JPS6347224B2 - - Google Patents
Info
- Publication number
- JPS6347224B2 JPS6347224B2 JP17596281A JP17596281A JPS6347224B2 JP S6347224 B2 JPS6347224 B2 JP S6347224B2 JP 17596281 A JP17596281 A JP 17596281A JP 17596281 A JP17596281 A JP 17596281A JP S6347224 B2 JPS6347224 B2 JP S6347224B2
- Authority
- JP
- Japan
- Prior art keywords
- conductive film
- image pickup
- deflection electrode
- treatment
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/70—Arrangements for deflecting ray or beam
- H01J29/72—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
- H01J29/74—Deflecting by electric fields only
Landscapes
- Chemically Coating (AREA)
Description
【発明の詳細な説明】
本発明は電界偏向型の撮像管用偏向電極の製造
方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing an electric field deflection type deflection electrode for an image pickup tube.
撮像管には家庭用の単管カラーカメラ用と放送
用の三管式カラーカメラ用の分野を中心として、
それぞれ小形化、高性能化が進んできている。 For image pickup tubes, we mainly use single-tube color cameras for home use and three-tube color cameras for broadcasting.
Each of these devices is becoming smaller and more sophisticated.
又最近層流形電子銃や高品位TV用などに見ら
れる、電子ビーム発生部やMS形などの新しい電
界偏向系の研究が進められている。 Recently, research has been progressing on new electric field deflection systems such as the electron beam generator and MS type, which are used in laminar flow electron guns and high-definition TVs.
電界偏向型の撮像管はガラス管の内周面に導電
膜を付着させ、所定のパターンを形成して、偏向
電極を作成する。 In an electric field deflection type image pickup tube, a conductive film is attached to the inner peripheral surface of a glass tube and a predetermined pattern is formed to create a deflection electrode.
従来、ガラス管内周面の導電膜、例えばクロ
ム、ニツケルは真空蒸着により形成されている
が、管内周面を真空蒸着するのは量産がしにくい
とか、膜厚を均一にしにくいとか、膜の密着強度
が充分でないという大きな問題が残されている。 Conventionally, conductive films on the inner surface of glass tubes, such as chromium and nickel, have been formed by vacuum evaporation, but vacuum evaporation on the inner surface of glass tubes is difficult to mass-produce, makes it difficult to make the film thickness uniform, and has problems with film adhesion. A major problem remains: insufficient strength.
本発明者は上記の問題を解決する為、無電解メ
ツキによる検討を進めた結果、良好な導電膜を得
る事が出来た。 In order to solve the above problem, the present inventor conducted studies using electroless plating, and as a result, was able to obtain a good conductive film.
すなわち、本発明はガラス管内周面に無電解メ
ツキ法により金属導電膜を付着させ、該金属導電
膜を所定の形状にパターン化する撮像管用偏向電
極の製造方法において、無電解メツキ法として、
脱脂処理、鋭敏化処理、活性化処理のあと次亜リ
ン酸ソーダや次亜リン酸カリウム等の次亜リン酸
のアルカリ金属塩水溶液の処理を行なうことを特
徴とする撮像管用偏向電極の製造方法である。 That is, the present invention provides a method for manufacturing a deflection electrode for an image pickup tube in which a metal conductive film is attached to the inner peripheral surface of a glass tube by an electroless plating method and the metal conductive film is patterned into a predetermined shape.
A method for manufacturing a deflection electrode for an image pickup tube, which comprises performing a treatment with an aqueous solution of an alkali metal salt of hypophosphorous acid such as sodium hypophosphite or potassium hypophosphite after degreasing treatment, sensitization treatment, and activation treatment. It is.
以下さらに詳細に本発明を説明すると、撮像管
用偏向電極は、第1図に示すように、撮像管用ガ
ラス管1の内周面に、ニツケルやクロムのような
導電膜が形成され、しかも該導電膜は所定の形状
にパターン化されて分割された偏向電極2となる
もので、その境界は導電膜が除去されてガラス面
が露出した絶縁領域3となつているものである。 The present invention will be described in more detail below. As shown in FIG. The film is patterned into a predetermined shape to become the divided deflection electrodes 2, and the boundaries thereof are insulating regions 3 where the conductive film is removed and the glass surface is exposed.
このような偏向電極2を作成するには、まずガ
ラス管1の内周面に均一に導電膜を形成し、しか
る後パターン化するのが一般的である。 To create such a deflection electrode 2, it is common to first uniformly form a conductive film on the inner peripheral surface of the glass tube 1, and then pattern it.
しかしながら、導電膜はガラス面に対して高い
密着強度をもつて形成されることが必要であり、
従来の無電解メツキ法として知られている活性化
処理すなわち、脱脂、鋭敏化、活性化の各処理だ
けでは、必要とされる高い密着強度が得られない
ものである。 However, the conductive film needs to be formed with high adhesion strength to the glass surface.
The required high adhesion strength cannot be obtained only by the activation treatment known as the conventional electroless plating method, that is, the degreasing, sensitization, and activation treatments.
本発明は、かかる点に鑑み、活性化処理のあ
と、次亜リン酸ソーダなどの水溶液による処理を
行なうことを特徴とする。この処理は、活性化処
理にて施した塩化パラジウムの還元を充分に行な
つて、析出核となる金属パラジウムを確実に生成
させるためのものであり、一種の還元処理という
ことができる。こうすることにより、後の無電解
メツキにおいて、ニツケルやクロムの付着が良好
となり、結果として密着強度の高いメツキ導電膜
が得られるものである。 In view of this point, the present invention is characterized in that after the activation treatment, a treatment with an aqueous solution such as sodium hypophosphite is performed. This treatment is for sufficiently reducing the palladium chloride applied in the activation treatment to reliably generate metallic palladium that will serve as precipitation nuclei, and can be considered a type of reduction treatment. By doing so, the adhesion of nickel and chromium becomes good in the subsequent electroless plating, and as a result, a plated conductive film with high adhesion strength can be obtained.
電界偏向型撮像管の場合、導電膜をパターン化
する必要がある。その方法としては、フオトエツ
チング法がある。すなわちフオトレジストを全面
塗布し、所定の遮光パターンを有するマスクを管
内周面に密着し、露光・現像後、レジストに覆わ
れていない露呈した導電膜を腐食液にてエツチン
グ除去する方法である。また、リフト・オフ法と
称して、メツキ前にガラス管内面にフオトレジス
トを塗布した後、露光によりレジストパターンを
形成し、レジストが残つている部分の上に施され
た導電膜をレジストとともに除去することにより
電極パターンを形成する事も出来る。さらに言え
ば無電解メツキ後レーザー光を照射することによ
り、不必要部分を除去するレーザー加工法によ
り、電極パターンを形成させる事も可能である。 In the case of an electric field deflection type image pickup tube, it is necessary to pattern the conductive film. One such method is the photoetching method. In other words, a photoresist is applied to the entire surface, a mask having a predetermined light-shielding pattern is closely attached to the inner peripheral surface of the tube, and after exposure and development, the exposed conductive film not covered by the resist is etched away with a corrosive solution. In addition, using the lift-off method, a photoresist is applied to the inner surface of the glass tube before plating, a resist pattern is formed by exposure, and the conductive film applied on the portion where the resist remains is removed together with the resist. By doing so, it is also possible to form an electrode pattern. Furthermore, it is also possible to form an electrode pattern by a laser processing method in which unnecessary portions are removed by irradiating laser light after electroless plating.
無電解メツキにより膜を形成させる場合、Cr
及びNiが考えられるが、形成された膜の接着性
等の特性上Niの方が良好であつた。 When forming a film by electroless plating, Cr
and Ni are considered, but Ni was better in terms of properties such as adhesiveness of the formed film.
又撮像管の場合、膜はガラス管の内面だけ必要
であるので、外面については、マスクをするか又
メツキ後Niの場合であれば希硝酸で外面だけ溶
解剥離する事により、膜を内面だけに形成させる
事が出来る。 In the case of image pickup tubes, the film is only needed on the inner surface of the glass tube, so the outer surface can be coated with a mask, or in the case of Ni after plating, it can be removed by dissolving only the outer surface with dilute nitric acid. It can be formed into
本発明によれば、真空蒸着に比較して、容易に
大量生産が可能であり、又低価で生産する事が可
能になつた。 According to the present invention, compared to vacuum evaporation, mass production is easier and can be produced at a lower cost.
さらに本発明の方法で形成された膜は均一性、
密着性とも良好であり、本撮像管の膜としては非
常に優れている。 Furthermore, the film formed by the method of the present invention has uniformity and
It has good adhesion and is extremely excellent as a film for this image pickup tube.
以下に本発明の実施例を述べる。 Examples of the present invention will be described below.
〔実施例 1〕
1/2インチ撮像管用のガラス管L−29F(日本電
気硝子(株)製)に次の工程により無電解のニツ
ケルメツキを行なつた。[Example 1] Electroless nickel plating was performed on a glass tube L-29F (manufactured by Nippon Electric Glass Co., Ltd.) for a 1/2-inch image pickup tube using the following process.
脱脂・水洗したガラス管を、塩化第二スズ1g
と酢酸3mlを水1に対して溶かした水溶液(25
℃)に3分間漬けて鋭敏化処理を行ない、流水で
30秒間の水洗の後、塩化パラジウム(PdCl2)0.1
gと塩酸0.2mlを水1に溶かした水溶液(45℃)
に1分間浸漬する活性化処理を行ない、次亜リン
酸ソーダ2%水溶液に常温で30秒間浸けた。水洗
の後、無電解ニツケルメツキ液として化成品工業
(株)製の商品名ニツカクロムの20%水溶液を用い、
温度55℃で7分間浸漬して無電解メツキを施し
た。水洗後、室温で1時間の自然乾燥を行ない、
温度200℃・2時間加熱乾燥を行なつた。なお、
この加熱乾燥を行なうと、メツキ導電膜とガラス
面との密着性が若干向上する。 Add 1 g of stannic chloride to the degreased and water-washed glass tube.
An aqueous solution (25
℃) for 3 minutes for sensitization, then rinse with running water.
After 30 seconds of water washing, palladium chloride ( PdCl2 ) 0.1
An aqueous solution of g and 0.2 ml of hydrochloric acid dissolved in 1 part of water (45℃)
Activation treatment was carried out by immersing it in water for 1 minute, and then immersing it in a 2% aqueous solution of sodium hypophosphite for 30 seconds at room temperature. After washing with water, it is used as an electroless nickel plating liquid by Kaseihin Kogyo Co., Ltd.
Using a 20% aqueous solution of Nitsuka Chrome (trade name) manufactured by Co., Ltd.,
Electroless plating was performed by dipping at a temperature of 55°C for 7 minutes. After washing with water, air dry for 1 hour at room temperature.
Heat drying was performed at a temperature of 200°C for 2 hours. In addition,
This heat drying slightly improves the adhesion between the plating conductive film and the glass surface.
以上のようにして0.3μ厚の均質なニツケルの導
電膜をガラス管内周面に形成した後、レーザー加
工機により、所定位置の導電膜を除去して絶縁領
域となし、偏向電極とした。 After forming a homogeneous nickel conductive film with a thickness of 0.3 μm on the inner circumferential surface of the glass tube as described above, the conductive film at a predetermined position was removed using a laser processing machine to form an insulating region, which was then used as a deflection electrode.
〔実施例 2〕
1/2インチ型撮像管用ガラス管L−29Fに対し
て実施例1と同様に脱脂処理と鋭敏化処理を行な
い、水洗後、フオトレジストAZ−1350(米国シツ
プレー社製)を浸漬法によりガラス管内に塗布し
た。その際、ガラス管の外周部は粘着テープによ
り被覆した。フオトレジスト塗布後、90℃30分間
のプレベークを行なつた。焼付けは、付与すべき
パターンの画線幅が200ミクロンと粗いので、ガ
ラス外周部にフイルム原版を密着させ超高圧水銀
燈(1KW)で照射を行なつた。[Example 2] A glass tube L-29F for a 1/2-inch image pickup tube was subjected to degreasing and sensitization treatment in the same manner as in Example 1, and after washing with water, photoresist AZ-1350 (manufactured by Shippray, Inc., USA) was applied. It was applied inside a glass tube by the dipping method. At that time, the outer periphery of the glass tube was covered with adhesive tape. After applying the photoresist, pre-baking was performed at 90°C for 30 minutes. For printing, since the print width of the pattern to be applied was as rough as 200 microns, the original film was placed in close contact with the outer periphery of the glass and irradiated with an ultra-high pressure mercury lamp (1KW).
焼付け後AZ−1350用の現像液で現像した後、
前記実施例1の無電解メツキの後工程を同様に行
ない、ニツケルの無電解メツキを施こした。 After baking and developing with developer for AZ-1350,
Electroless plating of nickel was performed by performing the post-electroless plating process in the same manner as in Example 1.
最後にAZレジストをAZ専用剥離液で剥膜する
リフトオフ法にて、所定の良好な電極パターンを
形成させた。 Finally, a predetermined good electrode pattern was formed using a lift-off method in which the AZ resist was removed using a special AZ stripping solution.
第1図は本発明の製造方法により作成しようと
する撮像管用の偏向電極の一例を示す説明図であ
る。
1…ガラス管、2…偏向電極、3…絶縁領域。
FIG. 1 is an explanatory diagram showing an example of a deflection electrode for an image pickup tube to be manufactured by the manufacturing method of the present invention. 1... Glass tube, 2... Deflection electrode, 3... Insulating region.
Claims (1)
導電膜を付着させ、該金属導電膜を所定の形状に
パターン化する撮像管用偏向電極の製造方法にお
いて、無電解メツキ法として、脱脂処理、鋭敏化
処理、活性化処理のあと次亜リン酸のアルカリ金
属塩水溶液の処理を行なうことを特徴とする撮像
管用偏向電極の製造方法。 2 金属導電膜が、ニツケルまたはクロムからな
る特許請求の範囲第1項記載の撮像管用偏向電極
の製造方法。 3 金属導電膜のパターン化が、フオトエツチン
グ法、リフトオフ法またはレーザー加工法により
行なわれる特許請求の範囲第1項記載の撮像管用
偏向電極の製造方法。[Scope of Claims] 1. A method for manufacturing a deflection electrode for an image pickup tube, in which a metal conductive film is attached to the inner peripheral surface of a glass tube by an electroless plating method, and the metal conductive film is patterned into a predetermined shape. A method for manufacturing a deflection electrode for an image pickup tube, which comprises performing treatment with an aqueous alkali metal salt solution of hypophosphorous acid after degreasing treatment, sensitization treatment, and activation treatment. 2. The method for manufacturing a deflection electrode for an image pickup tube according to claim 1, wherein the metal conductive film is made of nickel or chromium. 3. The method for manufacturing a deflection electrode for an image pickup tube according to claim 1, wherein the metal conductive film is patterned by a photoetching method, a lift-off method, or a laser processing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17596281A JPS5878353A (en) | 1981-11-02 | 1981-11-02 | Manufacture of deflecting electrode for pickup tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17596281A JPS5878353A (en) | 1981-11-02 | 1981-11-02 | Manufacture of deflecting electrode for pickup tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5878353A JPS5878353A (en) | 1983-05-11 |
| JPS6347224B2 true JPS6347224B2 (en) | 1988-09-21 |
Family
ID=16005296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17596281A Granted JPS5878353A (en) | 1981-11-02 | 1981-11-02 | Manufacture of deflecting electrode for pickup tube |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5878353A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5907896A (en) * | 1997-09-10 | 1999-06-01 | Tseng; Shao-Chien | Method for bending forging artistic metallic pipes |
-
1981
- 1981-11-02 JP JP17596281A patent/JPS5878353A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5878353A (en) | 1983-05-11 |
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