JPS622685B2 - - Google Patents
Info
- Publication number
- JPS622685B2 JPS622685B2 JP20273181A JP20273181A JPS622685B2 JP S622685 B2 JPS622685 B2 JP S622685B2 JP 20273181 A JP20273181 A JP 20273181A JP 20273181 A JP20273181 A JP 20273181A JP S622685 B2 JPS622685 B2 JP S622685B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- temperature
- thermistor
- sensitive resistor
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 37
- 239000010409 thin film Substances 0.000 claims description 19
- 239000011521 glass Substances 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 11
- 239000000919 ceramic Substances 0.000 claims description 8
- 238000005219 brazing Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052810 boron oxide Inorganic materials 0.000 claims 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 description 9
- 239000011888 foil Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 6
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 5
- 239000012530 fluid Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000010304 firing Methods 0.000 description 3
- 229910001006 Constantan Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910007472 ZnO—B2O3—SiO2 Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical group CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229910020617 PbO—B2O3—SiO2 Inorganic materials 0.000 description 1
- LIXXICXIKUPJBX-UHFFFAOYSA-N [Pt].[Rh].[Pt] Chemical compound [Pt].[Rh].[Pt] LIXXICXIKUPJBX-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910001179 chromel Inorganic materials 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 239000006023 eutectic alloy Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- UPIXZLGONUBZLK-UHFFFAOYSA-N platinum Chemical compound [Pt].[Pt] UPIXZLGONUBZLK-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Thermistors And Varistors (AREA)
Description
【発明の詳細な説明】
本発明は、温度を検出すべき対象物と機械的に
接触して温度を検出するサーミスタ、たとえば鍋
物調理をする際鍋底を通して鍋内部の調理物の温
度を検出するサーミスタに関するものである。Detailed Description of the Invention The present invention relates to a thermistor that detects temperature by mechanically contacting an object whose temperature is to be detected, such as a thermistor that detects the temperature of food inside a pot through the bottom of the pot when cooking food in a pot. It is related to.
従来、この種温度検出は第1図に示す如く鍋底
1に熱電対2を機械的に接触せしめ、前記熱電対
2の熱起電力を検出することによつてなされてい
た。この時熱電対2を鍋底1に機械的に強固に接
触せしめる為に熱電対2は支持容器3に固定され
ていた。しかし熱起電力は通常小さな値しか得ら
れないという欠点があつた。たとえがアルメル―
クロメル熱電対は耐熱性(空気中500〜100℃)に
優れまた安価であるが、〜40μV/℃の起電力し
か発生しない。銅―コンスタンタン熱電対、白金
―白金・ロジウム熱電対もその熱起電力は(30〜
60)μV/℃しか得られないのみならず、耐熱性
が小さい(銅―コンスタンタン熱電対)、高価で
ある(白金―白金ロジウム熱電対)などの欠点が
あつた。その他種々の熱電対が存在するが、いず
れも上記の如き欠点を有していた。上記の如く小
さな熱起電力を電気的に検出して、熱源の発熱量
を制御する場合電気的に大きな増巾をしなければ
ならないので価格が高くなる。複雑な電気回路が
必要になるなどの欠点も派生した。 Conventionally, this type of temperature detection has been carried out by mechanically bringing a thermocouple 2 into contact with the pot bottom 1 and detecting the thermoelectromotive force of the thermocouple 2, as shown in FIG. At this time, the thermocouple 2 was fixed to the support container 3 in order to bring the thermocouple 2 into strong mechanical contact with the pot bottom 1. However, the drawback is that thermoelectromotive force usually only has a small value. The parable is Armel.
Chromel thermocouples have excellent heat resistance (500 to 100°C in air) and are inexpensive, but they only generate an electromotive force of ~40 μV/°C. The thermoelectromotive forces of copper-constantan thermocouples and platinum-platinum/rhodium thermocouples are (30~
60) In addition to being able to obtain only μV/°C, it also had drawbacks such as low heat resistance (copper-constantan thermocouple) and high price (platinum-platinum-rhodium thermocouple). Various other thermocouples exist, but all of them have the drawbacks mentioned above. When controlling the amount of heat generated by a heat source by electrically detecting a small thermoelectromotive force as described above, a large electrical amplification is required, which increases the price. There were also disadvantages such as the need for complex electrical circuits.
他方上記熱電対に代つてサーミスタを用いて温
度検出をする場合、抵抗値の温度に対する変化率
は(1〜7%/℃)の大きな値を得られる。従つ
て複雑な電気回路を必要とせず、また低価格にな
るなどの長所を有する。この場合サーミスタ素子
はできるだけ小さくして、熱容量を小さくしたも
のが選ばれる。これは小型化により熱応答性を速
くできるからである。この様な小型のサーミスタ
素子には、Fe,Ni,Co,Mnなどの複合酸化物焼
結体を感温抵抗体に用いたビード型サーミスタ素
子、あるいは上記複合酸化物、Ge,Si,SiCなど
の薄膜を感温抵抗体に用いた薄膜サーミスタ素子
がある。しかしビート型サーミスタ素子は、通
常、球形もしくは回転楕円体に類似した形状を有
するので、支持容器3にこのサーミスタ素子を固
定しても熱抵抗が大きくなるという欠点があつ
た。すなわち、サーミスタ素子自身の熱容量は小
さくても、その複雑な形状のために支持容器3と
の接続部での熱抵抗を小さくすることが困難であ
り、この結果熱応答性が遅くなるという欠点があ
つた。 On the other hand, when temperature is detected using a thermistor instead of the thermocouple, the rate of change in resistance value with respect to temperature can be as large as (1 to 7%/°C). Therefore, it has advantages such as not requiring a complicated electric circuit and being inexpensive. In this case, the thermistor element is selected to be as small as possible and to have a low heat capacity. This is because miniaturization allows for faster thermal response. Such small thermistor elements include bead-type thermistor elements that use composite oxide sintered bodies such as Fe, Ni, Co, and Mn as the temperature-sensitive resistor, or composite oxides such as those mentioned above, Ge, Si, SiC, etc. There is a thin film thermistor element that uses a thin film of However, since the beat-type thermistor element usually has a shape similar to a sphere or a spheroid, it has the disadvantage that even if the thermistor element is fixed to the support container 3, the thermal resistance becomes large. That is, even though the heat capacity of the thermistor element itself is small, it is difficult to reduce the thermal resistance at the connection part with the support container 3 due to its complicated shape, and as a result, the thermal response becomes slow. It was hot.
他方、薄膜サーミスタチツプは第2図に示す如
く支持容器3とロウ付接続できるので、高速応答
性が得られるという利点があつた。薄膜サーミス
タチツプは通常、、アルミナなどの平板状セラミ
ツク絶縁基板4の一方の表面に電極膜5および感
温抵抗体膜6を形成して構成され、さらに電極膜
5にリード線7が接続される。薄膜サーミスタチ
ツプと支持容器3とのロウ付接続はチタニウム
Ti箔もしくはジルコニウムZr箔8を介してロウ
材層9によりなされる。しかしこの場合電極膜5
と感温抵抗体膜6とは外部雰囲気に対して露出し
ているので、水滴などの導電性の汚れに対して特
性変化を生じるという欠点があつた。 On the other hand, since the thin film thermistor chip can be connected to the support container 3 by brazing as shown in FIG. 2, it has the advantage of providing high-speed response. A thin film thermistor chip is usually constructed by forming an electrode film 5 and a temperature sensitive resistor film 6 on one surface of a flat ceramic insulating substrate 4 made of alumina or the like, and further, a lead wire 7 is connected to the electrode film 5. . The soldered connection between the thin film thermistor chip and the support container 3 is made of titanium.
This is done by using a brazing material layer 9 via a Ti foil or a zirconium Zr foil 8. However, in this case, the electrode film 5
Since the temperature-sensitive resistor film 6 is exposed to the external atmosphere, there is a drawback that characteristics change due to conductive dirt such as water droplets.
本発明は電極膜5と感温抵抗体膜6とを含む絶
縁基板の全表面を保護することを目的とする。 The present invention aims to protect the entire surface of the insulating substrate including the electrode film 5 and the temperature sensitive resistor film 6.
本発明の要旨は平板状セラミツク絶縁基板の一
方の表面に電極膜と感温抵抗膜とを形成して成る
薄膜サーミスタチツプと支持容器とをチタニウム
Ti箔もしくはジルコニウムZr箔を介してロウ付
接続し、前記薄膜サーミスタチツプの電極膜と感
温抵抗体膜が形成された前記平板状セラミツク絶
縁基板の全表面を、熱膨張係数が(40〜60)×
10-7/℃の硝子で被覆したことにある。 The gist of the present invention is to fabricate a thin film thermistor chip comprising an electrode film and a temperature sensitive resistance film formed on one surface of a flat ceramic insulating substrate and a support container made of titanium.
The entire surface of the flat ceramic insulating substrate, on which the electrode film of the thin-film thermistor chip and the temperature-sensitive resistor film are formed, is connected by brazing via Ti foil or zirconium Zr foil, and has a coefficient of thermal expansion of (40 to 60). ) ×
This is because it is coated with glass at a temperature of 10 -7 /℃.
このように本発明の高速応答性薄膜サーミスタ
では、電極膜と感温抵抗体膜が形成された平板状
セラミツク絶縁基板の全表面を電気的に絶縁性の
硝子で被覆しているので、水滴などの導電性の汚
れから薄膜サーミスタチツプを保護できる。この
とき硝子の熱膨張係数は(40〜60)×10-7/℃の
範囲にあることが望ましい。これはこの範囲内に
熱膨張係数を選ぶことにより硝子被覆膜はクラツ
ク,ピンホールのないち密な膜を形成できるが、
この範囲外の場合、クラツク,ピンホールが生じ
易いからである。 In this way, in the fast-response thin-film thermistor of the present invention, the entire surface of the flat ceramic insulating substrate on which the electrode film and temperature-sensitive resistor film are formed is coated with electrically insulating glass, so water droplets etc. can protect thin film thermistor chips from conductive dirt. At this time, it is desirable that the coefficient of thermal expansion of the glass is in the range of (40 to 60) x 10 -7 /°C. This is because by selecting the coefficient of thermal expansion within this range, the glass coating film can form a dense film without cracks or pinholes.
This is because cracks and pinholes are likely to occur outside this range.
以下本発明の一実施例について第3図により説
明する。第3図について前述と同番号は同部材を
示す。 An embodiment of the present invention will be described below with reference to FIG. With respect to FIG. 3, the same numbers refer to the same parts as described above.
アルミナ基板4(1.8mmW×6.5mmL×0.5mmt)
の一方の表面にAu―Pt厚膜電極5(10〜15μ
mt)とSiC感温抵抗体膜6(2〜3μmt)とを
形成し薄膜サーミスタチツプを構成した。このサ
ーミスタチツプと支持容器3(材質SUS―430,
0.4mmt)とをTi箔(50μmt)8を介してロウ材
層9(Ag―Cu共晶合金)でロウ付接続した。次
に、AU―Pt電極膜5にリード線7(Pt線,0.1
φ)を溶接接続した。更に、ZnO―B2O3―SiO2
を主成分とする硝子粉末(粒度350メツシユ以
下)とエチルセルロース,ジエチレン・グリコー
ル・モノ・ノルマル・ブチル・エーテル・アセテ
ートとの混合流動体を別途作成し、この流動体を
前記サーミスタチツプの全表面にわたり塗布し
た。こののち昇温速度約15℃/分、最高焼成温度
660℃、最高焼成温度での保持時間約5分、降温
速度約15℃/分で前記硝子粉末を焼成した。この
ようにして形成した硝子被覆膜10は0.2〜0.5mm
の厚さで、電極膜5と感温抵抗体膜6の形成され
た絶縁基板4の全表面にわたり、クラツク,ピン
ホールが生じなかつた。 Alumina substrate 4 (1.8mmW x 6.5mmL x 0.5mmt)
Au-Pt thick film electrode 5 (10~15μ
mt) and a SiC temperature sensitive resistor film 6 (2 to 3 μmt) were formed to constitute a thin film thermistor chip. This thermistor chip and support container 3 (material SUS-430,
0.4 mm thick) were connected by brazing with a brazing material layer 9 (Ag--Cu eutectic alloy) via a Ti foil (50 μm thick) 8. Next, the lead wire 7 (Pt wire, 0.1
φ) were welded and connected. Furthermore, ZnO―B 2 O 3 ―SiO 2
Separately prepare a mixed fluid of glass powder (particle size 350 mesh or less) whose main component is ethyl cellulose, diethylene glycol mono-normal butyl ether acetate, and apply this fluid over the entire surface of the thermistor chip. Coated. After this, the heating rate is approximately 15℃/min, and the maximum firing temperature is
The glass powder was fired at 660°C, with a holding time of about 5 minutes at the maximum firing temperature, and a cooling rate of about 15°C/min. The glass coating film 10 formed in this way has a thickness of 0.2 to 0.5 mm.
With a thickness of , no cracks or pinholes were generated over the entire surface of the insulating substrate 4 on which the electrode film 5 and the temperature-sensitive resistor film 6 were formed.
このサーミスタは空気中350℃,1000時間経過
後、また室温、15分←→空気中350℃,15分のヒー
トサイクルを3000サイクル印加後、沸とう水中に
8時間放置後、抵抗値変化率は±3%以下であ
り、これ等試験後にもクラツクは発生しなかつ
た。また、高湿度雰囲気中など結露し易い状況下
でも、抵抗値は変化しなかつた。 This thermistor was tested after 1000 hours at 350℃ in air, after 3000 heat cycles of 15 minutes at room temperature and 15 minutes at 350℃ in air, and after being left in boiling water for 8 hours. It was ±3% or less, and no cracks occurred after these tests. Furthermore, the resistance value did not change even under conditions where dew condensation is likely to occur, such as in a high humidity atmosphere.
なお、本実施例では硝子材料としてZnO―
B2O3―SiO2を主成分とするものを用いたが、こ
れは感温抵抗体膜6がSiC膜の場合、SiC膜の空
気中での短時間耐熱性が600〜750℃であり、他方
前記ZnO―B2O3―SiO2系硝子材料の焼成温度が
650〜740℃であるので、両者の熱的特性が一致す
る点で優れているからである。従つて感温抵抗体
膜6の耐熱性によつて、他の硝子材料、たとえば
PbO―B2O3―SiO2系、Al2O3―SiO2系であつても
良いことは当然である。 In addition, in this example, ZnO-- was used as the glass material.
B 2 O 3 ---SiO 2 was used as the main component, but this is because when the temperature-sensitive resistor film 6 is a SiC film, the short-term heat resistance of the SiC film in air is 600 to 750°C. , on the other hand, the firing temperature of the ZnO-B 2 O 3 -SiO 2 -based glass material is
This is because the temperature is 650 to 740°C, which is excellent in that the thermal properties of the two are the same. Therefore, depending on the heat resistance of the temperature sensitive resistor film 6, other glass materials such as
It goes without saying that the PbO--B 2 O 3 ---SiO 2 system or the Al 2 O 3 ---SiO 2 system may be used.
以上の説明から明らかなように本発明の薄膜サ
ーミスタによれば次の効果が得られる。 As is clear from the above description, the thin film thermistor of the present invention provides the following effects.
1 電極膜と感温抵抗体膜が形成された平板状セ
ラミツク絶縁基板の全表面にわたり硝子被覆膜
が形成されるので、水滴などの導電性の汚れか
ら薄膜サーミスタチツプを保護できる。1. Since a glass coating film is formed over the entire surface of the flat ceramic insulating substrate on which the electrode film and temperature-sensitive resistor film are formed, the thin film thermistor chip can be protected from conductive dirt such as water droplets.
2 硝子材料の塗布は前述のように硝子材料と有
機バインダーとの混合流動体を用いてなされる
が、このときその塗布量は混合流動体の粘度を
一定に制御することにより、ほぼ一定量に維持
できるので、硝子被覆膜はほぼ均一に形成され
る。この結果、本薄膜サーミスタの熱容量もほ
ぼ均一になるので、熱応答性の均一化が図れ
る。2. As mentioned above, the glass material is applied using a fluid mixture of the glass material and an organic binder, but at this time, the amount of application is kept almost constant by controlling the viscosity of the fluid mixture. Since it can be maintained, the glass coating film can be formed almost uniformly. As a result, the heat capacity of the present thin film thermistor becomes almost uniform, so that the thermal response can be made uniform.
3 硝子被覆膜は電極膜とリード線との接続部に
も形成されるので、リード線の機械的強度を向
上することができる。3. Since the glass coating film is also formed at the connection portion between the electrode film and the lead wire, the mechanical strength of the lead wire can be improved.
第1図は熱電対を用いた場合の温度検出構成を
示す断面図、第2図は従来の高速応答性薄膜サー
ミスタの構成を示す断面図、第3図は本発明の高
速応答性薄膜サーミスタの構成を示す断面図であ
る。
3……支持容器、4……平板状セラミツク絶縁
基板、5……電極膜、6……感温抵抗体膜、7…
…リード線、8……Ti箔もしくはZr箔、9……
ロウ材層、10……硝子被覆膜。
Fig. 1 is a cross-sectional view showing a temperature detection configuration using a thermocouple, Fig. 2 is a cross-sectional view showing the structure of a conventional fast-response thin-film thermistor, and Fig. 3 is a cross-sectional view of the fast-response thin-film thermistor of the present invention. FIG. 3 is a cross-sectional view showing the configuration. 3... Support container, 4... Flat ceramic insulating substrate, 5... Electrode film, 6... Temperature sensitive resistor film, 7...
...Lead wire, 8...Ti foil or Zr foil, 9...
Brazing material layer, 10...Glass coating film.
Claims (1)
極膜と感温抵抗体膜とを形成して成る薄膜サーミ
スタチツプと支持容器とをチタニウム箔もしくは
ジルコニウム箔を介してロウ付接続し、前記薄膜
サーミスタチツプの電極膜と感温抵抗体膜が形成
された前記平板状セラミツク絶縁基板の全表面
を、熱膨張係数が(40〜60)×10-7/℃の硝子で
被覆した薄膜サーミスタ。 2 硝子被覆が酸化アエン、酸化硼素、酸化ケイ
素を主成分とする特許請求の範囲第1項記載の薄
膜サーミスタ。[Claims] 1. A thin film thermistor chip formed by forming an electrode film and a temperature-sensitive resistor film on one surface of a flat ceramic insulating substrate and a support container are connected by brazing via titanium foil or zirconium foil. Then, the entire surface of the flat ceramic insulating substrate on which the electrode film of the thin-film thermistor chip and the temperature-sensitive resistor film were formed was covered with glass having a coefficient of thermal expansion of (40 to 60) x 10 -7 /°C. Thin film thermistor. 2. The thin film thermistor according to claim 1, wherein the glass coating contains aene oxide, boron oxide, and silicon oxide as main components.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56202731A JPS58103102A (en) | 1981-12-15 | 1981-12-15 | Thin film thermistor |
| US06/363,498 US4424507A (en) | 1981-04-10 | 1982-03-30 | Thin film thermistor |
| EP82301808A EP0063445B1 (en) | 1981-04-10 | 1982-04-06 | A thin film thermistor |
| DE8282301808T DE3268363D1 (en) | 1981-04-10 | 1982-04-06 | A thin film thermistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56202731A JPS58103102A (en) | 1981-12-15 | 1981-12-15 | Thin film thermistor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58103102A JPS58103102A (en) | 1983-06-20 |
| JPS622685B2 true JPS622685B2 (en) | 1987-01-21 |
Family
ID=16462222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56202731A Granted JPS58103102A (en) | 1981-04-10 | 1981-12-15 | Thin film thermistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58103102A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62287601A (en) * | 1986-06-06 | 1987-12-14 | 松下電器産業株式会社 | Thin film thermistor |
-
1981
- 1981-12-15 JP JP56202731A patent/JPS58103102A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58103102A (en) | 1983-06-20 |
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