JPH0147414B2 - - Google Patents
Info
- Publication number
- JPH0147414B2 JPH0147414B2 JP2954982A JP2954982A JPH0147414B2 JP H0147414 B2 JPH0147414 B2 JP H0147414B2 JP 2954982 A JP2954982 A JP 2954982A JP 2954982 A JP2954982 A JP 2954982A JP H0147414 B2 JPH0147414 B2 JP H0147414B2
- Authority
- JP
- Japan
- Prior art keywords
- glass plate
- film
- metal film
- liquid crystal
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 238000004140 cleaning Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims 1
- 239000004973 liquid crystal related substance Substances 0.000 description 12
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 10
- 229910052753 mercury Inorganic materials 0.000 description 10
- 239000000758 substrate Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Manufacturing Of Electric Cables (AREA)
Description
【発明の詳細な説明】
本発明は、In−Sn系金属の酸化膜が透明電極
としてガラス基板上に形成されてなる電極ガラス
板の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an electrode glass plate in which an oxide film of an In-Sn metal is formed as a transparent electrode on a glass substrate.
電極ガラス基板は、液晶、EL、プラズマ等を
利用した各種表示装置の如き電気光学機器に広く
利用されている。 Electrode glass substrates are widely used in electro-optical devices such as various display devices using liquid crystals, EL, plasma, etc.
例えば液晶表示装置は2枚のガラス基板を利用
して、これらガラス基板の間隙に液晶組成物を充
填して構成されている。液晶組成物を挾持してい
るガラス基板面には、液晶組成物に電界を印加す
るため電極が表示内容に対応した形状で形成され
ている。該電極は少なくとも表示を観察する側が
透明電極で形成され、通常はIn−Sn系金属の酸
化膜(以下ITO膜と称す)が用いられる。 For example, a liquid crystal display device is constructed by using two glass substrates and filling a gap between these glass substrates with a liquid crystal composition. Electrodes are formed on the surfaces of the glass substrates holding the liquid crystal composition in a shape corresponding to the display content in order to apply an electric field to the liquid crystal composition. The electrode is formed of a transparent electrode at least on the side on which the display is viewed, and usually an In--Sn metal oxide film (hereinafter referred to as ITO film) is used.
上記のようなITO膜はまずガラス板面にIn−
Sn系金属が蒸着され、この蒸着膜が焼成によつ
て酸化され透明導電膜にされる。 The ITO film shown above is first coated with In− on the glass plate surface.
Sn-based metal is deposited, and this deposited film is oxidized by firing to form a transparent conductive film.
ところで上記ITO膜を備えたガラス板を製造す
るにあたつて、ガラス板面は清浄な状態に保たれ
ていなければ、液晶組成物を挾持した場合に液晶
を変質させたり、表示に欠損部分が生じる等の不
都合を生じる惧れがある。従つて製造工程の適宜
の段階でガラス板の洗浄が実行される。ガラス基
板の洗浄は従来から高温加熱する方法が広く採用
されている。このような高温加熱は水分や油分を
除去するのに効果がある。しかし上記のようにIn
−Sn金属が蒸着されたガラス板を洗浄する場合、
高温加熱の雰囲気に晒すことによりIn−Sn金属
膜は酸化され、金属状態で黒色を呈していた膜は
酸化により透明膜に変化する。透明膜の状態は、
出来上つた液晶表示装置のガラス板としては何等
支障を生じるものではないが、金属膜を表示内容
に対応した形状にパターニングする際、黒色の金
属膜に比べて作業を著しく困難にするという欠点
があつた。 By the way, when manufacturing a glass plate with the above-mentioned ITO film, if the glass plate surface is not kept in a clean state, when the liquid crystal composition is held, the quality of the liquid crystal may change or defects may appear in the display. There is a risk of causing inconveniences such as Therefore, cleaning of the glass plate is performed at an appropriate stage of the manufacturing process. Conventionally, high-temperature heating has been widely used for cleaning glass substrates. Such high-temperature heating is effective in removing moisture and oil. But as mentioned above, In
−When cleaning a glass plate on which Sn metal is vapor-deposited,
The In-Sn metal film is oxidized by exposure to a high-temperature heating atmosphere, and the film, which was black in the metallic state, changes to a transparent film due to the oxidation. The state of the transparent membrane is
Although it does not cause any problems as a glass plate for the finished liquid crystal display device, it has the disadvantage that it makes the work much more difficult when patterning the metal film into a shape that corresponds to the display content, compared to a black metal film. It was hot.
本発明は上記従来のITO膜を備えたガラス板の
製造方法における欠点に鑑みてなされたもので、
洗浄によつて黒色のIn−Sn金属膜が透明化され
るのを抑制し、電極のパターニングの容易性を確
保した電極ガラス板の製造方法を提供することを
目的とするものである。 The present invention was made in view of the drawbacks in the above-mentioned conventional method for manufacturing a glass plate equipped with an ITO film.
The object of the present invention is to provide a method for manufacturing an electrode glass plate that suppresses the black In-Sn metal film from becoming transparent due to cleaning and ensures ease of electrode patterning.
即ち本発明はIn−Sn金属膜が蒸着されたガラ
ス板を紫外線光に晒して洗浄する。紫外線光はガ
ラス板表面に付着したゴミや水分等を除去する作
用がある。一方照射されたガラス板面の温度上昇
は約130℃程度に抑えることができ、洗浄中のIn
−Sn金属膜の焼成による透明化を防ぐことがで
きる。また洗浄に要する時間も水銀灯の下で約60
〜240秒程度の極めて短い紫外線照射で充分な効
果を得ることができる。 That is, in the present invention, a glass plate on which an In-Sn metal film is deposited is exposed to ultraviolet light to be cleaned. Ultraviolet light has the effect of removing dust, moisture, etc. adhering to the surface of the glass plate. On the other hand, the temperature rise on the irradiated glass plate surface can be suppressed to about 130°C, and the
- It is possible to prevent the Sn metal film from becoming transparent due to firing. Also, the time required for cleaning is approximately 60 minutes under a mercury lamp.
A sufficient effect can be obtained with extremely short ultraviolet irradiation of about 240 seconds.
第1図は、In−Sn金属膜が蒸着されたガラス
板1に紫外線光を照射するための装置を示し、コ
ンベア2で搬送されてくるガラス板1面を被う集
光型反射板3が設けられている。該集光型反射板
3で囲まれた空間内に高圧水銀灯4が紫外線光源
として設置されている。水銀灯4から放射された
紫外線は直接或いは反射板3に反射されてガラス
板1面に方向付けられ、In−Sn金属膜を備えた
ガラス板1面を速やかに洗浄する。ライン状に集
光された紫外線4により第3図に示す如く、コン
ベア2で運ばれるガラス板1が一端から他端に向
つて洗浄される。 FIG. 1 shows an apparatus for irradiating ultraviolet light onto a glass plate 1 on which an In-Sn metal film has been deposited. It is provided. A high-pressure mercury lamp 4 is installed as an ultraviolet light source in a space surrounded by the condensing reflector 3. The ultraviolet rays emitted from the mercury lamp 4 are directed toward the glass plate 1 either directly or reflected by the reflection plate 3, and quickly clean the glass plate 1 provided with the In-Sn metal film. As shown in FIG. 3, the glass plate 1 carried by the conveyor 2 is cleaned by the ultraviolet rays 4 condensed in a line from one end to the other.
第4図は本実施例に用いられる水銀灯4として
採用したEye graphics社の水銀ランプ(HO151
−L312)の波長スペクトルである。水銀ランプ
の光源強度は15Wである。また第5図は紫外線照
射時間とガラス板面の液晶分子接触角度との相関
関係を示すグラフである。照射時間を長くすると
液晶分子接触角度が漸次小さくなる。これはガラ
ス板面の活性度が小さくなることを意味してい
る。 Figure 4 shows a mercury lamp (HO151) manufactured by Eye graphics, which was adopted as the mercury lamp 4 used in this example.
-L312) wavelength spectrum. The light source intensity of the mercury lamp is 15W. FIG. 5 is a graph showing the correlation between the ultraviolet irradiation time and the contact angle of liquid crystal molecules on the glass plate surface. As the irradiation time increases, the contact angle of liquid crystal molecules gradually decreases. This means that the activity of the glass plate surface becomes smaller.
紫外線がゴミの付着されたガラス板面に照射さ
れると、紫外線の照射エネルギーがゴミを構成す
る有機化合物の分子間結合エネルギーよりも大き
い場合には有機化合物が分解され、空気中の酸素
のオゾン化の後ラジカルな酸素への分解が引き起
こされて励起状態の有機物質との反応により分子
形成がなされ、ガラス板表面より除去される。ま
たガラス板面に付着される水分は紫外線照射によ
り蒸発除去される。以上により紫外線照射を利用
したガラス板表面の洗浄が行なわれる。これは紫
外線洗浄効果として知られている。 When ultraviolet rays are irradiated onto a glass plate surface with dust attached, if the irradiation energy of the ultraviolet rays is greater than the intermolecular bonding energy of the organic compounds that make up the dust, the organic compounds are decomposed and the oxygen in the air becomes ozone. After the chemical reaction, decomposition into radical oxygen is caused, and molecules are formed by reaction with organic substances in an excited state, which are then removed from the glass plate surface. Further, moisture adhering to the glass plate surface is evaporated and removed by ultraviolet irradiation. As described above, the surface of the glass plate is cleaned using ultraviolet irradiation. This is known as the ultraviolet cleaning effect.
上記洗浄処理中、点灯した水銀灯4は同時に発
熱するためこれを冷却することと、放射された紫
外線によつてオゾンを発生するためこれを除去す
ることを兼ねて、反射板3で囲まれた空間を外部
に通じさせるための排気孔5が設けられ、次に説
明する第2図a,bに示す如く排気フアン6が取
付けられている。 During the cleaning process, the lit mercury lamp 4 generates heat at the same time, so the space surrounded by the reflector plate 3 is used to cool the mercury lamp 4 and to remove ozone, which is generated by the emitted ultraviolet rays. An exhaust hole 5 is provided to communicate the air to the outside, and an exhaust fan 6 is attached as shown in FIGS. 2a and 2b, which will be described next.
第2図a,bは上記紫外線照射部を備えた洗浄
装置の全体の概観を示す側面図及び正面図で、外
側カバー7内に上記第1図に示した紫外線照射部
が収納されている。 FIGS. 2a and 2b are a side view and a front view showing the overall appearance of the cleaning device equipped with the ultraviolet irradiation section, in which the ultraviolet irradiation section shown in FIG. 1 is housed within the outer cover 7.
紫外線照射によつて洗浄されたガラス板は、高
温に晒されていないためIn−Sn膜は金属膜のま
まに保存されており、従つて黒色を呈している。
次に従来公知のエツチング工程によりIn−Sn金
属膜は電極パターンに対応する形状にパターニン
グされ、パターンエツチング後高温に焼成されて
金属層が酸化され、ITOの透明導電膜となる。上
記ITO膜を備えたガラス板は液晶表示装置だけで
なく、EDC等の電極基板としても利用すること
ができる。 Since the glass plate cleaned by ultraviolet irradiation is not exposed to high temperatures, the In-Sn film is preserved as a metal film, and therefore has a black color.
Next, the In--Sn metal film is patterned into a shape corresponding to the electrode pattern by a conventionally known etching process, and after pattern etching, it is fired at a high temperature to oxidize the metal layer and become an ITO transparent conductive film. The glass plate provided with the above-mentioned ITO film can be used not only for liquid crystal display devices but also as an electrode substrate for EDCs and the like.
以上詳説した如く本発明は、In−Sn金属膜が
形成されたガラス板の表面洗浄を紫外線光によつ
て行うことにより、低い温度で洗浄することを可
能とし、In−Sn金属膜を金属膜の状態で維持さ
せることができる。また金属膜が黒色であるため
観察が容易になりその後に行われる電極パターニ
ングの作業が著しく容易になる。 As explained in detail above, the present invention makes it possible to clean the surface of a glass plate on which an In-Sn metal film is formed using ultraviolet light, thereby making it possible to clean the surface at a low temperature. can be maintained in this state. Furthermore, since the metal film is black, it is easy to observe and the subsequent electrode patterning work is significantly facilitated.
第1図は本発明を実施するための洗浄装置の要
部拡大図、第2図a,bは同洗浄装置の側面図及
び平面図、第3図は紫外線照射状態を示す図、第
4図は水銀ランプのスペクトル図、第5図は紫外
線照射時間とガラス板面での液晶分子接触角度と
の相関関係を示すグラフである。
1:ガラス板、4:水銀灯。
Fig. 1 is an enlarged view of the main parts of a cleaning device for carrying out the present invention, Figs. 2a and b are a side view and a plan view of the same cleaning device, Fig. 3 is a view showing the ultraviolet irradiation state, and Fig. 4 is a spectrum diagram of a mercury lamp, and FIG. 5 is a graph showing the correlation between the ultraviolet irradiation time and the contact angle of liquid crystal molecules on the glass plate surface. 1: Glass plate, 4: Mercury lamp.
Claims (1)
紫外線光に晒して前記ガラス板面の有機質付着物
を分解し、表面を洗浄することを特徴とする電極
ガラス板の製造方法。1 After depositing an In-Sn metal film on the glass plate surface,
A method for producing an electrode glass plate, which comprises exposing the glass plate to ultraviolet light to decompose organic deposits on the surface of the glass plate and cleaning the surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2954982A JPS58145643A (en) | 1982-02-24 | 1982-02-24 | Cleaning of indium-tin glass plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2954982A JPS58145643A (en) | 1982-02-24 | 1982-02-24 | Cleaning of indium-tin glass plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58145643A JPS58145643A (en) | 1983-08-30 |
| JPH0147414B2 true JPH0147414B2 (en) | 1989-10-13 |
Family
ID=12279213
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2954982A Granted JPS58145643A (en) | 1982-02-24 | 1982-02-24 | Cleaning of indium-tin glass plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58145643A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6361224A (en) * | 1986-09-01 | 1988-03-17 | Minolta Camera Co Ltd | Color correction coating method for near parabolic optical transmission body array |
| JPH0767058B2 (en) * | 1987-03-26 | 1995-07-19 | 旭硝子株式会社 | Surface treatment method for glass medium for ultrasonic delay element |
| JP4663501B2 (en) * | 2005-12-06 | 2011-04-06 | 株式会社フジクラ | Manufacturing method of quartz glass base material |
-
1982
- 1982-02-24 JP JP2954982A patent/JPS58145643A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58145643A (en) | 1983-08-30 |
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