JPS6366911B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a dry etching apparatus, and more particularly to a dry etching apparatus capable of uniformly heating workpieces stacked on a stacked shelf.

[Technical background of the invention and its problems]

In conventional general dry etching equipment, when etching a workpiece coated with SiO ₂ or resist, it is difficult to etch the workpiece unless it is at a high temperature, so etching is performed while heating the workpiece. There is.

As shown in FIG. 5, as a means for heating the object to be processed, a stacked shelf 3 on which objects 2 to be processed are stacked is housed inside a vacuum container 1, and a heater 4 is wound around the outer peripheral surface of the vacuum container 1. The vacuum container 1 may be heated by the heater 4, or the heater 5 may be embedded in the bottom surface of the vacuum container 1 as shown in FIG.
A vacuum vessel 1 is heated by the heater 5, with a flat workpiece 2 disposed therein, and a halogen lamp 6 is further disposed inside the vacuum vessel 1, as shown in FIG. It is generally known that the lamp 6 is provided with a lamp 6 to heat the object 2 to be processed.

However, the heating means shown in FIGS. 5 and 7 have a problem in that the heating temperature varies depending on the position inside the vacuum container 1, and the object to be processed 2 cannot be heated uniformly. It had For this reason, it has generally been quite difficult to uniformly etch the object 2 due to uneven heating of the object 2.

In this respect, the heating means shown in FIG. 6 can relatively uniformly heat the object 2 to be processed, but the number of objects 2 to be processed is limited, and in order to increase the number of objects to be processed, vacuum There was a problem in that the container 1 had to be made larger.

[Purpose of the invention]

SUMMARY OF THE INVENTION In view of the above, an object of the present invention is to provide a dry etching apparatus which can perform uniform etching by uniformly heating an object to be processed without increasing the size of the vacuum container.

[Summary of the invention]

In order to achieve the above object, a dry etching apparatus according to the present invention is a dry etching apparatus in which an object to be processed is placed inside a vacuum container, and etching is performed by generating plasma while feeding an etching gas. A support stand and a power supply shaft each rotatable and equipped with different electrodes are disposed inside the support stand, and a stacking shelf on which objects to be processed are stacked in multiple stages is placed on the top surface of the support stand to constitute the stacking shelf. one support plate and the above support stand,
Another support plate and a power supply shaft are brought into contact with each other in an insulated state, and terminals are located between each of the objects to be processed stacked on the stacked shelf and are electrically connected to each of the energized support plates. A plate heater having a plate heater projecting from the periphery in two directions is disposed on the stacked shelf with the terminals electrically connected to the support plates, respectively.

[Embodiments of the invention]

Hereinafter, embodiments of the present invention will be described with reference to FIGS. 1 to 4, and the same parts as in FIGS. 5 to 7 are denoted by the same reference numerals.

FIG. 1 shows an embodiment of the present invention, in which a stacking shelf 7 for stacking objects 2 to be processed horizontally in multiple stages is provided inside the vacuum container 1, and on the side surface of the vacuum container 1, , a gas introduction pipe 8 for introducing etching gas into the vacuum vessel 1, and a gas exhaust pipe 9 connected to a vacuum pump (not shown) are provided to face each other.

This stacked shelf 7 is placed on a support stand 11 having a shaft 10 attached to its lower surface, and the end of the shaft 10 passes through the lower surface of the vacuum container 1 and is connected to a motor 12 via a belt 13. As a result, the stacked shelf 7 is removed via the support stand 11 during etching.
It's like rotating.

Further, a power supply shaft 14 for supplying electricity, which is electrically insulated from the shaft 10, is fitted inside the shaft 10, and one electrode of the power supply 15 is connected to the lower end of the power supply shaft 14. The brush 16 connected to is in contact with the brush 16 . The power shaft 14 rotates together with the outer shaft 10, and the brush 16 allows power to be supplied even when the power shaft 14 rotates.

Further, the stacked shelf 7 has one side open and support plates 17 on the remaining three sides, and the inner side of the support plate 17 has support grooves at predetermined intervals, as shown in FIG. 18, 18... are formed, and this support groove 18 is used to stack the objects 2 to be processed in multiple stages and to place aluminum plate heaters 19, 19... between each object 2 to be processed. It belongs to
As a result, each workpiece 2 is partitioned off by the plate heater 19.

The plate heater 19 is shown in FIGS. 3 and 4.
As shown in the figure, the surface of the aluminum substrate 20 is polished,
After degreasing, the fluororesin 21, which is not affected by etching gas, is adhered. It is formed by pressurizing and pushing the flat heating element 22 onto the fluororesin 21, and then adhering the fluororesin 21 onto it.

The flat heating element 22 of the plate heater 19 is
It has a pair of terminals 23, 23 taken out to the outside of the plate heater 19, and these terminals 23,
23 are connected to two support plates 17, 17 that constitute the stacked shelf 7, which are electrically insulated, respectively. One of the support plates 17, 17 is contacted with the upper end surface of the power supply shaft 14 which is electrically connected to one electrode of the power supply 15, and the other is electrically connected to the other electrode of the power supply 15. The plate heater 19 is in contact with the support stand 11 connected to the plate heater 19 , so that electricity supplied from the power supply 15 flows through the plate heater 19 via the power supply shaft 14 and the support stand 11 .

Note that the plate heater 19 may have a flat heating element 22 directly fixed to the upper surface of the aluminum substrate 20.

In this embodiment, the objects 2 to be processed are stacked on the upper surface of the stacking shelf 7, and the vacuum container 1 is
Perform vacuum evacuation. Thereafter, an etching gas such as CF ₄ is sent through the gas introduction tube 8 to create a gas atmosphere at a predetermined pressure within the vacuum container 1, and a gas plasma is generated by applying high frequency output to a discharge tube (not shown). Fluorine radicals as an etching gas are generated by the generation of this gas plasma, and the object to be processed 2 in the vacuum chamber 1 is etched.

At this time, the motor 12 is driven to rotate the stacked shelf 7 together with the support base 11 via the shaft 10, and the power supply 15 supplies electricity to the flat heating element 22 to cause the plate heater 19 to generate heat.

Therefore, each workpiece 2 is heated uniformly by the plate heater 19, and since the plate heater 19 has a function of blocking radiant heat generated during etching, uneven heating of the workpiece 2 is avoided. Non-uniformity in etching can be reliably removed. In addition, the plate heater 19
Power is supplied to the stacking shelf 7 by bringing the support plates 17, 17 of the stacked shelf 7, to which the terminals 23, 23 of the plate heater 19 are connected, respectively, into contact with the support stand 11 and the power shaft 14, which are connected to the power source. It is sufficient to simply place the stacked shelf 7 on the support stand 11, and no extra wiring work is required.

Note that the object to be processed 2 is heated by a plate heater 19.
The plate heaters 19 may be placed directly on the plate heaters 19, and the shape, number, or direction of the plate heaters 19 may be determined as long as they can uniformly heat the object 2.
None of these are limited to those of the above embodiments.

〔Effect of the invention〕

Since the present invention has the above-described configuration, by stacking the non-processing objects on the stacking shelves, it is not necessary to increase the size of the vacuum container, and the objects to be processed can be uniformly heated.

Further, since the plate heater can block radiant heat that impairs the uniformity of etching of the objects stacked in multiple stages, the uniformity of etching can be extremely improved.

Furthermore, while rotating the stacked shelves, power can be reliably supplied to the plate heater placed inside to heat them, and this power can be supplied simply by placing the stacked shelves on the support stand. This has the advantage of being extremely easy to handle.

[Brief explanation of drawings]

1 to 4 show an embodiment of the present invention, in which FIG. 1 is a schematic configuration diagram, FIG. 2 is a vertical cross-sectional view of the stacked shelf portion, and FIG. 3 is a plan view of the plate heater.
FIG. 4 is a longitudinal sectional view of the plate heater, and FIGS. 5, 6, and 7 are schematic diagrams showing conventional heating means for different objects to be processed. 1... Vacuum container, 2... Workpiece, 3, 7...
Laminated shelf, 10... Shaft, 11... Support stand, 1
2...Motor, 14...Power shaft, 16...
Brush, 17... Support plate, 19... Plate heater, 20... Aluminum substrate, 21... Fluorine resin,
22... Flat heating element, 23... Terminal.

Claims (1)

[Claims] 1. In a dry etching apparatus in which an object to be processed is placed inside a vacuum container and etching is performed by generating plasma while feeding an etching gas, a support stand and a support stand each equipped with a rotatable and different electrode are installed inside the vacuum container. In addition to arranging the power supply shaft, a stacking shelf for stacking the objects to be processed in multiple stages is placed on the top surface of this supporting base, and one supporting plate and the above supporting base making up this stacking shelf are connected to the other one. A support plate and a power supply shaft are brought into contact with each other in an insulated state, and terminals are connected from the periphery to two terminals located between the workpieces stacked on the stacked shelf and electrically connected to each of the energized support plates. A dry etching apparatus characterized in that plate heaters projecting in the direction are arranged on the stacked shelf with the terminals electrically connected to the support plates.