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JPS647517B2 - - Google Patents
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JPS647517B2 - - Google Patents

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Publication number
JPS647517B2
JPS647517B2 JP10626180A JP10626180A JPS647517B2 JP S647517 B2 JPS647517 B2 JP S647517B2 JP 10626180 A JP10626180 A JP 10626180A JP 10626180 A JP10626180 A JP 10626180A JP S647517 B2 JPS647517 B2 JP S647517B2
Authority
JP
Japan
Prior art keywords
metal layer
electric circuit
thin metal
adhesive
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10626180A
Other languages
Japanese (ja)
Other versions
JPS5731193A (en
Inventor
Masami Takagi
Shunichi Nakayama
Hiroshi Yanagida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP10626180A priority Critical patent/JPS5731193A/en
Publication of JPS5731193A publication Critical patent/JPS5731193A/en
Publication of JPS647517B2 publication Critical patent/JPS647517B2/ja
Granted legal-status Critical Current

Links

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  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 本発明はフルアデイテイブ法に近似したプリン
ト配線板の製造法に関し、絶縁基板1上に電路部
2及び電路部2間を連結する電路連結部3となる
部分に無電解金属メツキ用の触媒核を含有する接
着剤4を印刷する工程と、上記接着剤4を半硬化
させる工程と、この半硬化の接着剤4上に薄い金
属層5を無電解金属メツキする工程と、電路連結
部3上にて薄い金属層5上にメツキレジスト6を
印刷する工程と、薄い金属層5に通電して電路部
2上にて薄い金属層5上に電路層7を電解メツキ
する工程と、上記電路連結部3上のメツキレジス
ト6を除去して電路連結部3上の薄い金属層5を
エツチング除去する工程と、前記の如く半硬化の
接着剤4上に無電解金属メツキの薄い金属層5を
形成した後に接着剤4を完全硬化させる工程とを
含むことを特徴とするプリント配線板の製造法に
係るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a printed wiring board similar to a full additive method, in which an electroless metal is formed on an insulating substrate 1 in a portion that will become a circuit portion 2 and a circuit connection portion 3 that connects the circuit portions 2. a step of printing an adhesive 4 containing catalyst nuclei for plating, a step of semi-curing the adhesive 4, and a step of electroless metal plating a thin metal layer 5 on the semi-cured adhesive 4; A process of printing a plating resist 6 on the thin metal layer 5 on the electric circuit connecting part 3, and a process of electrolytically plating the electric circuit layer 7 on the thin metal layer 5 on the electric circuit part 2 by applying electricity to the thin metal layer 5. , the step of removing the plating resist 6 on the electric circuit connecting part 3 and etching the thin metal layer 5 on the electric circuit connecting part 3, and the step of removing a thin electroless metal plating on the semi-cured adhesive 4 as described above. The present invention relates to a method for manufacturing a printed wiring board characterized by including a step of completely curing the adhesive 4 after forming the metal layer 5.

プリント配線板を製造するにあたつて、エツチ
ング除去する金属量を削減するためにアデイテイ
ブ法など種々の工法が検討されてきている。これ
らの一例としては、アデイテイブ用絶縁基板の全
面に無電解金属メツキのための触媒を付着させる
前処理をし、次に電路部以外の部分にて絶縁基板
の表面に接着剤をコーテイングして、電路パター
ンを形成し、こののち、無電解金属メツキで35μ
厚程度に接着剤以外の部分に電路層を形成する方
法がある。しかしこのものでは無電解銅メツキの
みで35μもの厚みのメツキを行なう必要があるた
め、無電解銅メツキ処理に長時間を要し、また無
電解金属メツキのコストが高くつき、さらに無電
解金属メツキによる金属層との接着性を確保する
ために絶縁基板としては表面を粗面化処理したア
デイテイブ用絶縁基板を用いる必要があると共に
触媒処理を基板の全面に行なう必要があり、基板
コストが高くつくものであつた。またこれらの他
の例としては、第1図に示すように、絶縁基板1
1の表面全面に無電解金属メツキのための触媒を
付着させる前処理を行なつたのちに、電路部18
及び電路連結部19となる部分を残して絶縁基板
11の表面に硬化性樹脂皮膜12を施し(第1図
a)、次で上記電路部18及び電路連結部19に
無電解金属メツキを施してごく薄い金属層13を
形成し(第1図b)、次に電路連結部19の金属
層13の表面に剥離可能な樹脂層14を被覆した
のち(第1図c)、金属層13に通電して電路部
18の金属層13上に電気メツキで電路層15を
形成し(第1図d)、こののち電路連結部19の
ごく薄い金属層13上の樹脂層14を除去して
(第1図e)この電路連結部19のごく薄い金属
層13をエツチング除去する(第1図f)ことに
より、電気メツキで厚い(35μ)電路層を形成す
る方法がある。しかしこのものにあつても前記方
法と同様に、触媒処理を基板の全面に行なう必要
があると共にアデイテイブ用の絶縁基板を用いる
必要があつて基板コストが高くつき、さらにはこ
の方法によれば、電路連結部19の薄い金属層1
3上に剥離可能な樹脂層14を被覆する(第1図
c)にあたつては、周囲の硬化性樹脂皮膜12よ
り凹んだ部分に樹脂層14を被覆する必要があ
り、この凹んだ部分にスクリーン印刷などで樹脂
層14を完全に被覆するのは非常に困難でこの部
分に電気メツキがなされてしまうというおそれも
あつた。
In manufacturing printed wiring boards, various methods such as additive methods have been studied in order to reduce the amount of metal to be removed by etching. An example of this is to pre-treat the entire surface of an additive insulating substrate with a catalyst for electroless metal plating, then coat the surface of the insulating substrate with an adhesive in areas other than the electrical circuits. Form the electrical circuit pattern and then use electroless metal plating to 35μ
There is a method of forming an electrical circuit layer on a portion other than the adhesive to a thickness of approximately the same thickness. However, with this method, it is necessary to plate a thickness of 35μ using only electroless copper plating, so the electroless copper plating process takes a long time, and the cost of electroless metal plating is high. In order to ensure adhesion with the metal layer, it is necessary to use an additive-use insulating substrate with a roughened surface, and it is also necessary to perform catalyst treatment on the entire surface of the substrate, which increases the substrate cost. It was hot. Further, as another example of these, as shown in FIG.
After performing a pretreatment to deposit a catalyst for electroless metal plating on the entire surface of the circuit section 18,
A curable resin film 12 is applied to the surface of the insulating substrate 11, leaving the portion that will become the electric circuit connecting portion 19 (FIG. 1a), and then electroless metal plating is applied to the electric circuit portion 18 and the electric circuit connecting portion 19. After forming a very thin metal layer 13 (FIG. 1b), and then coating the surface of the metal layer 13 of the electric circuit connection part 19 with a peelable resin layer 14 (FIG. 1c), the metal layer 13 is energized. Then, a circuit layer 15 is formed by electroplating on the metal layer 13 of the circuit section 18 (FIG. 1d), and then the resin layer 14 on the very thin metal layer 13 of the circuit connection section 19 is removed (FIG. 1d). 1e) There is a method of etching away the extremely thin metal layer 13 of the electrical circuit connecting portion 19 (FIG. 1f) to form a thick electrical circuit layer (35 μm) by electroplating. However, in this method, as with the above method, it is necessary to perform catalyst treatment on the entire surface of the substrate, and it is necessary to use an insulating substrate for additive use, which increases the substrate cost.Furthermore, according to this method, Thin metal layer 1 of electric circuit connection part 19
When coating the removable resin layer 14 on the surface of the resin film 12 (FIG. 1c), it is necessary to coat the resin layer 14 on a portion recessed from the surrounding hardening resin film 12, and this recessed portion It is extremely difficult to completely cover the resin layer 14 by screen printing or the like, and there is a fear that this portion may be electroplated.

本発明は上記の点に鑑みてなされたものであつ
て、絶縁基板として表面を粗面化したアデイテイ
ブ用のものを特に用いる必要がないと共に触媒処
理を絶縁基板の全面に施す必要がなく基板コスト
を安価にすることができ、しかも不要箇所に電気
メツキがなされるおそれがなく、さらには無電解
金属メツキに長時間を要することもなく、電路部
の絶縁基板への密着強度の高いプリント配線板の
製造法を提供することを目的とするものである。
The present invention has been made in view of the above points, and there is no need to use a substrate for additive use with a roughened surface as an insulating substrate, and there is no need to apply catalyst treatment to the entire surface of the insulating substrate, thereby reducing the substrate cost. A printed wiring board that can be made at low cost, eliminates the risk of electroplating in unnecessary areas, does not require a long time for electroless metal plating, and has high adhesion strength to the insulating substrate in the electrical circuit section. The purpose of this invention is to provide a method for manufacturing.

以下本発明を詳細に説明する。絶縁基板1とし
ては一般に汎用される任意のものを用いることが
でき、例えば紙基材やガラス繊維基材にフエノー
ル樹脂やエポキシ樹脂を含浸硬化させたリジツト
タイプ、ポリイミド系、ポリサルフイン系、ポリ
エステル系の各フイルムより得たフレキシブルタ
イプ、エポキシ系やフエノール系のプリプレグよ
り得たプリプレグタイプのものなど任意のものを
用いることができる。この絶縁基板1に無電解金
属メツキ用の触媒核を含有する接着剤4を第2図
aのように印刷する。この接着剤4は電路部2及
び電路部2間を連結する電路連結部3となる部分
のみにパターン状に例えばスクリーン印刷などで
印刷するものである。触媒核としては銀コロイド
などを接着剤4に混練して使用することができ、
またこの接着剤4としてはエポキシ樹脂などを用
いることができる。このように接着剤4をパター
ン形状に印刷したのち、短時間で加熱処理するか
もしくは室温で放置することにより、接着剤4を
半硬化させる。
The present invention will be explained in detail below. As the insulating substrate 1, any commonly used material can be used, such as a rigid type in which a paper base material or a glass fiber base material is impregnated with a phenol resin or epoxy resin, and polyimide-based, polysulfin-based, and polyester-based materials. Any material can be used, such as a flexible type obtained from a film or a prepreg type obtained from an epoxy or phenol prepreg. An adhesive 4 containing catalyst nuclei for electroless metal plating is printed on this insulating substrate 1 as shown in FIG. 2a. This adhesive 4 is printed in a pattern by, for example, screen printing, only on the electric circuit portions 2 and the portions that will become the electric circuit connection portions 3 that connect the electric circuit portions 2. As the catalyst core, colloidal silver or the like can be used by kneading it into the adhesive 4.
Further, as the adhesive 4, epoxy resin or the like can be used. After printing the adhesive 4 in a pattern shape in this manner, the adhesive 4 is semi-cured by heating for a short time or by leaving it at room temperature.

次に絶縁基板1の表面に無電解金属メツキを施
す。無電解金属メツキによる薄い金属層5は触媒
核を付与された接着剤4上にのみ、すなわち電路
部2と電路連結部3上にのみ第2図bのように形
成されることになる。この薄い金属層5は通電が
できればよく、厚みは0.1〜2.0μ程度で十分であ
る。ここで、このように接着剤4を半硬化させた
段階で接着剤4の上に無電解金属メツキによる薄
い金属層5を形成しているので、無電解金属メツ
キを行つている時に接着剤4の上に付着する金属
粒子が半硬化の接着剤4の表面に深く食い込み、
接着剤4の上に形成された薄い金属層5の密着強
度が大きくなるのである。これに対し、完全硬化
させた接着剤4の上に無電解金属メツキの薄い金
属層5を形成する場合には硬化した接着剤4の表
面に金属粒子が付着するだけであるので、薄い金
属層5の密着力を十分に得ることができない。
Next, electroless metal plating is applied to the surface of the insulating substrate 1. The thin metal layer 5 by electroless metal plating is formed only on the adhesive 4 provided with catalyst nuclei, that is, only on the electric circuit section 2 and the electric circuit connection section 3, as shown in FIG. 2b. This thin metal layer 5 only needs to be able to conduct electricity, and a thickness of approximately 0.1 to 2.0 μm is sufficient. Here, since the thin metal layer 5 is formed by electroless metal plating on the adhesive 4 at the stage where the adhesive 4 is semi-cured in this way, the adhesive 4 is The metal particles adhering to the surface dig deeply into the surface of the semi-cured adhesive 4,
This increases the adhesion strength of the thin metal layer 5 formed on the adhesive 4. On the other hand, when forming a thin metal layer 5 of electroless metal plating on the completely cured adhesive 4, metal particles only adhere to the surface of the cured adhesive 4, so the thin metal layer 5 cannot be obtained sufficiently.

次に電路連結部3上にて薄い金属層5上面にメ
ツキレジスト6をスクリーン印刷などで付着させ
て電路連結部3の薄い金属層5をメツキレジスト
6で第2図cのように被覆する。このメツキレジ
スト6としてはアルカリなどで溶解除去されるも
のを用いるものである。
Next, a plating resist 6 is attached to the upper surface of the thin metal layer 5 on the electric circuit connection part 3 by screen printing or the like, and the thin metal layer 5 of the electric circuit connection part 3 is covered with the plating resist 6 as shown in FIG. 2c. This plating resist 6 is one that can be dissolved and removed with an alkali or the like.

このようにメツキレジスト6を施したのち、薄
い金属層5に通電して電気メツキを施す。各電路
部2の薄い金属層5は電路連結部の薄い金属層5
で第3図のように連結されているため、一カ所よ
りの通電で薄い金属層5全面に電流は流れ、電路
部2における薄い金属層5上に電路層7が第2図
dのように形成される。電路連結部3における薄
い金属層5はメツキレジスト6で覆われているた
め、ここには電路層7は形成されず、また電路層
7は電気回路として用いるに十分な厚み例えば
35μ厚程度に形成する。
After applying the plating resist 6 in this manner, electricity is applied to the thin metal layer 5 to perform electroplating. The thin metal layer 5 of each electric circuit section 2 is the thin metal layer 5 of the electric circuit connection section.
Since they are connected as shown in Fig. 3, current flows across the thin metal layer 5 when current is applied from one place, and the electrical circuit layer 7 is formed on the thin metal layer 5 in the electrical circuit section 2 as shown in Fig. 2 (d). It is formed. Since the thin metal layer 5 in the electric circuit connection part 3 is covered with a plating resist 6, no electric circuit layer 7 is formed there, and the electric circuit layer 7 has a thickness sufficient to be used as an electric circuit, for example.
Form to about 35μ thickness.

次に電路連結部3における薄い金属層5上のメ
ツキレジスト6をアルカリ処理などで第2図eの
ように除去剥離し、こののちエツチング液などに
よる処理で、メツキレジスト6を除去することに
より露出する電路連結部3における薄い金属層5
を第2図fのようにエツチング除去する。このと
き、薄い金属層5をエツチングするだけであるか
ら軽いエツチング処理でよく、またこのエツチン
グ処理によつて電路層7の表面も腐食されるが、
薄い金属層5と同程度の厚さでわずかに腐食され
るにすぎない。この後、接着剤4を完全硬化させ
て絶縁基板1と電路層7とに完全一体化させる。
接着剤4はその上に無電解金属メツキの薄い金属
層5を形成された後に最終的に完全硬化させれば
足り、上記のように電路連結部3の薄い金属層5
をエツチング処理した後に限らず、無電解金属メ
ツキの薄い金属層5を形成した直後に接着剤4を
完全硬化させても良い。
Next, the plating resist 6 on the thin metal layer 5 in the electric circuit connection part 3 is removed and peeled off using an alkali treatment or the like as shown in FIG. The thin metal layer 5 in the electrical circuit connection part 3
is removed by etching as shown in Figure 2f. At this time, since only the thin metal layer 5 is etched, a light etching process is sufficient, and the surface of the electric circuit layer 7 is also corroded by this etching process.
The thickness is comparable to that of the thin metal layer 5 and is only slightly corroded. Thereafter, the adhesive 4 is completely cured to completely integrate the insulating substrate 1 and the circuit layer 7.
The adhesive 4 only needs to be completely cured after the thin metal layer 5 of electroless metal plating is formed thereon, and as described above, the thin metal layer 5 of the electrical circuit connection part 3
The adhesive 4 may be completely cured not only after the etching process but also immediately after forming the thin metal layer 5 of electroless metal plating.

上述のようにして離れた領域で電路層5が回路
パターン形状に絶縁基板1上に形成されたプリン
ト配線板を得るものである。
As described above, a printed wiring board is obtained in which the electrical circuit layer 5 is formed in the shape of a circuit pattern on the insulating substrate 1 in separate areas.

上述のように本発明にあつては、無電解金属メ
ツキ用の触媒核を含有する接着剤を電路部及び電
路連結部となる部分に印刷するようにしたので、
触媒核を絶縁基板の全面に処理するような必要が
なく、またこの接着剤上に電路層を形成するよう
にしたので、絶縁基板上に直接金属をメツキする
場合のような表面を粗面化したアデイテイブ用絶
縁基板を用いる必要なく一般の安価な絶縁基板を
用いることができ、基板コストを安価にすること
ができるものである。更に接着剤が半硬化の状態
で上に無電解金属メツキの薄い金属層を形成して
いるので、無電解金属メツキの金属粒子が半硬化
の接着剤内に深く食い込み、薄い金属層の大きな
密着強度が得られるものである。また、電路部を
連結する電路連結部にも無電解金属メツキにより
薄い金属層を形成しているので、電路連結部を通
して電路部の全体に一度に通電することができ、
電路部への電解メツキを簡単に行うことができる
ものである。しかも電路層の厚みは電気メツキで
出すことができるので、無電解金属メツキで厚み
を出す場合のように長時間を要することなく、短
時間で製造を行なうことができるものである。電
路連結部の薄い金属層は絶縁基板に印刷した接着
剤の層の上に設けられているために、この薄い金
属層に形成するメツキレジストは凹み部分に施す
ような必要なく接着剤の層の上に施すことがで
き、正確なパターンでメツキレジストを施すこと
ができると共にメツキレジストの不正確な印刷に
よる必要部分以外に電気メツキがされるようなお
それがないものである。またメツキレジストは電
路連結部の薄い金属層のみに設けるだけでよいた
めに、電気メツキの後に除去する必要のあるこの
メツキレジストの量を少なくすることができ、材
料コストを低減できると共に除去したメツキレジ
ストを排出する際の公害の問題を低減できるもの
である。
As mentioned above, in the present invention, since the adhesive containing catalyst nuclei for electroless metal plating is printed on the parts that will become the electric circuit parts and the electric circuit connection parts,
There is no need to treat the entire surface of the insulating substrate with catalyst nuclei, and since the electrical circuit layer is formed on this adhesive, the surface can be roughened, unlike when plating metal directly on the insulating substrate. There is no need to use an additive-use insulating substrate, and a general inexpensive insulating substrate can be used, and the substrate cost can be reduced. Furthermore, since a thin metal layer of electroless metal plating is formed on top of the adhesive while it is in a semi-cured state, the metal particles of the electroless metal plating dig deep into the semi-cured adhesive, creating a large adhesion between the thin metal layer. It provides strength. In addition, since a thin metal layer is formed by electroless metal plating on the electric circuit connection part that connects the electric circuit parts, electricity can be applied to the entire electric circuit part at once through the electric circuit connection part.
Electrolytic plating can be easily performed on the electrical circuit section. Moreover, since the thickness of the electrical circuit layer can be achieved by electroplating, the production can be carried out in a short time without requiring a long time as required when the thickness is achieved by electroless metal plating. Since the thin metal layer of the electrical circuit connection part is provided on the adhesive layer printed on the insulating substrate, the plating resist formed on this thin metal layer does not need to be applied to the recessed parts, and is applied to the adhesive layer. It is possible to apply a plating resist in an accurate pattern, and there is no fear that the plating resist will be electroplated in areas other than the required areas due to inaccurate printing. In addition, since the plating resist only needs to be provided on the thin metal layer of the electrical circuit connection, the amount of plating resist that needs to be removed after electroplating can be reduced, reducing material costs and removing the plating resist. This can reduce the problem of pollution when discharging resist.

次に本発明を実施例により具体的に説明する。 Next, the present invention will be specifically explained using examples.

<実施例> 紙エポキシ系汎用基板を絶縁基板として用い、
この絶縁基板の表面の電路部及び電路連結部とな
る部分にスクリーン印刷で接着剤を印刷した。こ
の接着剤は、エチレングリコール25c.c.と硝酸銀1
gからなる溶液にグリオキサール0.02〜0.1c.c.を
滴下したのち紫外線照射して触媒核となる銀コロ
イドを生成せしめた液を、エポキシ系レジンであ
るS−222(太陽インキ(株)製)10gに対して1c.c.を
添加し充分混練することにより得たものである。
<Example> Using a paper epoxy general-purpose board as an insulating board,
Adhesive was printed by screen printing on the surface of this insulating substrate, on the parts that would become the electric circuit parts and the electric circuit connection parts. This adhesive consists of 25 c.c. of ethylene glycol and 1 part of silver nitrate.
0.02 to 0.1 cc of glyoxal was added dropwise to a solution consisting of glyoxal, and then irradiated with ultraviolet rays to generate silver colloid, which becomes the catalyst nucleus. It was obtained by adding 1 c.c. and thoroughly kneading it.

次に接着剤を半硬化させた。この半硬化の条件
としては70℃で1〜5分間(好ましくは1〜3分
間)加熱処理するか25℃〜30℃で1時間放置する
かのいずれの条件を採用しても行なうことができ
た。
Next, the adhesive was semi-cured. This semi-curing can be carried out either by heat treatment at 70°C for 1 to 5 minutes (preferably 1 to 3 minutes) or by leaving it at 25°C to 30°C for 1 hour. Ta.

次で絶縁基板を無電解銅メツキ浴に30〜60分間
浸漬して絶縁基板の電路部と電路連結部に銅の薄
い金属層を形成した。無電解銅メツキ浴の配合組
成は次のとうりである。
Next, the insulating substrate was immersed in an electroless copper plating bath for 30 to 60 minutes to form a thin metal layer of copper on the electrical circuit portions and electrical circuit connection portions of the insulating substrate. The composition of the electroless copper plating bath is as follows.

CuSO4・5H2O 10g/ Nicl2・6H2O 2 〃 NaOH 10g/ 37%ホルマリン K・Na(C4H4O6)・H2O 30 〃 Na2CO3 20 〃 水 1 無電解銅メツキをしたのち、電路連結部の薄い
金属層上にエツチレジストUR−450B(田村化研
(株)製)を塗布して紫外線照射による硬化を行な
い、メツキレジストを形成する。
CuSO 4・5H 2 O 10g / Nicl 2・6H 2 O 2 〃 NaOH 10g / 37% formalin K・Na (C 4 H 4 O 6 )・H 2 O 30 〃 Na 2 CO 3 20 〃 Water 1 Electroless copper After plating, apply etch resist UR-450B (Tamura Kaken
Co., Ltd.) and cured by UV irradiation to form a plating resist.

次にこれをメツキ浴に漬けて電気銅メツキを行
なう。電気銅メツキは絶縁基板と銅板の両者に
5Vの直流電流を1〜3A/dm2流して絶縁基板の
薄い金属層上に通電することにより、電路部の薄
い金属層上に銅メツキで電路層を形成するもので
ある。銅メツキ浴の組成は次のとうりである。
Next, this is immersed in a plating bath and electrolytic copper plating is performed. Electrolytic copper plating can be applied to both insulating substrates and copper plates.
By passing a direct current of 5 V from 1 to 3 A/dm 2 onto the thin metal layer of the insulating substrate, an electrical circuit layer is formed by copper plating on the thin metal layer of the electrical circuit section. The composition of the copper plating bath is as follows.

CuSO4・5H2O 250g/ H2SO4 60 〃 電気銅メツキが終了したのち、電路連結部上の
メツキレジストを5%NaOH溶液で溶解して除
去する。
CuSO 4 .5H 2 O 250g/H 2 SO 4 60 After electrolytic copper plating is completed, the plating resist on the electrical circuit connection part is dissolved and removed with a 5% NaOH solution.

次に5〜20%の硫酸溶液(特に10%硫酸溶液が
よい)で3分間処理して、電路連結部上の薄い金
属層をソフトエツチング除去し、次で平板プレス
や加熱ロールにて130℃15分間の処理をすること
により接着剤を完全硬化させ、電路層が形成され
たプリント配線板を得るものである。
Next, the thin metal layer on the electrical circuit connection part is removed by soft etching by treatment with a 5-20% sulfuric acid solution (10% sulfuric acid solution is particularly good) for 3 minutes, and then heated to 130°C using a flat plate press or heating roll. By performing the treatment for 15 minutes, the adhesive is completely cured, and a printed wiring board on which a circuit layer is formed is obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図a乃至fは従来例の製法を示す断面図、
第2図a乃至fは本発明の製法の一実施例を示す
断面図、第3図は同上の電路部と電路連結部のパ
ターンを示す正面図である。 1は絶縁基板、2は電路部、3は電路連結部、
4は接着剤、5は薄い金属層、6はメツキレジス
ト、7は電路層である。
Figures 1a to 1f are cross-sectional views showing the conventional manufacturing method;
FIGS. 2a to 2f are cross-sectional views showing one embodiment of the manufacturing method of the present invention, and FIG. 3 is a front view showing a pattern of the electric circuit portion and the electric circuit connection portion same as above. 1 is an insulating substrate, 2 is an electric circuit section, 3 is an electric circuit connection section,
4 is an adhesive, 5 is a thin metal layer, 6 is a plating resist, and 7 is an electric circuit layer.

Claims (1)

【特許請求の範囲】[Claims] 1 絶縁基板上に電路部及び電路部間を連結する
電路連結部となる部分に無電解金属メツキ用の触
媒核を含有する接着剤を印刷する工程と、上記接
着剤を半硬化させる工程と、この半硬化の接着剤
上に薄い金属層を無電解金属メツキする工程と、
電路連結部上にて薄い金属層上にメツキレジスト
を印刷する工程と、薄い金属層に通電して電路部
上にて薄い金属層上に電路層を電気メツキする工
程と、上記電路連結部上のメツキレジストを除去
して電路連結部上の薄い金属層をエツチング除去
する工程と、前記の如く半硬化の接着剤上に無電
解金属メツキの薄い金属層を形成した後に接着剤
を完全硬化させる工程とを含むことを特徴とする
プリント配線板の製造法。
1. A step of printing an adhesive containing catalyst nuclei for electroless metal plating on an insulating substrate on a portion that will become an electric circuit section and an electric circuit connecting section that connects the electric circuit sections, and a step of semi-curing the adhesive, A process of electroless metal plating a thin metal layer on this semi-cured adhesive,
a step of printing a plating resist on the thin metal layer on the electric circuit connection section; a step of electroplating the electric circuit layer on the thin metal layer on the electric circuit section by applying electricity to the thin metal layer; and a step of electroplating the electric circuit layer on the thin metal layer on the electric circuit connection section. The process of removing the plating resist and etching away the thin metal layer on the electrical circuit connection part, and forming a thin metal layer of electroless metal plating on the semi-cured adhesive as described above, and then completely curing the adhesive. A method for manufacturing a printed wiring board, comprising the steps of:
JP10626180A 1980-07-31 1980-07-31 Method of producing printed circuit board Granted JPS5731193A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10626180A JPS5731193A (en) 1980-07-31 1980-07-31 Method of producing printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10626180A JPS5731193A (en) 1980-07-31 1980-07-31 Method of producing printed circuit board

Publications (2)

Publication Number Publication Date
JPS5731193A JPS5731193A (en) 1982-02-19
JPS647517B2 true JPS647517B2 (en) 1989-02-09

Family

ID=14429149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10626180A Granted JPS5731193A (en) 1980-07-31 1980-07-31 Method of producing printed circuit board

Country Status (1)

Country Link
JP (1) JPS5731193A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4623608A (en) * 1985-03-14 1986-11-18 Rca Corporation Method and apparatus for coating a selected area of the surface of an object

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143259B2 (en) * 1972-04-26 1976-11-20
JPS5619754B2 (en) * 1973-12-03 1981-05-09
JPS5138669A (en) * 1974-09-30 1976-03-31 Matsushita Electric Works Ltd SHAKUHOGATADENJISHAKUSOCHI
DE2728465C2 (en) * 1977-06-24 1982-04-22 Preh, Elektrofeinmechanische Werke, Jakob Preh, Nachf. Gmbh & Co, 8740 Bad Neustadt Printed circuit
JPS5559795A (en) * 1978-10-30 1980-05-06 Nippon Electric Co Printed circuit board and method of manufacturing same

Also Published As

Publication number Publication date
JPS5731193A (en) 1982-02-19

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