JPS633009B2 - - Google Patents
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- Publication number
- JPS633009B2 JPS633009B2 JP60207757A JP20775785A JPS633009B2 JP S633009 B2 JPS633009 B2 JP S633009B2 JP 60207757 A JP60207757 A JP 60207757A JP 20775785 A JP20775785 A JP 20775785A JP S633009 B2 JPS633009 B2 JP S633009B2
- Authority
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- Prior art keywords
- annealing
- steel
- partial pressure
- oxygen partial
- steel sheet
- Prior art date
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- Expired
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D8/00—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
- C21D8/1277—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties involving a particular surface treatment
- C21D8/1283—Application of a separating or insulating coating
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
- Heat Treatment Of Sheet Steel (AREA)
Description
〔産業上の利用分野〕
本発明は特にフオルステライト皮膜の良好な一
方向性電磁鋼板の製造方法に関するものである。
〔従来の技術〕
一方向性電磁鋼板は主にトランス鉄心に用いら
れる軟磁性材料である。この種の鋼板は透磁率を
磁束の流れる方向にのみ著しく高める目的で磁化
容易軸が圧延方向に対し数度の範囲内にそろつた
結晶粒((110)〔001〕方位粒)により構成され、
また成分的にはSiを含有することにより固有抵抗
を高め、ジユール熱に起因する鉄損を低減してい
る。その表面には鋼板製造過程の脱炭焼鈍時に選
択酸化されたSiO2とその上に塗布されたMgOと
が仕方焼鈍時に固相反応することにより生じたフ
オルステライト、MgSiO4、が数μmの厚さで付
着しており、絶縁皮膜の役目を果たすとともに、
磁区の細分化を行ない。磁気特性的にも重要な役
割りを任つている。通常はさらに張力付加の目的
でコロイダルシリカを主体とした2次皮膜が施さ
れた後、トランス鉄心として利用されている。こ
のような観点からすれば一方向性電磁鋼板は圧延
方向に、(110)〔001〕方位を持つ結晶粒によりお
おわれ、表層部にフオルステライトを主体とする
セラミツクス皮膜及び2次皮膜を有する複合材料
であると言える。
さて、このような一方向性電磁鋼板における
(110)〔001〕方位の高い集積度の達成と、酸化物
系セラミツクスであるところのフオルステライト
皮膜の生成は通常、最終仕上焼鈍と呼ばれるBox
焼鈍中ほぼ時期を同じくして起こる。前者は2次
再結晶と呼ばれる(110)〔001〕方位粒の異常粒
成長、後者は鋼板表面におけるSiO2−MgO系固
相反応により達成され、この2つの反応は本質的
にまつたく異つた現象であるにもかかわらず、関
接的に干渉しあいながら現実の反応は進行してい
る。
周知のようにフオルステライト、Mg2SiO4、
はMgOがMg++とO--の形でSiO2中に侵入するこ
とにより生成する(G.W.Brindley&R.Hayami
Phil、Mag.12、505(1965))。方向性電磁鋼板製
造に関する研究分野においては、この反応系に
MnO2、TiO2、B2O3、CaO、Sr化合物などの物
質が微量存在することにより、生成したフオルス
テライトの性質が変わることが経験的に知られて
いる。例えば特公昭51−12450号公報において
MnO2の添加が、同51−12451号公報において
TiO2の添加がそれぞれ開示された。また、特公
昭57−32716号公報、特開昭55−89422号公報及び
特開昭56−75577号公報においてSr化合物のフオ
ルステライト皮膜特性に及ぼす効果が開示され
た。特開昭54−66935号公報ではMgOを主体とし
た焼鈍分離済中に含まれるCaO成分の量に応じて
主に水酸化マグネシウムの形で持ちこまれる水分
量を管理する方法が開示されている。
これらの微量添加物がどのようなメカニズムで
MgO−SiO2系固相反応の反応メカニズムに影響
を及ぼし、また生成したフオルステライトの結晶
粒度、フオルステライト結晶粒で構成されるいわ
ゆるフオルステライト皮膜と鋼板との密着性など
の諸性質を変化させているかということは現時点
で必ずしも明らかになつていない。しかし、これ
らの物質が共通してMgO、SiO2、Mg2SiO4など
MgO−SiO2系酸化物の融点を下げる性質を具備
していることから、これらの添加物はMg++や
O--の拡散速度を速める形で反応に寄与している
ものと考えられている。また、場合によつては通
常の方向性電磁鋼板の仕上焼鈍の最高温度1200℃
付近において、一部液相を形成することにより系
の反応速度を著しく高めていると推測されてい
る。
さて、本発明者らは先に、このフオルステライ
ト形成反応時に鋼中のMn活量と雰囲気の酸素分
圧(PH2O/PH2で表わす)を制御することによ
り、フオルステライト結晶粒度が小さく、皮膜の
密着性が良好で、皮膜が鋼板に与える張力が従来
の技術によつて得られるもの以上に大きいフオル
ステライト皮膜を形成する方法を開示した(特願
昭59−53819号)。この方法は、焼鈍分離材中に添
加する微量添加物により皮膜の性質向上を図つて
きたこれまでの方法と異なり、鋼中の成分、すな
わちMn活量と外部雰囲気の酸素分圧により皮膜
の特性向上を狙うものである。そのメカニズムの
ポイントはMgO−SiO2固相反応時に高温酸化に
よりMnOを生成させるところにあると考えられ、
微量添加物の種類が少なくて済む工業的観点から
も従来技術と異つた特徴を持つものといえる。
〔本発明が解決しようとする問題点〕
ところがこの本発明者らにより開示された技術
を10トン、20トンという単重の大きなコイルにお
いて実施する段階で、良好なフオルステライト皮
膜の近傍に、一般にしもふりと呼ばれる地金の露
出した皮膜欠陥部が多発することが判明した。こ
れらの皮膜欠陥は成品外観を悪くするだけでな
く、絶縁特性や鋼板に与える張力の劣化という磁
気特性的にも好ましくない影響を与える。
〔問題点を解決するための手段〕
本発明の目的は良好なフオルステライト皮膜の
生成を目的とした本発明者らによる特願昭59−
53819号においてその後発生したこれらの問題点
を除去改善し、単重の大きなコイルにおいて良好
なフオルステライト皮膜を形成しうる仕上焼鈍方
法を提供することにある。
すなわち本発明は重量でC:0.025%〜0.075
%、Si:3.0%〜4.5%、酸可溶性Al:0.010〜
0.060%、N:0.0030%〜0.0130%、S≦0.010%、
およびMnを0.8%≧Mn≧0.05+7×(S+
0.405Se)なる関係を満足する如く含有し、又、
必要によりCr:0.07−0.25%を含有し、残部Feお
よび不可避的不純物からなるスラブから出発し、
通常の方法で一方向性電磁鋼板を作成する方法に
おいて、仕上焼鈍開始から650℃までの温度範囲
の雰囲気の酸素分圧(PH2O/PH2)を0.015以下
と限定し、かつ脱炭焼鈍板にマグネシアを主体と
した焼鈍分離剤を塗布する工程において、焼鈍分
離剤をスラリー状にした後、塗布・乾燥する下塗
り塗布量を片面4g/m2以下にし、その上に3〜
6g/m2(片面)のマグネシアを静電塗装するい
わゆる静電塗装法を並用することによりフオルス
テライト皮膜に発生する欠陥を除去する方法を提
供するものである。この方法に加え、仕上焼鈍中
800〜900℃の温度域で鋼板を10〜30時間保定する
ことにより、皮膜欠陥部の除去はより完全とな
り、また800〜900℃の温度域から1100℃までの昇
温時の酸素分圧を鋼中のMn及びS、Se量に対し
て特定の範囲に規定することにより皮膜特性が向
上することが明らかとなつた。
以下、本発明を詳細に説明する。
第2図はC:0.055%、Si:3.25%、Mn:0.18
%、S:0.006%、P:0.02%、Al:0.03%、N:
0.007%を含有する8cm×8cmの大きさの冷延板
を湿水素雰囲気中で脱炭焼鈍した後、TiO2を5
重量部含んだマグネシアを主成分とする焼鈍分離
材を片面7g/m2塗布し、仕上焼鈍を行なつた後
得られたフオルステライト皮膜に現れたしもふり
状皮膜欠陥の発生頻度を示したものである。この
実験で仕上焼鈍雰囲気はN225%、H275%とし、
かつ650℃に至るまでの酸素分圧をパラメータと
して種々の値に設定した。この実験からしもふり
状皮膜欠陥の発生頻度は仕上焼鈍前半の雰囲気の
酸素分圧がPH2O/PH2で0.015を越える時に特に
著しいことが判明した。また、鋼中のMn活量の
違う素材について脱炭焼鈍時の露点を変化させて
同様の実験を行なつたところ、この種の皮膜欠陥
はMn活量の高い材料においてその発生頻度が高
く、さらに脱炭焼鈍時の酸素分圧が高い場合に発
生しやすいことがわかつた。
本発明者らはこれらの皮膜欠陥の発生状況を詳
細に調査し、次の結論を得た。すなわち、これら
の皮膜欠陥は1200℃付近の高温焼鈍の際、フオル
ステライトを構成するところのMgOとSiO2、あ
るいは焼鈍分離材中に意図的に加えられるTiO2
やB、不可避的に混入するNa2Oなどアルカリあ
るいはアルカリ土類酸化物、そして鋼中成分が高
温酸化することにより生成するFeO、MnO、
Al2O3など、これらの複合酸化物系の組成が、共
晶点が1200℃以下の共晶組成を満たしたことによ
り生ずる溶融物形成に起因する。そして仕上焼鈍
前半650℃までの焼鈍雰囲気の酸素分圧の過度の
上昇は(Fe、Mn)O系の酸化物を過剰に生成
し、これらの酸化物の存在によりフオルステライ
ト生成後も、その複合酸化物系の融点が1200℃以
下となり結果的にしもふり状皮膜欠陥を生成する
との結論に達した。
さて、これらの知見に基づいて本発明者らは仕
上焼鈍雰囲気をPH2O/PH2で0.015以下に保つた
状態で10トンコイルで同様の実験を行なつた。し
かしながらその結果、本発明者らは小試料試験に
おいては消滅したしもふり状皮膜欠陥が10トンコ
イル試験では除去されないという新たな問題に直
面した。
この問題を解決するために本発明者らは次のよ
うな考察に基づきひき続き実験を行なつた。焼鈍
分離材の塗布には通常、マグネシアと各種添加物
を純水に溶き、スラリー状懸だく液として鋼板に
塗布・乾燥するという方法がとられる。この際、
マグネシアの水和反応が進み、Mg(OH)2が一部
形成される。この水和成分が仕上焼鈍中400〜500
℃の温度範囲で放出され、コイル板間の酸素分圧
を上昇させる。コイル外部雰囲気の酸素分圧を
PH2O/PH2で0.015以下に制御しても、実際に鋼
板直上の雰囲気の酸素分圧がそのような値になる
まで時間がかかり、結果的にしもふり状皮膜欠陥
を誘発してしまう。第3図にはこのようなコイル
板間の酸素分圧(この場合は水蒸気分圧)の経時
変化をコンピユーターを用いてシミユレーシヨン
した例を示す。このようなコイル板間の酸素分圧
の過度の上昇を押さえるためには、板間に不必要
に持ち込まれる水和成分をできるだけ減らすこ
と、板間のガス通気性を高めることという2つの
方策が基本的に有効である。本発明者らによる特
開昭58−67871号公報において開示されたマグネ
シアを主成分とする懸だく液の塗布後に非水和性
死焼マグネシア粉体を静電的に付着する方法(以
化静電塗装法という)はコイル内に持ち込む水和
成分量を制御するという本目的にかなうものであ
る。第1表に前記外部雰囲気の条件を満足させた
状態でコイル巾1mの10トンコイルに通常のマグ
ネシアコーテイング法(塗布量片面7g/m2)及
び静電塗装法(塗布量下塗り片面3g/m2、静電
塗装片面5g)によりマグネシアを塗布し、仕上
焼鈍して得た成品のコイル中央部のしもふり状皮
膜欠陥の発生頻度を示す。このように静電塗装法
を採用することにより、実際のコイルで仕上焼鈍
を行なつても、しもふり状皮膜欠陥の発生を防ぐ
ことが可能となつた。
[Industrial Field of Application] The present invention particularly relates to a method for manufacturing a unidirectional electrical steel sheet with a good forsterite film. [Prior Art] A unidirectional electrical steel sheet is a soft magnetic material mainly used for transformer cores. This type of steel sheet is composed of crystal grains ((110) [001] oriented grains) whose axes of easy magnetization are aligned within a range of several degrees with respect to the rolling direction, in order to significantly increase magnetic permeability only in the direction of magnetic flux flow.
Furthermore, the inclusion of Si increases the specific resistance and reduces iron loss caused by Joule heat. On its surface, forsterite, MgSiO 4 , which is produced by a solid phase reaction between SiO 2 selectively oxidized during decarburization annealing in the steel sheet manufacturing process and MgO coated on it, is several μm thick. It is attached to the surface and acts as an insulating film, as well as
Perform subdivision of magnetic domains. It also plays an important role in terms of magnetic properties. Usually, it is used as a transformer core after being coated with a secondary coating mainly made of colloidal silica for the purpose of adding tension. From this point of view, a unidirectional electrical steel sheet is a composite material that is covered with crystal grains with (110) [001] orientation in the rolling direction, and has a ceramic film and a secondary film mainly composed of forsterite on the surface layer. It can be said that Achieving a high degree of integration of (110) [001] orientation in unidirectional electrical steel sheets and forming a forsterite film in oxide-based ceramics is usually achieved through a box called final finish annealing.
They occur almost at the same time during annealing. The former is called secondary recrystallization, which is the abnormal grain growth of (110)[001] oriented grains, and the latter is achieved by the SiO 2 -MgO solid phase reaction on the surface of the steel sheet, and these two reactions are essentially completely different. Despite being a phenomenon, real reactions proceed while indirectly interfering with each other. As is well known, forsterite, Mg 2 SiO 4 ,
is produced by MgO penetrating into SiO2 in the form of Mg ++ and O-- (GW Brindley & R. Hayami
Phil, Mag. 12, 505 (1965)). In the field of research related to the production of grain-oriented electrical steel sheets, this reaction system
It is empirically known that the presence of trace amounts of substances such as MnO 2 , TiO 2 , B 2 O 3 , CaO, and Sr compounds changes the properties of the produced forsterite. For example, in Japanese Patent Publication No. 51-12450,
The addition of MnO 2 was reported in Publication No. 51-12451.
The addition of TiO 2 was disclosed respectively. In addition, the effects of Sr compounds on the properties of forsterite films have been disclosed in Japanese Patent Publications No. 32716/1980, No. 89422/1989, and No. 75577/1983. JP-A-54-66935 discloses a method for controlling the amount of water brought in, mainly in the form of magnesium hydroxide, depending on the amount of CaO component contained in an annealed and separated product containing MgO as the main component. What is the mechanism behind these trace additives?
It affects the reaction mechanism of the MgO-SiO 2 system solid phase reaction, and also changes various properties such as the crystal grain size of the forsterite produced and the adhesion between the so-called forsterite film composed of forsterite crystal grains and the steel plate. It is not clear at this point whether this is the case. However, these substances commonly include MgO, SiO 2 , Mg 2 SiO 4 etc.
These additives have the property of lowering the melting point of MgO−SiO 2 -based oxides, so these additives are
It is thought that it contributes to the reaction by accelerating the diffusion rate of O -- . In some cases, the maximum temperature for finish annealing of normal grain-oriented electrical steel sheets is 1200℃.
It is speculated that the reaction rate of the system is significantly increased by partially forming a liquid phase in the vicinity. Now, the present inventors first achieved a small forsterite crystal grain size by controlling the Mn activity in the steel and the oxygen partial pressure (expressed as PH 2 O / PH 2 ) in the atmosphere during this forsterite formation reaction. (Japanese Patent Application No. 59-53819) disclosed a method for forming a forstellite film which has good adhesion and the tension exerted by the film on a steel plate is greater than that obtained by conventional techniques. This method differs from previous methods in which the properties of the film are improved by adding small amounts of additives to the annealed separator.This method uses the ingredients in the steel, namely the Mn activity and the oxygen partial pressure in the external atmosphere, to improve the properties of the film. The aim is to improve. The key point of the mechanism is thought to be that MnO is generated by high-temperature oxidation during the MgO-SiO 2 solid phase reaction.
It can be said that it has a different feature from the conventional technology from an industrial point of view as it requires fewer types of trace additives. [Problems to be Solved by the Present Invention] However, when the technology disclosed by the present inventors was applied to coils with large unit weights of 10 tons and 20 tons, general It was discovered that there were many coating defects called ``Nishimofuri'' where the bare metal was exposed. These film defects not only deteriorate the appearance of the finished product, but also have an unfavorable effect on the magnetic properties, such as deterioration of the insulation properties and the tension applied to the steel sheet. [Means for Solving the Problems] The purpose of the present invention is to obtain a patent application filed in 1983 by the present inventors, which aims to produce a good forsterite film.
The object of the present invention is to provide a final annealing method that eliminates and improves these problems that subsequently occurred in No. 53819 and forms a good forsterite film in a coil having a large unit weight. That is, in the present invention, C: 0.025% to 0.075 by weight
%, Si: 3.0%~4.5%, Acid soluble Al: 0.010~
0.060%, N: 0.0030% to 0.0130%, S≦0.010%,
and Mn 0.8%≧Mn≧0.05+7×(S+
0.405Se), and
Starting from a slab containing Cr: 0.07-0.25% as necessary, the balance consisting of Fe and unavoidable impurities,
In the conventional method for producing unidirectional electrical steel sheets, the oxygen partial pressure (PH 2 O / PH 2 ) in the atmosphere in the temperature range from the start of finish annealing to 650°C is limited to 0.015 or less, and decarburization annealing is performed. In the process of applying an annealing separator mainly composed of magnesia to a plate, the annealing separator is made into a slurry, the amount of undercoat applied and dried is 4 g/ m2 or less on one side, and 3~
The present invention provides a method for removing defects occurring in a forsterite film by simultaneously applying a so-called electrostatic coating method in which 6 g/m 2 (one side) of magnesia is electrostatically applied. In addition to this method, during finish annealing
By holding the steel plate in the temperature range of 800 to 900°C for 10 to 30 hours, film defects can be removed more completely, and the oxygen partial pressure can be reduced when the temperature is increased from 800 to 900°C to 1100°C. It has become clear that the film properties can be improved by regulating the amounts of Mn, S, and Se in the steel within specific ranges. The present invention will be explained in detail below. Figure 2 shows C: 0.055%, Si: 3.25%, Mn: 0.18
%, S: 0.006%, P: 0.02%, Al: 0.03%, N:
After decarburizing a cold-rolled sheet of 8 cm x 8 cm containing 0.007% TiO 2 in a wet hydrogen atmosphere,
The frequency of occurrence of lame-like film defects that appeared on the forsterite film obtained after applying 7 g/m 2 of annealing separation material mainly composed of magnesia containing parts by weight on one side and performing final annealing is shown. It is something. In this experiment, the final annealing atmosphere was 25% N 2 and 75% H 2 .
The oxygen partial pressure up to 650℃ was set to various values as a parameter. This experiment revealed that the frequency of occurrence of chilblain-like film defects is particularly remarkable when the oxygen partial pressure in the atmosphere during the first half of final annealing exceeds 0.015 in terms of PH 2 O/PH 2 . In addition, when similar experiments were conducted by changing the dew point during decarburization annealing for materials with different Mn activities in steel, it was found that this type of film defect occurs more frequently in materials with higher Mn activities. Furthermore, it was found that decarburization tends to occur when the oxygen partial pressure during decarburization annealing is high. The present inventors investigated in detail the occurrence of these film defects and came to the following conclusion. In other words, these film defects are caused by MgO and SiO 2 , which constitute forsterite, or TiO 2 , which is intentionally added to the annealing separator, during high-temperature annealing at around 1200°C.
and B, alkali or alkaline earth oxides such as Na 2 O that are unavoidably mixed in, and FeO, MnO, which is produced by high-temperature oxidation of components in steel,
This is due to the formation of a melt resulting from the composition of these composite oxide systems such as Al 2 O 3 satisfying a eutectic composition with a eutectic point of 1200° C. or less. An excessive increase in the oxygen partial pressure in the annealing atmosphere up to 650°C in the first half of the final annealing causes excessive production of (Fe, Mn)O-based oxides, and due to the presence of these oxides, even after the formation of forsterite, the composite It was concluded that the melting point of the oxide system becomes below 1200℃, resulting in the formation of chimney-like film defects. Now, based on these findings, the present inventors conducted a similar experiment using a 10-ton coil while maintaining the final annealing atmosphere at PH 2 O/PH 2 at 0.015 or less. However, as a result, the present inventors faced a new problem in that the grain-like film defects that disappeared in the small sample test were not removed in the 10-ton coil test. In order to solve this problem, the present inventors continued to conduct experiments based on the following considerations. The usual method for applying the annealing separation material is to dissolve magnesia and various additives in pure water, apply it to the steel plate as a slurry suspension, and dry it. On this occasion,
The hydration reaction of magnesia progresses and Mg(OH) 2 is partially formed. This hydration component is 400 to 500 during finish annealing.
It is released in the temperature range of °C and increases the partial pressure of oxygen between the coil plates. Oxygen partial pressure in the atmosphere outside the coil
Even if PH 2 O/PH 2 is controlled to 0.015 or less, it takes time for the oxygen partial pressure in the atmosphere directly above the steel plate to actually reach such a value, which results in the formation of chilblain film defects. . FIG. 3 shows an example in which a computer is used to simulate the change over time in the oxygen partial pressure (in this case, the water vapor partial pressure) between the coil plates. In order to prevent such an excessive increase in the oxygen partial pressure between the coil plates, there are two measures: to reduce as much as possible the hydration components that are unnecessarily brought in between the coil plates, and to increase the gas permeability between the plates. Basically valid. The method disclosed in JP-A No. 58-67871 by the present inventors, in which non-hydratable dead burnt magnesia powder is electrostatically attached after applying a suspension liquid containing magnesia as a main component ( Electrocoating (also called electrocoating) serves the purpose of controlling the amount of hydration components introduced into the coil. Table 1 shows the usual magnesia coating method (coating amount: 7 g/m 2 on one side) and the electrostatic coating method (coating amount: undercoating 3 g/m 2 on one side) on a 10 ton coil with a coil width of 1 m while satisfying the above external atmosphere conditions. , 5 g of electrostatic coating on one side) and final annealing. By employing the electrostatic coating method in this way, it has become possible to prevent the occurrence of scallop-like film defects even when final annealing is performed on an actual coil.
【表】
以上述べたごとく、静電塗装法の採用によりフ
オルステライト皮膜は安定生成することが明らか
になつたが、さらに工業的には第2表に示すよう
に仕上焼鈍中800〜900℃の温度域において鋼板を
10〜30時間保定することによりフオルステライト
皮膜の欠陥はより確実に減少する。これを次に説
明する。[Table] As mentioned above, it has become clear that a forsterite film can be stably formed by adopting the electrostatic coating method. steel plate in the temperature range
By holding it for 10 to 30 hours, defects in the forsterite film are more reliably reduced. This will be explained next.
【表】
第4図にMn:0.2%、S:0.004%を含む冷延
板をPH2O/PH20.366の雰囲気で脱炭焼鈍したの
ち、TiO2を5重量部含むマグネシアを塗布仕上
焼鈍した素材の仕上焼鈍中各温度における酸化皮
膜の組成変化をGDS(Glow Discharge Optical
Emission Spectroscopy)で調べた結果を示す。
この図からわかるように800〜900℃の温度域でSi
が表面に集まつてくる。赤外線反射スペクトルを
用い存在形態を調べたところ、これらのSiは
SiO2として存在することがわかつた。これらの
ことから脱炭焼鈍時に形成された酸化皮膜は仕上
焼鈍中800〜900℃の温度域でSiO2の濃化という
変質を遂げていることが明らかになつた。従つ
て、このようなSiO2の濃化、すなわち複合酸化
物系のSiO2rich側への組成の変更が系の共晶点を
1200℃以上とし、結果的にしもふり状皮膜欠陥の
発生を押えているという結論に達した。なお、こ
のような仕上焼鈍中800〜900℃におけるSiO2の
濃化はMn活量の高い素材について特に顕著にあ
らわれる。この理由について本発明者らの見解を
次に述べる。周知のように3%Si−Fe系の高温
酸化挙動はMn活量により変動し、Mn量がある
程度以上であると、素材の酸化速度は大きく上昇
する(N.Morito&T.Ichida 17 961(1977))。こ
のようにして形成された皮膜を仕上焼鈍中におけ
るような低酸素分圧雰囲気にさらすことにより、
皮膜組成は新たな平衡状態、すなわちSiO2/
(Fe、Mn)2SiO4比の高い状態に近ずくものと考
えられる。このような変化は初期の皮膜の
SiO2/(Fe、Mn)2SiO4比の低いものほどより強
く現れると考えられるのである。
以上述べた仕上焼鈍方法は、鋼中のMn活量に
応じて仕上焼鈍雰囲気の酸素分圧を制御すること
を骨子とした本発明者らによる特願昭59−53819
号と組み合わせることにより、さらに有効にその
効果を発揮することができる。第3表にMn:
0.18%、S:0.006%の素材を脱炭焼鈍し、TiO2
を5重量部含むマグネシアを通常の方法と静電塗
装法により塗布し、仕上焼鈍して得た素材のフオ
ルステライト皮膜に現れた皮膜欠陥発生率と平均
フオルステライト結晶粒径を示す。[Table] Figure 4 shows that a cold-rolled sheet containing 0.2% Mn and 0.004% S was decarburized and annealed in an atmosphere of PH 2 O/PH 2 0.366, then coated with magnesia containing 5 parts by weight of TiO 2 and finished annealed. GDS (Glow Discharge Optical
The results are shown below.
As can be seen from this figure, Si
gathers on the surface. When we investigated the existence form using infrared reflection spectra, we found that these Si
It was found that it exists as SiO 2 . From these results, it became clear that the oxide film formed during decarburization annealing undergoes alteration in which SiO 2 becomes concentrated in the temperature range of 800 to 900°C during final annealing. Therefore, such enrichment of SiO 2 , that is, a change in the composition of the complex oxide system to the SiO 2 rich side, increases the eutectic point of the system.
The conclusion was reached that by setting the temperature to 1200°C or higher, the occurrence of chilblain film defects was suppressed. Note that such concentration of SiO 2 at 800 to 900° C. during final annealing is particularly noticeable in materials with high Mn activity. The inventors' views regarding this reason will be described below. As is well known, the high-temperature oxidation behavior of the 3% Si-Fe system varies depending on the Mn activity, and when the Mn content exceeds a certain level, the oxidation rate of the material increases significantly (N. Morito & T. Ichida 17 961 (1977)) ). By exposing the film thus formed to a low oxygen partial pressure atmosphere such as during final annealing,
The film composition is now in a new equilibrium state, i.e. SiO 2 /
(Fe, Mn) 2 It is thought that the SiO 4 ratio is approaching a high state. These changes occur in the initial film.
It is thought that the lower the SiO 2 /(Fe, Mn) 2 SiO 4 ratio, the more strongly it appears. The final annealing method described above is based on the Patent Application No. 53819/1986 filed by the present inventors, whose main point is to control the oxygen partial pressure in the final annealing atmosphere according to the Mn activity in the steel.
By combining it with the number, the effect can be even more effectively demonstrated. Mn in Table 3:
0.18%, S: 0.006% material is decarburized and annealed, TiO 2
The graph shows the incidence of film defects and the average forsterite crystal grain size of materials obtained by applying magnesia containing 5 parts by weight by a conventional method and an electrostatic coating method and final annealing.
【表】
上段:しもふり欠陥発生率
下段:フオルステライト結晶粒径
このように仕上焼鈍中850−1100℃の雰囲気の
露点をある程度高めることによりフオルステライ
ト皮膜の結晶粒径を小さくすることができる。そ
の理由は必ずしも明らかではないが本発明者等は
特願昭59−53819号に記載の通り、鋼中Mn活量
と雰囲気の酸素分圧との組み合わせにより酸化皮
膜側に適当量のMnOが生成し、このMnOがMgO
−SiO2系固相反応に対して触媒的効果をもつた
ものと考えている。
このような仕上焼鈍後半においてある程度の酸
素分圧をかける方法は先に述べた800〜900℃の保
定によりSiO2/(Fe、Mn)2SiO4比を上げしもふ
り欠陥をなくすという考え方と一見予盾するよう
に見える。しかしすでに述べたように実験的にこ
れらの方法はMn活量の高い素材において良好な
フオルステライト皮膜を生成する上で効果を持つ
ている。これらの事象に対する本発明者らの見解
を次に述べる。
まず固相反応を促進するという観点から適当量
のMnOはMgO−SiO2皮膜形成に有効である。従
つてMn活量の高い素材についてこのMnOの安定
性が問題となる。第5図にこのMnOの熱力学的
な安定性をMn活量をパラメータにとつて示し
た。なお、この図を作成するにあたつて必要な数
値は(“Metallurgical Thermochemistry”(5
th edition、1979)Kubaschewski&Alcock
(Pergamon Press)より引用した。この図から
明らかなようにMnOの平衡論的な安定性は温度
雰囲気の酸素分圧及び鋼中のMn活量に強く依存
する。しかもいつたん形成したMnOを還元する
ためにはさらに速度論的因子が強く働くはずであ
る。本発明者らの見解はフオルステライト皮膜の
特性向上には適当量のMnOが必要であるという
ことであり、過剰のMnO、FeOあるいは一般に
(Fe、Mn)O系酸化物はMgO−SiO2を主体とし
た複合酸化物系の共晶点を下げしもふり欠陥を誘
発するという意味で好ましくない。第5図から明
らかなように熱力学的平衡状態が常に実現されて
いるとすれば適当量のMnOを確保するためには
Mn活量に応じて例えば第5図中矢印で示したよ
うに推移させればよい。簡単に表現すれば温度の
上昇とともに少しずつ雰囲気の酸素分圧も上昇さ
せればよいのである。しかし、現実の方向性電磁
鋼板の製造工程においてはこのようなことは最初
の段階からあてはまらない。なぜならば脱炭焼鈍
時の酸素分圧は(1)脱炭を行なうため、(2)フオルス
テライトを形成するのに必要なSiO2、もしくは
酸素量、を短時間で確保するためにlog(PH2O/
PH2)−0.3程度に設定されており、第5図か
らわかるようにこの値は仕上焼鈍時に問題にされ
る酸素分圧の領域よりずつと高いのである。この
ようにして形成された酸化皮膜から出発して良好
なフオルステライト皮膜を形成するためには、本
発明で述べられた方法、すなわち仕上焼鈍前半の
追加酸化を押さえ(650℃以下でPH2O/PH2
0.015)、特に実コイルにおいてはMg(OH)2とし
て持ち込まれる水和成分量を制限し、(静電塗装
法)、酸化皮膜の組成をある程度SiO2richする
(800−900℃の保定)方法が有効なのである。そ
していつたんこのような状態になつたあとは逆に
温度の上昇とともにある程度の酸素分圧をかけ
MnOを必要量確保することが有効に働くのであ
る。
以上述べた技術的な進歩により、S+
0.405Se:0.010以下かつMn:{0.05×7(S+
0.405Se)}以上0.8%以下というMn活量の高い素
材について、しもふり欠陥を伴なわずにフオルス
テライト皮膜を安定して、得ることが可能となつ
た。
次に本発明の構成要因の限定条件を述べる。
鋼中のMn、S及びSeに対する規定は主に鋼中
Mn活量を確保しフオルステライト皮膜特性の向
上をはかるという観点から定めた。すなわち、前
述したように鋼中のMnが酸化してできたMnOが
成品のフオルステライト皮膜の特性を向上させる
のであるが、このために必要なfreeMn量を確保
するためにはSが0.010%以下であることが望ま
しい。Mnをトラツプするという意味からはSeも
同様の効果を持つのでSeを増やすことも好まし
くない。以上の点からSとSeに対する上限値を
S+0.405Seで0.010%とした。これ以上Sを増や
すと材質的には線状細粒と呼ばれる2次再結晶不
良部が発生し、表面皮膜の特性も劣化する。Mn
の下限値は良好なフオルステライト皮膜を得るた
めに必要なMn活量を得るという観点からS及び
Se量に対し{0.05+7(S+0.405Se)}%とした。
Mnがこの値以下であると皮膜が劣化し、2次再
結晶も不安定となるので好ましくない。Mnの上
限値は0.8%と定めた。これ以上Mn量が増えると
成品の磁束密度が劣化するので好ましくない。
Cは0.025%未満になると二次再結晶が不安定
になり、かつ二次再結晶した場合でも磁束密度
(B18で1.80T以下しか得られず)が悪いので0.025
%以上とした。一方、Cが多くなり過ぎると脱炭
焼鈍時間が長くなり、経済的ないので0.075%以
下とした。Siは4.5%を超えると冷延時の割れが
著しくなるので4.5%以下とした。又、3.0%未満
では製品板厚0.30mmでW17/58が1.05W/Kg以下の
最高等級の鉄損が得られないので3.0%以上とし
た。望ましくは3.2%以上である。
本発明では二次再結晶に必要な析出物として
AlNを用いる。したがつて必要最低量のAlNを
確保するために酸可溶性Alとして0.010%以上、
Nとして0.0030%以上が必要である。酸可溶性Al
が0.060%を超えると熱延板のAlNが不適切とな
り、二次再結晶が不安定になるので0.060%以下
とした。Nについては、0.0130%を超えるとブリ
スターと呼ばれる“鋼板表面のふくれ”が発生す
るので0.0130%以下とした。
Crは磁性を安定させるのに効果がある。則ち
Crを含有させることにより、高磁束密度の得ら
れる酸可溶性Al量の範囲を拡大できる。さらに、
同一磁束密度下での鉄損特性を良好ならしめる。
この鉄損低減効果は、Cr含有量0.07%以上で顕著
になり、0.25%で飽和する。さらに0.25%を超え
てCrを含有せしめると、脱炭昇温時の脱炭速度
を低下せしめるという問題が生じるので、Cr含
有量を0.07%〜0.25%とする。
仕上焼鈍開始から650℃までの雰囲気の酸素分
圧はPH2O/PH20.015でなければならない。こ
れ以上であると成品フオルステライト皮膜中にし
もふり欠陥が発生する。静電塗装法における塗布
量は次のようにして限定する。まず下塗りとする
通常の方法でスラリー状に塗布・乾燥することに
よる焼鈍分離材の塗布量はこれを片面4g/m2以
下とする。これ以上であるとコイル板間内に持ち
込む水和成分量を不必要に多くし、仕上焼鈍時の
雰囲気の酸素分圧を制御するという本来の目的が
達成されない。また焼き付けを防止する意味で静
電塗布するマグネシアの塗布量は片面あたり3〜
6g/m2とする。3g/m2未満であるとコイルの
焼き付けが発生する場合が生じ、また6g/m2を
越える量を塗布しても焼き付け防止の効果は同じ
で経済的でない。
800℃〜900℃の温度域で鋼板を保定し、皮膜特
性の向上を狙う場合その保定時間は10〜30時間と
限定する。これより短ければ皮膜特性向上に対す
る効果はあまり期待できず、これ以上長くしても
その効果は30時間保定の場合とくらべ大差ない。
従つて30時間を越える時間コイルを保持するのは
経済的でない。
次に本発明中の請求範囲2および4に示した仕
上焼鈍後半800〜900℃の温度域から110℃に至る
までの温度範囲における雰囲気酸素分圧の限定理
由を説明する(第1図)。この発明の目的は成品
表面に生成されるフオルステライト皮膜の特性向
上にあり、発明の詳しい内容は本発明者らによる
特願昭59−53819号と同じである。すなわち、本
発明の骨子はフオルステライト生成反応であると
ころのMgO−SiO2固相反応において触媒的機能
を有するMnOを、SiO2を主体とした酸化皮膜中
に必要量確保することにある。その方法として鋼
中のMn活量、具体的には鋼中Mn量及びMnをト
ラツプするS及びSe量に対して、MgO−SiO2固
相反応が進行する800−900℃の温度域から110℃
に至るまでの温度範囲における、仕上焼鈍雰囲気
の酸素分圧、具体的にはPH2O/PH2を第1図で
示す範囲に限定したのである。
第1図中AB及びDCは成分に関する限定(前
述)でその限定理由は説明したが、繰り返すと
Mn−1.719(S+0.405Se)が0.05(AB)以下であ
ると皮膜特性向上に有効なMnOが必要量得られ
ず、また0.8(DC)以上であると成品の磁束密度
が劣化するので好ましくない。
BCはフオルステライト皮膜の特性向上に必要
なMnOを確保するのに必要な酸素分圧で、これ
はaMo・PH2O/PH2(aMo・Mn活量)が一定値以上で
なくてはならないことから図で示した勾配を有す
る直線となつた。PH2O/PH2がこれ以下である
とフオルステライト結晶の平均粒径が0.5μmを越
えた値となり不適当である。PH2O/PH2の上限
値DEは、これ以上Mn活量を高くしたり雰囲気を
酸化性にすると過剰に生成した液相に起因すると
思われる皮膜不良部が発生し、成品の層間抵抗を
劣化させるので、図中に示したように設定した。
また、上限値AEは現場操業における問題から限
定される。すなわちPH2O/PH2を5×10-2以上
で仕上焼鈍を行なうためには大容量の加湿器が必
要であり、さらにコイル幅方向、長手方向に均等
に酸素分圧を与えることが難しくなり、成品歩留
りも低下するので上限値はAEとする必要がある。
以上のPH2O/PH2とaMoに対する制約により仕
上焼鈍中800〜900℃の温度域から1100℃に至る間
の酸素分圧は第1図ABCDEに示される範囲内に
保持する必要がある。
実施例 1
C:0.054%、Si:3.3%、Mn:0.15%、P:
0.02%、S:0.006%、Se:0.0006%、酸可溶性
Al:0.030%、N:0.007%を含有する溶鋼から連
鋳法で鋳片を作成、1150℃のスラブ加熱後、熱間
圧延にて1.8mm厚の熱延板とした。この熱延板を
1100℃×2分間の熱延板焼鈍後、0.18mmまで冷延
し、810℃の温度で温水素中の脱炭焼鈍を行なつ
た。この板に通常の方法(塗布量、片面6g/
m2)及び静電塗装法(下塗り片面3g/m2+静電
塗装法(MgOのみ)片面4g/m2)でTiO2を5
重量部含むマグネシアを塗布した。このようにし
て作成した10トンコイルを窒素25%水素75%露点
−20℃(PH2O/PH2=0.002)、0℃(PH2O/
PH2=0.008)及び20℃(PH2O/PH2=0.032)
の雰囲気で650℃まで昇温、その後の露点を−20
℃に切り換え1200℃まで昇温速度10℃/hrで昇温
した。得られた鋼板のしもふり状皮膜欠陥の発生
率を第4表に示す。[Table] Upper row: Shimofuri defect occurrence rate Lower row: Forsterite crystal grain size In this way, by increasing the dew point of the atmosphere at 850-1100°C to some extent during finish annealing, the crystal grain size of the forsterite film can be reduced. . The reason for this is not necessarily clear, but as described in Japanese Patent Application No. 59-53819, the present inventors found that an appropriate amount of MnO is generated on the oxide film side by combining the Mn activity in the steel and the oxygen partial pressure in the atmosphere. And this MnO is MgO
-It is thought to have a catalytic effect on SiO 2 -based solid phase reactions. The method of applying a certain amount of oxygen partial pressure in the second half of final annealing is based on the idea of increasing the SiO 2 /(Fe, Mn) 2 SiO 4 ratio by holding the temperature at 800 to 900°C, which was mentioned earlier, and eliminating the defects. At first glance, it seems like a premonition. However, as already mentioned, these methods have been experimentally shown to be effective in producing good forsterite films on materials with high Mn activity. The present inventors' views regarding these phenomena will be described below. First, from the viewpoint of promoting the solid phase reaction, an appropriate amount of MnO is effective in forming a MgO-SiO 2 film. Therefore, the stability of MnO becomes a problem for materials with high Mn activity. Figure 5 shows the thermodynamic stability of MnO using Mn activity as a parameter. The numerical values required to create this diagram are (“Metallurgical Thermochemistry” (5
th edition, 1979) Kubaschewski & Alcock
(Pergamon Press). As is clear from this figure, the equilibrium stability of MnO strongly depends on the oxygen partial pressure of the temperature atmosphere and the Mn activity in the steel. Moreover, kinetic factors should act even more strongly to reduce MnO once formed. The present inventors' view is that an appropriate amount of MnO is necessary to improve the properties of the forsterite film, and that excess MnO, FeO, or (Fe, Mn)O-based oxides in general, can reduce MgO-SiO 2 . This is undesirable in the sense that it lowers the eutectic point of the main composite oxide system and induces furi defects. As is clear from Figure 5, if a thermodynamic equilibrium state is always achieved, in order to secure an appropriate amount of MnO,
For example, the transition may be made as shown by the arrow in FIG. 5 depending on the Mn activity. Simply put, as the temperature rises, the partial pressure of oxygen in the atmosphere also increases little by little. However, in the actual manufacturing process of grain-oriented electrical steel sheets, this does not apply from the initial stage. This is because the oxygen partial pressure during decarburization annealing is (1) to perform decarburization, and ( 2 ) log (PH 2 O/
PH 2 )-0.3, and as can be seen from FIG. 5, this value is much higher than the oxygen partial pressure range that is a problem during final annealing. In order to form a good forsterite film starting from the oxide film thus formed, it is necessary to use the method described in the present invention, that is, to suppress additional oxidation in the first half of the final annealing (PH 2 O /PH 2
0.015), especially in actual coils, the amount of hydration components brought in as Mg(OH) 2 is limited (electrostatic coating method), and the composition of the oxide film is enriched to some extent with SiO 2 (maintaining 800-900℃). is valid. Once this state is reached, conversely, a certain amount of oxygen partial pressure is applied as the temperature rises.
Securing the necessary amount of MnO works effectively. Due to the technological advances mentioned above, S+
0.405Se: 0.010 or less and Mn: {0.05×7(S+
0.405Se)} to 0.8%, a material with a high Mn activity, it has become possible to stably obtain a forstellite film without any frizz defects. Next, the limiting conditions of the constituent factors of the present invention will be described. The regulations for Mn, S and Se in steel mainly apply to steel.
This was determined from the viewpoint of securing Mn activity and improving the properties of the forsterite film. In other words, as mentioned above, MnO produced by oxidation of Mn in steel improves the properties of the forsterite film in the finished product, but in order to secure the amount of free Mn necessary for this purpose, the S content must be 0.010% or less. It is desirable that In terms of trapping Mn, Se also has a similar effect, so increasing Se is also not desirable. From the above points, the upper limit value for S and Se was set as S+0.405Se, which is 0.010%. If S is increased further than this, secondary recrystallization defects called linear fine grains will occur in terms of material quality, and the characteristics of the surface film will also deteriorate. Mn
The lower limit of S and
It was set as {0.05+7 (S+0.405Se)}% with respect to the amount of Se.
If Mn is less than this value, the film will deteriorate and the secondary recrystallization will become unstable, which is not preferable. The upper limit of Mn was set at 0.8%. If the amount of Mn increases more than this, the magnetic flux density of the finished product will deteriorate, which is not preferable. If C is less than 0.025%, secondary recrystallization becomes unstable, and even if secondary recrystallization is performed, the magnetic flux density (only 1.80T or less can be obtained with B 18 ) is poor, so 0.025
% or more. On the other hand, if the C content is too large, the decarburization annealing time becomes long, which is not economical, so it is set to 0.075% or less. If Si exceeds 4.5%, cracking during cold rolling becomes significant, so it was set to 4.5% or less. In addition, if it is less than 3.0%, it will not be possible to obtain the highest grade iron loss of W 17/58 of 1.05W/Kg or less with a product plate thickness of 0.30mm, so it was set to be 3.0% or more. It is preferably 3.2% or more. In the present invention, as a precipitate necessary for secondary recrystallization,
Use AlN. Therefore, in order to ensure the minimum amount of AlN required, 0.010% or more of acid-soluble Al,
N is required to be 0.0030% or more. acid soluble Al
If it exceeds 0.060%, AlN in the hot rolled sheet becomes inappropriate and secondary recrystallization becomes unstable, so it was set to 0.060% or less. Regarding N, if it exceeds 0.0130%, "blistering" on the surface of the steel plate will occur, so it was set to 0.0130% or less. Cr is effective in stabilizing magnetism. Rule
By including Cr, the range of acid-soluble Al amount that can provide high magnetic flux density can be expanded. moreover,
Improves iron loss characteristics under the same magnetic flux density.
This iron loss reduction effect becomes noticeable when the Cr content is 0.07% or more, and is saturated at 0.25%. Furthermore, if Cr is contained in an amount exceeding 0.25%, a problem arises in that the decarburization rate is reduced when the decarburization temperature is increased, so the Cr content is set to 0.07% to 0.25%. The oxygen partial pressure in the atmosphere from the start of final annealing to 650°C must be PH 2 O/PH 2 0.015. If it is more than this, a chirping defect will occur in the finished forsterite film. The amount of coating in the electrostatic coating method is limited as follows. First, the coating amount of the annealing separation material is 4 g/m 2 or less on one side, which is applied as an undercoat in the form of a slurry using the usual method and dried. If it is more than this, the amount of hydration components brought into the space between the coil plates will be unnecessarily increased, and the original purpose of controlling the oxygen partial pressure in the atmosphere during final annealing will not be achieved. In addition, the amount of magnesia applied electrostatically to prevent burn-in is 3 to 3 times per side.
6g/ m2 . If it is less than 3 g/m 2 , coil seizure may occur, and if it is applied in an amount exceeding 6 g/m 2 , the anti-seizure effect remains the same and it is not economical. When holding a steel plate in a temperature range of 800°C to 900°C and aiming to improve film properties, the holding time is limited to 10 to 30 hours. If it is shorter than this, no significant effect on improving film properties can be expected, and even if it is longer than this, the effect is not much different from that of 30-hour retention.
Therefore, it is not economical to hold the coil for more than 30 hours. Next, the reason for limiting the atmospheric oxygen partial pressure in the temperature range from 800 to 900°C in the latter half of the final annealing to 110°C as shown in claims 2 and 4 of the present invention will be explained (FIG. 1). The purpose of this invention is to improve the characteristics of a forsterite film formed on the surface of a product, and the detailed content of the invention is the same as that of Japanese Patent Application No. 59-53819 filed by the present inventors. That is, the gist of the present invention is to secure a necessary amount of MnO, which has a catalytic function in the MgO-SiO 2 solid phase reaction, which is a forsterite production reaction, in an oxide film mainly composed of SiO 2 . The method is to adjust the Mn activity in the steel, specifically the amount of Mn in the steel and the amounts of S and Se that trap Mn, from the temperature range of 800-900℃ where the MgO- SiO2 solid phase reaction proceeds. ℃
The oxygen partial pressure in the final annealing atmosphere, specifically PH 2 O/PH 2 , was limited to the range shown in FIG. 1 in the temperature range up to . In Figure 1, AB and DC are limitations regarding the components (as mentioned above), and the reasons for these limitations have been explained, but to reiterate:
If Mn-1.719 (S + 0.405Se) is less than 0.05 (AB), the necessary amount of MnO that is effective in improving the film properties cannot be obtained, and if it is more than 0.8 (DC), the magnetic flux density of the product will deteriorate, which is undesirable. . BC is the oxygen partial pressure necessary to secure the MnO necessary to improve the properties of the forsterite film, and this is the oxygen partial pressure required if a Mo・PH 2 O/PH 2 (a Mo・Mn activity) is not above a certain value. Since this is not the case, a straight line with the slope shown in the figure was created. If PH 2 O/PH 2 is less than this, the average grain size of the forsterite crystals will exceed 0.5 μm, which is inappropriate. The upper limit value DE of PH 2 O/PH 2 is such that if the Mn activity is increased further or the atmosphere is made oxidizing, film defects will occur that are thought to be caused by the excessively generated liquid phase, and the interlayer resistance of the product will decrease. Since this causes deterioration, the settings were made as shown in the figure.
Further, the upper limit value AE is limited due to problems in on-site operations. In other words, in order to perform finish annealing at PH 2 O/PH 2 of 5×10 -2 or more, a large-capacity humidifier is required, and it is also difficult to apply oxygen partial pressure evenly in the width and length directions of the coil. The upper limit value needs to be set to AE because the product yield also decreases.
Due to the above constraints on PH 2 O / PH 2 and a Mo , the oxygen partial pressure from the temperature range of 800 to 900℃ to 1100℃ during final annealing must be maintained within the range shown in Figure 1 ABCDE. . Example 1 C: 0.054%, Si: 3.3%, Mn: 0.15%, P:
0.02%, S: 0.006%, Se: 0.0006%, acid soluble
A slab was made by a continuous casting method from molten steel containing Al: 0.030% and N: 0.007%, and after heating the slab to 1150°C, it was hot rolled into a hot rolled plate with a thickness of 1.8 mm. This hot rolled plate
After hot-rolled sheet annealing at 1100°C for 2 minutes, it was cold rolled to 0.18 mm and decarburized annealed in warm hydrogen at a temperature of 810°C. This board is coated using the usual method (coating amount, 6g/side).
m 2 ) and electrostatic coating method (undercoat 3 g/m 2 on one side + electrostatic coating method (MgO only) 4 g/m 2 on one side).
Parts by weight of magnesia were applied. The 10 ton coil created in this way was heated to 25% nitrogen, 75% hydrogen, dew point -20℃ (PH 2 O / PH 2 = 0.002), 0℃ (PH 2 O /
PH 2 = 0.008) and 20℃ (PH 2 O/PH 2 = 0.032)
The temperature was raised to 650℃ in an atmosphere of
The temperature was changed to 1200°C at a heating rate of 10°C/hr. Table 4 shows the occurrence rate of shingle-like film defects in the obtained steel sheets.
【表】
5 5内は本発明
[Table] 5 5 indicates the present invention
Claims (1)
〜4.5%、酸可溶性Al:0.010〜0.060%、N:
0.0030%〜0.0130%、S≦0.010%、およびMnを
0.8%≧Mn≧0.05+7×(S+0.405Se)なる関係
を満足する如く含有し、残部Feおよび不可避的
不純物からなる珪素鋼スラブを、熱間圧延、冷間
圧延し、湿水素雰囲気中での脱炭焼鈍、焼鈍分離
剤塗布を行つた後仕上焼鈍を行う一方向性電磁鋼
板の製造方法において、脱炭焼鈍後の鋼板に鋼板
片面当り4g/m2以下のスラリー状焼鈍分離剤を
塗布、乾燥した後、その上に鋼板片面当り3〜6
g/m2のマグネシアを静電塗布しかつ、仕上焼鈍
開始から650℃迄の温度域における雰囲気の酸素
分圧(PH2O/PH2で表す)を0.015以下にすると
ともに、800〜900℃の温度域で鋼板を10〜30時間
保定することを特徴とするフオルステライト皮膜
が良好な一方向性電磁鋼板の製造方法。 2 仕上焼鈍中800〜900℃の温度域から1100℃迄
の昇温時の酸素分圧を鋼中のMn、Sの量に対応
して第1図のABCDEに囲まれた領域の値にする
ことを特徴とする特許請求の範囲第1項記載の方
法。 3 重量%で、C:0.025%〜0.075%、Si:3.0%
〜4.5%、酸可溶性Al:0.010〜0.060%、N:
0.0030%〜0.0130%、S≦0.010%、Cr:0.07〜
0.25%およびMnを0.8%≧Mn≧0.05+7×(S+
0.405Se)なる関係を満足する如く含有し、残部
Feおよび不可避的不純物からなる珪素鋼スラブ
を、熱間圧延、冷間圧延し、湿水素雰囲気中での
脱炭焼鈍、焼鈍分離剤塗布を行つた後仕上焼鈍を
行う一方向性電磁鋼板の製造方法において、脱炭
焼鈍後の鋼板に鋼板片面当り4g/m2以下のスラ
リー状焼鈍分離剤を塗布、乾燥した後、その上に
鋼板片面当り3〜6g/m2のマグネシアを静電塗
布しかつ、仕上焼鈍開始から650℃迄の温度域に
おける雰囲気の酸素分圧(PH2O/PH2で表す)
を0.015以下とするとともに、800〜900℃の温度
域で鋼板を10〜30時間保定することを特徴とする
フオルステライト皮膜の良好な一方向性電磁鋼板
の製造方法。 4 仕上焼鈍中800〜900℃の温度域から1100℃迄
の昇温時の酸素分圧を鋼中のMn、Sの量に対応
して第1図のABCDEに囲まれた領域の値にする
ことを特徴とする特許請求の範囲第3項記載の方
法。[Claims] 1% by weight, C: 0.025% to 0.075%, Si: 3.0%
~4.5%, acid soluble Al: 0.010~0.060%, N:
0.0030%~0.0130%, S≦0.010%, and Mn
A silicon steel slab containing so as to satisfy the relationship 0.8%≧Mn≧0.05+7×(S+0.405Se), with the balance consisting of Fe and unavoidable impurities, was hot rolled, cold rolled, and then heated in a wet hydrogen atmosphere. In a method for producing a unidirectional electrical steel sheet in which finish annealing is performed after decarburization annealing and application of an annealing separator, applying a slurry annealing separator of 4 g/m 2 or less per side of the steel sheet to the steel sheet after decarburization annealing, After drying, apply 3 to 6 coats per side of the steel plate on top of it.
g/m 2 of magnesia is applied electrostatically, and the oxygen partial pressure (expressed in PH 2 O / PH 2 ) of the atmosphere in the temperature range from the start of final annealing to 650 ℃ is 0.015 or less, and at 800 to 900 ℃. 1. A method for producing a unidirectional electrical steel sheet with a good forsterite film, characterized by holding the steel sheet in a temperature range of 10 to 30 hours. 2. During final annealing, the oxygen partial pressure when the temperature is raised from 800 to 900℃ to 1100℃ is set to the value in the area surrounded by ABCDE in Figure 1, corresponding to the amount of Mn and S in the steel. A method according to claim 1, characterized in that: 3 In weight%, C: 0.025% to 0.075%, Si: 3.0%
~4.5%, acid soluble Al: 0.010~0.060%, N:
0.0030%~0.0130%, S≦0.010%, Cr:0.07~
0.25% and Mn 0.8%≧Mn≧0.05+7×(S+
0.405Se), and the remainder
Manufacture of unidirectional electrical steel sheets by hot rolling and cold rolling silicon steel slabs containing Fe and unavoidable impurities, decarburizing annealing in a wet hydrogen atmosphere, applying an annealing separator, and post-finish annealing. In the method, a slurry annealing separator of 4 g/m 2 or less per side of the steel plate is applied to the steel plate after decarburization annealing, and after drying, magnesia of 3 to 6 g/m 2 per side of the steel plate is electrostatically applied thereon. And the oxygen partial pressure of the atmosphere in the temperature range from the start of final annealing to 650℃ (expressed as PH 2 O / PH 2 )
A method for producing a unidirectional electrical steel sheet with a good forsterite film, characterized in that the steel sheet is maintained in a temperature range of 800 to 900°C for 10 to 30 hours. 4 During final annealing, set the oxygen partial pressure during temperature rise from 800 to 900℃ to 1100℃ to the value in the area surrounded by ABCDE in Figure 1, corresponding to the amount of Mn and S in the steel. The method according to claim 3, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20775785A JPS6270525A (en) | 1985-09-21 | 1985-09-21 | Manufacture of grain oriented electrical sheet having good forsterite film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20775785A JPS6270525A (en) | 1985-09-21 | 1985-09-21 | Manufacture of grain oriented electrical sheet having good forsterite film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6270525A JPS6270525A (en) | 1987-04-01 |
| JPS633009B2 true JPS633009B2 (en) | 1988-01-21 |
Family
ID=16545039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20775785A Granted JPS6270525A (en) | 1985-09-21 | 1985-09-21 | Manufacture of grain oriented electrical sheet having good forsterite film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6270525A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4810820B2 (en) * | 2004-11-10 | 2011-11-09 | Jfeスチール株式会社 | Directional electrical steel sheet with chromeless coating and method for producing the same |
| JP6436316B2 (en) * | 2016-01-05 | 2018-12-12 | Jfeスチール株式会社 | Method for producing grain-oriented electrical steel sheet |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5432412B2 (en) * | 1973-10-31 | 1979-10-15 | ||
| JPS5419850A (en) * | 1977-07-13 | 1979-02-14 | Sharp Kk | Electronic type sewing machine |
| JPS54120215A (en) * | 1978-03-10 | 1979-09-18 | Nippon Steel Corp | High temperature annealing method of electrical sheets |
| JPS6032896B2 (en) * | 1979-09-14 | 1985-07-31 | 株式会社東芝 | Tape recorder cueing device |
| JPS59190325A (en) * | 1983-04-09 | 1984-10-29 | Nippon Steel Corp | Production of grain-oriented silicon steel plate having excellent iron loss for which continuous casting method is applied |
-
1985
- 1985-09-21 JP JP20775785A patent/JPS6270525A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6270525A (en) | 1987-04-01 |
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