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JPS6243958B2 - - Google Patents
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JPS6243958B2 - - Google Patents

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Publication number
JPS6243958B2
JPS6243958B2 JP13800186A JP13800186A JPS6243958B2 JP S6243958 B2 JPS6243958 B2 JP S6243958B2 JP 13800186 A JP13800186 A JP 13800186A JP 13800186 A JP13800186 A JP 13800186A JP S6243958 B2 JPS6243958 B2 JP S6243958B2
Authority
JP
Japan
Prior art keywords
melt
magnetic field
crystal
solenoid
thermal convection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13800186A
Other languages
Japanese (ja)
Other versions
JPS623093A (en
Inventor
Hiroshi Hirata
Keigo Hoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP13800186A priority Critical patent/JPS623093A/en
Publication of JPS623093A publication Critical patent/JPS623093A/en
Publication of JPS6243958B2 publication Critical patent/JPS6243958B2/ja
Granted legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は導電性を有する物質を加熱して溶融体
とし、その溶融体から結晶を引上げる装置に関す
る。更に詳しくは、かかる装置の小型、軽量化を
可能とする新規な結晶引上げ装置に関する。 〔従来の技術〕 溶融体から結晶を引上げる方法の代表的なもの
はチヨクラルスキー法である。チヨクラルスキー
法においては、第3図に示すように、円形の横断
面をもつるつぼ1の外側に、円筒形の加熱体2を
るつぼ1と同心に配置し、たとえば加熱体2に電
流を流すことによつて発生するジユール熱により
るつぼ1内に所定の物質の溶融体3をつくり、結
晶方位がそろつた単結晶からなる種結晶5を溶融
体3の回転中心線4上に位置させるとともに、溶
融体3の表面に接触させ、種結晶5に接続した支
持体6を徐々に引上げることにより、種結晶5と
同様な結晶方位をもつた単結晶7を成長させる。
この場合、溶融体3は加熱体2により主として側
面から加熱されているから、溶融体3の中心部の
温度は外周部の温度より低い。このため、溶融体
3の内部に矢印20で大まかに示されるような熱
対流が生ずる。この熱対流は単結晶7が成長する
界面9に温度のゆらぎをもたらし、その結果成長
した単結晶7の内部に特性の不均一性および結晶
欠陥を生じさせるなどの悪影響を及ぼす。 そこで、溶融体3が半導体工業において重要な
結晶材料であるシリコンのような導電性を有する
物質である場合には、溶融体3に対して1000エル
ステツド以上の強い直流磁界を印加することによ
り、上述のような熱対流を抑制している。すなわ
ち、第4図に示すように、加熱体2を挾むように
巨大な2個の磁石38を配置し、これらの磁石3
8から発生する横方向の直流磁界58を溶融体3
に印加している。なお加熱体2は上述のように熱
を発生するための手段であり、そこに流れる電流
に基づいて直流磁界が発生することがあつたとし
ても、その直流磁界の強さは熱対流の抑制に関し
ては無視できる程度に弱いものであつた。 〔発明が解決しようとする問題点〕 しかしながら、かかる従来の装置には、以下の
問題点があつた。 問題点1:従来の装置においては、重量が数トン
にも達する巨大な磁石38が必要であるため、
装置全体が大型化、重量化し、又装置の平面寸
法(第4図中にW1で示す。)が大きくなるとい
う問題があつた。 即ち、装置収容上、極めて重要、かつ現実的
な要求である装置の小型化、軽量化が困難であ
るという欠点があつた。 問題点2:従来のこの種の装置においては、溶融
体3の横断面形状は普通回転中心線4に対して
対称な円形であり、また単結晶7の横断面も普
通円形であることが望まれるのに対して、磁石
38による直流磁界58は回転中心線4に対し
て非対称である。 〔なお、この場合の非対称とは、回転中心線を
中心とした場合に全方向に等方性を有していな
いことを言う。〕 従つて、溶融体3の横断面内での温度条件その
他にも非対称性が生じ、単結晶7の横断面の変形
横断面内での特性の不均一性が生ずるなどの、結
晶成長に係わる問題点が副作用として発生すると
いう欠点があつた。 この現象について、補足説明を行なう。 溶融体が加熱体によつて外側から均一に加熱さ
れている場合に、溶融体に磁界を印加しないとき
には、第7図に模式的に示すように、溶融体内に
はa〜fで示すような熱対流が生ずる。 ところで、第4図に示すような従来装置におい
ては、磁界が溶融液(単結晶)の回転中心線に対
して直交するように水平磁界として与えられる。
即ち、溶融体に対して非対称な横磁界を印加した
ことになり、この場合は第7図に示す熱対流a〜
fの縦方向の流れが抑制され、また熱対流a,d
の横方向の流れは抑制されないが、熱対流b,
c,e,fの横方向の流れの磁力線と直角方向の
成分が抑制されるので、熱対流b,c,e,fの
横方向の流れは磁力線と平行となる。(第8図
a)このため、熱対流a〜fによる熱の流れは第
8図bで示すようになるので、溶融体の等温線は
第8図cで示すように楕円形となるから、回転を
伴わずに引き上げる場合には、結晶の横断面形状
が楕円形となつてしまう。そして、結晶の横断面
形状が楕円形となるのを防止するため、結晶を回
転したときには、結晶の一つの成長点がたとえば
第8図cに示すA〜D点を通ることになるから、
結晶が成長する界面に温度のゆらぎが生じて、結
晶の成長速度に変化が生ずるので、結晶の横断面
における不純物濃度が不均一となり、また結晶欠
陥が生ずるという欠点があつた。 更に、従来装置においては、溶融体に横磁界を
印加しているので先にも述べたように、溶融体内
の熱対流閉曲線のうち、縦方向の流れが抑制され
ることになる。抑制されない横方向の流れを省略
し、抑制に寄与する長さのみを矢印で示したもの
が第10図である。同図において、aは結晶引上
げ開始直後の溶融液が多く残つている場合を示
し、bは結晶引上が完了直前の溶融液が少ししか
残つていない場合を示す。この両者を比較すれば
明らかなように、第4図に示す従来例において
は、結晶の成長に伴つて、残存溶融体の量が減少
すると、熱対流の縦方向の流れが短くなるから、
溶融体の量の減少とともに横磁界による熱対流の
抑制効果が減少し、溶融体の撹拌が増大してく
る。この結晶不純物の濃度を結晶の長さ方向にお
いて一定とすることはできないという欠点があつ
た。 〔問題点を解決するための手段〕 上記、問題点を解決するために、本発明におい
ては導電性を有する物質を加熱して溶融体とし、
その溶融体から結晶を引上げる結晶の成長装置に
おいて、溶融体の対流抑制用の磁界印加手段とし
て、上記溶融体の回転中心線を中心とする円筒形
のソレノイドを少なくとも設けたものである。 以下、実施例を示して、本発明の作用、効果を
説明する。 〔実施例〕 第1図は、この発明に係る結晶の成長装置の第
1の実施例を示す図である。この結晶の成長装置
においては、加熱体2の外側に、加熱体2と同心
の円筒形のソレノイド8が配置されている。この
ようなソレノイド8に直流電流を流すと、ソレノ
イド8の内側の溶融体3が存在する場所に、ソレ
ノイド8の巻数と電流の大きさに比例した強さを
もち、主として縦方向の直流磁界18が発生する
ことは、ビオ、サバールの法則により古くから知
られているところである。たとえば、ソレノイド
8の巻数を、ソレノイド8の高さ1cm当り10巻き
とし、電流の大きさを100アンペアとすれば、直
流磁界18の強さは約1300エルステツドとなり、
熱対流を抑制するに十分な強さとなる。このよう
に、本発明においては、従来例と同様に熱対流を
抑制するのに十分な強度の磁界を発生できる点は
共通であるが、第4図に示す従来装置とは構成に
おいて相違する。すなわち、本願発明において
は、溶融体の回転中心線を中心とする円筒形のソ
レノイドを設けているのに対して、従来装置にお
いては、電磁石(磁場装置)をその磁力線が水平
となるように設置している。 この構成の相違に起因して、本願発明と従来装
置とは効果においても相違する。即ち、本発明の
属するごとき溶融体から結晶を引上げる結晶成長
装置においては、一般に直径に比べ高さが5〜10
倍である縦長構造をしているし、又、るつぼ等の
構成要件も円筒形に近い形をしているものが多
い。 換言すれば、装置全体が縦長の円筒状にみなせ
る点に着眼し、本発明においては、その外側に同
じく縦長のソレノイドを設け、これにより対流抑
制用の磁界を発生させたものである。このように
すれば、磁界印加手段も含めた全体の寸法が磁界
印加手段を持たぬ第3図の基本構造に比べて、わ
ずかに増加するだけで良いという極めて実用上優
れた効果が得られる。第1図と第4図は、現実の
装置の主要部をほぼ同一縮尺率で図示したもので
あるが、W1とW0を比較すれば明らかなように装
置の小型化が可能であることがわかる。 更に、ソレノイドを使用することにより、少な
い電力で強い磁界を印加できるので、装置の小型
化のみならず、装置の軽量化や装置価格の安価が
可能となる。 更に、磁界の強度分布の点からもソレノイドは
溶融体の撹拌抑制に有利である。すなわち、ソレ
ノイド等の磁場印加手段の中心と溶融体の中心を
一致させて配するのが装置の全体構成上自然であ
るが、第7図に示すように溶融体の熱対流閉ルー
プを考えると、溶融体の中心部では回転中心線に
沿つて下降する成分があるが、この場合は第9図
aに示すように、縦磁界を印加できる本発明の構
成においては、実線で示す部分(対流の方向が磁
界と平行な部分)には、対流抑制が作用せず、点
線で示す部分(対流の方向が磁界と直交する部
分)のみに抑制力が作用するので、この中心部に
は縦磁界の抑制効果は作用せず、回転中心線から
半径方向に離れた部分で縦磁界と作用する横方向
の流れが生じている。したがつて、磁界により有
効に熱対流閉ループを抑制するには、溶融体の中
心部よりも半径方向に離れた部分の磁界強度が強
くなるような磁界印加手段がより効果的である
が、ソレノイドは中央を通る磁界が最も弱く、ソ
レノイドに近づく周辺部ほど強くなる特性である
ので、上記の目的に合致する。したがつて、少な
い電力でも効率よく熱対流抑制効果を発揮できる
という利点があり、さらにソレノイドには磁界分
布の外乱が小さく、発熱体の震動、破損が生じな
いという利点もある。これに対して、従来装置の
ように電磁石を使用して縦磁界を印加するときに
は、2つの磁極の間の空隙の長さが極めて長い巨
大な電磁石を設置しなければならないので、装置
が大形、大重量(ソレノイドを使用した場合と比
較して約20倍)となるとともに、価格が高価(ソ
レノイドを使用した場合と比較して約10倍)とな
り、また空隙内に発生する磁界の強さは空隙の長
さのおよそ2乗に反比例し、しかも上述のソレノ
イドの磁界分布とは逆に、電磁石の磁極の中央部
の磁力線が最も強く、外側に向つて磁力線が弱く
なるから、所望の強さの磁界を発生させるための
消費電力は莫大なものとならざるをえず、さらに
磁界分布の外乱が大きく、発熱体の震動、破損が
生ずる。 次に本発明の秦する別の効果について説明す
る。本発明においては、溶融体の回転中心線に対
して、どの放射方向に対しても対称な直流磁界を
溶融体に印加しているので、第7図及び第8図a
〜cで説明したような従来装置が横(水平)方向
の磁界を印加していることによつて生ずる熱の流
れが非対称になつたり、固液界面の等温線が楕円
化することもない。 即ち、第8図に対比して本発明の特徴を図示す
れば第9図のようになる。同図に示すように、溶
融体に対称な縦磁界を印加したときには、磁力線
と直角な流れは抑制され、磁力線と平行な流れは
抑制されないので、熱対流a〜fの縦方向の流れ
は抑制されないが、熱対流a〜fの横方向の流れ
が抑制され、しかも熱対流a〜fは閉じた流れで
あるため、熱対流a〜fは全体的に弱められると
ともに、熱対流a〜fは溶融体の回転中心線に対
して対称に抑制されるので、熱対流a〜fは溶融
体の回転中心線に対して対称となり、熱対流a〜
fによる熱の流れは第9図bで示すようになるか
ら、結晶育成上最も重要な溶融体の上部主面内の
等温線は第9図cで示すように円形となる。(な
お、第9図aで示すように、熱対流の閉ループの
うち、外部磁界により本質的に弱められる部分を
破線で示し、弱められない部分を実線で示す。)
このため、回転を伴つても、または伴わずに引き
上げる場合においても、結晶の横断面形状が円形
となる。また、回転を伴つて引き上げる場合で
も、結晶の外周部の特定の点は常に同一温度の溶
融体と接しながら回転することになるので、結晶
の成長速度も変化せず、結晶の横断面における不
純物濃度が均一となり、また結晶欠陥が生ずるこ
ともないという利点がある。 さらに、本発明のように、溶融体に縦磁界を印
加したときには、熱対流の横方向の流れが抑制さ
れ、かつ第11図a,bに示すように、溶融体の
量が減少したとしても、熱対流の横方向の流れ
(実線の矢印で示す。なお、抑制されない熱対流
の縦方向は省略してある。)の長さは変化しない
から、溶融体の量が減少したとしても、縦磁界に
よる熱対流の抑制効果は常に一定である。ここで
溶融体が強く撹拌されている場合には、不純物の
濃度が結晶の長さ方向において大きく変化するの
に対して、溶融体が全く撹拌されていない場合に
は不純物の濃度が結晶の長さ方向において一定と
なることが知られている。したがつて、本発明の
ように、溶融体の量の減少にかかわらず、熱対流
の抑制効果が常に一定であれば、溶融体を常に一
定の撹拌状態、若しくは適当な条件のもとでは撹
拌がほとんど無い状態に保持することができるの
で、不純物の濃度を結晶の長さ方向において一定
とすることができるという利点がある。 このように、溶融体の回転中心線に対して対称
となるように縦方向の磁界を印加することは多く
の利点を有するが、第4図に示す従来例の磁界印
加手段をそのまま転用することはできない。第5
図及び第6図は第4図に示す従来装置をるつぼや
結晶引上げ部等の寸法はそのままで、溶融液に同
一強度の磁界を印加できるように、電磁石を縦方
向に配置した場合の装置の大きさを示したもので
ある。幅W、高さHとも極めて大きくなり、体積
比で5〜10倍、重量比で10〜20倍となる。これに
対し、本発明においては、第1図〜第2図に示す
ように、磁界印加手段の付加による装置全体の寸
法、重量増加は、第6図に比べて著しく少なくて
よい。 なお、第2図は本発明の第2の実施例である。
(なお、気密容器30等は省略してある) この結晶の成長装置においては、第1図に示す
加熱体2およびソレノイド8の代りに、加熱と磁
界印加の2つの作用をする加熱兼磁界印加体8が
配置されている。(換言すれば、加熱体2が省略
されている。)この加熱兼磁界印加体8は円筒形
のソレノイドであり、るつぼ1と同心に設けられ
ており、またそのソレノイドの高さ1cm当りの巻
数をたとえば1巻とし、流す電流28の大きさを
たとえば1000アンペアとすれば、溶融体3を十分
加熱し、かつ熱対流の抑制に十分な強さの磁界を
印加することができる。さらに、加熱兼磁界印加
体8により発生する主として縦方向の磁界が溶融
体3の回転中心線4に対して対称となることは明
らかである。 〔発明の効果〕 以上説明したように、本発明においては、導電
性を有する物質を加熱して溶融体とし、その溶融
体から結晶を引上げる結晶の成長装置において、
溶融体の熱対流抑制用の磁界印加手段として、溶
融体の回転中心線を中心とする円筒形のソレノイ
ドを設けることにより装置の小型、軽量化、低価
格化が可能となる。 更に、ソレノイドを用いているので、磁界分布
の外乱が小さく、発熱体の震動、破損が生じな
い。また、溶融体の回転中心線に対して、等方的
な直流磁界(縦方向磁界)を溶融体に印加するの
で、熱の流れが対称となり、固液界面の等温線も
同心円状となる。このため、回転して結晶を引上
げても、結晶の成長点は同一温度の地点を回転す
るので、温度ゆらぎを受けず不純物濃度の均一性
を確保できるとともに、欠陥の発生を抑制でき
る。更に、溶融体の量の減少にかかわらず、熱対
流の抑制効果が常に一定であるので、不純物の濃
度を結晶の長さ方向において一定にできる。 なお、直径3インチの結晶引上げ装置に適用し
た場合の従来例との比較を下の表に示す。 【表】
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus for heating a conductive substance to form a melt and pulling crystals from the melt. More specifically, the present invention relates to a new crystal pulling device that allows such a device to be made smaller and lighter. [Prior Art] A typical method for pulling crystals from a melt is the Czyochralski method. In the Czyochralski method, as shown in Fig. 3, a cylindrical heating element 2 is placed concentrically with the crucible 1 on the outside of the crucible 1 with a circular cross section, and, for example, an electric current is passed through the heating element 2. A melt 3 of a predetermined substance is created in the crucible 1 by Juur heat generated thereby, and a seed crystal 5 made of a single crystal with an aligned crystal orientation is positioned on the rotation center line 4 of the melt 3. By gradually pulling up the support 6 which is brought into contact with the surface of the melt 3 and connected to the seed crystal 5, a single crystal 7 having the same crystal orientation as the seed crystal 5 is grown.
In this case, since the molten body 3 is heated mainly from the sides by the heating body 2, the temperature at the center of the molten body 3 is lower than the temperature at the outer circumference. As a result, thermal convection occurs within the melt 3 as roughly indicated by the arrow 20. This thermal convection brings about temperature fluctuations at the interface 9 where the single crystal 7 grows, and as a result, it has an adverse effect such as causing non-uniformity of characteristics and crystal defects inside the grown single crystal 7. Therefore, when the melt 3 is a conductive substance such as silicon, which is an important crystalline material in the semiconductor industry, by applying a strong DC magnetic field of 1000 oersted or more to the melt 3, the above-mentioned It suppresses heat convection such as That is, as shown in FIG. 4, two huge magnets 38 are arranged so as to sandwich the heating element 2,
The horizontal direct current magnetic field 58 generated from the melt 3
is applied to. Note that the heating element 2 is a means for generating heat as described above, and even if a DC magnetic field is generated based on the current flowing there, the strength of the DC magnetic field is limited in terms of suppressing thermal convection. was so weak that it could be ignored. [Problems to be Solved by the Invention] However, such conventional devices have the following problems. Problem 1: The conventional device requires a huge magnet 38 that weighs several tons.
There were problems in that the entire device became larger and heavier, and the planar dimension of the device (indicated by W1 in FIG. 4) became larger. That is, there is a drawback in that it is difficult to reduce the size and weight of the device, which is an extremely important and realistic requirement for accommodating the device. Problem 2: In conventional devices of this type, the cross-sectional shape of the melt 3 is usually circular and symmetrical with respect to the rotation center line 4, and it is desirable that the cross-sectional shape of the single crystal 7 is also usually circular. In contrast, the DC magnetic field 58 generated by the magnet 38 is asymmetrical with respect to the rotation center line 4. [Note that asymmetry in this case means that there is no isotropy in all directions when the rotation center line is the center. ] Therefore, asymmetry occurs in the temperature conditions and other aspects within the cross section of the melt 3, resulting in problems related to crystal growth, such as non-uniformity of properties within the deformed cross section of the single crystal 7. The drawback was that problems occurred as side effects. A supplementary explanation will be given regarding this phenomenon. When the molten body is uniformly heated from the outside by a heating element and no magnetic field is applied to the molten body, as shown schematically in FIG. Heat convection occurs. By the way, in the conventional apparatus shown in FIG. 4, the magnetic field is applied as a horizontal magnetic field orthogonal to the rotation center line of the melt (single crystal).
In other words, an asymmetric transverse magnetic field is applied to the melt, and in this case, the thermal convection a~ shown in Figure 7
The longitudinal flow of f is suppressed, and the thermal convection a, d
The lateral flow of is not suppressed, but the thermal convection b,
Since the components of the lateral flows c, e, and f in the direction perpendicular to the lines of magnetic force are suppressed, the lateral flows of the thermal convection b, c, e, and f become parallel to the lines of magnetic force. (Fig. 8a) Therefore, the heat flow due to thermal convection a to f becomes as shown in Fig. 8b, and the isotherm of the melt becomes elliptical as shown in Fig. 8c. If the crystal is pulled up without rotation, the cross-sectional shape of the crystal becomes elliptical. In order to prevent the cross-sectional shape of the crystal from becoming elliptical, when the crystal is rotated, one growth point of the crystal passes through points A to D shown in FIG. 8c, for example.
Temperature fluctuations occur at the interface where the crystal grows, causing a change in the crystal growth rate, resulting in non-uniform impurity concentrations in the cross section of the crystal and crystal defects. Furthermore, in the conventional apparatus, since a transverse magnetic field is applied to the melt, as mentioned above, the flow in the longitudinal direction of the closed thermal convection curve within the melt is suppressed. In FIG. 10, the unsuppressed lateral flow is omitted and only the lengths contributing to suppression are shown by arrows. In the figure, a shows a case in which a large amount of the molten liquid remains immediately after the start of crystal pulling, and b shows a case in which only a small amount of molten liquid remains just before the crystal pulling is completed. As is clear from comparing the two, in the conventional example shown in Figure 4, as the amount of residual melt decreases as the crystal grows, the vertical flow of thermal convection becomes shorter.
As the amount of the melt decreases, the effect of suppressing thermal convection by the transverse magnetic field decreases, and the agitation of the melt increases. A drawback is that the concentration of crystal impurities cannot be made constant in the length direction of the crystal. [Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention heats a conductive substance to form a molten body,
A crystal growth apparatus for pulling crystals from the melt is provided with at least a cylindrical solenoid centered on the rotation center line of the melt as means for applying a magnetic field for suppressing convection in the melt. Hereinafter, the functions and effects of the present invention will be explained with reference to Examples. [Embodiment] FIG. 1 is a diagram showing a first embodiment of a crystal growth apparatus according to the present invention. In this crystal growth apparatus, a cylindrical solenoid 8 concentric with the heating element 2 is arranged outside the heating element 2. When a direct current is applied to such a solenoid 8, a direct current magnetic field 18, which is mainly longitudinal, is generated at a location inside the solenoid 8 where the molten material 3 is present, with a strength proportional to the number of turns of the solenoid 8 and the magnitude of the current. It has been known for a long time that this occurs based on the Biot-Savart law. For example, if the number of turns of the solenoid 8 is 10 turns per 1 cm of the height of the solenoid 8, and the magnitude of the current is 100 amperes, the strength of the DC magnetic field 18 will be approximately 1300 oersted,
It is strong enough to suppress heat convection. As described above, the present invention has the same feature as the conventional device in that it can generate a magnetic field strong enough to suppress thermal convection, but it differs from the conventional device shown in FIG. 4 in its configuration. That is, in the present invention, a cylindrical solenoid is provided that is centered on the rotation center line of the molten material, whereas in the conventional device, an electromagnet (magnetic field device) is installed so that its magnetic field lines are horizontal. are doing. Due to this difference in configuration, the present invention and the conventional device also have different effects. That is, in a crystal growth apparatus for pulling crystals from a melt to which the present invention pertains, the height is generally 5 to 10 mm compared to the diameter.
It has a vertically elongated structure, and many of the crucibles and other components are nearly cylindrical in shape. In other words, the present invention focuses on the fact that the entire device can be regarded as a vertically elongated cylinder, and in the present invention, a similarly vertically elongated solenoid is provided on the outside of the solenoid, thereby generating a magnetic field for suppressing convection. In this way, an extremely excellent practical effect can be obtained in that the overall dimensions including the magnetic field applying means need only be slightly increased compared to the basic structure shown in FIG. 3 which does not have the magnetic field applying means. Figures 1 and 4 show the main parts of the actual device at almost the same scale, but it is clear from comparing W 1 and W 0 that the device can be made smaller. I understand. Furthermore, by using a solenoid, a strong magnetic field can be applied with less electric power, so that not only the size of the device can be reduced, but also the weight and cost of the device can be reduced. Furthermore, from the viewpoint of magnetic field strength distribution, solenoids are advantageous in suppressing agitation of the melt. That is, it is natural for the overall structure of the device to align the center of the magnetic field application means such as a solenoid with the center of the melt, but considering the closed thermal convection loop of the melt as shown in FIG. In the center of the melt, there is a component that descends along the rotation center line, but in this case, as shown in Figure 9a, in the configuration of the present invention that can apply a vertical magnetic field, the part shown by the solid line (convection) Convection suppression does not act on the area (where the direction of convection is parallel to the magnetic field), and the suppression force acts only on the area indicated by the dotted line (the area where the direction of convection is perpendicular to the magnetic field). The suppression effect does not work, and a transverse flow that interacts with the longitudinal magnetic field occurs in a portion radially away from the rotation center line. Therefore, in order to effectively suppress the thermal convection closed loop using a magnetic field, it is more effective to use a magnetic field application means that has a stronger magnetic field strength in the radially distant parts than in the center of the melt. Since the magnetic field passing through the center is the weakest and becomes stronger toward the periphery near the solenoid, it meets the above purpose. Therefore, the solenoid has the advantage of being able to efficiently suppress thermal convection even with a small amount of electric power.Furthermore, the solenoid has the advantage that the disturbance in the magnetic field distribution is small and the heating element does not vibrate or break. On the other hand, when using electromagnets to apply a vertical magnetic field as in conventional devices, a huge electromagnet with an extremely long air gap between the two magnetic poles must be installed, making the device large. , it is heavy (approximately 20 times as much as when using a solenoid), expensive (approximately 10 times as much as when using a solenoid), and the strength of the magnetic field generated in the air gap is large. is approximately inversely proportional to the square of the length of the air gap, and contrary to the magnetic field distribution of the solenoid described above, the lines of magnetic force are the strongest at the center of the magnetic pole of the electromagnet, and the lines of magnetic force become weaker toward the outside, so the desired strength can be obtained. The power consumption to generate such a magnetic field is unavoidable, and furthermore, the disturbance in the magnetic field distribution is large, causing vibration and damage to the heating element. Next, another effect of the present invention will be explained. In the present invention, since a DC magnetic field is applied to the melt that is symmetrical in any radial direction with respect to the center line of rotation of the melt, as shown in FIGS.
There is no asymmetrical heat flow or elliptical isothermal lines at the solid-liquid interface, which are caused by the conventional apparatuses described in items 1 to 3 applying a horizontal magnetic field. That is, if the features of the present invention are illustrated in comparison with FIG. 8, it will be as shown in FIG. As shown in the figure, when a symmetrical longitudinal magnetic field is applied to the melt, the flow perpendicular to the lines of magnetic force is suppressed, but the flow parallel to the lines of magnetic force is not suppressed, so the longitudinal flow of thermal convection a to f is suppressed. However, the lateral flow of thermal convection a to f is suppressed, and since thermal convection a to f are closed flows, thermal convection a to f are weakened overall, and thermal convection a to f are Since they are suppressed symmetrically with respect to the center line of rotation of the melt, thermal convection a to f become symmetrical with respect to the center line of rotation of the melt, and thermal convection a to
Since the heat flow due to f is as shown in FIG. 9b, the isothermal line in the upper main surface of the melt, which is most important for crystal growth, becomes circular as shown in FIG. 9c. (As shown in Figure 9a, the part of the closed loop of thermal convection that is essentially weakened by the external magnetic field is shown by a broken line, and the part that is not weakened is shown by a solid line.)
Therefore, the cross-sectional shape of the crystal becomes circular regardless of whether it is pulled with or without rotation. In addition, even when pulling with rotation, a specific point on the outer periphery of the crystal always rotates while contacting the melt at the same temperature, so the growth rate of the crystal does not change, and impurities in the cross section of the crystal do not change. It has the advantage that the concentration is uniform and no crystal defects occur. Furthermore, when a vertical magnetic field is applied to the melt as in the present invention, the lateral flow of thermal convection is suppressed, and even if the amount of the melt decreases as shown in Figures 11a and b, , the length of the horizontal flow of thermal convection (indicated by solid arrows; the longitudinal direction of unsuppressed thermal convection is omitted) does not change, so even if the amount of melt decreases, the vertical The effect of suppressing thermal convection by the magnetic field is always constant. When the melt is strongly stirred, the concentration of impurities varies greatly along the length of the crystal, whereas when the melt is not stirred at all, the concentration of impurities changes along the length of the crystal. It is known that it is constant in the horizontal direction. Therefore, as in the present invention, if the effect of suppressing thermal convection is always constant regardless of the decrease in the amount of the melt, the melt can be kept in a constant stirring state or stirred under appropriate conditions. Since the impurity concentration can be maintained in a state where there is almost no impurity, there is an advantage that the concentration of impurities can be kept constant in the length direction of the crystal. As described above, applying a vertical magnetic field symmetrically with respect to the center line of rotation of the melt has many advantages, but it is not possible to simply use the conventional magnetic field applying means shown in Fig. 4 as is. I can't. Fifth
The figure and Figure 6 show the conventional apparatus shown in Figure 4, but with the same dimensions as the crucible, crystal pulling section, etc., and the electromagnets are arranged vertically so that the same strength of magnetic field can be applied to the melt. This shows the size. Both the width W and the height H are extremely large, and are 5 to 10 times larger in volume and 10 to 20 times larger in weight. On the other hand, in the present invention, as shown in FIGS. 1 and 2, the increase in size and weight of the entire device due to the addition of the magnetic field applying means can be significantly smaller than that in FIG. 6. Note that FIG. 2 shows a second embodiment of the present invention.
(Note that the airtight container 30 and the like are omitted.) In this crystal growth apparatus, instead of the heating body 2 and solenoid 8 shown in FIG. A body 8 is arranged. (In other words, the heating element 2 is omitted.) This heating/magnetic field applying element 8 is a cylindrical solenoid, which is provided concentrically with the crucible 1, and the number of turns per 1 cm of height of the solenoid. For example, if the current 28 is 1000 amperes, it is possible to heat the melt 3 sufficiently and apply a magnetic field strong enough to suppress thermal convection. Furthermore, it is clear that the mainly longitudinal magnetic field generated by the heating/magnetic field applying body 8 is symmetrical with respect to the rotation center line 4 of the melt 3. [Effects of the Invention] As explained above, in the present invention, in a crystal growth apparatus that heats a conductive substance to form a melt and pulls a crystal from the melt,
By providing a cylindrical solenoid centered on the rotation center line of the molten body as a magnetic field applying means for suppressing thermal convection of the molten body, it is possible to make the device smaller, lighter, and lower in price. Furthermore, since a solenoid is used, disturbances in the magnetic field distribution are small and the heating element does not vibrate or break. Furthermore, since an isotropic DC magnetic field (longitudinal magnetic field) is applied to the melt with respect to the center line of rotation of the melt, the heat flow becomes symmetrical and the isothermal lines at the solid-liquid interface also become concentric. Therefore, even if the crystal is pulled up by rotation, the growth point of the crystal rotates at the same temperature point, so that it is not subject to temperature fluctuations, ensuring uniformity of impurity concentration, and suppressing the occurrence of defects. Furthermore, the effect of suppressing thermal convection is always constant regardless of the decrease in the amount of melt, so that the concentration of impurities can be kept constant in the length direction of the crystal. The table below shows a comparison with a conventional example when applied to a crystal pulling device with a diameter of 3 inches. 【table】

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図はそれぞれ本発明の実施例、第
3図は従来の磁界を印加しない基本的な結晶の成
長装置を示す概略断面図、第4図は従来の磁界を
印加する結晶成長装置の説明図、第5,6図は第
4図に示す従来の結晶成長装置の磁界印加装置を
単に垂直方向に磁界を印加するように設計変更し
た場合の装置全体の大きさを比較するための説明
図、第7図は溶融体内の対流を説明するための
図、第8図は第4図に示す従来例における印加磁
界と溶融体内の対流との関係を説明するための
図、第9図は本発明における印加磁界と溶融体内
の対流との関係を説明するための図、第10図及
び第11図はそれぞれ第4図に示す従来例、およ
び本発明において、磁界が抑制できる対流の部分
の大きさについて、結晶引上直後及び結晶引上げ
完了直前の状態を対比した説明図である。 1……るつぼ、2……加熱体、3……溶融体、
4……回転中心線、5……種結晶、6……支持
体、7……単結晶、8……ソレノイド、9……固
液界面、18……ソレノイドの作る直流磁界、2
0……加熱体により生ずる溶融体中の対流、28
……ソレノイドに流す電流、30……気密容器、
38,48……電磁石、58……電磁石の作る直
流磁界。
Figures 1 and 2 are examples of the present invention, Figure 3 is a schematic cross-sectional view showing a conventional basic crystal growth apparatus that does not apply a magnetic field, and Figure 4 is a conventional crystal growth apparatus that applies a magnetic field. The explanatory diagrams of the apparatus, Figures 5 and 6, are for comparison of the overall size of the apparatus when the design of the magnetic field application device of the conventional crystal growth apparatus shown in Figure 4 is changed to simply apply a magnetic field in the vertical direction. FIG. 7 is a diagram for explaining the convection in the melt; FIG. 8 is a diagram for explaining the relationship between the applied magnetic field and the convection in the melt in the conventional example shown in FIG. 4; The figure is a diagram for explaining the relationship between the applied magnetic field and the convection in the melt in the present invention, and FIGS. 10 and 11 respectively show the conventional example shown in FIG. FIG. 2 is an explanatory diagram comparing the size of a portion between the state immediately after crystal pulling and the state immediately before completion of crystal pulling. 1... Crucible, 2... Heating body, 3... Molten body,
4... Rotation center line, 5... Seed crystal, 6... Support, 7... Single crystal, 8... Solenoid, 9... Solid-liquid interface, 18... DC magnetic field created by solenoid, 2
0...Convection in the melt caused by the heating element, 28
... Current flowing through the solenoid, 30 ... Airtight container,
38, 48...electromagnet, 58...DC magnetic field created by the electromagnet.

Claims (1)

【特許請求の範囲】 1 導電性を有する物質を加熱して溶融体とし、
その溶融体から結晶を引上げる結晶の成長装置に
おいて、溶融体の熱対流抑制用の磁界印加手段と
して上記溶融体の回転中心線を中心とする円筒形
のソレノイドを具備することを特徴とする結晶の
成長装置。 2 ソレノイドが溶融体に磁場を印加する装置
と、溶融体を加熱する装置を兼ねていることを特
徴とする特許請求の範囲第1項記載の結晶の成長
装置。
[Claims] 1. Heating a conductive substance to make it into a melt,
A crystal growth apparatus for pulling crystals from the melt, characterized in that a cylindrical solenoid centered on the rotation center line of the melt is provided as means for applying a magnetic field for suppressing thermal convection in the melt. growth equipment. 2. The crystal growth apparatus according to claim 1, wherein the solenoid serves both as a device for applying a magnetic field to the melt and as a device for heating the melt.
JP13800186A 1986-06-13 1986-06-13 Crystal growth apparatus Granted JPS623093A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13800186A JPS623093A (en) 1986-06-13 1986-06-13 Crystal growth apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13800186A JPS623093A (en) 1986-06-13 1986-06-13 Crystal growth apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3245181A Division JPS57149894A (en) 1981-03-09 1981-03-09 Method and apparatus for growing grystal

Publications (2)

Publication Number Publication Date
JPS623093A JPS623093A (en) 1987-01-09
JPS6243958B2 true JPS6243958B2 (en) 1987-09-17

Family

ID=15211743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13800186A Granted JPS623093A (en) 1986-06-13 1986-06-13 Crystal growth apparatus

Country Status (1)

Country Link
JP (1) JPS623093A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7291221B2 (en) * 2004-12-30 2007-11-06 Memc Electronic Materials, Inc. Electromagnetic pumping of liquid silicon in a crystal growing process

Also Published As

Publication number Publication date
JPS623093A (en) 1987-01-09

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