the lens 24 to the master gauge and polishing cloth 1.
Align with the contact surface of 0. This is the monitor circuit 39
This is achieved by positioning the lens 24 so that the output of the A/D conversion circuit 33 is maximized while watching the display. After setting the reference value in this way, the changeover switch 34 is switched to the contact B side. On the other hand, after removing the weight 17 and the master gauge and setting the workpiece 16 in the through hole 15, the weight 17 is placed on it. In this state, while supplying the lapping agent onto the polishing cloth 10, the motor 5 is operated to rotate the lapping surface plate 9. Then, the workpiece 16 is polished. At this time, since the work holder 14 is in an eccentric position with respect to the polishing cloth 10, the work holder 14 also
It rotates around the support shaft 12. Therefore,
Once every time the work holder 14 rotates once,
The workpiece 16 passes under the half mirror 26. When the workpiece 16 is located under the half mirror 26, it is irradiated with laser light, and the reflected light is received by the photo sensor 28 and converted into an electrical signal. The output of the photo sensor 28 is sent to the amplification circuit 3.
1. Bandpass filter 32, A/D conversion circuit 3
3 and a changeover switch 34 to a comparison circuit 37, where it is compared with a reference value set in a holding circuit 35. At this time, when the output of the A/D conversion circuit 33 and the reference value match, a signal is oscillated from the comparison circuit 37, and the switch circuit 38 is activated to stop the motor 5. In this way, the workpiece 10 is processed to a predetermined size.

なお、基準値を設定する際に、マスターゲージ
を使用しない場合には、錘17の下端面から所定
の寸法(被加工物16の加工後の寸法)だけ下方
に焦点が位置するようにレンズ24の位置をセツ
トしておき、これを、被加工物10もしくは同材
質のダミー上に載せて、A/D変換回路33の出
力が最大値を過ぎるまで研磨し、前記最大値を基
準値として設定すればよい。
Note that when setting the reference value, if a master gauge is not used, the lens 24 is adjusted so that the focal point is located below the lower end surface of the weight 17 by a predetermined dimension (dimension of the workpiece 16 after processing). , place it on the workpiece 10 or a dummy made of the same material, polish it until the output of the A/D conversion circuit 33 exceeds the maximum value, and set the maximum value as the reference value. do it.

以上述べた如く、本発明によれば、研磨加工中
に透明な被加工物の加工位置を照射し、その反射
光を受光して被加工物の加工量を検出するように
したので、加工開始から加工終了まで機械を止め
ることなく連続して加工を行なうことができ、生
産性を大巾に向上させることができる。また、同
一条件で加工量の検出を行なうので、加工後の被
加工物の品質を向上させ、ばらつきの少ない製品
を得ることができるなどの効果がある。
As described above, according to the present invention, the processing position of the transparent workpiece is irradiated during the polishing process, and the amount of processing of the workpiece is detected by receiving the reflected light. Machining can be carried out continuously from start to finish without stopping the machine, greatly improving productivity. Furthermore, since the amount of processing is detected under the same conditions, it is possible to improve the quality of the processed workpiece after processing and obtain products with less variation.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による研磨装置の一例を示す構
成図、第2図は第1図における錘の拡大断面図、
第3図は第1図における制御手段のブロツク線図
である。 9:ラツプ定盤、12:支持軸、14:ワーク
ホルダ、15:貫通穴、16:被加工物、17:
錘、18:本体、19:貫通穴、24:レンズ、
26:ハーフミラ、27:レーザ発振器、28:
フオトセンサ、29:制御手段。
FIG. 1 is a configuration diagram showing an example of a polishing apparatus according to the present invention, FIG. 2 is an enlarged sectional view of a weight in FIG. 1,
FIG. 3 is a block diagram of the control means in FIG. 1. 9: Lap surface plate, 12: Support shaft, 14: Work holder, 15: Through hole, 16: Workpiece, 17:
Weight, 18: Main body, 19: Through hole, 24: Lens,
26: Half mirror, 27: Laser oscillator, 28:
Photo sensor, 29: control means.

Claims (1)

【特許請求の範囲】[Claims] 1 ラツプ定盤の回転中心から偏心した軸心を中
心として回転するワークホルダに保持された透明
な被加工物に、ワークホルダを摺動自在に貫通す
る錘を載せて研磨するようにした研磨装置におい
て、前記被加工物の加工面に対し垂直な貫通穴が
形成され、この貫通穴内に、下端から所定の寸法
だけ下方に焦点が位置するように対物レンズを備
えた錘と、前記対物レンズを通し被加工物の加工
面を照射する光源と、加工面からの反射光を受光
し電気信号に変換する受光素子を備えた光学手段
と、前記受光素子から出力される信号を、予め設
定された基準値と比較して、信号と基準値が一致
したとき研磨装置を止めるようにした制御手段と
を設けたことを特徴とする研磨装置。
1. A polishing device that polishes a transparent workpiece held by a workholder that rotates around an axis eccentric from the center of rotation of a lap surface plate, with a weight slidably passing through the workholder. A through hole is formed perpendicular to the processing surface of the workpiece, and a weight is provided with an objective lens such that the focal point is positioned downward by a predetermined dimension from the lower end, and a weight is provided in the through hole. An optical means comprising a light source that illuminates the processing surface of the workpiece, a light receiving element that receives reflected light from the processing surface and converts it into an electrical signal, and a signal output from the light receiving element that is set in advance. 1. A polishing device comprising a control means for comparing the signal with a reference value and stopping the polishing device when the signal and the reference value match.
JP56020201A 1981-02-16 1981-02-16 Grinding machine Granted JPS57138575A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56020201A JPS57138575A (en) 1981-02-16 1981-02-16 Grinding machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56020201A JPS57138575A (en) 1981-02-16 1981-02-16 Grinding machine

Publications (2)

Publication Number Publication Date
JPS57138575A JPS57138575A (en) 1982-08-26
JPS6211986B2 true JPS6211986B2 (en) 1987-03-16

Family

ID=12020545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56020201A Granted JPS57138575A (en) 1981-02-16 1981-02-16 Grinding machine

Country Status (1)

Country Link
JP (1) JPS57138575A (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6133857A (en) * 1984-07-27 1986-02-17 Matsushita Electric Ind Co Ltd Accurate polishing device
US5499733A (en) * 1992-09-17 1996-03-19 Luxtron Corporation Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
US6614529B1 (en) 1992-12-28 2003-09-02 Applied Materials, Inc. In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization
US7037403B1 (en) 1992-12-28 2006-05-02 Applied Materials Inc. In-situ real-time monitoring technique and apparatus for detection of thin films during chemical/mechanical polishing planarization
US5433651A (en) * 1993-12-22 1995-07-18 International Business Machines Corporation In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing
US6876454B1 (en) 1995-03-28 2005-04-05 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
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