JPS6352113B2 - - Google Patents
Info
- Publication number
- JPS6352113B2 JPS6352113B2 JP5032982A JP5032982A JPS6352113B2 JP S6352113 B2 JPS6352113 B2 JP S6352113B2 JP 5032982 A JP5032982 A JP 5032982A JP 5032982 A JP5032982 A JP 5032982A JP S6352113 B2 JPS6352113 B2 JP S6352113B2
- Authority
- JP
- Japan
- Prior art keywords
- air
- plating
- plated
- plating solution
- air pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 57
- 239000000654 additive Substances 0.000 claims description 20
- 238000007772 electroless plating Methods 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 150000001247 metal acetylides Chemical class 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 5
- -1 borides Chemical class 0.000 claims description 3
- 238000013019 agitation Methods 0.000 claims 2
- 239000007788 liquid Substances 0.000 description 15
- 239000010419 fine particle Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 241000080590 Niso Species 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- NQXGLOVMOABDLI-UHFFFAOYSA-N sodium oxido(oxo)phosphanium Chemical compound [Na+].[O-][PH+]=O NQXGLOVMOABDLI-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1664—Process features with additional means during the plating process
- C23C18/1669—Agitation, e.g. air introduction
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1662—Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Chemically Coating (AREA)
Description
【発明の詳細な説明】
本発明は、無電解めつき液のエア撹拌装置に係
り、特にめつき液撹拌用エアの気泡が被めつき物
に直接当たらないようにして、めつき膜厚及び微
粒子添加物の安定した析出が得られるようにした
エア撹拌装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an air stirring device for electroless plating solution, and in particular, it prevents air bubbles of air for stirring the plating solution from directly hitting the object to be plated, thereby improving the plating film thickness and The present invention relates to an air stirring device that allows stable precipitation of particulate additives.
無電解めつきは、電解めつきと異なり、めつき
液に含まれている還元剤によつてめつき材を析出
させて、金属の表面にめつき層を形成するめつき
法であり、特に自動車のクラツチ用部品等の擦過
腐食を生じ易い摺動を伴なう高速重荷重を受ける
機構部品の表面処理に応用され、その自己潤滑性
と耐摩耗性を著しく向上させることができるもの
である。このような大きな特徴を示すのは、めつ
き材の中に、酸化物、炭化物、窒化物、硼化物等
のセラミツク又は金属等の微粒子添加物が分散析
出しているためである。この微粒子添加物は、直
径1μ程度の丸形微粒子であつて、高い自己潤滑
性と耐摩耗性を金属めつき層に与えている。 Unlike electrolytic plating, electroless plating is a plating method in which a plating material is deposited using a reducing agent contained in a plating solution to form a plating layer on the metal surface. It is applied to the surface treatment of mechanical parts that are subject to high-speed heavy loads that involve sliding and are susceptible to scratch corrosion, such as parts for clutches, and can significantly improve their self-lubricating properties and wear resistance. The reason why such a large characteristic is exhibited is that particulate additives such as ceramics such as oxides, carbides, nitrides, borides, etc. or metals are dispersed and precipitated in the plating material. This fine particle additive is a round fine particle with a diameter of approximately 1 μm, and provides high self-lubricating properties and wear resistance to the metal plated layer.
このような無電解めつきを施すには、めつき液
に例えばセラミツクの微粒子添加物を混合して分
散させておき、該めつき液中に被めつき物を所定
時間浸漬してめつき材と微粒子添加物を析出させ
てめつき層を形成する。 To perform such electroless plating, fine particle additives such as ceramic particles are mixed and dispersed in a plating solution, and the object to be plated is immersed in the plating solution for a predetermined period of time. and fine particle additives are precipitated to form a plating layer.
しかしめつき液中に混合された微粒子添加物
は、その表面張力によつて、極めて凝集し易く、
従つてこれをめつき液中に均一に分散させておく
ことは技術的に相当困難である。 However, fine particle additives mixed into the plating solution tend to aggregate extremely easily due to their surface tension.
Therefore, it is technically quite difficult to uniformly disperse this in the plating solution.
従来は、例えばニツケルの無電解めつきの場
合、硫酸ニツケル(NiSO4)に、セラミツク
(SiC)を微粒子添加物として混合し、更に還元
剤である媒介物質として次亜リン酸ソーダ
(NaH2PO2)を加えてメツキ液とし、該めつき
液に、セラミツク(SiC)の凝集を防止して分散
させるため界面活性剤等の分散剤を混合し、めつ
き液槽にはエアを吹き込んで常に撹拌させる装置
が用いられていた。 Conventionally, for example, in the case of electroless plating of nickel, nickel sulfate (NiSO 4 ) is mixed with ceramic (SiC) as a fine particle additive, and sodium hypophosphite (NaH 2 PO 2 ) is added to form a plating solution, and a dispersant such as a surfactant is mixed with the plating solution to prevent the ceramic (SiC) from agglomerating and dispersed, and air is blown into the plating solution tank to constantly stir. A device was used to
即ち、従来の無電解めつき用のめつき槽1の構
造を第1図から第3図により説明すると、めつき
槽1の側面1a,1bには第1図及び第2図に破
線で示す隔膜2,3が設けてあり、めつき液4は
矢印Aで示すように、めつき槽1の上部1cから
側面1a,1bと夫々の隔膜2,3との間から下
向きに入り、暖められてから矢印Bで示すように
少しずつめつき槽1内のめつき液4に混入される
ようになつている。 That is, the structure of a conventional plating bath 1 for electroless plating will be explained with reference to FIGS. Diaphragms 2 and 3 are provided, and the plating liquid 4 enters downward from the upper part 1c of the plating tank 1 between the side surfaces 1a and 1b and the respective diaphragms 2 and 3, as shown by arrow A, and is heated. Then, as shown by arrow B, it is mixed into the plating liquid 4 in the plating tank 1 little by little.
まためつき槽1の底部1dには、第2図に示す
ように、V字形の溝1eが設けられ、各溝1eの
底部には、エアパイプ5が配設され、該エアパイ
プには下向きに45度間隔でエアの吹出し穴5aが
夫々長手方向に多数あけられていて、エアは矢印
Cで示すように下向きに吹き出し、各溝1eの底
に沈澱する微粒子添加物を上方に吹き上げ、エア
は気泡6となつて矢印Dで示すように上昇し、め
つき液4を撹拌する。 Further, as shown in FIG. 2, the bottom 1d of the plating tank 1 is provided with a V-shaped groove 1e, and an air pipe 5 is provided at the bottom of each groove 1e. A large number of air blow-off holes 5a are formed in the longitudinal direction at intervals of 150 degrees, and the air is blown downward as shown by arrow C, blowing up the particulate additives precipitated at the bottom of each groove 1e, and causing air bubbles. 6 and rises as shown by arrow D, stirring the plating solution 4.
しかし上記従来例においては、第3図に示すよ
うに、被めつき物7の要めつき範囲Eの表面7a
にめつき液浸入防止具8を通過した気泡6が次第
に膨張しながら直接当たるため、めつき速度が低
下し、微粒子添加物の析出を阻害するという欠点
があつた。 However, in the above conventional example, as shown in FIG.
Since the bubbles 6 that have passed through the plating liquid infiltration prevention device 8 gradually expand and come into direct contact with the device, the plating speed is reduced and the precipitation of the particulate additives is inhibited.
本発明は、上記した従来技術の欠点を除くため
になされたものであつて、その目的とするところ
は、酸化物、炭化物、窒化物、硼化物、金属等の
微粒子添加物を含むめつき液を用い、該めつき液
をエアパイプから噴出するエアで撹拌するように
した無電解めつき装置において、エアの気泡遮蔽
板を設けることによつて、気泡が被めつき物の表
面に直接当たらないようにすることであり、また
これによつて被めつき物のめつき膜厚及び微粒子
添加物の析出がむらなく安定化するようにし、ま
ためつき速度を増大させ、作業能率の向上を図る
ことである。 The present invention has been made to eliminate the drawbacks of the prior art described above, and its purpose is to provide a plating solution containing particulate additives such as oxides, carbides, nitrides, borides, and metals. In an electroless plating device that uses air bubbles to agitate the plating liquid with air ejected from an air pipe, an air bubble shielding plate is installed to prevent air bubbles from directly hitting the surface of the object to be plated. This also stabilizes the plating film thickness of the object to be plated and the precipitation of the particulate additive, thereby increasing the plating speed and improving work efficiency. That's true.
要するに本発明は、酸化物、炭化物、窒化物、
硼化物、金属等の微粒子添加物を含むめつき液を
用い、該めつき液をエアパイプから噴出するエア
で撹拌するようにした無電解めつき装置におい
て、前記めつき液中に浸漬される被めつき物の最
大横断面積よりも若干大きな横断面積を有する気
泡遮蔽板を該被めつき物と前記エアパイプとの間
に配設し、該エアパイプから噴出するエアの気泡
が前記被めつき物に直接当たらないように構成し
たことを特徴とするものである。 In short, the present invention provides oxides, carbides, nitrides,
In an electroless plating apparatus that uses a plating solution containing particulate additives such as borides and metals and agitates the plating solution with air jetted from an air pipe, the plating solution is immersed in the plating solution. A bubble shielding plate having a cross-sectional area slightly larger than the maximum cross-sectional area of the plated object is disposed between the plated object and the air pipe, so that air bubbles ejected from the air pipe reach the plated object. It is characterized by being constructed so that it does not come into direct contact with the object.
以下本発明を図面に示す実施例に基いて説明す
る。めつき槽1、隔膜2,3、めつき液4、エア
パイプ5、エアの吹出穴5a、被めつき物7、要
めつき範囲Eについては、第1図から第3図に示
す従来例と同様であるが、第4図に示すように、
めつき液浸入防止具8と一体的に気泡遮蔽板9
が、被めつき物7とエアパイプ5との間に配設さ
れている。該気泡遮蔽板9の最大横断面積は、め
つき液4中に浸漬される被めつき物7(要めつき
範囲E)の最大横断面積よりも若干大きく設定さ
れる。望ましくは、被めつき物7が円形断面の場
合には、要めつき範囲Eにおける被めつき物7の
最大半径r1と気泡遮蔽板9の半径r2との差をaと
し、気泡遮蔽板9の上面9aからめつき液4の液
面4aまでの距離をbとした場合、aとbとの比
a/bが、
0.1≦a/b≦0.3
となるように各部の寸法を定めるのがよい。これ
は、実験の結果確認されたもので、a/bが0.1
よりも小さくなると、気泡遮蔽板9が気泡6を遮
る機能が不足し、気泡6が被めつき物7の表面7
aに接触することが多くなり、遮蔽効果が失わ
れ、また逆にa/bが0.3を超えると、気泡6の
遮蔽効果は非常に大きくなるが、エアによるめつ
き液4の撹拌効果が失われ、被めつき物7の表面
7a付近における微粒子添加物がその表面張力に
よつて凝集してしまうため、微粒子添加物が十分
に析出しなくなることが判明したものである。 The present invention will be explained below based on embodiments shown in the drawings. The plating tank 1, diaphragms 2, 3, plating liquid 4, air pipe 5, air blowing hole 5a, object to be plated 7, and required plating area E are the same as the conventional example shown in FIGS. 1 to 3. Similarly, as shown in Figure 4,
A bubble shielding plate 9 is integrated with the plating liquid intrusion prevention device 8.
is arranged between the covered object 7 and the air pipe 5. The maximum cross-sectional area of the bubble shielding plate 9 is set to be slightly larger than the maximum cross-sectional area of the object to be plated 7 (required plating range E) immersed in the plating liquid 4. Preferably, when the object 7 has a circular cross-section, the difference between the maximum radius r 1 of the object 7 and the radius r 2 of the bubble shielding plate 9 in the target range E is set as a, and the air bubble shielding When the distance from the top surface 9a of the plate 9 to the liquid level 4a of the plating liquid 4 is b, the dimensions of each part are determined so that the ratio a/b of a and b is 0.1≦a/b≦0.3. Good. This was confirmed through experiments, and a/b was 0.1.
If the size is smaller than that, the bubble shielding plate 9 will not have the ability to block the bubbles 6, and the surface 7 of the object 7 on which the bubbles 6 will be covered.
If a/b exceeds 0.3, the shielding effect of the air bubbles 6 becomes very large, but the effect of stirring the plating liquid 4 by air is lost. It has been found that since the particulate additives near the surface 7a of the plated object 7 aggregate due to the surface tension, the particulate additives do not precipitate sufficiently.
なお被めつき物7の形状が断面円形でない場合
にも同様の考え方で構成すればよい。 Note that even when the shape of the object 7 to be fitted is not circular in cross section, the same concept may be used.
本発明は、上記のように構成されており、以下
その作用について説明する。エアパイプ5から噴
出したエアは気泡6となつて、第4図に示すよう
に次第に膨張しながら上昇し、そのうちの一部の
ものは気泡遮蔽板9に当たつて、横にそれて上昇
するため、被めつき物7の表面7aに直接接触す
る気泡6はなくなる。しかも該気泡6は表面7a
の比較的近傍を通過して上昇するので、気泡6に
よるめつき液4の撹拌効果は全く損われない。こ
れは比a/bを0.1〜0.3の範囲に保つことによつ
て最もよく達成される。 The present invention is configured as described above, and its operation will be explained below. The air ejected from the air pipe 5 becomes bubbles 6, which gradually expand and rise as shown in FIG. 4, and some of them hit the bubble shielding plate 9 and deviate laterally and rise. , the air bubbles 6 that come into direct contact with the surface 7a of the object 7 to be plated disappear. Moreover, the bubble 6 is on the surface 7a.
Since the plating liquid 4 passes relatively close to the plating liquid 4 and rises, the effect of stirring the plating liquid 4 by the bubbles 6 is not impaired at all. This is best achieved by keeping the ratio a/b in the range of 0.1 to 0.3.
以上によつて、めつき液4はエアにより十分に
撹拌されるため微粒子添加物が凝集することもな
く、また気泡6が被めつき物7の表面7aに接触
しないので、めつき材と共に微粒子添加物が十分
に析出し、めつき膜厚が安定化し、まためつき速
度が速くなる。 As described above, the plating liquid 4 is sufficiently agitated by air, so that the particulate additives do not aggregate, and the air bubbles 6 do not come into contact with the surface 7a of the object 7 to be plated, so that the particulate additives are mixed together with the plating material. The additives are sufficiently precipitated, the plating film thickness is stabilized, and the plating speed becomes faster.
本発明は、上記のように構成され、作用するも
のであるから、酸化物、炭化物、窒化物、硼化
物、金属等の微粒子添加物を含むめつき液を用
い、該めつき液をエアパイプから噴出するエアで
撹拌するようにした無電解めつき装置において、
エアの気泡遮蔽板を設けたので、気泡が被めつき
物の表面に直接当たらないようにすることがで
き、この結果被めつき物のめつき膜厚及び微粒子
添加物の析出がむらなく安定化すると共にめつき
速度が増大し、作業能率が向上する効果が得られ
る。 Since the present invention is constructed and operates as described above, it uses a plating solution containing particulate additives such as oxides, carbides, nitrides, borides, metals, etc., and the plating solution is supplied from an air pipe. In an electroless plating device that is stirred by jetting air,
Since an air bubble shielding plate is installed, air bubbles can be prevented from directly hitting the surface of the plated object, and as a result, the plating film thickness of the plated object and the precipitation of fine particle additives are even and stable. As the plating speed increases, the plating speed increases and work efficiency is improved.
第1図から第3図は従来例に係り、第1図はめ
つき槽の平面図、第2図は第1図の−矢視縦
断面図、第3図は被めつき物と気泡との相互関係
を示す部分縦断面図、第4図は本発明の実施例に
係る被めつき物と気泡と気泡遮蔽板との相互関係
を示す縦断面図である。
4はめつき液、5はエアパイプ、6は気泡、7
は被めつき物、9は気泡遮蔽板である。
Figures 1 to 3 relate to conventional examples, with Figure 1 being a plan view of the plating tank, Figure 2 being a vertical sectional view taken in the direction of the - arrow in Figure 1, and Figure 3 showing the relationship between the plated material and air bubbles. FIG. 4 is a partial vertical cross-sectional view showing the mutual relationship between the object to be fitted, the bubble, and the bubble shielding plate according to the embodiment of the present invention. 4 is plating liquid, 5 is air pipe, 6 is air bubble, 7
9 is a covering plate, and 9 is a bubble shielding plate.
Claims (1)
微粒子添加物を含むめつき液を用い、該めつき液
をエアパイプから噴出するエアで撹拌するように
した無電解めつき装置において、前記めつき液中
に浸漬される被めつき物の最大横断面積よりも若
干大きな横断面積を有する気泡遮蔽板を該被めつ
き物と前記エアパイプとの間に配設し、該エアパ
イプから噴出するエアの気泡が前記被めつき物に
直接当たらないように構成したことを特徴とする
無電解めつき液のエア撹拌装置。1. In an electroless plating apparatus using a plating solution containing particulate additives such as oxides, carbides, nitrides, borides, metals, etc., the plating solution is agitated with air jetted from an air pipe. A bubble shielding plate having a cross-sectional area slightly larger than the maximum cross-sectional area of the object to be plated that is immersed in the plating solution is disposed between the object to be plated and the air pipe, and air is blown out from the air pipe. An air agitation device for an electroless plating solution, characterized in that the air agitation device is configured to prevent air bubbles from directly hitting the object to be plated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5032982A JPS58167763A (en) | 1982-03-28 | 1982-03-28 | Air stirring apparatus for electroless plating liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5032982A JPS58167763A (en) | 1982-03-28 | 1982-03-28 | Air stirring apparatus for electroless plating liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58167763A JPS58167763A (en) | 1983-10-04 |
| JPS6352113B2 true JPS6352113B2 (en) | 1988-10-18 |
Family
ID=12855867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5032982A Granted JPS58167763A (en) | 1982-03-28 | 1982-03-28 | Air stirring apparatus for electroless plating liquid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58167763A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63288445A (en) * | 1987-05-20 | 1988-11-25 | Wako Kk | Auto-reverse mechanism for cassette tape player |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6531277B2 (en) * | 2015-03-30 | 2019-06-19 | 株式会社 コーア | Electroless plating solution and electroless plating method |
| IT201700012608A1 (en) * | 2017-02-06 | 2018-08-06 | Arnaldo Morganti | Improved anti-friction mechanical components, coating process and plant tank for their manufacture |
-
1982
- 1982-03-28 JP JP5032982A patent/JPS58167763A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63288445A (en) * | 1987-05-20 | 1988-11-25 | Wako Kk | Auto-reverse mechanism for cassette tape player |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58167763A (en) | 1983-10-04 |
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