JPH0153982B2 - - Google Patents
Info
- Publication number
- JPH0153982B2 JPH0153982B2 JP59133560A JP13356084A JPH0153982B2 JP H0153982 B2 JPH0153982 B2 JP H0153982B2 JP 59133560 A JP59133560 A JP 59133560A JP 13356084 A JP13356084 A JP 13356084A JP H0153982 B2 JPH0153982 B2 JP H0153982B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- triazine
- weight
- phenol
- diamino
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003822 epoxy resin Substances 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 24
- 229920000647 polyepoxide Polymers 0.000 claims description 24
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 16
- -1 imidazole compound Chemical class 0.000 claims description 13
- 150000002460 imidazoles Chemical class 0.000 claims description 7
- ZXLYUNPVVODNRE-UHFFFAOYSA-N 6-ethenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=C)=N1 ZXLYUNPVVODNRE-UHFFFAOYSA-N 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims 1
- 238000001723 curing Methods 0.000 description 15
- 239000004020 conductor Substances 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 229910052709 silver Inorganic materials 0.000 description 10
- 239000004332 silver Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000000976 ink Substances 0.000 description 9
- 239000011253 protective coating Substances 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 238000013508 migration Methods 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 238000007650 screen-printing Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 238000002845 discoloration Methods 0.000 description 6
- 230000005012 migration Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical compound ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- MMABHMIOCAINNH-UHFFFAOYSA-N pyrrole-2,5-dione;triazine Chemical compound C1=CN=NN=C1.O=C1NC(=O)C=C1.O=C1NC(=O)C=C1 MMABHMIOCAINNH-UHFFFAOYSA-N 0.000 description 2
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- MTPJEFOSTIKRSS-UHFFFAOYSA-N 3-(dimethylamino)propanenitrile Chemical compound CN(C)CCC#N MTPJEFOSTIKRSS-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- XNCOSPRUTUOJCJ-UHFFFAOYSA-N Biguanide Chemical compound NC(N)=NC(N)=N XNCOSPRUTUOJCJ-UHFFFAOYSA-N 0.000 description 1
- 229940123208 Biguanide Drugs 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 1
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- XUCHXOAWJMEFLF-UHFFFAOYSA-N bisphenol F diglycidyl ether Chemical compound C1OC1COC(C=C1)=CC=C1CC(C=C1)=CC=C1OCC1CO1 XUCHXOAWJMEFLF-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Inks, Pencil-Leads, Or Crayons (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Description
(産業上の利用分野)
本発明はエポキシ樹脂インキ組成物に関するも
のである。このものは電気絶縁性、耐湿性、耐熱
性、耐薬品性及び密着性に優れ、且つ銀あるいは
銅の変色及びマイグレーシヨン防止性能を有し、
更に中高温速硬化性をも有するため、プリント回
路基板等の製造に利用することができる。
(従来の技術)
従来のプリント回路基板は主として下記の方法
によつて製造されている。
即ち、(A)セラミツク、ガラス等の無銀材料を基
材とする無機質絶縁基板上にガラスフリツトをバ
インダーとして銀、白金、パラジウム系導体、抵
抗体、コンデンサ等により所望の回路をスクリー
ン印刷により形成し、高温焼成する所謂厚膜成集
積回路基板の製法。
(B)紙・フエノール、紙・エポキシ、ガラス−エ
ポキシ等の有機材料を基材とする積層絶縁基板上
にフエノール樹脂、フエノール変性キシレン樹
脂、エポキシ樹脂等をバインダーとして、銀系導
体、抵抗体により所望の回路をスクリーン印刷に
より形成し、中高温焼き付けをするプリント回路
基板の製法。
(C)前記(B)に記載の有機材料を基材とする積層板
に、銅箔をはり合せた銅張り積層板の銅箔をエツ
チングすることにより所望の回路を形成するプリ
ント回路基板の製法である。
ところでこれらの方法で形成された導体回路の
表面は通常平面的に露出しているために環境雰囲
気による影響を受けやすい。即ち、雰囲気中に含
まれる導体腐蝕性不純物や湿気の導体への付着に
よる導体回路部分の腐蝕に起因する事故が起き易
い。
このような要因による事故を防ぎ、さらに回路
の信頼性を向上させるために、スクリーン印刷等
により、永久レジストと称する保護塗膜をその回
路上に形成する方法が一般に用いられ実施されて
いる。
(発明が解決しようとする問題点)
プリント配線回路の保護塗膜には電気絶縁性、
耐湿性、耐薬品性、密着性、硬度等の諸性能が要
求される。
更に前記厚膜混成集積回路基板やプリント回路
基板においては、その形成された回路は多くの場
合、微細且つ複雑なので、ニツケル、金、銅、ハ
ンダ等のメツキ付けを行う際、メツキによる回路
の短絡を起こす惧れがある。それを防ぐためにメ
ツキ付けの不必要な部分にスクリーン印刷等によ
り所謂レジストインキと称する保護塗膜を塗布、
硬化させて塗膜を形成させた後、必要な部分にの
みメツキ付けを行う方法が今日採られており、こ
の場合、該保護塗料スクリーン印刷等に適した粘
度、糸洩き性、チクソトロピツク性等のインキと
しての機能が要求される。
高温、高湿の環境条件下で電圧を印刷すること
により発生する銀や銅の導体回路の変色及びマイ
グレーシヨンは、最近の電子機器の小型、軽量
化、高密度化、高信頼性化等のより高度な要求に
伴ない今日問題となつている。このような銀、銅
の導体の変色、マイグレーシヨン防止性能を有す
る保護塗料用材料はトリアジン樹脂あるいはビス
−マレイミド−トリアジン樹脂を除き、ほとんど
見当らない。
従来より上述の諸特性、機能を有した保護塗料
として、焼成型のガラス系、加熱硬化型のエポキ
シ樹脂系フエノール樹脂系、メラミン樹脂系、エ
ポキシ−メラミン樹脂系、シリコーン樹脂系、更
に紫外線硬化樹脂系の塗料が知られているが、ガ
ラス系を除き、いずれも銀や銅の導体の変色やマ
イグレイシヨン防止性に関しては不充分である。
前記トリアジン樹脂系、ビス−マレイミド−ト
リアジン樹脂系と言えども硬化条件(温度、時
間)や可使時間等の取扱いに問題があり、満足す
べき状態にあるとは言えない。
本発明者らは、このような事情に鑑み、鋭意研
究の結果、長い可使時間を有し、且つ銀や銅の導
体の変色やマイグレーシヨンを防止し、さらに保
護塗料として満足すべき諸特性と機能を有する二
液性エポキシ樹脂インキ組成物を見い出すに至つ
た。
(問題点を解決するための手段)
すなわち、本発明エポキシ樹脂インキ組成物
は、少なくともエポキシ樹脂、ポリビニル−パラ
−フエノール、2−ビニル−4,6−ジアミノ−
s−トリアジン及びイミダゾール化合物を配合し
たものである。
本発明組成物は加熱に際し、2−ビニル−4,
6−ジアミノ−s−トリアジンのビニル基は開裂
して重合反応し、またトリアジン環につく2つの
アミノ基もイミダゾール化合物の存在により、エ
ポキシ樹脂と反応する。
また、ポリビニル−パラ−フエノールの水酸基
もイミダゾール化合物の作用により、容易にエポ
キシ樹脂と反応する。
更にエポキシ樹脂自身は上述の2−ビニル−
4,6−ジアミノ−s−トリアジンやポリビニル
−パラ−フエノールとは別にイミダゾール化合物
とも反応し、アニオン重合より硬化する。このよ
うに幾種もの反応がほとんど同時に起こる結果、
耐熱性、耐薬品性、耐変色性、マイグレーシヨン
防止機能等回路基板用インキに必要な諸特性を発
揮する塗膜が生じる。
しかし、この組成物の可使時間は残念乍ら短い
ので、それに実用性を持たすためには、次のよう
な構成にして使用しなければならない。
即ち、エポキシ樹脂と2−ビニル−4,6−ジ
アミノ−s−トリアジン及び充填剤等を均一に混
合して主剤(以下A液という)となし、次にポリ
ビニル−パラ−フエノールとイミダゾール化合物
等を適当量の有機溶剤(例えばブチルカルビトー
ル−アセテート等)に溶解してえられる溶液をB
液となし、A液と硬化剤(B液という)を使用直
前に混合して使用に供する。
本発明による組成物は可使時間が短かくて長期
保存出来ず、従つて実用性に乏しい欠点を有して
はいるが、上述の如く二液性として取り扱うこと
によりその欠点を除くことが出来る。
本発明エポキシ樹脂インキ組成物は、エポキシ
樹脂100重量部に対し、2−ビニル−4,6−ジ
アミノ−s−トリアジン5ないし20重量部、ポリ
ビニル−パラ−フエノール10ないし40重量部及び
イミダゾール化合物0.025ないし10重量部の割合
で配合すべきである。
硬化後の保護塗膜の性能は極めて高く又硬化速
度も紫外線硬化樹脂系塗料(近年硬化速度が早い
ため当該分野でよく用いられている。)に匹敵す
るものである。
本発明による組成物は厚膜混成集積回路板、プ
リント回路板用等の保護塗料や多重(多層)配線
用絶縁層としても使用できる。
本発明の実施に適するエポキシ樹脂は多価フエ
ノールのポリグリシジルエーテル例えばビスフエ
ノール−A−ジグリシジルエーテル、ビスフエノ
ール−F−ジグリシジルエーテルその他エポキシ
化フエノール−ノボラツク樹脂、エポキシ化クレ
ゾール−ノボラツク樹脂等である。
本発明においては充填剤をエポキシ樹脂100重
量部に対して100重量部までの混合で添加するこ
とができ、その代表的なものは、硫酸バリウム、
炭酸カルシウム、タルク、マイカ、シリカ、水酸
化アルミニウム、アルミナ等であり、これらを単
独又は2種以上の組み合せで使用できる。これら
以外の充填剤も勿論使用出来る。
(Industrial Application Field) The present invention relates to an epoxy resin ink composition. This product has excellent electrical insulation, moisture resistance, heat resistance, chemical resistance, and adhesion, and also has the ability to prevent silver or copper discoloration and migration.
Furthermore, since it has quick curing properties at medium to high temperatures, it can be used for manufacturing printed circuit boards and the like. (Prior Art) Conventional printed circuit boards are mainly manufactured by the following method. That is, (A) a desired circuit is formed by screen printing using silver, platinum, palladium conductors, resistors, capacitors, etc. using glass frit as a binder on an inorganic insulating substrate made of a silver-free material such as ceramic or glass as a base material. , a method for manufacturing a so-called thick film integrated circuit board by firing at high temperature. (B) Phenol resin, phenol-modified xylene resin, epoxy resin, etc. are used as binders on a laminated insulating substrate based on organic materials such as paper/phenol, paper/epoxy, glass-epoxy, etc., and silver-based conductors and resistors are used as binders. A method of manufacturing printed circuit boards in which a desired circuit is formed by screen printing and then baked at medium to high temperatures. (C) A method for manufacturing a printed circuit board in which a desired circuit is formed by etching the copper foil of a copper-clad laminate in which copper foil is bonded to a laminate based on the organic material described in (B) above. It is. Incidentally, the surfaces of conductor circuits formed by these methods are usually exposed in a plane and are therefore easily affected by the environmental atmosphere. That is, accidents are likely to occur due to corrosion of the conductor circuit portion due to adhesion of conductor-corrosive impurities or moisture contained in the atmosphere to the conductor. In order to prevent accidents caused by such factors and further improve the reliability of circuits, a method is generally used and practiced in which a protective coating called a permanent resist is formed on the circuit by screen printing or the like. (Problem to be solved by the invention) The protective coating of the printed wiring circuit has electrical insulation,
Various performances such as moisture resistance, chemical resistance, adhesion, and hardness are required. Furthermore, in the thick-film hybrid integrated circuit boards and printed circuit boards, the formed circuits are often minute and complex, so when plating with nickel, gold, copper, solder, etc., short circuits due to the plating may occur. There is a risk of causing To prevent this, a protective coating called resist ink is applied by screen printing to areas where plating is unnecessary.
The method used today is to cure the coating to form a coating and then apply plating only to the necessary areas. is required to function as an ink. Discoloration and migration of silver and copper conductor circuits caused by printing voltages under high temperature and high humidity environmental conditions are a problem that is caused by the recent advances in electronic equipment, such as smaller size, lighter weight, higher density, and higher reliability. This has become a problem today with more sophisticated requirements. With the exception of triazine resin or bis-maleimide-triazine resin, there are almost no protective coating materials that have the ability to prevent discoloration and migration of silver and copper conductors. Traditionally, protective coatings with the above-mentioned properties and functions include baking-type glass-based, heat-curable epoxy resin, phenolic resin-based, melamine resin-based, epoxy-melamine resin-based, silicone resin-based, and ultraviolet curable resin. Paints based on these types are known, but with the exception of glass-based paints, all of them are insufficient in preventing discoloration and migration of silver and copper conductors. Even with the above-mentioned triazine resin system and bis-maleimide-triazine resin system, there are problems in handling such as curing conditions (temperature, time) and pot life, and it cannot be said that they are in a satisfactory state. In view of these circumstances, the inventors of the present invention have conducted extensive research to find a coating that has a long pot life, prevents discoloration and migration of silver and copper conductors, and has various properties that are satisfactory as a protective coating. We have now discovered a two-component epoxy resin ink composition that has these functions. (Means for Solving the Problems) That is, the epoxy resin ink composition of the present invention contains at least an epoxy resin, polyvinyl-para-phenol, 2-vinyl-4,6-diamino-
It is a blend of s-triazine and imidazole compounds. When the composition of the present invention is heated, 2-vinyl-4,
The vinyl group of 6-diamino-s-triazine is cleaved and undergoes a polymerization reaction, and the two amino groups attached to the triazine ring also react with the epoxy resin due to the presence of the imidazole compound. Further, the hydroxyl group of polyvinyl-para-phenol also easily reacts with the epoxy resin due to the action of the imidazole compound. Furthermore, the epoxy resin itself is the above-mentioned 2-vinyl-
Apart from 4,6-diamino-s-triazine and polyvinyl-para-phenol, it also reacts with imidazole compounds and is cured by anionic polymerization. As a result of these reactions occurring almost simultaneously,
A coating film is produced that exhibits the various properties necessary for circuit board inks, such as heat resistance, chemical resistance, color fastness, and anti-migration function. However, the pot life of this composition is unfortunately short, so in order to make it practical, it must be used in the following configuration. That is, an epoxy resin, 2-vinyl-4,6-diamino-s-triazine, a filler, etc. are uniformly mixed to form a main agent (hereinafter referred to as liquid A), and then polyvinyl-para-phenol and an imidazole compound, etc. are mixed uniformly. B
Liquid A and a curing agent (referred to as B liquid) are mixed immediately before use. Although the composition according to the present invention has the drawback that it has a short pot life and cannot be stored for a long period of time, making it impractical, this drawback can be overcome by handling it as a two-part composition as described above. . The epoxy resin ink composition of the present invention comprises 5 to 20 parts by weight of 2-vinyl-4,6-diamino-s-triazine, 10 to 40 parts by weight of polyvinyl para-phenol, and 0.025 parts by weight of an imidazole compound, based on 100 parts by weight of epoxy resin. It should be blended in a proportion of 10 to 10 parts by weight. The performance of the protective coating after curing is extremely high, and the curing speed is comparable to that of ultraviolet curing resin paints (which have been frequently used in the field in recent years due to their fast curing speed). The composition according to the present invention can also be used as a protective coating for thick-film hybrid integrated circuit boards, printed circuit boards, etc., and as an insulating layer for multiple (multilayer) wiring. Epoxy resins suitable for the practice of the present invention include polyglycidyl ethers of polyhydric phenols such as bisphenol-A-diglycidyl ether, bisphenol-F-diglycidyl ether, epoxidized phenol-novolac resins, epoxidized cresol-novolac resins, etc. be. In the present invention, the filler can be added in an amount of up to 100 parts by weight to 100 parts by weight of the epoxy resin, and representative examples include barium sulfate,
These include calcium carbonate, talc, mica, silica, aluminum hydroxide, alumina, etc., and these can be used alone or in combination of two or more. Of course, fillers other than these can also be used.
【式】左記構造式で示される2−
ビニル−4,6−ジアミノ−s−トリアジンは、
ビグアニドとアクリル酸クロライドと反応させる
方法[J.Am.Chem、Soc.、80、988(1958)]、ジ
シアンジアミドとβ−ジメチルアミノ−プロピオ
ニトリルを反応させる方法(フランス特許第
1563255号)および1,2−ジ{4′,6′−ジアミ
ノ−s−トリアジニル−(2)′}−シクロブタンを減
圧下に加熱する方法(特公昭46−35068号)等に
よつて製造するとが出来る。
その使用量はエポキシ樹脂100重量部に対し、
5及至20重量部であり、特に好ましくは7及至15
重量部である。2−ビニル−4,6−ジアミノ−
s−トリアジンの使用量が上述の範囲を外れ、少
すぎる場合は銀や銅の変色及びマイグレーシヨン
防止効果が無く、硬化速度も低く、実用性は失わ
れる。また多過ぎる場合は硬化後の塗膜が脆く、
保護塗料としての機能性に欠ける。[Formula] 2-vinyl-4,6-diamino-s-triazine represented by the structural formula on the left is
A method of reacting biguanide with acrylic acid chloride [J.Am.Chem, Soc., 80, 988 (1958)], a method of reacting dicyandiamide with β-dimethylamino-propionitrile (French patent no.
1563255) and 1,2-di{4',6'-diamino-s-triazinyl-(2)'}-cyclobutane by heating under reduced pressure (Japanese Patent Publication No. 46-35068). I can do it. The amount used is per 100 parts by weight of epoxy resin.
5 to 20 parts by weight, particularly preferably 7 to 15 parts by weight
Parts by weight. 2-vinyl-4,6-diamino-
If the amount of s-triazine used is outside the above-mentioned range and is too small, there will be no effect of preventing discoloration and migration of silver or copper, the curing rate will be low, and practicality will be lost. Also, if there is too much, the coating film after curing will become brittle.
Lacks functionality as a protective coating.
【式】左記構造式で示さ
れるポリビニル−パラ−フエノールの添加は、塗
膜と基材との密着性を著しく向上させ、また細い
パターンの塗膜の硬化時の滲出を防止する。平均
重合度は25及至70の範囲のこのものが好ましい。
本発明において使用されるイミダゾール化合物
の代表的なものは、2−メチル−イミダゾール、
2−エチル−4−メチル−イミダゾール、2−フ
エニルイミダゾール、2−ウンデシルイミダゾー
ル、2−ヘプタデシルイミダゾール、2−フエニ
ル−4−メチルイミダゾール、これら2−置換イ
ミダゾール類の1位シアノエチル化合物、これら
イミダゾール化合物のカルボン酸塩、2,4−ジ
アミノ−6−{2−メチルイミダゾリル−(1)}−エ
チル−s−トリアジン、2,4−ジアミノ−6−
{2−エチル−4−メチルイミダゾリル−(1)}−エ
チル−s−トリアジン、2,4−ジアミノ−6−
{2−メチルイミダゾリル−(1)}−エチル−s−ト
リアジン−イソシアヌレート、2−フエニル−
4,5−ジヒドロキシメチルイミダゾール、2−
フエニル−4−メチル−s−ヒドロキシメチルイ
ミダゾール等があり、エポキシ樹脂との反応性の
高いイミダゾール化合物の1種または2種以上の
組み合せで速硬化性の組成物を得ることが出来
る。ポリビニル−パラ−フエノールの溶剤、例え
ばブチルカルビトール−アセテート等に溶解する
イミダゾール化合物、例えば2−メチルイミダゾ
ール、2−エチル−4−メチルイミダゾール等は
溶剤に溶して使用され、また溶剤に不溶のイミダ
ゾール化合物はポリビニル−パラ−フエノールの
溶液中に三本ロールミル等の混練機を用いて、粒
子径が10ミクロン以下になるように分散させる。
本発明における組成物の硬化温度は、130及至
200℃の範囲である。
(実施例)
実施例および比較例中の各組成物は三本ロール
ミルを用いて粒子径が10ミクロン以下になるよう
に均一に分散、混練されたものである。
表−1に従つて調合した組成物について性能試
験を行なつた結果は表−2及び表−3に示した通
りである。[Formula] Addition of polyvinyl-para-phenol represented by the structural formula shown on the left significantly improves the adhesion between the coating film and the substrate, and also prevents oozing of a thin patterned coating film during curing. The average degree of polymerization is preferably in the range of 25 to 70. Typical imidazole compounds used in the present invention include 2-methyl-imidazole,
2-ethyl-4-methyl-imidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecyl imidazole, 2-phenyl-4-methylimidazole, 1-position cyanoethyl compounds of these 2-substituted imidazoles, these Carboxylate salt of imidazole compound, 2,4-diamino-6-{2-methylimidazolyl-(1)}-ethyl-s-triazine, 2,4-diamino-6-
{2-ethyl-4-methylimidazolyl-(1)}-ethyl-s-triazine, 2,4-diamino-6-
{2-methylimidazolyl-(1)}-ethyl-s-triazine-isocyanurate, 2-phenyl-
4,5-dihydroxymethylimidazole, 2-
Examples include phenyl-4-methyl-s-hydroxymethylimidazole, and a fast-curing composition can be obtained by using one or a combination of two or more imidazole compounds that are highly reactive with epoxy resins. Imidazole compounds, such as 2-methylimidazole, 2-ethyl-4-methylimidazole, etc., which are soluble in polyvinyl-para-phenol solvents such as butyl carbitol-acetate, etc., are used dissolved in the solvent, and imidazole compounds that are insoluble in the solvent are used. The imidazole compound is dispersed in a polyvinyl-para-phenol solution using a kneader such as a three-roll mill so that the particle size is 10 microns or less. The curing temperature of the composition in the present invention is between 130 and 130°C.
It is in the range of 200℃. (Example) Each composition in the Examples and Comparative Examples was uniformly dispersed and kneaded using a three-roll mill so that the particle size was 10 microns or less. Performance tests were conducted on the compositions prepared according to Table 1, and the results are shown in Tables 2 and 3.
【表】
なお、A液とB液の混合比率は、性能に応じて
決定すべきであるが、本実施例においては重量比
でA液:B液=100:13.6とした。比較例1〜3
は、一液性エポキシ樹脂インキ組成物である。ま
た比較例4の市販品は、サンワ化学工業株式会社
製紫外線硬化型ソルダーレジストUR3000であ
る。[Table] The mixing ratio of liquid A and liquid B should be determined depending on the performance, but in this example, the weight ratio of liquid A: liquid B was 100:13.6. Comparative examples 1 to 3
is a one-component epoxy resin ink composition. The commercially available product of Comparative Example 4 is an ultraviolet curing solder resist UR3000 manufactured by Sanwa Chemical Industries, Ltd.
【表】【table】
【表】
但し、スクリーン印刷により20μ厚の塗膜を形
成し、これを150℃15分硬化させたものである。
* 市販品レジスト:紫外線硬化型インキ組成
物である。硬化条件は80W/cmオゾンレス高圧
水銀灯3本で照射、通炉速度4m/Minとした。
(注)
(3) 試験片を温度60℃、湿度95%、印加電圧
DC30Vの条件で所定時間毎に測定た。
(4) NEMA規格XPCの銅張り積層板の銅箔をエ
ツチングして導体線幅0.5mn、導体間隔0.3nm
のくし型電極回路を形成し、その回路上に各例
の調合物をスクリーン印刷し、これを硬化して
得た試験片を前記の条件下に、500時間放置し
た場合。
(5) NEMA規格 XPCの積層板上に銀粉−フエ
ノール樹脂系ペーストを導体線幅0.5mm、導体
間隔0.3mmのくし型電極回路にスクリーン印刷
し、150℃の温度で30分間焼付けた後、その回
路上に各例の調合物をスクリーン印刷し、これ
を熱硬化して得た試験片を前記(3)の条件下に、
100時間放置した場合。
(6) セラミツク基板上に銀・パラジウム粉−ガラ
ス系ペーストを導体線幅0.5mmのくし型電極回
路にスクリーン印刷し、700℃の温度で2時間
焼成したのち、その回路上に各例の調合物をス
クリーン印刷し、これを熱硬化して得た試験片
を前記(3)の条件下で500時間放置した場合。
(7) JIS−C−2103に従つてアルミ板上に各例の
調合物をスクリーン印刷して保護膜を形成した
ものについて測定した。
(8) 前記(4)の方法で作製した試験片を260℃の溶
融ハンダ浴に30秒浸漬した後、塗膜の外観上の
ふくれ、はがれ等を観察しJIS−D−0202に従
つてクロスカツトピーリングテストをしたもの
である。
(9) 前記(4)の方法で作製した試験片を、10%硫酸
溶液及び10%苛性ソーダ溶液に120時間浸漬し
た後、塗膜の変化を観察したものである。
(10) 前記(4)の方法で作製した試験片をJIS−D−
0202に従つて鉛筆硬度を測定したものである。[Table] However, a coating film with a thickness of 20 μm was formed by screen printing, and this was cured at 150°C for 15 minutes. * Commercially available resist: An ultraviolet curable ink composition. The curing conditions were irradiation with three 80W/cm ozone-free high-pressure mercury lamps and a furnace speed of 4m/min. (Note) (3) The test piece was placed at a temperature of 60℃, humidity of 95%, and an applied voltage.
Measurements were taken at predetermined time intervals under the condition of DC30V. (4) Etching the copper foil of the NEMA standard XPC copper-clad laminate with a conductor line width of 0.5 mm and conductor spacing of 0.3 nm.
A test piece obtained by forming a comb-shaped electrode circuit, screen-printing the formulation of each example on the circuit, and curing it was left under the above conditions for 500 hours. (5) Screen-print silver powder-phenol resin paste on a NEMA standard The formulation of each example was screen printed on the circuit, and the test piece obtained by heat curing was subjected to the conditions of (3) above.
When left for 100 hours. (6) Screen-print a comb-shaped electrode circuit with a conductor line width of 0.5 mm using silver/palladium powder-glass paste on a ceramic substrate, bake it at a temperature of 700°C for 2 hours, and then print each example formulation on the circuit. When a test piece obtained by screen printing an object and heat curing it was left for 500 hours under the conditions described in (3) above. (7) In accordance with JIS-C-2103, each formulation was screen printed on an aluminum plate to form a protective film, and measurements were taken. (8) After immersing the test piece prepared by the method in (4) above in a molten solder bath at 260°C for 30 seconds, observe the appearance of the paint film for blistering, peeling, etc., and cross-wash it according to JIS-D-0202. This is a cut peeling test. (9) Changes in the coating film were observed after the test pieces prepared by the method (4) above were immersed in a 10% sulfuric acid solution and a 10% caustic soda solution for 120 hours. (10) JIS-D-
Pencil hardness was measured according to 0202.
Claims (1)
−フエノール、2−ビニル−4,6−ジアミノ−
s−トリアジン及びイミダゾール化合物を含有し
てなるエポキシ樹脂インキ組成物。 2 エポキシ樹脂100重量部に対し、2−ビニル
−4,6−ジアミノ−s−トリアジン5ないし20
重量部、ポリビニル−パラ−フエノール10ないし
40重量部及びイミダゾール化合物0.025ないし10
重量部を配合させてなる特許請求の範囲1に記載
のエポキシ樹脂インキ組成物。 3 少なくともエポキシ樹脂と2−ビニル−4,
6−ジアミノ−s−トリアジンを含有する主剤と
少なくともポリビニル−パラ−フエノールとイミ
ダゾール化合物を有機溶剤に溶かした硬化剤から
なるエポキシ樹脂インキ組成物。[Claims] 1. At least epoxy resin, polyvinyl-para-phenol, 2-vinyl-4,6-diamino-
An epoxy resin ink composition containing s-triazine and an imidazole compound. 2 5 to 20 2-vinyl-4,6-diamino-s-triazine per 100 parts by weight of epoxy resin
Parts by weight, polyvinyl-para-phenol 10 to
40 parts by weight and 0.025 to 10 imidazole compounds
The epoxy resin ink composition according to claim 1, wherein parts by weight of the epoxy resin ink composition are blended. 3 at least an epoxy resin and 2-vinyl-4,
An epoxy resin ink composition comprising a base agent containing 6-diamino-s-triazine and a curing agent in which at least polyvinyl-para-phenol and an imidazole compound are dissolved in an organic solvent.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59133560A JPS6112772A (en) | 1984-06-27 | 1984-06-27 | Epoxy resin ink composition |
| US06/747,234 US4593069A (en) | 1984-06-23 | 1985-06-21 | Epoxy resin composition |
| CA000484733A CA1235545A (en) | 1984-06-23 | 1985-06-21 | Epoxy resin composition |
| DE8585304461T DE3564957D1 (en) | 1984-06-23 | 1985-06-21 | Epoxy resin composition |
| EP85304461A EP0166588B1 (en) | 1984-06-23 | 1985-06-21 | Epoxy resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59133560A JPS6112772A (en) | 1984-06-27 | 1984-06-27 | Epoxy resin ink composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6112772A JPS6112772A (en) | 1986-01-21 |
| JPH0153982B2 true JPH0153982B2 (en) | 1989-11-16 |
Family
ID=15107655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59133560A Granted JPS6112772A (en) | 1984-06-23 | 1984-06-27 | Epoxy resin ink composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6112772A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4451214B2 (en) | 2004-05-21 | 2010-04-14 | シャープ株式会社 | Semiconductor device |
| JP5790550B2 (en) * | 2012-03-13 | 2015-10-07 | 住友金属鉱山株式会社 | Three-dimensional circuit board and manufacturing method thereof |
-
1984
- 1984-06-27 JP JP59133560A patent/JPS6112772A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6112772A (en) | 1986-01-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1338624B1 (en) | Liquid thermosetting resin composition, printed wiring boards and process for their production | |
| EP0955795A2 (en) | Conductive paste for filing via-hole, double-sided and multilayer printed circuit boards using the same, and method for producing the same | |
| KR20100059790A (en) | Insulating resin composition for multilayer printed wiring board, insulating resin sheet with base material, multilayer printed wiring board, and semiconductor device | |
| KR20030046552A (en) | Printed Circuit Board with Buried Resistors and Manufacturing Method Thereof | |
| TWI321517B (en) | Opaque polyimide coverlay | |
| EP0166588B1 (en) | Epoxy resin composition | |
| JPS6259681A (en) | Adhesive for additive printed circuit board | |
| JPH0153982B2 (en) | ||
| WO2016121668A1 (en) | Electroconductive paste | |
| JPH0325468B2 (en) | ||
| WO2024101707A1 (en) | Resin composition and printed circuit board comprising same | |
| KR101862734B1 (en) | Material for bonding electronic component, and method for bonding electronic component | |
| JPH0119834B2 (en) | ||
| JPS603113B2 (en) | Epoxy resin varnish for printing and coating inks | |
| JP3789603B2 (en) | Thermosetting resin composition for multilayer printed wiring boards | |
| JPS58176254A (en) | Plating-resistant solder resist ink composition | |
| JPH107884A (en) | Electroconductive paste and production of electric circuit-forming board | |
| JPS6112771A (en) | One-pack type epoxy resin ink composition | |
| KR101652174B1 (en) | Prepreg, and metal-clad laminate and printed circuit board comprising the same | |
| JPS619428A (en) | Epoxy resin composition | |
| JP2627916B2 (en) | Solder resist composition | |
| KR20120081383A (en) | Adhesive composition for halogen-free coverlay film and coverlay film using the same | |
| JPS6079080A (en) | Adhesive composition | |
| JPS6023460A (en) | Paint for electrical resistor | |
| JPH1121422A (en) | Thermosetting resin composition |