JPS6342739B2 - - Google Patents
Info
- Publication number
- JPS6342739B2 JPS6342739B2 JP55151893A JP15189380A JPS6342739B2 JP S6342739 B2 JPS6342739 B2 JP S6342739B2 JP 55151893 A JP55151893 A JP 55151893A JP 15189380 A JP15189380 A JP 15189380A JP S6342739 B2 JPS6342739 B2 JP S6342739B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- rays
- sample holding
- slit
- profile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000001678 irradiating effect Effects 0.000 claims 3
- 230000003287 optical effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20025—Sample holders or supports therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
【発明の詳細な説明】
本発明はX線ゴニオメーターに関し、特に格子
定数の微少な差を検出するのに適したX線ゴニオ
メーターに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an X-ray goniometer, and particularly to an X-ray goniometer suitable for detecting minute differences in lattice constants.
同一物質であつても、その成生過程において温
度や圧力が異つていたり、又微量元素の混入量が
異なると格子定数が微少量異なる場合がある。こ
のような格子定数の微少な差を測定しようとする
場合、従来においてはまず互いに格子定数が微少
量異つていると思われる2種の粉末試料のうちの
第1種の試料をまず試料装着板(ホルダー)に装
着してゴニオメーターを走査させ、該試料の特定
の結晶反射面によつて回折された特性X線強度の
プロフイールを得、次にそのプロフイールから第
1種の試料のブラツグ角θ1を求めて該試料の格子
定数を算出し、同様に第2種の試料を試料装着板
に装着してゴニオメーターを走査させ特性X線強
度のプロフイールを得、このプロフイールのピー
ク値から第2種の試料の格子定数を算出し、既に
求めた第1種の試料の格子定数と比較するように
している。 Even if the substances are the same, their lattice constants may differ slightly if the temperature or pressure during the formation process is different, or if the amount of trace elements mixed is different. When attempting to measure such minute differences in lattice constants, conventionally the first of two powder samples whose lattice constants are thought to differ by a minute amount from each other is first placed on a sample mounting plate. (holder) and scan the goniometer to obtain a profile of the characteristic X-ray intensity diffracted by a specific crystal reflecting surface of the sample, and then calculate the Bragg angle θ of the first type sample from the profile. 1 and calculate the lattice constant of the sample. Similarly, a second type of sample is mounted on the sample mounting plate and the goniometer is scanned to obtain a characteristic X-ray intensity profile. From the peak value of this profile, the second type of sample is The lattice constant of the seed sample is calculated and compared with the already determined lattice constant of the first type sample.
しかしながら、ゴニオメーターの走査において
は回動の都度わずかではあるが機械的な誤差が入
り込むことは避けられない。又試料装着板のゴニ
オメーターの回転軸への取り付け方もその都度わ
ずかながら異つてしまう。従つて前述したθ1を求
める為の測定と、θ2を求めるための測定を同一の
条件或は同一条件に近い条件で行うことができ
ず、類似した2種の試料格子定数の微少な差を正
確に求めることができない。 However, in scanning with a goniometer, it is inevitable that a slight mechanical error will be introduced each time the goniometer rotates. Furthermore, the method of attaching the sample mounting plate to the rotating shaft of the goniometer is slightly different each time. Therefore, the measurement for determining θ 1 and the measurement for determining θ 2 described above cannot be performed under the same conditions or under conditions close to the same, and the slight difference between the lattice constants of two similar samples cannot be performed. cannot be determined accurately.
本発明はこのような従来の欠点を解決し正確に
格子定数の差を測定することのできるX線ゴニオ
メーターを提供するもので、以下図面に基づき本
発明を詳述する。 The present invention solves these conventional drawbacks and provides an X-ray goniometer that can accurately measure the difference in lattice constants.The present invention will be described in detail below with reference to the drawings.
本発明の一実施例を示す第1図において、1は
基板であり、該基板1上には筒体2が固定されて
いる。該筒体2には図示外のX線源からのX線3
を通過させる切欠4と、試料によつて回折された
X線を通過させる切欠5とを有している。該筒体
2の頂部には円盤6がベアリング7によつて回転
自在に取り付けられている。該円盤6には第2の
筒体8が取り付けられている。該第2の筒体8に
は第1のスリツト9が形成されていると共に、該
第1のスリツト9と180°隔てた位置には第2、第
3のスリツト10a,10bが設けられている。
11は回転軸であり、該回転軸11の先端は切欠
かれており、該切欠かれた部分には試料装着板1
2が板バネ13によつて押圧されて取り付けられ
る。該試料装着板12は第2図に拡大して示すよ
うに、前記回転軸11の方向に沿つて配置された
第1、第2、第3の装着領域A、B、Cに分割さ
れており、第2、第3の領域B、Cは第1の領域
Aの両隣りに対称に形成されている。これら各試
料装着領域は例えば200μm程の深さを有し、帯
状に形成されている。第1の試料装着領域Aには
例えば熱処理を受けた試料が装着され、第2、第
3の領域B、Cには該試料と同一物質で熱処理等
を受けない通常試料が装着される。14,15は
これら各領域に装着された試料から散乱されたX
線の干渉を防ぐためのシールド板である。又前記
スリツト9及びスリツト10a,10bは各々ス
リツト9を通過するX線が試料装着板12の第1
の領域Aにのみ照射され、スリツト10a,10
bを通過したX線が試料装着板12の第2、第3
の領域B、Cにのみ照射されるようにその大きさ
及び位置が決定されている。又回転軸11及び該
回転軸11と共に試料装着板12は図示外のステ
ツプモータにより例えば10秒のカウントタイム毎
に0.01゜ずつ回転する。第3図に示すように試料
によつて回折されたX線を検出するため例えばシ
ンチレーシヨン検出器の如きX線検出器16が備
えられている。該X線検出器16は軸11の回転
に同期して軸11の回転角の2倍で(0.02゜毎)
回転し、試料によつて種々の角度でブラツグ反射
されたX線がX線検出器16に入射する。又第1
図からは明らかでないが、試料より回折されたX
線をX線検出器16に導くために筒体8のスリツ
ト9,10a,10bから離れた部分は切欠かれ
ている。円筒2には蓋体17がX線の漏洩を防ぐ
ため備えられている。18は前記基板1に取り付
けられた支持部材であり、該支持部材18にはス
テツプモータ19が軸20を介して回転円盤6を
180゜ずつ回転させるため取り付けられている。 In FIG. 1 showing an embodiment of the present invention, 1 is a substrate, and a cylinder 2 is fixed on the substrate 1. As shown in FIG. The cylinder body 2 receives X-rays 3 from an X-ray source not shown.
It has a notch 4 through which X-rays pass, and a notch 5 through which X-rays diffracted by the sample pass. A disk 6 is rotatably attached to the top of the cylinder 2 by means of a bearing 7. A second cylindrical body 8 is attached to the disc 6. A first slit 9 is formed in the second cylindrical body 8, and second and third slits 10a and 10b are provided at positions 180° apart from the first slit 9. .
Reference numeral 11 denotes a rotating shaft, and the tip of the rotating shaft 11 is notched, and the sample mounting plate 1 is placed in the notched portion.
2 is pressed by a leaf spring 13 and attached. As shown in an enlarged view in FIG. 2, the sample mounting plate 12 is divided into first, second, and third mounting areas A, B, and C arranged along the direction of the rotation axis 11. , second and third regions B and C are symmetrically formed on both sides of the first region A. Each of these sample mounting areas has a depth of, for example, about 200 μm, and is formed in a band shape. For example, a heat-treated sample is mounted in the first sample mounting area A, and normal samples made of the same material as the sample and not subjected to heat treatment are mounted in the second and third areas B and C. 14 and 15 are the X scattered from the sample attached to each of these areas.
This is a shield plate to prevent wire interference. Further, the slit 9 and the slits 10a and 10b each allow the X-rays passing through the slit 9 to
The slits 10a, 10
The X-rays that have passed through b
Its size and position are determined so that only areas B and C are irradiated. Further, the rotating shaft 11 and the sample mounting plate 12 together with the rotating shaft 11 are rotated by 0.01° every 10 seconds, for example, by a step motor (not shown). As shown in FIG. 3, an X-ray detector 16, such as a scintillation detector, is provided to detect X-rays diffracted by the sample. The X-ray detector 16 synchronizes with the rotation of the shaft 11 at twice the rotation angle of the shaft 11 (every 0.02°).
The X-rays rotate and are reflected by the sample at various angles and enter the X-ray detector 16 . Also the first
Although it is not clear from the figure, the X diffracted from the sample
In order to guide the radiation to the X-ray detector 16, the portion of the cylinder 8 remote from the slits 9, 10a, 10b is cut out. The cylinder 2 is provided with a lid 17 to prevent leakage of X-rays. Reference numeral 18 denotes a support member attached to the substrate 1, and a step motor 19 is connected to the support member 18 to drive the rotary disk 6 through a shaft 20.
It is attached to rotate in 180° increments.
上述した如き構成において、試料装着板12の
第1の試料装着領域Aに例えば熱処理を受けた試
料を、又第2、第3の領域B、Cには該試料と同
一物質で熱処理を受けない通常試料をつめた後該
板12を装着する。次に第1のスリツト9を介し
て第1の領域Aにつめられた試料にX線を照射
し、その際の回折X線をX線検出器16で検出
し、その検出器出力を例えばプリンターの如き表
示手段に出力する。次にステツプモータ19によ
り筒体8を180゜回転させ、スリツト10a,10
bを介して第2、第3の領域につめられた試料に
X線を照射し、その際の回折X線をX線検出器1
6で検出し、その検出信号値をプリントアウトす
る。次に試料装着板12を0.01゜、X線検出器1
6を0.02゜回転させると共に、筒体8を180゜回転さ
せてスリツト9を介して第1の領域Aにつめられ
た試料にX線を照射し、その際の回折X線を検出
してプリントアウトする。次に筒体8を180゜回転
させてスリツト10a,10bを介して第2、第
3の領域B、Cにつめられた試料にX線を照射し
その際のX線を検出し、プリントアウトする。以
下全く同様に試料へのX線の入射角を0.01゜ずつ
増加させる毎に第1の領域Aにつめられた試料よ
りの回折X線強度と、第2、第3の領域B、Cに
つめられた試料よりの回折X線強度とを検出しプ
リントアウトする。このようにすれば、一回のゴ
ニオメーターの回転により例えば第4図に示す如
き熱処理を受けた試料によつて回折されたX線の
強度プロフイールgと通常試料によつて回折され
たX線の強度プロフイールfとが得られる。この
両者の強度プロフイールから強度の最高値を与え
るブラツグ角の差を求め、この差から格子定数の
差を求めることができる。 In the above-described configuration, the first sample mounting area A of the sample mounting plate 12 is filled with a sample that has undergone heat treatment, and the second and third areas B and C are made of the same material as the sample but are not heat treated. Usually, the plate 12 is attached after the sample is packed. Next, the sample packed in the first area A is irradiated with X-rays through the first slit 9, the diffracted X-rays at that time are detected by the X-ray detector 16, and the output of the detector is sent to a printer, for example. output to a display means such as . Next, the cylinder body 8 is rotated 180 degrees by the step motor 19, and the slits 10a, 10
The sample packed in the second and third areas is irradiated with X-rays through
6, and print out the detected signal value. Next, set the sample mounting plate 12 at an angle of 0.01° and the X-ray detector 1.
6 is rotated by 0.02 degrees, and the cylindrical body 8 is rotated by 180 degrees to irradiate the sample filled in the first area A with X-rays through the slit 9, and print by detecting the diffracted X-rays. Go out. Next, the cylinder 8 is rotated 180 degrees to irradiate the samples filled in the second and third regions B and C with X-rays through the slits 10a and 10b, and the X-rays are detected and printed out. do. Similarly, each time the angle of incidence of X-rays on the sample is increased by 0.01°, the diffracted X-ray intensity from the sample packed in the first region A and the packed in the second and third regions B and C The diffracted X-ray intensity from the sample is detected and printed out. In this way, by one rotation of the goniometer, the intensity profile g of X-rays diffracted by a heat-treated sample as shown in FIG. An intensity profile f is obtained. From these two intensity profiles, the difference in Bragg angles that give the highest intensity value can be determined, and from this difference, the difference in lattice constants can be determined.
さて、一般に第5図aにおいてPで示すような
軸を中心として実線SPで示す試料面を回転させ
て第5図bにおいてPPで示す如きプロフイール
が得られる場合に、同図において各々軸GA,
GB,GCを中心として試料面LA,LB,LCを回
転させてプロフイールを得ると、得られるプロフ
イールは第5図bにおいて各々PA,PB,PCで
示されるように試料位置変位(displacement)
に、比例した反射角変位が得られる。ところで、
試料装着板12の取り付けのし方が完全でなかつ
たり、或は装置の製作精度が不充分であるため、
第6図に示すように筒体8の中心軸21に対して
試料装着板12の装着位置が傾くことがある。こ
のような場合試料装着板12の試料装着領域Aに
つけられた試料と、試料装着領域B、Cにつけら
れた試料によつて回折されたX線は試料の格子定
数が同じなら丁度第5図bにおけるプロフイール
PA,PB,PCのように正規なプロフイールPPか
らずれたものとなる。ところでプロフイールPB
とプロフイールPCとを加算したプロフイールは
PBCとなり、そのピーク位置はプロフイールPA
の位置と一致する。従つて本発明における装置に
おいては、試料装着板の装着位置が前述した原因
によつて筒体8の中心軸21に対して傾いていて
も、2種の試料のピーク位置はこの傾きによつて
同じ量だけずれることになり、2種の試料に基づ
くプロフイールのピーク位置の差を求める場合に
は前述した傾きがあることによる誤差は無視でき
る程小さなものとなる。 Now, generally speaking, when the sample surface shown by the solid line SP is rotated around the axis shown by P in Fig. 5a and a profile shown by PP in Fig. 5b is obtained, the axes GA,
When the sample surfaces LA, LB, and LC are rotated around GB and GC to obtain a profile, the resulting profile shows the sample position displacement as shown by PA, PB, and PC, respectively, in Figure 5b.
, a proportional reflection angle displacement is obtained. by the way,
The sample mounting plate 12 may not be attached completely, or the manufacturing precision of the device may be insufficient.
As shown in FIG. 6, the mounting position of the sample mounting plate 12 may be inclined with respect to the central axis 21 of the cylinder 8. In such a case, if the lattice constants of the samples are the same, the X-rays diffracted by the sample attached to sample attachment area A of the sample attachment plate 12 and the samples attached to sample attachment areas B and C will be exactly as shown in Figure 5b. Profile in
The profile deviates from the regular profile PP, such as PA, PB, and PC. By the way, profile PB
The profile obtained by adding the and profile PC is
PBC, and its peak position is profile PA
matches the position of Therefore, in the apparatus of the present invention, even if the mounting position of the sample mounting plate is tilted with respect to the central axis 21 of the cylinder 8 due to the above-mentioned cause, the peak positions of the two types of samples are determined by this tilt. The difference will be the same amount, and when determining the difference between the peak positions of the profiles based on the two types of samples, the error due to the above-mentioned slope will be negligible.
又、上述した本発明に基づく装置においては、
試料装着板の取り付けと、ゴニオメーターの回転
を1度行うだけで、必要なデータを得ることがで
きるため、試料装着板の取り付けとゴニオメータ
ーの回転の再現性が完全でないために介入する誤
差を無くすことができ、極めて正確に2種の試料
の格子定数の差を測定することができる。 Furthermore, in the device based on the present invention described above,
Since the necessary data can be obtained by simply attaching the sample mounting plate and rotating the goniometer once, errors that may occur due to incomplete reproducibility of attaching the sample mounting plate and rotating the goniometer are eliminated. The difference in lattice constants between two types of samples can be measured with great accuracy.
尚、上述した実施例において、高角度側で回折
されたX線を検出することが測定の精度を向上さ
せる上で望ましい。 In the above-described embodiments, it is desirable to detect X-rays diffracted at a high angle in order to improve measurement accuracy.
第1図は本発明の一実施例の概略を示すための
図、第2図は試料装着板を拡大して示すための
図、第3図は試料装着板とX線検出器の回転を説
明するための図、第4図は得られたプロフイール
の一例を示すための図、第5図は試料面を回転さ
せる軸のずれと、得られたプロフイールのずれと
の関係を説明するための図、第6図は筒体8の中
心軸に対して傾斜して取り付けられた試料装着板
を説明するための図である。
1:基板、2,8:筒体、3:X線、4,5:
切欠、6:円盤、7:ベアリング、9,10a,
10b:スリツト、11,20:回転軸、12:
試料装着板、13:板バネ、14,15:シール
ド板、16:X線検出器、17:蓋体、18:支
持部材、19:ステツプモータ、21:中心軸。
Fig. 1 is a diagram showing an outline of an embodiment of the present invention, Fig. 2 is a diagram showing an enlarged view of the sample mounting plate, and Fig. 3 is a diagram explaining the rotation of the sample mounting plate and the X-ray detector. Figure 4 is a diagram to show an example of the obtained profile, and Figure 5 is a diagram to explain the relationship between the deviation of the axis for rotating the sample surface and the deviation of the obtained profile. , FIG. 6 is a diagram for explaining the sample mounting plate attached at an angle with respect to the central axis of the cylinder 8. 1: Substrate, 2, 8: Cylindrical body, 3: X-ray, 4, 5:
Notch, 6: Disc, 7: Bearing, 9, 10a,
10b: Slit, 11, 20: Rotating shaft, 12:
Sample mounting plate, 13: plate spring, 14, 15: shield plate, 16: X-ray detector, 17: lid, 18: support member, 19: step motor, 21: central shaft.
Claims (1)
設けられ、該試料保持軸に垂直な方向から前記試
料保持面にX線を照射するための手段が備えら
れ、前記X線の前記試料面に対する入射角を変え
るため前記試料保持軸はその軸芯を中心として回
転可能になつており、前記X線の照射の結果前記
試料から回折された特性X線を検出するための検
出器が前記保持軸を中心として回転可能に備えら
れ、前記試料保持軸と該検出器とを1対2の角度
比で回転させるための手段が備えられたX線ゴニ
オメーターにおいて、前記試料保持面は前記試料
保持軸の方向に沿つて配置される第1、第2、第
3の領域に分割されており、該第2、第3の領域
は第1の領域の両隣に該第1の領域を中心として
対称に配置されており、前記X線を前記第1の領
域に選択照射するための1個のスリツトを有する
スリツト板と前記X線を前記第2、第3の領域に
選択照射するための2個のスリツトを有するスリ
ツト板とを切換えて前記X線光路上に配置するた
めの手段を備えることを特徴とするX線ゴニオメ
ーター。1. A sample holding surface is provided on a sample holding shaft along the holding axis, and means for irradiating the sample holding surface with X-rays from a direction perpendicular to the sample holding axis is provided, The sample holding shaft is rotatable about its axis in order to change the angle of incidence with respect to the surface, and a detector for detecting characteristic X-rays diffracted from the sample as a result of irradiation with the X-rays is mounted on the sample holding shaft. In an X-ray goniometer that is rotatable about a holding shaft and is provided with means for rotating the sample holding shaft and the detector at an angular ratio of 1:2, the sample holding surface is It is divided into first, second, and third regions arranged along the direction of the holding axis, and the second and third regions are located on both sides of the first region with the first region as the center. A slit plate having one slit for selectively irradiating the first region with the X-rays and two slit plates arranged symmetrically with each other for selectively irradiating the second and third regions with the X-rays. An X-ray goniometer characterized by comprising means for switching between a slit plate having a plurality of slits and arranging the slit plate on the X-ray optical path.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55151893A JPS5776446A (en) | 1980-10-29 | 1980-10-29 | X-ray goniometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55151893A JPS5776446A (en) | 1980-10-29 | 1980-10-29 | X-ray goniometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5776446A JPS5776446A (en) | 1982-05-13 |
| JPS6342739B2 true JPS6342739B2 (en) | 1988-08-25 |
Family
ID=15528494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55151893A Granted JPS5776446A (en) | 1980-10-29 | 1980-10-29 | X-ray goniometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5776446A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4938981B2 (en) * | 2005-01-13 | 2012-05-23 | キヤノン株式会社 | Crystal orientation measurement method |
-
1980
- 1980-10-29 JP JP55151893A patent/JPS5776446A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5776446A (en) | 1982-05-13 |
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