JPS6351987B2 - - Google Patents
Info
- Publication number
- JPS6351987B2 JPS6351987B2 JP56058202A JP5820281A JPS6351987B2 JP S6351987 B2 JPS6351987 B2 JP S6351987B2 JP 56058202 A JP56058202 A JP 56058202A JP 5820281 A JP5820281 A JP 5820281A JP S6351987 B2 JPS6351987 B2 JP S6351987B2
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- target
- metal
- concave surface
- ion source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013307 optical fiber Substances 0.000 claims description 47
- 239000002184 metal Substances 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 238000000576 coating method Methods 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 22
- 238000010884 ion-beam technique Methods 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 7
- 239000012141 concentrate Substances 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000009987 spinning Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/12—General methods of coating; Devices therefor
- C03C25/22—Deposition from the vapour phase
- C03C25/226—Deposition from the vapour phase by sputtering
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
- Physical Vapour Deposition (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Description
【発明の詳細な説明】
この発明はスパツタリングによつて、光フアイ
バの表面に金属被覆を施すようにした光フアイバ
の金属被覆方法とその装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method and apparatus for metallizing an optical fiber, in which the surface of the optical fiber is coated with a metal by sputtering.
光フアイバの機械的強度、耐熱性等を改善する
ために、プラスチツク被覆に代えて金属被覆を光
フアイバに施すことが広く行われている。 In order to improve the mechanical strength, heat resistance, etc. of optical fibers, it is widely practiced to provide optical fibers with metal coatings instead of plastic coatings.
また、この際の金属被覆手段としてスパツタリ
ングの有効性も検討されてきたが、諸々の問題が
残されている。 In addition, the effectiveness of sputtering as a means of metal coating in this case has been studied, but various problems remain.
即ち、既知のスパツタリングでは、所定真空度
とした雰囲気中でのガス放電により、陽イオンを
金属性のターゲツト（カソード）へ衝突させると
共にそのターゲツト原子をアノード側へ放出させ
てターゲツトから霧状の金属を発生させるように
しており、そしてターゲツトおよびアノード間に
所望の被着物、例えば光フアイバを介在させるこ
とにより、これの表面に金属膜を被着させてい
た。 That is, in known sputtering, cations are collided with a metallic target (cathode) by gas discharge in an atmosphere with a predetermined degree of vacuum, and the target atoms are ejected to the anode side, thereby forming a mist of metal from the target. A desired deposit, such as an optical fiber, is interposed between the target and the anode, and a metal film is deposited on the surface of the target.
ところが、こうした場合に、霧状金属の指向性
がターゲツトからアノードに向う一方向だけに定
まつてしまい、したがつて、その光フアイバの外
周には表面の一部にのみ金属被膜が厚くなり、残
部の表面には金属が殆ど被着されないという問題
があつた。 However, in such cases, the directivity of the atomized metal is fixed in only one direction, from the target to the anode, and as a result, the metal coating becomes thick only on a portion of the outer periphery of the optical fiber. There was a problem in that almost no metal was deposited on the remaining surface.
一方、かかる問題解決のため、光フアイバおよ
びその支持装置を回転させて、光フアイバ表面の
金属膜厚のむらを防止する方法が提供されている
ものの、光フアイバの回転装置が大がかりで高価
となつていた。 On the other hand, to solve this problem, a method has been proposed in which the optical fiber and its support device are rotated to prevent unevenness in the metal film thickness on the surface of the optical fiber. However, the optical fiber rotation device is large-scale and expensive. Ta.
また、ターゲツトとアノード間に介在された光
フアイバはプラズマ中にさらされて温度上昇し、
光フアイバとこれの表面に於ける金属粒子との間
に残留応力が残り易くなり、さらに、真空度が低
いので光フアイバに不活性ガス分子を巻き込んだ
り、スパツタ槽内壁からの汚染物が光フアイバの
金属被膜に悪影響する等の問題があつた。 Furthermore, the optical fiber interposed between the target and the anode is exposed to the plasma and its temperature rises.
Residual stress tends to remain between the optical fiber and the metal particles on its surface.Furthermore, the low degree of vacuum can cause inert gas molecules to be drawn into the optical fiber, and contaminants from the inner walls of the sputtering tank can be trapped in the optical fiber. There were problems such as an adverse effect on the metal coating.
この発明はかかる従来の問題点に着目して成さ
れたもので、イオンビーム投射装置を具備した真
空室内に凹面形のターゲツトを配し、上記イオン
ビーム投射装置からのイオンビームをターゲツト
の凹面に衝突させて作つたスパツタ粒子を、上記
ターゲツトの中心を通過する光フアイバに付着さ
せることにより、光フアイバの表面に金属被膜を
形成する光フアイバの金属被覆方法および金属被
覆装置を提供する。 This invention was made by focusing on such conventional problems, and includes a concave target placed in a vacuum chamber equipped with an ion beam projection device, and an ion beam from the ion beam projection device directed onto the concave surface of the target. An optical fiber metal coating method and a metal coating apparatus are provided, which form a metal coating on the surface of an optical fiber by adhering sputter particles produced by collision to the optical fiber passing through the center of the target.
以下に、この発明の一実施例を第１図について
説明する。 An embodiment of the present invention will be described below with reference to FIG.
１はスパツタリング装置を構成する真空室で、
これの上下部の同一垂直線上に、光フアイバ２を
この真空室１内に気密的に案内する真空シール部
３，４が突設されている。 1 is a vacuum chamber that constitutes the sputtering device;
Vacuum seal portions 3 and 4 for guiding the optical fiber 2 into the vacuum chamber 1 in a hermetically sealed manner are provided on the same vertical line at the upper and lower portions thereof.
尚、図示しないが、真空室１の上方には、プリ
フオームロツドを光フアイバ２に加工するための
紡糸装置が設置され、真空室１の下方には、紡糸
装置からの光フアイバ２を真空室１で金属被膜処
理した後、これを巻き取る巻取装置が設置され
る。 Although not shown, a spinning device for processing the preform rod into an optical fiber 2 is installed above the vacuum chamber 1, and a spinning device for processing the optical fiber 2 from the spinning device is installed below the vacuum chamber 1. After the metal coating is processed in chamber 1, a winding device is installed to wind up the metal coating.
上記真空室１内には円弧状凹面５ａを有する直
径が50〜100ミリのターゲツト（カソード）５が
上向きに設置され、これの中心が上記真空シール
部３，４の孔の中心に一致するようになつてい
る。 In the vacuum chamber 1, a target (cathode) 5 having a diameter of 50 to 100 mm and having an arcuate concave surface 5a is installed facing upward, and its center is aligned with the center of the hole in the vacuum seal parts 3 and 4. It's getting old.
６はターゲツト５の中心に設けた光フアイバ２
の通孔で、これに連通する筒孔を持つた遮蔽管７
が焦点距離ｌの凹面５ａに一体に突設されてい
る。 6 is an optical fiber 2 installed at the center of the target 5.
A shielding pipe 7 having a cylindrical hole communicating with the through hole.
is integrally provided on the concave surface 5a with a focal length l.
尚、この遮蔽管７は例えば外径が2.5ミリ、内
径が1.5ミリ、長さが14センチに選定される。 The shielding tube 7 is selected to have an outer diameter of 2.5 mm, an inner diameter of 1.5 mm, and a length of 14 cm, for example.
また、上記真空室１内に於いて、ターゲツト５
が回転自在の治具上に設けられる。 Also, in the vacuum chamber 1, the target 5
is provided on a rotatable jig.
このターゲツト５および遮蔽管７の材質とし
て、シリコン（Si）、アルミニウム（Al）、銅
（Cu）、チタン（Ti）、ニツケル（Ni）またはこ
れらの合金などが使用される。 The target 5 and the shielding tube 7 are made of silicon (Si), aluminum (Al), copper (Cu), titanium (Ti), nickel (Ni), or an alloy thereof.
さらに、上記真空室１内は残留ガスなどの気体
を窒素ガス（N2）、アルゴン（Ar）、ヘリウム
（He）などの不活性ガスによつて置換され、真空
度を例えば10-5〜10-6torrとしてある。 Furthermore, gases such as residual gas in the vacuum chamber 1 are replaced with an inert gas such as nitrogen gas (N 2 ), argon (Ar), helium (He), etc., and the degree of vacuum is increased to, for example, 10 -5 to 10 -6 torr.
一方、８は真空室１上部に取り付けられたカウ
フマン型の多孔式イオン源で、これからは多数の
平行なイオンビームＢが上記ターゲツト５の凹面
５ａに向つて投射される様になつている。 On the other hand, 8 is a Kauffman type porous ion source attached to the upper part of the vacuum chamber 1, from which a large number of parallel ion beams B are projected toward the concave surface 5a of the target 5.
尚、この凹面５ａは投射されたイオンビームＢ
に依つてスパツタ粒子Ｓを所定の焦点位置に集中
させるように作用する。 Incidentally, this concave surface 5a is formed by the projected ion beam B.
This acts to concentrate the spatter particles S at a predetermined focal position.
次に、上記金属被覆装置に依る金属被覆方法に
ついて述べる。 Next, a metal coating method using the metal coating apparatus described above will be described.
先ず、紡糸装置からの光フアイバ２は真空室１
内の真空シール部３，４およびターゲツト５の通
孔６を経て、既述の巻取装置に固定し、光フアイ
バ２を連続的に巻き取れる様に準備する。 First, the optical fiber 2 from the spinning device is transferred to the vacuum chamber 1.
The optical fiber 2 is prepared so that it can be continuously wound by fixing it to the above-mentioned winding device through the vacuum seal parts 3 and 4 inside and the through hole 6 of the target 5.
次に、その光フアイバの巻き取りと同時に上記
イオン源８から約300単位のアルゴン（Ar）イオ
ンビームＢを、１分間に10回前後で回転する上記
ターゲツト５に向けて投射する。 Next, at the same time as the optical fiber is wound, an argon (Ar) ion beam B of about 300 units is projected from the ion source 8 toward the target 5, which rotates about 10 times per minute.
このときのイオン電流は例えば10〜15mAで、
イオン加速電圧は２〜3KVに選定する。 The ion current at this time is, for example, 10 to 15 mA,
The ion acceleration voltage is selected to be 2-3KV.
ターゲツト５に投射されたイオンビームＢに依
つて、ターゲツト５の凹面５ａからは、これの焦
点距離ｌ、例えば20センチの位置に向つてスパツ
タ粒子が集中する。 Due to the ion beam B projected onto the target 5, spatter particles are concentrated from the concave surface 5a of the target 5 toward a position at a focal length l, for example 20 cm.
尚、ターゲツト５が回転しているので、これの
凹面５ａが均一にスパツタされ、したがつてスパ
ツタ粒子の上記焦点への集中が大きく乱れること
がなくなる。 Since the target 5 is rotating, its concave surface 5a is sputtered uniformly, so that the concentration of spatter particles at the focal point is not disturbed significantly.
一方、このようにして作られたスパツタ粒子
は、上部の真空シール部３を通過した後、上記の
焦点位置に連続的に案内される光フアイバ２の外
周に霧状の金属となつて均一に被着する。 On the other hand, after passing through the upper vacuum seal part 3, the spatter particles created in this way uniformly form atomized metal around the outer periphery of the optical fiber 2, which is continuously guided to the above-mentioned focal position. to adhere to.
続いて、このように金属被膜が形成された金属
被覆光フアイバ９はターゲツト５の通孔６に至る
までの間、その被覆された金属がイオンビームＢ
に依つて再びスパツタリングされないように、遮
蔽管７内に直ちに案内される。 Subsequently, while the metal-coated optical fiber 9 on which the metal coating has been formed reaches the through hole 6 of the target 5, the coated metal is exposed to the ion beam B.
It is immediately guided into the shielding tube 7 so that it is not sputtered again by the
また、通孔６を通過した金属被覆光フアイバと
して真空シール部４通過後巻取装置に巻き取られ
る。 Further, the metal-coated optical fiber that has passed through the through hole 6 is wound up by a winding device after passing through the vacuum seal section 4.
かくして、金属被膜厚が1000〜3000オングスト
ローム（Å）の金属被覆光フアイバを得る。 Thus, a metal coated optical fiber with a metal coating thickness of 1000 to 3000 Angstroms (Å) is obtained.
上記実施例では、こうして光フアイバ２の外周
に金属被膜を形成する際、上記ターゲツト５を回
転状態とする。 In the embodiment described above, when forming the metal coating on the outer periphery of the optical fiber 2, the target 5 is rotated.
例えば、このターゲツト５を回転台の上に設置
し、この回転台を適当な伝動手段を介して真空室
１外に設置したモータ等によつてゆつくりと回転
する。 For example, the target 5 is placed on a rotating table, and the rotating table is slowly rotated by a motor or the like installed outside the vacuum chamber 1 via a suitable transmission means.
この回転により、イオン源８から放射されるイ
オンビームＢが一定方向であつても、ターゲツト
５の凹面５ａは均一にスパツタされ、光フアイバ
２に対する金属被膜厚が均等になるとともに、タ
ーゲツト５各部の摩耗度も均等となり、凹面５ａ
の当初の曲面度が害されることもなくなる。 Due to this rotation, even if the ion beam B emitted from the ion source 8 is directed in a fixed direction, the concave surface 5a of the target 5 is sputtered uniformly, the metal coating thickness on the optical fiber 2 becomes uniform, and each part of the target 5 is sputtered. The degree of wear becomes even, and the concave surface 5a
The original degree of curvature will not be impaired.
また、上記実施例は光フアイバ上に均一に強
度、耐熱性に優れた金属被膜を形成する方法であ
るが、被膜をさらに大きくすために、他のメツキ
法、例えば真空蒸着法、イオンプレーテイング法
或いは電解メツキ法などが併用される。 In addition, although the above embodiment is a method for uniformly forming a metal coating with excellent strength and heat resistance on an optical fiber, other plating methods such as vacuum evaporation, ion plating, etc. can be used to make the coating even larger. method, electrolytic plating method, etc. are used in combination.
以上説明した通り、この発明によれば、イオン
源を備えた真空室内に凹面形のターゲツトを配
し、上記イオン源から上記凹面にイオンビームを
衝突させて作つたスパツタ粒子を、上記凹面の焦
点付近を通過する光フアイバに被着することに依
り、スパツタリングによつて、光フアイバに対す
る金属被膜の厚さを均等化でき、したがつて、光
フアイバの強度並びに耐熱性が各部に於いて均一
化するという利点が得られる。 As explained above, according to the present invention, a concave target is arranged in a vacuum chamber equipped with an ion source, and sputtered particles produced by colliding an ion beam from the ion source with the concave surface are directed to the focal point of the concave surface. By coating the optical fiber passing nearby, the thickness of the metal coating on the optical fiber can be made uniform by sputtering, and therefore the strength and heat resistance of the optical fiber are made uniform in each part. You get the advantage of doing so.
また、光フアイバがプラズマ中に置かれないの
で、これの温度上昇による残留応力の発生がない
ばかりか、純度の高い金属被膜が得られて、被膜
内への不活性ガスの吸い込みがなくなる等の利点
が得られる。 In addition, since the optical fiber is not placed in the plasma, not only is there no residual stress caused by the rise in temperature of the optical fiber, but also a highly pure metal coating is obtained, and there is no inert gas being sucked into the coating. Benefits can be obtained.
また、この発明によれば、真空室内にイオン源
とこのイオン源からのイオンビームの投射を受け
てスパツタ粒子を焦点に集中する凹面を持つた回
転自在のターゲツトとを備え、このターゲツトの
中心には上記焦点を通る光フアイバの通孔および
この通孔に連通するイオンビームの遮蔽管が設け
られたことにより、光フアイバを回転させずにタ
ーゲツトを回転するのみで、光フアイバへの均一
な金属被膜の被着が可能となり、しかもターゲツ
トのみを回転するので、この回転機構が簡単かつ
安価に得られ、生産コストの低減が図れる。 Further, according to the present invention, an ion source is provided in a vacuum chamber and a rotatable target having a concave surface that receives an ion beam projected from the ion source and concentrates spatter particles at a focal point. By providing a hole for the optical fiber passing through the focal point and a shielding tube for the ion beam communicating with this hole, it is possible to uniformly deposit metal onto the optical fiber by simply rotating the target without rotating the optical fiber. It is possible to deposit a film, and since only the target is rotated, this rotation mechanism can be obtained easily and inexpensively, and production costs can be reduced.
また、ターゲツトの中心を通る金属被覆後の光
フアイバは、遮蔽管に依るイオンビームの遮蔽効
果により、その金属被覆した光フアイバの金属が
２次的にスパツタリングが行われるのを防止する
ことができる。 In addition, the metal-coated optical fiber that passes through the center of the target can be prevented from being sputtered secondary to the metal of the metal-coated optical fiber due to the shielding effect of the ion beam by the shielding tube. .
更に、ターゲツトに凹面を設けたことにより、
スパツタ粒子を光フアイバの周面に集中させて、
被覆効率を向上することができる。 Furthermore, by providing a concave surface on the target,
By concentrating the spatter particles on the circumferential surface of the optical fiber,
Coating efficiency can be improved.
図面はこの発明の光フアイバ金属被覆方法をそ
の装置と共に示した概略説明図である。
１…真空室、２…光フアイバ、５…ターゲツ
ト、５ａ…凹面、６…通孔、７…遮蔽管、８…イ
オン源。
The drawing is a schematic explanatory view showing the optical fiber metal coating method of the present invention together with its apparatus. DESCRIPTION OF SYMBOLS 1... Vacuum chamber, 2... Optical fiber, 5... Target, 5a... Concave surface, 6... Through hole, 7... Shield tube, 8... Ion source.
Claims (1)
ーゲツトを配し、上記イオン源からその凹面にイ
オンビームを衝突させて作つたスパツタ粒子を、
少くとも上記凹面の焦点を通過する光フアイバに
被着させるようにしたことを特徴とする光フアイ
バの金属被覆方法。 ２ 真空室内に、イオン源とこのイオン源からの
イオンビームの投射を受けて、スパツタ粒子を焦
点に集中する凹面を持つた回転自在のターゲツト
とを備え、このターゲツトの中心には上記焦点を
通過する光フアイバの通孔およびこの通孔に連通
するイオンビームの遮蔽管が設けられたことを特
徴とする光フアイバの金属被覆装置。[Scope of Claims] 1 A target with a concave surface is placed in a vacuum chamber equipped with an ion source, and sputter particles are produced by colliding an ion beam from the ion source onto the concave surface,
A method for coating an optical fiber with metal, characterized in that the metal coating is applied to an optical fiber that passes through at least the focal point of the concave surface. 2. A vacuum chamber is equipped with an ion source and a rotatable target with a concave surface that receives the ion beam projected from the ion source and concentrates the spatter particles at the focal point, and the center of the target has an ion source that passes through the focal point. 1. An apparatus for metal coating an optical fiber, comprising a through hole in the optical fiber and an ion beam shielding tube communicating with the through hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56058202A JPS57175753A (en) | 1981-04-17 | 1981-04-17 | Coating method of optical fiber with metal and apparatus thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56058202A JPS57175753A (en) | 1981-04-17 | 1981-04-17 | Coating method of optical fiber with metal and apparatus thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57175753A JPS57175753A (en) | 1982-10-28 |
| JPS6351987B2 true JPS6351987B2 (en) | 1988-10-17 |
Family
ID=13077438
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56058202A Granted JPS57175753A (en) | 1981-04-17 | 1981-04-17 | Coating method of optical fiber with metal and apparatus thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57175753A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100414766B1 (en) * | 2000-09-21 | 2004-01-13 | 광주과학기술원 | Optical fiber mirror and method for fabricating the same |
| CN109536911B (en) * | 2018-12-26 | 2020-09-29 | 北京航空航天大学 | A device for optical fiber side coating |
-
1981
- 1981-04-17 JP JP56058202A patent/JPS57175753A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57175753A (en) | 1982-10-28 |
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