JPH0219982B2 - - Google Patents
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- Publication number
- JPH0219982B2 JPH0219982B2 JP57025150A JP2515082A JPH0219982B2 JP H0219982 B2 JPH0219982 B2 JP H0219982B2 JP 57025150 A JP57025150 A JP 57025150A JP 2515082 A JP2515082 A JP 2515082A JP H0219982 B2 JPH0219982 B2 JP H0219982B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film wire
- vortex
- information storage
- superconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/44—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using super-conductive elements, e.g. cryotron
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は、第二種超伝導体中の磁束量子を利用
する超伝導記憶素子の動作電流の低減及び動作の
安定化に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to reducing the operating current and stabilizing the operation of a superconducting memory element that utilizes magnetic flux quanta in a type II superconductor.
〔発明の技術的背景とその問題点〕
鉛合金等の不純物を含む超伝導体、Nb等の遷
移金属超伝導体、Nb3Ge等の化合物超伝導体は
第二種超伝導体と呼ばれ、局在化された磁束量子
(ボルテツクスあるいは渦糸と呼ばれる、以後渦
糸とする)の形で磁束の侵入を許す。渦糸の直径
は通常500nm以下と考えてよく、これを記憶情
報担体として用い得れば大容量な超伝導記憶装置
の実現が可能である。[Technical background of the invention and its problems] Superconductors containing impurities such as lead alloys, transition metal superconductors such as Nb, and compound superconductors such as Nb 3 Ge are called type II superconductors. , which allows magnetic flux to enter in the form of localized flux quanta (called vortices or vortex threads, hereinafter referred to as vortex threads). The diameter of the vortex thread can be considered to be normally 500 nm or less, and if it can be used as a storage information carrier, it is possible to realize a large-capacity superconducting storage device.
この様な記憶装置としては、第二種超伝導体薄
膜よりなる渦糸発生部で発生せしめた渦糸を、同
じく第二種超伝送体薄膜より形成された環状の渦
糸転送部に記憶入力情報に応じて送出せしめ、ク
ロツクパルスにより環状転送部中を順次移動せし
め、これを同環中に配されたジヨセフソン接合よ
りなる検出部で検出する構成の装置が「IEEE
Transaction or Magnetics、Vol MAG−15、
No.1、PP.558〜561(1968)」に、また、その渦糸
発生部に関して「特公昭56−53834号公報」に開
示されている。 Such a storage device stores and inputs vortices generated in a vortex generation section made of a second type superconductor thin film into an annular vortex transfer section also made of a second type superconductor thin film. A device configured to transmit information in accordance with information, move it sequentially through a ring transfer section using clock pulses, and detect it with a detection section consisting of a Josephson junction arranged in the ring is known as the ``IEEE
Transaction or Magnetics, Vol MAG−15,
No. 1, pp. 558-561 (1968), and the vortex generating portion thereof is disclosed in Japanese Patent Publication No. 56-53834.
然し乍ら、斯る超伝導記憶装置の場合シリアル
メモリとしての機能しか得られない。また、渦糸
の速度が遅いため転送クロツクを速くすることが
できず、従つて、情報読み出し速度が遅いという
欠点を有していた。 However, such a superconducting memory device can only function as a serial memory. Furthermore, since the speed of the vortex is slow, the transfer clock cannot be made faster, and therefore the information readout speed is slow.
また、「特願昭56−65493号」および第42回応用
物理学会学術講演会講演予稿集P478(7p−Y−
15、昭和56年10月)に於て、渦糸発生部、蓄積
部、検出部よりなる構造を基本記憶セルとする構
成の超伝導記憶装置の提案がなされている。この
構成では上述の問題はないが、超伝導状態にあ
る第二種超伝導体薄膜中に渦糸を発生させるた
め、第一臨界磁場以上の高磁場を発生しなければ
ならず、したがつて渦糸発生用の電流レベルが極
めて大きい。蓄積された渦糸を消去する方法と
して、逆向きの渦糸の発生あるいは移送電流によ
る超伝導体外への放出を用いているため、電流レ
ベルが大きく、かつ、ピン(超伝導体中に存在す
る不規則な渦糸のトラツプ)の影響を受け易く従
つて消去が不完全にしか行われない。という欠点
があつた。 In addition, "Special Application No. 1983-65493" and the 42nd Japan Society of Applied Physics Academic Conference Proceedings P478 (7p-Y-
15, October 1981), a superconducting memory device was proposed in which the basic memory cell was a structure consisting of a vortex generating section, an accumulating section, and a detecting section. Although this configuration does not have the above-mentioned problem, in order to generate vortices in the second type superconductor thin film in a superconducting state, a high magnetic field higher than the first critical magnetic field must be generated. The current level for vortex generation is extremely high. The method of eliminating accumulated vortices is to generate vortices in the opposite direction or to release them out of the superconductor using a transport current. (irregular vortex traps) and therefore cancellation is incomplete. There was a drawback.
本発明はこれらの欠点を解決するため、渦糸書
き込み時に第二種超伝導体薄膜線を一旦常伝導状
態に転移せしめ、かつ、渦糸の消去を第二種超伝
導体薄膜線の常伝導転移を用いて行うようにした
もので、以下図面について詳細に説明する。
In order to solve these drawbacks, the present invention temporarily transitions the second type superconductor thin film wire to a normal conduction state when writing the vortex thread, and erases the vortex to the normal conduction state of the second type superconductor thin film wire. This is done using transfer, and will be described in detail below with reference to the drawings.
第1図は第1番目の本発明による超伝導記憶素
子の実施例であつて、aは平面図、bはAA′線断
面図である。1は情報記憶用第二種超伝導体薄膜
線であり、ジヨセフソン接合の下部電極としても
働く。2は上部電極超伝導体薄膜線であり、接合
絶縁体層4を介して下部電極の薄膜線1と対向し
てジヨセフソン接合を形成している。3は抵抗体
薄膜線であり、情報記憶用薄膜線1および上部電
極の薄膜線2から絶縁体薄膜5を介して絶縁され
ている。また、これ等全体は基板6上に形成され
ている。
FIG. 1 shows a first embodiment of a superconducting memory element according to the present invention, in which a is a plan view and b is a cross-sectional view taken along the line AA'. 1 is a type 2 superconductor thin film wire for information storage, and also serves as the lower electrode of the Josephson junction. Reference numeral 2 denotes an upper electrode superconductor thin film wire, which faces the lower electrode thin film wire 1 via a junction insulator layer 4 to form a Josephson junction. Reference numeral 3 denotes a resistor thin film wire, which is insulated from the information storage thin film wire 1 and the upper electrode thin film wire 2 via an insulator thin film 5. Further, these are all formed on a substrate 6.
これを製作するには公知のジヨセフソン回路製
作技術を用いることができる。すなわち、各層の
金属および絶縁体を真空蒸着法あるいはスパツタ
リング法により形成し、リングラフイー技術によ
りパタニングを行いつつ順次積み上げて製作す
る。 Known Josephson circuit fabrication techniques can be used to fabricate this. That is, each layer of metal and insulator is formed by a vacuum evaporation method or a sputtering method, and is sequentially stacked while patterning is performed using a phosphorography technique.
第1図の記憶素子についてその動作方法を述べ
る。 A method of operating the memory element shown in FIG. 1 will be described.
(1) 渦糸の書き込み:ジヨセフソン接合の上部電
極の薄膜線2から下部電極の薄膜線1に向けて
(向きは逆でもよい、この場合には生じる渦糸
の向きが逆になるだけで全く同一の効果を持
つ)バイアス電流IBを流す。次に、抵抗体薄膜
線3に、この薄膜で発生する熱による情報記憶
用薄膜線1の温度上昇が、臨界温度以上となつ
て常伝導状態に転移するに足るだけの大きさ
の、電流IRを流す。すると、情報記憶用薄膜線
1は、常伝導転移したため磁場を排除するマイ
スナー効果が消滅して、第2図aに示す様に、
バイアス電流IBの作る磁力線Bを侵入させるこ
とになる。次に、バイアス電流IBを流したまま
の状態で、抵抗体薄膜線3に流す電流を零に戻
すと、発熱源がなくなるから情報記憶用薄膜線
1の温度が低下し超伝導状態へと戻る。この超
伝導状態への転移はバイアス電流IBの作る磁場
の中で起るため第2図bに示す様に、その磁場
は情報記憶用薄膜線1中に渦糸Aとなつて取り
込まれる。この渦糸Aは、情報記憶用薄膜線1
に多数存在するピンによつて捕捉されるため、
バイアス電流を零にした後にも第2図cに示す
様に、情報記憶用薄膜線1の中に残る。かくし
て、情報記憶用薄膜線1中への渦糸の書き込
み、記憶が行われるだけである。渦糸の記憶を
更に確実に行うためには第2図dに示す様に、
情報記憶用薄膜線1の膜厚を接合の近傍で薄く
しておくと良い。渦糸の持つエネルギーは第二
種超伝導体の膜厚が小さいほど小さな値となる
ため、渦糸はこの膜厚の薄くなつた部分に閉じ
込められる。(1) Writing vortices: From the thin film line 2 of the upper electrode of the Josephson junction to the thin film line 1 of the lower electrode (the direction may be reversed; in this case, the direction of the vortex produced is simply reversed, and no A bias current I B (having the same effect) is applied. Next, a current I is applied to the resistor thin film wire 3, which is large enough to cause the temperature rise of the information storage thin film wire 1 due to the heat generated in this thin film to exceed the critical temperature and transition to a normal conduction state. Run R. Then, the thin film wire 1 for information storage undergoes a normal conduction transition, and the Meissner effect that eliminates the magnetic field disappears, as shown in FIG. 2a.
This causes the magnetic field line B created by the bias current I B to enter. Next, when the current flowing through the resistor thin film wire 3 is returned to zero while the bias current I B remains flowing, the temperature of the information storage thin film wire 1 decreases because the heat generation source disappears, and the information storage thin film wire 1 enters a superconducting state. return. Since this transition to the superconducting state occurs in the magnetic field created by the bias current IB , the magnetic field is incorporated into the information storage thin film wire 1 in the form of vortex threads A, as shown in FIG. 2b. This vortex thread A is a thin film wire 1 for information storage.
Because it is captured by many pins in
Even after the bias current is reduced to zero, it remains in the information storage thin film line 1, as shown in FIG. 2c. In this way, only the vortex is written and stored in the thin film wire 1 for information storage. In order to memorize the vortex threads more reliably, as shown in Figure 2d,
It is preferable that the film thickness of the thin film wire 1 for information storage is made thin near the junction. The energy possessed by the vortex threads decreases as the film thickness of the second type superconductor becomes smaller, so the vortex threads are confined in the thinner part of the film.
(2) 渦糸の消去:一旦書き込まれた渦糸を消して
やるには次の様に行う。バイアス電流は流さな
い状態で、抵抗体薄膜線3に、この薄膜で発生
する熱による情報記憶用薄膜線1の温度上昇が
臨界温度以上となつて常伝導状態に転移するに
足るだけの大きさの電流IRを流す。すなわち、
情報記憶用薄膜を常伝導状態へと転移させる。
渦糸は超伝導体中の渦電流(前述した様に直径
500nm程度以下の円周をまわる周回電流であ
り、超伝導状態では抵抗が無いから永久に流れ
続ける)によつて作られ且つそれに囲まれた2
×10-15Vsの大きさの磁束の粒である。常伝導
へ転移するとこの渦電流は維持されず抵抗によ
つて減衰してしまう。当然これに伴う磁束も消
滅する。かくして、渦糸の消去が行われるわけ
である。(2) Erasing the vortex: To erase the vortex once written, proceed as follows. With no bias current flowing, the temperature of the information storage thin film wire 1 due to the heat generated in this thin film rises to a critical temperature or higher and is large enough to transition to a normal conduction state in the resistor thin film wire 3. A current I R is applied. That is,
Transforms a thin film for information storage into a normal conducting state.
The vortex thread is the eddy current in the superconductor (as mentioned above, the diameter
It is a circulating current that revolves around a circumference of about 500 nm or less, and it continues to flow forever because there is no resistance in the superconducting state) and surrounded by 2
It is a grain of magnetic flux with a size of ×10 -15 Vs. When the transition to normal conduction occurs, this eddy current is not maintained and is attenuated by resistance. Naturally, the accompanying magnetic flux also disappears. In this way, the vortex threads are eliminated.
(3) 渦糸の検出:本発明素子では記憶情報担体と
して渦糸を用いる。すなわち、情報記憶用薄膜
線1中に渦糸のある状態を例えば2進論理記憶
情報の論理値“1”に、渦糸の無い状態を
“0”に対応させる。渦糸の有無を検出するに
は1、4、2よりなるジヨセフソン接合を用い
る。ジヨセフソン接合の電圧対電流特性は周知
のように第3図に示す様な零電圧電流及びヒス
テリシスを持つ形をしている。零電圧の状態で
流し得る電流の最大値を臨界電流と呼びこれ以
上の電流を流すと接合の両端に電圧が生じる。
第3図aを渦糸の無い場合のIV特性とし、そ
の臨界電流をIC1とする。情報記憶用薄膜線1
に渦糸が有るとその渦糸の持つ磁場の一部分が
第2図cに示す如く、接合絶縁体層4を貫く。
この結果、周知の様にジヨセフソン接合の臨界
電流が減少する。この状態での臨界電流値を
IC2とする(第3図b)。ジヨセフソン接合にIC1
>IB>IC2なる大きさのバイアス電流IBを流して
やると第3図a及びbに示される如く、情報記
憶用薄膜線1に渦糸が無い場合には接合電圧は
零であるが渦糸が有ると接合電圧はVG(通常数
mVの大きさ)となる。かくして、適当な大き
さのバイアス電流をジヨセフソン接合に流すこ
とによつて記憶情報の有無を検出できるわけで
ある。(3) Detection of vortex threads: The device of the present invention uses vortex threads as storage information carriers. That is, the state in which there is a vortex in the information storage thin film wire 1 corresponds to, for example, the logical value "1" of binary logic storage information, and the state in which there is no vortex corresponds to "0". To detect the presence or absence of vortex threads, a Josephson junction consisting of 1, 4, and 2 is used. As is well known, the voltage versus current characteristic of a Josephson junction has a zero voltage current and hysteresis as shown in FIG. The maximum value of current that can flow in a state of zero voltage is called the critical current, and if a current greater than this is allowed to flow, a voltage will be generated across the junction.
Figure 3a is the IV characteristic without vortices, and its critical current is I C1 . Thin film wire for information storage 1
If there is a vortex thread in the vortex thread, a part of the magnetic field of the vortex thread penetrates the bonding insulator layer 4, as shown in FIG. 2c.
As a result, the critical current of the Josephson junction is reduced, as is well known. The critical current value in this state is
I C2 (Figure 3b). I C1 to Josephson junction
>I B >I C2 When a bias current I B of a magnitude of If there are vortex threads, the junction voltage will be V G (usually several mV). Thus, the presence or absence of stored information can be detected by passing a bias current of an appropriate magnitude through the Josephson junction.
以上が、第1図に示す本発明素子の超伝導記憶
素子としての動作である。第4図は、第1図の構
造の素子を製作して測定した渦糸の書き込み特性
の実験結果である。同図で横軸は、磁場を発生す
るために流すバイアス電流IB、縦軸はジヨセフソ
ン臨界電流ICである。渦糸の無い状態の臨界電流
ICは2.2mAで横軸に平行な直線L1で示してあ
る。(1)に於て述べた方法により渦糸を書き込んだ
後の臨界電流の実測値は黒丸で示してあり、ばら
つきはあるがほぼ破線L2で示した曲線より下側
となる。直線L1と破線L2の差が渦糸の書き込
みによる臨界電流の変化を表わしている。図から
わかる様に、バイアス電流が例えば2mAでも渦
糸の書き込みが十分に行われている。この値は、
情報記憶用薄膜線1を超伝導状態に保つたまま渦
糸を書き込む場合に必要な電流値に比べ約1/80の
値である。また、情報記憶用薄膜線1を常伝導に
転移させるのに必要な、抵抗体薄膜線3に流す電
流は、近似的に情報記憶用薄膜線1の巾に比例
し、実測では1mA/μmであつた。したがつ
て、巾を狭くすることによつてこの電流レベルも
数mAの程度にすることができる。 The above is the operation of the element of the present invention shown in FIG. 1 as a superconducting memory element. FIG. 4 shows the experimental results of the writing characteristics of the vortex fibers, which were measured by manufacturing an element having the structure shown in FIG. In the figure, the horizontal axis is the bias current I B that is applied to generate the magnetic field, and the vertical axis is the Josephson critical current I C. Critical current without vortices
I C is 2.2 mA and is shown by a straight line L1 parallel to the horizontal axis. The actual measured value of the critical current after the vortex is written by the method described in (1) is shown by a black circle, and although there is some variation, it is approximately below the curve shown by the broken line L2. The difference between the straight line L1 and the broken line L2 represents the change in critical current due to the writing of the vortex. As can be seen from the figure, even when the bias current is, for example, 2 mA, the vortex is sufficiently written. This value is
This value is approximately 1/80 of the current value required to write a vortex thread while maintaining the information storage thin film wire 1 in a superconducting state. In addition, the current flowing through the resistor thin film wire 3 necessary to transfer the information storage thin film wire 1 to normal conduction is approximately proportional to the width of the information storage thin film wire 1, and is actually measured to be 1 mA/μm. It was hot. Therefore, by narrowing the width, this current level can also be reduced to the order of several mA.
第5図は第2番目の本発明による超伝導記憶素
子の実施例であつて、第1図に示した構造に加え
て、超伝導薄膜線7が、上記電極の薄膜線2の直
上に絶縁体薄膜5′を介して形成されている。こ
の新たに加えられた超伝導薄膜線7は渦糸書き込
みの際の磁場発生用の電流を流すためのもので、
第1番目の本発明で渦糸書き込み時に流していた
バイアス電流の代りに、この線に電流を流してや
る。他の動作は上記第1番目の本発明におけるも
のと全く同一である。この様な構成をとることに
より、情報の書き込み線と読み出し線とを分離で
き回路構成上の自由度を増すことができる。 FIG. 5 shows a second embodiment of a superconducting memory element according to the present invention, in which, in addition to the structure shown in FIG. It is formed through a body thin film 5'. This newly added superconducting thin film wire 7 is for passing current for generating a magnetic field during vortex writing.
A current is passed through this line in place of the bias current that was passed during vortex writing in the first invention. The other operations are exactly the same as those in the first aspect of the invention. By adopting such a configuration, the information write line and read line can be separated, and the degree of freedom in circuit configuration can be increased.
以上説明したように、渦糸の書き込み時に情報
記憶用の第二種超伝導体薄膜線を常伝導に転移さ
せているため書き込み電流レベルが大幅に低減で
き、更にまた、記憶された渦糸の消去の方法とし
て渦糸を蓄えている第二種超伝導体薄膜線を常伝
導に転移させる手段をとつているので、同薄膜中
のピンの有無にかかわりなく完全に渦糸を消去で
き従つて安定な繰返し動作ができるという利点が
ある。
As explained above, since the type 2 superconductor thin film wire for information storage is transferred to normal conductivity when writing the vortex thread, the write current level can be significantly reduced, and furthermore, the write current level can be significantly reduced. As a method of elimination, we use a method to transfer the type II superconductor thin film wire that stores vortices to normal conductivity, so the vortices can be completely eliminated regardless of the presence or absence of pins in the thin film. It has the advantage of being able to perform stable and repeated operations.
本発明素子は渦糸書き込み速度が余り速くでき
ないので、キヤツシユメモリとしての適用は困難
と考えられるが、読み出しはジヨセフソン接合の
電圧転移を用いており極めて高速であるので、構
造の簡単さ、セル面積を小さくできる等の利点を
併せ、超大容量の超伝導記憶装置への応用が有効
である。 Since the device of the present invention cannot have a very high vortex write speed, it is considered difficult to apply it as a cache memory.However, since the device of the present invention uses the voltage transition of Josephson junction and is extremely high speed, the structure is simple and the cell With the advantages of reducing the area, it is effective to apply it to ultra-large capacity superconducting storage devices.
第1図aは第1番目の本発明の一実施例を示す
平面図、第1図bは同図aのAA′線断面図、第2
図a〜dは本発明に係る渦糸発生の様子の説明
図、第3図a,bは本発明に係る渦糸検出動作を
説明するためのジヨセフソン接合の電圧、電流特
性図、第4図は、本発明に係る渦糸書き込み特性
の実験結果を示す図、第5図は第2番目の本発明
の一実施例を示す断面図である。
1……情報記憶用第二種超伝導体薄膜線、2…
…超伝導体上部電極薄膜線、3……抵抗体薄膜
線、4……ジヨセフソン接合絶縁体層、5,5′
……絶縁体薄膜、6……基板、7……渦糸書込み
用超伝導体薄膜線。
FIG. 1a is a plan view showing a first embodiment of the present invention, FIG. 1b is a sectional view taken along the line AA' in FIG.
Figures a to d are explanatory diagrams of how vortices are generated according to the present invention, Figures 3a and b are voltage and current characteristic diagrams of Josephson junctions to explain the vortex detection operation according to the present invention, and Figure 4 FIG. 5 is a diagram showing the experimental results of the vortex writing characteristics according to the present invention, and FIG. 5 is a sectional view showing an example of the second embodiment of the present invention. 1... Type 2 superconductor thin film wire for information storage, 2...
...Superconductor upper electrode thin film wire, 3...Resistor thin film wire, 4...Josephson junction insulator layer, 5, 5'
...Insulator thin film, 6...Substrate, 7...Superconductor thin film wire for vortex writing.
Claims (1)
ジヨセフソン効果を生ぜしめ得る厚さの絶縁体層
を介して上記情報記憶用薄膜線に対向する超伝導
体薄膜線と、この超伝導体薄膜線および上記情報
記憶用薄膜線から絶縁された抵抗体薄膜線とより
なることを特徴とする超伝導記憶素子。 2 第二種超伝導体でなる情報記憶用薄膜線と、
ジヨセフソン効果を生ぜしめ得る厚さの絶縁体層
を介して上記情報記憶用薄膜線に対向する超伝導
体薄膜線と、この超伝導体薄膜線および上記情報
記憶用薄膜線から絶縁された抵抗体薄膜線と、こ
の抵抗体薄膜線および上記情報記憶用薄膜線およ
び上記超伝導体薄膜線から絶縁された超伝導体薄
膜線とよりなることを特徴とする超伝導記憶素
子。[Claims] 1. A thin film wire for information storage made of a second type superconductor;
A superconductor thin film wire facing the information storage thin film wire through an insulating layer having a thickness that can produce the Josephson effect, and a resistor insulated from the superconductor thin film wire and the information storage thin film wire. A superconducting memory element characterized by consisting of a thin film wire. 2. A thin film wire for information storage made of a second type superconductor,
A superconductor thin film wire facing the information storage thin film wire through an insulating layer having a thickness that can produce the Josephson effect, and a resistor insulated from the superconductor thin film wire and the information storage thin film wire. A superconducting memory element comprising a thin film wire, and a superconductor thin film wire insulated from the resistor thin film wire, the information storage thin film wire, and the superconductor thin film wire.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57025150A JPS58143495A (en) | 1982-02-18 | 1982-02-18 | Superconductive storage element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57025150A JPS58143495A (en) | 1982-02-18 | 1982-02-18 | Superconductive storage element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58143495A JPS58143495A (en) | 1983-08-26 |
| JPH0219982B2 true JPH0219982B2 (en) | 1990-05-07 |
Family
ID=12157968
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57025150A Granted JPS58143495A (en) | 1982-02-18 | 1982-02-18 | Superconductive storage element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58143495A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5011817A (en) * | 1988-01-29 | 1991-04-30 | Nec Corporation | Magnetic memory using superconductor ring |
| US5039656A (en) * | 1988-02-29 | 1991-08-13 | Yasuharu Hidaka | Superconductor magnetic memory using magnetic films |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS533901B2 (en) * | 1974-02-08 | 1978-02-10 | ||
| US3936809A (en) * | 1974-06-07 | 1976-02-03 | International Business Machines Corporation | Single flux quantum storage devices and sensing means therefor |
-
1982
- 1982-02-18 JP JP57025150A patent/JPS58143495A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58143495A (en) | 1983-08-26 |
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