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JPS6354237B2 - - Google Patents
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JPS6354237B2 - - Google Patents

Info

Publication number
JPS6354237B2
JPS6354237B2 JP57221433A JP22143382A JPS6354237B2 JP S6354237 B2 JPS6354237 B2 JP S6354237B2 JP 57221433 A JP57221433 A JP 57221433A JP 22143382 A JP22143382 A JP 22143382A JP S6354237 B2 JPS6354237 B2 JP S6354237B2
Authority
JP
Japan
Prior art keywords
substrate
thick film
nozzle
drawing nozzle
film paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57221433A
Other languages
Japanese (ja)
Other versions
JPS59111387A (en
Inventor
Shinichi Kudo
Akira Kabeshita
Shuichi Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57221433A priority Critical patent/JPS59111387A/en
Priority to DE8383307644T priority patent/DE3373380D1/en
Priority to EP83307644A priority patent/EP0113979B1/en
Publication of JPS59111387A publication Critical patent/JPS59111387A/en
Priority to US06/802,950 priority patent/US4656048A/en
Publication of JPS6354237B2 publication Critical patent/JPS6354237B2/ja
Granted legal-status Critical Current

Links

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  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、描画ノズルを用いた厚膜回路パター
ンの形成方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for forming a thick film circuit pattern using a drawing nozzle.

従来例の構成とその問題点 従来より厚膜回路パターンを形成する方法とし
ては、量産にはスクリーン印刷法が広く用いられ
ているのに対し、試作には描画法が用いられつつ
ある。これは試作の場合は試行錯誤が繰り返され
るため、その度にスクリーン版を設計、製作して
いたのでは時間がかかり過ぎるのに対し、描画法
ではコンピユータ制御により自由なパターンを短
時間で製作できるので開発期間を短縮できるため
である。
Conventional Structures and Problems Conventionally, as a method for forming thick film circuit patterns, screen printing has been widely used for mass production, while drawing methods are increasingly being used for trial production. In the case of prototyping, trial and error is repeated, and it would take too much time to design and produce a screen version each time, whereas with the drawing method, free patterns can be produced in a short time using computer control. This is because the development period can be shortened.

さて従来の描画法は先ず第1図に示すように厚
膜ペースト(抵抗)3を吐出する描画ノズル4の
先端に取り付けたスタイラス5を基板1に接触さ
せた状態で描画ノズル4を基板1に対して相対的
に移動せしめて基板1表面に原膜ペースト3を塗
布する方法や、また第3図に示すように描画ノズ
ル4を基板1に対する相対的移動方向に傾けた状
態で前記基板1の表面に当接し厚膜ペースト3を
塗布する方法が用いられてきた。これらの方法は
厚膜ペーストの塗布厚みを均一する効果を有して
いる。しかしながら、いずれの方法でもスタイラ
ス5あるいは描画ノズル4が基板1に接触してい
るため第2図および第4図に示すように描画ノズ
ル4を相対的に移動する際に基板1表面や導体パ
ターン2などの他の回路パターンに傷6が発生
し、焼成後の電気特性に悪影響を及ぼすことがあ
る。また基板1には通常セラミツク基板が用いら
れるがセラミツクは非常に硬いため、基板1に接
触しているスタイラス5や描画ノズル4が摩耗し
てしまうため高い頻度で描画ノズル4の交換が必
要になる。さらに相対的な移動速度を速めるとス
タイラス5や描画ノズル4が曲つたり折れてしま
い、描画スピードの向上が困難という欠点があつ
た。これらの欠点のためあくまで試作に適してい
るが量産用としては全く不適であつた。
Now, in the conventional drawing method, as shown in FIG. There is a method in which the original film paste 3 is applied to the surface of the substrate 1 by moving the drawing nozzle 4 relative to the substrate 1, as shown in FIG. A method of applying thick film paste 3 in contact with the surface has been used. These methods have the effect of making the thickness of the thick film paste uniform. However, in either method, the stylus 5 or the drawing nozzle 4 is in contact with the substrate 1, so when the drawing nozzle 4 is relatively moved as shown in FIGS. Scratches 6 may occur in other circuit patterns such as, which may adversely affect the electrical characteristics after firing. Furthermore, a ceramic substrate is usually used for the substrate 1, but since ceramic is very hard, the stylus 5 and drawing nozzle 4 that are in contact with the substrate 1 will wear out, making it necessary to replace the drawing nozzle 4 frequently. . Furthermore, if the relative moving speed is increased, the stylus 5 and the drawing nozzle 4 will bend or break, making it difficult to improve the drawing speed. Due to these shortcomings, it was only suitable for prototype production, but completely unsuitable for mass production.

発明の目的 本発明は上記欠点に鑑み、高速でしかも信頼性
よく描く量産用に適した厚膜回路パターンの形成
方法を提供することにある。
OBJECTS OF THE INVENTION In view of the above drawbacks, it is an object of the present invention to provide a method for forming thick film circuit patterns that can be drawn at high speed and with high reliability and is suitable for mass production.

発明の構成 本発明は、厚膜ペーストを吐出する描画ノズル
が基板と接触することなく、基板に対して一定の
距離を保持しながら厚膜ペーストを塗布すること
により、回路パターンを傷つけることがなく、ま
た移動速度の向上が図れるという特有の効果を有
する。
Structure of the Invention The present invention enables the drawing nozzle that discharges the thick film paste to apply the thick film paste without contacting the board and while maintaining a certain distance from the board, thereby preventing damage to the circuit pattern. , it also has the unique effect of increasing movement speed.

実施例の説明 以下本発明の一実施例について、図面を参照し
ながら説明する。
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

第5図,第6図は本発明の一実施例における描
画要部を示す断面図および斜視図である。図中7
はスリツト状の吐出口を有する描画ノズルで1は
セラミツク基板、2は導体パターン、3は厚膜ペ
ーストを示す。スリツトノズル7は上下に駆動す
る描画ヘツド(図示せず)に固定されており、あ
らかしめレーザー測長法により測定した基板1の
凹凸に応じて描画ヘツド部を上下に駆動すること
により基板1と描画ノズル7との距離を100μmに
保持した状態で厚膜ペースト3を所望の位置に塗
布し、導体パターン2を形成した基板1と描画ノ
ズル7との距離は10μm〜200μmの範囲が好まし
く、10μm以下では設備の振動によつて描画ノズ
ル7が基板1に接触してしまうと、200μm以上で
は安定した塗布厚みが得られない。
FIGS. 5 and 6 are a sectional view and a perspective view showing essential parts of drawing in an embodiment of the present invention. 7 in the diagram
1 is a drawing nozzle having a slit-shaped discharge port, 1 is a ceramic substrate, 2 is a conductor pattern, and 3 is a thick film paste. The slit nozzle 7 is fixed to a drawing head (not shown) that is driven up and down, and the drawing head is moved up and down according to the irregularities of the substrate 1 measured by the preparatory laser length measurement method, thereby drawing and drawing on the substrate 1. The thick film paste 3 is applied to a desired position while maintaining the distance to the nozzle 7 at 100 μm, and the distance between the substrate 1 on which the conductive pattern 2 is formed and the drawing nozzle 7 is preferably in the range of 10 μm to 200 μm, and is 10 μm or less. If the drawing nozzle 7 comes into contact with the substrate 1 due to equipment vibration, a stable coating thickness of 200 μm or more cannot be obtained.

以上のように本実施例ではあらかじめレーザー
測長法により非接触で基板の凹凸を測定してお
き、これに応じて描画ヘツドを上下に追従させて
基板1と描画ノズル7との距離を互いに接触する
ことなく一定に保持し、厚膜ペースト3を所望の
位置に塗布して導体パターン2を形成でき、導体
パターン2に傷つけることなく400mm/秒という
高速で描画が可能となつた。
As described above, in this embodiment, the unevenness of the substrate is measured in advance in a non-contact manner using the laser length measurement method, and the drawing head is moved up and down according to this measurement to adjust the distance between the substrate 1 and the drawing nozzle 7 so that they are in contact with each other. The conductor pattern 2 can be formed by applying the thick film paste 3 to a desired position while maintaining the conductor pattern 2 at a constant level without causing damage, and it has become possible to draw at a high speed of 400 mm/sec without damaging the conductor pattern 2.

なお実施例ではあらかじめ基板の凹凸を測定す
る方法を示したが、レーザーなどを用いた光学的
測長法、超音波を用いた測長法、磁気を利用した
測長法などの任意の非接触法を応用し、基板の凹
凸を測定すると同時にその結果を描画ヘツドにフ
イードバツクして描画ヘツドを上下に駆動するこ
とにより基板1と描画ノズル7の距離を一定に保
持する方法も可能である。
In addition, although the method of measuring the unevenness of the substrate was shown in advance in the example, any non-contact method such as an optical length measurement method using a laser, a length measurement method using ultrasonic waves, a length measurement method using magnetism, etc. It is also possible to keep the distance between the substrate 1 and the drawing nozzle 7 constant by applying the method and simultaneously measuring the irregularities of the substrate and feeding the results back to the drawing head to drive the drawing head up and down.

発明の効果 以上の説明より明らかなように本発明は、基板
と描画ノズルとが接触することなく、かつ一定距
離を保持しながら厚膜ペーストを塗布する方法に
より、導体パターンに傷つけることなく、高速
(従来の3倍以上)で描画が可能となる。したが
つて従来信頼性、量産性の点で問題があり、試作
用にのみ実用されていた描画法を、本発明によつ
て量産用として使用できる道を開いたわけでその
実用的効果は大なるものがある。
Effects of the Invention As is clear from the above explanation, the present invention has a method of applying a thick film paste without causing contact between the substrate and the drawing nozzle and while maintaining a constant distance, thereby achieving high speed application without damaging the conductor pattern. (more than three times the conventional rate). Therefore, the present invention has paved the way for the drawing method, which conventionally had problems in terms of reliability and mass production and was only used for prototyping, to be used for mass production, and its practical effects are great. There is something.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の描画法を示す要部断面図、第2
図は第1図の斜視図、第3図は従来の描画法の他
の例を示す要部断面図、第4図は第3図の斜視
図、第5図は本発明の一実施例を示す要部断面
図、第6図は第5図の斜視図である。 1……基板、2……導体パターン、3……厚膜
ペースト(抵抗)、7……描画ノズル。
Figure 1 is a sectional view of the main parts showing the conventional drawing method, Figure 2
The figure is a perspective view of FIG. 1, FIG. 3 is a sectional view of a main part showing another example of the conventional drawing method, FIG. 4 is a perspective view of FIG. 3, and FIG. 5 is a perspective view of an embodiment of the present invention. FIG. 6 is a sectional view of the main parts shown, and FIG. 6 is a perspective view of FIG. 1...Substrate, 2...Conductor pattern, 3...Thick film paste (resistance), 7...Drawing nozzle.

Claims (1)

【特許請求の範囲】[Claims] 1 基板の表面の凹凸状態を厚膜ペースト塗布前
に非接触法による測定法によりあらかじめ測定し
その結果にもとづいて描画ノズルを上下して前記
基板と描画ノズルの先端とが接触することなく一
定の距離を保持させた状態で、描画ノズルを前記
基板に対して相対的に移動させて、基板に厚膜ペ
ーストを塗布する厚膜回路パターンの形成方法。
1. Before applying the thick film paste, the unevenness of the surface of the substrate is measured in advance using a non-contact measurement method, and based on the results, the drawing nozzle is moved up and down to maintain a constant level without contact between the substrate and the tip of the drawing nozzle. A method for forming a thick film circuit pattern, in which a drawing nozzle is moved relative to the substrate while a distance is maintained, and a thick film paste is applied to the substrate.
JP57221433A 1982-12-16 1982-12-16 Method of forming thick film circuit pattern Granted JPS59111387A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57221433A JPS59111387A (en) 1982-12-16 1982-12-16 Method of forming thick film circuit pattern
DE8383307644T DE3373380D1 (en) 1982-12-16 1983-12-15 Method of forming thick film circuit patterns with a sufficiently wide and uniformly thick strip
EP83307644A EP0113979B1 (en) 1982-12-16 1983-12-15 Method of forming thick film circuit patterns with a sufficiently wide and uniformly thick strip
US06/802,950 US4656048A (en) 1982-12-16 1985-11-27 Method of forming thick film circuit patterns with a sufficiently wide and uniformly thick strip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57221433A JPS59111387A (en) 1982-12-16 1982-12-16 Method of forming thick film circuit pattern

Publications (2)

Publication Number Publication Date
JPS59111387A JPS59111387A (en) 1984-06-27
JPS6354237B2 true JPS6354237B2 (en) 1988-10-27

Family

ID=16766660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57221433A Granted JPS59111387A (en) 1982-12-16 1982-12-16 Method of forming thick film circuit pattern

Country Status (1)

Country Link
JP (1) JPS59111387A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63133694A (en) * 1986-11-26 1988-06-06 ジューキ株式会社 Method of detecting circuit defect in thick film circuit formation

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4831448A (en) * 1971-08-12 1973-04-25
JPS5919479B2 (en) * 1980-03-24 1984-05-07 株式会社日立製作所 How to print thick film circuits
JPS57132393A (en) * 1981-02-09 1982-08-16 Tokyo Shibaura Electric Co Method of producing electric circuit board
JPS57193089A (en) * 1981-05-22 1982-11-27 Nippon Electric Co Method of forming circuit pattern

Also Published As

Publication number Publication date
JPS59111387A (en) 1984-06-27

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