JPS6222541B2 - - Google Patents
Info
- Publication number
- JPS6222541B2 JPS6222541B2 JP56208672A JP20867281A JPS6222541B2 JP S6222541 B2 JPS6222541 B2 JP S6222541B2 JP 56208672 A JP56208672 A JP 56208672A JP 20867281 A JP20867281 A JP 20867281A JP S6222541 B2 JPS6222541 B2 JP S6222541B2
- Authority
- JP
- Japan
- Prior art keywords
- sides
- silicon diaphragm
- beam leads
- lead
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/50—Devices controlled by mechanical forces, e.g. pressure
Landscapes
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Description
【発明の詳細な説明】
この発明は、シリコンダイヤフラムを用い流体
の圧力を検出する、半導体圧力検出装置の改良に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a semiconductor pressure detection device that detects fluid pressure using a silicon diaphragm.
従来のこの種の半導体圧力検出装置は、第1図
に正面断面図で示すようになつていた。1はシリ
コンダイヤフラムで、薄肉部の表面層にはゲージ
抵抗層(図示は略す)が形成されてある。2はこ
のシリコンダイヤフラム1を気密固着したシリコ
ン当板で、ダイヤフラム1のくぼみ部に密閉室3
を形成し、内部を真空又は基準圧のガス体を充て
んし封鎖している。4はシリコン又はガラス材な
どからなり、シリコン当板2をできるだけ機械的
ひずみを与えないように接着固定した台座で、回
路基板5に接着固定されている。6は回路基板5
上に施された配線導体の端子電極部、7はシリコ
ンダイヤフラム1上の引出電極部(図示は略す)
と対応する端子電極部6とをワイヤボンドした金
属細線である。 A conventional semiconductor pressure detection device of this type is shown in a front sectional view in FIG. 1 is a silicon diaphragm, and a gauge resistance layer (not shown) is formed on the surface layer of the thin portion. 2 is a silicone backing plate to which this silicone diaphragm 1 is airtightly fixed, and a sealed chamber 3 is formed in the recess of the diaphragm 1.
The inside is filled with a vacuum or standard pressure gas and sealed. Reference numeral 4 denotes a pedestal made of silicon or glass material, on which the silicone backing plate 2 is adhesively fixed so as not to cause mechanical strain as much as possible, and is adhesively fixed to the circuit board 5. 6 is the circuit board 5
Terminal electrode part of the wiring conductor applied on the top, 7 is an extraction electrode part on the silicon diaphragm 1 (not shown)
This is a thin metal wire in which the terminal electrode portion 6 and the corresponding terminal electrode portion 6 are wire-bonded.
上記従来の装置では、シリコンダイヤフラム1
に機械的ひずみをできるだけ与えないように、台
座4はシリコン又はガラス材を用いているが、台
座4の取付け、ワイヤボンドなど面倒な組立作業
を要していた。また、圧力検出するガスの種類に
よつては、金属細線7が腐食断線することがあ
り、信頼性上問題があつた。 In the above conventional device, the silicon diaphragm 1
The pedestal 4 is made of silicon or glass in order to minimize mechanical strain on the pedestal 4, but this requires troublesome assembly work such as attaching the pedestal 4 and wire bonding. Furthermore, depending on the type of gas whose pressure is to be detected, the thin metal wire 7 may corrode and break, posing a problem in terms of reliability.
この発明は、シリコンダイヤフラムの表面層に
形成されたゲージ抵抗層からの両側の引出電極部
にそれぞれビームリードを形成し両側方向に引出
し、上記シリコンダイヤフラム部を表面側を下向
きにし、回路基板上の両側の対応する端子電極部
に両側のビームリードを接着接続するとともに、
シリコンダイヤフラム部を支持し、従来の台座及
び金属細線のワイヤボンドを不要とし、組立作業
を容易にし、信頼度が高く安価な半導体圧力検出
装置を提供することを目的としている。 In this invention, beam leads are formed on both extraction electrode parts from a gauge resistance layer formed on the surface layer of a silicon diaphragm, and the beam leads are drawn out in both directions, and the silicon diaphragm part is placed on a circuit board with the surface side facing downward. Adhesively connect the beam leads on both sides to the corresponding terminal electrodes on both sides, and
The object of the present invention is to provide a highly reliable and inexpensive semiconductor pressure detection device that supports a silicon diaphragm portion, eliminates the need for a conventional pedestal and thin metal wire wire bond, and facilitates assembly work.
第2図はこの発明の一実施例による半導体圧力
検出装置の正面断面図であり、1〜3,5,6は
上記従来装置と同一のものである。10はシリコ
ンダイヤフラム1の表面層に形成されたゲージ抵
抗層(図示は略す)からの両側の引出電極部(図
示は略す)にそれぞれ形成され側方に引出された
両側複数本宛のビームリードである。 FIG. 2 is a front sectional view of a semiconductor pressure detection device according to an embodiment of the present invention, and numerals 1 to 3, 5, and 6 are the same as those of the conventional device. Reference numeral 10 denotes beam leads for a plurality of beams on both sides, which are formed on lead electrode portions (not shown) on both sides from a gauge resistance layer (not shown) formed on the surface layer of the silicon diaphragm 1 and drawn out laterally. be.
上記一実施例の装置では、裏面にシリコン当板
2が接着されたシリコンダイヤフラム1部を、ビ
ームリード10側を下向きにし回路基板5上に位
置し、両側のビームリード10を対応する両側の
配線の端子電極部6にそれぞれ熱圧着又はろう付
けなどで接着接続するとともに、両側複数本宛の
ビームリード10によりシリコンダイヤフラム1
部を支持している。 In the device of the above-mentioned embodiment, a silicon diaphragm 1 part with a silicon backing plate 2 bonded to the back side is placed on a circuit board 5 with the beam leads 10 facing downward, and the beam leads 10 on both sides are connected to the corresponding wirings on both sides. The silicon diaphragm 1 is connected to the terminal electrode part 6 of the silicon diaphragm 1 by thermocompression bonding or brazing, etc., and is connected to the silicon diaphragm 1 by a plurality of beam leads 10 on both sides.
supports the department.
以上のように、この発明によれば、シリコンダ
イヤフラムの表面の両側の引出電極部に複数本宛
のビームリードを形成して両側方に引出し、この
シリコンダイヤフラム部を表面を下向きにし、両
側のビームリードを回路基板上の対応する両側の
端子電極部にそれぞれ接着接続し、かつ、シリコ
ンダイヤフラム部を上記両側複数本宛のビームリ
ードにより支持したので、従来の台座及び金属細
線のワイヤボンドを要せず、信頼度を高くし、安
価にすることができる。 As described above, according to the present invention, beam leads for a plurality of beams are formed on the extraction electrode portions on both sides of the surface of the silicon diaphragm and are drawn out to both sides, and the surface of the silicon diaphragm portion is turned downward, and the beam leads on both sides are The leads were adhesively connected to the corresponding terminal electrodes on both sides of the circuit board, and the silicon diaphragm was supported by the multiple beam leads on both sides, eliminating the need for conventional pedestals and wire bonds using thin metal wires. Therefore, reliability can be increased and costs can be reduced.
第1図は従来の半導体圧力検出装置の要部の正
面断面図、第2図はこの発明の一実施例による半
導体圧力検出装置の要部の正面断面図である。
1…シリコンダイヤフラム、2…シリコン当
板、3…密閉室、5…回路基板、6…配線端子電
極部、10…ビームリード。なお、図中同一符号
は同一又は相当部分を示す。
FIG. 1 is a front sectional view of a main part of a conventional semiconductor pressure detection device, and FIG. 2 is a front sectional view of a main part of a semiconductor pressure detection device according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Silicon diaphragm, 2... Silicon backing plate, 3... Sealed chamber, 5... Circuit board, 6... Wiring terminal electrode part, 10... Beam lead. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
部に真空又は基準圧にされた密閉室が形成され、
表面層にゲージ抵抗層が設けられて両側に引出電
極部が施されたシリコンダイヤフラムと、これら
両側の引出電極部にそれぞれ形成され、先端部が
両側方向に引出された両側複数本宛のビームリー
ドと、上面に間隔をあけて両側に配線導体の端子
電極部が施された回路基板とを備え、上記シリコ
ンダイヤフラム部を表面を下向きにして上記両側
のビームリードの先端部を上記対応する両側の端
子電極部にそれぞれ接着接続し、かつ、シリコン
ダイヤフラム部を上記両側複数本宛のビームリー
ドにより支持したことを特徴とする半導体圧力検
出装置。1 A silicone patch plate is airtightly adhered to the back side to form a sealed chamber with a vacuum or standard pressure inside.
A silicon diaphragm with a gauge resistance layer on its surface layer and lead-out electrodes on both sides, and a beam lead for multiple beams on both sides formed on the lead-out electrodes on both sides, with tips drawn out in both directions. and a circuit board having terminal electrode portions of wiring conductors on both sides at intervals on the upper surface, and with the silicon diaphragm portion facing downward, the tips of the beam leads on both sides are connected to the ends of the beam leads on the corresponding both sides. A semiconductor pressure detection device characterized in that the silicon diaphragm portion is adhesively connected to the terminal electrode portions and supported by the plurality of beam leads on both sides.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56208672A JPS58107683A (en) | 1981-12-21 | 1981-12-21 | Semiconductor pressure detecting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56208672A JPS58107683A (en) | 1981-12-21 | 1981-12-21 | Semiconductor pressure detecting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58107683A JPS58107683A (en) | 1983-06-27 |
| JPS6222541B2 true JPS6222541B2 (en) | 1987-05-19 |
Family
ID=16560141
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56208672A Granted JPS58107683A (en) | 1981-12-21 | 1981-12-21 | Semiconductor pressure detecting device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58107683A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63183567U (en) * | 1987-05-18 | 1988-11-25 |
-
1981
- 1981-12-21 JP JP56208672A patent/JPS58107683A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63183567U (en) * | 1987-05-18 | 1988-11-25 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58107683A (en) | 1983-06-27 |
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