JPS641413B2 - - Google Patents
Info
- Publication number
- JPS641413B2 JPS641413B2 JP566580A JP566580A JPS641413B2 JP S641413 B2 JPS641413 B2 JP S641413B2 JP 566580 A JP566580 A JP 566580A JP 566580 A JP566580 A JP 566580A JP S641413 B2 JPS641413 B2 JP S641413B2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust
- base material
- flow rate
- gas
- optical fiber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 26
- 238000006243 chemical reaction Methods 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 20
- 239000013307 optical fiber Substances 0.000 claims description 15
- 239000011521 glass Substances 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 239000005373 porous glass Substances 0.000 claims description 5
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 239000010419 fine particle Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 50
- 238000001514 detection method Methods 0.000 description 9
- 239000002245 particle Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/0144—Means for after-treatment or catching of worked reactant gases
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】
光フアイバ母材の製法の一つに、火炎加水分解
バーナによりガラス微粒子を合成し、これを出発
材に吹きつけて多孔質ガラス母材を成長させ、そ
の後、高温に加熱して透明なガラスの光フアイバ
母材とする方法がある（第１図参照）。この方法
において、多孔質ガラス母材２および透明ガラス
母材４の外径と屈折率の軸方向変動を抑えるには
ガラス微粒子を含んだ火炎５のゆらぎ量をつねに
一定となるように制御しなければならない。この
火炎のゆらぎ量を制御する方法として、本発明者
は反応容器６の排気口１３と排気装置１７（排気
ポンプなどを含む）との間に圧力検出装置１５、
排気ガス流量調節装置１６を設けた。そして圧力
検出装置１５で反応容器内の圧力を検出し、その
検出信号を制御回路１８を通して排気ガス流量調
節装置１６にフイードバツクし、反応容器内の圧
力を一定となるように制御するようにした。しか
し、この方法では次のような問題点が生じた。[Detailed Description of the Invention] One of the methods for producing an optical fiber base material is to synthesize glass fine particles using a flame hydrolysis burner, blow them onto a starting material to grow a porous glass base material, and then heat it to a high temperature. There is a method of heating transparent glass to form an optical fiber base material (see Figure 1). In this method, in order to suppress axial variations in the outer diameter and refractive index of the porous glass base material 2 and the transparent glass base material 4, it is necessary to control the amount of fluctuation of the flame 5 containing fine glass particles so that it is always constant. Must be. As a method for controlling the amount of flame fluctuation, the present inventor has developed a pressure detection device 15 between the exhaust port 13 of the reaction vessel 6 and the exhaust device 17 (including an exhaust pump, etc.).
An exhaust gas flow rate adjustment device 16 was provided. The pressure inside the reaction vessel is detected by the pressure detection device 15, and the detected signal is fed back to the exhaust gas flow rate adjustment device 16 through the control circuit 18, so that the pressure inside the reaction vessel is controlled to be constant. However, this method has the following problems.
(1) 反応容器内でのガス流の変動あるいは逆流、
対流を防ぐために排気口１３から流出するガス
流速（矢印１４で示す方向）に比し、排気装置
１７の排気速度を大きくとつてある。ところ
が、排気装置１７の排気速度が変動すると反応
容器内の圧力変動を誘引し、炎を反応容器外の
状態変化で乱す。反応容器内の圧力変動は、(1)
反応容器内の状態変化に起因するものと、(2)反
応容器外の状態変化に起因するものに分けられ
るが、前者を制御できても後者により本来制御
しなければならない反応容器内の状態変化によ
る圧力変動を高精度に制御することが困難であ
る。(1) Fluctuations or backflow of gas flow within the reaction vessel;
In order to prevent convection, the exhaust speed of the exhaust device 17 is set higher than the flow rate of gas flowing out from the exhaust port 13 (in the direction indicated by arrow 14). However, when the exhaust speed of the exhaust device 17 fluctuates, pressure fluctuations within the reaction vessel are induced, and the flame is disturbed by changes in conditions outside the reaction vessel. The pressure fluctuation inside the reaction vessel is (1)
(2) Those caused by changes in the state inside the reaction vessel; and (2) those caused by changes in the state outside the reaction vessel.Even if the former can be controlled, changes in the state inside the reaction vessel that should originally be controlled by the latter. It is difficult to control pressure fluctuations with high precision.
(2) 上記排気速度の変動スペクトラムは比較的周
波数成分の高い変動を含んでいるために母材の
径方向屈折率分布にも変動を生じさせる。(2) Since the fluctuation spectrum of the pumping speed mentioned above includes fluctuations with relatively high frequency components, it also causes fluctuations in the radial refractive index distribution of the base material.
以上のような問題点のために、外径および屈折
率分布の均質な長尺の母材を作ることが困難であ
つた。 Due to the above-mentioned problems, it has been difficult to produce a long base material with a uniform outer diameter and refractive index distribution.
本発明の目的は前記従来方法の問題点を解決す
る方法を提供することにある。即ち本発明は、第
１に矢印１４方向に流れる排気ガスにバイアス用
のガスを重ねて流うようにしたものである。第２
に本発明は、このバイアス用のガスを流すととも
に、排気口と排気装置との間に設けたタンクにガ
スを一時的に貯えるようにした。このようにする
ことにより、排気装置１７の排気速度の変動によ
る反応容器内の圧力変動を抑制するのである。 An object of the present invention is to provide a method for solving the problems of the conventional method. That is, in the present invention, first, bias gas is superimposed on the exhaust gas flowing in the direction of the arrow 14. Second
According to the present invention, this bias gas is caused to flow, and at the same time, the gas is temporarily stored in a tank provided between the exhaust port and the exhaust device. By doing this, pressure fluctuations within the reaction vessel due to fluctuations in the exhaust speed of the exhaust device 17 are suppressed.
以下に本発明の方法を実施例を用いて詳細に説
明する。 The method of the present invention will be explained in detail below using Examples.
第２図は本発明の一実施例を示したものであ
る。これは排気口１３から流出する排気ガス１４
にバイアス用のガス（矢印２５で示す方向）を流
すようにしたものである。２４はバイアス用ガス
供給装置であり、ここから矢印２５方向へ送り込
むガス流量は排気ガス１４よりも多い方が排気速
度の変動による反応容器内の圧力変動を抑制する
効果が大きい。より好ましいガス流量は排気ガス
流量の1.5〜５倍の範囲から選べばよい。本実施
例では30／minの空気をバイアス用ガスとして
送り込んだ。その結果、反応容器内の圧力変動防
止に改善効果があることが確認された。このバイ
アス用ガス供給装置は１カ所でなく、数カ所に設
けてもよい。たとえば排気ガス流量調節装置１６
と排気装置１７との間、圧力検出装置１５と排気
ガス流量調節装置１６との間、などである。２４
から矢印２５方向へ送り込むガスは空気、N2、
Ar、O2、あるいはそれらの混合ガスなどを用い
ることができる。排気ガス１４にバイアス用ガス
を重畳させる方法としてはバイアス用ガスを排気
ガスの外周から吹きつけるようにしてもよい。 FIG. 2 shows an embodiment of the present invention. This is the exhaust gas 14 flowing out from the exhaust port 13.
A bias gas (in the direction shown by the arrow 25) is made to flow through. Reference numeral 24 denotes a bias gas supply device, and if the flow rate of gas sent from here in the direction of arrow 25 is larger than that of the exhaust gas 14, it is more effective in suppressing pressure fluctuations in the reaction vessel due to fluctuations in exhaust speed. A more preferable gas flow rate may be selected from a range of 1.5 to 5 times the exhaust gas flow rate. In this example, air was fed at a rate of 30/min as a bias gas. As a result, it was confirmed that there was an improvement effect in preventing pressure fluctuations within the reaction vessel. This bias gas supply device may be provided not at one location but at several locations. For example, the exhaust gas flow rate adjustment device 16
and the exhaust device 17, between the pressure detection device 15 and the exhaust gas flow rate adjustment device 16, etc. 24
The gases sent in the direction of arrow 25 are air, N 2 ,
Ar, O 2 , or a mixed gas thereof can be used. As a method of superimposing the bias gas on the exhaust gas 14, the bias gas may be blown from the outer periphery of the exhaust gas.
第３図はバイアス用ガスを供給する方法と、タ
ンクを用いる方法とを組合せた実施例である。排
気速度の変動による反応容器内の圧力変動をより
効果的に抑制するのに適した構成である。 FIG. 3 shows an embodiment in which the method of supplying bias gas and the method of using a tank are combined. This configuration is suitable for more effectively suppressing pressure fluctuations within the reaction vessel due to fluctuations in pumping speed.
図において、１９，１９′は排気ガスを一時的
に貯えるタンクである。このタンクの容積は大き
いほど排気装置１７の排気速度の変動による反応
容器内の圧力変動を抑制する効果が大きい。本実
施例では外径178mm、高さ500mmのパイレツクス管
を用い、供給管２１，２１′と排出管２２，２
２′には内径50mmの管を用いた。タンク１９，１
９′内の底部には、この場合水２０，２０′を少し
入れてある。これは排気ガスを水表面に吹きつけ
ることにより、排気ガス中に含まれているガラス
微粒子や、Cl、Cl2などの塩素ガスを水中に沈で
んさせる目的で充填してある。その結果、圧力検
出装置、排気ガス流量調節装置、排気装置などが
ガラス微粒子でつまつて動作不安定になることを
防ぐことができ、また上記装置の腐蝕防止にも役
立つ。タンクの容積は反応容器の容積、排気ガス
の流速、排気装置のポンプの排気容量、排気管の
断面積、排気管の長さなどを考慮に入れて決定す
るが、通常は反応容器の容積と同程度であれば充
分である。なお本実施例では排気管２３の内径は
250mmとし、排気装置のポンプ容量として140/
mmを用いた。そして矢印１４方向へ流出するガス
流速v1と排気装置の排気速度v2との比v1／v2≒
1.8になるように排気ガス流量調節装置の開閉弁
を調節し、そのときの反応容器内の圧力を圧力検
出装置１５（空気圧式精密微差圧計、日本モニタ
リングシステム製品、製品名π―バルブを使用）
で検出した。その検出信号を基準値とし、つねに
一定となるように制御回路（本実施例では空気作
動式P.I.Dコントローラーを使用した。日本モニ
タリングシステムズ製品）１８を通して排気ガス
流量調節装置１６（空気作動式バタフライバルブ
調節装置、日本モニタリングシステムズ製品）に
フイードバツクさせた。バーナ１に通常使用され
ている同心５重管構造のものを用いてガラス組成
がSiO2―GeO2―P2O5からなる集束型光フアイバ
母材を作成した。第１図の従来法で作成した場合
と第３図の本発明の方法で作成した場合の光フア
イバ母材の外径、光フアイバの帯域特性を比較し
た結果、母材の外径変動は本発明の方法により約
15％改善され、帯域特性については本発明の方法
により約40％広い帯域に改善された。またそれぞ
れのタンク内に約２ずつの水を入れておいた
が、この水の中にガラス微粒子を沈でんさせるこ
とができた。そのために、圧力検出装置１５、排
気ガス流量調節装置１６へのガラス微粒子の付着
量を低減させることができた。またこのタンク内
で排気ガスが冷却されるので、１５，１６の装置
の温度上昇による動作の不安定性も抑制すること
ができた。 In the figure, 19 and 19' are tanks for temporarily storing exhaust gas. The larger the volume of this tank, the greater the effect of suppressing pressure fluctuations in the reaction vessel due to fluctuations in the exhaust speed of the exhaust device 17. In this embodiment, Pyrex pipes with an outer diameter of 178 mm and a height of 500 mm are used, and the supply pipes 21, 21' and the discharge pipes 22, 2 are used.
A tube with an inner diameter of 50 mm was used for 2'. Tank 19,1
In this case, a small amount of water 20, 20' is placed in the bottom of 9'. This is filled with the purpose of causing glass particles and chlorine gases such as Cl and Cl 2 contained in the exhaust gas to settle into the water by blowing the exhaust gas onto the water surface. As a result, the pressure detection device, exhaust gas flow rate adjustment device, exhaust device, etc. can be prevented from becoming clogged with glass particles and become unstable in operation, and it is also useful for preventing corrosion of the above devices. The volume of the tank is determined by taking into account the volume of the reaction vessel, the flow rate of the exhaust gas, the exhaust capacity of the pump of the exhaust system, the cross-sectional area of the exhaust pipe, the length of the exhaust pipe, etc., but usually it is determined by the volume of the reaction vessel and It is sufficient if it is about the same level. In this embodiment, the inner diameter of the exhaust pipe 23 is
250mm, and the pump capacity of the exhaust device is 140/
mm was used. Then, the ratio of the gas flow velocity v 1 flowing out in the direction of arrow 14 to the exhaust velocity v 2 of the exhaust device is v 1 /v 2 ≒
Adjust the on-off valve of the exhaust gas flow rate control device so that the flow rate is 1.8, and measure the pressure inside the reaction vessel at that time using the pressure detection device 15 (pneumatic precision differential pressure gauge, Nippon Monitoring System product, product name π-valve). )
Detected with. The detected signal is used as a reference value, and is passed through a control circuit (in this example, an air-operated PID controller was used, a product of Japan Monitoring Systems) 18 to an exhaust gas flow rate adjustment device 16 (air-operated butterfly valve adjustment) so that the signal is always constant. Feedback was provided to the equipment (Japan Monitoring Systems product). A focusing type optical fiber base material having a glass composition of SiO 2 --GeO 2 --P 2 O 5 was prepared using a concentric quintuple tube structure commonly used in burner 1. As a result of comparing the outer diameter of the optical fiber base material and the band characteristics of the optical fiber when fabricated by the conventional method shown in Fig. 1 and by the method of the present invention shown in Fig. 3, it was found that the variation in the outer diameter of the base material was Approximately by the method of invention
The band characteristics were improved by 15%, and the band characteristics were improved to about 40% wider by the method of the present invention. In addition, approximately two volumes of water were placed in each tank, and the glass particles were able to settle in this water. Therefore, it was possible to reduce the amount of glass particles adhering to the pressure detection device 15 and the exhaust gas flow rate adjustment device 16. Furthermore, since the exhaust gas was cooled in this tank, it was also possible to suppress instability in the operation of devices 15 and 16 due to temperature increases.
以上の説明から明らかなように本発明の方法は
次のような効果がある。 As is clear from the above description, the method of the present invention has the following effects.
(1) 排気装置の排気速度の変動による反応容器内
の圧力変動を誘引しない。したがつて、反応容
器内の状態変化による圧力変動を圧力検出装
置、制御回路、排気ガス流量調節装置で高精度
に制御することができる。(1) Do not induce pressure fluctuations in the reaction vessel due to fluctuations in the exhaust speed of the exhaust system. Therefore, pressure fluctuations due to state changes within the reaction vessel can be controlled with high precision by the pressure detection device, the control circuit, and the exhaust gas flow rate adjustment device.
(2) 排気ガス中に含まれているガラス微粒子や、
塩素ガスをタンク内の水中に沈でんさせること
が可能である。そのために、圧力検出装置、排
気ガス流量調節装置、排気装置を安定に動作さ
せることが可能である。(2) Glass particles contained in exhaust gas,
It is possible to precipitate the chlorine gas into the water in the tank. Therefore, it is possible to stably operate the pressure detection device, the exhaust gas flow rate adjustment device, and the exhaust device.
(3) タンクの設置、あるいはバイアス用ガスを流
すことによつて排気ガスの冷却効果があり、上
記装置の温度上昇による不安定性を低減させる
ことができる。(3) Installing a tank or flowing bias gas has the effect of cooling the exhaust gas, and can reduce instability due to temperature rise in the above device.
また本発明の適用は、上述した火炎加水分解に
よる多孔質ガラス母材の形成に限定されるもので
はなく、高温酸化反応、プラズマ酸化法など他の
方法によるガラス母材形成を容器内で行う場合は
もちろん、広く容器内に流入するガスに対して排
気ガスを高精度に制御して、容器内のガス圧力、
ガス流の状態を一定に保つことを目的とする装置
には、すべて適用できるものである。 Furthermore, the application of the present invention is not limited to the formation of a porous glass base material by the above-mentioned flame hydrolysis, but also when forming a glass base material by other methods such as high temperature oxidation reaction or plasma oxidation method in a container. Of course, the exhaust gas can be controlled with high precision for a wide range of gases flowing into the container, and the gas pressure inside the container can be adjusted.
It can be applied to any device whose purpose is to maintain a constant gas flow state.
第１図は本発明者が先に提案した光フアイバ用
母材の製造方法において用いる装置の概略断面
図、第２図および第３図はいずれも本発明の実施
例において用いた光フアイバ用母材の製造装置の
概略断面図である。
１…バーナ、２…多孔質ガラス母材、３…加熱
装置、４…透明ガラス母材、５…火炎、６…反応
容器、１３…排気口、１４…排気ガスの流出方
向、１５…圧力検出装置、１６…排気ガス流量調
節装置、１７…排気装置、１８…制御回路、１
９，１９′…タンク、２０，２０′…水、２１，２
１′…供給管、２２，２２′…排出管、２３…排気
管、２４…バイアス用ガス供装置、２５…バイア
ス用ガス流の方向。
FIG. 1 is a schematic cross-sectional view of an apparatus used in the method for manufacturing an optical fiber base material previously proposed by the present inventor, and FIGS. 2 and 3 are the optical fiber base materials used in the examples of the present invention. 1 is a schematic cross-sectional view of a material manufacturing apparatus. DESCRIPTION OF SYMBOLS 1... Burner, 2... Porous glass base material, 3... Heating device, 4... Transparent glass base material, 5... Flame, 6... Reaction container, 13... Exhaust port, 14... Outflow direction of exhaust gas, 15... Pressure detection Device, 16...Exhaust gas flow rate adjustment device, 17...Exhaust device, 18...Control circuit, 1
9,19'...Tank, 20,20'...Water, 21,2
1'... Supply pipe, 22, 22'... Discharge pipe, 23... Exhaust pipe, 24... Bias gas supply device, 25... Direction of bias gas flow.
Claims (1)
器内に出発部材を配置し、火炎加水分解バーナに
よつて合成されたガラス微粒子をこの出発部材に
吹付け、その軸方向に多孔質ガラス母材を成長さ
せる方法において、上記排気口から流出する排気
ガスにバイアス用ガスを重畳して流すことを特徴
とする光フアイバ用母材の製造方法。 ２ 特許請求の範囲第１項において、前記バイア
ス用ガスの流量は上記排気ガスの流量よりも多い
ことを特徴とする光フアイバ用母材の製造方法。 ３ 特許請求の範囲第２項において、前記バイア
ス用ガスの流量は上記排気ガスの流量の1.5〜5.0
倍であることを特徴とする光フアイバ用母材の製
造方法。 ４ 排気装置に連接された排気口を有する反応容
器内に出発部材を配置し、火炎加水分解バーナに
よつて合成されたガラス微粒子をこの出発部材に
吹付け、その軸方向に多孔質ガラス母材を成長さ
せる方法において、上記反応容器から排気された
排気ガスにバイアス用ガスを重畳して流すととも
に、上記排気口と排気装置との間に備えたタンク
に上記ガスを一時的に貯えるようにしたことを特
徴とする光フアイバ用母材の製造方法。 ５ 特許請求の範囲第４項において、前記バイア
ス用ガスの流量は上記排気ガスの流量よりも多い
ことを特徴とする光フアイバ用母材の製造方法。 ６ 特許請求の範囲第５項において、前記バイア
ス用ガスの流量は上記排気ガスの流量の1.5倍〜
5.0倍であることを特徴とする光フアイバ用母材
の製造方法。 ７ 特許請求の範囲第４項において、前記タンク
内に水を入れておくことを特徴とする光フアイバ
用母材の製造方法。 ８ 特許請求の範囲第４項において、前記タンク
内の水の表面に前記排気ガスを吹き付けることを
特徴とする光フアイバ用母材の製造方法。[Claims] 1. A starting member is placed in a reaction vessel having an exhaust port connected to an exhaust device, glass fine particles synthesized by a flame hydrolysis burner are sprayed onto the starting member, and the axial direction of the starting member is A method for producing an optical fiber preform, characterized in that a bias gas is superimposed on the exhaust gas flowing out from the exhaust port. 2. The method of manufacturing an optical fiber base material according to claim 1, wherein the flow rate of the bias gas is greater than the flow rate of the exhaust gas. 3. In claim 2, the flow rate of the bias gas is 1.5 to 5.0 of the flow rate of the exhaust gas.
1. A method for producing an optical fiber base material, characterized in that the base material is twice as large. 4. A starting member is placed in a reaction vessel having an exhaust port connected to an exhaust device, and glass fine particles synthesized by a flame hydrolysis burner are sprayed onto this starting member, and the porous glass base material is oriented in the axial direction of the starting member. In this method, a bias gas is superimposed on the exhaust gas exhausted from the reaction vessel, and the gas is temporarily stored in a tank provided between the exhaust port and the exhaust device. A method for producing a base material for optical fiber, characterized by: 5. The method of manufacturing an optical fiber base material according to claim 4, wherein the flow rate of the bias gas is greater than the flow rate of the exhaust gas. 6 In claim 5, the flow rate of the bias gas is 1.5 times to 1.5 times the flow rate of the exhaust gas.
A method for producing a base material for optical fiber, characterized in that it is 5.0 times as large. 7. The method for manufacturing an optical fiber base material according to claim 4, characterized in that water is placed in the tank. 8. The method for manufacturing an optical fiber base material according to claim 4, characterized in that the exhaust gas is sprayed onto the surface of the water in the tank.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP566580A JPS56104736A (en) | 1980-01-23 | 1980-01-23 | Preparation of parent material for optical fiber |
| JP30129986A JPS62235227A (en) | 1980-01-23 | 1986-12-19 | Method for manufacturing base material for optical fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP566580A JPS56104736A (en) | 1980-01-23 | 1980-01-23 | Preparation of parent material for optical fiber |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30129986A Division JPS62235227A (en) | 1980-01-23 | 1986-12-19 | Method for manufacturing base material for optical fiber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56104736A JPS56104736A (en) | 1981-08-20 |
| JPS641413B2 true JPS641413B2 (en) | 1989-01-11 |
Family
ID=11617393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP566580A Granted JPS56104736A (en) | 1980-01-23 | 1980-01-23 | Preparation of parent material for optical fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56104736A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5761641A (en) * | 1980-09-29 | 1982-04-14 | Hitachi Ltd | Manufacturing of optical fiber preform |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5626737A (en) * | 1979-08-14 | 1981-03-14 | Nippon Telegr & Teleph Corp <Ntt> | Exhaust adjuster for optical fiber base material manufacturing apparatus |
-
1980
- 1980-01-23 JP JP566580A patent/JPS56104736A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56104736A (en) | 1981-08-20 |
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