JPS6340796B2 - - Google Patents
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- Publication number
- JPS6340796B2 JPS6340796B2 JP58140116A JP14011683A JPS6340796B2 JP S6340796 B2 JPS6340796 B2 JP S6340796B2 JP 58140116 A JP58140116 A JP 58140116A JP 14011683 A JP14011683 A JP 14011683A JP S6340796 B2 JPS6340796 B2 JP S6340796B2
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- group
- carbon atoms
- less carbon
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 229910052731 fluorine Inorganic materials 0.000 claims description 40
- 239000011737 fluorine Substances 0.000 claims description 40
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 37
- 125000004432 carbon atom Chemical group C* 0.000 claims description 22
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 14
- -1 allylsilane compound Chemical class 0.000 claims description 14
- 125000003342 alkenyl group Chemical group 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 230000000737 periodic effect Effects 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 229910020175 SiOH Inorganic materials 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 150000002221 fluorine Chemical class 0.000 claims description 3
- 229910001507 metal halide Inorganic materials 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000003262 carboxylic acid ester group Chemical class [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 1
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- DNAJDTIOMGISDS-UHFFFAOYSA-N prop-2-enylsilane Chemical group [SiH3]CC=C DNAJDTIOMGISDS-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 150000001342 alkaline earth metals Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 239000007818 Grignard reagent Substances 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- STSCVKRWJPWALQ-UHFFFAOYSA-N TRIFLUOROACETIC ACID ETHYL ESTER Chemical compound CCOC(=O)C(F)(F)F STSCVKRWJPWALQ-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- OOCUOKHIVGWCTJ-UHFFFAOYSA-N chloromethyl(trimethyl)silane Chemical compound C[Si](C)(C)CCl OOCUOKHIVGWCTJ-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002363 herbicidal effect Effects 0.000 description 1
- 239000004009 herbicide Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000002917 insecticide Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Description
1 産業上の利用分野
本発明は、含フツ素アリルシラン化合物及びそ
の製造方法に関するものである。
2 従来技術
近年、含フツ素化合物は医薬、農薬、各種表面
処理剤等として様々な分野で非常に注目されてい
る。しかしながら、1つの重大な問題点として、
どのようにしてフツ素を分子内の目的とする位置
へ選択的に導入するかであるが、これまでそうし
たフツ素の選択的導入を容易かつ高収率で行なえ
る方法、及びその方法によつて得られた含フツ素
有機化合物は殆んど知られていない。
3 発明の目的
本発明の目的は、上記の問題点を解消し、CF3
等の含フツ素基を目的とする位置に有し、かつ含
フツ素基を他の化合物の分子中に組込むことを可
能ならしめる含フツ素アリルシラン化合物、及び
その製造方法を提供することにある。
4 発明の構成
即ち、本発明は、
一般式:
(但、Rfは炭素原子数10以下の含フツ素アル
キル基又は炭素原子数10以下の含フツ素アルケニ
ル基、R1は炭素原子数10以下のアルキル基、炭
素原子数10以下のアルケニル基、アリール基又は
アラルキル基を示す。これらの基には更に置換基
が導入されていてもよい。)
で表わされることを特徴とする含フツ素アリルシ
ラン化合物に係るものである。
この含フツ素アリルシラン化合物は、除草剤、
殺虫剤等の生理活性物質、又はこれらのビルデイ
ングブロツクの中間体として有用である。
また、本発明は、上記含フツ素アリルシラン化
合物を容易かつ高収率に得る方法として、一般
式:
(R1)3SiCH2MX
(但、R1は未置換の若しくは置換された炭素
原子数10以下のアルキル基、炭素原子数10以下の
アルケニル基、アリール基又はアラルキル基、M
はアルカリ土類金属原子等の周期表第a族元素
又は周期表第b族元素若しくは第b族元素、
Xはハロゲン原子を示す。)
で表わされるシランの金属ハロゲン化物と、一般
式:
RfCOOR2
(但、Rfは炭素原子数10以下の含フツ素アル
キル基又は炭素原子数10以下の含フツ素アルケニ
ル基、R2は炭素原子数10以下のアルキル基又は
炭素原子数10以下のアルケニル基を示す。これら
の基には置換基が導入されていてもよい。)
で表わされる含フツ素カルボン酸エステルとを反
応させ、
一般式:
(但、R1,Rfは前記したものと同じである。)
で表わされる含フツ素カルビノールを得、この含
フツ素カルビノールから1分子の(R1)3SiOH
(但、R1は前記したものと同じである。)を脱離
せしめて、
一般式:
(但、R1,Rfは前記したものと同じである。)
で表わされる含フツ素アリルシラン化合物を得る
ことを特徴とする含フツ素アリルシラン化合物の
製造方法に係るものである。
上記した一般式で表わされる本発明による含フ
ツ素アリルシラン化合物において、適用可能な
Rf(含フツ素脂肪族基としては、
一般式:CF3(CF2)o−又は(CF3)2CF(CF2)o−
で表わされる含フツ素脂肪族基が挙げられる。こ
れには、CF3−,CF3CF2−,CF3(CF2)2−,CF3
(CF2)3−,CF3(CF2)4−,CF3(CF2)5−,
(CF3)2CF−,(CF3)2CFCF2−,(CF3)2CF
(CF2)2−,(CF3)2CF(CF2)3−等がある。これら
のアルキル基以外にも不飽和基、特にアルケニル
基、例えばCF2=CF−CF2−,CF3−CF=CF−
等も適用可能である。但、適用する含フツ素脂肪
族基の炭素原子数は、溶媒に対する溶解性を考慮
すれば10以下とする。
また、上記含フツ素脂肪族基は、上記に列記し
たペルフルオロアルキル基又はアルケニル基だけ
でなく、分子鎖の一部に水素原子が結合された例
えばCF3(CF2)2CH2CF2−も適用可能である。
更に、上記Rfとして上記以外にも、芳香族基
置換ヨウ化物、例えばC6H5−CF2−,C6H5−
(CF2)2−等も使用してよい。
また、上記R1としては、メチル基、エチル基、
プロピル基、イソプロピル基、ブチル基、イソブ
チル基等のアルキル基、又は一部に不飽和結合を
有するアルケニル基が適用できるが、炭素原子数
を10以下とする。これら以外にも、R1としてア
リール基、アラルキル基(この場合の置換基は上
記したアルキル基であつてよい。)も適用できる。
一方、本発明による含フツ素アリルシラン化合
物((R2)3SiCH2MX)を得るための上記製造方
法に使用するシランの金属ハロゲン化物として、
R1は上記と同じであり、Mはマグネシウムをは
じめとするアルカリ土類金属原子等の周期表a
族元素、セリウムやイツトリウム、イツテルビウ
ム等の周期表第b族元素、マンガン等の周期表
第b族元素が適用可能である。また、上記ハロ
ゲンXとしては塩素原子、臭素原子が挙げられ
る。上記含フツ素カルボン酸エステル(Rf
COOR2)において、Rfは上記したものと同じ各
種含フツ素脂肪族基が適用可能であり、またR2
としては上記したR1と同様の脂肪族若しくは芳
香族炭化水素基が適用可能である。
また、上記した(R1)3SiOHを脱離せしめる際
には酸又はアルカリを含フツ素カルビノール
に作用させればよい。使用可能な酸は硫酸、リン
酸、トリフルオロ酢酸があり、使用可能なアルカ
リはKHがある。
次に、本発明を、CF3基のアリルシラン骨格へ
の導入に適用した下記式の具体例に即して説明す
る。
まず、CF3源として低価格に入手できるトリフ
ルオロ酢酸エチルに、クロロメチルトリメチルシ
ランとマグネシウムとから得られたグリニヤール
試薬1を反応させ、カルビノール2とした後、ピ
ーターソン(Peterson)脱離を行なわせること
によつて、β−トリフルオロメチルアリルシラン
3を良好な収率(例えば60%)で得ることができ
る。この反応は、次式で表わすことができる
(但、(CH3)3Si−基はTMSとして略記してい
る)。
但、この反応において、脱TMSOHを行なう
際には、(例えば50〜60℃)、減圧(例えば20mm
Hg)下で濃H2SO4を作用させることが望ましい。
仮にそうした加熱、減圧を行なわないとすれば、
生成物3に残すべきTMS基も脱離する場合があ
る。上記反応で得られた含フツ素アリルシラン3
は沸点106.5〜107.0℃を示し、また常温、常圧下
で非常に安定であり、長期保存にも充分に耐えら
れるものである。精製も蒸留によつて簡単に行な
うことができる。
5 実施例
次に、本発明の具体的な実施例を説明するが、
下記の実施例は本発明を限定するものではなく、
その技術的思想に基いて種々に変形することがで
きる。
実施例 1
3ツ口フラスコ(500ml)に、Mg(9.72g,
0.4mol)、エーテル(300ml)を入れ、
(CH3)3SiCH2C(49.1g,0.4mol)をゆつくり
滴下することにより、(CH3)3SiCH2MgClを合成
した。このグリニヤール溶液にCF3CO2C2H5
(28.4g,0.2mol)を1時間かけて滴下したのち、
室温にて1時間撹拌した。反応後、1NHCl溶液
にて反応を停止させ、生じた油層を分離した。溶
媒を留去したのち、減圧蒸留にて生成物(37.9
g)を70%の収率でえた。この生成物の沸点
(BP)85.0〜86.0℃/14mmHgであつた。
また、この生成物の分析データは次の通りであ
つた。19
F NMR(外部標準CF3CO2H):
4.0(CF3)1
H NMR(CDCl3):以下同様):
τ9.96〜9.88(Si(CH3)3)、9.99〜8.81(CH2×
2)、8.50(OH)
IR:3600cm-1(OH)
元素分析:
C44.17,H8.06
計算値 C(44.08)、H(8.51)
濃硫酸(5ml)を入れた3ツ口フラスコ(25
ml)に蒸留装置および滴下ロートをセツトし、2
(1.53g,5.1mol)をゆつくり滴下しながら生成
したアリルシラン3を減圧下でトラツプした。生
成物を再蒸留してアリルシラン(6.8g)を収率
78%,BP55〜97mmHgでえた。
この生成物の分析データは次の通りであつた。19
F NMR:−8.4(CF3)1
H NMR:τ9.93(Si(CH3)3)、9.39(CH2)5.07,
4.55
1. Industrial Application Field The present invention relates to a fluorine-containing allylsilane compound and a method for producing the same. 2. Prior Art In recent years, fluorine-containing compounds have attracted much attention in various fields such as medicines, agricultural chemicals, and various surface treatment agents. However, one major problem is that
The question is how to selectively introduce fluorine into the desired position within the molecule, and so far there have been no methods for selectively introducing fluorine with ease and high yield. Almost no fluorine-containing organic compounds obtained by this method are known. 3. Purpose of the invention The purpose of the present invention is to solve the above problems and to
An object of the present invention is to provide a fluorine-containing allylsilane compound having a fluorine-containing group such as fluorine-containing group at a desired position and making it possible to incorporate the fluorine-containing group into the molecule of another compound, and a method for producing the same. . 4. Structure of the invention That is, the present invention has the following general formula: (However, R f is a fluorine-containing alkyl group with 10 or less carbon atoms or a fluorine-containing alkenyl group with 10 or less carbon atoms, and R 1 is an alkyl group with 10 or less carbon atoms, an alkenyl group with 10 or less carbon atoms. , represents an aryl group or an aralkyl group.These groups may further have a substituent introduced therein. This fluorine-containing allylsilane compound is a herbicide,
It is useful as physiologically active substances such as insecticides, or as intermediates in their building blocks. Further, the present invention provides a method for easily obtaining the fluorine-containing allylsilane compound with high yield, using the general formula: (R 1 ) 3 SiCH 2 MX (where R 1 is the number of unsubstituted or substituted carbon atoms). Alkyl group of 10 or less, alkenyl group of 10 or less carbon atoms, aryl group or aralkyl group, M
is an element of group a of the periodic table such as an alkaline earth metal atom, an element of group b of the periodic table, or an element of group b of the periodic table,
X represents a halogen atom. ) and a silane metal halide represented by the general formula: R f COOR 2 (however, R f is a fluorine-containing alkyl group having 10 or less carbon atoms or a fluorine-containing alkenyl group having 10 or less carbon atoms, R 2 represents an alkyl group having 10 or less carbon atoms or an alkenyl group having 10 or less carbon atoms. Substituents may be introduced into these groups. , general formula: (However, R 1 and R f are the same as above.) A fluorine-containing carbinol represented by is obtained, and one molecule of (R 1 ) 3 SiOH is obtained from this fluorine-containing carbinol.
(However, R 1 is the same as above.) is eliminated, and the general formula: (However, R 1 and R f are the same as those described above.) This invention relates to a method for producing a fluorine-containing allylsilane compound, which is characterized by obtaining a fluorine-containing allylsilane compound represented by the following formula. In the fluorine-containing allylsilane compound according to the present invention represented by the above general formula, applicable
R f (The fluorine-containing aliphatic group has the general formula: CF 3 (CF 2 ) o − or (CF 3 ) 2 CF (CF 2 ) o −
Examples include fluorine-containing aliphatic groups represented by: This includes CF 3 −, CF 3 CF 2 −, CF 3 (CF 2 ) 2 −, CF 3
(CF 2 ) 3 −, CF 3 (CF 2 ) 4 −, CF 3 (CF 2 ) 5 −,
(CF 3 ) 2 CF−, (CF 3 ) 2 CFCF 2 −, (CF 3 ) 2 CF
(CF 2 ) 2 −, (CF 3 ) 2 CF(CF 2 ) 3 −, etc. In addition to these alkyl groups, unsaturated groups, especially alkenyl groups, such as CF2 =CF- CF2- , CF3 -CF=CF-
etc. are also applicable. However, the number of carbon atoms of the fluorine-containing aliphatic group to be applied is 10 or less in consideration of solubility in a solvent. Further, the above-mentioned fluorine-containing aliphatic group is not limited to the perfluoroalkyl group or alkenyl group listed above, but also includes a hydrogen atom bonded to a part of the molecular chain, such as CF 3 (CF 2 ) 2 CH 2 CF 2 − is also applicable. Furthermore, in addition to the above R f , aromatic group-substituted iodides, such as C 6 H 5 −CF 2 −, C 6 H 5 −
(CF 2 ) 2 − etc. may also be used. In addition, the above R 1 includes a methyl group, an ethyl group,
An alkyl group such as a propyl group, isopropyl group, butyl group, or isobutyl group, or an alkenyl group partially having an unsaturated bond can be used, but the number of carbon atoms should be 10 or less. In addition to these, an aryl group or an aralkyl group (the substituent in this case may be the above-mentioned alkyl group) can also be applied as R 1 . On the other hand, as the metal halide of silane used in the above manufacturing method for obtaining the fluorine-containing allylsilane compound ((R 2 ) 3 SiCH 2 MX) according to the present invention,
R 1 is the same as above, and M is a periodic table a of alkaline earth metal atoms such as magnesium.
Group B elements of the periodic table such as cerium, yttrium, and ytterbium, and group B elements of the periodic table such as manganese are applicable. Further, examples of the halogen X include chlorine atom and bromine atom. The above fluorine-containing carboxylic acid ester (R f
COOR 2 ), R f can be the same various fluorine-containing aliphatic groups as mentioned above, and R 2
The same aliphatic or aromatic hydrocarbon groups as R 1 described above can be used as R 1 . In addition, when removing the above-mentioned (R 1 ) 3 SiOH, an acid or alkali is added to the fluorine-containing carbinol. All you have to do is make it work. Usable acids include sulfuric acid, phosphoric acid, and trifluoroacetic acid, and usable alkali is KH. Next, the present invention will be explained based on a specific example of the following formula applied to the introduction of CF 3 group into the allylsilane skeleton. First, ethyl trifluoroacetate, which is available at a low price as a CF 3 source, is reacted with Grignard reagent 1 obtained from chloromethyltrimethylsilane and magnesium to form carbinol 2, and then Peterson elimination is carried out. By carrying out this process, β-trifluoromethylallylsilane 3 can be obtained in a good yield (for example, 60%). This reaction can be expressed by the following formula (however, the (CH 3 ) 3 Si- group is abbreviated as TMS). However, in this reaction, when removing TMSOH, it is necessary to use the
It is desirable to act with concentrated H 2 SO 4 under Hg).
If such heating and depressurization are not performed,
The TMS group that should remain in product 3 may also be eliminated. Fluorine-containing allylsilane 3 obtained by the above reaction
has a boiling point of 106.5 to 107.0°C, is very stable at room temperature and pressure, and can withstand long-term storage. Purification can also be easily carried out by distillation. 5 Examples Next, specific examples of the present invention will be described.
The examples below are not intended to limit the invention;
Various modifications can be made based on the technical idea. Example 1 Mg (9.72g,
0.4mol) and ether (300ml),
(CH 3 ) 3 SiCH 2 MgCl was synthesized by slowly dropping (CH 3 ) 3 SiCH 2 C (49.1 g, 0.4 mol). CF 3 CO 2 C 2 H 5 in this Grignard solution
(28.4g, 0.2mol) was added dropwise over 1 hour,
Stirred at room temperature for 1 hour. After the reaction, the reaction was stopped with 1NHCl solution, and the resulting oil layer was separated. After distilling off the solvent, the product (37.9
g) was obtained with a yield of 70%. The boiling point (BP) of this product was 85.0-86.0°C/14 mmHg. Moreover, the analytical data of this product was as follows. 19 F NMR (external standard CF 3 CO 2 H): 4.0 (CF 3 ) 1 H NMR (CDCl 3 ): τ9.96 to 9.88 (Si(CH 3 ) 3 ), 9.99 to 8.81 (CH 2 ×
2), 8.50 (OH) IR: 3600cm -1 (OH) Elemental analysis: C44.17, H8.06 Calculated value C (44.08), H (8.51) A 3-necked flask (25ml) containing concentrated sulfuric acid (5ml)
ml), set the distillation device and dropping funnel, and
(1.53 g, 5.1 mol) was slowly added dropwise, and the produced allylsilane 3 was trapped under reduced pressure. Redistill the product to yield allylsilane (6.8g)
78% achieved a BP of 55 to 97 mmHg. The analytical data for this product were as follows. 19 F NMR: −8.4 (CF 3 ) 1 H NMR: τ9.93 (Si(CH 3 ) 3 ), 9.39 (CH 2 ) 5.07,
4.55
【式】 IR :1650cm-1(C=C)[Formula] IR: 1650cm -1 (C=C)
Claims (1)
ルキル基又は炭素原子数10以下の含フツ素アルケ
ニル基、R1は炭素原子数10以下のアルキル基、
炭素原子数10以下のアルケニル基、アリール基又
はアラルキル基を示す。) で表わされることを特徴とする含フツ素アリルシ
ラン化合物。 2 一般式: (R1)3SiCH2MX (但、R1は炭素原子数10以下のアルキル基、
炭素原子数10以下のアルケニル基、アリール基又
はアラルキル基、Mは周期表第a族元素又は周
期表第b族若しくは第Vb族元素、Xはハロ
ゲン原子を示す。) で表わされるシランの金属ハロゲン化物と、 一般式: RfCOOR2 (但、Rfは炭素原子数10以下の含フツ素アル
キル基又は炭素原子数10以下の含フツ素アルケニ
ル基、R2は炭素原子数10以下のアルキル基又は
炭素原子数10以下のアルケニル基を示す。) で表わされる含フツ素カルボン酸エステルとを反
応させ、一般式: (但、R1,Rfは前記したものと同じである。) で表わされる含フツ素カルビノールを得、この含
フツ素カルビノールから1分子の(R1)3SiOH
(但、R1は前記したものと同じである。)を脱離
せしめて、一般式: (但、R1,Rfは前記したものと同じである。) で表わされる含フツ素アリルシラン化合物を得る
ことを特徴とする含フツ素アリルシラン化合物の
製造方法。 3 含フツ素カルビノールに対して酸又はアルカ
リを作用させることによつて(R1)3SiOHを脱離
せしめる、特許請求の範囲の第2項に記載した方
法。[Claims] 1. General formula: (However, R f is a fluorine-containing alkyl group having 10 or less carbon atoms or a fluorine-containing alkenyl group having 10 or less carbon atoms, R 1 is an alkyl group having 10 or less carbon atoms,
Indicates an alkenyl group, aryl group, or aralkyl group having 10 or less carbon atoms. ) A fluorine-containing allylsilane compound characterized by the following: 2 General formula: (R 1 ) 3 SiCH 2 MX (However, R 1 is an alkyl group having 10 or less carbon atoms,
An alkenyl group, an aryl group or an aralkyl group having 10 or less carbon atoms, M represents an element of group a of the periodic table or an element of group b or Vb of the periodic table, and X represents a halogen atom. ) and a silane metal halide represented by the general formula: R f COOR 2 (where R f is a fluorine-containing alkyl group having 10 or less carbon atoms or a fluorine-containing alkenyl group having 10 or less carbon atoms, R 2 represents an alkyl group having up to 10 carbon atoms or an alkenyl group having up to 10 carbon atoms.) is reacted with a fluorine-containing carboxylic acid ester represented by the general formula: (However, R 1 and R f are the same as above.) A fluorine-containing carbinol represented by is obtained, and one molecule of (R 1 ) 3 SiOH is obtained from this fluorine-containing carbinol.
(However, R 1 is the same as above.) is eliminated, and the general formula: (However, R 1 and R f are the same as those described above.) A method for producing a fluorine-containing allylsilane compound, which comprises obtaining a fluorine-containing allylsilane compound represented by the following. 3. The method according to claim 2, wherein (R 1 ) 3 SiOH is removed by causing acid or alkali to act on fluorine-containing carbinol.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58140116A JPS6032794A (en) | 1983-07-30 | 1983-07-30 | Fluorine-containing allylsilane compound and method for producing the same |
| GB08419053A GB2145102B (en) | 1983-07-30 | 1984-07-26 | Fluorinated allylic compounds and a process for their preparation |
| DE19843427821 DE3427821A1 (en) | 1983-07-30 | 1984-07-27 | FLUORINATED ALLYL COMPOUNDS AND METHOD FOR THEIR PRODUCTION |
| US06/635,682 US4558148A (en) | 1983-07-30 | 1984-07-30 | Fluorinated allylic compounds and a process for preparing these compounds |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58140116A JPS6032794A (en) | 1983-07-30 | 1983-07-30 | Fluorine-containing allylsilane compound and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6032794A JPS6032794A (en) | 1985-02-19 |
| JPS6340796B2 true JPS6340796B2 (en) | 1988-08-12 |
Family
ID=15261284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58140116A Granted JPS6032794A (en) | 1983-07-30 | 1983-07-30 | Fluorine-containing allylsilane compound and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6032794A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2618668B2 (en) * | 1987-12-24 | 1997-06-11 | 東レ・ダウコーニング・シリコーン株式会社 | Method for producing β-substituted allylsilane |
| JPH0662647B2 (en) * | 1988-02-12 | 1994-08-17 | 信越化学工業株式会社 | Fluorine-containing organosilicon compound |
| JPH02115190A (en) * | 1988-10-21 | 1990-04-27 | Shin Etsu Chem Co Ltd | Fluorine-containing organosilicon compounds |
-
1983
- 1983-07-30 JP JP58140116A patent/JPS6032794A/en active Granted
Non-Patent Citations (1)
| Title |
|---|
| TETRAHEDRON LETTERS=1982 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6032794A (en) | 1985-02-19 |
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