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JPH0210225B2 - - Google Patents
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JPH0210225B2 - - Google Patents

Info

Publication number
JPH0210225B2
JPH0210225B2 JP12650181A JP12650181A JPH0210225B2 JP H0210225 B2 JPH0210225 B2 JP H0210225B2 JP 12650181 A JP12650181 A JP 12650181A JP 12650181 A JP12650181 A JP 12650181A JP H0210225 B2 JPH0210225 B2 JP H0210225B2
Authority
JP
Japan
Prior art keywords
window
vacuum
laser beam
metal material
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12650181A
Other languages
Japanese (ja)
Other versions
JPS5827981A (en
Inventor
Yukio Komura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP12650181A priority Critical patent/JPS5827981A/en
Publication of JPS5827981A publication Critical patent/JPS5827981A/en
Publication of JPH0210225B2 publication Critical patent/JPH0210225B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は、レーザ加熱による金属の真空蒸着を
目的とした真空メツキ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum plating apparatus for vacuum deposition of metal by laser heating.

真空容器内で金属を加熱溶融して蒸発させ、こ
れを基板上に付着させる手段として真空蒸着、イ
オンプレーテイング等があり、これらにおいて
は、金属を一定の条件で溶融、蒸発させる手段と
して、抵抗加熱法、誘導加熱法、電子ビーム法等
が採られている。
Vacuum evaporation, ion plating, etc. are methods for melting and vaporizing metal in a vacuum container and depositing it on a substrate.In these methods, resistance is used as a means to melt and vaporize metal under certain conditions. Heating methods, induction heating methods, electron beam methods, etc. are used.

しかし抵抗加熱法においては、装置が安価であ
るにしても金属蒸発の再現性が難しく、誘導加熱
法においては金属蒸発の再現性はあるが、装置が
高価につきかつ大型化する傾向があり、また電子
ビーム法においても金属蒸発の再現性はあるが、
装置が高価である。
However, in the resistance heating method, it is difficult to reproduce metal evaporation even though the equipment is inexpensive, and in the induction heating method, although the metal evaporation can be reproducible, the equipment tends to be expensive and large. Although the electron beam method has reproducibility of metal evaporation,
Equipment is expensive.

しかも、誘導加熱法、電子ビーム法では、装置
が真空容器中に設置されるものであるため、同容
器が必然的に大きくならざるを得ず、また抵抗加
熱法では、蒸発が安定しないので、一定の品質を
要求される薄膜作成には殆ど使用されない。
Moreover, in the induction heating method and the electron beam method, the equipment is installed in a vacuum container, which inevitably makes the container larger, and in the resistance heating method, evaporation is not stable. It is rarely used to create thin films that require a certain level of quality.

かかる状況下でレーザ蒸着法が出現した。 Under such circumstances, laser vapor deposition method emerged.

これは、真空容器の外部にレーザ発生器を設置
して内部の金属を蒸発させるものである。
In this method, a laser generator is installed outside the vacuum container to vaporize the metal inside.

ところがこの装置においては、レーザビームが
透過する真空容器の窓ガラスあるいは反射鏡に蒸
気が付着するため、レーザビームの透過率あるい
は反射率が著しく落ち、そのため、短時間の使用
しかできなかつた。
However, in this device, steam adheres to the window glass or reflective mirror of the vacuum container through which the laser beam passes, resulting in a significant drop in the transmittance or reflectance of the laser beam, and therefore, the device could only be used for a short period of time.

本発明は、真空容器内における窓の周囲にレー
ザビームの進路を囲む冷却部を設けることによつ
て上記問題点を解決しようというもので、これを
図面に示す実施例を参照しながら説明すると、第
1図において、1は真空容器、2はレーザビーム
3が透過可能な窓、4は同窓に取り付けられたガ
ラス板、5はプリフオームロツド、6は同プリフ
オームロツドを溶融加熱するための加熱炉、7は
線引き後の光フアイバ、8はレーザ加熱によつて
溶融、蒸発可能な線状の金属材、9は同金属材を
連続供給するための巻枠、10はメツキ後の光フ
アイバ11を巻取るための巻取ドラムであり、こ
れらを備えている点は従来例と同様であるが、本
発明においては、第2図に明示するように、冷却
部12を備えている点において異なつている。
The present invention aims to solve the above-mentioned problems by providing a cooling section around the window in the vacuum container to surround the path of the laser beam.This will be explained with reference to an embodiment shown in the drawings. In Fig. 1, 1 is a vacuum container, 2 is a window through which the laser beam 3 can pass, 4 is a glass plate attached to the window, 5 is a preform rod, and 6 is for melting and heating the preform rod. , 7 is an optical fiber after being drawn, 8 is a linear metal material that can be melted and vaporized by laser heating, 9 is a winding frame for continuously supplying the metal material, and 10 is a light after plating. It is a winding drum for winding up the fiber 11, and is similar to the conventional example in that it is equipped with these, but in the present invention, as clearly shown in FIG. 2, it is equipped with a cooling section 12. There are differences in

この冷却部12は、窓2の周囲に突設されかつ
レーザビーム3の進路を囲む内筒13と、同内筒
13の外周に配置されかつその周壁内部に液体ガ
ス通路14を有する円筒状部材15と、同部材1
5のさらに外周に設けられた断熱層16とを備え
ている。
The cooling unit 12 includes an inner cylinder 13 that protrudes around the window 2 and surrounds the path of the laser beam 3, and a cylindrical member that is arranged on the outer periphery of the inner cylinder 13 and has a liquid gas passage 14 inside its peripheral wall. 15 and the same member 1
5 and a heat insulating layer 16 provided on the outer periphery.

従つて、図示しない配管系を介して上記液体ガ
ス通路に、液体窒素等の液体ガスを充填すると、
内筒13が冷却されることになる。
Therefore, when the liquid gas passage is filled with liquid gas such as liquid nitrogen through a piping system not shown,
The inner cylinder 13 will be cooled.

上記構成において、真空容器1の外部に設置さ
れた発振部17からレーザビーム3を発すると、
同レーザ3は、窓2を透過し、さらに内筒13を
通つて、予め設定された金属材8上の焦点位置に
達する。
In the above configuration, when the laser beam 3 is emitted from the oscillation unit 17 installed outside the vacuum container 1,
The laser 3 passes through the window 2 and further passes through the inner tube 13 to reach a predetermined focal position on the metal material 8.

レーザビーム3の照射を受けた金属材8は、レ
ーザ加熱によつて蒸発し、金属蒸気18となり、
光フアイバ7に付着すると共にあらゆる方向に飛
散し、従つて窓2方向にも向うことになる。
The metal material 8 irradiated with the laser beam 3 is evaporated by laser heating and becomes metal vapor 18,
It adheres to the optical fiber 7 and scatters in all directions, thus also heading towards the window 2.

しかし、内筒13は冷却されているので、その
内部に達した金属蒸気18は、その分子運動が抑
えられることになり、このため金属蒸気18は内
筒13にトラツプされることになる。
However, since the inner cylinder 13 is cooled, the molecular movement of the metal vapor 18 that has reached the inside is suppressed, and therefore the metal vapor 18 is trapped in the inner cylinder 13.

金属材8はガイド19を介して連続的に供給さ
れ、従つて、光フアイバ7は連続的にメツキされ
る。
The metal material 8 is continuously supplied via the guide 19, so that the optical fiber 7 is continuously plated.

尚、断熱層16の存在により、冷却が内筒13
のみに集中することになる。
In addition, due to the presence of the heat insulating layer 16, cooling is performed by the inner cylinder 13.
You will have to concentrate only on

また窓2は図示しない配管によつて冷却され
る。
Further, the window 2 is cooled by piping (not shown).

20は、ガラス板4を保持するための押え部材
である。
20 is a holding member for holding the glass plate 4.

上述においては、被メツキ物として光フアイバ
などの線条体を例にあげたが、もちろんこれに限
定されるものではない。
In the above description, a striated body such as an optical fiber was used as an example of the object to be plated, but of course the object is not limited to this.

ここでより具体的な例について述べると、 ) 金属材8として直径1mmのアルミニウム線
を用い、これに100PPS 200WのYAGレーザを
照射し、メツキすべき線条体の両側から金属材
8を蒸発させた。
To describe a more specific example here, an aluminum wire with a diameter of 1 mm is used as the metal material 8, and a 100PPS 200W YAG laser is irradiated onto it to evaporate the metal material 8 from both sides of the wire to be plated. Ta.

この際線条体を上下方向に数m/分のスピー
ドで走行させた。
At this time, the striatum was made to run vertically at a speed of several meters/minute.

) 直線1mmのアルミニウム線にYAGレーザ
を照射して、鉄板にメツキし、次いでそのメツ
キ上に高周波放電によりイオンプレーテイング
を施し、その膜厚を数μmとした。
) A straight 1 mm aluminum wire was irradiated with a YAG laser to plate an iron plate, and then ion plating was performed on the plating using high frequency discharge to make the film thickness several μm.

このサンプルに塩水を噴霧し、100時間放置
したが、鉄さびは現われなかつた。
This sample was sprayed with salt water and left for 100 hours, but no iron rust appeared.

尚、真空容器内では、鉄板を自転及び公転さ
せ、均一にメツキした。
In addition, the iron plate was rotated and revolved in the vacuum container to uniformly plate the plate.

尚、金属材8としては、Alの外に、Ti、Si、
Ni、Ta等の高融点金属も適用可能である。
In addition to Al, the metal material 8 includes Ti, Si,
High melting point metals such as Ni and Ta are also applicable.

またメツキすべきものは、線条体に限らず、上
記の如く、鉄板等も可能である。
Furthermore, the object to be plated is not limited to the filament, but may also be an iron plate, etc., as mentioned above.

以上のように本発明においては、真空容器内に
おける窓の周囲にレーザビームの進路を囲む冷却
部を設けたので、冷却部内は冷却されることにな
り、従つて同内部に侵入した金属蒸気の分子運動
は抑えられ、同蒸気は冷却部にトラツプされる。
As described above, in the present invention, the cooling section surrounding the path of the laser beam is provided around the window in the vacuum vessel, so the inside of the cooling section is cooled, and therefore, the metal vapor that has entered the inside of the cooling section is cooled. Molecular motion is suppressed and the vapor is trapped in the cooling section.

このため真空容器の窓は、長時間レーザビーム
を通過させ、金属材を蒸発させても所期の透明度
は保たれ、レーザビームの透過率は殆ど落ちない
ことになる。
Therefore, even if the window of the vacuum container allows the laser beam to pass through it for a long time and evaporates the metal material, the desired transparency is maintained, and the transmittance of the laser beam hardly decreases.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る装置の概略断面図、第2
図は同装置の要部を示す概略断面図である。 1…真空容器、2…窓、7…被メツキ物(光フ
アイバ)、8…金属材、12…冷却部。
FIG. 1 is a schematic cross-sectional view of the device according to the present invention, FIG.
The figure is a schematic sectional view showing the main parts of the device. DESCRIPTION OF SYMBOLS 1... Vacuum container, 2... Window, 7... Object to be plated (optical fiber), 8... Metal material, 12... Cooling section.

Claims (1)

【特許請求の範囲】 1 外部からのレーザビームが透過可能な窓を有
する真空容器内に、レーザ加熱によつて蒸発可能
な金属材を配置して該真空容器内の蒸発金属雰囲
気中に被メツキ物を導入するようにした真空メツ
キ装置において、上記真空器内における窓の周囲
にレーザビームの進路を囲む冷却部を設けたこと
を特徴とする真空メツキ装置。 2 冷却部は窓の周囲に突設された円筒状部材を
備え、該円筒状部材はその周壁内部に液体ガス通
路を有していることを特徴とする特許請求の範囲
第1項記載の真空メツキ装置。
[Claims] 1. A metal material that can be evaporated by laser heating is placed in a vacuum container having a window through which a laser beam from the outside can pass, and the metal material to be plated is placed in the evaporated metal atmosphere in the vacuum container. A vacuum plating device for introducing objects, characterized in that a cooling section is provided around a window in the vacuum chamber to surround a path of a laser beam. 2. The vacuum according to claim 1, wherein the cooling unit includes a cylindrical member protruding around the window, and the cylindrical member has a liquid gas passage inside its peripheral wall. Metsuki device.
JP12650181A 1981-08-12 1981-08-12 Vacuum plating device Granted JPS5827981A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12650181A JPS5827981A (en) 1981-08-12 1981-08-12 Vacuum plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12650181A JPS5827981A (en) 1981-08-12 1981-08-12 Vacuum plating device

Publications (2)

Publication Number Publication Date
JPS5827981A JPS5827981A (en) 1983-02-18
JPH0210225B2 true JPH0210225B2 (en) 1990-03-07

Family

ID=14936765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12650181A Granted JPS5827981A (en) 1981-08-12 1981-08-12 Vacuum plating device

Country Status (1)

Country Link
JP (1) JPS5827981A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2698156B1 (en) * 1992-11-16 1995-01-27 Rhone Poulenc Chimie Process for the thermal treatment of an effluent comprising polluting organic materials or an inorganic compound.

Also Published As

Publication number Publication date
JPS5827981A (en) 1983-02-18

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