JPS622696B2 - - Google Patents
Info
- Publication number
- JPS622696B2 JPS622696B2 JP16350080A JP16350080A JPS622696B2 JP S622696 B2 JPS622696 B2 JP S622696B2 JP 16350080 A JP16350080 A JP 16350080A JP 16350080 A JP16350080 A JP 16350080A JP S622696 B2 JPS622696 B2 JP S622696B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- porcelain
- insulating
- insulating agent
- binder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 25
- 229910052573 porcelain Inorganic materials 0.000 claims description 18
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- 239000011230 binding agent Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 239000000919 ceramic Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 229920001169 thermoplastic Polymers 0.000 claims description 4
- 239000004416 thermosoftening plastic Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 5
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000003985 ceramic capacitor Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Ceramic Capacitors (AREA)
Description
本発明は半導体磁器の粒界絶縁化方法に関す
る。
従来、粒界絶縁型半導体磁器コンデンサや半導
体磁器バリスタなどを製造する場合、Bi2O3,
Pb3O4,CuOなどの金属酸化物を絶縁化剤として
用いこれをワニスなどのバインダと混練してペー
ストとし、これを半導体磁器の表面にスクリーン
印刷した後、加熱して絶縁化剤を半導体磁器の表
面層および粒界層に拡散させる方法が採用されて
いる。しかしながら、この方法では半導体磁器へ
のペーストの塗布量が時間的に変化してバラツキ
が多く、製品の電気的特性が不均一となり、その
標準偏差も大きいという問題があつた。
本発明は、かかる問題を解決すべくなされたも
のであつて、電気的特性のバラツキが少なく、そ
の標準偏差の小さい製品を得ることができる半導
体磁器の粒界絶縁方法を提供することを目的と
し、その要旨は、半導体磁器の表面に熱可塑性バ
インダをコーテイングし、該半導体磁器を絶縁化
剤粉末と共に混合しつつ加熱して半導体磁器表面
に前記絶縁化剤粉末を付着させた後、熱処理して
半導体磁器の表面および粒界層に前記絶縁化剤を
拡散させることを特徴とする半導体磁器の粒界絶
縁化方法、にある。
熱可塑性バインダとしてはアクリル樹旨、スチ
レン系樹脂、ビニル系樹脂、など種々の熱可塑性
樹脂を用いることができる。
また、絶縁化剤としては、Bi2O3,Pb3O4,
CuO,MnO2など従来公知の金属酸化物を単独ま
たは混合して使用すればよく、その量は磁器に対
し0.5〜4.0重量%の範囲で添加される。また絶縁
化剤を付着させるにはバインダが軟化する程度の
温度で加熱すればよいが、通常、80〜110℃の範
囲の温度で加熱する。
半導体磁器の表面に熱可塑性バインダをコーテ
イングする方法としては、前記熱可塑性樹脂をそ
のまま、あるいは溶剤に溶かした溶液を半導体磁
器表面に噴霧するスプレー法、あるいは溶液中に
浸漬するデイツピング法などを採用することがで
きる、このバインダの量は半導体磁器の個々の大
きさにより異なるが、通常、3〜15μ厚の層が形
成されるように設定される。これはバインダ層の
厚さが、3μ未満では絶縁化剤を半導体磁器表面
に充分量付着させることができず、また15μを超
えると磁器同志が付着し粒界絶縁化の歩留りが低
下するからである。
熱処理は、中性あるいは酸化性霧囲気で行なわ
れるが、その温度は従来同様1000〜1200℃の範囲
が好ましい。
実施例
アクリル樹脂固形分30%、溶剤70%からなるバ
インダ溶液を用意する。次に、常法により製造し
たチタン酸バリウム系半導体磁器からなる直径10
mm、肉厚0.4mmの円板試料を一枚のステンレス製
マスクに100個挿入し、の上下両面より前記バイ
ンダをスプレー法によりコートし、60℃で3分間
乾燥させ、7〜10μ厚のバインダ層を形成する。
このようにしてコーテイングした試料300個を円
筒状銭属容器に入れ、これに絶縁化剤として
Bi2O345重量%、Pb3O445重量%、CuO10重量%
からなる混合粉末を1.5g投入し、85℃に保持し
た乾燥器中で容器を毎分5回の速度で1分間回転
させる。
これと同じ操作を3回行なつて3ロツトの試料
を作成し、それぞれ空気中、1100℃で1時間熱処
理し、次いで常法により銀電極を焼付け、粒界絶
縁型半導体磁器コンデンサを製作し、各ロツト毎
に静電容量(Cs)および標準偏差を求めた。
その結果を第1表に示す。
The present invention relates to a method for insulating grain boundaries in semiconductor ceramics. Conventionally, when manufacturing grain boundary insulated semiconductor ceramic capacitors, semiconductor ceramic varistors, etc., Bi 2 O 3 ,
Metal oxides such as Pb 3 O 4 and CuO are used as insulating agents, and this is kneaded with a binder such as varnish to form a paste. After screen printing this on the surface of semiconductor porcelain, it is heated to transfer the insulating agent to the semiconductor. A method of diffusing into the surface layer and grain boundary layer of porcelain is adopted. However, this method has the problem that the amount of paste applied to the semiconductor ceramic changes over time and is highly variable, resulting in non-uniform electrical characteristics of the product and a large standard deviation. The present invention was made in order to solve this problem, and an object of the present invention is to provide a method for insulating grain boundaries of semiconductor ceramics, which makes it possible to obtain products with little variation in electrical characteristics and a small standard deviation thereof. , the gist is that the surface of semiconductor porcelain is coated with a thermoplastic binder, the semiconductor porcelain is mixed with an insulating agent powder and heated to adhere the insulating agent powder to the surface of the semiconductor porcelain, and then heat treated. A method for insulating grain boundaries in semiconductor ceramics, which comprises diffusing the insulating agent into the surface and grain boundary layers of semiconductor ceramics. As the thermoplastic binder, various thermoplastic resins such as acrylic resin, styrene resin, vinyl resin, etc. can be used. In addition, as an insulating agent, Bi 2 O 3 , P b3 O 4 ,
Conventionally known metal oxides such as CuO and MnO 2 may be used alone or in combination, and the amount added is in the range of 0.5 to 4.0% by weight based on the porcelain. Further, in order to attach the insulating agent, heating may be performed at a temperature that softens the binder, but heating is usually performed at a temperature in the range of 80 to 110°C. As a method for coating the surface of the semiconductor porcelain with a thermoplastic binder, a spray method in which the thermoplastic resin is sprayed as it is or a solution dissolved in a solvent onto the surface of the semiconductor porcelain, or a dipping method in which the thermoplastic resin is immersed in the solution is adopted. The amount of this binder can vary depending on the individual size of the semiconductor porcelain, but is usually set so that a layer 3 to 15 microns thick is formed. This is because if the thickness of the binder layer is less than 3μ, a sufficient amount of insulating agent cannot be attached to the surface of the semiconductor porcelain, and if it exceeds 15μ, the porcelain will adhere to itself, reducing the yield of grain boundary insulation. be. The heat treatment is carried out in a neutral or oxidizing mist atmosphere, and the temperature is preferably in the range of 1000 to 1200°C, as in the conventional case. Example A binder solution consisting of 30% acrylic resin solids and 70% solvent is prepared. Next, a diameter 10 mm made of barium titanate-based semiconductor porcelain manufactured by a conventional method was prepared.
Insert 100 disc samples with a thickness of 0.4 mm and a thickness of 0.4 mm into one stainless steel mask, coat the upper and lower surfaces with the binder by spraying, dry at 60°C for 3 minutes, and apply a binder with a thickness of 7 to 10 μm. form a layer.
300 samples coated in this way were placed in a cylindrical container, and an insulating agent was added to the container.
Bi 2 O 3 45% by weight, Pb 3 O 4 45% by weight, CuO 10% by weight
1.5 g of mixed powder consisting of the following were added, and the container was rotated for 1 minute at a speed of 5 times per minute in a dryer maintained at 85°C. The same operation was repeated three times to create three lots of samples, each of which was heat treated in air at 1100°C for 1 hour, and then silver electrodes were baked in the usual manner to produce grain boundary insulated semiconductor porcelain capacitors. The capacitance (Cs) and standard deviation were determined for each lot. The results are shown in Table 1.
【表】
比較例
Bi2O3 22.5重量部、Pb3O422.5重量部、CuO5重
量部、ワニス50重量部からなるペーストを調製
し、これを実施例の試料と同寸法、同材質の磁器
円板の表面に常法によりスクリーン印刷し、300
個を時系列で3ロツトに分け、各ロツトの試料を
空気中1100℃で1時間熱処理した後、銀電極を焼
付けて粒界絶縁型半導体磁器コンデンサを製作
し、その容量のxおよびσを求めた。その結果を
第2表に示す。[Table] Comparative Example A paste consisting of 22.5 parts by weight of Bi 2 O 3 , 22.5 parts by weight of Pb 3 O 4 , 5 parts by weight of CuO, and 50 parts by weight of varnish was prepared, and this was applied to a porcelain plate of the same size and material as the example sample. Screen print on the surface of the disk using a conventional method, and
The samples were divided into 3 lots in chronological order, and the samples from each lot were heat-treated in air at 1100°C for 1 hour, and the silver electrodes were baked to produce grain-boundary insulated semiconductor ceramic capacitors, and the capacitances x and σ were determined. Ta. The results are shown in Table 2.
【表】
第1表および第2表の結果から明らかなよう
に、本発明方法によれば、従来法に比べ静電容量
のバラツキが少なく、また標準偏差も小さくする
ことができ、従つて製品の品質を向上させること
ができる。また、このことから、本発明方法によ
れば半導体磁器表面への絶縁化剤の付着量もほぼ
均一であることがわかる。[Table] As is clear from the results in Tables 1 and 2, according to the method of the present invention, there is less variation in capacitance and the standard deviation can be reduced compared to the conventional method. can improve the quality of This also shows that according to the method of the present invention, the amount of insulating agent deposited on the surface of the semiconductor ceramic is almost uniform.
Claims (1)
テイングし、該半導体磁器を絶縁化剤粉末と共に
混合しつつ加熱して半導体磁器表面に前記絶縁化
剤粉末を付着させた後、熱処理して半導体磁器の
表面および粒界層に前記絶縁化剤を拡散させるこ
とを特徴とする半導体磁器の粒界絶縁化方法。1 Coating the surface of semiconductor porcelain with a thermoplastic binder, heating the semiconductor porcelain while mixing it with insulating agent powder to adhere the insulating agent powder to the surface of the semiconductor porcelain, and then heat-treating the surface of the semiconductor porcelain. and a method for insulating grain boundaries in semiconductor ceramics, which comprises diffusing the insulating agent into grain boundary layers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16350080A JPS5787111A (en) | 1980-11-19 | 1980-11-19 | Method of insulating grain boundary of semiconductor porcelain |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16350080A JPS5787111A (en) | 1980-11-19 | 1980-11-19 | Method of insulating grain boundary of semiconductor porcelain |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5787111A JPS5787111A (en) | 1982-05-31 |
| JPS622696B2 true JPS622696B2 (en) | 1987-01-21 |
Family
ID=15775037
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16350080A Granted JPS5787111A (en) | 1980-11-19 | 1980-11-19 | Method of insulating grain boundary of semiconductor porcelain |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5787111A (en) |
-
1980
- 1980-11-19 JP JP16350080A patent/JPS5787111A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5787111A (en) | 1982-05-31 |
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