JPS6331855B2 - - Google Patents
Info
- Publication number
- JPS6331855B2 JPS6331855B2 JP60058682A JP5868285A JPS6331855B2 JP S6331855 B2 JPS6331855 B2 JP S6331855B2 JP 60058682 A JP60058682 A JP 60058682A JP 5868285 A JP5868285 A JP 5868285A JP S6331855 B2 JPS6331855 B2 JP S6331855B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- amorphous
- substrate
- metal thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3176—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
- G11B5/3179—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
- G11B5/3183—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes intersecting the gap plane, e.g. "horizontal head structure"
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
- G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】
本発明は磁気ヘツドの製造方法に関し、支持基
板上にスパツタリング法にて非晶質磁性金属薄膜
を生成し、この基板を加工してコイルを巻装する
方法を提供しようとするものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a magnetic head, and provides a method for forming an amorphous magnetic metal thin film on a support substrate by sputtering, processing this substrate, and winding a coil. That is.
これまで、狭トラツク磁気ヘツド用の磁心材料
として、磁束密度や耐摩耗性、高周波領域での透
磁率などの諸特性をもとに満足できるような材料
が得られていない。そのため、従来、第１図に示
すような構造の磁気ヘツドが広く使用されてい
た。なお、同図Ａは正面図、同図Ｂは平面図であ
る。 Up to now, no material has been obtained that satisfies various properties such as magnetic flux density, wear resistance, and magnetic permeability in a high frequency range as a magnetic core material for a narrow track magnetic head. Therefore, conventionally, a magnetic head having a structure as shown in FIG. 1 has been widely used. Note that FIG. A is a front view, and FIG. B is a plan view.
この磁気ヘツドは、図に示すように、単結晶フ
エライトあるいは多結晶フエライトなどの酸化物
磁性材料で磁気ヘツドコア１が構成されており、
そのヘツドギヤツプ部分４にノツチが形成されて
いて、そこにガラスなどの非磁性材料３が充填さ
れ、さらにコア１にコイル２が巻装されているも
のである。 As shown in the figure, this magnetic head has a magnetic head core 1 made of an oxide magnetic material such as single crystal ferrite or polycrystal ferrite.
A notch is formed in the head gap portion 4, which is filled with a non-magnetic material 3 such as glass, and a coil 2 is further wound around the core 1.
酸化物磁性材料は一般に耐摩耗性に優れている
ものであり、コアにノツチを設け、さらにガラス
などを充填することによつて、狭トラツクでなお
かつ耐摩耗性のよい磁気ヘツドを得ている。しか
し、酸化物磁性材料は、パーマロイをはじめとす
る合金磁性材料と比較すると、飽和磁束密度が小
さいものである。そのため、酸化物磁性材料で作
つた磁気ヘツドを抗磁力の高い磁気記録媒体に対
する書込みに使用しようとすると、多量の磁束を
流さなければならないことから、コアが磁気的に
飽和してしまい、前記記録媒体に十分に記録する
ことができない。また、酸化物磁性材料は打抜き
などの塑性加工のできない材料であるため、それ
をコアとするには精密切削や表面研摩などの加工
が必要となる。それだけでなく、機械加工によつ
て生じた表面の加工変質層は、磁気コアの機械的
強度を劣化せしめ、トラツク巾が10μｍ程度の狭
トラツクヘツドの加工は困難であり、磁気ヘツド
の製造工程が非常に複雑で、磁気ヘツドの製造コ
ストが高くなることは避けられない。さらに、磁
気ヘツドとして使用すると、材料そのものが脆い
ため、ギヤツプ部分でのチツピングやグレインの
欠落といつた問題を生ずる。 Oxide magnetic materials generally have excellent wear resistance, and by providing a notch in the core and filling it with glass or the like, a magnetic head with a narrow track and good wear resistance can be obtained. However, oxide magnetic materials have a lower saturation magnetic flux density than alloy magnetic materials such as permalloy. Therefore, when a magnetic head made of oxide magnetic material is used to write on a magnetic recording medium with high coercive force, a large amount of magnetic flux must flow, which causes the core to become magnetically saturated, causing the recording It is not possible to record sufficiently on the medium. Furthermore, since the oxide magnetic material cannot be subjected to plastic processing such as punching, processing such as precision cutting and surface polishing is required to use it as a core. In addition, the damaged layer on the surface caused by machining deteriorates the mechanical strength of the magnetic core, making it difficult to process a narrow track head with a track width of about 10 μm, and making the manufacturing process of the magnetic head extremely difficult. This inevitably increases the complexity and manufacturing cost of the magnetic head. Furthermore, when used as a magnetic head, the material itself is brittle, leading to problems such as chipping at the gap and missing grains.
これに対して、合金磁性材料は、磁気的な特性
に関しては優れているものの、耐摩耗性がよくな
い。そのため、磁気ヘツドとしたときに、磁気記
録媒体との接触部分が実質的に変形してしまい、
ギヤツプ部分が磁気的に短絡されてしまうという
欠点がある。 On the other hand, although alloy magnetic materials have excellent magnetic properties, they do not have good wear resistance. Therefore, when used as a magnetic head, the part that contacts the magnetic recording medium is substantially deformed.
The disadvantage is that the gap portion is magnetically shorted.
本発明は、かかる磁気ヘツドにあつた問題点あ
るいは欠点を、支持基板上にスパツタリング法に
て非晶質磁性金属薄膜を生成し、この基板を所定
形状に加工し、ギヤツプ面が互いに向かい合うよ
うにつき合せて磁気ヘツドコアを形成する方法を
用い、高性能な磁気ヘツドを得るものである。 The present invention solves the problems or drawbacks of such magnetic heads by forming an amorphous magnetic metal thin film on a support substrate by sputtering, processing this substrate into a predetermined shape, and aligning the gap surfaces facing each other. In addition, a method for forming a magnetic head core is used to obtain a high-performance magnetic head.
非晶質金属薄膜の製造方法の一つとして、RF
スパツタ法がある。この方法は、よく知られてい
るように、たとえば（１〜10）×10-2Torr程度の
圧力のアルゴンガスを、高周波交番電関で電離さ
せ、アルゴンイオンを陰極側に配置されているタ
ーゲツトに1KeV程度のエネルギーで衝突させ
て、ターゲツト材料をスパツタさせ、陽極側に配
置された支持基板上にターゲツト材料と同じ組成
の薄膜を形成するものである。この方法では、タ
ーゲツト側からの輻射熱によつて支持基板の温度
が上昇するので、基板温度が非晶質金属の結晶化
温度を越えないように、基板を液体窒素や水など
の冷媒を用いて冷却することにより冷却する。こ
の支持基板上に直接目的とする組成の非晶質磁性
金属薄膜を形成する。 RF is one of the methods for manufacturing amorphous metal thin films.
There is a spatuta method. As is well known, this method involves ionizing argon gas at a pressure of, for example, (1 to 10) x 10 -2 Torr using a high-frequency alternating box electric box, and then ionizing the argon ions to a target placed on the cathode side. The target material is sputtered by colliding with an energy of about 1 KeV to form a thin film having the same composition as the target material on the support substrate placed on the anode side. In this method, the temperature of the supporting substrate increases due to radiant heat from the target side, so the substrate is cooled using a coolant such as liquid nitrogen or water to prevent the substrate temperature from exceeding the crystallization temperature of the amorphous metal. Cool by cooling. An amorphous magnetic metal thin film having a desired composition is directly formed on this support substrate.
この方法によれば、薄膜の組成、非晶質化なら
びに厚みの制御が容易であり、良質で耐摩耗性の
良好な組成を有する非晶質磁性金属薄膜を基板上
に形成できる。さらに、スパツタリングによる作
成であるため、薄くて基板との付着強度も極めて
強い非晶質磁性金属膜を得ることが可能となる。
さらに、スパツタリング法は様々な種類の基板の
使用が可能で、非晶質磁性金属薄膜の形成された
支持基板はそのまま使用するため、効果的なヘツ
ドに製造が可能となる。 According to this method, it is easy to control the composition, amorphization, and thickness of the thin film, and it is possible to form an amorphous magnetic metal thin film of good quality and composition with good wear resistance on the substrate. Furthermore, since it is produced by sputtering, it is possible to obtain an amorphous magnetic metal film that is thin and has extremely strong adhesion to the substrate.
Furthermore, the sputtering method allows the use of various types of substrates, and since the support substrate on which the amorphous magnetic metal thin film is formed can be used as is, it is possible to manufacture an effective head.
なお、膜厚があまり厚くなると、生成膜はその
内部応力によつて前記支持基板から剥離してしま
う恐れがある。そのため、支持基板と目的とする
薄膜との間に、双方となじみのよい層を介在さ
せ、それによつて薄膜の支持基板に対する接着力
を高めて、十分な膜厚の非晶質金属薄膜を得ても
よい。具体的には、はじめアルゴンガスに酸素ガ
スを混入しておき、スパツタリングの進行に従つ
て酸素分圧を徐々に減少させ、ついには酸素分圧
零として、支持基板側から徐々に酸化度が減少
し、ついには非晶質磁性合金となる薄膜を形成す
る。このようにして支持基板上に非晶質磁性金属
薄膜を形成すると、それをかなり厚くしても支持
基板から剥離してしまうようなことはなく、必要
な膜厚の非晶質磁性金属薄膜をガラスなどの酸化
物基板上に均一に形成することができる。ただ、
10μｍ以上の厚さの薄膜を形成しようとすると、
それに大きな内部応力が蓄積され、支持基板が歪
んだり彎曲したりする。このようなおそれのある
ときには、非磁性体層と非晶質磁性金属層とを交
互に積層形成して、膜全体として支持基板に対し
てあまり大きな応力を与えないようにする。ま
た、こうすることにより、高周波特性が良好な狭
トラツクヘツドに最適な構造が得られる。非磁性
体層に抵抗率の比較的高い材料、たとえばSiOや
SiO2、あるいは非晶質金属層を形成する組成の
酸化物などを使用すると、表皮効果が小さくな
り、全体としての高周波特性が良好となる。基板
材料としては、ガラスなどの高抵抗材料を使用す
るのが望ましい。支持基板に銅などの非磁性金属
を使用すると、基板抵抗が低いために、基板中に
渦電流が生じる。それによつて損失が生じるの
で、たとえ磁性体の特性がよかつたとしても、全
体として十分な高周波特性が得られなくなる。よ
つて、磁気装置に使用する場合には、支持基板を
高抵抗材料で構成することが望ましい。 Note that if the film thickness becomes too thick, there is a risk that the generated film will peel off from the support substrate due to its internal stress. Therefore, a layer that is compatible with both is interposed between the supporting substrate and the target thin film, thereby increasing the adhesion of the thin film to the supporting substrate and obtaining an amorphous metal thin film of sufficient thickness. It's okay. Specifically, oxygen gas is mixed into argon gas at first, and as sputtering progresses, the oxygen partial pressure is gradually reduced, until the oxygen partial pressure reaches zero, and the degree of oxidation gradually decreases from the supporting substrate side. Finally, a thin film that becomes an amorphous magnetic alloy is formed. When an amorphous magnetic metal thin film is formed on a supporting substrate in this way, it will not peel off from the supporting substrate even if it is made quite thick. It can be uniformly formed on an oxide substrate such as glass. just,
When trying to form a thin film with a thickness of 10 μm or more,
A large internal stress is accumulated therein, causing the supporting substrate to become distorted or curved. If such a possibility exists, nonmagnetic layers and amorphous magnetic metal layers are alternately laminated to prevent the film as a whole from applying too much stress to the support substrate. Moreover, by doing so, a structure optimal for a narrow track head with good high frequency characteristics can be obtained. The non-magnetic layer is made of a material with relatively high resistivity, such as SiO.
When SiO 2 or an oxide having a composition that forms an amorphous metal layer is used, the skin effect is reduced and the high frequency characteristics as a whole are improved. As the substrate material, it is desirable to use a high resistance material such as glass. When a non-magnetic metal such as copper is used for the support substrate, eddy currents are generated in the substrate due to the low substrate resistance. This causes loss, so even if the magnetic material has good characteristics, sufficient high frequency characteristics cannot be obtained as a whole. Therefore, when used in a magnetic device, it is desirable that the support substrate be made of a high-resistance material.
このようにして、高抵抗基板上に非晶質磁性金
属薄膜をスパツタリング法にて形成してから、所
定の形状に加工し、ギヤツプ形成面が互いに向か
い合うようにして突き合わせて、磁気ヘツドコア
を作る。第２図にその一例を示す。図において、
１１が高抵抗支持基板、１２は非晶質磁性金属薄
膜、１３は両者間に介在する非磁性体層であり、
これによつて支持基板１１と非晶質磁性金属薄膜
１２との接着性を高めている。１４は磁気ギヤツ
プ、１５は磁心窓である。この例では、非晶質磁
性金属薄膜１２の厚さがトラツク巾Ｗとなる。非
晶質磁性金属薄膜１２は磁気的な性質に優れ、耐
摩耗性も良好なものであるため、狭トラツク磁気
ヘツドとして適している。 In this way, an amorphous magnetic metal thin film is formed on a high-resistance substrate by sputtering, processed into a predetermined shape, and butted against each other with the gap forming surfaces facing each other to form a magnetic head core. An example is shown in FIG. In the figure,
11 is a high resistance support substrate, 12 is an amorphous magnetic metal thin film, 13 is a nonmagnetic layer interposed between the two,
This improves the adhesion between the support substrate 11 and the amorphous magnetic metal thin film 12. 14 is a magnetic gap, and 15 is a magnetic core window. In this example, the thickness of the amorphous magnetic metal thin film 12 is the track width W. Since the amorphous magnetic metal thin film 12 has excellent magnetic properties and good wear resistance, it is suitable as a narrow track magnetic head.
そして、本発明は支持基板上にスパツタリング
法による非晶質磁性金属薄膜を生成する構造であ
るため、基板と薄膜の両者によりテープ摺動に対
する耐摩耗性を向上させることができ、良好な耐
摩耗性を発揮でき、積層も容易であり、狭トラツ
クヘツドを精度良く作成できる。 Furthermore, since the present invention has a structure in which an amorphous magnetic metal thin film is formed on a support substrate by a sputtering method, both the substrate and the thin film can improve wear resistance against tape sliding, resulting in good wear resistance. It is easy to stack, and narrow track heads can be created with high precision.
ところで、高分解能の磁気記録体では、その抗
磁力（Hc）が高いため、記録のために供給すべ
き磁束は多くを要し、非晶質磁性金属薄膜１２が
磁気的に飽和してしまうおそれがある。そのため
には、高抵抗基板１１の材質として、高透磁率の
磁性材料を使用すればよい。このようにすれば、
飽和状態となる領域は、ギヤツプ１４のごく近傍
であり、磁気記録媒体に十分な磁束を流すことが
できる。 By the way, since a high-resolution magnetic recording medium has a high coercive force (Hc), a large amount of magnetic flux is required to be supplied for recording, and there is a risk that the amorphous magnetic metal thin film 12 may become magnetically saturated. There is. For this purpose, a magnetic material with high magnetic permeability may be used as the material of the high resistance substrate 11. If you do this,
The region where the saturation state occurs is in the very vicinity of the gap 14, and a sufficient magnetic flux can flow through the magnetic recording medium.
あるいは、第３図に示すように、高抵抗基板１
１上に非晶質磁性金属薄膜１２を十分な厚さに形
成し、そのギヤツプ１４側の端面の巾を厚さより
狭くすることによつても、狭トラツク磁気ヘツド
を構成することができる。これもやはり、磁気ギ
ヤツプ１４のごく近傍の部分が磁気的に飽和する
だけであるので、磁気記録媒体に十分な磁束を供
給することができる。 Alternatively, as shown in FIG.
A narrow track magnetic head can also be constructed by forming an amorphous magnetic metal thin film 12 on the magnetic head 1 to a sufficient thickness and making the width of the end face on the gap 14 side narrower than the thickness. Again, since only a portion in the immediate vicinity of the magnetic gap 14 is magnetically saturated, sufficient magnetic flux can be supplied to the magnetic recording medium.
ところで、ギヤツプ部分を、非晶質磁性金属薄
膜と熱膨張係数がほぼ等しいガラスなどの非磁性
材料で構成するのが望ましい。特に、それをRF
スパツタリング装置などを用いて被着形成する
と、非晶質磁性金属膜と非磁性ギヤツプ材とが強
く接着するので、ビデオヘツドのような磁気記録
媒体との相対速度が大きく、かつそれと接触摺動
する磁気ヘツドでは、良好な耐摩耗性を示す。し
かし、ガラスと非晶質磁性金属膜の耐摩耗性が異
なるので、長期間使用するうちに、ガラスギヤツ
プ部分と非晶質磁性金属膜との間に段差が生じる
ようになる。耐摩耗特性をより良好にするには、
ギヤツプ材の非磁性体層を非晶質非磁性金属膜で
構成する。これは、コアに用いられている非晶質
磁性金属薄膜の上にそれと物性が似ている非磁性
非晶質金属を形成すると、膜同士のなじみがよ
く、また、耐摩耗特性もほぼ同じくなるので、長
時間、磁気記録媒体と接触摺動させても、そのギ
ヤツプ部分に段差が非常に生じにくくなり、その
摺動面が滑らかな状態に保持される。 Incidentally, it is desirable that the gap portion be made of a non-magnetic material such as glass, which has approximately the same coefficient of thermal expansion as the amorphous magnetic metal thin film. In particular, RF it
When deposited using a sputtering device or the like, the amorphous magnetic metal film and the nonmagnetic gap material are strongly adhered to each other, so the relative speed with the magnetic recording medium such as a video head is high, and the material slides in contact with it. Magnetic heads exhibit good wear resistance. However, since the abrasion resistance of glass and the amorphous magnetic metal film are different, after long-term use, a step will develop between the glass gap portion and the amorphous magnetic metal film. For better wear resistance properties,
The nonmagnetic layer of the gap material is composed of an amorphous nonmagnetic metal film. This is because if a non-magnetic amorphous metal with similar physical properties is formed on top of the amorphous magnetic metal thin film used for the core, the films will fit well together and have almost the same wear resistance properties. Therefore, even if the magnetic recording medium is slid in contact with the magnetic recording medium for a long period of time, a step is hardly generated in the gap portion, and the sliding surface is maintained in a smooth state.
以上のように、本発明の磁気ヘツドの製造方法
は、支持基板上にスパツタリング法を用いて非晶
質磁性金属膜を生成し、所定形状に加工してギヤ
ツプ形成面が向かい合うようにつき合せ、巻線を
巻装するものであり、磁気コアの飽和特性、高周
波領域における磁気特性がすぐれ、強度ならびに
耐摩耗性が極めて良好となり、高精度に狭トラツ
クに適した高性能の磁気ヘツドを制御性良く実現
することが可能となり、高性能磁気ヘツドの工業
的製造に大きく寄与するものである。 As described above, the method for manufacturing a magnetic head of the present invention involves forming an amorphous magnetic metal film on a support substrate using a sputtering method, processing it into a predetermined shape, aligning the film with the gap forming surfaces facing each other, and winding the film. The magnetic core has excellent saturation characteristics and magnetic properties in the high frequency range, and has extremely good strength and wear resistance, making it possible to create a high-performance magnetic head suitable for narrow tracks with high precision and good controllability. This will greatly contribute to the industrial production of high-performance magnetic heads.
第１図は従来の磁気ヘツドの一例を示し、同図
Ａは正面図、同図Ｂは平面図である。第２図およ
び第３図はそれぞれ本発明の方法により形成され
た磁気ヘツドの斜視図である。
１１……支持基板、１２……非晶質磁性金属薄
膜、１３……非磁性体層、１４……磁気ギヤツ
プ。
FIG. 1 shows an example of a conventional magnetic head, with FIG. 1A being a front view and FIG. 1B being a plan view. 2 and 3 are perspective views of magnetic heads formed by the method of the present invention, respectively. 11...Support substrate, 12...Amorphous magnetic metal thin film, 13...Nonmagnetic layer, 14...Magnetic gap.
Claims (1)
より非晶質磁性金属薄膜を形成して複合基板を作
成し、その後この複合基板を一対の所定のヘツド
半体形状に加工し、ギヤツプ形成面が互いに向か
い合うように突き合わされて磁気ヘツドコアを形
成することを特徴とする磁気ヘツドの製造方法。 ２ ギヤツプ形成面のギヤツプ材を、スパツタリ
ング法にて形成することを特徴とする特許請求の
範囲第１項記載の磁気ヘツドの製造方法。 ３ 非晶質磁性金属薄膜を、非晶質磁性金属層と
非磁性体層の積層により形成することを特徴とす
る特許請求の範囲第１項記載の磁気ヘツドの製造
方法。[Claims] 1. A composite substrate is created by forming an amorphous magnetic metal thin film on a cooled support substrate by a sputtering method, and then this composite substrate is processed into a pair of predetermined head halves, 1. A method of manufacturing a magnetic head, comprising: forming a magnetic head core by abutting the gap-forming surfaces so as to face each other. 2. The method of manufacturing a magnetic head according to claim 1, wherein the gap material on the gap forming surface is formed by a sputtering method. 3. The method of manufacturing a magnetic head according to claim 1, wherein the amorphous magnetic metal thin film is formed by laminating an amorphous magnetic metal layer and a nonmagnetic layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60058682A JPS60242511A (en) | 1985-03-22 | 1985-03-22 | Manufacture of magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60058682A JPS60242511A (en) | 1985-03-22 | 1985-03-22 | Manufacture of magnetic head |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2488878A Division JPS54116663A (en) | 1978-03-03 | 1978-03-03 | Magnetic device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60242511A JPS60242511A (en) | 1985-12-02 |
| JPS6331855B2 true JPS6331855B2 (en) | 1988-06-27 |
Family
ID=13091324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60058682A Granted JPS60242511A (en) | 1985-03-22 | 1985-03-22 | Manufacture of magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60242511A (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4869308U (en) * | 1971-12-06 | 1973-09-03 | ||
| JPS5194211A (en) * | 1975-02-15 | 1976-08-18 | ||
| JPS52128115A (en) * | 1976-04-20 | 1977-10-27 | Matsushita Electric Ind Co Ltd | Magnetic head and its production |
-
1985
- 1985-03-22 JP JP60058682A patent/JPS60242511A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60242511A (en) | 1985-12-02 |
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