JPH0151543B2 - - Google Patents
Info
- Publication number
- JPH0151543B2 JPH0151543B2 JP54019835A JP1983579A JPH0151543B2 JP H0151543 B2 JPH0151543 B2 JP H0151543B2 JP 54019835 A JP54019835 A JP 54019835A JP 1983579 A JP1983579 A JP 1983579A JP H0151543 B2 JPH0151543 B2 JP H0151543B2
- Authority
- JP
- Japan
- Prior art keywords
- bellows
- shaft
- vacuum
- space
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Sealing Devices (AREA)
- Diaphragms And Bellows (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
この発明は低圧装置、特にベローズを介して外
部より内部を操作する真空装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a low pressure device, and more particularly to a vacuum device in which the inside is operated from the outside through a bellows.
半導体装置、製造の際の不純物イオン打込みは
真空に保持したベルジヤ(真空容器)中で行われ
る。このためイオン打込み処理される半導体ウエ
ハを載置するウエハ台等の操作を容器に設けたベ
ローズ(蛇腹)を介して外部よりシヤフトで操作
する真空装置が使用される。このような真空装置
においては第1図に示すように真空容器1の真空
側2にベローズ3が入り込むようにoリング4を
介して取付けられ、外気側5よりシヤフト6がベ
ローズ内空間7を通つてベローズ末端に接続され
る。真空容器内は真空ポンプ8により例えば1×
10-6トル(Torr)の低圧が保持され、このよう
にベローズ内圧と外圧の差が大きく、特にベロー
ズの長さが大(200mm)であり、ベローズ内径
(60mmφ)とシヤフトの径(25mmφ)の差が大き
い場合、シヤフトを上下送りするとバツクリング
(蛇行)現象が起り、ベローズ内面がシヤフトに
強く当接してベローズを損傷させ、あるいはシヤ
フト動作が重くなつて操作困難となる等種々の故
障の原因となつていた。 Impurity ion implantation during the manufacture of semiconductor devices is performed in a bell jar (vacuum container) kept in a vacuum. For this purpose, a vacuum device is used in which a wafer stand or the like on which a semiconductor wafer to be ion-implanted is placed is operated by a shaft from the outside via a bellows provided in a container. In such a vacuum device, as shown in FIG. 1, a bellows 3 is attached to the vacuum side 2 of a vacuum container 1 via an O-ring 4, and a shaft 6 is inserted from the outside air side 5 through an inner space 7 of the bellows. and is connected to the bellows end. The inside of the vacuum container is heated by a vacuum pump 8, for example, 1×
A low pressure of 10 -6 Torr is maintained, and the difference between the internal pressure and external pressure of the bellows is large.In particular, the length of the bellows is large (200mm), and the inside diameter of the bellows (60mmφ) and the diameter of the shaft (25mmφ) If the difference is large, a buckling phenomenon will occur when the shaft is moved up and down, causing various failures such as the inner surface of the bellows coming into strong contact with the shaft, damaging the bellows, or making the shaft movement heavy and difficult to operate. It was becoming.
本発明は上記した従来装置の欠点を解消するた
めになされたものであり、その目的は真空装置に
使用するベローズのバツクリングの解消ならびに
ベローズの長寿命化である。 The present invention was made to eliminate the above-mentioned drawbacks of the conventional device, and its purpose is to eliminate backling of the bellows used in a vacuum device and extend the life of the bellows.
上記目的を達成するため本発明においては、ベ
ローズを有する真空装置において、シヤフトを含
むベローズ空間を外部より閉鎖し、その空間を外
気圧と真空装置内圧との中間の気圧に保持するこ
とを特徴とする。 In order to achieve the above object, the present invention is characterized in that, in a vacuum apparatus having a bellows, the bellows space including the shaft is closed from the outside and the space is maintained at an air pressure intermediate between the outside air pressure and the internal pressure of the vacuum apparatus. do.
第2図は本発明による一実施例の要部を示すも
のであり、同図の第1図と共通する構成部分は同
一番号符号をもつて指示される。シヤフト6はベ
ローズ3の末端部9でoリング10を介して回転
自在、かつベローズの伸縮により上下動自在であ
り、真空容器1の内部2の真空を損なうことなく
容器内を外部から操作できる。このシヤフトを含
むベローズ空間11はさらにoリング12,13
を介してフランジ14を取付けることにより外部
より第2の密閉空間11を構成する。この密閉空
間より吸引管15を通して別の低圧ポンプ16、
例えば小型油回転ポンプにより低圧吸引し、例え
ばベローズ内気圧を1Torr程度に下げることによ
り、外圧(760Torr)と、真空容器内圧(1×
10-6Torr)との差がベローズ内気圧によつて緩
和され、ベローズの動きが円滑になるとともにバ
ツクリング現象の発生がなくなる。この結果、ベ
ローズとシヤフトのかみ合がなくベローズを長寿
命化できるとともにシヤフトの上下及び回転の諸
操作が容易となる等の効果を奏する。 FIG. 2 shows a main part of an embodiment according to the present invention, and components common to those in FIG. 1 are designated by the same reference numerals. The shaft 6 is rotatable at the distal end 9 of the bellows 3 via an O-ring 10, and is also movable up and down by expansion and contraction of the bellows, so that the inside of the vacuum container 1 can be operated from the outside without damaging the vacuum inside the interior 2. The bellows space 11 including this shaft further includes O-rings 12 and 13.
By attaching the flange 14 via the flange 14, a second sealed space 11 is configured from the outside. Another low pressure pump 16 is passed through the suction pipe 15 from this closed space,
For example, by drawing low pressure with a small oil rotary pump and lowering the internal pressure of the bellows to about 1 Torr, the external pressure (760 Torr) and the internal pressure of the vacuum chamber (1
10 -6 Torr) is alleviated by the internal pressure of the bellows, making the movement of the bellows smooth and eliminating the buckling phenomenon. As a result, there is no engagement between the bellows and the shaft, which makes it possible to extend the life of the bellows, and also to facilitate various operations of vertical and rotational movement of the shaft.
第1図は従来の真空装置におけるベローズ適用
部の断面図、第2図は本発明による真空装置の要
部を示す断面図である。
1……真空容器、2……真空側、3……ベロー
ズ、4……oリング、5……外気側、6……シヤ
フト、7……ベローズ内空間、8……真空ポン
プ、9……ベローズ末端部、10……oリング、
11……ベローズ空間、12,13……oリン
グ、14……フランジ、15……吸引管、16…
低圧ポンプ。
FIG. 1 is a cross-sectional view of a bellows application part in a conventional vacuum device, and FIG. 2 is a cross-sectional view showing essential parts of a vacuum device according to the present invention. 1... Vacuum container, 2... Vacuum side, 3... Bellows, 4... O-ring, 5... Outside air side, 6... Shaft, 7... Space inside bellows, 8... Vacuum pump, 9... Bellows end, 10...O ring,
11... Bellows space, 12, 13... O-ring, 14... Flange, 15... Suction pipe, 16...
low pressure pump.
Claims (1)
空間を真空にする手段と、その容器内外に延在す
る移動シヤフトと、容器内部においてそのシヤフ
トを包むベローズとを有し、そのシヤフトによつ
て外部より内部を操作する真空装置であつて、該
シヤフトを包むベローズ空間を外気圧に対して負
圧に保持するための吸引機構を備えて成ることを
特徴とする真空装置。1 A container having a space to be evacuated, a means for evacuating the space in the container, a moving shaft extending inside and outside the container, and a bellows surrounding the shaft inside the container, 1. A vacuum device in which the inside is operated from the outside, the vacuum device comprising a suction mechanism for maintaining a bellows space surrounding the shaft at a negative pressure with respect to outside pressure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983579A JPS55113873A (en) | 1979-02-23 | 1979-02-23 | Low pressure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983579A JPS55113873A (en) | 1979-02-23 | 1979-02-23 | Low pressure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55113873A JPS55113873A (en) | 1980-09-02 |
| JPH0151543B2 true JPH0151543B2 (en) | 1989-11-06 |
Family
ID=12010326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1983579A Granted JPS55113873A (en) | 1979-02-23 | 1979-02-23 | Low pressure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55113873A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62163369U (en) * | 1986-03-31 | 1987-10-17 | ||
| JPH0749082B2 (en) * | 1986-09-22 | 1995-05-31 | 住友化学工業株式会社 | Axial sealing structure of cylindrical kinematic shaft that penetrates partition wall |
| JPH0250568U (en) * | 1988-10-04 | 1990-04-09 | ||
| JP2733780B2 (en) * | 1989-02-08 | 1998-03-30 | 日本真空技術株式会社 | Rod seal in sealing processing equipment |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5035250U (en) * | 1973-07-24 | 1975-04-15 |
-
1979
- 1979-02-23 JP JP1983579A patent/JPS55113873A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55113873A (en) | 1980-09-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2548062B2 (en) | Load lock chamber for vertical heat treatment equipment | |
| JPH0613361A (en) | Processor | |
| JP3121915B2 (en) | Sealing device | |
| JP4574926B2 (en) | Vacuum processing equipment | |
| JPH0151543B2 (en) | ||
| KR970077303A (en) | Semiconductor processing equipment | |
| JP2005056994A (en) | Plasma processing equipment | |
| JPH09181156A (en) | Vacuum chuck | |
| US2397207A (en) | Lens coating apparatus | |
| JPH04257244A (en) | Water carrier | |
| JPS60125467A (en) | High vacuum shaft sealing device using magnetic fluid | |
| JPH0539625Y2 (en) | ||
| KR980700680A (en) | Semiconductor Treatment Apparatus | |
| JP2003243312A (en) | Semiconductor manufacturing equipment | |
| JP2576495B2 (en) | Dry etching equipment | |
| JPH06120320A (en) | Carrier | |
| JPS5812700B2 (en) | electron beam equipment | |
| JP2016035086A (en) | Vacuum processing apparatus and method for vacuum-exhausting the same | |
| JPH0214198Y2 (en) | ||
| JPH0238317B2 (en) | ||
| JPS63114976A (en) | Substrate electrode mechanism | |
| JPH0653302A (en) | Evacuating device | |
| KR20230049598A (en) | Wafer processing apparatus | |
| JPH0533093B2 (en) | ||
| CN121874741A (en) | LOADLOCK process cavity that can be centered and positioned |