JPH0113097B2 - - Google Patents
Info
- Publication number
- JPH0113097B2 JPH0113097B2 JP55042797A JP4279780A JPH0113097B2 JP H0113097 B2 JPH0113097 B2 JP H0113097B2 JP 55042797 A JP55042797 A JP 55042797A JP 4279780 A JP4279780 A JP 4279780A JP H0113097 B2 JPH0113097 B2 JP H0113097B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- corrosion
- solid metal
- metal mask
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はスクリーン印刷に用いられるソリツド
メタルマスクの精度を向上させる方法として両面
から腐食される金属層の任意の中間に、両面から
腐食する腐食液ではほとんど腐食することのでき
ない異種金属層、及び/又はどんな腐食液でも腐
食できない極薄い合金層を形成したことを特徴と
するソリツドメタルマスクの構造に関するもので
ある。[Detailed Description of the Invention] [Industrial Application Field] The present invention is a method for improving the precision of solid metal masks used in screen printing. The present invention relates to the structure of a solid metal mask characterized by forming a dissimilar metal layer that cannot be corroded by any etchant and/or an extremely thin alloy layer that cannot be corroded by any etchant.
ソリツドメタルマスクはスクリーン印刷法で印
刷される版の一種である。通常のスクリーン印刷
ではスクリーン上に感光性樹脂(以下レジストと
云う)で画像がえがかれ、インキはスクリーンの
メツシユ孔を通つて、被印刷体に付着する。この
版を全て金属におきかえたものはサスペンドメタ
ルマスクスクリーンと一般に云われている。これ
に対しメツシユ孔の全くない、即ち画像通りに貫
通せしめられインキがストレートに押し出される
版はソリツドメタルマスクと呼ばれている。 A solid metal mask is a type of plate printed using a screen printing method. In normal screen printing, an image is drawn on a screen using a photosensitive resin (hereinafter referred to as resist), and ink passes through mesh holes in the screen and adheres to the printing material. A screen in which this plate is entirely made of metal is generally referred to as a suspended metal mask screen. On the other hand, a plate that has no mesh holes at all, that is, the ink is pushed out straight through the mask in accordance with the image, is called a solid metal mask.
現在行われているソリツドメタルマスクの製版
法の大略を示すと次のようになる。
The outline of the currently used plate-making method for solid metal masks is as follows.
1 必要とする厚さの金属板を用意する。(今日
一般に使われているのは、厚さ100μ,200μ等
のステンレス板である。)
2 金属板を任意の大きさに切断し、両面を脱
脂、水洗、乾燥した後、両面にレジストを塗布
し、乾燥する。1 Prepare a metal plate of the required thickness. (Today, stainless steel plates with a thickness of 100μ, 200μ, etc. are commonly used.) 2. Cut the metal plate to the desired size, degrease both sides, wash with water, dry, and then apply resist on both sides. and dry.
3 両面にフイルムを密着させ露光する。3 Place the film on both sides and expose.
4 フイルムを取り除き現象、水洗する。4 Remove the film and wash with water.
5 現像によつて露出した金属面を塩化第二鉄液
を腐食液として両面同時又は片面ずつ腐食する
(片面ずつ腐食する場合は他方の側に保護膜を
付ける。)
6 レジストを除去し、ソリツドメタルマスク版
とする。5. Corrode the metal surface exposed by development using ferric chloride solution as an etchant, either simultaneously on both sides or one side at a time (if corroding one side at a time, attach a protective film to the other side).6. This is the Tsudo metal mask version.
以上の工程をへて作られたソリツドメタルマス
ク版は慣用(例えば登録実用新案第1343802号)
の方法でスクリーン枠に固定し印刷板とする。 The solid metal mask plate made through the above process is commonly used (for example, registered utility model No. 1343802)
Fix it to the screen frame using the method described below to make a printing board.
この状態の断面図を示すと第1図のようにな
る。図中aは枠、例えばアルミ枠を示し、bは伸
縮性あるナイロン、テトロン等の紗を示し、その
中心にソリツドメタルマスクcを接着剤dで固定
する。そしてスキージeでインキfを被印刷体g
に押し出し印刷する。 A cross-sectional view of this state is shown in FIG. In the figure, a indicates a frame, for example, an aluminum frame, b indicates stretchable gauze made of nylon, Tetron, etc., and a solid metal mask c is fixed to the center thereof with an adhesive d. Then apply the ink f to the printing material g using a squeegee e.
Extrude and print.
ソリツドメタルマスクは単位面積当りのインキ
の塗布量が多いことを必要とする印刷法として利
用されるため、次に示す特性が求められている。 Since solid metal masks are used in printing methods that require a large amount of ink to be applied per unit area, the following characteristics are required.
1 腐食の形状(腐食された金属画像の形状)の
精密性(シヤープ性)
腐食形状のシヤープ性は、第2図から被印刷
体gと接触するソリツドメタルマスクcのイン
キhの押し出される面c′に特に要求され、その
輪郭は鋭角(例えば輪郭が四角形である時、各
角が鋭角であること)で、しかもフイルムに対
し忠実に画像が再現されていなければならな
い。1. Precision (sharpness) of the corrosion shape (shape of the corroded metal image) The sharpness of the corrosion shape is determined by the sharpness of the corrosion shape from the surface of the solid metal mask c that comes into contact with the printing material g from which the ink h is extruded, as shown in Figure 2. There is a particular requirement for c', and the outline must have acute angles (for example, if the outline is a rectangle, each corner must be acute), and the image must be faithfully reproduced on the film.
2 インキの塗布量が加減出来る。2. The amount of ink applied can be adjusted.
インキのの塗布量、即ち押し出されるインキ
の量は腐食による断面の型が変ると変る。第3
a図に示すごとくソリツドメタルマスクcのイ
ンキを押し込む面c″とインキが押し出される面
c′が同じであれば、例えば被印刷体gの孔g′に
インキhを詰める場合、インキhの量はソリツ
ドメタルマスクcの厚さに比例するが、第3b
図のごとくインキを押し込む面c″がインキが押
し出される面c′より大きい場合、押し出される
インキの量hはソリツドメタルマスクcの厚さ
とは無関係に多くなる。 The amount of ink applied, that is, the amount of ink extruded, changes as the shape of the cross section changes due to corrosion. Third
As shown in figure a, the surface c″ of the solid metal mask c into which the ink is pushed and the surface from which the ink is pushed out.
If c' is the same, for example, when filling ink h into hole g' of printing material g, the amount of ink h is proportional to the thickness of solid metal mask c, but the third b
As shown in the figure, when the surface c'' into which the ink is pushed is larger than the surface c' through which the ink is pushed out, the amount h of the ink pushed out increases regardless of the thickness of the solid metal mask c.
ソリツドメタルマスクは用途に応じて上記の
貫通画像孔断面特性をそなえるように製作しな
ければならない。 A solid metal mask must be manufactured to have the above-mentioned through-hole cross-sectional characteristics depending on the intended use.
しかしながら前述した工程では貫通画像孔断面
特性の満足なソリツドメタルマスクは作成出来な
い。それは次のような欠点があるからである。
However, with the above-described process, a solid metal mask with satisfactory through-hole cross-sectional characteristics cannot be produced. This is because it has the following drawbacks.
1 単一金属(ステンレスとして)であるから、
腐食深度を設定しても、その深度で腐食を止め
るには相当な熟練を必要とする。1 Since it is a single metal (as stainless steel),
Even if a corrosion depth is set, considerable skill is required to stop corrosion at that depth.
(腐食する場合、腐食液が新しいか、使い古
されたかによつて腐食の速さがいちぢるしく異
なる。又50μ,100μの腐食は腐食途中で深度を
測定する事は不可能である。その為勘に頼るこ
とになり再版は全く不可能となる。)
2 片面ずつ腐食する場合、腐食の終つた面をニ
ス止めするが、腐食面積が小さく腐食深度が深
い時などニスが充分腐食面を被膜しないと一方
から腐食が進み貫通した時腐食液がニスで被膜
されていない金属面まで腐食が進み、版として
の用に供しえないものとなつてしまう。 (When corroding, the speed of corrosion differs significantly depending on whether the corrosive solution is new or used. Also, in the case of 50μ or 100μ corrosion, it is impossible to measure the depth during corrosion. (You will have to rely on intuition and reprinting will be completely impossible.) 2. When corrosion occurs on one side at a time, apply varnish to the corroded surface, but if the corroded area is small and the corrosion depth is deep, the varnish may not cover the corroded surface sufficiently. If it is not coated, corrosion will progress from one side, and when it penetrates, the corrosive liquid will corrode all the way to the metal surface that is not coated with varnish, making it unusable as a plate.
3 ステンレスは合金であるため腐食時垂直方向
と共に進む側壁方向への腐食(サイドエツチと
云う)が大きく、その為輪郭のシヤープ性がで
きない。3. Since stainless steel is an alloy, when it corrodes, corrosion progresses in the vertical direction as well as the side wall direction (referred to as side etch), and as a result, the profile cannot be sharpened.
4 単一層であるから腐食断面が一定なものしか
できない。4 Since it is a single layer, only a uniform corrosion cross section can be produced.
5 同一板上に大小さまざまな孔径をもつた孔を
貫通させようとする時、孔径の大小によつて腐
食スピードが異る為、腐食断面を同一にするこ
とができない。5. When trying to penetrate holes of various sizes on the same plate, it is not possible to make the corrosion cross section the same because the corrosion speed differs depending on the size of the hole.
6 柄を保持するため厚さのの1/2,1/3の金属で
架橋しようとしても全く不可能である。6. Even if you try to bridge the handle with metal that is 1/2 or 1/3 of its thickness, it is completely impossible.
本発明の目的は以上述べた全ての欠点をなくし
理想的なソリツドメタルマスクを提供しようとす
るものである。 The object of the present invention is to eliminate all of the above-mentioned drawbacks and provide an ideal solid metal mask.
又、本発明は発明者等が先に出願した特開昭55
−100556(特願昭54−7679)をソリツドメタルマ
スクの製版の為に発展改良したものである。 Additionally, the present invention is based on the patent application filed in 1983 by the inventors.
-100556 (Japanese Patent Application No. 54-7679) was developed and improved for the plate making of solid metal masks.
以下本発明に関し更に詳細に説明する。 The present invention will be explained in more detail below.
本発明のソリツドメタルマスクは基本的には第
4図に示すごとく3つの層からなつている。今仮
にインキの入る側をm(以下m層と云う)とし、
インキの出る側をo(以下o層と云う)とすると、
m層、o層を腐食する腐食液ではほとんど腐食す
ることが出来ない金属層、即ち異種金属層をn
(以下n層と云う)と呼ぶ事にする。 The solid metal mask of the present invention basically consists of three layers as shown in FIG. Let's assume that the side where the ink enters is m (hereinafter referred to as the m layer),
If the side where the ink comes out is o (hereinafter referred to as the o layer),
A metal layer that can hardly be corroded by a corrosive solution that corrodes the m and o layers, that is, a dissimilar metal layer, is n
(hereinafter referred to as the n-layer).
第5c図に示す断面形態を必要とする時、m層
o層をニツケルとしn層を銅又は真鍮とすればよ
い。そしてメツキ法でニツケル一銅−ニツケルと
するか又は銅板或いは真鍮板の両側にメツキ法で
ニツケルを付着させればよい。次に第5a図のご
とく表裏にそれぞれ互いに位置を合せたほぼ対称
の像のレジストPを光学的に所望の部分にだけ残
し腐食に入る。像を対称に表と裏に形成すること
は写真技術を用いて容易に行える。またぼかしそ
の他を利用して一方の像だけ像をやや大きくする
ことも容易である。腐食液は発明者等が先願した
特公昭56−18944(特願昭48−48419号)に示して
ある過酸化水素と硝酸の混液である酸性腐食液で
ニツケルを腐食する。この腐食液では銅を腐食す
る事はほとんど出来ない。腐食中銅面が表われた
事を確認して腐食を止めると第5b図のようにな
る。次にアルカリ性腐食液で銅を腐食する。この
腐食液ではニツケルを腐食することは全く出来な
い。次にレジストを剥離すると第5c図のような
形となる。n層を酸性腐食液でもアルカリ性腐食
液でも腐食することの出来ない金属、例えばニツ
ケル−リンの合金にした断面図を示すと第6図の
ようになる。この場合のn層の厚さは0.5〜2μで
なければならない。このような薄い層を中間にし
て両側から腐食する時腐食中に加わる圧力でこの
膜が破れてはならないので硬度400〜700(ビツカ
ース硬度)が必要となる。しかも最終的には腐食
以外の方法、例えばスプレーガンを用い水圧等で
この膜を取り除き貫通させなければならないので
硬くもろい性が要求される。第6a図はn層にニ
ツケルリンとし、m層、o層をニツケルとし同様
な腐食液でニツケルを腐食して第6b図の様に
し、次に第6c図に示すごとくスプレーガンを用
い水圧で貫通部分のn層を除去する。 When the cross-sectional form shown in FIG. 5c is required, the m layer and o layer may be made of nickel, and the n layer may be made of copper or brass. Then, nickel may be made into copper-nickel by a plating method, or nickel may be attached to both sides of a copper plate or a brass plate by a plating method. Next, as shown in FIG. 5a, the resist P, which has substantially symmetrical images aligned with each other on the front and back sides, is left only in optically desired areas and then etched. Forming images symmetrically on the front and back can be easily done using photographic technology. It is also easy to make one image slightly larger by using blurring or other methods. The corrosive liquid corrodes nickel with an acidic corrosive liquid which is a mixture of hydrogen peroxide and nitric acid as shown in Japanese Patent Publication No. 18944/1983 (Japanese Patent Application No. 48419/1982) filed by the inventors. This corrosive liquid can hardly corrode copper. When it is confirmed that the copper surface appears during corrosion and the corrosion is stopped, the result is as shown in Figure 5b. Next, the copper is corroded with an alkaline corrosive solution. This corrosive liquid cannot corrode nickel at all. Next, when the resist is peeled off, a shape as shown in FIG. 5c is obtained. FIG. 6 shows a cross-sectional view of the n-layer made of a metal that cannot be corroded by either acidic or alkaline corrosive liquids, such as a nickel-phosphorous alloy. The thickness of the n-layer in this case should be 0.5-2μ. When corroding from both sides with such a thin layer in between, this film must not be torn by the pressure applied during corrosion, so a hardness of 400 to 700 (Vickers hardness) is required. Furthermore, since this film must ultimately be removed and penetrated by a method other than corrosion, such as water pressure using a spray gun, it is required to be hard and brittle. In Figure 6a, the n layer is made of nickel, the m and o layers are made of nickel, and the nickel is corroded with a similar corrosive liquid to form the structure shown in figure 6b, and then penetrated with water pressure using a spray gun as shown in figure 6c. Remove part of the n layer.
次に印刷精度を上げる方法として示したのが第
7図である。いわゆるV型を作り被印刷体との接
触面の精度を上げる事により精度ある厚膜印刷を
しようとする時に必要となる型である。 Next, FIG. 7 shows a method for increasing printing accuracy. This type is necessary when attempting to perform thick film printing with high precision by creating a so-called V shape and increasing the precision of the contact surface with the printing medium.
第7a図に示すごとくo層を更に2つに分割し
o′層とo″層とし、前と同様に表裏にそれぞれ互い
に位置を合せたほぼ対称であるが一方の方がやや
大きい像となるようにレジストを光学的に所望の
部分にだけ残す。o′層を被印刷体との接触層とし
てニツケルを用い、o″層を銅、n層をニツケルリ
ン、m層をニツケルとし、ニツケルを腐食して第
7b図の様にした後、銅を腐食第7c図の様に
し、最後にスプレーガンを用いてn層を除去して
第7d図の様にすることにより製作することがで
きる。この結果o′層の厚さを例えば20μとすれば
前述した深度とサイドエツチとの関係からサイド
エツチを20μでおさえる事が出来精度が飛躍的に
向上する事になる。又o′層をさらに薄くすればそ
れに比例して精度が上ることにもなる。 The o layer is further divided into two as shown in Figure 7a.
The o′ layer and o″ layer are almost symmetrical, with the front and back sides aligned with each other as before, but the resist is left only in optically desired areas so that one image is slightly larger than the other. o Nickel was used as the contact layer with the printing material for the 'layer, copper for the o'' layer, nickel for the n layer, and nickel for the m layer.After corroding the nickel to form the layer shown in Figure 7b, It can be manufactured by making it as shown in Fig. 7c and finally removing the n layer using a spray gun to make it as shown in Fig. 7d. As a result, if the thickness of the o′ layer is set to 20 μm, for example, the side etch can be kept to 20 μm based on the relationship between the depth and the side etch described above, and the accuracy will be dramatically improved. Furthermore, if the o' layer is made even thinner, the accuracy will increase proportionally.
以上述べた組合せによる断面形状は数例にしか
すぎないが、組合せ方による断面形状の変化は
様々で利用する面からしてその応用範囲はさらに
増大するものと期待している。例えば現在ステン
レスで製造されている光学式スリツト版(エンコ
ーダ)等に本発明方法の構造でつくることによ
り、より精度のよいスリツト版が得られるなどで
ある。 Although the cross-sectional shapes of the above-mentioned combinations are only a few examples, the cross-sectional shapes change in various ways depending on the combination, and we expect that the range of applications will further increase in terms of usage. For example, by manufacturing an optical slit plate (encoder), which is currently made of stainless steel, with the structure of the method of the present invention, a slit plate with higher precision can be obtained.
以下実施例を挙げさらに詳しく説明する。 A more detailed explanation will be given below with reference to Examples.
実施例 1
300mm×300mmで厚さ2mmのステンレス板の表面
を鏡面とした後、5%カセイソーダ水溶液で脱脂
し次に水洗した。更に残存カセイソーダを中和す
るため5%硫酸水溶液をかけ、さらに水洗した。
次に表面がぬれている状態で通常のスルフアミン
酸ニツケルメツキ浴で厚さ50μになるようニツケ
ルメツキを行つた。メツキ終了後直ちに水洗し、
次に通常のニツケル−リン合金メツキ浴で厚さ
0.8μになるようメツキを行い、メツキ終了後水洗
し、再度通常のスルフアミン酸ニツケルメツキ浴
で厚さ50μになるようメツキを行つた。以上一連
のメツキ工程が終了した後メツキ金属をステンレ
ス板から剥離しソリツドメタルマスク用板とし
た。次にホイラーを用い感光性樹脂(K.P.Rコダ
ツク社製)塗布し、赤外線ヒーターを用い乾燥し
た。次にあらかじめ用意してある2枚のフイルム
を真空焼枠に入れ密着させキセノンランプを用い
て紫外線露光した。露光後フイルムをはがし、所
定の現像液で現像し水洗した。次に通常のパドル
式エツチングマシンの中に硝酸10%、過酸化水素
20%を入れ液温28℃で腐食を行つた。両面腐食が
終了した後スプレーガンを用い露出しているニツ
ケル−リン層を除去した。最後に剥離液でレジス
トを剥離し水洗しソリツドメタルマスク板とし
た。その結果一方からの腐食の影響が他方に及ぼ
すことがなく理想的な版に仕上げることができ
た。他の応用例として蒸着マスクへの利用があ
る。Example 1 The surface of a stainless steel plate measuring 300 mm x 300 mm and 2 mm thick was made into a mirror surface, degreased with a 5% caustic soda aqueous solution, and then washed with water. Furthermore, in order to neutralize the remaining caustic soda, a 5% aqueous sulfuric acid solution was applied, followed by washing with water.
Next, while the surface was wet, it was nickel plated to a thickness of 50 μm using a normal sulfamic acid nickel plating bath. Immediately after finishing the plating, wash with water,
Next, use a normal nickel-phosphorus alloy plating bath to
It was plated to a thickness of 0.8μ, washed with water after plating, and plated again to a thickness of 50μ using a normal nickel sulfamic acid plating bath. After completing the above series of plating steps, the plating metal was peeled off from the stainless steel plate to obtain a solid metal mask plate. Next, a photosensitive resin (manufactured by KPR Kodak) was applied using a wheeler and dried using an infrared heater. Next, two films prepared in advance were placed in a vacuum printing frame and brought into close contact with each other, and exposed to ultraviolet light using a xenon lamp. After exposure, the film was peeled off, developed with a prescribed developer, and washed with water. Next, add 10% nitric acid and hydrogen peroxide to a regular paddle etching machine.
20% was added and corrosion was carried out at a liquid temperature of 28°C. After the corrosion on both sides was completed, the exposed nickel-phosphorus layer was removed using a spray gun. Finally, the resist was removed with a remover and washed with water to obtain a solid metal mask plate. As a result, we were able to create an ideal plate without the effects of corrosion from one side affecting the other. Another example of application is its use in vapor deposition masks.
実施例 2
300mm×300mmの大きさで厚さ100μの真鍮板を
木枠に固定し、実施例1と同様な方法で表面処理
をした後、同様なメツキ浴で両側に厚さ30μのニ
ツケルメツキを行つた。次に実施例1と同様な方
法でフイルムを焼付けた後、同様な腐食液を用い
てニツケル層の腐食を行つた。その結果銅面が多
少ざらついた程度で腐食が止つた。次にアンモニ
ア水の入つているアルカリ性腐食液を用いて真鍮
の腐食をパツドの中で行つた。その結果真鍮面を
完全に腐食で除去出来たがニツケル面には何らの
変化も認められなかつた。この応用例として光学
式スリツト版がある。Example 2 A brass plate with a size of 300 mm x 300 mm and a thickness of 100 μ was fixed to a wooden frame, and the surface was treated in the same manner as in Example 1. After that, a nickel plating with a thickness of 30 μ was applied on both sides in the same plating bath. I went. Next, the film was baked in the same manner as in Example 1, and then the nickel layer was etched using the same etching solution. As a result, corrosion stopped with the copper surface becoming slightly rough. Next, the brass was corroded inside the pad using an alkaline caustic solution containing aqueous ammonia. As a result, the brass surface was completely removed by corrosion, but no change was observed on the nickel surface. An example of this application is an optical slit plate.
第1図はソリツドメタルマスク版をスクリーン
枠に固定して印刷板とした状態を概略的に示す断
面図である。第2図はソリツドメタルマスクcの
画像孔のインキhの押し出される面c′の輪郭が鋭
角であることを要求されることを概略的に示す断
面図である。第3a図はソリツドメタルマスクの
インキを押し込む面の孔径が押し出される面のも
のと同じ場合、第3b図は押し込む面の孔径が押
し出される面より広い場合の状況を概略的に示す
断面図である。第4図はソリツドメタルマスクの
3層m,n,oを示す断面図である。第5a図は
第4図の版にレジストPを光学的につけ腐食に入
らんとする状況を示し、第5b図は中間層以外が
腐食された状況、第5c図は違つた腐食液で中間
層を腐食しレジストを除去した状況を示すいずれ
も概略的断面図である。第6a図、第6b図及び
第6c図は第5a図、第5b図及び第5c図の場
合と同様な例であるが中間層はどんな腐食液にも
侵されない金属を囲む中間層を例えば水圧等で破
る場合を示す概略断面図である。第7a図はo層
を2つに分割し、被印刷体との接触層にニツケル
o′、その上の層に銅o″、その上の3層にどんな腐
食液でも侵されないニツケル−リン層をその上の
m層をニツケルとし、レジストを付けた状況を示
す断面図である。第7b図はニツケルを腐食した
状況、第7c図は更に銅を腐食した状況を、第7
図最後にスプレーガンを用いてニツケル−リンを
除去した状況を概略的に示すいずれも断面図であ
る。
a:枠、b:伸縮性あるナイロン、テトロン等
の紗、c:ソリツドメタルマスク、d:接着剤、
e:スキージ、f:インキ、g:被印刷体、c′:
ソリツドメタルマスクのインキの押し出される
面、c″:インキを押し込む面、g′:被印刷体の
孔、m:ソリツドメタルのインキの入る側の層、
o:インキの出る側の層、n:mともoとも異る
金属層、l:m,nとoの3層。
FIG. 1 is a cross-sectional view schematically showing a state in which a solid metal mask plate is fixed to a screen frame to form a printing plate. FIG. 2 is a cross-sectional view schematically showing that the contour of the surface c' from which the ink h is extruded from the image hole of the solid metal mask c is required to have an acute angle. Figure 3a is a cross-sectional view schematically showing the situation when the hole diameter of the surface into which ink is pushed is the same as that of the surface from which the ink is pushed out, and Figure 3b is a cross-sectional view schematically showing the situation when the hole diameter of the surface to be pushed is wider than that of the surface from which the ink is pushed out. be. FIG. 4 is a sectional view showing three layers m, n, and o of a solid metal mask. Fig. 5a shows a situation in which a resist P is optically applied to the plate in Fig. 4 to prevent corrosion, Fig. 5b shows a situation in which areas other than the intermediate layer are corroded, and Fig. 5c shows a situation in which the intermediate layer is corroded with a different etchant. Both are schematic cross-sectional views showing the situation where the resist has been corroded and the resist has been removed. Figures 6a, 6b and 6c are examples similar to those in Figures 5a, 5b and 5c, except that the intermediate layer surrounds the metal which is not attacked by any corrosive liquid, e.g. FIG. In Figure 7a, the o layer is divided into two, and the contact layer with the printing material is made of nickel.
This is a cross-sectional view showing a situation in which a resist is applied to a copper layer o', a copper o'' layer above it, a nickel-phosphorus layer that is not corroded by any corrosive liquid, and a nickel layer m above it. Figure 7b shows the situation where nickel is corroded, and Figure 7c shows the situation where copper is further corroded.
The last figure is a cross-sectional view schematically showing the state in which nickel-phosphorus was removed using a spray gun. a: frame, b: stretchable nylon, tetron, etc. gauze, c: solid metal mask, d: adhesive,
e: squeegee, f: ink, g: printing material, c':
The surface of the solid metal mask where the ink is pushed out, c'': The surface where the ink is pushed, g': The hole in the printing material, m: The layer of the solid metal on the side where the ink enters.
o: layer on the side from which ink comes out, n: metal layer different from both m and o, l: three layers of m, n and o.
Claims (1)
腐食することの出来ない金属で中間層を形成した
メツキにより一体的に形成した少なくとも3層か
らなる金属板の表裏面に互いに位置を合せたほぼ
対称の像のレジスト除去部分を形成して異なる腐
食液による腐食、又は腐食液による腐食と薄い上
記中間層を物理的力で除去することの組合せによ
つて貫通画像孔を設けたソリツドメタルマスク
版。 2 上記中間層を10μ〜500μの厚さのアルカリ可
溶性金属とした特許請求の範囲第1項に記載のソ
リツドメタルマスク版。 3 上記中間層を腐食ではほとんど取り除けない
0.5〜2μの厚みの合金とした特許請求の範囲第1
項に記載のソリツドメタルマスク版。 4 中間層として10μ〜500μの厚さのアルカリ可
溶性金属、又は0.5〜2μの厚さの腐食ではほとん
ど取り除けない合金を有する特許請求の範囲第1
項に記載のソリツドメタルマスク版。[Claims] 1. On the front and back surfaces of a metal plate consisting of at least three layers integrally formed by plating with an intermediate layer made of a metal that can hardly be corroded by a corrosive liquid that corrodes metals in other layers. The through-image holes are formed by etching with different etchants, forming roughly symmetrical image resist removal portions aligned with each other, or by a combination of etchant attack and removal of the thin intermediate layer by physical force. Solid metal mask version. 2. The solid metal mask plate according to claim 1, wherein the intermediate layer is an alkali-soluble metal having a thickness of 10μ to 500μ. 3 The above intermediate layer can hardly be removed by corrosion.
Claim 1: The alloy has a thickness of 0.5 to 2μ.
Solid metal mask version described in section. 4 Claim 1 having an alkali-soluble metal with a thickness of 10μ to 500μ or an alloy that can hardly be removed by corrosion with a thickness of 0.5 to 2μ as the intermediate layer
Solid metal mask version described in section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4279780A JPS56140352A (en) | 1980-04-03 | 1980-04-03 | Solid metallic mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4279780A JPS56140352A (en) | 1980-04-03 | 1980-04-03 | Solid metallic mask plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56140352A JPS56140352A (en) | 1981-11-02 |
| JPH0113097B2 true JPH0113097B2 (en) | 1989-03-03 |
Family
ID=12645951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4279780A Granted JPS56140352A (en) | 1980-04-03 | 1980-04-03 | Solid metallic mask plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56140352A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005042147A (en) * | 2003-07-25 | 2005-02-17 | Dainippon Screen Mfg Co Ltd | Method of producing mask for vapor deposition, and mask for vapor deposition |
| JP2005089809A (en) * | 2003-09-17 | 2005-04-07 | Mitsumura Printing Co Ltd | Masking device, method of producing masking device, conveying device and method of producing conveying device |
| JP5453870B2 (en) * | 2009-03-27 | 2014-03-26 | 協立化学産業株式会社 | Metal mask for forming adhesive rib and manufacturing method thereof |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5196606A (en) * | 1975-02-19 | 1976-08-25 | ||
| JPS53113602A (en) * | 1977-03-15 | 1978-10-04 | Fujitsu Ltd | Method of engraving metal mask |
| JPS55100556A (en) * | 1979-01-05 | 1980-07-31 | Kenseidou Kagaku Kogyo Kk | Construction and preparation of metal mask screen |
-
1980
- 1980-04-03 JP JP4279780A patent/JPS56140352A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56140352A (en) | 1981-11-02 |
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