JPH0149414B2 - - Google Patents
Info
- Publication number
- JPH0149414B2 JPH0149414B2 JP13303985A JP13303985A JPH0149414B2 JP H0149414 B2 JPH0149414 B2 JP H0149414B2 JP 13303985 A JP13303985 A JP 13303985A JP 13303985 A JP13303985 A JP 13303985A JP H0149414 B2 JPH0149414 B2 JP H0149414B2
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- represented
- polyamide resin
- formula
- dicarboxylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920006122 polyamide resin Polymers 0.000 claims description 25
- 150000004985 diamines Chemical class 0.000 claims description 23
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 20
- -1 1-phenoxy-2,4-phenylene Chemical group 0.000 claims description 17
- 239000003960 organic solvent Substances 0.000 claims description 15
- 125000000732 arylene group Chemical group 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 4
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 claims description 4
- 150000003222 pyridines Chemical class 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 20
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 18
- 229920000642 polymer Polymers 0.000 description 17
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 14
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 14
- 230000009477 glass transition Effects 0.000 description 13
- ABQAWYPFZVJRGM-UHFFFAOYSA-N 4-phenoxybenzene-1,3-diamine Chemical compound NC1=CC(N)=CC=C1OC1=CC=CC=C1 ABQAWYPFZVJRGM-UHFFFAOYSA-N 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 10
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 9
- 239000012299 nitrogen atmosphere Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 238000002411 thermogravimetry Methods 0.000 description 7
- 230000000930 thermomechanical effect Effects 0.000 description 7
- 230000004580 weight loss Effects 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000004760 aramid Substances 0.000 description 5
- 229920003235 aromatic polyamide Polymers 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 2
- HWWYDZCSSYKIAD-UHFFFAOYSA-N 3,5-dimethylpyridine Chemical compound CC1=CN=CC(C)=C1 HWWYDZCSSYKIAD-UHFFFAOYSA-N 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VYZAHLCBVHPDDF-UHFFFAOYSA-N Dinitrochlorobenzene Chemical compound [O-][N+](=O)C1=CC=C(Cl)C([N+]([O-])=O)=C1 VYZAHLCBVHPDDF-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000000370 acceptor Substances 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- RBHJBMIOOPYDBQ-UHFFFAOYSA-N carbon dioxide;propan-2-one Chemical compound O=C=O.CC(C)=O RBHJBMIOOPYDBQ-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- ABMFBCRYHDZLRD-UHFFFAOYSA-N naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1 ABMFBCRYHDZLRD-UHFFFAOYSA-N 0.000 description 2
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- XWKFPIODWVPXLX-UHFFFAOYSA-N 2-methyl-5-methylpyridine Natural products CC1=CC=C(C)N=C1 XWKFPIODWVPXLX-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- UHNUHZHQLCGZDA-UHFFFAOYSA-N 4-[2-(4-aminophenyl)ethyl]aniline Chemical compound C1=CC(N)=CC=C1CCC1=CC=C(N)C=C1 UHNUHZHQLCGZDA-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- 229940044174 4-phenylenediamine Drugs 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- CCNJNUGDZQIZBL-UHFFFAOYSA-N bis(2-methylphenyl) hydrogen phosphite Chemical compound CC1=CC=CC=C1OP(O)OC1=CC=CC=C1C CCNJNUGDZQIZBL-UHFFFAOYSA-N 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- VZOSMKZCDPKGHW-UHFFFAOYSA-N bis(3-methylphenyl) hydrogen phosphite Chemical compound CC1=CC=CC(OP(O)OC=2C=C(C)C=CC=2)=C1 VZOSMKZCDPKGHW-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- YLHOTPVVEQAELM-UHFFFAOYSA-N bis(4-methylphenyl) hydrogen phosphite Chemical compound C1=CC(C)=CC=C1OP(O)OC1=CC=C(C)C=C1 YLHOTPVVEQAELM-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- KUMNEOGIHFCNQW-UHFFFAOYSA-N diphenyl phosphite Chemical compound C=1C=CC=CC=1OP([O-])OC1=CC=CC=C1 KUMNEOGIHFCNQW-UHFFFAOYSA-N 0.000 description 1
- GRWZHXKQBITJKP-UHFFFAOYSA-L dithionite(2-) Chemical compound [O-]S(=O)S([O-])=O GRWZHXKQBITJKP-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- OKBVMLGZPNDWJK-UHFFFAOYSA-N naphthalene-1,4-diamine Chemical compound C1=CC=C2C(N)=CC=C(N)C2=C1 OKBVMLGZPNDWJK-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- BKHZQJRTFNFCTG-UHFFFAOYSA-N tris(2-methylphenyl) phosphite Chemical compound CC1=CC=CC=C1OP(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C BKHZQJRTFNFCTG-UHFFFAOYSA-N 0.000 description 1
- AZLGDNBTDKZORI-UHFFFAOYSA-N tris(3-methylphenyl) phosphite Chemical compound CC1=CC=CC(OP(OC=2C=C(C)C=CC=2)OC=2C=C(C)C=CC=2)=C1 AZLGDNBTDKZORI-UHFFFAOYSA-N 0.000 description 1
- FEVFLQDDNUQKRY-UHFFFAOYSA-N tris(4-methylphenyl) phosphite Chemical compound C1=CC(C)=CC=C1OP(OC=1C=CC(C)=CC=1)OC1=CC=C(C)C=C1 FEVFLQDDNUQKRY-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polyamides (AREA)
Description
(産業上の利用分野)
本発明はポリアミド樹脂、特に各種有機溶媒に
可溶で、なおかつ高いガラス転移温度を有する新
規ポリアミド樹脂及びその製造方法に関する。
(従来の技術)
従来、全芳香族ポリアミド樹脂は、高ガラス転
移点、高分解点を有する材料として期待されてい
る。しかし、従来製造された多くの芳香族ポリア
ミドは、有機溶媒に不溶であり、又300℃以上の
ガラス転移点を有しているため、その成型性には
なお問題があつた。
(発明が解決しようとする問題点)
上記のように、従来の全芳香族ポリアミド樹脂
においては、高い熱安定性を有しているにもかか
わらず、成形性が悪く、耐熱性を加工性とを共に
具備する全芳香族ポリアミド樹脂がないことが、
この樹脂の商業的利用の上で大きな問題点であつ
た。
したがつて、本発明は有機溶媒に可溶で、なお
かつ高いガラス転移点を有し、同時に高い分解点
を有する、加工性に優れた新規ポリアミド樹脂及
びその製造方法を提供する問題を解決しようとす
る。
(問題点を解決するための手段)
本発明者らは、有機溶媒に可溶で、ないかつ高
いガラス転移点を有し、同時に高い分解点を有す
る、加工性に優れた新規ポリアミド樹脂を製造す
るべく鋭意努力し、本発明を完成した。
本発明の第1の発明は、一般式
(式中、Rは少なくとも1種のアリーレン基、
Arは少なくとも20モル%が1―フエノキシ―2,
4―フエニレン基よりなるアリーレン基、nは10
〜200の整数を示す)
で表わされるポリアミド樹脂である。
本発明の第2の発明は、一般式
H2N―Ar―NH2 ()
(式中、Arは少なくとも20モル%が1―フエ
ノキシ―2,4―フエニレン基よりなるアリーレ
ン基を示す)
で表わされるジアミンの少なくとも1種と、一般
式
(式中、Rはアリーレン基を、またXはハロゲ
ン原子を示す)
で表わされるジカルボン酸ジハライドの少なくと
も1種とを有機溶媒中で反応させることによりな
る前記一般式()で表わされるポリアミド樹脂
の製造方法である。
本発明の第3の発明は、一般式
H2N―Ar―NH2 ()
(式中、Arは少なくとも20モル%が1―フエ
ノキシ―2,4―フエニレン基よりなるアリーレ
ン基を示す)
で表わされるジアミンの少なくとも1種と、一般
式
(式中、Rはアリーレン基を示す)
で表わされるジカルボン酸の少なくとも1種とを
芳香族亜リン酸エステルとピリジン誘導体の存在
下、有機溶媒中で反応させることよりなる前記一
般式()で表わされるポリアミド樹脂の製造方
法である。
上記一般式で表わされるポリアミド樹脂は上
記一般式で表わされるジアミンを上記一般式
で表わされるジカルボン酸ジハライド、又は上記
一般式で表わされるジカルボン酸と反応させて
製造するが、ジアミンとしてはArが置換フエニ
レン基、すなわち1―フエノキシ―2,4―フエ
ニレン基からなるジアミンを単独で使用すること
もできるし、あるいは、上記と異なる少なくとも
1種のアリーレンジアミンをジアミン全量の高々
80モル%まで混合して使用することもできる。ジ
アミンを混合して使用する場合、Arが1―フエ
ノキシ―2,4―フエニレン基からなるジアミン
が、全ジアミンの20モル%未満となると本発明の
特徴である、有機溶媒への可溶性及び熱成形性を
じゆうぶん満足しなくなる。上記一般式で表わ
されるジアミンとしてArが1―フエノキシ―2,
4―フエニレン基からなるジアミンを単独で使用
し、上記一般式で表わされるジカルボン酸ジハ
ライド、又は上記一般式で表わされるジカルボ
ン酸の1種または2種以上を混合して使用するこ
ともできる。
上記一般式で表わされるジアミンのうち、
Arが1―フエノキシ―2,4―フエニレン基か
らなるジアミンとは、下記式の構造を有する、
1―フエノキシ―2,4―フエニレン基からなる
ジアミンである。
このジアミンは、工業的に安価に入手できる
2,4―ジニトロクロロベンゼンとフエノールを
原料にして製造しうる2,4―ジニトロジフエニ
ルエーテルを、従来公知の各種還元法により還元
することにより得られる。
上記一般式で表わされるジアミンのうち、1
―フエノキシ―2,4―フエニレンジアミン以外
のアリーレンジアミンとしては、たとえばメタフ
エニレンジアミン、パラフエニレンジアミン、
4,4′―ジアミノビフエニル、3,3′―メチレン
ジアニリン、4,4′―メチレンジアニリン、4,
4′―エチレンジアニリン、4,4′―イソプロピリ
デンジアニリン、3,4′―オキシジアニリン、
4,4′―オキシジアニリン、4,4′―チオジアニ
リン、3,3′―カルボニルジアニリン、4,4′―
カルボニルジアニリン、3,3′―スルホニルジア
ニリン、4,4′―スルホニルジアニリン、1,4
―ナフタレンジアミン、1,5―ナフタレンジア
ミン、2,6―ナフタレンジアミン等をあげるこ
とができる。
上記一般式で表わされるRが二価の芳香族基
からなるジカルボン酸ジハライドとしては、次の
ようなジカルボン酸のジクロリド、ジフルオリド
及びジブロミドを例示することができる。すなわ
ち、テレフタル酸、イソフタル酸、1,4―ナフ
タレンジカルボン酸、1,5―ナフタレンジカル
ボン酸、2,6―ナフタレンジカルボン酸、4,
4′―ジフエニルエーテルジカルボン酸、3,3′―
ジフエニルエーテルジカルボン酸、4,4′―ジフ
エニルメタンジカルボン酸、3,3′―ジフエニル
メタンジカルボン酸、4,4′―ジフエニルスルホ
ンジカルボン酸、3,3′―ジフエニルスルホンジ
カルボン酸などのジクロリド、ジフルオリド及び
ジブロミドを例示することができる。
上記一般式で表わされるアリーレンジカルボ
ン酸としては、テレフタル酸、イソフタル酸、
1,4―ナフタレンジカルボン酸、1,5―ナフ
タレンジカルボン酸、2,6―ナフタレンジカル
ボン酸、4,4′―ジフエニルエーテルジカルボン
酸、3,3′―ジフエニルエーテルジカルボン酸、
4,4′―ジフエニルメタンジカルボン酸、3,
3′―ジフエニルメタンジカルボン酸、4,4′ジフ
エニルスルホンジカルボン酸、3,3′―ジフエニ
ルスルホンジカルボン酸などを例示することがで
きる。
上記一般式で表わされるポリアミド樹脂の製
造は、有機溶媒中、上記一般式で表わされるジ
アミンと上記一般式で表わされるジカルボン酸
ジハライドとを、−20〜200℃の温度で数分間から
数日間反応させることにより行われるものであ
る。この方法において、一般式で表わされるポ
リアミド樹脂の分子量は上記一般式で表わされ
るジアミンと上記一般式で表わされるジカルボ
ン酸ジハライドの仕込量によつて制限され、これ
らの反応成分を等モル量使用すると高分子量の上
記一般式で表わされるポリアミド樹脂を製造す
ることができる。上記一般式で表わされるポリ
アミド樹脂においてnを10〜200の整数に限定し
た理由はnが10より小ではフイルム等に成型した
成型品の機械特性や耐熱性等の特性がじゆうぶん
でなく、nが200を越えると有機溶媒等への溶解
性が悪くなるからである。
この方法に使用しうる有機溶媒としては、N,
N―ジメチルアセトアミド、N―メチル―2―ピ
ロリドン等のアミド系溶媒、ベンゼン、アニソー
ル、ジフエニルエーテル、ニトロベンゼン、ベン
ゾニトリルのような芳香族系溶媒、及びクロロホ
ルム、ジクロロメタン、1,2―ジクロロエタ
ン、1,1,2,2―テトラクロロエタンのよう
なハロゲン系溶媒などの有機溶媒を例示すること
ができる。このような有機溶媒と共にピリジン、
トリエチルアミンなどの酸受容体を共存させた
り、水と互いに混合しない溶媒の場合にアルカリ
水溶液との二相系を用いたりして反応を行うと効
果的である。特にN,N―ジメチルアセトアミド
又はN―メチル―2―ピロリドン等のアミド系溶
媒を使用すると、これらの溶媒自身が酸受容体と
なり高重合体のポリアミド樹脂を得ることができ
る。
別に、上記一般式によつて表わされるポリア
ミド樹脂の製造は、上記一般式で表わされるジ
アミンと、上記一般式で表わされるジカルボン
酸とを、芳香族亜リン酸エステルとピリジン誘導
体の存在下に、20〜200℃の温度で数分間から数
日間反応させることにより行うことができる。こ
の方法において、一般式で表わされるポリアミ
ド樹脂の分子量は上記一般式で表わされるジア
ミンと上記一般式で表わされるジカルボン酸の
仕込量によつて制限され、これらの反応成分を等
モル量使用すると高分子量の上記一般式で表わ
されるポリアミド樹脂を製造することができる。
本発明において使用する芳香族亜リン酸エステ
ルとしては、亜リン酸トリフエニル、亜リン酸ジ
フエニル、亜リン酸トリ―o―トリル、亜リン酸
ジ―o―トリル、亜リン酸トリ―m―トリル、亜
リン酸ジ―m―トリル、亜リン酸トリ―p―トリ
ル、亜リン酸ジ―p―トリル、亜リン酸トリ―o
―クロロフエニル、亜リン酸ジ―o―クロロフエ
ニル、亜リン酸トリ―p―クロロフエニル、亜リ
ン酸ジ―p―クロロフエニル等をあげることがで
きる。
本発明において使用するピリジン誘導体として
は、ピリジン、2―ピコリン、3―ピコリン、4
―ピコリン、2,4―ルチジン、2,6―ルチジ
ン、3,5―ルチジン等をあげることができる。
この方法に使用しうる有機溶媒として代表的な
ものは、N―メチルピロリドンやN,N―ジメチ
ルアセトアミド等のアミド系溶媒である。ここで
重合度の大きいポリアミド樹脂を得るために、塩
化リチウムや塩化カルシウムなどの無機塩類や、
トリエチルアミン塩酸塩、テトラブチルアンモニ
ウムクロリド、セチルトリメチルアンモニウムク
ロリドなどの有機塩類をこの反応系に添加するこ
ともできる。
かくして製造された上記一般式で表わされる
ポリアミド樹脂は、使用した上記一般式で表わ
されるジアミンと使用した上記一般式で表わさ
れるジカルボン酸ジハライド、又は上記一般式
で表わされるジカルボン酸の種類により特にその
溶解性が変化するが、クロロホルム、テトラクロ
ロエタン、N,N―ジメチルホルムアミド、N,
N―ジメチルアセトアミド、ジメチルスルホキシ
ド、クレゾール、クロロベンゼン、o―クロロフ
エノール及びピリジン等の溶媒のすべてに又は一
部に可溶となる。上記一般式で表わされるポリ
アミド樹脂は400℃付近まで加熱しても顕著な重
量変化は認められない。
(実施例)
以下、本発明を参考例及び、実施例により更に
詳細に説明する。
参考例 1
エタノール200mlに、KOH30.24g(0.54mol)、
フエノール56.5g(0.6mol)を溶解し、2,4―
ジニトロクロロベンゼン121.2g(0.6mol)を加
えて、75℃で8時間かくはんした。反応後、熱時
にろ過し、エタノールを減圧留去して生成物を得
た。得られた2,4―ジニトロジフエニルエーテ
ルの純品は、エタノールから再結晶することによ
り得た。収量108.6g(70%)。融点70〜71℃(文
献値69〜70℃)。
参考例 2
エタノール100mlに2,4―ジニトロジフエニ
ルエーテル10.4g(0.04mol)を溶解し、10%パ
ラジウム活性炭1.3gを触媒として、水素添加法
により還元反応を行つた。反応後、パラジウム活
性炭をろ過し、ろ液に濃塩酸20mlを加え、溶媒を
減圧留去した。得られた2,4―ジアミノジフエ
ニルエーテル塩酸塩は、ベンゼン―エタノール系
で再結晶した。収量7.53g(69%)。
次に、2,4―ジアミノジフエニルエーテル塩
酸塩7.08g(0.03mol)を、ハイドロサルフアイ
トを含む水100mlに溶解し、水酸化ナトリウム2.8
g(0.07mol)と水25mlから調製したアルカリ水
溶液を滴下した。析出した2,4―ジアミノジフ
エニルエーテルをろ過、乾燥後、ベンゼンで再結
晶した。収量12.47g(42%)。融点65〜67℃(文
献値67℃)。
実施例 1
イソフタル酸0.83g(5mmol)、2,4―ジア
ミノジフエニルエーテル1.00g(5mmol)、亜リ
ン酸トリフエニル3.10g(10mmol)、ピリジン
2.5ml、塩化リチウム1.00gおよびN―メチル―
2―ピロリドン10mlを、窒素雰囲気下、100℃で
3時間かくはんした。反応後、重合溶液をメタノ
ールに投入したポリマーを得た。収量1.65g
(100%)。固有粘度0.63(硫酸中0.5g/dLの濃度、
30℃で測定)。
熱重量測定法による10%重量減少温度、435℃
熱機械測定法によるガラス転移温度、220℃
生成したポリマーの溶解性は表1に示す。
実施例 2
2,4―ジアミノジフエニルエーテル1.00g
(5mmol)を10mlのN,N―ジメチルアセトアミ
ドに溶解し、ドライアイス―アセトン浴上で完全
に凍結した。生成した固体にイソフタル酸クロリ
ド1.02g(5mmol)を加え、0℃、窒素雰囲気下
3時間かくはんした。反応後、重合溶液をメタノ
ールに投入したポリマーを得た。収量1.59g(96
%)。固有粘度0.30(硫酸中0.5g/dLの濃度、30
℃で測定)。
実施例 3
テレフタル酸0.83g(5mmol)、2,4―ジア
ミノジフエニルエーテル1.00g(5mmol)、亜リ
ン酸トリフエニル3.10g(10mmol)、ピリジン
2.5ml、塩化リチウム1.00gおよびN―メチル―
2―ピロリドン10mlを、窒素雰囲気下、100℃で
3時間かくはんした。反応後、重合溶液をメタノ
ールに投入しポリマーを得た。収量1.65g(100
%)。固有粘度0.84(硫酸中0.5g/dLの濃度、30
℃で測定)。
熱重量測定法による10%重量減少温度、400℃
熱機械測定法によるガラス転移温度、265℃
生成したポリマーの溶解性は表1に示す。
実施例 4
2,4―ジアミノジフエニルエーテル1.00g
(5mmol)を10mlのN,N―ジメチルアセトアミ
ドに溶解し、ドライアイス―アセトン浴上で完全
に凍結した。生成した固体にテレフタル酸クロリ
ド1.02g(5mmol)を加え、0℃、窒素雰囲気下
3時間かくはんした。反応後、重合溶液をメタノ
ールに投入しポリマーを得た。収量1.65g(100
%)。固有粘度0.74(硫酸中0.5g/dLの濃度、30
℃で測定)。
実施例 5
2,6―ナフタレンジカルボン酸1.08g
(5mmol)、2,4―ジアミノジフエニルエーテ
ル1.00g(5mmol)、亜リン酸トリフエニル3.10
g(10mmol)、ピリジン2.5ml、塩化リチウム
1.00gおよびN―メチル―2―ピロリドン10ml
を、窒素雰囲気下、100℃で3時間かくはんした。
反応後、重合溶液をメタノールに投入しポリマー
を得た。収量1.90g(97%)。固有粘度0.99(硫酸
中0.5g/dLの濃度、30℃で測定)。
熱重量測定法による10%重量減少温度、414℃
熱機械測定法によるガラス転移温度、251℃
生成したポリマーの溶解性は表1に示す。
実施例 6
テレフタル酸0.83g(5mmol)、2,4―ジア
ミノジフエニルエーテル0.40g(2mmol)、4,
4′―オキシジアニリン0.60g(3mmol)、亜リン
酸トリフエニル3.10g(10mmol)、ピリジン2.5
ml、塩化リチウム1.00gおよびN―メチル―2―
ピロリドン10mlを、窒素雰囲気下、100℃で3時
間かくはんした。反応後、重合溶液をメタノール
に投入しポリマーを得た。収量1.61g(97%)。
固有粘度1.17(硫酸中0.5g/dLの濃度、30℃で測
定)。
熱重量測定法による10%重量減少温度、425℃
熱機械測定法によるガラス転移温度、255℃
生成したポリマーの溶解性は表1に示す。
実施例 7
テレフタル酸0.83g(5mmol)、2,4―ジア
ミノジフエニルエーテル0.60g(3mmol)、4,
4′―オキシジアニリン0.40g(2mmol)、亜リン
酸トリフエニル3.10g(10mmol)、ピリジン2.5
ml、塩化リチウム1.00gおよびN―メチル―2―
ピロリドン10mlを、窒素雰囲気下、100℃で3時
間かくはんした。反応後、重合溶液をメタノール
に投入しポリマーを得た。収量1.65g(100%)。
固有粘度1.13(硫酸中0.5g/dLの濃度、30℃で測
定)。
熱重量測定法による10%重量減少温度、410℃
熱機械測定法によるガラス転移温度、255℃
生成したポリマーの溶解性は表1に示す。
実施例 8
テレフタル酸0.83g(5mmol)、2,4―ジア
ミノジフエニルエーテル0.80g(4mmol)、4,
4′―オキシジアニリン0.20g(1mmol)、亜リン
酸トリフエニル3.10g(10mmol)、ピリジン2.5
ml、塩化リチウム1.00gおよびN―メチル―2―
ピロリドン10mlを、窒素雰囲気下、100℃で3時
間かくはんした。反応後、重合溶液をメタノール
に投入しポリマーを得た。収量1.61g(98%)。
固有粘度0.96(硫酸中0.5g/dLの濃度、30℃で測
定)。
熱重量測定法による10%重量減少温度、400℃
熱機械測定法によるガラス転移温度、250℃
生成したポリマーの溶解性は表1に示す。
実施例 9
テレフタル酸0.415g(2.5mmol)、イソフタル
酸0.415g(2.5mmol)、2,4―ジアミノジフエ
ニルエーテル1.00g(5mmol)、亜リン酸トリフ
エニル3.10g(10mmol)、ピリジン2.5ml、塩化
リチウム1.00gおよびN―メチル―2―ピロリド
ン10mlを、窒素雰囲気下、100℃で3時間かくは
んした。反応後、重合溶液をメタノールに投入し
ポリマーを得た。収量1.65g(100%)。固有粘度
0.66(硫酸中0.5g/dLの濃度、30℃で測定)。
熱重量測定法による10%重量減少温度、430℃
熱機械測定法によるガラス転移温度、230℃
生成したポリマーの溶解性は表1に示す。
(Field of Industrial Application) The present invention relates to a polyamide resin, particularly a novel polyamide resin that is soluble in various organic solvents and has a high glass transition temperature, and a method for producing the same. (Prior Art) In the past, wholly aromatic polyamide resins have been expected to be materials with high glass transition points and high decomposition points. However, many conventionally produced aromatic polyamides are insoluble in organic solvents and have a glass transition point of 300° C. or higher, so there are still problems with their moldability. (Problems to be solved by the invention) As mentioned above, although conventional wholly aromatic polyamide resins have high thermal stability, they have poor moldability, and heat resistance The fact that there is no wholly aromatic polyamide resin that also has
This was a major problem in the commercial use of this resin. Therefore, the present invention aims to solve the problem of providing a new polyamide resin that is soluble in organic solvents, has a high glass transition point, and at the same time has a high decomposition point, and has excellent processability, and a method for producing the same. do. (Means for Solving the Problems) The present inventors have produced a new polyamide resin that is soluble in organic solvents, has a high glass transition point, and has a high decomposition point, and has excellent processability. We have worked diligently to accomplish this invention. The first invention of the present invention is based on the general formula (wherein R is at least one arylene group,
Ar contains at least 20 mol% of 1-phenoxy-2,
Arylene group consisting of 4-phenylene group, n is 10
(indicates an integer between 200 and 200). The second invention of the present invention has the general formula H 2 N—Ar—NH 2 () (in the formula, Ar represents an arylene group in which at least 20 mol% is a 1-phenoxy-2,4-phenylene group). At least one diamine represented by the general formula (In the formula, R represents an arylene group and X represents a halogen atom.) A polyamide resin represented by the general formula () obtained by reacting in an organic solvent with at least one dicarboxylic acid dihalide represented by This is the manufacturing method. The third invention of the present invention has the general formula H 2 N—Ar—NH 2 () (in the formula, Ar represents an arylene group in which at least 20 mol% is a 1-phenoxy-2,4-phenylene group). At least one diamine represented by the general formula (wherein, R represents an arylene group) is reacted with at least one dicarboxylic acid represented by the above general formula () in the presence of an aromatic phosphite and a pyridine derivative in an organic solvent. This is a method for manufacturing the polyamide resin. The polyamide resin represented by the above general formula is produced by reacting the diamine represented by the above general formula with the dicarboxylic acid dihalide represented by the above general formula, or the dicarboxylic acid represented by the above general formula, but the diamine is substituted with Ar. A diamine consisting of a phenylene group, that is, a 1-phenoxy-2,4-phenylene group, can be used alone, or at least one arylene diamine different from the above may be used at most of the total amount of diamine.
They can also be used in a mixture of up to 80 mol%. When using a mixture of diamines, if the diamine whose Ar is a 1-phenoxy-2,4-phenylene group is less than 20 mol% of the total diamines, the solubility in organic solvents and thermoformability, which are the characteristics of the present invention, will be reduced. I'm no longer fully satisfied with sex. As the diamine represented by the above general formula, Ar is 1-phenoxy-2,
A diamine consisting of a 4-phenylene group may be used alone, and one or more dicarboxylic acid dihalides represented by the above general formula or dicarboxylic acids represented by the above general formula may be used in combination. Among the diamines represented by the above general formula,
A diamine in which Ar is a 1-phenoxy-2,4-phenylene group has the structure of the following formula:
It is a diamine consisting of a 1-phenoxy-2,4-phenylene group. This diamine can be obtained by reducing 2,4-dinitrodiphenyl ether, which can be produced from 2,4-dinitrochlorobenzene and phenol, which are industrially available at low cost, using various conventional reduction methods. Among the diamines represented by the above general formula, 1
Examples of arylene diamines other than phenoxy-2,4-phenylene diamine include metaphenylene diamine, paraphenylene diamine,
4,4'-diaminobiphenyl, 3,3'-methylene dianiline, 4,4'-methylene dianiline, 4,
4'-ethylene dianiline, 4,4'-isopropylidene dianiline, 3,4'-oxydianiline,
4,4'-oxydianiline, 4,4'-thiodianiline, 3,3'-carbonyldianiline, 4,4'-
Carbonyl dianiline, 3,3'-sulfonyl dianiline, 4,4'-sulfonyl dianiline, 1,4
-naphthalenediamine, 1,5-naphthalenediamine, 2,6-naphthalenediamine, etc. Examples of the dicarboxylic acid dihalide represented by the above general formula in which R is a divalent aromatic group include dichloride, difluoride, and dibromide of the following dicarboxylic acids. That is, terephthalic acid, isophthalic acid, 1,4-naphthalene dicarboxylic acid, 1,5-naphthalene dicarboxylic acid, 2,6-naphthalene dicarboxylic acid, 4,
4′-diphenyl ether dicarboxylic acid, 3,3′-
Diphenyl ether dicarboxylic acid, 4,4'-diphenylmethane dicarboxylic acid, 3,3'-diphenylmethane dicarboxylic acid, 4,4'-diphenylsulfone dicarboxylic acid, 3,3'-diphenylsulfone dicarboxylic acid, etc. Examples include dichloride, difluoride and dibromide. The arylene dicarboxylic acids represented by the above general formula include terephthalic acid, isophthalic acid,
1,4-naphthalene dicarboxylic acid, 1,5-naphthalene dicarboxylic acid, 2,6-naphthalene dicarboxylic acid, 4,4'-diphenyl ether dicarboxylic acid, 3,3'-diphenyl ether dicarboxylic acid,
4,4′-diphenylmethanedicarboxylic acid, 3,
Examples include 3'-diphenylmethanedicarboxylic acid, 4,4'diphenylsulfonedicarboxylic acid, and 3,3'-diphenylsulfonedicarboxylic acid. The polyamide resin represented by the above general formula is produced by reacting a diamine represented by the above general formula and a dicarboxylic acid dihalide represented by the above general formula in an organic solvent at a temperature of -20 to 200°C for several minutes to several days. This is done by letting the In this method, the molecular weight of the polyamide resin represented by the general formula is limited by the amount of the diamine represented by the above general formula and the dicarboxylic acid dihalide represented by the above general formula, and if equimolar amounts of these reaction components are used, A high molecular weight polyamide resin represented by the above general formula can be produced. The reason why n is limited to an integer between 10 and 200 in the polyamide resin represented by the above general formula is that if n is smaller than 10, the mechanical properties and heat resistance of the molded product, such as a film, will not be sufficient. This is because when n exceeds 200, the solubility in organic solvents etc. deteriorates. Organic solvents that can be used in this method include N,
Amide solvents such as N-dimethylacetamide and N-methyl-2-pyrrolidone, aromatic solvents such as benzene, anisole, diphenyl ether, nitrobenzene, and benzonitrile, and chloroform, dichloromethane, 1,2-dichloroethane, 1 , 1,2,2-tetrachloroethane, and other halogenated solvents. Pyridine along with such organic solvents,
It is effective to carry out the reaction in the presence of an acid acceptor such as triethylamine, or in the case of a solvent that is immiscible with water, in a two-phase system with an alkaline aqueous solution. In particular, when an amide solvent such as N,N-dimethylacetamide or N-methyl-2-pyrrolidone is used, these solvents themselves become acid acceptors, and a high polymer polyamide resin can be obtained. Separately, the production of the polyamide resin represented by the above general formula involves combining a diamine represented by the above general formula and a dicarboxylic acid represented by the above general formula in the presence of an aromatic phosphite and a pyridine derivative. This can be carried out by reacting at a temperature of 20 to 200°C for several minutes to several days. In this method, the molecular weight of the polyamide resin represented by the general formula is limited by the amounts of the diamine represented by the above general formula and the dicarboxylic acid represented by the above general formula, and when equimolar amounts of these reaction components are used, the molecular weight becomes high. A polyamide resin having a molecular weight represented by the above general formula can be produced. Aromatic phosphites used in the present invention include triphenyl phosphite, diphenyl phosphite, tri-o-tolyl phosphite, di-o-tolyl phosphite, and tri-m-tolyl phosphite. , di-m-tolyl phosphite, tri-p-tolyl phosphite, di-p-tolyl phosphite, tri-o phosphite
-chlorophenyl, di-o-chlorophenyl phosphite, tri-p-chlorophenyl phosphite, di-p-chlorophenyl phosphite, and the like. The pyridine derivatives used in the present invention include pyridine, 2-picoline, 3-picoline, 4-picoline,
-Picoline, 2,4-lutidine, 2,6-lutidine, 3,5-lutidine, etc. can be mentioned. Typical organic solvents that can be used in this method are amide solvents such as N-methylpyrrolidone and N,N-dimethylacetamide. In order to obtain a polyamide resin with a high degree of polymerization, inorganic salts such as lithium chloride and calcium chloride,
Organic salts such as triethylamine hydrochloride, tetrabutylammonium chloride, cetyltrimethylammonium chloride, etc. can also be added to this reaction system. The polyamide resin represented by the above general formula produced in this manner is particularly sensitive to the type of the diamine represented by the above general formula used, the dicarboxylic acid dihalide represented by the above general formula used, or the dicarboxylic acid represented by the above general formula. Although the solubility changes, chloroform, tetrachloroethane, N,N-dimethylformamide, N,
It becomes soluble in all or part of solvents such as N-dimethylacetamide, dimethylsulfoxide, cresol, chlorobenzene, o-chlorophenol, and pyridine. The polyamide resin represented by the above general formula shows no significant weight change even when heated to around 400°C. (Example) Hereinafter, the present invention will be explained in more detail by reference examples and examples. Reference example 1 30.24 g (0.54 mol) of KOH in 200 ml of ethanol,
Dissolve 56.5g (0.6mol) of phenol, 2,4-
121.2 g (0.6 mol) of dinitrochlorobenzene was added and stirred at 75°C for 8 hours. After the reaction, the mixture was filtered while hot, and ethanol was distilled off under reduced pressure to obtain a product. The resulting pure 2,4-dinitrodiphenyl ether was obtained by recrystallization from ethanol. Yield: 108.6g (70%). Melting point 70-71°C (literature value 69-70°C). Reference Example 2 10.4 g (0.04 mol) of 2,4-dinitrodiphenyl ether was dissolved in 100 ml of ethanol, and a reduction reaction was carried out by hydrogenation using 1.3 g of 10% palladium activated carbon as a catalyst. After the reaction, the palladium activated carbon was filtered, 20 ml of concentrated hydrochloric acid was added to the filtrate, and the solvent was distilled off under reduced pressure. The obtained 2,4-diaminodiphenyl ether hydrochloride was recrystallized from a benzene-ethanol system. Yield 7.53g (69%). Next, 7.08 g (0.03 mol) of 2,4-diaminodiphenyl ether hydrochloride was dissolved in 100 ml of water containing hydrosulfite, and 2.8 g of sodium hydroxide was added.
An alkaline aqueous solution prepared from g (0.07 mol) and 25 ml of water was added dropwise. The precipitated 2,4-diaminodiphenyl ether was filtered, dried, and then recrystallized from benzene. Yield 12.47g (42%). Melting point 65-67°C (literature value 67°C). Example 1 Isophthalic acid 0.83g (5mmol), 2,4-diaminodiphenyl ether 1.00g (5mmol), triphenyl phosphite 3.10g (10mmol), pyridine
2.5ml, lithium chloride 1.00g and N-methyl-
10 ml of 2-pyrrolidone was stirred at 100° C. for 3 hours under a nitrogen atmosphere. After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.65g
(100%). Intrinsic viscosity 0.63 (concentration of 0.5 g/dL in sulfuric acid,
(measured at 30°C). 10% weight loss temperature by thermogravimetry, 435°C Glass transition temperature, 220°C by thermomechanical measurement The solubility of the produced polymer is shown in Table 1. Example 2 2,4-diaminodiphenyl ether 1.00g
(5 mmol) was dissolved in 10 ml of N,N-dimethylacetamide and completely frozen on a dry ice-acetone bath. 1.02 g (5 mmol) of isophthalic acid chloride was added to the generated solid, and the mixture was stirred at 0° C. under a nitrogen atmosphere for 3 hours. After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.59g (96
%). Intrinsic viscosity 0.30 (concentration of 0.5 g/dL in sulfuric acid, 30
(measured in °C). Example 3 Terephthalic acid 0.83g (5mmol), 2,4-diaminodiphenyl ether 1.00g (5mmol), triphenyl phosphite 3.10g (10mmol), pyridine
2.5ml, lithium chloride 1.00g and N-methyl-
10 ml of 2-pyrrolidone was stirred at 100° C. for 3 hours under a nitrogen atmosphere. After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.65g (100
%). Intrinsic viscosity 0.84 (concentration of 0.5 g/dL in sulfuric acid, 30
(measured in °C). 10% weight loss temperature by thermogravimetry, 400°C Glass transition temperature, 265°C by thermomechanical measurement The solubility of the produced polymer is shown in Table 1. Example 4 2,4-diaminodiphenyl ether 1.00g
(5 mmol) was dissolved in 10 ml of N,N-dimethylacetamide and completely frozen on a dry ice-acetone bath. 1.02 g (5 mmol) of terephthalic acid chloride was added to the generated solid, and the mixture was stirred at 0° C. under a nitrogen atmosphere for 3 hours. After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.65g (100
%). Intrinsic viscosity 0.74 (concentration of 0.5 g/dL in sulfuric acid, 30
(measured in °C). Example 5 1.08 g of 2,6-naphthalene dicarboxylic acid
(5mmol), 2,4-diaminodiphenyl ether 1.00g (5mmol), triphenyl phosphite 3.10
g (10 mmol), pyridine 2.5 ml, lithium chloride
1.00g and 10ml N-methyl-2-pyrrolidone
was stirred at 100°C for 3 hours under a nitrogen atmosphere.
After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.90g (97%). Intrinsic viscosity 0.99 (measured at a concentration of 0.5 g/dL in sulfuric acid at 30°C). 10% weight loss temperature by thermogravimetry, 414°C Glass transition temperature, 251°C by thermomechanical measurement The solubility of the produced polymer is shown in Table 1. Example 6 Terephthalic acid 0.83g (5mmol), 2,4-diaminodiphenyl ether 0.40g (2mmol), 4,
4′-oxydianiline 0.60g (3mmol), triphenyl phosphite 3.10g (10mmol), pyridine 2.5
ml, 1.00 g of lithium chloride and N-methyl-2-
10 ml of pyrrolidone was stirred at 100° C. for 3 hours under a nitrogen atmosphere. After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.61g (97%).
Intrinsic viscosity 1.17 (measured at a concentration of 0.5 g/dL in sulfuric acid at 30°C). 10% weight loss temperature by thermogravimetry, 425°C Glass transition temperature, 255°C by thermomechanical measurement The solubility of the produced polymer is shown in Table 1. Example 7 Terephthalic acid 0.83g (5mmol), 2,4-diaminodiphenyl ether 0.60g (3mmol), 4,
4′-oxydianiline 0.40g (2mmol), triphenyl phosphite 3.10g (10mmol), pyridine 2.5
ml, 1.00 g of lithium chloride and N-methyl-2-
10 ml of pyrrolidone was stirred at 100° C. for 3 hours under a nitrogen atmosphere. After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.65g (100%).
Intrinsic viscosity 1.13 (measured at a concentration of 0.5 g/dL in sulfuric acid at 30°C). 10% weight loss temperature by thermogravimetry, 410°C Glass transition temperature, 255°C by thermomechanical measurement The solubility of the produced polymer is shown in Table 1. Example 8 Terephthalic acid 0.83g (5mmol), 2,4-diaminodiphenyl ether 0.80g (4mmol), 4,
4′-oxydianiline 0.20g (1mmol), triphenyl phosphite 3.10g (10mmol), pyridine 2.5
ml, 1.00 g of lithium chloride and N-methyl-2-
10 ml of pyrrolidone was stirred at 100° C. for 3 hours under a nitrogen atmosphere. After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.61g (98%).
Intrinsic viscosity 0.96 (measured at a concentration of 0.5 g/dL in sulfuric acid at 30°C). 10% weight loss temperature by thermogravimetry, 400°C Glass transition temperature, 250°C by thermomechanical measurement The solubility of the produced polymer is shown in Table 1. Example 9 Terephthalic acid 0.415g (2.5mmol), isophthalic acid 0.415g (2.5mmol), 2,4-diaminodiphenyl ether 1.00g (5mmol), triphenyl phosphite 3.10g (10mmol), pyridine 2.5ml, chloride 1.00 g of lithium and 10 ml of N-methyl-2-pyrrolidone were stirred at 100° C. for 3 hours under a nitrogen atmosphere. After the reaction, the polymerization solution was poured into methanol to obtain a polymer. Yield 1.65g (100%). intrinsic viscosity
0.66 (concentration of 0.5 g/dL in sulfuric acid, measured at 30°C). 10% weight loss temperature by thermogravimetry, 430°C Glass transition temperature, 230°C by thermomechanical measurement The solubility of the produced polymer is shown in Table 1.
【表】【table】
【表】
(発明の効果)
本発明は上記一般式で表わされるポリアミド
樹脂及びこのポリアミド樹脂の有利な製造方法を
提供する。本発明のポリアミド樹脂は、従来の芳
香族ポリアミド樹脂が、有機溶媒に不溶であり、
熱的に不融であり、成型性に問題を残していたの
に対し、高いガラス転移温度を有しながら、各種
有機溶媒に可溶であつて溶液成型が可能であると
ともに、加熱成型可能なエンジニアリングプラス
チツクとして工業的価値が高い。[Table] (Effects of the Invention) The present invention provides a polyamide resin represented by the above general formula and an advantageous method for producing this polyamide resin. The polyamide resin of the present invention is different from conventional aromatic polyamide resins in that it is insoluble in organic solvents,
Whereas it was thermally infusible and had problems with moldability, it has a high glass transition temperature, is soluble in various organic solvents, can be solution molded, and can be heat molded. It has high industrial value as an engineering plastic.
Claims (1)
Arは少なくとも20モル%が1―フエノキシ―2,
4―フエニレン基よりなるアリーレン基、nは10
〜200の整数を示す)で表わされるポリアミド樹
脂。 2 一般式 H2 N―Ar―NH2 (式中、Arは少なくとも20モル%が1―フエ
ノキシ―2,4―フエニレン基よりなるアリーレ
ン基を示す)で表わされるジアミンの少なくとも
1種と、一般式 (式中、Rはアリーレン基を、またXはハロゲ
ン原子を示す)で表わされるジカルボン酸ジハラ
イドの少なくとも1種とを有機溶媒中で反応させ
て、一般式 (式中、RおよびArは前記と同義であり、n
は10〜200の整数を示す) で表わされるポリアミド樹脂を得ることを特徴と
するポリアミド樹脂の製造方法。 3 一般式 H2 N―Ar―NH2 (式中、Arは少なくとも20モル%が1―フエ
ノキシ―2,4―フエニレン基よりなるアリーレ
ン基を示す) で表わされるジアミンの少なくとも1種と、一般
式 (式中、Rはアリーレン基を示す) で表わされるジカルボン酸の少なくとも1種とを
芳香族亜リン酸エステルとピリジン誘導体の存在
下、有機溶媒中で反応させて一般式 (式中、RおよびArは前記と同義であり、n
は10〜200の整数を示す) で表わされるポリアミド樹脂を得ることを特徴と
するポリアミド樹脂の製造方法。[Claims] 1. General formula (wherein R is at least one arylene group,
Ar contains at least 20 mol% of 1-phenoxy-2,
Arylene group consisting of 4-phenylene group, n is 10
(denoting an integer of ~200). 2 At least one diamine represented by the general formula H 2 N-Ar-NH 2 (in the formula, Ar represents an arylene group in which at least 20 mol% is a 1-phenoxy-2,4-phenylene group); formula (wherein, R represents an arylene group and X represents a halogen atom) is reacted with at least one dicarboxylic acid dihalide represented by the general formula (In the formula, R and Ar have the same meanings as above, and n
represents an integer from 10 to 200) A method for producing a polyamide resin, characterized in that a polyamide resin is obtained. 3 At least one diamine represented by the general formula H 2 N-Ar-NH 2 (in the formula, Ar represents an arylene group in which at least 20 mol% is a 1-phenoxy-2,4-phenylene group); formula (In the formula, R represents an arylene group) is reacted with at least one dicarboxylic acid represented by the following in the presence of an aromatic phosphite and a pyridine derivative in an organic solvent to form the general formula (In the formula, R and Ar have the same meanings as above, and n
represents an integer from 10 to 200) A method for producing a polyamide resin, characterized in that a polyamide resin is obtained.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13303985A JPS61293222A (en) | 1985-06-20 | 1985-06-20 | Polyamide resin and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13303985A JPS61293222A (en) | 1985-06-20 | 1985-06-20 | Polyamide resin and its manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61293222A JPS61293222A (en) | 1986-12-24 |
| JPH0149414B2 true JPH0149414B2 (en) | 1989-10-24 |
Family
ID=15095380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13303985A Granted JPS61293222A (en) | 1985-06-20 | 1985-06-20 | Polyamide resin and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61293222A (en) |
-
1985
- 1985-06-20 JP JP13303985A patent/JPS61293222A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61293222A (en) | 1986-12-24 |
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