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JPS648915B2 - - Google Patents
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JPS648915B2 - - Google Patents

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Publication number
JPS648915B2
JPS648915B2 JP6395483A JP6395483A JPS648915B2 JP S648915 B2 JPS648915 B2 JP S648915B2 JP 6395483 A JP6395483 A JP 6395483A JP 6395483 A JP6395483 A JP 6395483A JP S648915 B2 JPS648915 B2 JP S648915B2
Authority
JP
Japan
Prior art keywords
frequency
waveguide
heating
dimension
heating chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6395483A
Other languages
Japanese (ja)
Other versions
JPS59189587A (en
Inventor
Yasushi Iwabuchi
Tetsuo Kubota
Ikuo Odajima
Hisayuki Serizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Global Life Solutions Inc
Original Assignee
Hitachi Heating Appliances Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Heating Appliances Co Ltd filed Critical Hitachi Heating Appliances Co Ltd
Priority to JP6395483A priority Critical patent/JPS59189587A/en
Publication of JPS59189587A publication Critical patent/JPS59189587A/en
Publication of JPS648915B2 publication Critical patent/JPS648915B2/ja
Granted legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)

Description

【発明の詳細な説明】 本発明は高周波加熱装置の均一加熱に関する。[Detailed description of the invention] The present invention relates to uniform heating in a high frequency heating device.

高周波加熱装置の均一加熱手段として、高周波
を乱反射するスターラ、高周波を放射する回転ア
ンテナ、被加熱物を回転移動するターンテーブ
ル、加熱室周壁に多数の高周波供給口を設ける方
法などが知られている。いずれにしてもカツトア
ンドトライによる多数の実験によつて実用に供せ
る程度に加熱むらを少なくしているが、人手とか
なりの検討期間を要するという欠点があつた。
Known methods for uniform heating in high-frequency heating devices include a stirrer that diffusely reflects high-frequency waves, a rotating antenna that emits high-frequency waves, a turntable that rotates the object to be heated, and a method of providing a large number of high-frequency supply ports on the peripheral wall of the heating chamber. . In any case, through a large number of cut-and-try experiments, the heating unevenness has been reduced to the extent that it can be put to practical use, but it has the drawback of requiring manpower and a considerable period of study time.

本発明は上記欠点を解消するもので、簡単な手
段で均一加熱を得る高周波加熱装置を提供するこ
とを目的とする。
The present invention solves the above-mentioned drawbacks, and aims to provide a high-frequency heating device that achieves uniform heating with simple means.

以下本発明の一実施例を第1図、第2図に従つ
て説明する。第1図は本発明の高周波加熱装置の
一実施例を示す要部断面略図で、第2図は第1図
のXY方向から見た上面図である。1は高周波エ
ネルギーを発生する高周波発振器で、2は高周波
発振器1を加熱室3に連結する導波管である。加
熱室3および導波管2は金属板から形成されてい
る。加熱室3内の下部には食品などの被加熱物4
を載置して回転移動させるターンテーブル5を設
けている。加熱室3に導波管2を結合する部分に
は高周波放射口を2個所6,7設け、一方の高周
波放射口6を導波管2の先端部とし、もう一方の
高周波放射口7を加熱室3の端部とし、かつ導波
管2の軸方向に対する上記2個所の高周波放射口
6,7の寸法B、Dと上記2個所の高周波放射口
6,7の間を隔てる仕切部8の寸法Cとを合計し
た寸法B+C+Dを使用波長λに対して1/2λ〜
λ+1/4λにする。とともに仕切部8の寸法Cを
1/8λ以上としている。9は導波管2の下板と加
熱室3の上壁端部とを接合するためのねじであ
る。ねじ9の取付部寸法Eは製作の容易さの点か
ら15mm以上は必要である。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. FIG. 1 is a schematic cross-sectional view of a main part showing an embodiment of the high-frequency heating device of the present invention, and FIG. 2 is a top view as seen from the XY direction of FIG. 1. 1 is a high frequency oscillator that generates high frequency energy; 2 is a waveguide that connects the high frequency oscillator 1 to the heating chamber 3; The heating chamber 3 and the waveguide 2 are formed from metal plates. A heated object 4 such as food is placed at the bottom of the heating chamber 3.
A turntable 5 is provided on which to place and rotate. Two high-frequency radiation ports 6 and 7 are provided in the part where the waveguide 2 is connected to the heating chamber 3. One high-frequency radiation port 6 is used as the tip of the waveguide 2, and the other high-frequency radiation port 7 is heated. A partition part 8 is located at the end of the chamber 3 and separates the dimensions B and D of the two high-frequency radiation ports 6 and 7 in the axial direction of the waveguide 2 from the two high-frequency radiation ports 6 and 7. Dimension B+C+D, which is the sum of dimension C, is 1/2λ~ for the wavelength λ used.
Set it to λ+1/4λ. At the same time, the dimension C of the partition portion 8 is set to be 1/8λ or more. Reference numeral 9 denotes a screw for joining the lower plate of the waveguide 2 and the upper wall end of the heating chamber 3. The dimension E of the mounting part of the screw 9 needs to be 15 mm or more from the viewpoint of ease of manufacture.

高周波放射口6,7の寸法B、Dと仕切部の寸
法Cとの合計寸法B+C+Dを1/2λ〜λ+1/4λ
にしている理由を説明する。導波管2内の管内波
長λgは使用波長(自由空間波長)λよりも大き
く、長辺寸法aを狭くするほど大きくなるという
性質がある、実用寸法の導波管では1/2λ〜λ+
1/4λの範囲内に少なくとも1/2λgが含まれてい
る。具体的に述べると、家庭用の高周波加熱装置
いわゆる電子レンジにおいては、λ=122mm(周
波数2450MHzに対応)で、1/2λ〜λ+1/4λは61
〜153mmであり、a寸法は96、80、70mmが一般的
である。a=96mmに対しては1/2λg=79mmで、
61<B+C+D<153mmの範囲内では、磁界最大
位置が導波管軸方向に対して先端と79mmの2箇所
であり、磁界最小位置は39.5mmと118.5mmの2箇
所である。磁界最大位置では磁界と直行する導波
管軸方向の壁面電流も最大となる。この壁面電流
を切るように高周波放射口6,7を設けることに
より、高周波放射口6,7から能率よく高周波エ
ネルギーを加熱室3内に向かつて放射できる。そ
こで、a=96mmの場合は、高周波放射口6,7を
それぞれ磁界最大位置である導波管の先端部と79
mm付近に配設する。仕切部8は高周波放射効率の
悪い磁界最小位置39.5mm付近に配設する。磁界最
小位置付近では壁面電流が小さいため仕切部8の
異常加熱による変形や溶解の恐れがない。実用
上、a=96mmでは、B+C+Dの最小寸法は1/2
λgに対応する79mmである。
The total dimension B + C + D of the dimensions B and D of the high frequency radiation ports 6 and 7 and the dimension C of the partition part is 1/2λ to λ + 1/4λ
Explain why. The internal wavelength λg in the waveguide 2 is larger than the used wavelength (free space wavelength) λ, and increases as the long side dimension a becomes narrower.In a waveguide of practical size, it is 1/2λ~λ+
At least 1/2λg is included within the range of 1/4λ. Specifically, in a household high-frequency heating device called a microwave oven, λ = 122 mm (corresponds to a frequency of 2450 MHz), and 1/2 λ to λ + 1/4 λ is 61
~153mm, and the a dimension is generally 96, 80, and 70mm. For a=96mm, 1/2λg=79mm,
Within the range of 61<B+C+D<153 mm, the maximum magnetic field positions are at the tip and 79 mm in the waveguide axis direction, and the minimum magnetic field positions are at two positions at 39.5 mm and 118.5 mm. At the position of the maximum magnetic field, the wall current in the waveguide axis direction perpendicular to the magnetic field also reaches its maximum. By providing the high-frequency radiation ports 6 and 7 to cut off this wall current, high-frequency energy can be efficiently radiated toward the inside of the heating chamber 3 from the high-frequency radiation ports 6 and 7. Therefore, when a = 96 mm, the high frequency radiation ports 6 and 7 are located at the tip of the waveguide, which is the maximum position of the magnetic field, and at 79 mm.
Place it around mm. The partition part 8 is arranged near the minimum position of 39.5 mm in the magnetic field where high frequency radiation efficiency is poor. Since the wall current is small near the minimum magnetic field position, there is no risk of deformation or melting of the partition section 8 due to abnormal heating. In practice, when a=96mm, the minimum dimension of B+C+D is 1/2
It is 79 mm corresponding to λg.

同様にa=80mmの場合は、61<B+C+D<
153mmの範囲内に磁界最大位置が2箇所、最小位
置が2箇所あるが、高周波放射口6,7をそれぞ
れ磁界最大位置である導波管先端部と95mm付近に
配設し、仕切部8は磁界最小位置の47.5mm付近に
配設する。実用上、a=80mmではB+C+Dの最
小寸法は1/2λgに対応する95mmである。
Similarly, if a=80mm, 61<B+C+D<
There are two maximum magnetic field positions and two minimum magnetic field positions within a range of 153 mm, but the high-frequency radiation ports 6 and 7 are located at the tip of the waveguide, which is the maximum magnetic field position, and at around 95 mm, and the partition part 8 is Place it near the minimum magnetic field position of 47.5mm. In practice, when a=80mm, the minimum dimension of B+C+D is 95mm, which corresponds to 1/2λg.

また、a=70mmの場合は、61<B+C+D<
153mmの範囲内に磁界最大位置が2箇所、最小位
置が1箇所あるが、高周波放射口6,7をそれぞ
れ磁界最大位置である導波管先端部と126mm付近
に配設し、仕切部8は磁界最小位置の63mm付近に
配設する。実用上、a=70mmではB+C+Dの最
小寸法は1/2λgに対応する126mmである。家庭用
の電子レンジでは、加熱室の幅は270mm〜400mm程
度である。前述のように、a=96mmでは、B+C
+Dの最小寸法が79mmであり、これにEの最小寸
法15mmを加えた寸法が94mmである。この94mmがA
(=B+C+D+E)寸法の最小であり、上記電
子レンジの最小幅270mmの1/2である135mmよりも
短く実施可能である。同様に、a=80mmではA寸
法の最小は110mmとなり、a=70mmではA寸法の
最小は141mmとなる。このように、a=96、80、
70mmいずれの場合も導波管2の先端と加熱室3の
側壁との距離Aは、実際の電子レンジの加熱室の
導波管軸方向の幅のほぼ1/2以内と短くでき、ス
ペース的、コスト的に有利である。
Also, if a=70mm, 61<B+C+D<
There are two maximum magnetic field positions and one minimum magnetic field position within the range of 153 mm, but the high frequency radiation ports 6 and 7 are placed at the tip of the waveguide, which is the maximum magnetic field position, and near 126 mm, and the partition part 8 is Place it near the minimum magnetic field position of 63mm. In practice, when a=70 mm, the minimum dimension of B+C+D is 126 mm, which corresponds to 1/2λg. In a household microwave oven, the width of the heating chamber is approximately 270 mm to 400 mm. As mentioned above, when a=96mm, B+C
The minimum dimension of +D is 79 mm, and the addition of the minimum dimension of E, 15 mm, is 94 mm. This 94mm is A
(=B+C+D+E), which is the minimum dimension, and can be made shorter than 135 mm, which is 1/2 of the minimum width of 270 mm of the above microwave oven. Similarly, when a=80mm, the minimum A dimension is 110mm, and when a=70mm, the minimum A dimension is 141mm. In this way, a=96, 80,
In any case of 70mm, the distance A between the tip of the waveguide 2 and the side wall of the heating chamber 3 can be shortened to approximately 1/2 of the width of the heating chamber of an actual microwave oven in the waveguide axis direction, which saves space. , which is advantageous in terms of cost.

なお、A寸法が加熱室3のほぼ1/2以内であつ
ても、ターンテーブル5で被加熱物4を回転移動
させるので、被加熱物4の全面に均一に高周波エ
ネルギーを照射することができる。
Note that even if the A dimension is within approximately 1/2 of the heating chamber 3, the object to be heated 4 is rotated and moved by the turntable 5, so that the entire surface of the object to be heated 4 can be uniformly irradiated with high-frequency energy. .

高周波加熱装置の使用波長λを122mm(周波数
2450MHzに対応)とした場合、1/8λは約15mmと
なる。この15mmは、家庭用の高周波加熱装置いわ
ゆる電子レンジにおいて、仕切部8を塗装した鉄
板あるいはステンレススチールで製作したとき、
500W〜700Wの高周波エネルギーを供給している
加熱室3内に被加熱物4を入れ忘れた状態すなわ
ち空焼状態で異常加熱による変色や変形などの不
都合が生じないために必要な最小寸法であり、実
用上は寸法Cは15mmより大き目にする必要があ
る。寸法B、Dの各々は寸法Cの位置の移動によ
つて互の大きさを異らしめる。
The wavelength λ used for the high-frequency heating device is 122 mm (frequency
2450MHz), 1/8λ is approximately 15mm. This 15 mm is when the partition part 8 is made of painted iron plate or stainless steel in a household high-frequency heating device called a microwave oven.
This is the minimum size necessary to prevent inconveniences such as discoloration and deformation due to abnormal heating in a state where the object to be heated 4 is forgotten to be placed in the heating chamber 3 which supplies high frequency energy of 500W to 700W, that is, in an empty firing state. In practice, dimension C needs to be larger than 15 mm. Dimensions B and D differ in size from each other by moving the position of dimension C.

次に、本発明の高周波加熱装置の作用、効果を
説明する。高周波発振器1から加熱室3に向かう
高周波エネルギーは、まず加熱室3端部の高周波
放射口7から加熱室3内に放射され、続いて残り
の高周波エネルギーが導波管2の先端部の高周波
放射口6から加熱室3内に放射される。高周波放
射口7と6との大きさを互いに違えて高周波エネ
ルギーの放射比率を調節し、加熱条件が変つた場
合でも実用的にターンテーブル5の半径方向の加
熱むらを少なくすることができる。円周方向の加
熱むらはターンテーブル5の回転移動により少な
くすることができるのはいうまでもない。
Next, the functions and effects of the high frequency heating device of the present invention will be explained. The high-frequency energy heading from the high-frequency oscillator 1 toward the heating chamber 3 is first radiated into the heating chamber 3 from the high-frequency radiation port 7 at the end of the heating chamber 3, and then the remaining high-frequency energy is radiated into the high-frequency radiation at the tip of the waveguide 2. It is radiated into the heating chamber 3 from the opening 6. By adjusting the radiation ratio of high frequency energy by making the sizes of the high frequency radiation ports 7 and 6 different from each other, uneven heating of the turntable 5 in the radial direction can be practically reduced even when the heating conditions change. Needless to say, heating unevenness in the circumferential direction can be reduced by rotating the turntable 5.

以上のように、本発明によると、ターンテーブ
ルを備えた高周波加熱装置において、高周波放射
口を2個所設け、両者の大きさを互いに違えて高
周波エネルギーの放射比率を調節するようになつ
ているので、ターンテーブルの半径方向の加熱む
らを実用的に少なくすることが容易であり、加熱
むら改善に要する人手や期間を低減でき、製作上
有利であり、かつ両放射口の間を隔てる仕切部を
導波管軸の先端より管内波長の1/4の位置付近に
配置しているため、仕切部の空焼時の異常加熱に
よる変形、溶解等のない安全な導波管結合構造を
提供する。
As described above, according to the present invention, in a high-frequency heating device equipped with a turntable, two high-frequency radiation ports are provided and the sizes of the ports are made different to adjust the radiation ratio of high-frequency energy. , it is easy to practically reduce the heating unevenness of the turntable in the radial direction, it is possible to reduce the manpower and time required to improve the heating unevenness, it is advantageous in manufacturing, and it is possible to reduce the partition part separating the two radiation ports. Since it is located at a position approximately 1/4 of the wavelength in the tube from the tip of the waveguide axis, it provides a safe waveguide coupling structure that will not be deformed or melted due to abnormal heating during dry firing of the partition.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の高周波加熱装置の一実施例を
示す要部断面略図で、第2図は第1図のXY方向
から見た上面図である。 1……高周波発振器、2……導波管、3……加
熱室、5……ターンテーブル、6,7……高周波
放射口。
FIG. 1 is a schematic cross-sectional view of a main part showing an embodiment of the high-frequency heating device of the present invention, and FIG. 2 is a top view as seen from the XY direction of FIG. 1. 1... High frequency oscillator, 2... Waveguide, 3... Heating chamber, 5... Turntable, 6, 7... High frequency radiation port.

Claims (1)

【特許請求の範囲】[Claims] 1 高周波エネルギーを発生する高周波発振器1
と、この高周波発振器1を加熱室3に連結する導
波管2と、被加熱物4を回転移動させるターンテ
ーブル5とを備えた高周波加熱装置において、加
熱室3上面側に導波管2を結合し、その結合部に
互いに大きさを違えた2個の高周波放射口6,7
を設け、かつ両放射口6,7の間を隔てる仕切部
8を導波管2の先端より管内波長の1/4の位置付
近になるように配設したことを特徴とする高周波
加熱装置。
1 High frequency oscillator 1 that generates high frequency energy
In a high-frequency heating device that includes a waveguide 2 that connects the high-frequency oscillator 1 to a heating chamber 3 and a turntable 5 that rotationally moves the object to be heated 4, the waveguide 2 is installed on the upper surface side of the heating chamber 3. Two high-frequency radiation ports 6 and 7 of different sizes are connected to each other at the joint.
A high-frequency heating device characterized in that a partition part 8 separating the radiation ports 6 and 7 is arranged at a position near the tip of the waveguide 2 at about 1/4 of the wavelength in the pipe.
JP6395483A 1983-04-12 1983-04-12 High frequency heater Granted JPS59189587A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6395483A JPS59189587A (en) 1983-04-12 1983-04-12 High frequency heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6395483A JPS59189587A (en) 1983-04-12 1983-04-12 High frequency heater

Publications (2)

Publication Number Publication Date
JPS59189587A JPS59189587A (en) 1984-10-27
JPS648915B2 true JPS648915B2 (en) 1989-02-15

Family

ID=13244221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6395483A Granted JPS59189587A (en) 1983-04-12 1983-04-12 High frequency heater

Country Status (1)

Country Link
JP (1) JPS59189587A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02214511A (en) * 1989-02-14 1990-08-27 Arai Tekkosho:Kk Continuous solid-liquid separator

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH081474Y2 (en) * 1992-12-16 1996-01-17 株式会社オリエンテック Toothed teeth in chuck for tensile tester

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52149343U (en) * 1976-05-07 1977-11-12

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02214511A (en) * 1989-02-14 1990-08-27 Arai Tekkosho:Kk Continuous solid-liquid separator

Also Published As

Publication number Publication date
JPS59189587A (en) 1984-10-27

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