JPS6312955B2 - - Google Patents
Info
- Publication number
- JPS6312955B2 JPS6312955B2 JP8124180A JP8124180A JPS6312955B2 JP S6312955 B2 JPS6312955 B2 JP S6312955B2 JP 8124180 A JP8124180 A JP 8124180A JP 8124180 A JP8124180 A JP 8124180A JP S6312955 B2 JPS6312955 B2 JP S6312955B2
- Authority
- JP
- Japan
- Prior art keywords
- gold
- plating
- tin
- bath
- stannous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 68
- 239000010931 gold Substances 0.000 claims description 39
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 38
- 229910052737 gold Inorganic materials 0.000 claims description 35
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 229910001020 Au alloy Inorganic materials 0.000 claims description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 229910017052 cobalt Inorganic materials 0.000 claims description 8
- 239000010941 cobalt Substances 0.000 claims description 8
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- XTFKWYDMKGAZKK-UHFFFAOYSA-N potassium;gold(1+);dicyanide Chemical compound [K+].[Au+].N#[C-].N#[C-] XTFKWYDMKGAZKK-UHFFFAOYSA-N 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- 239000003963 antioxidant agent Substances 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 238000004070 electrodeposition Methods 0.000 claims description 5
- 239000003353 gold alloy Substances 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 25
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 21
- 239000000203 mixture Substances 0.000 description 17
- 230000000694 effects Effects 0.000 description 13
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 9
- 238000005219 brazing Methods 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- 235000015165 citric acid Nutrition 0.000 description 7
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 6
- 229910001128 Sn alloy Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- 230000003078 antioxidant effect Effects 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 4
- UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 description 4
- NRTDAKURTMLAFN-UHFFFAOYSA-N potassium;gold(3+);tetracyanide Chemical compound [K+].[Au+3].N#[C-].N#[C-].N#[C-].N#[C-] NRTDAKURTMLAFN-UHFFFAOYSA-N 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 3
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 3
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- 239000001630 malic acid Substances 0.000 description 3
- 235000011090 malic acid Nutrition 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000001119 stannous chloride Substances 0.000 description 3
- 235000011150 stannous chloride Nutrition 0.000 description 3
- RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 description 3
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 3
- LSBDFXRDZJMBSC-UHFFFAOYSA-N 2-phenylacetamide Chemical compound NC(=O)CC1=CC=CC=C1 LSBDFXRDZJMBSC-UHFFFAOYSA-N 0.000 description 2
- ZNBNBTIDJSKEAM-UHFFFAOYSA-N 4-[7-hydroxy-2-[5-[5-[6-hydroxy-6-(hydroxymethyl)-3,5-dimethyloxan-2-yl]-3-methyloxolan-2-yl]-5-methyloxolan-2-yl]-2,8-dimethyl-1,10-dioxaspiro[4.5]decan-9-yl]-2-methyl-3-propanoyloxypentanoic acid Chemical compound C1C(O)C(C)C(C(C)C(OC(=O)CC)C(C)C(O)=O)OC11OC(C)(C2OC(C)(CC2)C2C(CC(O2)C2C(CC(C)C(O)(CO)O2)C)C)CC1 ZNBNBTIDJSKEAM-UHFFFAOYSA-N 0.000 description 2
- FUSNOPLQVRUIIM-UHFFFAOYSA-N 4-amino-2-(4,4-dimethyl-2-oxoimidazolidin-1-yl)-n-[3-(trifluoromethyl)phenyl]pyrimidine-5-carboxamide Chemical compound O=C1NC(C)(C)CN1C(N=C1N)=NC=C1C(=O)NC1=CC=CC(C(F)(F)F)=C1 FUSNOPLQVRUIIM-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000001888 Peptone Substances 0.000 description 2
- 108010080698 Peptones Proteins 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000010668 complexation reaction Methods 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 239000012493 hydrazine sulfate Substances 0.000 description 2
- 229910000377 hydrazine sulfate Inorganic materials 0.000 description 2
- 229910000378 hydroxylammonium sulfate Inorganic materials 0.000 description 2
- 235000019319 peptone Nutrition 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- PTLRDCMBXHILCL-UHFFFAOYSA-M sodium arsenite Chemical compound [Na+].[O-][As]=O PTLRDCMBXHILCL-UHFFFAOYSA-M 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- 235000010215 titanium dioxide Nutrition 0.000 description 2
- 150000004992 toluidines Chemical class 0.000 description 2
- 239000010938 white gold Substances 0.000 description 2
- 229910000832 white gold Inorganic materials 0.000 description 2
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000004283 Sodium sorbate Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- -1 benzylidene acetate Chemical compound 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 235000019646 color tone Nutrition 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001325 element alloy Inorganic materials 0.000 description 1
- 239000006023 eutectic alloy Substances 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- JVPLOXQKFGYFMN-UHFFFAOYSA-N gold tin Chemical compound [Sn].[Au] JVPLOXQKFGYFMN-UHFFFAOYSA-N 0.000 description 1
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- ZQDWXGKKHFNSQK-UHFFFAOYSA-N hydroxyzine Chemical compound C1CN(CCOCCO)CCN1C(C=1C=CC(Cl)=CC=1)C1=CC=CC=C1 ZQDWXGKKHFNSQK-UHFFFAOYSA-N 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- KHZALYIIDCJNTD-UHFFFAOYSA-N rhodium titanium Chemical compound [Ti].[Rh] KHZALYIIDCJNTD-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- LROWVYNUWKVTCU-STWYSWDKSA-M sodium sorbate Chemical compound [Na+].C\C=C\C=C\C([O-])=O LROWVYNUWKVTCU-STWYSWDKSA-M 0.000 description 1
- 235000019250 sodium sorbate Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- IUTCEZPPWBHGIX-UHFFFAOYSA-N tin(2+) Chemical compound [Sn+2] IUTCEZPPWBHGIX-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
- Contacts (AREA)
Description
【発明の詳細な説明】
本発明は、安定な金とスズおよび第3元素から
なる合金メツキ浴に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a stable alloy plating bath consisting of gold, tin and a third element.
金とスズの合金は古くから使用されており、そ
の用途は多岐にわたつている。その例としてはス
ズの強い白色化力を利用したホワイトゴールド又
は、重量比で金80%、スズ20%の共晶合金を用い
たろう材が挙げられる。 Gold and tin alloys have been used for a long time and have a wide variety of uses. Examples include white gold, which utilizes the strong whitening power of tin, and brazing filler metal, which uses a eutectic alloy of 80% gold and 20% tin by weight.
金とスズの合金は、一般には冶金法によつて製
造されるが、この方法は必要な形状にするまでの
工程が複雑であるため、単価が相当高くなるとい
う欠点があつた。 Gold and tin alloys are generally produced by metallurgical methods, but this method has the drawback of being quite expensive due to the complicated process of forming it into the required shape.
これに対して、金とスズの合金をメツキで析出
させる試みはいくつかなされているが、光沢を得
ることは困難であり、また、第一スズイオンは第
二スズイオンに酸化されやすいため、メツキ液と
しては不安定であるという欠点があつた。 On the other hand, several attempts have been made to deposit gold and tin alloys by plating, but it is difficult to obtain gloss, and stannous ions are easily oxidized to stannic ions, so the plating solution However, it had the disadvantage of being unstable.
本発明の目的は、かかる上記の欠点を解消し、
析出物の光沢性および第一スズイオンの安定性を
改善することにあり、さらに機械的特性を改善し
た金とスズを含む多元素合金メツキ浴を提供する
ものである。 The purpose of the present invention is to eliminate the above-mentioned drawbacks,
The object of the present invention is to provide a multi-element alloy plating bath containing gold and tin that improves the brightness of the precipitate and the stability of stannous ions, and also has improved mechanical properties.
本発明のメツキ浴は、
金合金の電着に適した水性浴において、
シアン化金カリウムとして添加した金が20〜50
g/と、鉄(Fe)、コバルト(Co)、ニツケル
(Ni)、銅(Cu)のうちの少なくとも1種の金属
が0.5〜10g/と、第一スズが20〜50g/と、
前記金属を錯化する少なくとも一種類の化合物が
600〜750g/と、光沢剤が1〜3g/と、前
記第一スズの酸化防止剤の少なくとも1種が10〜
50g/とが添加され、PHが4〜6であることを
特徴とする。 The plating bath of the present invention is an aqueous bath suitable for electrodeposition of gold alloys, and contains 20 to 50% of gold added as potassium gold cyanide.
g/, at least one metal of iron (Fe), cobalt (Co), nickel (Ni), copper (Cu) is 0.5 to 10 g/, and stannous is 20 to 50 g/,
at least one compound that complexes the metal;
600 to 750 g/brightener, 1 to 3 g/brightener, and at least one of the stannous antioxidants 10 to 750 g/b
It is characterized by the addition of 50 g/day and a pH of 4 to 6.
本発明のメツキ浴の構成は次のとおりである。 The structure of the plating bath of the present invention is as follows.
シアン化金カリウムとして添加される金の量
は、20〜50g/である。金の量が20g/未満
では、メツキ浴の安定性、光沢性に乏しく、優秀
な析出物を得る電着速度が遅い。また、50g/
より多い場合はメツキ浴中の金濃度が高すぎ、メ
ツキによるすくい出し等による損失のため経済的
ではない。 The amount of gold added as potassium gold cyanide is between 20 and 50 g/g. If the amount of gold is less than 20 g/g, the stability and gloss of the plating bath will be poor, and the rate of electrodeposition to obtain an excellent deposit will be slow. Also, 50g/
If the amount is more than that, the gold concentration in the plating bath will be too high and it will be uneconomical because of losses due to scooping out by plating.
第一スズイオンは20g/〜50g/である。
第一スズイオンが20g/未満ではスズの析出お
よび第二スズイオンへの酸化による消耗量が大き
くなつて不安定であり、50g/より多い場合は
錯化が困難である。 The stannous ion is 20g/~50g/.
If the amount of stannous ions is less than 20 g, the amount consumed by tin precipitation and oxidation to stannic ions becomes large, resulting in instability, and if it is more than 50 g, it is difficult to form a complex.
金とスズの合金の機械的強度を上げるために添
加される元素は、周期律表のa族、a族、
a族、a族、a族、a族の金属およびb
族、b族、b族のものが考えられる。これら
の元素は、金とスズの合金中に析出して機械的強
度を著しく向上させることができ、2種以上の添
加をすればその効果は相乗的に示される。 Elements added to increase the mechanical strength of gold and tin alloys are group a, group a of the periodic table,
metals of group a, group a, group a, group a and b
Possible examples include those of the group B, group b, and group b. These elements can precipitate into an alloy of gold and tin and significantly improve mechanical strength, and when two or more of these elements are added, their effects are synergistic.
前記の元素は、例えばチタン、ニオブ、モリブ
デン、レニウム、鉄、コバルト、ニツケル、ロジ
ウム、パラジウム、銅、銀、ケイ素、リンなどが
考えられるが、これらはそれぞれ水溶液に適した
化合物の形で添加される。 Examples of the aforementioned elements include titanium, niobium, molybdenum, rhenium, iron, cobalt, nickel, rhodium, palladium, copper, silver, silicon, and phosphorus, each of which is added in the form of a compound suitable for the aqueous solution. Ru.
これらの金属のうち、添加のしやすさ、錯化の
しやすさ、値段、機械的強度からみて、鉄、コバ
ルト、ニツケル、銅が適当であり、その金属イオ
ンの量は0.5g/〜10g/である。10g/
より多い場合は錯化が困難で不安定なメツキ浴と
なる。0.5g/未満であると機械的強度が出な
い。 Among these metals, iron, cobalt, nickel, and copper are suitable in terms of ease of addition, ease of complexation, price, and mechanical strength, and the amount of metal ions is 0.5g/~10g. / is. 10g/
If the amount is higher than that, complexation will be difficult and the resulting plating bath will be unstable. If it is less than 0.5g/, mechanical strength will not be achieved.
上記の金属を錯化する化合物の量は600〜750
g/である。600g/未満では、メツキ浴の
安定性、緩衝作用に乏しい。 The amount of compounds complexing the above metals is 600-750
g/. If it is less than 600g/, the stability and buffering effect of the plating bath will be poor.
第1図は、金15g/、スズ15g/で、クエ
ン酸の量をパラメーターとした時の電流密度−析
出皮膜の金組成を示す。この図からわかるよう
に、クエン酸の量が多いほど電流密度変化に対し
て析出合金組成の変化が少なくなり、また高電流
密度側でも安定なメツキが得られ、クエン酸量が
600g/を越えるとその効果は著しい。なお、
この効果はクエン酸以外の有機カルボン酸でも同
様に得られた。 FIG. 1 shows the current density-gold composition of the deposited film when the amount of gold was 15 g/tin and the amount of citric acid was used as a parameter. As can be seen from this figure, the larger the amount of citric acid, the smaller the change in the precipitated alloy composition with respect to changes in current density, and the more stable plating can be obtained even on the high current density side.
The effect is remarkable when it exceeds 600g/. In addition,
This effect was similarly obtained with organic carboxylic acids other than citric acid.
また750g/より多いときには、浴の粘性が
高くなるため実用的ではない。また錯化合物とし
ては上記金属をわずかでも錯化させるものであれ
ばよいが、リンゴ酸、クエン酸、グルコン酸、マ
ロン酸、マレイン酸などの有機カルボンがより好
ましい。これは、有機カルボン酸は緩衝作用が強
く、またシアン化金カリウムを酸性側でも安定に
存在させることができるためである。 Moreover, if the amount exceeds 750 g/g, it is not practical because the viscosity of the bath becomes high. The complex compound may be one that complexes the above-mentioned metal even slightly, but organic carboxylic acids such as malic acid, citric acid, gluconic acid, malonic acid, and maleic acid are more preferable. This is because organic carboxylic acids have a strong buffering effect, and gold potassium cyanide can be stably present even on the acidic side.
析出する合金組成は、浴中の各金属イオン濃
度、錯化合物濃度、PH、浴温および陰極電流密度
に依存する。浴が安定な範囲では、濃度の高い成
分が析出しやすく、全金属イオン量が大きいほど
析出速度は速い。錯化合物濃度は多いほど析出合
金組成が安定になり、浴そのものも安定化する。
PHは高いとスズの電着効率が金に比べて低くなる
が、析出物の外観はよくなる。PHがアルカリ側の
場合は第一スズイオンが不安定になるため浴のPH
は4〜6、好ましくは4.5±0.5がよい。PHが4未
満であればシアン化金が分解し、PHが6を越える
と第一スズが分解する。浴温は15〜90℃で使用可
能であり、高い方がメツキ外観は良くなり析出速
度は速くなるが、光沢剤、酸化防止剤の消耗は速
くなるので適正な浴温が決められる。 The alloy composition to be deposited depends on the concentration of each metal ion in the bath, the concentration of complex compounds, PH, bath temperature, and cathode current density. In a range where the bath is stable, components with high concentrations tend to precipitate, and the greater the total amount of metal ions, the faster the precipitation rate. The higher the complex compound concentration, the more stable the precipitated alloy composition becomes, and the more stable the bath itself becomes.
When the pH is high, the electrodeposition efficiency of tin is lower than that of gold, but the appearance of the deposit is improved. If the pH is on the alkaline side, stannous ions become unstable, so the pH of the bath
is 4 to 6, preferably 4.5±0.5. If the pH is less than 4, gold cyanide decomposes, and if the pH exceeds 6, stannous decomposes. A bath temperature of 15 to 90°C can be used; the higher the temperature, the better the plating appearance and the faster the precipitation rate, but the brightener and antioxidant will be consumed more quickly, so the appropriate bath temperature is determined.
陰極電流密度は0.1〜10A/dm2が実用的な範
囲である。電流密度が高いと析出合金組成はスズ
が多くなり電流密度が低いと金が多くなる。 The practical range of cathode current density is 0.1 to 10 A/dm 2 . If the current density is high, the precipitated alloy composition will be tin-rich, and if the current density is low, the deposited alloy composition will be gold-rich.
本発明によるメツキ浴は、ゼラチン、トルイジ
ン、フエニルアセトアミド、亜ヒ酸ナトリウム、
β−ナフトール、ペプトン、アセトアルデヒドと
o−トルイジンなどの反応生成物の少なくとも1
種を添加することによつて優れた光沢を得ること
ができる。添加量は1〜3g/である。1g/
未満では光沢が出なく、3g/を越えても効
果が余りなく、メツキ液を不安定にする。この光
沢剤の効果はメツキ作業温度が35℃以下で特に顕
著に現われる。これは、浴温が35℃以下では、ス
ズはなめらかな析出物を得ることができないため
である。また、これらの光沢剤はメツキ浴の安定
性、析出条件等にほとんど影響を与えない。 The plating bath according to the present invention contains gelatin, toluidine, phenylacetamide, sodium arsenite,
At least one of the reaction products such as β-naphthol, peptone, acetaldehyde and o-toluidine
Excellent shine can be obtained by adding seeds. The amount added is 1 to 3 g/. 1g/
If it is less than 3 g/g, no gloss will be produced, and if it exceeds 3 g/g, it will not be very effective and will make the plating solution unstable. The effect of this brightener is particularly noticeable when the plating temperature is below 35°C. This is because tin cannot form a smooth precipitate if the bath temperature is below 35°C. Furthermore, these brighteners have little effect on the stability of the plating bath, the precipitation conditions, etc.
一般に第一スズイオンは第二スズイオンに酸化
されやすい。第二スズイオンは析出に寄与しない
ばかりでなく均一電着性に悪影響のおよぼすた
め、メツキ浴に酸化防止剤を添加することが実用
上有効な手段である。酸化防止剤としては、硫酸
ヒドラジン、硫酸ヒドロキシルアミン、L−アス
コロビン酸、P−クレゾールスルホン酸、レゾル
シン、ホルマリン、ハイドロキノン、ソルビン酸
ソーダまたはブドウ糖が有効である。 Generally, stannous ions are easily oxidized to stannous ions. Since stannic ions not only do not contribute to precipitation but also have an adverse effect on uniform electrodeposition, it is a practically effective means to add an antioxidant to the plating bath. As the antioxidant, hydrazine sulfate, hydroxylamine sulfate, L-ascobic acid, P-cresolsulfonic acid, resorcinol, formalin, hydroquinone, sodium sorbate, or glucose are effective.
添加量は10〜50g/である。10g/未満で
は酸化防止効果が不十分であり、50g/を越え
ても余り効果がなく、メツキ液を不安定にする。
また、これらの酸化防止剤は、メツキ浴の安定
性、析出条件等に何ら悪影響を与えない。 The amount added is 10-50g/. If it is less than 10g/, the antioxidant effect is insufficient, and if it exceeds 50g/, it is not very effective and makes the plating solution unstable.
Furthermore, these antioxidants do not have any adverse effect on the stability of the plating bath, the precipitation conditions, etc.
このメツキ浴に用いる陽極は白金、カーボン、
チタン白金、チタンロジウムが望ましい。また、
陰極に対する陽極の面積比は2倍以上が望まし
い。 The anode used in this plating bath is platinum, carbon,
Titanium platinum and titanium rhodium are preferable. Also,
It is desirable that the area ratio of the anode to the cathode is twice or more.
また、このメツキ浴は、十分かくはんすること
によつて析出合金の外観、均一性が向上する。か
くはん方法としては、カソードロツキング、噴流
あるいはその作用がよく、空気かくはんは行なう
べきでない。 Further, by sufficiently stirring this plating bath, the appearance and uniformity of the precipitated alloy will be improved. As a stirring method, cathode locking, jet flow, or their effects are preferred; air stirring should not be used.
次に本発明の実施例を説明する。 Next, embodiments of the present invention will be described.
実施例 1
金(シアン化金カリウムとして) 20g/
スズ(硫酸第一スズとして) 50g/
リンゴ酸 600g/
ニツケル(硫酸ニツケルとして) 10g/
硫酸ヒドラジン 30g/
ゼラチン 1g/
ペプトン 0.5g/
ベンジリデンアセテート 0.5g/
PH 4.5
浴 温 20℃
陰極電流密度 6A/dm2
陽 極 チタン白金
メツキ時間 5分
上記メツキ浴組成、メツキ条件でかくはんしな
がらメツキを行なつたところ、金72%、スズ27.8
%、ニツケル0.2%、厚み12μmの半光沢の析出皮
膜が得られた。皮膜の外観は銀白色である。この
サンプルに金ワイヤをボンデイングして強度を測
定したところ、すべてワイヤ切れであつた。Example 1 Gold (as potassium gold cyanide) 20g / tin (as stannous sulfate) 50g / malic acid 600g / nickel (as nickel sulfate) 10g / hydrazine sulfate 30g / gelatin 1g / peptone 0.5g / benzylidene acetate 0.5g / PH 4.5 Bath temperature 20℃ Cathode current density 6A/dm 2 anode Titanium platinum plating time 5 minutes When plating was performed with stirring under the above plating bath composition and plating conditions, the result was 72% gold and 27.8% tin.
%, nickel 0.2%, and a thickness of 12 μm, a semi-gloss deposited film was obtained. The appearance of the film is silvery white. When gold wire was bonded to this sample and its strength was measured, all wires were broken.
実施例 2
金(シアン化金カリウムとして) 35g/
スズ(塩化第一スズとして) 50g/
クエン酸 600g/
コバルト(塩化コバルトとして) 0.5g/
ホルマリン 10c.c./
トルイジン 2g/
PH 4.5
浴 温 20℃
陰極電流密度 2A/dm2
陽 極 カーボン
メツキ時間 5分
上記メツキ浴組成、メツキ条件でメツキを行な
つたところ、金85%、スズ14.9%、コバルト0.1
%、厚み4μmのナシ地の析出皮膜が得られた。
皮膜の外観は銀白色である。Example 2 Gold (as gold potassium cyanide) 35g / Tin (as stannous chloride) 50g / Citric acid 600g / Cobalt (as cobalt chloride) 0.5g / Formalin 10c.c. / Toluidine 2g / PH 4.5 Bath temperature 20 °C Cathode current density 2A/dm 2 anodes Carbon plating time 5 minutes When plating was performed with the above plating bath composition and plating conditions, the results were 85% gold, 14.9% tin, and 0.1% cobalt.
%, a blank deposited film with a thickness of 4 μm was obtained.
The appearance of the film is silvery white.
実施例 3
金(シアン化金カリウムとして) 50g/
スズ(硫酸第一スズとして) 20g/
マロン酸 600g/
銅(硫酸銅として) 5g/
硫酸ヒドロキシルアミン 50g/
β−ナフトール 1g/
PH 4.5
浴 温 45℃
陰極電流密度 1A/dm2
陽 極 チタン白金
メツキ時間 5分
上記メツキ浴、メツキ条件でメツキを行なつた
ところ、金92%、スズ7.8%、銅0.2%、厚み2.5μ
mの光沢ある析出皮膜が得られた。皮膜の外観は
黄味を帯びた銀白色である。Example 3 Gold (as gold potassium cyanide) 50g / Tin (as stannous sulfate) 20g / Malonic acid 600g / Copper (as copper sulfate) 5g / Hydroxylamine sulfate 50g / β-naphthol 1g / PH 4.5 Bath temperature 45 °C Cathode current density 1A/dm 2 anodes Titanium platinum plating time 5 minutes When plating was performed using the above plating bath and plating conditions, the results were as follows: 92% gold, 7.8% tin, 0.2% copper, thickness 2.5μ
A shiny deposited film of m was obtained. The appearance of the film is yellowish silvery white.
実施例 4
金(シアン化金カリウムとして) 20g/
スズ(塩化第一スズとして) 20g/
リンゴ酸 750g/
鉄(塩化第一鉄として) 1g/
P−クレゾールスルホン酸 50g/
o−トルイジン 3g/
PH 4.5
浴 温 45℃
陰極電流密度 4A/dm2
陽 極 チタン白金
メツキ時間 5分
上記メツキ浴組成、メツキ条件でメツキを行な
つたところ、金80%、スズ18.8%、鉄0.2%、厚
み8μmの析出皮膜が得られた。この皮膜は光沢
があり、硬度185で銀白色を呈する。Example 4 Gold (as potassium gold cyanide) 20g/tin (as stannous chloride) 20g/malic acid 750g/iron (as ferrous chloride) 1g/P-cresolsulfonic acid 50g/o-toluidine 3g/PH 4.5 Bath temperature 45℃ Cathode current density 4A/dm 2 Anode Titanium platinum plating time 5 minutes When plating was carried out using the above plating bath composition and plating conditions, 80% gold, 18.8% tin, 0.2% iron, and a thickness of 8 μm. A deposited film was obtained. This film is shiny, has a hardness of 185, and is silvery white.
実施例 5
金(シアン化金カリウムとして) 35g/
スズ(硫酸第一スズとして) 50g/
クエン酸 750g/
コバルト(硫酸コバルトとして) 5g/
ハイドロキシン 30g/
亜ヒ酸ナトリウム 1g/
PH 4.5
浴 温 45℃
陰極電流密度 2A/dm2
陽 極 チタン白色
メツキ時間 5分
上記メツキ浴組成、メツキ条件でメツキを行な
つたところ、金88%、スズ11.6%、コバルト0.4
%、厚み4.5μmの光沢ある析出皮膜が得られた。
この皮膜の外観は銀白色である。Example 5 Gold (as gold potassium cyanide) 35g / Tin (as stannous sulfate) 50g / Citric acid 750g / Cobalt (as cobalt sulfate) 5g / Hydroxine 30g / Sodium arsenite 1g / PH 4.5 Bath temperature 45 °C Cathode current density 2A/dm 2 anode Titanium white plating time 5 minutes When plating was performed with the above plating bath composition and plating conditions, the results were 88% gold, 11.6% tin, and 0.4% cobalt.
%, a glossy deposited film with a thickness of 4.5 μm was obtained.
The appearance of this film is silvery white.
実施例 6
金(シアン化金カリウムとして) 50g/
スズ(塩化第一スズとして) 50g/
マロン酸 750g/
ニツケル(塩化ニツケルとして) 5g/
レゾルシン 50g/
β−ナフトール 2g/
PH 4.5
浴 温 45℃
陰極電流密度 4A/dm2
陽 極 チタン白色
メツキ時間 5分
上記のメツキ浴組成、メツキ条件でメツキを行
なつたところ、金83%、スズ16.5%、ニツケル
0.5%、厚み9μmの光沢ある析出皮膜が得られた。Example 6 Gold (as potassium gold cyanide) 50g / Tin (as stannous chloride) 50g / Malonic acid 750g / Nickel (as nickel chloride) 5g / Resorcinol 50g / β-naphthol 2g / PH 4.5 Bath temperature 45°C Cathode Current density 4A/dm 2 anodes Titanium white plating time 5 minutes When plating was performed with the above plating bath composition and plating conditions, the results were 83% gold, 16.5% tin, and nickel.
A glossy precipitated film containing 0.5% and a thickness of 9 μm was obtained.
以上に述べた実施例は本発明の一部であり、こ
れは本発明を限定するものではない。 The embodiments described above are part of the invention and are not intended to limit the invention.
次に、本発明によつて得られる効果を次に挙げ
る。 Next, the effects obtained by the present invention will be listed below.
(1) メツキ浴が安定である。(1) Metsuki bath is stable.
シアン化金カリウムおよび錯化剤は多いほど
メツキ浴を安定化するが、前者は20g/を越
え、後者は600g/を越えるとその効果が著
しい。また、金、錯化剤とも多い方が析出組成
の電流密度による変化が少なくなり、その効果
はともに多い場合は相乗的に現われる。 The larger the amount of potassium gold cyanide and complexing agent, the more stabilized the plating bath will be, but the effect is significant when the amount of the former exceeds 20 g/and the latter exceeds 600 g/. Furthermore, the more gold and complexing agent there are, the less changes in the deposited composition due to current density will occur, and the effect will be synergistic when both are present in large amounts.
(2) 優れた光沢が得られ、厚メツキによつても光
沢性、均一性、密着性に変化がない。(2) Excellent gloss is obtained, and there is no change in gloss, uniformity, or adhesion even with thick plating.
(3) 金−スズ合金に第3元素を添加することよつ
て、硬度が増加する。(3) Hardness increases by adding a third element to the gold-tin alloy.
(4) 金属成分が高いため、高速メツキが可能であ
る。(4) High-speed plating is possible due to the high metal content.
(5) 浴組成、電流密度によつて析出合金組成を任
意に、かつ広範囲に変化させることができる。(5) The composition of the precipitated alloy can be changed arbitrarily and over a wide range by changing the bath composition and current density.
(6) 常温でもすぐれた析出物を得ることができ
る。(6) Excellent precipitates can be obtained even at room temperature.
これは、メツキ浴の安定性をさらに高める効
果をもつ。 This has the effect of further increasing the stability of the plating bath.
(7) 浴濃度が減少した場合、濃厚な補充液をあら
かじめつくつておいてこれを補充すればよく、
長時間の使用が可能である。(7) If the bath concentration decreases, you can prepare a concentrated replenisher solution in advance and replenish it.
Can be used for a long time.
本発明によるメツキ浴は上記に述べたように顕
著な諸効果を示す。このメツキ浴の用途として
は、次のようなものが挙げられる。 The plating bath according to the present invention exhibits remarkable effects as described above. The uses of this plating bath include the following.
(a) 硬度の高い装飾用金色合金メツキ
(b) 硬度の高い装飾用ホワイトゴールドメツキ
金とスズの組成を変化させることによつて金
色から白色まで巾広い色調を得ることができ、
析出物の硬度も高いので装飾用メツキとして利
用できる。具体的には、優れた外観、硬度、耐
食性が求められる腕時計、メガネフレームおよ
びネツクレス等の装飾飾品などに用いることが
できる。(a) Decorative gold alloy plating with high hardness (b) Decorative white gold plating with high hardness By changing the composition of gold and tin, a wide range of color tones from gold to white can be obtained.
The hardness of the precipitates is high, so they can be used as decorative plating. Specifically, it can be used for decorative accessories such as wristwatches, eyeglass frames, and net dresses that require excellent appearance, hardness, and corrosion resistance.
(c) 低品位、高強度の電気接点材料
優れた耐摩耗性、耐食性、導電性を利用した
電気接点材料として用いることができる。(c) Low-grade, high-strength electrical contact material Can be used as an electrical contact material that takes advantage of its excellent wear resistance, corrosion resistance, and conductivity.
(d) ボンデイング用メツキ
金にスズを適量添加することによつて融点は
著しく低下する。これを利用してICのワイヤ
ボンデイングが行なわれるリードフレームへ用
いることができる。従来の純金メツキに比べ、
金相が低下すると同時に、ボンデイング時の加
熱温度を下げることができるためサイクルタイ
ムを短縮できるという利点がある。(d) Plating for bonding By adding an appropriate amount of tin to gold, the melting point is significantly lowered. Utilizing this, it can be used in lead frames where IC wire bonding is performed. Compared to traditional pure gold plating,
At the same time as the gold phase is lowered, the heating temperature during bonding can be lowered, which has the advantage of shortening the cycle time.
(e) 低融点、高強度ろう材
金80%、スズ20%の合金およびこれに第3元
素が添加された合金は融点がほぼ300℃前後で
強度がハンダ類の十倍以上とすぐれている。(e) Low melting point, high strength brazing filler metal Alloys of 80% gold and 20% tin, as well as alloys to which a third element is added, have a melting point of approximately 300°C and a strength ten times higher than that of solder. .
ろう材メツキの用途として具体的には次のよ
うなものがある。腕時計などの水晶振動子にお
いてプラグ先端のリード線に本発明のメツキを
施し、加熱溶融して水晶振動子をリード線にろ
う付する場合、また、水晶振動子を封入するパ
ツケージにおいて、パツケージに本発明のメツ
キを施して加熱溶融し、パツケージをろう付封
止する場合がある。また、ICチツプとテープ
キヤリア方式の導電用フインガー部のろう付と
してチツプ又はフインガー部に本発明を施す場
合、同じくフエイスダウンと呼ばれる半導体実
装方法において、回路基板とICチツプのろう
付としてチツプ又は回路基板に本発明のメツキ
を施す場合等がある。 Specific uses for brazing metal plating include the following. When the lead wire of the plug tip of a crystal resonator such as a wristwatch is coated with the plating of the present invention, heated and melted to braze the crystal resonator to the lead wire, and when the crystal resonator is enclosed in a package, the plating of the present invention is applied to the lead wire at the tip of the plug. In some cases, the plating of the invention is applied, the material is heated and melted, and the package is sealed by brazing. In addition, when the present invention is applied to a chip or a finger part for brazing an IC chip and a conductive finger part of a tape carrier method, it is also possible to apply the present invention to a chip or a finger part for brazing a circuit board and an IC chip in a semiconductor mounting method called face-down. There are cases where a substrate is plated according to the present invention.
この金とスズを主成分とした合金メツキをろ
う材として用いる場合、析出物の成分組成は金
がほぼ10〜85%、スズがほぼ15〜90%、第3元
素の1種以上の合計が0〜60%で融点は280℃
〜550℃、メツキ厚み2μm以上であれば可能で
ある。 When this alloy plating mainly composed of gold and tin is used as a brazing material, the composition of the precipitates is approximately 10-85% gold, approximately 15-90% tin, and a total of one or more third elements. 0-60%, melting point is 280℃
This is possible as long as the temperature is ~550°C and the plating thickness is 2 μm or more.
以上述べたように、本発明による金合金メツキ
浴は装飾用メツキ、機能メツキおよびろう材メツ
キなどさまざまな用途に使用できるため、実用上
極めて有用な発明である。 As described above, the gold alloy plating bath according to the present invention can be used for various purposes such as decorative plating, functional plating, and brazing material plating, and is therefore an extremely useful invention in practice.
第1図はクエン酸をパラメーターとした時の電
流密度−析出皮膜の金組成図を示す。
FIG. 1 shows a current density-gold composition diagram of a deposited film when citric acid is used as a parameter.
Claims (1)
g/と、鉄(Fe)、コバルト(Co)、ニツケル
(Ni)、銅(Cu)のうちの少なくとも1種の金属
が0.5〜10g/と、第一スズが20〜50g/と、
前記金属を錯化する少なくとも一種類の化合物が
600〜750g/と、光沢剤が1〜3g/と、前
記第一スズの酸化防止剤の少なくとも1種が10〜
50g/とが添加され、PHが4〜6であることを
特徴とする金合金メツキ浴。[Claims] 1. In an aqueous bath suitable for electrodeposition of a gold alloy, the amount of gold added as potassium gold cyanide is 20 to 50%.
g/, at least one metal of iron (Fe), cobalt (Co), nickel (Ni), copper (Cu) is 0.5 to 10 g/, and stannous is 20 to 50 g/,
at least one compound that complexes the metal;
600 to 750 g/brightener, 1 to 3 g/brightener, and at least one of the stannous antioxidants 10 to 750 g/b
A gold alloy plating bath characterized in that 50 g/g/g/g of gold is added and the pH is 4 to 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8124180A JPS575886A (en) | 1980-06-16 | 1980-06-16 | Gold alloy plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8124180A JPS575886A (en) | 1980-06-16 | 1980-06-16 | Gold alloy plating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS575886A JPS575886A (en) | 1982-01-12 |
| JPS6312955B2 true JPS6312955B2 (en) | 1988-03-23 |
Family
ID=13740921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8124180A Granted JPS575886A (en) | 1980-06-16 | 1980-06-16 | Gold alloy plating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS575886A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3405105C1 (en) * | 1984-02-14 | 1985-04-25 | Karl 7298 Loßburg Hehl | Oil container of a plastic injection molding machine with an air filter on a pressure compensation opening |
| EP1308541A1 (en) * | 2001-10-04 | 2003-05-07 | Shipley Company LLC | Plating bath and method for depositing a metal layer on a substrate |
-
1980
- 1980-06-16 JP JP8124180A patent/JPS575886A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS575886A (en) | 1982-01-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4168214A (en) | Gold electroplating bath and method of making the same | |
| JP2645701B2 (en) | Palladium alloy plating composition and plating method | |
| US4681670A (en) | Bath and process for plating tin-lead alloys | |
| US4076598A (en) | Method, electrolyte and additive for electroplating a cobalt brightened gold alloy | |
| US4640746A (en) | Bath and process for plating tin/lead alloys on composite substrates | |
| KR20080052479A (en) | Electroless Gold Plating, Electroless Gold Plating Methods and Electronic Components | |
| US6743346B2 (en) | Electrolytic solution for electrochemical deposit of palladium or its alloys | |
| US20050249969A1 (en) | Preserving solderability and inhibiting whisker growth in tin surfaces of electronic components | |
| US20080261071A1 (en) | Preserving Solderability and Inhibiting Whisker Growth in Tin Surfaces of Electronic Components | |
| EP2730682B1 (en) | Alkaline, cyanide-free solution for electroplating of gold alloys, a method for electroplating and a substrate comprising a bright, corrosion-free deposit of a gold alloy | |
| JPS62278293A (en) | Production of electronic parts | |
| US3770596A (en) | Gold plating bath for barrel plating operations | |
| JPS6312955B2 (en) | ||
| JP2001200387A (en) | Tin-indium alloy electroplating bath | |
| JPS6312956B2 (en) | ||
| JPS609117B2 (en) | gold alloy plating bath | |
| JPH0571673B2 (en) | ||
| JPS61223194A (en) | Electrodeposition bath of gold/tin alloy film | |
| CN100548090C (en) | Method for maintaining solderability and inhibiting whisker growth in tin surfaces of electronic components | |
| JPH0565659A (en) | Electroless copper-nickel alloy plating method | |
| WO2004001101A2 (en) | Electrolytic bath for the electrodeposition of noble metals and their alloys | |
| JPS6312954B2 (en) | ||
| JPH0711477A (en) | Noble metal plated article | |
| JPS6115992A (en) | Gold-tin alloy plating bath and plating method | |
| JPH07233496A (en) | Silver-palladium alloy plating method and plating bath |