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JPS6237899B2 - - Google Patents
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JPS6237899B2 - - Google Patents

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Publication number
JPS6237899B2
JPS6237899B2 JP55112170A JP11217080A JPS6237899B2 JP S6237899 B2 JPS6237899 B2 JP S6237899B2 JP 55112170 A JP55112170 A JP 55112170A JP 11217080 A JP11217080 A JP 11217080A JP S6237899 B2 JPS6237899 B2 JP S6237899B2
Authority
JP
Japan
Prior art keywords
semiconductor laser
electrode
oscillation
small electrode
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55112170A
Other languages
Japanese (ja)
Other versions
JPS5736887A (en
Inventor
Yoshinobu Mihashi
Junichi Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP11217080A priority Critical patent/JPS5736887A/en
Publication of JPS5736887A publication Critical patent/JPS5736887A/en
Publication of JPS6237899B2 publication Critical patent/JPS6237899B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1053Comprising an active region having a varying composition or cross-section in a specific direction
    • H01S5/106Comprising an active region having a varying composition or cross-section in a specific direction varying thickness along the optical axis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0425Electrodes, e.g. characterised by the structure
    • H01S5/04254Electrodes, e.g. characterised by the structure characterised by the shape

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Optical Head (AREA)
  • Semiconductor Lasers (AREA)

Description

【発明の詳細な説明】 本発明は、半導体レーザ、殊に高出力、長寿
命、高信頼性を保ちながらもマルチモード発振を
可能とした半導体レーザに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor laser, and particularly to a semiconductor laser that can perform multimode oscillation while maintaining high output, long life, and high reliability.

半導体レーザの発振光を光学系を用いて、情報
媒体に集束照射し、照射光の一部を情報媒体で反
射させて同一の光学系を通してもとの半導体レー
ザに帰還すると、半導体レーザの光出力や端子電
圧が変化する。この変化は半導体レーザの自己結
合効果と呼ばれ、光デイスクなどの情報媒体の信
号読取用ピツクアツプとして応用できることが知
られている。
When the oscillation light of a semiconductor laser is focused and irradiated onto an information medium using an optical system, and a part of the irradiated light is reflected by the information medium and returned to the original semiconductor laser through the same optical system, the optical output of the semiconductor laser is increased. or the terminal voltage changes. This change is called the self-coupling effect of semiconductor lasers, and it is known that it can be applied to pickups for reading signals from information media such as optical disks.

一方、近年の半導体レーザの特性改良は目ざま
しく、高出力化、長寿命化はほぼ目標を達成し
た。発振スペクトルの制御も様々な構造や工夫で
可能となり、横モードの発生が無い、単一縦モー
ド発振が普通になつた。これに伴い、半導体レー
ザ光の可干渉性は著しく向上し、Hl―Nlレーザ
以上のものも得られている。
On the other hand, the characteristics of semiconductor lasers have been significantly improved in recent years, and the goals of higher output and longer life have almost been achieved. Control of the oscillation spectrum has become possible through various structures and devices, and single longitudinal mode oscillation without the generation of transverse modes has become commonplace. Along with this, the coherence of semiconductor laser light has been significantly improved, and even better than H l -N l lasers have been obtained.

しかしながら、半導体レーザの可干渉性の向上
は、半導体レーザの応用を進める上で、思わぬ問
題を提起した。すなわち、半導体レーザの自己結
合効果を用いた光メモリ、たとえば光デイスク用
ピツクアツプでは、半導体レーザと情報媒体との
距離は数cmであることが望ましく、事実、そのよ
うなものが開発されているが、この距離は、半導
体レーザの可干渉距離内となり、情報媒体から反
射して、もとの半導体レーザに戻る光は、もとの
発振光と干渉することになる。このため、光デイ
スクの微小な振動に対応して、光出力が変化した
りあるいは、注入電流に対する光出力特性が非線
形となる事態が生じ光デイスクの信号読取のSN
比が低下したり、場合によつては、光デイスク読
取時の焦点制御のためのウオブリングによる信号
検出が不可能になる。また、光フアイバを用いた
光通信システムにおいても、半導体レーザ光を光
フアイバに結合する時に、発振光の一部が光フア
イバ端面で反射し、もとの半導体レーザに戻るた
め、いわば好むと好まざるとにかかわらず、半導
体レーザの自己結合効果が起きて、光出力の変動
を起す問題がある。
However, the improvement in coherence of semiconductor lasers has raised unexpected problems in advancing the application of semiconductor lasers. That is, in an optical memory that uses the self-coupling effect of a semiconductor laser, such as a pick-up for an optical disk, it is desirable that the distance between the semiconductor laser and the information medium be several centimeters, and in fact, such a device has been developed. This distance is within the coherence distance of the semiconductor laser, and the light reflected from the information medium and returned to the original semiconductor laser will interfere with the original oscillation light. For this reason, the optical output may change in response to minute vibrations of the optical disk, or the optical output characteristics may become non-linear with respect to the injected current.
The ratio may decrease, and in some cases, signal detection by wobbling for focus control when reading an optical disk becomes impossible. Also, in optical communication systems using optical fibers, when a semiconductor laser beam is coupled to an optical fiber, a part of the oscillated light is reflected at the end face of the optical fiber and returns to the original semiconductor laser. Regardless of whether it happens or not, there is a problem in that the self-coupling effect of the semiconductor laser occurs, causing fluctuations in the optical output.

半導体レーザの単一縦モード発振は、このよう
に、各種の問題を引起したため、光通信システム
では、1GHz以下、100MHz程度の帯域で、光源
としては縦モードマルチの半導体レーザを用いる
ことが望ましいという現状である。また、光デイ
スクなどの光メモリ用ピツクアツプとして半導体
レーザの自己結合効果を用いる場合にもマルチモ
ード発振の半導体レーザが望ましいものとなつて
いる。しかし、これも、高出力、長寿命等の諸特
性が満足されての話であつて、在来のマルチモー
ド・レーザをそのまま採用することはできない。
As the single longitudinal mode oscillation of semiconductor lasers has caused various problems, it is desirable to use multi-longitudinal mode semiconductor lasers as light sources in optical communication systems in the band below 1 GHz and around 100 MHz. This is the current situation. Further, multi-mode oscillation semiconductor lasers have also become desirable when using the self-coupling effect of semiconductor lasers as pickups for optical memories such as optical disks. However, this is also a matter of satisfying various characteristics such as high output and long life, and conventional multimode lasers cannot be used as is.

というのも、半導体レーザの特性改良の歴史を
省みると判かるように、従来のマルチモード・レ
ーザは、意図してマルチモード化していたのでは
なく、半導体結晶育成時に生ずる結晶欠陥や導波
路構造の不均一性等に基いてそうならざるを得な
かつたのであり、マルチモード発振レーザと言え
ば小出力、短寿命等の悪い特性のレーザと言うの
と同じだつたからである。
This is because, as we can see from the history of improving the characteristics of semiconductor lasers, conventional multimode lasers were not designed to be multimode intentionally, but due to crystal defects and waveguide structures that occurred during semiconductor crystal growth. This was unavoidable due to the non-uniformity of the laser, and a multimode oscillation laser was the same as a laser with poor characteristics such as low output and short life.

本発明は以上に鑑み、高出力、最寿命という特
性改良の進んだ単一縦モード半導体レーザと同等
以上の性能を保ち、信頼性の高いマルチモード発
振レーザを提供せんとするものである。
In view of the above, it is an object of the present invention to provide a highly reliable multi-mode oscillation laser that maintains performance equal to or better than that of single longitudinal mode semiconductor lasers with improved characteristics such as high output and long life.

本発明はまた、特性の勝れた昨今の単一縦モー
ド発振半導体レーザの構成部分としての電流注入
電極に積極的な改変を施すことにより、諸特性を
良好に保ちながら、マルチモード発振化に成功し
たものと言うこともできる。
The present invention also actively modifies the current injection electrode as a component of recent single longitudinal mode oscillation semiconductor lasers with excellent characteristics, thereby achieving multi-mode oscillation while maintaining good characteristics. It can be said that it was a success.

以下、本発明の実施例に就き説明するが、以上
のような本発明改変を施す対象となる電流注入形
半導体レーザとして、第1図に従来の単一縦モー
ド半導体レーザの一例を示している。
Embodiments of the present invention will be described below, and FIG. 1 shows an example of a conventional single longitudinal mode semiconductor laser as a current injection type semiconductor laser to which the above modifications of the present invention are applied. .

このレーザは、GaAlAsレーザを想定してい
て、その構造は、n形GaAs基板1にn形
GaAlAs2、GaAs活性層3、p形GaAlAs4、p
形GaAs5を次次と成長させ、さらに絶縁物6を
介して正電極8を、また基板1の下側には負電極
7を取りつけて成つている。活性層3の典形的な
厚さは0.2μm程度であり、ダブルヘテロ構造に
より、電流注入によるキヤリヤと、光とのとじこ
めをはかり、しきい値電流を小さくする工夫が重
要であり、このため、絶縁膜6に開けた開口を介
してp形GaAs層5にオーミツク接触し、活性層
3へ電流を注入する実質的な電極部分10として
の電極ストライプの幅Wは、10μm程度にしてあ
る。こうした従来形半導体レーザでは電極ストラ
イプ10の幅は均一で、一般には、半導体結晶の
片側の劈開面から、他方の劈開面までの全長が電
極となつている。最近では、結晶端面付近をレー
ザ光に対して透明にすれば、レーザ光による結晶
の破壊限界を大幅に引上げることができ、したが
つて光出力を増大できるという例もある。この場
合でも、電極10は結晶端面付近を除いて全長に
わたつて均一な幅の連続したストライプとなつて
いる。
This laser is assumed to be a GaAlAs laser, and its structure consists of an n-type GaAs substrate 1 and an n-type
GaAlAs2, GaAs active layer 3, p-type GaAlAs4, p
A positive electrode 8 is attached via an insulator 6, and a negative electrode 7 is attached to the lower side of the substrate 1. The typical thickness of the active layer 3 is about 0.2 μm, and it is important to use a double heterostructure to reduce the threshold current by confining the carrier by current injection and the light. The width W of the electrode stripe, which serves as a substantial electrode portion 10 that comes into ohmic contact with the p-type GaAs layer 5 through an opening in the insulating film 6 and injects current into the active layer 3, is set to about 10 μm. In such a conventional semiconductor laser, the width of the electrode stripe 10 is uniform, and generally the entire length from the cleavage plane on one side of the semiconductor crystal to the cleavage plane on the other side serves as an electrode. Recently, there have been cases in which it has been shown that by making the vicinity of the crystal end face transparent to laser light, it is possible to significantly raise the limit of crystal destruction by laser light, thereby increasing the optical output. Even in this case, the electrode 10 is a continuous stripe with a uniform width over the entire length except near the crystal end face.

本発明は、これに対して、実質的な電流注入電
極領域10を不規則なパターンによる各小領域か
ら成るように構造的改変を施したものである。第
2図に先づ第一の実施例を示すが、第1図中と同
一符号は同一の構成子を示し、また、実質的に本
発明に係る電極部分以外の構成部分1〜7に就い
ては特に改変の必要がないので、第2図中でもこ
れ等構成子1〜7は適宜省略して示してある。
In the present invention, on the other hand, the current injection electrode region 10 is structurally modified to consist of small regions in an irregular pattern. The first embodiment is shown first in FIG. 2, and the same reference numerals as in FIG. Since there is no need for any particular modification, these components 1 to 7 are omitted as appropriate in FIG. 2 as well.

この第一実施例では、正電極8にあつて、レー
ザ活性層への実質的な電流注入電極10となる領
域を、長さ方向に互いに離間した小電極領域10
i(i=,……n)から成るように構成し
ており、全体として見ると不規則な電極パターン
となつている。そして、各隣接小電極部分間の各
絶縁部分9j(j=,……n-1)には、一般
には絶縁膜が介在する。尚、パターンによつては
長さ方向両端の小電極部分10,10nの外側
にも絶縁部分9(図示せず)、9nが設けられ
ることもある。
In this first embodiment, in the positive electrode 8, a region which becomes a substantial current injection electrode 10 to the laser active layer is formed into small electrode regions 10 separated from each other in the length direction.
i (i= 1 , 2 , . . . n), and when viewed as a whole, it has an irregular electrode pattern. In general, an insulating film is interposed between each insulating portion 9j (j= 1 , 2 , . . . n -1 ) between adjacent small electrode portions. Depending on the pattern, insulating parts 90 (not shown) and 9n may also be provided outside the small electrode parts 101 and 10n at both ends in the length direction.

この実施例では、各小電極領域10i及び絶縁
部分9iの幅は総て等しくWであつて、例えば10
μm程度としているが、長さに就いては様々に異
ならせている。各小電極領域10iの長さai
絶縁部分9jの長さbjにつき具体的な数値例を
挙げるなら、例えば、a1=8.1μm、b1=9.8μ
m、a2=7.7μm、b2=5.7μm、a3=7.1μm、b3
=7.6μm、a4=8.5μm、b4=6.6μm……という
ように、ある範囲の値で(上限、下限が定まつて
いて)、ある間隔(近接する二つの値の間にもあ
る差が常にある)で、乱数的に決定される値とす
る。このように不規則電極パターンを持つ半導体
レーザに電流を注入すると、半導体レーザの発振
方向の励起キヤリヤ密度が不均一となる。このよ
うにすると発振スペクトルは単一縦モードではな
くマルチモードにすることができる。
In this embodiment, the widths of each small electrode region 10i and insulating portion 9i are all equal W, for example, 10
The length is approximately μm, but the length is varied. The length a i of each small electrode region 10i,
To give a specific numerical example for the length b j of the insulating portion 9j, for example, a 1 = 8.1 μm, b 1 = 9.8 μm.
m, a 2 = 7.7 μm, b 2 = 5.7 μm, a 3 = 7.1 μm, b 3
= 7.6 μm, a 4 = 8.5 μm, b 4 = 6.6 μm, etc., within a certain range of values (the upper and lower limits are fixed) and at a certain interval (even between two adjacent values). (there is always a difference), and the value is determined randomly. When current is injected into a semiconductor laser having such an irregular electrode pattern, the excited carrier density in the oscillation direction of the semiconductor laser becomes non-uniform. In this way, the oscillation spectrum can be made into multiple modes instead of a single longitudinal mode.

第3A,B図は、夫々、第二、第三の実施例と
して不規則な電極パターンの他の例を示してお
り、電流注入電極10部分のみを平面図的に示し
ている。第3A図示のものは、ストライプ電極1
0の幅を長さ方向の各部位で異ならせたものであ
つて、見方を変えれば、既述の小電極領域10i
を長さ方向に連続させ、長さaiの変化と共に各
小電極領域の幅wi(i=,……n)を
様々に変化させたものということができる。一
方、第3B図示のものは、第2図示の実施例のよ
うに、隣接小電極領域10i,10i+間に絶
縁領域9jを持つているが、各小電極領域10i
の長さai及び幅wiと共に、この絶縁領域の各々
の長さbj、幅sjも変化させたものである。
3A and 3B show other examples of irregular electrode patterns as the second and third embodiments, respectively, and show only the current injection electrode 10 portion in plan view. The one shown in 3A is the stripe electrode 1
The width of 0 is made different in each part in the length direction, and if you look at it from a different perspective, it is the small electrode area 10i described above.
can be said to be continuous in the length direction, and the width w i (i= 1 , 2 , . . . n) of each small electrode region is varied as the length a i changes. On the other hand, the one shown in FIG. 3B has an insulating region 9j between adjacent small electrode regions 10i and 10i+ 1 like the embodiment shown in second drawing, but each small electrode region 10i
In addition to the length a i and width w i of the insulating regions, the length b j and width s j of each insulating region are also varied.

第4図は、更に他の実施例乃至使用例を示して
おり、第2図示実施例における小電極領域10i
を二つの群に分けて(例えばiが奇数の領域の群
と偶数の領域の群とに分けて)、各群を夫々互い
に異なる周波数fa,fbの高周波バイアス源11
a,11bに接続している。そして、一方の高周
波バイアス源11aからの注入電流は、直流動作
電流の約10分の1程度とし、他方の高周波バイア
ス源11bの電流の大きさは必要に応じて選択し
て注入する。各周波数fa,fbの周波数差をΔfと
し、この半導体レーザを用いた自己結合効果によ
る光メモリピツクアツプの取扱うキヤリヤ信号周
波数をfとすると、これらの値には、 fa,fb,Δf>2f………(1) の関係が必要である。光デイスクの読取を想定
し、f=20MHzとして、たとえばfa=178MHz、
fb=380MHzなどとすれば良い。この半導体レー
ザは、励起キヤリヤ密度が、空間的に不均一であ
るに加えて時間的にも不均一であるから、発振ス
ペクトルは単一縦モードではなく、マルチモード
となる。時間的に励起キヤリヤが変動すると、光
出力もそれに対応して変動することになるが、光
デイスク読取への応用を考えて、式(1)が満足され
れば、検出信号をエレクトロニクス処理して、所
望の信号として取り出すことができる。
FIG. 4 shows still another embodiment or usage example, in which the small electrode area 10i in the second illustrated embodiment is shown.
is divided into two groups (for example, divided into a group in the area where i is an odd number and a group in the area where i is an even number), and each group is connected to a high frequency bias source 11 with different frequencies fa and fb.
It is connected to a and 11b. The current injected from one high-frequency bias source 11a is approximately one-tenth of the DC operating current, and the magnitude of the current from the other high-frequency bias source 11b is selected and injected as necessary. Let Δf be the frequency difference between the respective frequencies fa and fb, and let f be the carrier signal frequency handled by the optical memory pickup due to the self-coupling effect using this semiconductor laser, then these values include fa, fb, Δf>2f... The relationship (1) is necessary. Assuming reading of an optical disk, f = 20MHz, for example fa = 178MHz,
It is sufficient to set fb=380MHz. In this semiconductor laser, the excitation carrier density is not only spatially non-uniform but also temporally non-uniform, so the oscillation spectrum is not a single longitudinal mode but multi-mode. If the excitation carrier changes over time, the optical output will also change accordingly, but considering the application to optical disk reading, if equation (1) is satisfied, the detection signal can be processed electronically. , can be extracted as a desired signal.

第5図は本発明の半導体レーザの出力側端面に
反射防止膜12と、反対側端面に高反射膜13と
をつけて、ビデオ・デイスク用光ピツクアツプを
構成した一応用例の模式図である。出力側端面に
反射防止膜をつけると無い場合の劈開面反射率分
約32%だけ、半導体レーザの利得が低下するの
で、その分を反対側に高反射膜、たとえば反射率
90%程度、を付加する。このようにして半導体レ
ーザの利得としては低下を見ることはなく、自己
結合効果による光出力変化、端子電圧変化を極め
て増大することが出来、信号検出のSN比を非常
に大きくすることが出来る。半導体レーザは電源
B、抵抗Rを通して駆動される。反射防止膜を付
加した側の出力光は公知手法により、コリメート
レンズL1および集束用レンズL2によりビデオ・
デイスクDの表面に集束照射され、デイスク上の
情報に応じた反射光により、半導体レーザの光出
力が変化するから、後方の高反射率膜からわずか
に出てくる光をフオトダイオード14で検出する
か、半導体レーザの電極間端子15,15の電圧
変化を、コンデンサーCを介して検出すれば良
い。
FIG. 5 is a schematic diagram of an application example in which an optical pickup for a video disk is constructed by providing an antireflection film 12 on the output end facet of the semiconductor laser of the present invention and a high reflection film 13 on the opposite end facet. If an anti-reflection film is attached to the output side end face, the gain of the semiconductor laser will be reduced by about 32% of the reflectance of the cleavage plane than when no anti-reflection film is attached.
Approximately 90% is added. In this way, the gain of the semiconductor laser does not decrease, and the optical output change and terminal voltage change due to the self-coupling effect can be greatly increased, and the signal-to-noise ratio for signal detection can be greatly increased. The semiconductor laser is driven through a power source B and a resistor R. The output light from the side with the anti-reflection film added is converted into a video signal using a collimating lens L 1 and a focusing lens L 2 using a known method.
The optical output of the semiconductor laser changes depending on the reflected light that is focused on the surface of the disk D and reflected according to the information on the disk, so the photodiode 14 detects the light that slightly emerges from the high reflectance film at the rear. Alternatively, the voltage change at the interelectrode terminals 15, 15 of the semiconductor laser may be detected via the capacitor C.

上記の実施例では、一対の正負電極8,7の
中、正電極8に本発明を適用している。しかし、
場合に依つては、負電極7に対して、或いはまた
双方の電極に対して不規則電極パターン構成を採
つても良い。
In the above embodiment, the present invention is applied to the positive electrode 8 of the pair of positive and negative electrodes 8 and 7. but,
Depending on the case, an irregular electrode pattern configuration may be adopted for the negative electrode 7 or for both electrodes.

ここで、本発明の構成により、マルチモード発
振を起こすことができる理由を再めて簡単にまと
めておく。
Here, the reasons why the configuration of the present invention can cause multimode oscillation will be briefly summarized again.

冒頭にも述べたが、初期の半導体レーザでは結
晶成長技術が未熟であつたため、結晶内にこまか
な欠陥が散在したり、電流注入がどうしても不均
一であつたため、励起キヤリヤが不均一となり、
単一縦モード発振が困難であつた。結晶内欠陥を
極めて小さくすることが出来るようになるに従つ
て、単一縦モード化が可能になつた。さらに注入
電流を増大するに従い、周波数プーリングという
誘導放出にともなう量子エレクトロニクスの教え
る原理により、半導体レーザの両劈開面で定まる
フアブリ・ペロー共振器モードの内最強のものが
成長し、単一縦モード性が強くなる。この周波数
プーリングの効果は、半導体レーザでは他のガス
レーザ等に比較して極めて強く、このため半導体
レーザの発振周波数の温度依存性が当初考えられ
たように比例する関係ではなく、モードホツプを
ともなう階段形変化の関係にあることが実験事実
として判明した。この階段形変化のため、半導体
レーザの単一縦モード性、ひいては可干渉性が常
識をはるかに越えたものになつた理由である。可
干渉性の優れた半導体レーザとして、埋め込み形
ヘテロ構造(BH形)、チヤンネル・ストライプ・
プレーナー構造(CSP形)などのくりこみ形導波
路構造のものが有名である。これらは横モードが
制御され易く、単一縦モードになり易い。しか
し、これらの半導体レーザでも、自己結合効果を
用いる光学配置をした場合には、マルチモードに
もなる。この場合はもどり光により、半導体レー
ザの励起キヤリヤ分布が不均一になり、これにも
とづく結晶内部の屈折率変化が引き起され、いく
つかのフアブリ・ペロー共振器モードが発振し、
マルチモード発振となると説明することが出来
る。
As mentioned at the beginning, in the early days of semiconductor lasers, the crystal growth technology was immature, so small defects were scattered within the crystal, and the current injection was inevitably non-uniform, resulting in non-uniform excitation carriers.
Single longitudinal mode oscillation was difficult. As it became possible to make intracrystalline defects extremely small, it became possible to create a single longitudinal mode. As the injection current is further increased, the strongest Fabry-Perot cavity mode determined by both cleavage planes of the semiconductor laser grows due to frequency pooling, a principle taught by quantum electronics associated with stimulated emission, and a single longitudinal mode is generated. becomes stronger. This frequency pooling effect is extremely strong in semiconductor lasers compared to other gas lasers, and for this reason, the temperature dependence of the oscillation frequency of semiconductor lasers is not proportional to the temperature as initially thought, but rather has a stepped shape with mode hops. Experiments have shown that there is a relationship of change. This step-like change is the reason why the single longitudinal mode property of a semiconductor laser, and thus its coherence, are far beyond common sense. As a semiconductor laser with excellent coherence, buried heterostructure (BH type), channel, stripe,
Renormalized waveguide structures such as the planar structure (CSP type) are famous. In these cases, the transverse mode is easily controlled, and the single longitudinal mode is easily achieved. However, even these semiconductor lasers become multi-mode when an optical arrangement that uses the self-coupling effect is used. In this case, the returned light makes the excitation carrier distribution of the semiconductor laser non-uniform, which causes a change in the refractive index inside the crystal, causing several Fabry-Perot cavity modes to oscillate.
This can be explained as multi-mode oscillation.

従つて、本発明構成のように、半導体結晶内部
の励起キヤリヤ密度を少くとも空間的に、実施例
によつては時間的にも変調すると、同時に、ある
いは、時々刻々に多数のフアブリ・ペロー共振器
モードが発振し、ある時間内で発振スペクトルを
観測すると、マルチモード発振と見ることができ
る。以上の様にして、横モードは制御しつつ、マ
ルチモード発振を可能にすることができる。
Therefore, when the excited carrier density inside the semiconductor crystal is modulated at least spatially and, depending on the embodiment, also temporally, as in the configuration of the present invention, a large number of Fabry-Perot resonances occur simultaneously or momentarily. When the oscillation mode oscillates and the oscillation spectrum is observed within a certain period of time, it can be seen as multimode oscillation. In the manner described above, multimode oscillation can be made possible while controlling the transverse mode.

最後に、製法に就き述べると、本発明の半導体
レーザと従来形の半導体レーザの作製法での相異
点は、主として従来形の均一な電極に対して不規
則電極パターンを作製することであり、これは、
単に電極作製時に特有のマスクを用意するだけで
すむ。このマスク作製は、フオトレジストとか電
子ビーム露光装置など、LSIなどの半導体素子を
作製する技術で十分に開発されているものであ
り、最近では分解能0.1〜0.2μmのマスク作製は
十分可能であり、先に述べた乱数的に決定される
幅や長さの電極形状を作製することが出来る。ま
た、半導体レーザの端面に反射防止膜や、高反射
率膜を付加するのも周知技術で容易である。
Finally, regarding the manufacturing method, the main difference between the manufacturing method of the semiconductor laser of the present invention and the conventional semiconductor laser is that an irregular electrode pattern is manufactured as opposed to the conventional uniform electrode. ,this is,
It is sufficient to simply prepare a special mask when producing the electrode. This mask production has been fully developed using photoresist, electron beam exposure equipment, and other technologies for producing semiconductor devices such as LSIs, and recently it has become fully possible to produce masks with a resolution of 0.1 to 0.2 μm. It is possible to produce an electrode shape having a width and length determined by random numbers as described above. Furthermore, it is easy to add an antireflection film or a high reflectance film to the end face of a semiconductor laser using well-known techniques.

以上、詳記のように、本発明によれば、安定で
信頼性の高いマルチモード発振半導体レーザが提
供でき、半導体レーザの自己結合効果を用いた、
光デイスク読取技術の実用化等に大いに寄与し得
るものである。
As described above in detail, according to the present invention, a stable and highly reliable multi-mode oscillation semiconductor laser can be provided, and the self-coupling effect of the semiconductor laser can be used.
This can greatly contribute to the practical application of optical disk reading technology.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の単一縦モード発振半導体レーザ
の構成図、第2図は本発明第一の実施例の要部概
略構成図、第3A,B図は、夫々、第二、第三の
実施例の要部の平面図的な概略構成図、第4図は
同じく更に他の実施例の説明図、第5図は実際に
応用装置を組む場合の一例の説明図、である。 図中、3はレーザ活性層、10は該活性層への
電流注入電極領域、10iは各小電極領域、11
a,11bは高周波バイアス源、である。
Fig. 1 is a block diagram of a conventional single longitudinal mode oscillation semiconductor laser, Fig. 2 is a schematic block diagram of main parts of the first embodiment of the present invention, and Figs. FIG. 4 is an explanatory diagram of still another embodiment, and FIG. 5 is an explanatory diagram of an example of actually assembling an application device. In the figure, 3 is a laser active layer, 10 is a current injection electrode region to the active layer, 10i is each small electrode region, and 11
a and 11b are high frequency bias sources.

Claims (1)

【特許請求の範囲】 1 電流注入型半導体レーザにおいて、レーザ活
性層へ電流を注入する正負電流注入電極領域の少
くとも一方を、全体として不規則なパターンとな
る複数の小電極領域から構成し、その小電極領域
は、連続して設けられ、または同小電極領域間に
絶縁部分を介しており、同小電極領域の幅及び長
さが様々に異なつていることを特徴とする半導体
レーザ。 2 小電極領域を少くとも二つの群に分け、各群
に夫々異なる周波数のバイアス電流源を接続して
成ることを特徴とする特許請求の範囲1に記載の
半導体レーザ。
[Scope of Claims] 1. In a current injection semiconductor laser, at least one of the positive and negative current injection electrode regions for injecting current into the laser active layer is composed of a plurality of small electrode regions having an irregular pattern as a whole, A semiconductor laser characterized in that the small electrode regions are provided continuously or with an insulating part interposed between the small electrode regions, and the width and length of the small electrode regions are variously different. 2. The semiconductor laser according to claim 1, wherein the small electrode region is divided into at least two groups, and bias current sources with different frequencies are connected to each group.
JP11217080A 1980-08-14 1980-08-14 Semiconductor laser Granted JPS5736887A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11217080A JPS5736887A (en) 1980-08-14 1980-08-14 Semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11217080A JPS5736887A (en) 1980-08-14 1980-08-14 Semiconductor laser

Publications (2)

Publication Number Publication Date
JPS5736887A JPS5736887A (en) 1982-02-27
JPS6237899B2 true JPS6237899B2 (en) 1987-08-14

Family

ID=14579993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11217080A Granted JPS5736887A (en) 1980-08-14 1980-08-14 Semiconductor laser

Country Status (1)

Country Link
JP (1) JPS5736887A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2543674B2 (en) * 1984-06-25 1996-10-16 工業技術院長 Optical pickup
JPH02118927A (en) * 1988-10-27 1990-05-07 Canon Inc Semiconductor laser driving method and semiconductor laser driving device
US6653662B2 (en) 2000-11-01 2003-11-25 Matsushita Electric Industrial Co., Ltd. Semiconductor light-emitting device, method for fabricating the same, and method for driving the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727088A (en) * 1980-07-25 1982-02-13 Nippon Telegr & Teleph Corp <Ntt> Semiconductor laser device

Also Published As

Publication number Publication date
JPS5736887A (en) 1982-02-27

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