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JPS6330717B2 - - Google Patents
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JPS6330717B2 - - Google Patents

Info

Publication number
JPS6330717B2
JPS6330717B2 JP549581A JP549581A JPS6330717B2 JP S6330717 B2 JPS6330717 B2 JP S6330717B2 JP 549581 A JP549581 A JP 549581A JP 549581 A JP549581 A JP 549581A JP S6330717 B2 JPS6330717 B2 JP S6330717B2
Authority
JP
Japan
Prior art keywords
pattern
transfer
margin
cusp
bubble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP549581A
Other languages
Japanese (ja)
Other versions
JPS57120291A (en
Inventor
Susumu Asata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP549581A priority Critical patent/JPS57120291A/en
Publication of JPS57120291A publication Critical patent/JPS57120291A/en
Publication of JPS6330717B2 publication Critical patent/JPS6330717B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/02Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements
    • G11C19/08Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure
    • G11C19/0808Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation
    • G11C19/0816Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation using a rotating or alternating coplanar magnetic field

Description

【発明の詳細な説明】 本発明はバブル磁区(以下単にバブルと称す)
素子に関する。
[Detailed Description of the Invention] The present invention relates to a bubble magnetic domain (hereinafter simply referred to as bubble).
Regarding elements.

従来、バブル素子にはバブル保持層の上に軟磁
性体パターンを互いに間隙を設けて面内磁場回転
によりバブルを転送させる方式が採用されてき
た。しかし、そのパターンの間隙は、バブル密度
の低下、バブルの高速度転送に対する障害そして
パターン微細加工の限界という点で好ましくなか
つた。
Conventionally, bubble devices have adopted a method in which soft magnetic patterns are provided on a bubble retaining layer with a gap between them and bubbles are transferred by in-plane magnetic field rotation. However, the gaps in the pattern are undesirable from the viewpoint of reducing bubble density, impeding high-speed bubble transfer, and limiting pattern microfabrication.

これに対し、米国特許第3828329号公報におい
て、無間隙のパターンを用いてバブルを転送させ
る素子が提供され、最近急速に開発が進められて
きた。そこではパターンはイオン注入により形成
されている。その転送パターンが円を連らねた形
状であつたことから、その後に開発された無間隙
のパターンを用いた素子をも含めてコンテイギユ
アス・デイスク(以下CDと称す)素子と呼ばれ
ている。
On the other hand, US Pat. No. 3,828,329 provides an element that transfers bubbles using a gapless pattern, and its development has been rapidly progressing recently. There, the pattern is formed by ion implantation. Since the transfer pattern was in the form of a series of circles, devices developed subsequently that used patterns with no gaps were also called continuous disk (hereinafter referred to as CD) devices.

しかしながら、従来のCD素子の転送パターン
は、前記の円を連らねたパターンの他に、米国特
許第4070658号公報に示されている様なコンテイ
ギユアス・ダイアモンド・パターンのような幾つ
かのパターンが試みられているが、いずれが転送
パターンとして好適かは、明確にされていない。
また、今後更にバブル密度を高くするためにパタ
ーン周期を減少させるとき、円を連らねたパター
ンなどは微細加工の限界のため、形成することが
難かしくなりつつある。具体的に、現在素子プロ
セスでの加工限界は約1μmと言われている。従
つて、4μm周期のパターンでも円を連らねた様
な複雑なパターンは、加工限界にあると言える。
However, in addition to the above-mentioned pattern of connected circles, the transfer pattern of conventional CD elements includes several patterns such as a continuous diamond pattern as shown in U.S. Pat. No. 4,070,658. Although attempts have been made, it is not clear which is the preferred transfer pattern.
Furthermore, when the pattern period is reduced in order to further increase the bubble density in the future, it is becoming difficult to form patterns such as a series of circles due to the limitations of microfabrication. Specifically, the processing limit in current device processing is said to be approximately 1 μm. Therefore, it can be said that even a pattern with a period of 4 μm, a complicated pattern such as a series of circles is at the processing limit.

本発明は、このような従来のCD素子の転送パ
ターンの加工上の難点を解決し、転送特性を改善
したパターン形状をもつCD素子を提供すること
を目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to solve such difficulties in processing the transfer pattern of a conventional CD element and to provide a CD element having a pattern shape with improved transfer characteristics.

本発明によれば、転送パターン要素が互いに間
隙のない周期的転送パターンをもつCDバブル素
子において、周期的転送パターン要素として転送
方向の長さがパターン周期に一致する十字状パタ
ーンを用いることにより、パターン形成が容易で
転送特性のよいCDバブル素子が得られる。
According to the present invention, in a CD bubble device in which the transfer pattern elements have a periodic transfer pattern with no gaps between them, by using a cross-shaped pattern whose length in the transfer direction matches the pattern period as the periodic transfer pattern element, A CD bubble element with easy pattern formation and good transfer characteristics can be obtained.

以下、本発明について実施例をもつて詳細に説
明する。
Hereinafter, the present invention will be explained in detail using examples.

実施例 1 第1図は、本発明のバブル素子の転送パターン
要素の一例を示す。パターンの長さはパターン周
期Pである。第2図は、第1図の十字状パターン
要素を並べた周期的パターンを示す。本実施例で
は、カスプ部21の深さaをパターン周期Pの約
1/4倍、カスプ部21の底幅2bはパターン周期
の約1/2倍に設定してある。パターン周期P=4μ
mの場合、カスプ深さaは約1μmカスプ底幅2
bは約2μmであり、このパターンは現在の1μm
ルールのマスク形成技術の範囲内で十分形成でき
る。但し、パターン形成後、パターンの凸部及び
凹部のコーナーが第2図破線23で示す様に若
干、丸みを帯びるが勿論、本発明のパターン形状
はこの様な丸味を帯びたパターン形状も含む。2
2はパターンの頂点部である。
Example 1 FIG. 1 shows an example of a transfer pattern element of a bubble element of the present invention. The length of the pattern is the pattern period P. FIG. 2 shows a periodic pattern in which the cross-shaped pattern elements of FIG. 1 are arranged. In this embodiment, the depth a of the cusp portion 21 is set to approximately 1/4 times the pattern period P, and the bottom width 2b of the cusp portion 21 is set to approximately 1/2 times the pattern period. Pattern period P = 4μ
m, the cusp depth a is approximately 1 μm, and the cusp bottom width 2
b is approximately 2 μm, and this pattern is the current 1 μm
It can be formed sufficiently within the range of mask forming technology according to the rule. However, after the pattern is formed, the corners of the convex portions and concave portions of the pattern are slightly rounded as shown by broken lines 23 in FIG. 2, and the pattern shape of the present invention includes such rounded pattern shapes. 2
2 is the apex portion of the pattern.

第3図はグツド(good)ループでの準静的単
純転送マージンを示す図で、横軸Hrは回転磁場
縦軸Hzはバイアス磁場を表わしている。バブル保
持層は、通常の様にGd3Ga5O12(111)単結晶基板
面の上に、約0.8μmの厚さに液相エピタキシヤル
(LPE)成長されている。バブル保持層はストラ
イプ幅約1.0μmの(SmLuBiCa)3((FeGe)5O12
ーネツトである。
FIG. 3 is a diagram showing the quasi-static simple transfer margin in a good loop, where the horizontal axis Hr represents the rotating magnetic field and the vertical axis Hz represents the bias magnetic field. The bubble retaining layer is conventionally grown on a Gd 3 Ga 5 O 12 (111) single crystal substrate surface to a thickness of about 0.8 μm by liquid phase epitaxial (LPE) growth. The bubble retention layer is (SmLuBiCa) 3 ((FeGe) 5 O 12 garnet with a stripe width of about 1.0 μm).

本実施例では、イオン注入により面内磁化層を
容易に得るため、別種類のドライブ層がLPE成
長されている。そのドライブ層は
(GdSmTmCa)3(FeGe)5O12ガーネツトで厚さは
約0.5μmである。ドライブ層の飽和磁化4πMdは
約590ガウスでQ値は約1.7である。ドライブ層の
上にパターンマスクをAuCrで形成し、その上に
He+イオンを100KeVで5×1015/cm2注入して転
送パターンを形成した。
In this example, a different type of drive layer is grown by LPE in order to easily obtain an in-plane magnetization layer by ion implantation. The drive layer is (GdSmTmCa) 3 (FeGe) 5 O 12 garnet and has a thickness of about 0.5 μm. The drive layer has a saturation magnetization 4πMd of about 590 Gauss and a Q value of about 1.7. A pattern mask is formed with AuCr on the drive layer, and
A transfer pattern was formed by implanting He + ions at 5×10 15 /cm 2 at 100 KeV.

第3図中左下隅の円の周辺の黒丸方向は面内の
磁化困難方向を示す。グツドループとはこの磁化
困難方向に平行に形成されたループのことであ
る。ループは21ビツト長からなるループが3本平
行に形成され、第3図の転送マージンの測定はそ
の中央のループで行なつたものである。
The direction of the black circle around the circle in the lower left corner of FIG. 3 indicates the direction in which magnetization is difficult in the plane. A good loop is a loop formed parallel to this direction of difficult magnetization. Three loops each having a length of 21 bits are formed in parallel, and the measurement of the transfer margin shown in FIG. 3 was performed on the central loop.

さて、第3図で実線31は第2図に示した本発
明の十字状パターンからなるループ(同図中左上
のa)についての点線32はたて長円を連らねた
パターンからなるループ(同b)についての、破
線33は約4μm径の円を連らねたパターンから
なるループ(同c)についてのそれぞれのバブル
転送マージンを示している。この結果から明らか
なように、本発明の十字状パターンは円やたて長
円を連らねたパターンよりマージンが広い。特
に、面内磁場の比較的低い領域でのマージンの改
善が著しい。これは第3図中のbやcに示すよう
な円や長円パターンに沿つて起るエラーが本発明
の十字状パターンでは起らないためであると考え
られる。即ち、本発明の様にカスプ部21から頂
点22へ向かう辺の転送ループ方向となす角を大
きくし、カスプ底幅2bを加工限界以上に確保し
てカスプ部21を形成することが転送に有効に効
いていると考えられる。
Now, in FIG. 3, the solid line 31 indicates a loop (a) in the upper left corner of the present invention shown in FIG. 2, and the dotted line 32 indicates a loop consisting of a pattern of vertical ellipses. Regarding (b), the broken line 33 indicates the bubble transfer margin for each loop (c) consisting of a pattern of circles with a diameter of about 4 μm. As is clear from this result, the cross-shaped pattern of the present invention has a wider margin than a pattern consisting of a series of circles or vertical ellipses. In particular, the margin improvement is remarkable in a region where the in-plane magnetic field is relatively low. This is considered to be because errors that occur along circular or oval patterns as shown in b and c in FIG. 3 do not occur in the cross-shaped pattern of the present invention. That is, it is effective for transfer to form the cusp portion 21 by increasing the angle between the side from the cusp portion 21 toward the apex 22 and the transfer loop direction, and by ensuring the cusp bottom width 2b is greater than the processing limit, as in the present invention. It is thought that it is effective.

第4図は、第1図のパターンを磁化困難軸と垂
直に並べたループでの磁化容易軸側のトラツク、
いわゆるスーパー(super)トラツクでのバブル
の準静的単純転送マージンを示す。このように十
分マージンがあり、これは円を連らねたパターン
のマージンに比べ劣つていない。
Figure 4 shows the track on the easy axis side of a loop in which the pattern in Figure 1 is arranged perpendicular to the axis of hard magnetization.
It shows the quasi-static simple transfer margin of bubbles on the so-called super track. As you can see, there is a sufficient margin, which is comparable to the margin of a pattern consisting of a series of circles.

実施例 2 実施例1において、第2図のカスプ底幅2bは
パターン周期の半分で一定にし、カスプ深さaだ
けをパターン周期Pの0.3倍と深くしたとき、グ
ツドループの準静的単純転送マージンは、第3図
の実線31に比べ、低面内磁場側に広がり、一方
スーパートラツクのマージンは第4図より低面内
磁場側が削られる結果が得られた。
Example 2 In Example 1, when the cusp bottom width 2b in Fig. 2 is kept constant at half the pattern period and only the cusp depth a is made deep to 0.3 times the pattern period P, the quasi-static simple transfer margin of the good loop is It was found that the margin of the supertrack is wider toward the lower in-plane magnetic field than the solid line 31 in FIG. 3, while the margin of the supertrack is narrower toward the lower in-plane magnetic field than in FIG.

実施例 3 実施例2におけるカスプ深さaを逆にパターン
周期Pの約0.2倍と浅くしたとき、グツドループ
の準静的単純転送マージンは、第3図実線に比べ
低面内磁場側が削られ、またスーパートラツクで
は、第4図とほぼ同じか、あるいは若干よい結果
が得られた。
Example 3 When the cusp depth a in Example 2 is made shallower to approximately 0.2 times the pattern period P, the quasi-static simple transfer margin of the good loop is reduced on the low in-plane magnetic field side compared to the solid line in Figure 3. Also, with Super Track, results were obtained that were almost the same as in Figure 4, or slightly better.

実施例 4 実施例1において、カスプ深さaをパターン周
期Pの約0.25倍で一定にし、カスプ底幅2bをパ
ターン周期Pの約1/3に選んだとき、グツドルー
プの転送マージンは第3図の実線31よりやや狭
いが、ほぼ同等、スーパートラツクの場合も第4
図とほぼ同じであつた。
Example 4 In Example 1, when the cusp depth a is kept constant at approximately 0.25 times the pattern period P and the cusp bottom width 2b is selected to be approximately 1/3 of the pattern period P, the transfer margin of the good loop is as shown in FIG. Although it is slightly narrower than the solid line 31, it is almost the same.
It was almost the same as the figure.

実施例 5 実施例4におけるカスプ底幅2bをパターン周
期の約2/3に選んだとき、グツドループの転送マ
ージンは第3図の実線31より悪くなつたが、ス
ーパートラツクでは第4図とほぼ同等であつた。
Example 5 When the cusp bottom width 2b in Example 4 was selected to be about 2/3 of the pattern period, the good loop transfer margin was worse than the solid line 31 in Figure 3, but in the super track it was almost the same as in Figure 4. It was hot.

以上、説明した様に、本発明によれば、加工精
度が1μm程度の現在の技術でもパターン周期の
短かい転送パターンが形成でき、円を連らねたよ
うな複雑な形状のパターンに比べても劣らないバ
ブル転送マージンが得られ、その産業上の意義は
大きい。
As explained above, according to the present invention, a transfer pattern with a short pattern period can be formed even with current technology with a processing accuracy of about 1 μm, compared to a pattern with a complicated shape such as a series of circles. It is possible to obtain a bubble transfer margin that is comparable to that of the conventional method, and its industrial significance is great.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明における十字状転送パターン要
素を示す図、第2図は第1図の十字状パターン要
素を2個並べた周期的パターンを示す図、第3図
はグツドループでの準静的単純転送マージンの測
定結果を示す図、第4図は4μm周期十字状パタ
ーンのスーパートラツクマージンを示す図であ
る。 図において、21はパターンのカスプ部、22
はパターンの頂点部、23は本発明の丸みを帯び
たパターン、Pはパターン周期、aはカスプ深さ
2bはカスプ底幅、31は本発明一実施例の十字
状パターンの転送マージン、32はたて長円を連
らねたパターンの転送マージン、33は円を連ら
ねたパターンの転送マージンを表わす。
FIG. 1 is a diagram showing a cross-shaped transfer pattern element in the present invention, FIG. 2 is a diagram showing a periodic pattern in which two cross-shaped pattern elements of FIG. FIG. 4 is a diagram showing the measurement results of the simple transfer margin, and FIG. 4 is a diagram showing the supertrack margin of a cross-shaped pattern with a period of 4 μm. In the figure, 21 is the cusp part of the pattern, 22
is the apex of the pattern, 23 is the rounded pattern of the present invention, P is the pattern period, a is the cusp depth 2b is the cusp bottom width, 31 is the transfer margin of the cross-shaped pattern of one embodiment of the present invention, 32 is the 33 represents the transfer margin of a pattern of vertical ellipses, and 33 represents the transfer margin of a pattern of circles.

Claims (1)

【特許請求の範囲】[Claims] 1 転送パターン要素が互いに間隙なくつながつ
て形成した周期的転送パターンをもつコンテイギ
ユアス・デイスク・バブル磁区素子において、前
記転送パターン要素は、転送方向の長さがパター
ン周期に一致する十字状パターンであることを特
徴とするバブル磁区素子。
1. In a continuous disk bubble magnetic domain element having a periodic transfer pattern formed by interconnecting transfer pattern elements without gaps, the transfer pattern elements are a cross-shaped pattern whose length in the transfer direction matches the pattern period. A bubble magnetic domain element featuring:
JP549581A 1981-01-16 1981-01-16 Bubble magnetic domain element Granted JPS57120291A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP549581A JPS57120291A (en) 1981-01-16 1981-01-16 Bubble magnetic domain element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP549581A JPS57120291A (en) 1981-01-16 1981-01-16 Bubble magnetic domain element

Publications (2)

Publication Number Publication Date
JPS57120291A JPS57120291A (en) 1982-07-27
JPS6330717B2 true JPS6330717B2 (en) 1988-06-20

Family

ID=11612806

Family Applications (1)

Application Number Title Priority Date Filing Date
JP549581A Granted JPS57120291A (en) 1981-01-16 1981-01-16 Bubble magnetic domain element

Country Status (1)

Country Link
JP (1) JPS57120291A (en)

Also Published As

Publication number Publication date
JPS57120291A (en) 1982-07-27

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