JPS643667B2 - - Google Patents
Info
- Publication number
- JPS643667B2 JPS643667B2 JP58222833A JP22283383A JPS643667B2 JP S643667 B2 JPS643667 B2 JP S643667B2 JP 58222833 A JP58222833 A JP 58222833A JP 22283383 A JP22283383 A JP 22283383A JP S643667 B2 JPS643667 B2 JP S643667B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- heat generating
- wiring
- generating layer
- wiring layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electronic Switches (AREA)
Description
【発明の詳細な説明】
この発明はサーマルプリントヘツドの製造方法
に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a thermal print head.
周知のようにこの種サーマルプリントヘツド
は、絶縁性の基板の表面に対をなす配線層を形成
し、そのあと両配線層にまたがつて発熱層を形成
することによつて構成される。したがつて配線層
の端部と発熱層の端部とは互いに重なり合うよう
になる。しかし通常配線層は金等により、又発熱
層は酸化ルテニウム等からなり、いずれもそれぞ
れ印刷焼成して形成されるので、両者の重なり部
分において互いになじむことがなく、すなわち両
者が一体化することが極めて困難である。そのた
め両層間で剥離が起りやすく、特に発熱のために
パルス状の電圧を繰返して印加するときは、急激
な加熱、冷却が繰返えされることになり、層間剥
離や浮きばなれが顕著に発生する。 As is well known, this type of thermal print head is constructed by forming a pair of wiring layers on the surface of an insulating substrate, and then forming a heat generating layer spanning both wiring layers. Therefore, the ends of the wiring layer and the ends of the heat generating layer overlap each other. However, the wiring layer is usually made of gold or the like, and the heat generating layer is made of ruthenium oxide, etc., and both are formed by printing and firing, so the overlapping parts of the two do not blend into each other, that is, the two do not become integrated. It is extremely difficult. Therefore, delamination is likely to occur between both layers, and especially when pulsed voltage is repeatedly applied to generate heat, rapid heating and cooling will be repeated, resulting in noticeable delamination and floating separation between the layers. do.
この発明は配線層と発熱層との重なり部分にお
ける両者の確実な一体化を図ることを目的とす
る。 An object of the present invention is to ensure reliable integration of a wiring layer and a heat generating layer in the overlapping portion thereof.
この発明は配線層と発熱層との重なり領域に、
両者を融着させるための鉛又はその化合物からな
る融着層を介在せしめ、これを加熱することによ
つて融着層内の鉛成分を配線層及び発熱層内に含
まれているバインダーガラス中に拡散させること
によつて配線層と発熱層との重なり領域における
確実な一体化を図ることを特徴とする。 In this invention, in the overlapping region of the wiring layer and the heat generating layer,
A fusing layer made of lead or a compound thereof is interposed to fuse the two, and by heating this, the lead component in the fusing layer is removed from the binder glass contained in the wiring layer and the heat generating layer. It is characterized by ensuring reliable integration in the overlapping region of the wiring layer and the heat generating layer by diffusing the wiring layer and the heat generating layer.
この発明の実施例方法を図を参照して説明す
る。1はアルミナセラミツク等のような絶縁性の
基板、2は対をなす配線層で、金等からなり、3
は発熱層で、酸化ルテニウム等からなり、両配線
層2の端部に重なるようにして形成される。配線
層2は印刷焼成によつて形成される。これを形成
したあと、発熱層3は同じく印刷焼成によつて形
成される。このような形成法は従来と特に相違す
るところはない。そしてこのような構成では、配
線層2と発熱層3との重なり領域で剥離する現象
が発生しやすいことは前述したとおりである。 An example method of the present invention will be explained with reference to the drawings. 1 is an insulating substrate such as alumina ceramic, 2 is a pair of wiring layers made of gold or the like, and 3
is a heat generating layer made of ruthenium oxide or the like, and is formed so as to overlap the ends of both wiring layers 2. The wiring layer 2 is formed by printing and baking. After forming this, the heat generating layer 3 is also formed by printing and baking. Such a forming method is not particularly different from the conventional method. In such a configuration, as described above, peeling easily occurs in the overlapping region of the wiring layer 2 and the heat generating layer 3.
この発明にしたがい、発熱層3を形成するのに
さきだつて、配線層2の端部すなわち発熱層3と
重なり合う領域に、鉛又はその化合物(たとえば
酸化鉛)からなる融着層4を形成する。融着層4
は実際には鉛又はその化合物を少くとも30%以上
含有するガラスペーストを印刷して焼成(膜厚
0.1〜5μ程度)するか又は真空蒸着等により膜状
(膜厚0.1〜3μ程度)に形成する。 According to the present invention, prior to forming the heat generating layer 3, a fusion layer 4 made of lead or a compound thereof (for example, lead oxide) is formed at the end of the wiring layer 2, that is, in a region overlapping with the heat generating layer 3. Fusion layer 4
Actually, a glass paste containing at least 30% of lead or its compounds is printed and fired (film thickness).
(approximately 0.1 to 5 μm) or formed into a film (film thickness approximately 0.1 to 3 μm) by vacuum evaporation or the like.
このあとで前述した発熱層3を印刷焼成するの
であるが、当然のことながら発熱層3は配線層2
との重なり領域において融着層4が介在するよう
に印刷される。この印刷のあと700〜950℃程度で
焼成される。このときの焼成熱により、融着層
4、配線層2も同時に加熱されるが、この熱によ
り融着層4内の鉛成分が、配線層2、発熱層3内
のバインダーとして混在しているガラス(一般に
は鉛ガラス)内に拡散する。この拡散によつて配
線層2と発熱層3との間に一体的に鉛成分の多い
領域が形成されるようになり、これによつて配線
層2と発熱層3はこの拡散領域を介在して一体的
に融着接合されるようになる。 After this, the heat generating layer 3 described above is printed and fired, and naturally the heat generating layer 3 is the wiring layer 2.
The adhesive layer 4 is printed in such a manner that the adhesive layer 4 is interposed in the overlapping region. After this printing, it is fired at around 700-950℃. The heat of firing at this time heats the fusing layer 4 and the wiring layer 2 at the same time, but this heat causes the lead component in the fusing layer 4 to coexist as a binder in the wiring layer 2 and heat generating layer 3. Diffuses into glass (generally leaded glass). Due to this diffusion, a region containing a large amount of lead is integrally formed between the wiring layer 2 and the heat generating layer 3, and as a result, the wiring layer 2 and the heat generating layer 3 are placed between the wiring layer 2 and the heat generating layer 3 through this diffusion region. They are now integrally fused and bonded.
次に本発明者が行つた実験について説明する。
デユーテイフアクター50%、波高値15Vのパルス
電圧を連続して印加した場合、従来構成のサーマ
ルプリントヘツドではパルス印加回数が3×10回
で局部的な剥離が発生した。これに対しこの発明
にしたがい、酸化鉛を35%含有するガラスペース
トを印刷焼成して膜厚3μの融着膜4を形成して
から発熱層3を印刷焼成(焼成温度約800℃)し
て膜厚2μに形成したところ、前記したパルス電
圧を同じ条件で10×108回連続印加しても剥離は
どこにも発生しなかつた。 Next, an experiment conducted by the present inventor will be explained.
When a pulse voltage with a duty factor of 50% and a peak value of 15V was continuously applied, local peeling occurred after 3 x 10 pulses were applied to a conventional thermal print head. In contrast, according to the present invention, a glass paste containing 35% lead oxide is printed and fired to form a fusion film 4 with a thickness of 3 μm, and then a heat generating layer 3 is printed and fired (firing temperature: about 800°C). When the film was formed to a thickness of 2 μm, no peeling occurred anywhere even when the pulse voltage described above was continuously applied 10×10 8 times under the same conditions.
以上詳述したようにこの発明によれば、配線層
と発熱層との重なり領域は鉛成分の多いガラス層
を介して一体的となるため、両者の融着は確実と
なり、急激な加熱、冷却によつても剥離や浮き離
れといつた事故は充分回避できるといつた効果を
奏する。 As detailed above, according to the present invention, the overlapping region of the wiring layer and the heat generating layer is integrated through the glass layer with a high lead content, so that the fusion of the two is reliable, and rapid heating and cooling can be achieved. This has the effect that accidents such as peeling and floating can be sufficiently avoided.
図はこの発明方法の実施過程を示す断面図であ
る。
1……基板、2……配線層、3……発熱層、4
……融着層。
The figure is a sectional view showing the process of carrying out the method of this invention. 1... Board, 2... Wiring layer, 3... Heat generating layer, 4
...Fusion layer.
Claims (1)
し、ついで前記配線層の互いに相対する各端部
に、鉛又はその化合物からなる融着層を形成して
から、前記両配線層間に、前記融着層を介在させ
て発熱層を印刷するとともに、前記融着層内の鉛
成分が配線層及び発熱層内のバインダーガラス中
に拡散する程度に加熱して焼成してなるサーマル
プリントヘツドの製造方法。1. Form a pair of wiring layers on the surface of a substrate, then form a fusion layer made of lead or a compound thereof on each opposing end of the wiring layer, and then apply the fusion layer between both wiring layers. Manufacturing a thermal print head by printing a heat generating layer with a fusing layer interposed therebetween and heating and firing it to such an extent that the lead component in the fusing layer diffuses into the wiring layer and the binder glass in the heat generating layer. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58222833A JPS60112460A (en) | 1983-11-24 | 1983-11-24 | Manufacture of thermal printing head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58222833A JPS60112460A (en) | 1983-11-24 | 1983-11-24 | Manufacture of thermal printing head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60112460A JPS60112460A (en) | 1985-06-18 |
| JPS643667B2 true JPS643667B2 (en) | 1989-01-23 |
Family
ID=16788622
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58222833A Granted JPS60112460A (en) | 1983-11-24 | 1983-11-24 | Manufacture of thermal printing head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60112460A (en) |
-
1983
- 1983-11-24 JP JP58222833A patent/JPS60112460A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60112460A (en) | 1985-06-18 |
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