JPS6222933B2 - - Google Patents
Info
- Publication number
- JPS6222933B2 JPS6222933B2 JP55115564A JP11556480A JPS6222933B2 JP S6222933 B2 JPS6222933 B2 JP S6222933B2 JP 55115564 A JP55115564 A JP 55115564A JP 11556480 A JP11556480 A JP 11556480A JP S6222933 B2 JPS6222933 B2 JP S6222933B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- gas
- optical fiber
- heater
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma- or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】
本発明は光フアイバの母材の製造方法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an optical fiber base material.
反応管内に四塩化硅素(SiCl4)等のガラス形成
用原料ガスと酸素(O2)ガスとを導入し、該反応
管を外側から加熱して前記ガラス形成用原料ガス
を酸化して微粉状ガラス形成用酸化物となし該酸
化物を反応管内壁に堆積させ、さらに溶融させて
ガラス化して光フアイバの母材を製造する方法は
内付けCVD法と呼ばれて周知である。 A raw material gas for glass formation such as silicon tetrachloride (SiCl 4 ) and oxygen (O 2 ) gas are introduced into a reaction tube, and the reaction tube is heated from the outside to oxidize the raw material gas for glass formation to form a fine powder. The method of manufacturing an optical fiber base material by depositing the oxide on the inner wall of a reaction tube and melting it to vitrify it is known as the internal CVD method.
従来このような内付けCVD法で光フアイバの
母材を製造する場合、反応管に沿つて移動するバ
ーナを用いて反応管の外壁を加熱して前記原料ガ
スを酸化したのちガラス化して反応管の内壁に付
着させていた。 Conventionally, when manufacturing optical fiber base materials using such an internal CVD method, a burner that moves along the reaction tube is used to heat the outer wall of the reaction tube to oxidize the raw material gas, which is then vitrified and removed from the reaction tube. It was attached to the inner wall of the
しかしこのように反応管の外壁をバーナで加熱
する方法では、反応管の内部への熱伝達が悪く反
応管内部の温度を所要の温度にするためには反応
管の外壁の加熱箇所の温度をそれ以上に高温にし
なければならず、そのため反応管に収縮、変形等
を生じるなどの問題点があつた。 However, with this method of heating the outer wall of the reaction tube with a burner, heat transfer to the inside of the reaction tube is poor, and in order to bring the temperature inside the reaction tube to the required temperature, it is necessary to adjust the temperature at the heating point on the outer wall of the reaction tube. The temperature had to be higher than that, which caused problems such as shrinkage and deformation of the reaction tube.
特に大体積の光フアイバ用母材を得るために反
応管を太くしたり、あるいは肉厚の反応管を用い
た場合、前記した問題点が生じやすい。 In particular, when a reaction tube is made thick or a thick reaction tube is used in order to obtain a large-volume optical fiber preform, the above-mentioned problems are likely to occur.
本発明は前述した問題点を除去するもので、内
付けCVD法で光フアイバ用母材を製造する場合
反応管の加熱温度を低下させ、反応管の収縮、変
形等を防止する新規な光フアイバ母材の製造法の
提供を目的とするものである。 The present invention eliminates the above-mentioned problems and provides a novel optical fiber that lowers the heating temperature of the reaction tube and prevents shrinkage, deformation, etc. of the reaction tube when producing an optical fiber base material by the internal CVD method. The purpose is to provide a method for manufacturing base materials.
かかる目的を達成するため本発明に係る光フア
イバ母材の製造法は、反応管内に外径が該反応管
の内径よりも若干小さい短管状ヒータを該反応管
と同軸的に設置し、かつ該ヒータを管軸方向に移
動させることができるようにし、上記反応管内に
ガラス原料ガスと酸化性ガスとを導入し、導入さ
れたガスを上記ヒータにより加熱して気相化学反
応を生起させ、以つてガラスを生成させて該ガラ
スを上記反応管内壁に堆積させることを特徴とす
るものである。 In order to achieve this object, the method for producing an optical fiber preform according to the present invention includes installing a short tubular heater coaxially with the reaction tube and having an outer diameter slightly smaller than the inner diameter of the reaction tube. The heater is movable in the tube axis direction, frit gas and oxidizing gas are introduced into the reaction tube, the introduced gas is heated by the heater to cause a gas phase chemical reaction, and the following steps are carried out. The method is characterized in that glass is produced and the glass is deposited on the inner wall of the reaction tube.
以下図面を用いて本発明の一実施例につき詳細
に説明する。 An embodiment of the present invention will be described in detail below with reference to the drawings.
第1図は本発明の光フアイバ母材の製造方法の
一実施例を説明するための概略図で、第2図は本
発明の方法に用いるヒータの概略図である。 FIG. 1 is a schematic diagram for explaining an embodiment of the method for manufacturing an optical fiber base material of the present invention, and FIG. 2 is a schematic diagram of a heater used in the method of the present invention.
第1図に示すように石英の反応管1内には加熱
用のリング状のカーボン治具2が設置されており
その周囲を、前記カーボン治具中の不純物が外部
へ飛散するのを阻止するためリング状の石英治具
3で被覆している。そしてこのカーボン治具2を
被覆する石英治具3に反応管の管軸方向に沿つて
伸びる2本の石英ホルダー4および5が取りつけ
られている。またこの反応管の外壁を巻くように
して前記カーボン治具を加熱するための高周波誘
導コイル6が設けられており、該コイルは銅管を
巻いたもので、内部に水を通して水冷するように
なつている。ここで前記石英ホルダー4,5は管
軸に沿つて平行に往復運動するような移送治具
(図示せず)に取りつけられており、一方前記高
周波誘導コイルも反応管に沿つて平行に往復運動
するような移送治具に取りつけられており、前記
高周波誘導コイルおよびカーボン治具は一定の速
度で運動して移動するようになつている。ここで
第2図に示すように前記リング状のカーボン治具
2の外周面は、断面が凹レンズ状を呈するような
凹面となつており、放射される輻射熱が反応管1
の内壁面に効率的に集中するようにしている。 As shown in FIG. 1, a ring-shaped carbon jig 2 for heating is installed inside a quartz reaction tube 1, and the surrounding area is used to prevent impurities in the carbon jig from scattering to the outside. It is covered with a ring-shaped quartz jig 3. Two quartz holders 4 and 5 are attached to the quartz jig 3 that covers the carbon jig 2 and extend along the axial direction of the reaction tube. A high-frequency induction coil 6 is also provided to heat the carbon jig by wrapping around the outer wall of the reaction tube. ing. Here, the quartz holders 4 and 5 are attached to a transfer jig (not shown) that reciprocates in parallel along the tube axis, while the high-frequency induction coil also reciprocates in parallel along the reaction tube. The high-frequency induction coil and the carbon jig are attached to a transfer jig that moves at a constant speed. As shown in FIG. 2, the outer peripheral surface of the ring-shaped carbon jig 2 is a concave surface with a concave lens-like cross section, and the radiant heat is transferred to the reaction tube 1.
It is designed to efficiently concentrate on the inner wall surface.
このようにした加熱用のカーボン治具を有する
反応管内部へ、ガラス形成用原料ガスとしての
SiCl4ガスをキヤリアガスとしてO2ガスを用いて
導入する。そして高周波誘導コイルに高周波電圧
を印加して該コイルおよび反応管内に設けた加熱
用のカーボン治具を反応管の管軸方向に沿つて運
動させながら往復運動させることで該反応管内に
二酸化硅素(SiO2)のようなガラス形成酸化物を
形成し、ついで溶融してガラス層として反応管の
内壁に堆積させる。 The raw material gas for glass formation was introduced into the reaction tube equipped with the carbon jig for heating.
SiCl 4 gas is introduced using O 2 gas as a carrier gas. Then, by applying a high-frequency voltage to the high-frequency induction coil and reciprocating the coil and a heating carbon jig provided in the reaction tube while moving it along the tube axis direction of the reaction tube, silicon dioxide ( A glass-forming oxide, such as SiO 2 ), is formed and then melted and deposited as a glass layer on the inner wall of the reaction tube.
このようにすれば、ガラス形成用原料ガスを酸
化させるための加熱源が反応管内部にあるため、
反応管および原料ガスに効率良く熱が伝導され
る。したがつて従来の反応管を外から加熱する方
法に比べて反応管の加熱温度が低温ですみ、その
ため反応管に収縮等を生じるようなことが少なく
なり均一な外径寸法を有する大体積の光フアイバ
用母材が高歩留りで得られる利点を生じる。 In this way, since the heating source for oxidizing the raw material gas for glass formation is inside the reaction tube,
Heat is efficiently conducted to the reaction tube and source gas. Therefore, compared to the conventional method of heating the reaction tube from the outside, the heating temperature of the reaction tube is lower, and shrinkage of the reaction tube is less likely to occur. The advantage is that the base material for optical fiber can be obtained in high yield.
第1図は本発明の光フアイバ母材の製造方法を
説明するための概略図で、第2図は本発明の方法
に用いるヒータの概略図である。
図において1は反応管、2はカーボン治具、3
は石英治具、4および5は石英ホルダー、6は高
周波誘導コイルを示す。
FIG. 1 is a schematic diagram for explaining the method of manufacturing an optical fiber preform of the present invention, and FIG. 2 is a schematic diagram of a heater used in the method of the present invention. In the figure, 1 is a reaction tube, 2 is a carbon jig, and 3
4 and 5 are quartz holders, and 6 is a high-frequency induction coil.
Claims (1)
小さい短管状ヒータを該反応管と同軸的に設置
し、かつ該ヒータを管軸方向に移動させることが
できるようにし、上記反応管内にガラス原料ガス
と酸化性ガスとを導入し、導入されたガスを上記
ヒータにより加熱して気相化学反応を生起させ、
以つてガラスを生成させて該ガラスを上記反応管
内壁に堆積させることを特徴とする光フアイバ母
材の製造方法。1. A short tubular heater whose outer diameter is slightly smaller than the inner diameter of the reaction tube is installed coaxially with the reaction tube, and the heater is movable in the axial direction of the tube. Introducing frit gas and oxidizing gas, heating the introduced gas with the heater to cause a gas phase chemical reaction,
A method for producing an optical fiber preform, comprising the steps of: producing glass and depositing the glass on the inner wall of the reaction tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11556480A JPS5742550A (en) | 1980-08-21 | 1980-08-21 | Preparation of base material for optical fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11556480A JPS5742550A (en) | 1980-08-21 | 1980-08-21 | Preparation of base material for optical fiber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5742550A JPS5742550A (en) | 1982-03-10 |
| JPS6222933B2 true JPS6222933B2 (en) | 1987-05-20 |
Family
ID=14665663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11556480A Granted JPS5742550A (en) | 1980-08-21 | 1980-08-21 | Preparation of base material for optical fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5742550A (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53144921A (en) * | 1977-05-23 | 1978-12-16 | Toshiba Ceramics Co | Formation of glass layer on inner surface of quartz glass tube |
| JPS5424648A (en) * | 1977-07-26 | 1979-02-24 | Fujitsu Ltd | Production of optical transmission wires |
-
1980
- 1980-08-21 JP JP11556480A patent/JPS5742550A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5742550A (en) | 1982-03-10 |
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