JPS648916B2 - - Google Patents
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- Publication number
- JPS648916B2 JPS648916B2 JP6395583A JP6395583A JPS648916B2 JP S648916 B2 JPS648916 B2 JP S648916B2 JP 6395583 A JP6395583 A JP 6395583A JP 6395583 A JP6395583 A JP 6395583A JP S648916 B2 JPS648916 B2 JP S648916B2
- Authority
- JP
- Japan
- Prior art keywords
- frequency
- waveguide
- dimension
- heating chamber
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Landscapes
- Constitution Of High-Frequency Heating (AREA)
Description
【発明の詳細な説明】 本発明は高周波加熱装置の均一加熱に関する。[Detailed description of the invention] The present invention relates to uniform heating in a high frequency heating device.
高周波加熱装置の均一加熱手段として、高周波
を乱反射するスターラ、高周波を放射する回転ア
ンテナ、被加熱物を回転移動するターンテーブ
ル、加熱室周壁に多数の高周波供給口を設ける方
法などが知られている。いずれにしてもカツトア
ンドトライによる多数の実験によつて実用に供せ
る程度に加熱むらを少なくしているが、人手とか
なりの検討期間を要するという欠点があつた。 Known methods for uniform heating in high-frequency heating devices include a stirrer that diffusely reflects high-frequency waves, a rotating antenna that emits high-frequency waves, a turntable that rotates the object to be heated, and a method of providing a large number of high-frequency supply ports on the peripheral wall of the heating chamber. . In any case, through a large number of cut-and-try experiments, the heating unevenness has been reduced to the extent that it can be put to practical use, but it has the drawback of requiring manpower and a considerable period of study time.
本発明は上記欠点を解消するもので、簡単な手
段で均一加熱を得る高周波加熱装置を提供するこ
とを目的とする。 The present invention solves the above-mentioned drawbacks, and aims to provide a high-frequency heating device that achieves uniform heating with simple means.
以下本発明の一実施例を第1図、第2図に従つ
て説明する。第1図は本発明の高周波加熱装置の
一実施例を示す要部断面略図で、第2図は第1図
のXY方向から見た上面図である。1は高周波エ
ネルギーを発生する高周波発振器で、2は高周波
発振器1を加熱室3に連結する導波管である。加
熱室3および導波管2は金属板から形成されてい
る。加熱室3内の下部には食品などの被加熱物4
を載置して回転移動させるターンテーブル5を設
けている。加熱室3に導波管2を結合する部分に
は高周波放射口を2個所6,7設け、一方の高周
波放射口6を導波管2の先端部とし、もう一方の
高周波放射口7を加熱室3の端部とし、かつ導波
管2の軸方向に対する上記2個所の高周波放射口
6,7の寸法B、Dと上記2個所の高周波放射口
6,7の間を隔てる仕切部8の寸法Cとを合計し
た寸法B+C+Dを使用波長λに対して1/2λ〜
λ+1/4λにするとともに仕切部8の寸法Cを1/8
λ以上としている。9は導波管2の下板と加熱室
3の上壁端部とを接合するためのねじである。ね
じ9の取付部寸法Eは製作の容易さの点から15mm
以上は必要である。 An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. FIG. 1 is a schematic cross-sectional view of a main part showing an embodiment of the high-frequency heating device of the present invention, and FIG. 2 is a top view as seen from the XY direction of FIG. 1. 1 is a high frequency oscillator that generates high frequency energy; 2 is a waveguide that connects the high frequency oscillator 1 to the heating chamber 3; The heating chamber 3 and the waveguide 2 are formed from metal plates. A heated object 4 such as food is placed at the bottom of the heating chamber 3.
A turntable 5 is provided on which to place and rotate. Two high-frequency radiation ports 6 and 7 are provided in the part where the waveguide 2 is connected to the heating chamber 3. One high-frequency radiation port 6 is used as the tip of the waveguide 2, and the other high-frequency radiation port 7 is heated. A partition part 8 is located at the end of the chamber 3 and separates the dimensions B and D of the two high-frequency radiation ports 6 and 7 in the axial direction of the waveguide 2 from the two high-frequency radiation ports 6 and 7. Dimension B+C+D, which is the sum of dimension C, is 1/2λ~ for the wavelength λ used.
λ+1/4λ and dimension C of partition part 8 to 1/8
λ or more. Reference numeral 9 denotes a screw for joining the lower plate of the waveguide 2 and the upper wall end of the heating chamber 3. The mounting part dimension E of screw 9 is 15 mm for ease of manufacturing.
The above is necessary.
高周波放射口6,7の寸法B、Dと仕切部の寸
法Cとの合計寸法B+C+Dを1/2λ〜λ+1/4λ
にしている理由を説明する。導波管2内の管内波
長λgは使用波長(自由空間波長)λよりも大き
く、長辺寸法aを狭くするほど大きくなるという
性質があるが、実用寸法の導波管では1/2λ〜λ
+1/4λの範囲内に少なくとも1/2λgが含まれて
いる。具体的に述べると、家庭用の高周波加熱装
置いわゆる電子レンジにおいては、λ=122mm
(周波数2450MHzに対応)で、1/2λ〜λ+1/4λ
は61〜153mmであり、a寸法は96、80、70mmが一
般的である。a=96mmに対しては1/2λg=79mm
で、61<B+C+D<153mmの範囲内では、磁界
最大位置が導波管軸方向に対して先端と79mmの2
箇所であり、磁界最小位置は39.5mmと118.5mmの
2箇所である。磁界最大位置では磁界と直行する
導波管軸方向の壁面電流も最大となる。この壁面
電流を切るように高周波放射口6,7を設けるこ
とにより、高周波放射口6,7から能率よく高周
波エネルギーを加熱室3内に向かつて放射でき
る。そこで、a=96mmの場合は、高周波放射口
6,7をそれぞれ磁界最大位置である導波管の先
端部と79mm付近に配設する。仕切部8は高周波放
射効率の悪い磁界最小位置39.5mm付近に配設す
る。実用上、a=96mmでは、B+C+Dの最小寸
法1/2λgに対応する79mmである。 The total dimension B + C + D of the dimensions B and D of the high frequency radiation ports 6 and 7 and the dimension C of the partition part is 1/2λ to λ + 1/4λ
Explain why. The internal wavelength λg in the waveguide 2 is larger than the used wavelength (free space wavelength) λ, and it increases as the long side dimension a becomes narrower, but in a waveguide of practical size, it is 1/2 λ to λ.
At least 1/2λg is included within the range of +1/4λ. Specifically, in a household high-frequency heating device called a microwave oven, λ = 122 mm.
(corresponds to frequency 2450MHz), 1/2λ to λ+1/4λ
is 61 to 153 mm, and the a dimension is generally 96, 80, and 70 mm. For a=96mm, 1/2λg=79mm
In the range of 61<B+C+D<153mm, the maximum magnetic field position is between the tip and 79mm in the waveguide axis direction.
The minimum magnetic field positions are 39.5mm and 118.5mm. At the position of the maximum magnetic field, the wall current in the waveguide axis direction perpendicular to the magnetic field also reaches its maximum. By providing the high-frequency radiation ports 6 and 7 to cut off this wall current, high-frequency energy can be efficiently radiated toward the inside of the heating chamber 3 from the high-frequency radiation ports 6 and 7. Therefore, when a=96 mm, the high frequency radiation ports 6 and 7 are arranged near the tip of the waveguide and 79 mm, respectively, where the magnetic field is maximum. The partition part 8 is arranged near the minimum position of 39.5 mm in the magnetic field where high frequency radiation efficiency is poor. In practice, when a=96 mm, the minimum dimension of B+C+D is 79 mm, which corresponds to 1/2λg.
同様にa=80mmの場合は、61<B+C+D<
153mmの範囲内に磁界最大位置が2箇所、最小位
置が2箇所あるが、高周波放射口6,7をそれぞ
れ磁界最大位置である導波管先端部と95mm付近に
配設し、仕切部8は磁界最小位置の47.5mm付近に
配設する。実用上、a=80mmではB+C+Dの最
小寸法は1/2λgに対応する95mmである。 Similarly, if a=80mm, 61<B+C+D<
There are two maximum magnetic field positions and two minimum magnetic field positions within a range of 153 mm, but the high-frequency radiation ports 6 and 7 are located at the tip of the waveguide, which is the maximum magnetic field position, and at around 95 mm, and the partition part 8 is Place it near the minimum magnetic field position of 47.5mm. In practice, when a=80mm, the minimum dimension of B+C+D is 95mm, which corresponds to 1/2λg.
また、a=70mmの場合は、61<B+C+D<
153mmの範囲内に磁界最大位置が2箇所、最小位
置が1箇所あるが、高周波放射口6,7をそれぞ
れ磁界最大位置である導波管先端部と126mm付近
に配設し、仕切部8は磁界最小位置の63mm付近に
配設する。実用上、a=70mmではB+C+Dの最
小寸法は1/2λgに対応する126mmである。家庭用
の電子レンジでは、加熱室の幅は270mm〜400mm程
度である。前述のように、a=96mmでは、B+C
+Dの最小寸法が79mmであり、これにEの最小寸
法15mmを加えた寸法94mmである。この94mmがA
(=B+C+D+E)寸法の最小であり、上記電
子レンジの最小幅270mmの1/2である135mmよりも
短く実施可能である。同様に、a=80mmではA寸
法の最小は110mmとなり、a=70mmではA寸法の
最小は141mmとなる。このように、a=96、80、
70mmいずれの場合も導波管2の先端と加熱室3の
側壁との距離Aは、実際の電子レンジの加熱室の
導波管軸方向の幅のほぼ1/2以内と短くでき、ス
ペース的、コスト的に有利である。 Also, if a=70mm, 61<B+C+D<
There are two maximum magnetic field positions and one minimum magnetic field position within the range of 153 mm, but the high frequency radiation ports 6 and 7 are placed at the tip of the waveguide, which is the maximum magnetic field position, and near 126 mm, and the partition part 8 is Place it near the minimum magnetic field position of 63mm. In practice, when a=70 mm, the minimum dimension of B+C+D is 126 mm, which corresponds to 1/2λg. In a household microwave oven, the width of the heating chamber is approximately 270 mm to 400 mm. As mentioned above, when a=96mm, B+C
The minimum dimension of +D is 79 mm, and the minimum dimension of E, 15 mm, is added to this, resulting in a dimension of 94 mm. This 94mm is A
(=B+C+D+E), which is the minimum dimension, and can be made shorter than 135 mm, which is 1/2 of the minimum width of 270 mm of the above microwave oven. Similarly, when a=80mm, the minimum A dimension is 110mm, and when a=70mm, the minimum A dimension is 141mm. In this way, a=96, 80,
In any case of 70mm, the distance A between the tip of the waveguide 2 and the side wall of the heating chamber 3 can be shortened to approximately 1/2 of the width of the heating chamber of an actual microwave oven in the waveguide axis direction, which saves space. , which is advantageous in terms of cost.
なお、A寸法が加熱室3のほぼ1/2以内であつ
ても、ターンテーブル5で被加熱物4を回転移動
させるので、被加熱物4の全面に均一に高周波エ
ネルギーを照射することができる。 Note that even if the A dimension is within approximately 1/2 of the heating chamber 3, the object to be heated 4 is rotated and moved by the turntable 5, so that the entire surface of the object to be heated 4 can be uniformly irradiated with high-frequency energy. .
仕切部8の寸法Cを1/8λ以上としている理由
を説明する。高周波加熱装置の使用波長λを122
mm(周波数2450MHzに対応)とした場合、1/8λ
は約15mmとなる。この15mmは、家庭用の高周波加
熱装置いわゆる電子レンジにおいて、仕切部8を
塗装した鉄板あるいはステンレススチールで製作
したとき、500W〜700Wの高周波エネルギーを供
給している加熱室3内に被加熱物4を入れ忘れた
状態すなわち空焼状態で異常加熱による変色や変
形などの不都合が生じないために必要なもので、
その最小寸法であり、実用上は寸法Cは15mmより
大き目にする必要がある。 The reason why the dimension C of the partition portion 8 is set to 1/8λ or more will be explained. The wavelength λ used for the high frequency heating device is 122
mm (corresponding to frequency 2450MHz), 1/8λ
is approximately 15mm. This 15 mm is a household high-frequency heating device called a microwave oven, and when the partition part 8 is made of painted iron plate or stainless steel, the heated object 4 is placed inside the heating chamber 3 which supplies high-frequency energy of 500W to 700W. This is necessary to prevent inconveniences such as discoloration and deformation due to abnormal heating in the state where you forget to add the product, that is, in the dry firing state.
This is the minimum dimension, and for practical purposes, dimension C needs to be larger than 15 mm.
次に、本発明の高周波加熱装置の作用、効果を
説明する。高周波発振器1から加熱室3に向かう
高周波エネルギーは、まず加熱室3端部の高周波
放射口7から加熱室3内に放射され、続いて残り
の高周波エネルギーが導波管2の先端部の高周波
放射口6から加熱室3内に放射される。仕切部8
の寸法Cや位置を調節することにより、高周波放
射口7と6との高周波エネルギーの放射比率を調
節でき、ターンテーブル5の半径方向の加熱むら
を少なくすることができる。円周方向の加熱むら
はターンテーブル5の回転移動により少なくする
ことができるのはいうまでもない。 Next, the functions and effects of the high frequency heating device of the present invention will be explained. The high-frequency energy heading from the high-frequency oscillator 1 toward the heating chamber 3 is first radiated into the heating chamber 3 from the high-frequency radiation port 7 at the end of the heating chamber 3, and then the remaining high-frequency energy is radiated into the high-frequency radiation at the tip of the waveguide 2. It is radiated into the heating chamber 3 from the opening 6. Partition part 8
By adjusting the dimension C and position of the high-frequency radiation ports 7 and 6, the radiation ratio of high-frequency energy between the high-frequency radiation ports 7 and 6 can be adjusted, and uneven heating of the turntable 5 in the radial direction can be reduced. Needless to say, heating unevenness in the circumferential direction can be reduced by rotating the turntable 5.
以上のように、本発明によると、高周波放射口
の寸法範囲、どこを調節すればよいかが明確であ
るので、加熱むら改善に要する人手や期間を低減
でき、ターンテーブル上の半径方向、円周方向の
加熱むらが少なく、かつ二つの放射効率のよい放
射口を設けた導波管の先端と加熱室の側壁との距
離が実際の電子レンジの加熱室の幅のほぼ1/2以
内と短くて済み、スペース的、コスト的に有利な
高周波加熱装置が提供でき、実施する効果は大な
るものがある。 As described above, according to the present invention, the dimensional range of the high-frequency radiation opening and where to adjust it are clear, so it is possible to reduce the manpower and time required to improve uneven heating. There is little heating unevenness in the direction, and the distance between the tip of the waveguide, which has two radiation ports with high radiation efficiency, and the side wall of the heating chamber is short, approximately within half the width of the heating chamber of an actual microwave oven. It is possible to provide a high-frequency heating device that is advantageous in terms of space and cost, and has great effects when implemented.
第1図は本発明の高周波加熱装置の一実施例を
示す要部断面略図で、第2図は第1図のXY方向
から見た上面図である。
1……高周波発振器、2……導波管、3……加
熱室、4……被加熱物、5……ターンテーブル、
6,7……高周波放射口、8……仕切部、B,
C,D……各高周波放射口及び仕切部の寸法。
FIG. 1 is a schematic cross-sectional view of a main part showing an embodiment of the high-frequency heating device of the present invention, and FIG. 2 is a top view as seen from the XY direction of FIG. 1. 1... High frequency oscillator, 2... Waveguide, 3... Heating chamber, 4... Heated object, 5... Turntable,
6, 7... High frequency radiation port, 8... Partition part, B,
C, D...Dimensions of each high frequency radiation port and partition.
Claims (1)
と、この高周波発振器1を加熱室3に連結する導
波管2と、被加熱物4を回転移動させるターンテ
ーブル5とを備えた高周波加熱装置において、導
波管2と加熱室3との結合部に2個の高周波放射
口6,7を設け、導波管軸方向に対する上記2個
所の高周波放射口6,7の寸法B、Dと上記2個
所の高周波放射口6,7の間を隔てる仕切部8の
寸法Cとを合計した寸法(B+C+D)を使用波
長の1/2〜5/4にしたことを特徴とする高周波加熱
装置。1 High frequency oscillator 1 that generates high frequency energy
In a high-frequency heating device including a waveguide 2 that connects the high-frequency oscillator 1 to the heating chamber 3 and a turntable 5 that rotationally moves the object to be heated 4, the waveguide 2 and the heating chamber 3 are connected to each other. Two high-frequency radiation ports 6, 7 are provided in the waveguide, and dimensions B and D of the two high-frequency radiation ports 6, 7 in the waveguide axis direction are separated from the two high-frequency radiation ports 6, 7. A high-frequency heating device characterized in that the total dimension (B+C+D) of the dimension C of the partition portion 8 is set to 1/2 to 5/4 of the wavelength used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6395583A JPS59189588A (en) | 1983-04-12 | 1983-04-12 | High frequency heater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6395583A JPS59189588A (en) | 1983-04-12 | 1983-04-12 | High frequency heater |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59189588A JPS59189588A (en) | 1984-10-27 |
| JPS648916B2 true JPS648916B2 (en) | 1989-02-15 |
Family
ID=13244247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6395583A Granted JPS59189588A (en) | 1983-04-12 | 1983-04-12 | High frequency heater |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59189588A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6025874B2 (en) * | 1980-09-18 | 1985-06-20 | 株式会社東芝 | High frequency heating device |
-
1983
- 1983-04-12 JP JP6395583A patent/JPS59189588A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59189588A (en) | 1984-10-27 |
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