JPS6344059B2 - - Google Patents
Info
- Publication number
- JPS6344059B2 JPS6344059B2 JP2129281A JP2129281A JPS6344059B2 JP S6344059 B2 JPS6344059 B2 JP S6344059B2 JP 2129281 A JP2129281 A JP 2129281A JP 2129281 A JP2129281 A JP 2129281A JP S6344059 B2 JPS6344059 B2 JP S6344059B2
- Authority
- JP
- Japan
- Prior art keywords
- aluminum plate
- heat
- acid
- aluminum
- polyimide resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052782 aluminium Inorganic materials 0.000 claims description 35
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 34
- 229920001721 polyimide Polymers 0.000 claims description 24
- 239000009719 polyimide resin Substances 0.000 claims description 18
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 239000011148 porous material Substances 0.000 claims description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 5
- 150000008065 acid anhydrides Chemical class 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 238000007743 anodising Methods 0.000 claims description 3
- 238000006068 polycondensation reaction Methods 0.000 claims description 3
- 238000005868 electrolysis reaction Methods 0.000 claims description 2
- 238000006114 decarboxylation reaction Methods 0.000 claims 1
- 239000011347 resin Substances 0.000 description 16
- 229920005989 resin Polymers 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 238000011282 treatment Methods 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 150000003949 imides Chemical group 0.000 description 6
- 238000012805 post-processing Methods 0.000 description 6
- 238000007363 ring formation reaction Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229920005575 poly(amic acid) Polymers 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000010407 anodic oxide Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000005187 foaming Methods 0.000 description 3
- 125000005462 imide group Chemical group 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- -1 etc. can be used Chemical compound 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- ZTNJGMFHJYGMDR-UHFFFAOYSA-N 1,2-diisocyanatoethane Chemical compound O=C=NCCN=C=O ZTNJGMFHJYGMDR-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- VGHSXKTVMPXHNG-UHFFFAOYSA-N 1,3-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC(N=C=O)=C1 VGHSXKTVMPXHNG-UHFFFAOYSA-N 0.000 description 1
- WXHLLJAMBQLULT-UHFFFAOYSA-N 2-[[6-[4-(2-hydroxyethyl)piperazin-1-yl]-2-methylpyrimidin-4-yl]amino]-n-(2-methyl-6-sulfanylphenyl)-1,3-thiazole-5-carboxamide;hydrate Chemical compound O.C=1C(N2CCN(CCO)CC2)=NC(C)=NC=1NC(S1)=NC=C1C(=O)NC1=C(C)C=CC=C1S WXHLLJAMBQLULT-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- OMRDSWJXRLDPBB-UHFFFAOYSA-N N=C=O.N=C=O.C1CCCCC1 Chemical compound N=C=O.N=C=O.C1CCCCC1 OMRDSWJXRLDPBB-UHFFFAOYSA-N 0.000 description 1
- WMTLVUCMBWBYSO-UHFFFAOYSA-N N=C=O.N=C=O.C=1C=CC=CC=1OC1=CC=CC=C1 Chemical compound N=C=O.N=C=O.C=1C=CC=CC=1OC1=CC=CC=C1 WMTLVUCMBWBYSO-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical class OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 229920002253 Tannate Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- JXCHMDATRWUOAP-UHFFFAOYSA-N diisocyanatomethylbenzene Chemical compound O=C=NC(N=C=O)C1=CC=CC=C1 JXCHMDATRWUOAP-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Description
本発明は、溶媒可溶性ポリイミド系樹脂よりな
る層とアルミニウム層よりなる後加工可能な耐熱
性積層体に関するものである。
従来よく知られている様に、主鎖にイミド基を
含有するポリイミド系樹脂は溶媒に不溶であり、
従つて、本発明の主旨を満たす積層体を製造する
様な場合においては、イミド基が開環したポリイ
ミド前駆体、即ちポリアミツク酸が有機溶媒に可
溶である事を利用して、まずそのポリアミツク酸
溶液をアルミニウム層にコーテイングして溶媒を
蒸発させると共に、イミド閉環反応を進行させ、
ポリイミド層を形成せしめるのであるが、この時
イミド閉環反応の進行により水が発生して発泡す
る。発泡を防止するためには閉環反応時間を長く
せねばならない。
かかるポリイミド系樹脂を使用して製造したア
ルミニウム板との積層体は、耐熱性があり、成程
産業上有用な素材たり得るが、次に述べる様な後
加工を行なうと種々問題点が発生する。即ち、か
かるポリイミド系樹脂とアルミニウム板との積層
体を用いて、例えばプリント配線基板を製造する
場合、折りまげ加工や絞り加工等の後加工を行な
おうとする時に樹脂層のキレツや破断を生ずるの
である。又、かかるポリイミド樹脂は先に述べた
様に、ポリアミツク酸を経由してイミド閉環反応
によりイミド化するのであるから、一種の架橋型
ポリマーであり、従つてヒートシールする事が出
来ない。即ち、かかる積層体のポリイミド樹脂層
と同層のポリイミド樹脂層とのヒートシールが不
可能である。
本発明者等はかかる問題点を克服し、耐熱性、
絶縁性に優れ、しかも折りまげ加工、絞り加工あ
るいはヒートシール加工等の如き後加工可能な積
層体を得るため鋭意検討した結果本発明に到達し
た。すなわち本発明の要旨は、表面に陽極処理を
施したアルミニウム板で、該陽極処理表面が、平
均径350〜800Åで、密度が少なくとも50ケ/μ2の
細孔を有するアルミニウム板と溶媒可溶型ポリイ
ミド系樹脂を積層してなる後加工可能な耐熱性積
層体に存する。
以下、本発明をさらに詳細に説明するに、本発
明で使用する溶媒可溶性ポリイミド系樹脂とは、
主鎖にイミド基を含有しており、しかも有機溶媒
に可溶である熱可塑性樹脂であるべきであり、非
晶性である事が好ましく、アミド基等の共重合体
であつても構わない。
かかるポリイミド樹脂は、周知の方法で製造す
る事ができる。即ち、芳香族四塩基酸無水物と芳
香族、脂肪族もしくは脂環式ジイソシアネートの
重縮合反応によつて得る事が出来る。この時、芳
香族ジカルボン酸を共重合成分として組み入れる
事も出来るし、芳香族ジカルボン酸と芳香族、脂
肪族もしくは脂環式ジイソシアネートよりなる重
合体を前記ポリイミド縮合物にブレンドする事も
出来る。
芳香族ジイソシアネート化合物としては、トル
イレンジイソシアネート、ジフエニルメタンジイ
ソシアネート、m−フエニレンジイシアネート、
ジフエニルエーテルジイソシアネート、m−キシ
レンジイソシアネート等が用いる事が出来、脂肪
族ジイソシアネート化合物としては、ヘキサメチ
レンジイソシアネート、エチレンジイソシアネー
ト等が用いられ、脂環式ジイソシアネートとして
は、シクロヘキサンジイソシアネート等を用いる
事が出来るが本発明の特長である耐熱性の点から
芳香族ジイソシアネートが望ましい。
一方芳香族四塩基酸無水物としては、3,3′,
4,4′−ベンゾフエノンテトラカルボン酸無水
物、ピロメリツト酸無水物、3,3′,4,4′−ビ
フエニルテトラカルボン酸無水物等を用いる事が
出来るがそれぞれ共重合されていてもよい。
本発明の主旨を満足する為には、使用すべきポ
リイミド樹脂の固有粘度はN,N′−ジメチルホ
ルムアミド溶液において30℃で測定して、0.25
dl/g以上、3.0dl/g以下が望ましい。固有粘
度が0.25より小さいと、得られた樹脂層の性質が
硬くてもろく、折りまげ加工、絞り加工等に際し
て樹脂層が亀裂したり、破断する。固有粘度が
3.0より大きいと重合度が高くなりすぎ、アルミ
ニウム板との積層(コーテイング)に際して難が
ある。
かくして得られた重縮合溶液に、沈澱を生じせ
しめない有機溶媒を適宜加える事により粘度を調
節し、アルミニウム板あるいはアルミニウム箔に
コーテイングし、すみやかに溶媒を揮発せしめる
のであるが、この時化学反応が生じて水が発生し
ないので発泡の原因とならない。
ここで、使用し得る有機溶媒としては、N−メ
チル−2−ピロリドン、N,N′−ジメチルホル
ムアミド、N,N′−ジメチルアセトアミドある
いは石炭酸誘導体等があり、これらの単独あるい
は各々混合して使用する事もでき、又沈澱を生じ
させない範囲でベンゼン、トルエン等の易揮発性
溶媒を混合する事も可能である。
アルミニウム層への本ポリイミド樹脂溶液のコ
ーテイングに際しては公知の方法を用いる事によ
り行なわれる。本発明を達成するためには、更に
折りまげ加工、絞り加工等の後加工における樹脂
層とアルミニウム層のはがれを防止する事が重要
である。
本発明者等は、かかる問題の克服にはアルミニ
ウム板の表面処理が不可欠であることを見出し
た。
一般に、アルミニウム板の接着性向上の表面処
理としては、クロメート処理、リン酸塩処理、タ
ンニン酸チタン処理等の化成皮膜生成による方
法、硫酸、リン酸、クロム酸、スルフアミン酸、
ホウ酸、シユウ酸、スルホサリチル酸、マロン
酸、コハク酸、クエン酸、リンゴ酸などの電解浴
による陽極酸化皮膜生成による方法、塩酸、硝酸
などの電解浴による電解粗面化処理又は、ブラシ
研摩、ホーニングなどの機械的粗面化処理による
方法などがあるが、本発明者等は先に述べた、ポ
リイミド系樹脂とアルミニウム板との接着には、
平均径が350〜800Åで、密度が少なくとも50ケ/
μ2の細孔を有する陽極酸化皮膜をもつたアルミニ
ウム板が、折曲げ加工、絞り加工等の後加工に完
全に耐える事を認めた。
従来公知であるポリアミツク酸のイミド閉環に
よるポリイミド系樹脂を使用した場合には、折り
まげ加工、絞り加工の工程において、樹脂層部の
亀裂は発生するが、アルミニウムとの密着性は良
好であり表面処理を必要としない。この事は、ポ
リアミツク酸よりイミド閉環反応を生じせしめポ
リイミド化する過程において分子内閉環のみなら
ず分子間反応も生じ、アルミニウム層との界面に
おいてアルミニウムと化学的に反応し強固に接着
するのみならず生成した官能基によるアルミニウ
ムとの物理化学接着力とあいまつて絞り加工の様
な大きな変形に対しても強固に接着しているもの
と推測される。本発明に基づく樹脂を使用する場
合、既に説明した如く化学反応は進行せず、又水
素結合の如きアルミニウム層と物理化学的に接着
しうる官能基をもたないため化成処理あるいは表
面粗面化処理によつて成る程接着力は向上するも
のの折りまげ加工、絞り加工の如きアルミニウム
層の局部的伸びあるいは縮みの様な変形に際して
は接着力がまだ不充分であり、陽極酸化の如き生
成した酸化皮膜層に多数の微少な細孔を介在せし
める様な表面処理において、かような局部的伸び
縮みの様な変形に際して有効であると思われる。
本発明を実施するに当り、平均径350〜800Å
で、密度が少なくとも50ケ/μ2の細孔を有する陽
極酸化皮膜は、例えば、アルミニウム板をリン酸
10〜50%の水溶液中で、温度10〜50℃で、電圧10
〜50Vの直流又は交流で陽極酸化することによつ
て得られる。電解時間は所望する酸化皮膜厚さに
よつて異なるが、一般的には、1〜30分である。
なお、ここで用いられるアルミニウム板とは、純
アルミニウム板、または、アルミニウムを主成分
とする合金板、例えば、ケイ素、マグネシウム、
鉄、銅、亜鉛、マンガン、クロム、チタン等を含
むアルミニウム合金板で、板厚は、特に指定はな
いが、一般には、0.03〜3.0mm程度のものが用い
られる。
かようにして得られた本発明の積層体は、耐熱
性、絶縁性、耐薬品性に優れるのみならず折りま
げ加工、絞り加工、あるいはヒートシール等の積
層体の後加工性能も付与され、産業上きわめて有
用な素材となり得るのである。
次に、本発明を実施例によつて更に詳細に説明
するが、本発明はこれによつて何ら制限されな
い。
樹脂製造例 1
米国特許第3708458号の実施例4中に述べられ
ている手順を使用し、3,3′,4,4′−ベンゾフ
エノンテトラカルボン酸無水物と80モル%のトル
イレンジイソシアネートおよび20モル%の4,
4′−ジフエニルメタンジイソシアネートを含む混
合物より共重合ポリイミドを重合した。重合溶媒
は、ジメチルホルムアミドを使用し、樹脂物濃度
は21wt%である。固有粘度は0.6dl/gであり溶
液の粘度は280ポイズであつた。
実施例 1
純度99.7%、板厚0.6mmのアルミニウム板に、
脱脂処理をほどこした後、30%リン酸水溶液中30
℃にて40V(直流)、3分間陽極酸化処理をほどこ
し、水洗、乾燥した。得られた陽極酸化皮膜の細
孔の大きさは、電子顕微鏡観察の結果、500〜800
Åで、平均約650Åで、密度は、約100ケ/μ2であ
つた。この陽極処理済みのアルミニウム板に樹脂
製造例1の方法で重合したポリイミド樹脂をコー
テイングし、残留DMF(ジメチルホルムアミド)
量が700ppm以下になるまで乾燥させ、アルミニ
ウム−ポリイミド積層体を製造した。樹脂層厚み
は15μであつた。得られた積層体について、折り
まげ加工性および絞り性についてのテストを行な
つた。折りまげ加工法は、折り曲げ部が完全に密
着するまでプレスし、折りまげ部の亀裂及び樹脂
層とアルミニウム層とのはがれの状態を観察し
た。また、絞り加工法については、深絞り試験
機・TF−102−12型(東京工機(株)製)を使用し
て、前記積層体から試験片として、5.5cm×5.5cm
の正方形板を切断し、その中心部を第1図に示す
様に深さ7mmに絞つた後、樹脂コート面A、B、
およびC部(領域)におけるアルミニウム板との
密着性について観察した。
該折りまげ加工性および絞り加工性の評価基準
は次のとおり。
◎:完全密着で異常なし。
△:◎と×のほぼ中間(亀裂や剥離が若干見られ
る)
×:亀裂や剥離が明らかに発生している。各々の
結果を表−2に示す。
比較例 1〜6
アルミニウム板の表面処理を、リン酸陽極酸化
処理とは異なり、表−1に示す処理にそれぞれ変
えた他は実施例1と全く同様な操作で積層体を製
造し、さらに折りまげ加工性および絞り加工性も
評価した。表面処理条件を表−1、加工性検討結
果を表−2に示す。
The present invention relates to a post-processable heat-resistant laminate comprising a layer made of a solvent-soluble polyimide resin and an aluminum layer. As is well known, polyimide resins containing imide groups in their main chains are insoluble in solvents.
Therefore, in the case of manufacturing a laminate that satisfies the spirit of the present invention, the polyimide precursor with ring-opened imide groups, that is, polyamic acid, is soluble in organic solvents. Coating the aluminum layer with an acid solution, evaporating the solvent, and proceeding with the imide ring closure reaction,
A polyimide layer is formed, and at this time water is generated due to the progress of the imide ring closure reaction and foaming occurs. In order to prevent foaming, the ring closure reaction time must be increased. A laminate with an aluminum plate manufactured using such a polyimide resin is heat resistant and can be a useful material in the manufacturing industry, but various problems occur when post-processing is performed as described below. . That is, when manufacturing, for example, a printed wiring board using such a laminate of polyimide resin and aluminum plate, the resin layer may crack or break when performing post-processing such as folding or drawing. It is. Furthermore, as mentioned above, such polyimide resin is imidized by imide ring closure reaction via polyamic acid, and therefore is a type of crosslinked polymer and therefore cannot be heat-sealed. That is, it is impossible to heat seal the polyimide resin layer of such a laminate and the same polyimide resin layer. The present inventors have overcome these problems and achieved heat resistance,
The present invention was arrived at as a result of extensive research into obtaining a laminate that has excellent insulation properties and can be subjected to post-processing such as folding, drawing, or heat-sealing. That is, the gist of the present invention is an aluminum plate whose surface is anodized, and the anodized surface has pores having an average diameter of 350 to 800 Å and a density of at least 50 pores/μ 2 and a solvent-soluble aluminum plate. It consists in a heat-resistant laminate which can be post-processed and is made by laminating polyimide resin. Hereinafter, to explain the present invention in more detail, the solvent-soluble polyimide resin used in the present invention is:
It should be a thermoplastic resin that contains imide groups in its main chain and is soluble in organic solvents, preferably amorphous, and may be a copolymer with amide groups, etc. . Such polyimide resin can be manufactured by a well-known method. That is, it can be obtained by a polycondensation reaction of an aromatic tetrabasic acid anhydride and an aromatic, aliphatic or alicyclic diisocyanate. At this time, an aromatic dicarboxylic acid can be incorporated as a copolymerization component, or a polymer consisting of an aromatic dicarboxylic acid and an aromatic, aliphatic or alicyclic diisocyanate can be blended into the polyimide condensate. Aromatic diisocyanate compounds include toluylene diisocyanate, diphenylmethane diisocyanate, m-phenylene diisocyanate,
Diphenyl ether diisocyanate, m-xylene diisocyanate, etc. can be used, hexamethylene diisocyanate, ethylene diisocyanate, etc. can be used as the aliphatic diisocyanate compound, and cyclohexane diisocyanate, etc. can be used as the alicyclic diisocyanate. Aromatic diisocyanates are desirable from the viewpoint of heat resistance, which is a feature of the present invention. On the other hand, aromatic tetrabasic acid anhydrides include 3,3′,
4,4'-benzophenonetetracarboxylic anhydride, pyromellitic anhydride, 3,3',4,4'-biphenyltetracarboxylic anhydride, etc. can be used, but even if they are copolymerized, good. In order to satisfy the purpose of the present invention, the intrinsic viscosity of the polyimide resin to be used must be 0.25 as measured at 30°C in N,N'-dimethylformamide solution.
Desirably dl/g or more and 3.0 dl/g or less. If the intrinsic viscosity is less than 0.25, the resulting resin layer will be hard and brittle, and the resin layer will crack or break during folding, drawing, etc. Intrinsic viscosity
If it is larger than 3.0, the degree of polymerization will be too high, causing difficulties in laminating (coating) with an aluminum plate. The viscosity is adjusted by appropriately adding an organic solvent that does not cause precipitation to the polycondensation solution obtained in this way, and it is coated on an aluminum plate or aluminum foil to quickly volatilize the solvent, but at this time the chemical reaction does not occur. Since no water is generated, it does not cause foaming. Here, examples of organic solvents that can be used include N-methyl-2-pyrrolidone, N,N'-dimethylformamide, N,N'-dimethylacetamide, and carbolic acid derivatives, which may be used alone or in combination. It is also possible to mix easily volatile solvents such as benzene and toluene within a range that does not cause precipitation. Coating the polyimide resin solution onto the aluminum layer is carried out using a known method. In order to achieve the present invention, it is further important to prevent the resin layer and aluminum layer from peeling off during post-processing such as folding and drawing. The present inventors have found that surface treatment of the aluminum plate is essential to overcome this problem. In general, surface treatments for improving the adhesion of aluminum plates include chemical conversion film formation methods such as chromate treatment, phosphate treatment, titanium tannate treatment, sulfuric acid, phosphoric acid, chromic acid, sulfamic acid, etc.
A method of forming an anodic oxide film using an electrolytic bath containing boric acid, oxalic acid, sulfosalicylic acid, malonic acid, succinic acid, citric acid, malic acid, etc., electrolytic surface roughening treatment using an electrolytic bath such as hydrochloric acid, nitric acid, or brush polishing. There are methods such as mechanical roughening treatment such as honing, but the present inventors used the method described above for bonding polyimide resin and aluminum plate.
The average diameter is 350-800 Å and the density is at least 50 Å/
It was confirmed that an aluminum plate with an anodized film having micropores of μ 2 can completely withstand post-processing such as bending and drawing. When using a conventionally known polyimide resin made by imide ring closure of polyamic acid, cracks occur in the resin layer during the folding and drawing processes, but the adhesion to aluminum is good and the surface No processing required. This means that in the process of polyamic acid causing an imide ring-closing reaction and polyimidation, not only intramolecular ring-closing but also intermolecular reactions occur, which chemically reacts with aluminum at the interface with the aluminum layer, resulting in not only strong adhesion. It is presumed that the physicochemical adhesive force with aluminum due to the generated functional groups, together with the strength of the physicochemical adhesion with aluminum, provides strong adhesion even against large deformations such as drawing. When using the resin based on the present invention, as described above, chemical reactions do not proceed, and since it does not have functional groups that can physicochemically adhere to the aluminum layer such as hydrogen bonds, chemical conversion treatment or surface roughening is required. Although the adhesion strength improves to a certain degree with processing, the adhesive strength is still insufficient when the aluminum layer is deformed by local elongation or shrinkage, such as during folding or drawing, and oxidation generated during anodization, etc. It is thought to be effective in surface treatment in which a large number of fine pores are provided in the film layer, and in the case of deformation such as local expansion and contraction. In carrying out the present invention, the average diameter is 350 to 800 Å.
For example, an anodic oxide film having pores with a density of at least 50 pores/ μ2 can be obtained by coating an aluminum plate with phosphoric acid.
In 10-50% aqueous solution, temperature 10-50℃, voltage 10
Obtained by anodizing with ~50V DC or AC. The electrolysis time varies depending on the desired thickness of the oxide film, but is generally 1 to 30 minutes.
Note that the aluminum plate used here refers to a pure aluminum plate or an alloy plate whose main component is aluminum, such as silicon, magnesium,
It is an aluminum alloy plate containing iron, copper, zinc, manganese, chromium, titanium, etc., and although there is no particular specification for the thickness of the plate, it is generally about 0.03 to 3.0 mm. The thus obtained laminate of the present invention not only has excellent heat resistance, insulation, and chemical resistance, but also has post-processing performance of the laminate such as folding, drawing, or heat sealing. It can be an extremely useful material in industry. Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited thereto. Resin Preparation Example 1 Using the procedure described in Example 4 of U.S. Pat. and 20 mol% 4,
A copolyimide was polymerized from a mixture containing 4'-diphenylmethane diisocyanate. Dimethylformamide was used as the polymerization solvent, and the resin concentration was 21 wt%. The intrinsic viscosity was 0.6 dl/g and the viscosity of the solution was 280 poise. Example 1 An aluminum plate with a purity of 99.7% and a thickness of 0.6 mm,
30% in 30% phosphoric acid aqueous solution after degreasing
It was anodized at 40V (DC) for 3 minutes at ℃, washed with water, and dried. As a result of electron microscopic observation, the pore size of the obtained anodic oxide film was 500 to 800.
The average thickness was about 650 Å, and the density was about 100 cells/μ 2 . This anodized aluminum plate is coated with polyimide resin polymerized by the method of resin production example 1, and residual DMF (dimethylformamide) is removed.
The aluminum-polyimide laminate was produced by drying until the amount was 700 ppm or less. The resin layer thickness was 15μ. The obtained laminate was tested for foldability and drawability. In the folding method, the folded parts were pressed until they were completely in contact with each other, and cracks in the folded parts and peeling between the resin layer and the aluminum layer were observed. Regarding the drawing method, a deep drawing tester TF-102-12 model (manufactured by Tokyo Koki Co., Ltd.) was used to draw a 5.5 cm x 5.5 cm test piece from the laminate.
After cutting a square plate and narrowing the center to a depth of 7 mm as shown in Figure 1, resin coated surfaces A, B,
And the adhesion with the aluminum plate in the C part (area) was observed. The evaluation criteria for folding workability and drawing workability are as follows. ◎: Complete adhesion and no abnormality. △: Approximately halfway between ◎ and × (some cracks and peeling are observed) ×: Cracks and peeling clearly occur. The results are shown in Table 2. Comparative Examples 1 to 6 Laminated bodies were produced in exactly the same manner as in Example 1, except that the surface treatment of the aluminum plate was changed from phosphoric acid anodization treatment to the treatment shown in Table 1. Curling workability and drawing workability were also evaluated. Table 1 shows the surface treatment conditions, and Table 2 shows the processability results.
【表】【table】
【表】
実施例 2
樹脂製造例1で製造した樹脂溶液を用いて公知
の方法で流延法によりフイルム厚26μのポリイミ
ドフイルムを得た。本フイルムに含まれている
N,N′−ジメチルホルムアミドの含有率は
700ppm以下であつた。
実施例1に使用したリン酸陽極酸化処理法によ
る積層体の樹脂層部に上記ポリイミドフイルムを
350℃で加熱圧着した。圧着部分の状態は良好で
ありフイルム層と積層体の間のピール強度は3.4
Kg/cmであつた。又、別に本積層体2板を樹脂層
同志350℃で加熱圧着せしめた。両積層体の引き
はがし強度は5.2Kg/cmであり良好であつた。
比較例 7
イミド閉環反応を経由するポリイミド樹脂の代
表例としてDupon′t製KAPTON 100H(厚み26μ)
を選び、フイルム2枚を350℃〜400℃の間で加熱
圧着せしめたところ全く接着しなかつた。なお、
400℃以上では、Alは軟化気味になり圧着工程で
変形した。[Table] Example 2 Using the resin solution produced in Resin Production Example 1, a polyimide film having a film thickness of 26 μm was obtained by casting according to a known method. The content of N,N'-dimethylformamide contained in this film is
It was below 700ppm. The above polyimide film was applied to the resin layer of the laminate produced by the phosphoric acid anodizing method used in Example 1.
Heat and pressure bonding was carried out at 350℃. The condition of the crimped part is good, and the peel strength between the film layer and the laminate is 3.4.
It was Kg/cm. Separately, two sheets of this laminate were heat-pressed together at 350° C. to form resin layers. The peel strength of both laminates was 5.2 kg/cm, which was good. Comparative Example 7 KAPTON 100H (thickness 26μ) manufactured by Dupon't is a representative example of polyimide resin that undergoes imide ring-closing reaction.
When the two films were heat-pressed at 350°C to 400°C, no adhesion occurred. In addition,
At temperatures above 400°C, Al became slightly softened and deformed during the crimping process.
第1図は、本発明の積層体を絞り加工した試験
片の態様を示す図面であつて、イはロの1−1′
線に沿う断面略図、ロは上面図である。
FIG. 1 is a drawing showing an embodiment of a test piece obtained by drawing the laminate of the present invention, in which A and B are 1-1'.
A schematic cross-sectional view taken along the line, and b is a top view.
Claims (1)
該陽極処理表面が、平均径350〜800Åで、密度が
少なくとも50ケ/μ2の細孔を有するアルミニウム
板と溶媒可溶型ポリイミド系樹脂を積層してなる
後加工可能な耐熱性積層体。 2 陽極処理をリン酸濃度10〜50%、温度10〜50
℃および電解電圧10〜50Vの条件で施したアルミ
ニウム板を使用した特許請求の範囲第1項記載の
耐熱性積層体。 3 芳香族四塩基酸無水物と芳香族、脂肪族もし
くは脂環式ジイソシアネートの脱炭酸重縮合反応
によつて得られる有機溶媒に可溶なポリイミド系
樹脂を積層してなる特許請求範囲第1項記載の耐
熱性積層体。[Claims] 1. An aluminum plate whose surface is anodized,
A post-processable heat-resistant laminate comprising an aluminum plate whose anodized surface has pores having an average diameter of 350 to 800 Å and a density of at least 50 pores/μ 2 and a solvent-soluble polyimide resin. 2 Anodizing at a phosphoric acid concentration of 10-50% and a temperature of 10-50%
The heat-resistant laminate according to claim 1, which uses an aluminum plate subjected to the electrolysis at a temperature of 10 to 50 V. 3 Claim 1: A polyimide resin soluble in an organic solvent obtained by a decarboxylation polycondensation reaction of an aromatic tetrabasic acid anhydride and an aromatic, aliphatic or alicyclic diisocyanate. The heat-resistant laminate described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2129281A JPS57135154A (en) | 1981-02-16 | 1981-02-16 | Heat-resisting laminate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2129281A JPS57135154A (en) | 1981-02-16 | 1981-02-16 | Heat-resisting laminate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57135154A JPS57135154A (en) | 1982-08-20 |
| JPS6344059B2 true JPS6344059B2 (en) | 1988-09-02 |
Family
ID=12051057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2129281A Granted JPS57135154A (en) | 1981-02-16 | 1981-02-16 | Heat-resisting laminate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57135154A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013251515A (en) * | 2012-06-04 | 2013-12-12 | Mitsubishi Alum Co Ltd | Printed board |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59142138A (en) * | 1983-02-01 | 1984-08-15 | イビデン株式会社 | Insulating radiating sheet and its manufacture |
| WO2012087107A1 (en) * | 2010-12-23 | 2012-06-28 | Anomax Corp., Ltd. | Integrated plated circuit heat sink and method of manufacture |
| JPWO2018139146A1 (en) * | 2017-01-27 | 2019-11-21 | 積水化学工業株式会社 | Flexible solar cell |
-
1981
- 1981-02-16 JP JP2129281A patent/JPS57135154A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013251515A (en) * | 2012-06-04 | 2013-12-12 | Mitsubishi Alum Co Ltd | Printed board |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57135154A (en) | 1982-08-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI462826B (en) | Flexible copper clad sheet | |
| TWI455671B (en) | Printed circuit board manufacturing method | |
| CN101484513B (en) | Surface modification method for polyimide resin layer and method for producing metal-clad laminate | |
| TWI433879B (en) | Method for surface modification of polyimide resin layer and method for manufacturing sheet metal paste | |
| TW201111165A (en) | Resin composite electrolyzed copper foil, copper clad laminate and print wiring board | |
| TWI889867B (en) | Multi-layer polyimide film | |
| US6916544B2 (en) | Laminate type materials for flexible circuits or similar-type assemblies and methods relating thereto | |
| KR20010082630A (en) | Laminate comprising polyimide and conductor layer, multi-layer wiring board with the use of the same and process for producing the same | |
| JP5469578B2 (en) | Copper-clad laminate having primer layer and wiring board using the same | |
| JP3641952B2 (en) | Polyimide film and flexible substrate | |
| CN101396895A (en) | Double-sided flexible copper-clad laminated substrate and method of producing double-sided flexible copper-clad laminated substrate with carrier | |
| US20080292878A1 (en) | Polyimide film with improved adhesion, process for its fabrication and laminated body | |
| JP5042729B2 (en) | Method for modifying surface of polyimide resin layer and method for producing metal-clad laminate | |
| US8518550B2 (en) | Polyimide, polyimide film and laminated body | |
| JPS6344059B2 (en) | ||
| TW200528265A (en) | Flexible metal foil-polyimide laminate and making method | |
| WO2006129526A1 (en) | Polyimide film, polyimide metal laminate and process for producing the same | |
| JPS6116618B2 (en) | ||
| TWI282759B (en) | Electro-conductive metal plated polyimide substrate | |
| JP5042728B2 (en) | Method for modifying surface of polyimide resin layer and method for producing metal-clad laminate | |
| TW202417547A (en) | Multilayer polyimide film | |
| JP2005135985A (en) | Manufacturing method for printed wiring board | |
| WO2013144992A1 (en) | Copper-clad laminate having primer layer and wiring board using same | |
| JP2008031448A (en) | Method for producing polyimide film and method for producing laminated board | |
| JP5237578B2 (en) | Aromatic polyamide laminated film |