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JPS6320910B2 - - Google Patents
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JPS6320910B2 - - Google Patents

Info

Publication number
JPS6320910B2
JPS6320910B2 JP59122418A JP12241884A JPS6320910B2 JP S6320910 B2 JPS6320910 B2 JP S6320910B2 JP 59122418 A JP59122418 A JP 59122418A JP 12241884 A JP12241884 A JP 12241884A JP S6320910 B2 JPS6320910 B2 JP S6320910B2
Authority
JP
Japan
Prior art keywords
container
taper
side wall
evaporation
evaporation source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59122418A
Other languages
Japanese (ja)
Other versions
JPS6017071A (en
Inventor
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59122418A priority Critical patent/JPS6017071A/en
Publication of JPS6017071A publication Critical patent/JPS6017071A/en
Publication of JPS6320910B2 publication Critical patent/JPS6320910B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は、電子ビーム加熱式の蒸発源用容器に
関し、耐火物から成る大型容器の実用性能の改良
を目的とするものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam heating type evaporation source container, and an object of the present invention is to improve the practical performance of a large container made of a refractory material.

近年、真空蒸着技術の進歩は著しく、短波長記
録に適した蒸着テープも開発され、一部実用に供
されるに至つている。一方磁気テープの消費量の
増大は極めて急で、大量生産技術としての蒸着技
術の改良が強く望まれている。
In recent years, vacuum evaporation technology has made remarkable progress, and evaporation tapes suitable for short wavelength recording have been developed, and some of them have come into practical use. On the other hand, the consumption of magnetic tape is increasing extremely rapidly, and there is a strong desire to improve vapor deposition technology as a mass production technology.

従来の容器を第1図a,bに示す。図に示すよ
うに、容器1は、溶融金属を保持できるようなプ
ール2を有しているが、この断面形状は、図bに
示すように側壁3がテーパaを有し、底面4が水
平であつた。ところでかかる容器を用い、蒸発材
としてCoを選びCoを15Kg溶解して蒸着に供しよ
うとすると、耐火物容器が大型化するので分割し
たものをつきあわせることがよく行われるが、水
平を完全に保持することは困難である。とりわ
け、くり返し使用を試みた場合、熱変形するのを
始めとし水平性がくずれてくる。
A conventional container is shown in FIGS. 1a and 1b. As shown in the figure, the container 1 has a pool 2 capable of holding molten metal, and its cross-sectional shape is such that the side wall 3 has a taper a and the bottom surface 4 is horizontal, as shown in figure b. It was hot. By the way, if you use such a container to melt 15 kg of Co as the evaporator and use it for evaporation, the refractory container will become larger, so it is common to divide the container into pieces and butt them together. Difficult to hold. In particular, if you try to use it repeatedly, it will become thermally deformed and lose its horizontality.

このとき、溶融金属と容器を構成する耐火物
(酸化物、窒化物等)との高温での濡れ性により、
溶融金属が少なくなるに従つて、プールの底部に
不均一に溶融金属が局所化し、耐火物底部表面が
露出する不都合が生じていた。
At this time, due to the high-temperature wettability between the molten metal and the refractory material (oxide, nitride, etc.) that makes up the container,
As the amount of molten metal decreases, the molten metal is unevenly localized at the bottom of the pool, resulting in the inconvenience that the bottom surface of the refractory is exposed.

本発明は従来におけるこのような問題を解消し
ようとするもので以下に図面を用いその実施例を
説明する。
The present invention aims to solve such problems in the prior art, and embodiments thereof will be described below with reference to the drawings.

第2図に本発明の一実施例を示すように底面
4′が曲面で構成されている。その曲率Rがひと
つであるか、複数の曲率であるかは本発明の決定
的要素ではなく、テーパ部の終端からほぼ滑らか
な曲面でつながれるのが好ましい。なお、側壁面
3′におけるテーパの角度βとγは等しくてもよ
いが、同軸タイプの電子銃による加速電子を用い
る場合はむしろ非対称の方が好ましい。
As shown in FIG. 2 in an embodiment of the present invention, the bottom surface 4' is formed of a curved surface. Whether the curvature R is one or multiple curvatures is not a determining factor of the present invention, and it is preferable that the tapered portion is connected from the end with a substantially smooth curved surface. Although the taper angles β and γ of the side wall surface 3' may be equal, it is preferable that they be asymmetrical if accelerated electrons from a coaxial type electron gun are used.

これは、蒸発原子の角度分布、いわゆる蒸気分
布とも関係して、蒸着効率のみならず蒸着による
磁気テープの製造の場合には、磁気特性にも関係
して、重要な役割を果すためである。第3図に示
すように、テープ基材5が回転キヤン6の周面に
沿つて捲き取られる状態で蒸着する時には、容器
の側壁面3′におけるテーパの角度βとγが互い
に異なる非対称なものが好ましい。
This is because it is related to the angular distribution of evaporated atoms, so-called vapor distribution, and plays an important role not only in vapor deposition efficiency but also in magnetic properties in the case of manufacturing magnetic tapes by vapor deposition. As shown in FIG. 3, when the tape base material 5 is rolled up along the circumferential surface of the rotary can 6 for vapor deposition, an asymmetric tape base material 5 is used, in which the taper angles β and γ on the side wall surface 3' of the container are different from each other. is preferred.

即ち、回転キヤン6が矢印Aの方向に回転し
て、基材5が送り出し軸7から捲き取り軸8へ移
動し、マスク9で制限した蒸気で蒸着を行う時、
加速電子9により加熱される溶融金属10を保持
する容器11の側壁面3′におけるテーパβとγ
との関係がこの場合でいうとβ>γであるような
非対称が好ましい。
That is, when the rotary can 6 rotates in the direction of the arrow A, the substrate 5 moves from the feed shaft 7 to the winding shaft 8, and vapor deposition is performed using vapor restricted by the mask 9.
Tapers β and γ in the side wall surface 3' of the container 11 holding the molten metal 10 heated by the accelerated electrons 9
In this case, an asymmetrical relationship such that β>γ is preferable.

第4図に実験例を示したように、γ=10゜,
15゜,20゜にして、β/γをパラメータにして、厚
さ14μのポリエチレンテレフタレート上に、3×
10-5(Torr)の酸素中で、最小入射角36度でCo−
Ni(Ni20wt%)を同軸電子ビームで(30KV,
100KW)加熱蒸発させ蒸着した0.1μmの膜の保
磁力をβ=γの時の保磁力で規格化した値は、β
>γで1より大きくなつている。これは、斜めに
溶湯に入射する電子ビームでできる凹みが、テー
パの差により温度分布に非対称性がでて、電子ビ
ームが垂直側に立ち上つたような凹みとなるた
め、蒸気流分布が真上に大量蒸発部が移動するた
め、結晶性がよくなり保磁力が増大するものと推
察される。
As shown in the experimental example in Figure 4, γ=10°,
15°, 20°, β/γ as a parameter, 3×
Co− in oxygen at 10 −5 (Torr) with a minimum angle of incidence of 36 degrees.
Ni (Ni20wt%) was deposited with a coaxial electron beam (30KV,
100KW) The value of the coercive force of a 0.1 μm film deposited by heating and evaporation, normalized by the coercive force when β = γ, is β
>γ is larger than 1. This is because the dent created by the electron beam entering the molten metal at an angle creates an asymmetrical temperature distribution due to the difference in taper, creating a dent that looks like the electron beam is rising vertically, so the vapor flow distribution is not true. It is presumed that because the mass evaporation part moves upward, the crystallinity improves and the coercive force increases.

以上のような構造の容器を蒸発源用容器として
用い、Co,Co−Ni等の金属を8Kg〜22Kg溶融保
持せしめたところ、金属の使用率が85〜88%まで
高められ、くり返し寿命も従来の5倍〜10倍にま
で延びた。なお従来の容器における金属の使用率
は60%〜70%であつた。
When a container with the above structure was used as an evaporation source container to melt and hold 8 kg to 22 kg of metal such as Co, Co-Ni, etc., the metal usage rate was increased to 85 to 88%, and the repeated life was also shorter than that of the previous one. It has increased by 5 to 10 times. Note that the usage rate of metal in conventional containers was 60% to 70%.

本発明によると以上のように溶融物の使用率が
高くかつ耐久性にきわめてすぐれたものとするこ
とができる。
According to the present invention, as described above, the usage rate of the molten material is high and the durability is extremely excellent.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a,bはそれぞれ従来の蒸発源用容器の
斜視図および断面図、第2図は本発明の一実施例
である蒸発源用容器の断面図、第3図は上記蒸発
源用容器を磁気テープの製造に用いた場合を示す
一部断面図、第4図はテーパの角度比に対する規
格化保持力の特性図である。 3,3′……側壁面、4,4′……底面。
1a and b are respectively a perspective view and a sectional view of a conventional evaporation source container, FIG. 2 is a sectional view of an evaporation source container according to an embodiment of the present invention, and FIG. 3 is a sectional view of the evaporation source container described above. FIG. 4 is a partial cross-sectional view showing the case where the magnetic tape is used in manufacturing a magnetic tape, and FIG. 4 is a characteristic diagram of the normalized holding force with respect to the taper angle ratio. 3, 3'... side wall surface, 4, 4'... bottom surface.

Claims (1)

【特許請求の範囲】[Claims] 1 収納部側壁面が開口部側に向つて開くテーパ
を有するとともに同収納部底面が下に凸の曲面か
らなり、かつ同軸電子ビームが斜めに入射する側
のテーパ角度が反対側のテーパ角度より大きいこ
とを特徴とする蒸発源用容器。
1 The side wall surface of the storage section has a taper that opens toward the opening side, and the bottom surface of the storage section has a downwardly convex curved surface, and the taper angle on the side where the coaxial electron beam is obliquely incident is greater than the taper angle on the opposite side. An evaporation source container characterized by its large size.
JP59122418A 1984-06-14 1984-06-14 Evaporation source container Granted JPS6017071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59122418A JPS6017071A (en) 1984-06-14 1984-06-14 Evaporation source container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59122418A JPS6017071A (en) 1984-06-14 1984-06-14 Evaporation source container

Publications (2)

Publication Number Publication Date
JPS6017071A JPS6017071A (en) 1985-01-28
JPS6320910B2 true JPS6320910B2 (en) 1988-05-02

Family

ID=14835332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59122418A Granted JPS6017071A (en) 1984-06-14 1984-06-14 Evaporation source container

Country Status (1)

Country Link
JP (1) JPS6017071A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN209619438U (en) * 2019-01-17 2019-11-12 云谷(固安)科技有限公司 A kind of evaporation source and evaporated device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5333873B2 (en) * 1973-03-16 1978-09-18
JPS51151684A (en) * 1975-06-23 1976-12-27 Fuji Xerox Co Ltd Evaporating source for vacuum evaporation

Also Published As

Publication number Publication date
JPS6017071A (en) 1985-01-28

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