JPH0124870B2 - - Google Patents
Info
- Publication number
- JPH0124870B2 JPH0124870B2 JP3982785A JP3982785A JPH0124870B2 JP H0124870 B2 JPH0124870 B2 JP H0124870B2 JP 3982785 A JP3982785 A JP 3982785A JP 3982785 A JP3982785 A JP 3982785A JP H0124870 B2 JPH0124870 B2 JP H0124870B2
- Authority
- JP
- Japan
- Prior art keywords
- electrodeposited
- layer
- ceramic cement
- thin film
- film layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Moulds For Moulding Plastics Or The Like (AREA)
Description
【発明の詳細な説明】
「対象技術分野」
この発明は電鋳型およびその製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] This invention relates to an electroforming mold and a method for manufacturing the same.
「従来装置およびその問題点」
従来、表面に凹部を有する母型から電鋳型を製
造するばあい、通常の電流密度で電着を行うと第
2図に示すように局部的、とくに凸部2に電着層
が厚く形成され、そのために凹部3における電着
層の成長が阻害される。したがつてその電鋳工程
における電流密度を通常の電流密度より低く設定
しているが、反面電着層の形成に多くの日数を要
する欠点がある。また電流密度を低くしてもなお
凹凸部2,3の電着層が不均一となることは避け
られず、このため電鋳工程の後に機械加工を施す
必要があり、いきおい多くの日時を必要とする。"Conventional Apparatus and its Problems" Conventionally, when producing an electroforming mold from a master mold having concave portions on its surface, when electrodeposition is carried out at a normal current density, as shown in FIG. The electrodeposited layer is formed thickly in the recess 3, which inhibits the growth of the electrodeposited layer in the recess 3. Therefore, the current density in the electroforming process is set lower than the usual current density, but on the other hand, it has the disadvantage that it takes many days to form the electrodeposited layer. Furthermore, even if the current density is lowered, it is unavoidable that the electrodeposited layer on the uneven parts 2 and 3 will be non-uniform, and for this reason, it is necessary to perform machining after the electroforming process, which requires a lot of time and effort. shall be.
また電着層の不均一を補正する目的で、第3図
に示すように補助電極8を用いることもなされて
いるが、歯型などの複雑な凹凸形状を有する電鋳
型の製造においては母型を回転させて電着を行う
ため、補助電極の作成ならびに取付装置にかえつ
て多くの時間を費す欠点がある。 In addition, for the purpose of correcting non-uniformity of the electrodeposition layer, an auxiliary electrode 8 is used as shown in Fig. 3. Since electrodeposition is carried out by rotating the electrode, there is a disadvantage that a lot of time is spent on the preparation of the auxiliary electrode and the attachment device.
「目的」
この発明は歯型のように複雑な凹凸部を有する
電鋳型の製造において、電着層の形成が遅い凹部
にも高速で電着を施すことを目的とするものであ
る。"Purpose" The purpose of the present invention is to perform electrodeposition at high speed even in the recesses where the formation of the electrodeposition layer is slow, in the production of electroforming molds having complex uneven parts such as tooth patterns.
「実施例」
以下図によつてこの発明の一実施例について説
明する。"Embodiment" An embodiment of the present invention will be described below with reference to the drawings.
すなわち第1図において電鋳型の母型1はたと
えばギア等の歯型用のもので、その表面には複数
の凸部2および凹部3が形成されている。そして
その母型1の表面にはまず厚さが0.2〜1mmの電
着薄膜層4が形成され、その厚さは母型1の形状
あるいはその大きさで異なり、またその電着薄膜
層4を形成するばあい、母型1が電気メツキを施
すことが可能な形状であるならば電気メツキの方
が能率的に有利であるが、電気メツキを施すこと
が困難なばあい、あるいはそのメツキ工程に比較
的長い時間を要するものにあつては無電解メツキ
により形成することができる。次に電着薄膜層4
の表面において凹部3内にはセラミツクセメント
5が充填され、これによつて母型1の表面はほぼ
均一に整形される。ここでセラミツクセメント5
の主剤は三価の金属酸化物たとえば酸化アルミニ
ウム(Al2O3)や酸化ニツケル(Ni2O3)に金属
粉末たとえばニツケル、銅、アルミニウム等の粉
末を重量比にして5〜50%混合することにより組
成される。そして三価の金属酸化物は熱硬化性を
有するため、とくに母型1の材質が金属により構
成され、かつ高温加熱が可能なばあいに適する。
またセラミツクセメント5中に混入される金属粉
末は熱伝導性が高く、かつ導電性を有するため、
活性化を容易にするとともに、セラミツクセメン
ト5の熱膨張をこの表面に施されるメツキ層に近
づける効果を有する。次に凹部3に充填したセラ
ミツクセメント5を硬化させるが、この際セラミ
ツクセメントに導電性を与えるために、その表面
を塩化パラジウム(Pdcl2)、塩化錫(Sncl2)等
で表面を活性化し、その表面に厚さが約0.01〜
0.1mm程度のメツキ層6を形成する。なおこのメ
ツキ層は無電解メツキにより行うことが望まし
い。そしてこのメツキ層を形成した状態において
は母型1の表面には凹凸がなくなるため、次にス
ルフアミン酸ニツケル浴のような高電流の流せる
メツキ浴を使用して電着加工を行うことによりそ
の表面に電着層7を形成する。これによつて表面
の均一な電鋳母型が完成する。 That is, in FIG. 1, an electroforming master mold 1 is used for, for example, a tooth mold of a gear, and has a plurality of convex portions 2 and concave portions 3 formed on its surface. First, an electrodeposited thin film layer 4 with a thickness of 0.2 to 1 mm is formed on the surface of the matrix 1, and the thickness varies depending on the shape or size of the matrix 1. When forming, if the matrix 1 has a shape that allows electroplating, electroplating is more efficient, but if it is difficult to electroplat, or the plating process is If the process requires a relatively long time, it can be formed by electroless plating. Next, the electrodeposited thin film layer 4
Ceramic cement 5 is filled in the recess 3 on the surface of the mold 1, thereby making the surface of the mother mold 1 substantially uniform. Here Ceramic Cement 5
The main ingredient is a trivalent metal oxide such as aluminum oxide (Al 2 O 3 ) or nickel oxide (Ni 2 O 3 ) mixed with metal powder such as nickel, copper, aluminum, etc. at a weight ratio of 5 to 50%. It is composed of Since trivalent metal oxides have thermosetting properties, they are particularly suitable when the material of the matrix 1 is made of metal and can be heated at high temperatures.
Furthermore, since the metal powder mixed into the ceramic cement 5 has high thermal conductivity and electrical conductivity,
This has the effect of facilitating activation and bringing the thermal expansion of the ceramic cement 5 closer to the plating layer applied to its surface. Next, the ceramic cement 5 filled in the recess 3 is hardened, and at this time, in order to give conductivity to the ceramic cement, its surface is activated with palladium chloride (Pdcl 2 ), tin chloride (Sncl 2 ), etc. The thickness on its surface is about 0.01 ~
A plating layer 6 of about 0.1 mm is formed. Note that this plating layer is preferably formed by electroless plating. When this plating layer is formed, the surface of the mother mold 1 has no irregularities, so the surface is then processed by electrodeposition using a plating bath that can flow a high current, such as a nickel sulfamate bath. An electrodeposition layer 7 is formed thereon. As a result, an electroformed mold with a uniform surface is completed.
「効果」
この発明は上述のように母型の凹部内に三価の
金属酸化物に金属粉末を重量比にして5〜50%混
合したセラミツクセメントを充填するとともに、
このセラミツクセメントの表面に電着層を施すよ
うにしているので、導電性がよく、かつセラミツ
クセメントとこの表面に施されるメツキ層との熱
膨張をたがいに近づけることができ、したがつて
電鋳時間が著るしく短縮される。とくにこの発明
によるとその工程時間は従来の3分の1ないし2
分の1に短縮することができる。また従来のよう
に電鋳加工の後、別に機械加工を行う必要もない
ため、電鋳設備の回転性が良く、しかも電気代お
よびメツキ薬品の節約と相まつて電鋳加工能率が
大幅に向上する利点がある。"Effects" As described above, this invention fills the concave portion of the matrix with ceramic cement containing a mixture of trivalent metal oxide and metal powder at a weight ratio of 5 to 50%, and
Since an electrodeposited layer is applied to the surface of this ceramic cement, it has good conductivity, and the thermal expansion of the ceramic cement and the plating layer applied to the surface can be made close to each other. Casting time is significantly reduced. In particular, according to this invention, the process time is one-third to two times the conventional time.
It can be shortened to one-fold. In addition, unlike conventional methods, there is no need to perform separate machining after electroforming, so the rotatability of electroforming equipment is improved, and the efficiency of electroforming is greatly improved by saving electricity costs and plating chemicals. There are advantages.
第1図はこの発明における電鋳加工方法の一実
施例を示す正断面図、第2図および第3図は従来
の加工方法を示す正断面図である。
1……母型、2……凸部、3……凹部、4……
電着薄膜層、5……セラミツクセメント、6……
メツキ層。
FIG. 1 is a front sectional view showing an embodiment of the electroforming method according to the present invention, and FIGS. 2 and 3 are front sectional views showing a conventional processing method. 1... Mother mold, 2... Convex part, 3... Concave part, 4...
Electrodeposited thin film layer, 5... Ceramic cement, 6...
Metsuki layer.
Claims (1)
成し、この電着薄膜層の表面において、上記凹部
内に三価の金属酸化物に金属粉末を重量比にして
5〜50%混合したセラミツクセメントを充填し、
かつこのセラミツクセメントの表面を活性化し、
さらにこのセラミツクセメントの表面に電着層を
施すことを特徴とする電鋳型の製造方法。 2 凹凸部を有する母型の表面に電着薄膜層を形
成し、この電着薄膜層の表面において、上記凹部
内に三価の金属酸化物に金属粉末を重量比にして
5〜50%混合したセラミツクセメントからなる充
填剤を充填し、かつこの充填剤の表面に電着層を
施すことを特徴とする電鋳型。[Scope of Claims] 1. An electrodeposited thin film layer is formed on the surface of a matrix having uneven parts, and on the surface of the electrodeposited thin film layer, metal powder is added to trivalent metal oxide in a weight ratio of trivalent metal oxide to trivalent metal oxide in the recessed parts. Fill with ceramic cement mixed with 5 to 50%.
Activates the surface of Katsuko's ceramic cement,
A method for manufacturing an electroforming mold further comprising applying an electrodeposited layer to the surface of the ceramic cement. 2. An electrodeposited thin film layer is formed on the surface of the matrix having uneven parts, and on the surface of this electrodeposited thin film layer, 5 to 50% by weight of trivalent metal oxide and metal powder are mixed in the recessed parts. An electroforming mold characterized by being filled with a filler made of ceramic cement and having an electrodeposited layer on the surface of the filler.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3982785A JPS61199089A (en) | 1985-02-28 | 1985-02-28 | Electroforming die and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3982785A JPS61199089A (en) | 1985-02-28 | 1985-02-28 | Electroforming die and its manufacture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61199089A JPS61199089A (en) | 1986-09-03 |
| JPH0124870B2 true JPH0124870B2 (en) | 1989-05-15 |
Family
ID=12563805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3982785A Granted JPS61199089A (en) | 1985-02-28 | 1985-02-28 | Electroforming die and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61199089A (en) |
-
1985
- 1985-02-28 JP JP3982785A patent/JPS61199089A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61199089A (en) | 1986-09-03 |
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